Abstract: Disclosed are photo or electron beam curable polymerizable compositions, and preparation thereof and devices containing such cured material. The composition contains completely or substantially completely hydrogenated hydrocarbon-based material completely free or substantially free of carbon-carbon double and triple bonds containing photo or electron beam curable terminal or pendant groups, low-outgassing photoinitiators, an optional viscosity adjustment component and an optional filler. The composition is visible light, UV or electron beam curable. It cures into a low-modulus, low outgassing polymer material. The composition can be used as an adhesive, sealant or lens potting material. It is ideal for use in lithographic tools and other optical devices involving deep or vacuum ultraviolet radiations, in particular, as lens potting materials for 248 nm, 193 nm and 157 nm lithographic tools, as well as other optical devices involving using high fluence irradiation.

Abstract: A passively aligned optical isolator includes laminated layers of material including two polarizing glass layers sandwiching a Faraday rotator layer. Each polarizing glass layer comprises a glass matrix containing elongated metal particles exhibiting a change in polarization axis of less than about 0.0375°/m over a distance of at least 8 mm, as measured across a major surface of the layer. The optical isolator has a contrast ratio greater than 40 dB.

Abstract: The invention utilizes colloidal silica soot (62) in a semiconductor process for chemical-mechanical planarizing a semiconductor integrated circuit workpiece (24) with a slurry (60). The particulate abrasive agent colloidal solid sphere fused silica soot (62) provides a beneficial CMP slurry/process for semiconductor device manufacturing compared to standard semiconductor CMP slurries with conventional colloidal sol-gel or fumed silica.

Abstract: Polarizing glass articles, optical isolators including polarizing glass articles, and methods of manufacturing polarizing glass articles and optical isolators are disclosed. The methods manufacture can be used to manufacture isolators exhibiting improved contrast ratio.

Abstract: A collimator array, a fiber array and a method for fabricating the fiber array are described herein. In one embodiment, that fiber array includes a plurality of optical fibers and a glass plate with a plurality of holes in each of which there is secured one of the optical fibers, wherein the holes were formed by etching away a plurality of opal regions within an exposed and heated photosensitive glass which after the etching became the glass plate. In another embodiment, the fiber array includes a plurality of optical fibers and a glass plate with a plurality of holes in each of which there is secured one of the optical fibers, wherein the holes were formed by etching away a plurality of opal regions within an exposed and heated photosensitive glass which after the etching became the glass plate that included a plurality of oversized holes which were filled with a moldable material that was then drilled to form the holes.

Abstract: Polarizing glass articles, optical isolators including polarizing glass articles, and methods of manufacturing polarizing glass articles and optical isolators are disclosed. The methods manufacture can be used to manufacture isolators exhibiting improved contrast ratio.

Abstract: Optical isolators and methods of manufacturing optical isolators are disclosed. The optical isolators are manufactured by directly bonding the parts of the isolators without the use of adhesive or mechanical devices to hold the individual parts together.

Abstract: Methods of bonding glass and silicon-containing articles are disclosed. Bonding is achieved without use of adhesives or high temperature fusion. A wide variety of glass and silicon-containing articles may be bonded by the methods of the invention.

Abstract: Disclosed are photo or electron beam curable polymerizable compositions, and preparation thereof and devices containing such cured material. The composition contains completely or substantially completely hydrogenated hydrocarbon-based material completely free or substantially free of carbon-carbon double and triple bonds containing photo or electron beam curable terminal or pendant groups, low-outgassing photoinitiators, an optional viscosity adjustment component and an optional filler. The composition is visible light, UV or electron beam curable. It cures into a low-modulus, low outgassing polymer material. The composition can be used as an adhesive, sealant or lens potting material. It is ideal for use in lithographic tools and other optical devices involving deep or vacuum ultraviolet radiations, in particular, as lens potting materials for 248 nm, 193 nm and 157 nm lithographic tools, as well as other optical devices involving using high fluence irradiation.

