Abstract: A method of screen printing on 3D glass articles includes providing a 3D glass article having a first 3D surface with a first surface profile and a second 3D surface with a second surface profile, the first 3D surface and the second 3D surface being separated by a thickness of glass. The method includes providing a fixture having a 3D fixture surface with a fixture surface profile matching the second surface profile. The method includes providing a screen having a design, a squeegee, and an ink. The 3D glass article is supported on the fixture by mating the second 3D surface with the 3D fixture surface. The screen is positioned at a plane a distance above the first 3D surface. The ink is deposited on the screen. The squeegee is positioned at a selected orientation relative to the plane.

Abstract: A low expansion glass substrate includes titania and silica and has a thermal expansivity with an average gradient less than 1 ppb/° C./° C. in a temperature range of 19° C. to 25° C.

Abstract: A glass sheet having enhanced edge strength. The glass sheet is down-drawn and has at least one laser-formed edge having a minimum edge strength of at least about 90 MPa. The laser-formed edge is substantially free of a chamfer or a bevel. The glass sheet can be strengthened after formation of the edge and is adaptable for use as a cover plate for display and touch screen applications, or as a display or touch screen for information-related terminal (IT) devices; as well as in other applications.

Abstract: A glass article having an anti-glare surface. The anti-glare surface has a distinctness-of-reflected image of less than 95, and a haze of less than or equal to 50%. In one embodiment, the glass article further includes a smudge-resistant surface disposed on the anti-glare surface. Methods of making the glass article and anti-glare surface are also described.

Abstract: The invention is directed to a method for reducing striae in ultra-low expansion glass, for example, silica-titania glass, by heat-treating the glass at temperatures above 1600° C. for a time in the range of 72-288 hours. The silica-titania glass is formed by substantially simultaneously forming, collecting and consolidating a silica-titania soot formed in one or a plurality of burners using silicon-containing feedstock and a titanium-containing feedstock. In one embodiment of the invention the glass is heat treated without forcing the glass to flow or “move”. The invention was found to reduce the magnitude of striae in an ultra-low expansion glass by at least 50%, and particularly reduces most of the “higher frequency” striae.

Abstract: The invention is directed to a method for finishing alkaline earth metal fluoride optical components and to the alkaline earth optical elements produced using the method. In particular, in the last polishing step, the method of the invention uses a colloidal silica polishing slurry having containing silica particles having a particle size of <500 nm. Additionally, after colloidal silica polishing, the method using a megasonic cleaning step with a high pH detergent cleaning solution to remove any silica residue on the polished optical component. The optic resulting from use of the method has a polished and unetched surface roughness of less than 0.5 nm; a surface roughness of less then 0.6 nm after polishing and etching; and a step height of less than 6 nm.

Abstract: The invention relates to glass articles suitable for use as electronic device housing/enclosure or protective cover which comprise a glass material. Particularly, a housing/enclosure/cover comprising an ion-exchanged glass exhibiting the following attributes (1) radio, and microwave frequency transparency, as defined by a loss tangent of less than 0.03 and at a frequency range of between 15 MHz to 3.0 GHz; (2) infrared transparency; (3) a fracture toughness of greater than 0.6 MPa·m1/2; (4) a 4-point bend strength of greater than 350 MPa; (5) a Vickers hardness of at least 450 kgf/mm2 and a Vickers median/radial crack initiation threshold of at least 5 kgf, (6) a Young's Modulus ranging between about 50 to 100 GPa; (7) a thermal conductivity of less than 2.0 W/m° C., and (9) and at least one of the following attributes: (i) a compressive surface layer having a depth of layer (DOL) greater and a compressive stress greater than 400 MPa, or, (ii) a central tension of more than 20 MPa.

Abstract: A glass article having at least one edge of which at least a portion has been laser melted. The laser melted portion scatters light, thus enabling the glass article to be properly aligned. In some embodiments, the laser melted portion also provides a roughened edge having a coefficient of friction that facilitates handling of the glass article. The laser melted portion is formed by irradiating the peripheral surface with a laser beam to cause localized melting.

Abstract: The invention is directed to a method of protecting a glass surface during transportation and/or process using an aqueous solution of an acrylic material to protectively coat the surface of the glass sheet. The acrylic protective coating may be applied by dipping, roller applying or spraying the coating on the glass. The coating is then cured, dried or baked in an oven. Subsequently, the glass sheet may be scored and separated into individual glass article blanks for further processing; for example, edge grinding to produce smooth edges and drilling/milling to produce openings such as holes in the surface of the glass. When processing of the glass article is completed, the protective coating can be removed or the article can be shipped to the end used who can remove the coating using an aqueous solution of pH?12 to remove the coating.

Abstract: The invention is directed to a high strength, chemically toughened protective glass article, the glass article having a high damage tolerance threshold of at least 1500 g as measured by the lack of radial cracks when the load is applied to the glass using a Vickers indenter; preferably greater than 2000 g s measured by the lack of initiation of radial cracks when the load is applied to the glass using a Vickers indenter

Abstract: An alkali aluminosilicate glass article, said alkali aluminosilicate glass having a surface compressive stress of at least about 200 MPa, a surface compressive layer having a depth of at least about 30 ?m, a thickness of at least about 0.3 mm and an amphiphobic fluorine-based surface layer chemically bonded to the surface of the glass. In one embodiment the glass has an anti-reflective coating applied to one surface of the glass between the chemically strengthened surface of the glass and the amphiphobic coating. In another embodiment the surface of the chemically strengthened glass is acid treated using a selected acid (e.g., HCL, H2SO4, HClO4, acetic acid and other acids as described) prior to placement of the amphiphobic coating or the anti-reflective coating.

