Patents by Inventor Naoko Kihara
Naoko Kihara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20110267718Abstract: According to one embodiment, a magnetic recording medium includes a plurality of magnetic dots having a pattern formed by self organization. The density of magnetic dots in a peripheral portion of a central portion in a widthwise direction is higher than that of magnetic dots in the central portion at a burst portion of the magnetic recording medium.Type: ApplicationFiled: March 23, 2011Publication date: November 3, 2011Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Akihiro ITAKURA, Akira KIKITSU, Yoshiyuki KAMATA, Naoko KIHARA
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Publication number: 20110259849Abstract: According to one embodiment, a method for producing an imprint mold includes forming, on a substrate, a plurality of guides including a first wall surface and a second wall surface, wherein an angle between at least one of the first and second wall surfaces and an exposed substrate surface is 131° or less, applying a self-assembling material, which forms a sphere when phase-separated, to a guide groove area defined by the first wall surface, the second wall surface and the substrate surface, and self-assembling the self-assembling material to form a dot pattern, etching the substrate by using the dot pattern as a mask to transfer the dot pattern and forming an imprint mold by using the substrate with the dot pattern transferred as a master mold.Type: ApplicationFiled: April 25, 2011Publication date: October 27, 2011Applicant: Kabushiki Kaisha ToshibaInventors: Masatoshi Sakurai, Naoko Kihara, Hiroki Tanaka, Ryosuke Yamamoto, Akiko Yuzawa
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Publication number: 20110242706Abstract: According to one embodiment, a servo area of a magnetic recording medium includes magnetic dots arrayed at a period L0. The magnetic dots include a plurality of magnetic dot regions divided in the cross track direction. A width Wm in the down track direction of the mth magnetic dot region from the innermost circumference and a number Nm of dot rows in the down track direction of the mth region meet a relationship represented by L0{Nm?3/2?0.3}?Wm?L0{Nm?3/2+0.Type: ApplicationFiled: March 2, 2011Publication date: October 6, 2011Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Masatoshi SAKURAI, Ryosuke YAMAMOTO, Naoko KIHARA, Akiko YUZAWA, Yoshiyuki KAMATA
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Patent number: 7931819Abstract: There is provided a method for pattern formation, including a step of coating a composition comprising a block copolymer, a silicon compound, and a solvent for dissolving these components onto an object to form a layer of the composition on the object, a step of subjecting the layer of the composition to self-organization of the block copolymer to cause phase separation into a first phase, in which the silicon compound is localized, having higher etching resistance by heat treatment or/and oxygen plasma treatment, and a second phase comprising a polymer phase and having lower etching resistance by heat treatment or/and oxygen plasma treatment, and thereby forming a pattern layer with a fine pattern, and a step of etching the object using as a mask the thus formed pattern layer.Type: GrantFiled: March 23, 2007Date of Patent: April 26, 2011Assignee: Kabushiki Kaisha ToshibaInventors: Naoko Kihara, Hiroyuki Hieda
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Patent number: 7740961Abstract: A magnetic recording media has recording cells formed of two-dimensionally arrayed magnetic material, a nonmagnetic layer surrounding the recording cells, an adhesive film formed on each of the recording cells, and a lubricant directly adhered to the adhesive film.Type: GrantFiled: May 16, 2006Date of Patent: June 22, 2010Assignee: Kabushiki Kaisha ToshibaInventors: Hiroyuki Hieda, Naoko Kihara, Yoshitaka Yanagita
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Patent number: 7635529Abstract: According to one embodiment, a substrate for a magnetic recording media has circumferential protrusions corresponding to recording tracks and circumferential recesses corresponding to grooves between the recording tracks, in which the substrate satisfying at least one of conditions of (a) a surface of the recess has a surface energy smaller than that of the protrusion, (b) the surface of the recess is modified with a thermally decomposable or deformable substance, (c) the surface of the recess has surface roughness smaller than that of the protrusion, (d) crystal orientation is more disturbed on the surface of the recess than on the protrusion, (e) the surface of the recess is modified with a substance that causes reaction with a magnetic material or that diffuses into the magnetic material, and (f) the surface of the recess is modified with a substance soluble in a solvent or with a deformable substance.Type: GrantFiled: June 28, 2006Date of Patent: December 22, 2009Assignees: Showa Denko K.K., Kabushiki Kaisha ToshibaInventors: Katsuyuki Naito, Masatoshi Sakurai, Akira Kikitsu, Yoshiyuki Kamata, Naoko Kihara, Masahiro Oka
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Patent number: 7618675Abstract: The present invention provides a pattern forming method using phase separation structure of self-assembling block copolymer and minimizing variations in pattern. A substrate having groove structure pre-formed thereon, is coated with a solution of the block copolymer comprising at least one block having a mesogen group. The block copolymer is caused to self-assemble in the groove to form block copolymer assemblies, which are regularly arrayed. The invention also relates to a processing method of processing a substrate by the use of the pattern obtained by the pattern forming method as a template.Type: GrantFiled: October 13, 2005Date of Patent: November 17, 2009Assignee: Kabushiki Kaisha ToshibaInventors: Hiroyuki Hieda, Naoko Kihara, Katsuyuki Naito
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Publication number: 20090078673Abstract: A pattern forming method is provided, which includes forming, above a substrate, a layer of a diblock copolymer composition containing at least PS and PEO, subjecting the layer to phase separation to obtain a phase-separated layer, thereby forming an easy-to-etch region constituted by PS and having a cylindrical or lamellar configuration extending in a first direction, forming an imprinting resist layer on the phase-separated layer, subjecting the imprinting resist layer to imprinting to form, on the imprinting resist layer, an uneven pattern consisting of projections and recesses extending in a second direction intersecting with the first direction, selectively removing, from the imprinting resist layer, the recesses, thereby leaving only the projections and, at the same time, selectively removing the PS from the phase-separated layer to obtain an etching resistive pattern containing PEO, and etching the substrate using, as a mask, not only the projections but also the etching resistive pattern.Type: ApplicationFiled: August 19, 2008Publication date: March 26, 2009Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Naoko Kihara, Hiroyuki Hieda, Yoshiyuki Kamata
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Patent number: 7343857Abstract: An imprint apparatus configured such that it can press a laminate structure in which a magnetic film and a resist film are sequentially laminated on a substrate. The imprint apparatus includes a first press plate configured to mount the laminate structure, a second press plate adapted for sandwiching the laminate structure, a stamper placed on a surface of the second press plate, and has projections and recesses configured to be transferred onto the resist film, and a light source configured to dispose on the same plane as the laminate structure, and is oriented so that the light source can shine the resist film.Type: GrantFiled: September 30, 2004Date of Patent: March 18, 2008Assignee: Kabushiki Kaisha ToshibaInventors: Masatoshi Sakuarai, Akira Kikitsu, Naoko Kihara
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Publication number: 20080041818Abstract: There is provided a method for pattern formation, including a step of coating a composition comprising a block copolymer, a silicon compound, and a solvent for dissolving these components onto an object to form a layer of the composition on the object, a step of subjecting the layer of the composition to self-organization of the block copolymer to cause phase separation into a first phase, in which the silicon compound is localized, having higher etching resistance by heat treatment or/and oxygen plasma treatment, and a second phase comprising a polymer phase and having lower etching resistance by heat treatment or/and oxygen plasma treatment, and thereby forming a pattern layer with a fine pattern, and a step of etching the object using as a mask the thus formed pattern layer.Type: ApplicationFiled: March 23, 2007Publication date: February 21, 2008Applicant: Kabushiki Kaisha ToshibaInventors: Naoko Kihara, Hiroyuki Hieda
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Patent number: 7270916Abstract: Disclosed is a recording medium comprising a recording layer including a photo-acid generating agent that generates an acid upon irradiation with an actinic radiation and a polymer having a polymerizable substituent group bonded to a main chain of the polymer via a functional group that cleaves in the presence of the acid.Type: GrantFiled: June 17, 2004Date of Patent: September 18, 2007Assignee: Kabushiki Kaisha ToshibaInventors: Naoko Kihara, Urara Ichihara, legal representative, Akiko Hirao, Kazuki Matsumoto, Hideyuki Nishizawa, Katsutaro Ichihara, deceased
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Publication number: 20070172584Abstract: A method of manufacturing a patterned magnetic recording medium includes coating a magnetic film with a resist which is decomposed by exposure to electromagnetic radiation or an electron beam to have a low molecular weight, forming a pattern on the resist by an imprinting method, transferring the pattern to the magnetic film by using the resist having the pattern formed thereon as a mask, and removing the resist by exposing the resist to the electromagnetic radiation or the electron beam.Type: ApplicationFiled: January 25, 2007Publication date: July 26, 2007Applicant: Kabushiki Kaisha ToshibaInventors: Naoko Kihara, Satoshi Shirotori, Yoshiyuki Kamata, Masatoshi Sakurai
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Publication number: 20070065588Abstract: A method of forming patterns includes coating a toroidal substrate having a center hole with an imprint material containing a precursor of a metal oxide film, selected from the group consisting of a metal alkoxide and a metal oxide, and an ether type nonionic surfactant containing fluorine or silicon, imprinting a stamper on the imprint material to transfer patterns of protrusions and recesses of the stamper to the imprint material, and removing organic components from the imprint material through plasma processing or heat treatment to form a metal oxide film having patterns of protrusions and recesses.Type: ApplicationFiled: September 13, 2006Publication date: March 22, 2007Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Naoko Kihara, Yoshiyuki Kamata, Satoshi Shirotori, Katsuyuki Naito