Abstract: A low expansion glass substrate includes titania and silica and has a thermal expansivity with an average gradient less than 1 ppb/° C./° C. in a temperature range of 19° C. to 25° C.

Abstract: The invention is directed to a method for cleaning surfaces of optical elements made from metal fluoride single crystals of formula MF2, where M is calcium, barium, magnesium, or strontium, or mixtures of the foregoing, prior to coating the elements with films of protective materials; and to a DUV optic made using the foregoing method. The method has at least the steps of: (a) immersing the optical element in at least one selected liquid and utilizing sonication at megasonic frequencies to remove particulates, polishing slurry residue and the damaged top layer of the optical element; (b) cleaning in a gas phase cleaning process whereby hydrocarbons are removed from the surface of the optical element using UV/ozone cleaning; and (c) exposing, in a gas phase process, of the optical element's surface to a low-energy plasma containing argon and oxygen, xenon and oxygen, or fluorine in a vacuum environment.

Abstract: A glass article having an edge of which at least a portion that is ground and subsequently etched to provide a roughened edge. The roughened edge scatters light, thus enabling the glass article to be properly aligned. In some embodiments, the roughened edge also provides a surface having a coefficient of friction that facilitates handling of the glass article. The edge may further include at least one chamfer that may either be polished, so as to be transparent or ground and subsequently etched.

Abstract: A glass article having at least one edge of which at least a portion has been laser melted. The laser melted portion scatters light, thus enabling the glass article to be properly aligned. In some embodiments, the laser melted portion also provides a roughened edge having a coefficient of friction that facilitates handling of the glass article. The laser melted portion is formed by irradiating the peripheral surface with a laser beam to cause localized melting.

Abstract: The invention is directed to polished glass substrates suitable for extreme ultraviolet lithography. The elements are silica-titania glass elements having a coefficient of thermal expansion of 0±30×10?9/° C. or less, and containing 5-10 wt. % titania. The polished elements have a mid-spatial frequency peak-to-valley roughness of <10 nm and a high-spatial frequency roughness of <0.20 nm average roughness. The invention is further directed to a method of for producing optical elements suitable for extreme ultraviolet lithography (“EUVL”), the method having at least the steps of providing a glass substrate in the shape of the desired optical element and polishing the shaped substrate using a high abrasive slurry flow rate of >2.0 ml/cm2/min. Generally the flow rates are in the range of 2.0-10 ml/cm2/min. Glass substrates suitable for extreme ultraviolet lithography element have a coefficient of thermal expansion of 0±30×10?9/° C. or less.

Abstract: The invention is directed to large LCD image masks having a final flatness of less than 40 nm and a method of making such LCD image masks by utilizing subaperture deterministic grinding/lapping/polishing. In one preferred embodiment the final flatness is <20 ?m. In another the final flatness is <10 nm. The LCD image masks have a length and width that are each, independently of the other, greater than 400 mm and a thickness that is less than 20 mm. In at least one preferred embodiment the ICD image masks have a length and width that are each, independently, greater than 100 mm and the thickness is <15 mm. The glass LCD image masks can be of any glass materials suitable for LCD image masks. The method of the invention can be used with all such glasses. Exemplary LCD image mask glasses include fused silica, high purity fused silica and silica-titania containing 5-10 wt. % titania.

Abstract: Disclosed are photo or electron beam polymerizable compositions, and preparation thereof and devices containing them. The composition contains completely or substantially completely hydrogenated hydrocarbon-based material completely free or substantially free of carbon-carbon double and triple bonds containing photo or electron beam curable terminal or pendant groups, low-outgassing photoinitiators, an optional viscosity adjustment component and an optional filler. The composition is visible light, UV or electron beam curable. It cures into a low-modulus, low outgassing polymer material. The composition can be used as an adhesive, sealant or lens potting material. It is ideal for use in lithographic tools involving deep or vacuum ultraviolet radiations, in particular, as lens potting materials for 157 nm lithographic tools.

Abstract: Disclosed are photo or electron beam polymerizable compositions, and preparation thereof and devices containing them. The composition contains completely or substantially completely hydrogenated hydrocarbon-based material completely free or substantially free of carbon-carbon double and triple bonds containing photo or electron beam curable terminal or pendant groups, low-outgassing photoinitiators, an optional viscosity adjustment component and an optional filler. The composition is visible light, UV or electron beam curable. It cures into a low-modulus, low outgassing polymer material. The composition can be used as an adhesive, sealant or lens potting material. It is ideal for use in lithographic tools involving deep or vacuum ultraviolet radiations, in particular, as lens potting materials for 157 nm lithographic tools.

Abstract: The invention is directed to a method for reducing striae in ultra-low expansion glass by heat-treating the glass at temperatures above 1600° C. for a time in the range of 72-288 hours. In one embodiment of the invention the glass is heat treated without forcing the glass to flow or “move”. The invention was found to reduce the magnitude of striae in an ultra-low expansion glass by 500%, and particularly reduces most of the “higher frequency” striae.