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Publication number: 20070003798Abstract: According to one embodiment, a substrate for a magnetic recording media has circumferential protrusions corresponding to recording tracks and circumferential recesses corresponding to grooves between the recording tracks, in which the substrate satisfying at least one of conditions of (a) a surface of the recess has a surface energy smaller than that of the protrusion, (b) the surface of the recess is modified with a thermally decomposable or deformable substance, (c) the surface of the recess has surface roughness smaller than that of the protrusion, (d) crystal orientation is more disturbed on the surface of the recess than on the protrusion, (e) the surface of the recess is modified with a substance that causes reaction with a magnetic material or that diffuses into the magnetic material, and (f) the surface of the recess is modified with a substance soluble in a solvent or with a deformable substance.Type: ApplicationFiled: June 28, 2006Publication date: January 4, 2007Applicants: KABUSHIKI KAISHA TOSHIBA, SHOWA DENKO K.K.Inventors: Katsuyuki Naito, Masatoshi Sakurai, Akira Kikitsu, Yoshiyuki Kamata, Naoko Kihara, Masahiro Oka
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Publication number: 20060257694Abstract: A magnetic recording media has recording cells formed of two-dimensionally arrayed magnetic material, a nonmagnetic layer surrounding the recording cells, an adhesive film formed on each of the recording cells, and a lubricant directly adhered to the adhesive film.Type: ApplicationFiled: May 16, 2006Publication date: November 16, 2006Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Hiroyuki Hieda, Naoko Kihara, Yoshitaka Yanagita
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Patent number: 7081328Abstract: An optical disk from which recorded data are read out by means of light irradiation has a substrate having recording pits as data on a surface thereof, and stacked films formed on the substrate. The stacked films contain a super-resolution film of a polymer matrix and semiconductor particles having an organic group covalently bonded thereto, and a reflective film reflecting light. The super-resolution film and the reflective film are provided in this order from a light incident side.Type: GrantFiled: March 29, 2001Date of Patent: July 25, 2006Assignee: Kabushiki Kaisha ToshibaInventors: Kenji Todori, Toshihiko Nagase, Katsutaro Ichihara, Naoko Kihara
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Publication number: 20060078681Abstract: The present invention provides a pattern forming method using phase separation structure of self-assembling block copolymer and minimizing variations in pattern. A substrate having groove structure pre-formed thereon, is coated with a solution of the block copolymer comprising at least one block having a mesogen group. The block copolymer is caused to self-assemble in the groove to form block copolymer assemblies, which are regularly arrayed. The invention also relates to a processing method of processing a substrate by the use of the pattern obtained by the pattern forming method as a template.Type: ApplicationFiled: October 13, 2005Publication date: April 13, 2006Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Hiroyuki Hieda, Naoko Kihara, Katsuyuki Naito
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Publication number: 20050284320Abstract: An imprint apparatus configured such that it can press a laminate structure in which a magnetic film and a resist film are sequentially laminated on a substrate. The imprint apparatus includes a first press plate configured to mount the laminate structure, a second press plate adapted for sandwiching the laminate structure, a stamper placed on a surface of the second press plate, and has projections and recesses configured to be transferred onto the resist film, and a light source configured to dispose on the same plane as the laminate structure, and is oriented so that the light source can shine the resist film.Type: ApplicationFiled: September 30, 2004Publication date: December 29, 2005Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Masatoshi Sakuarai, Akira Kikitsu, Naoko Kihara
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Patent number: 6879099Abstract: Provided is an organic EL display including a substrate, anodes arranged on one major surface of the substrate, an insulating separator layer covering the major surface of the substrate and having through-holes in the positions of the anodes, organic emitting layers disposed on the anodes, buffer layers disposed between the anodes and the organic emitting layers, and a cathode covering the organic emitting layers, wherein a central portion of each of the buffer layers is thicker than its periphery.Type: GrantFiled: April 7, 2004Date of Patent: April 12, 2005Assignee: Kabushiki Kaisha ToshibaInventors: Naoko Kihara, Yasushi Mori, Katsuyuki Naito
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Publication number: 20050026079Abstract: Disclosed is a recording medium comprising a recording layer including a photo-acid generating agent that generates an acid upon irradiation with an actinic radiation and a polymer having a polymerizable substituent group bonded to a main chain of the polymer via a functional group that cleaves in the presence of the acid.Type: ApplicationFiled: June 17, 2004Publication date: February 3, 2005Inventors: Naoko Kihara, Katsutaro Ichihara, Akiko Hirao, Kazuki Matsumoto, Hideyuki Nishizawa, Urara Ichihara