Abstract: A lens array and a method for fabricating a lens array that is relatively flat and has useful lenses with relatively uniform sag heights are described herein. In one embodiment, the lens array includes a one-dimensional array of useful lens and two sacrificial lens each of which is formed next to an end of a row of the useful lenses. In another embodiment, the lens array includes a two-dimensional array of useful lens and a plurality of perimeter sacrificial lens each of which is formed next to an end of a row or a column of the useful lenses. In yet another embodiment, the lens array includes an array of useful lenses and a glass region (including possibly a glass matrix) located within a opal border and outside a opal region that surrounds the useful lenses.

Abstract: Disclosed are optical resonators having low OH content in at least the near-surface region and a process for making low OH glass article by chlorine treatment of consolidated glass of the article. Cl2 gas was used to remove OH from depth as deep as 350 ?m from the surface of the consolidated glass. The process can be used for treating flame-polished preformed optical resonator disks. A new process involving hot pressing or thermal reflowing for making planar optical resonator disks without the use of flame polishing is also disclosed.

Abstract: Methods of bonding optical components are disclosed. Bonding is achieved without use of adhesives or high temperature fusion. The invention is useful for bonding optical fibers together and for bonding optical fiber arrays to lens arrays.

Abstract: Methods of forming bulk optical elements, such as prisms, incorporating gratings are disclosed. Grating structures are formed by etching a uniform-thickness or generally planar substrate. Direct bonding, particularly chemical bonding, is then employed to bond the etched planar substrate to a bulk optical material without the use of adhesives or high temperature fusion.

Abstract: Methods of bonding glass and silicon-containing articles are disclosed. Bonding is achieved without use of adhesives or high temperature fusion. A wide variety of glass and silicon-containing articles may be bonded by the methods of the invention.

Abstract: Optical isolators and methods of manufacturing optical isolators are disclosed. The optical isolators are manufactured by directly bonding the parts of the isolators without the use of adhesive or mechanical devices to hold the individual parts together.

Abstract: Polarizing glass articles, optical isolators including polarizing glass articles, and methods of manufacturing polarizing glass articles and optical isolators are disclosed. The methods manufacture can be used to manufacture isolators exhibiting improved contrast ratio.

Abstract: A method is provide for using abrasive colloidal particles having multi-component composition comprising mixed 1) metal or metalloid oxides, 2) oxyfluorides, or 3) oxynitrides, each grouping (1, 2, or 3) individually alone or in combination thereof, in a chemical-mechanical manufacturing process for planarizing or polishing metal, semiconductor, dielectric, glass, polymer, optical, and ceramic materials. The particles exhibit a modified surface chemistry performance and have an isoelectric point (pHIEP) greater than the pH of the dispersed particles in solution, and with a stabilized particle dispersion at pH values of interest for CMP operations. The composition of the multi-component particles may be adjusted as desired, in regard to their chemical or physical properties such as surface chemistry, hardness, solubility, or degree of compatibility with the workpiece material being planarized or polished.

Abstract: Disclosed are photo or electron beam polymerizable compositions, and preparation thereof and devices containing them. The composition contains completely or substantially completely hydrogenated hydrocarbon-based material completely free or substantially free of carbon-carbon double and triple bonds containing photo or electron beam curable terminal or pendant groups, low-outgassing photoinitiators, an optional viscosity adjustment component and an optional filler. The composition is visible light, UV or electron beam curable. It cures into a low-modulus, low outgassing polymer material. The composition can be used as an adhesive, sealant or lens potting material. It is ideal for use in lithographic tools involving deep or vacuum ultraviolet radiations, in particular, as lens potting materials for 157 nm lithographic tools.

Abstract: Methods and apparatus for manufacturing titania-containing fused silica bodies and optical elements are described. The titania-containing fused silica bodies can be subsequently processed to make extreme ultraviolet optical elements. The methods and apparatus involve providing a sol including a titania-containing silica powder, forming the sol into a shaped gel and drying and heating the gel to a glass body.

Abstract: The method of making optical fluoride crystal components provide optical components with beneficial final polished transmission surfaces for transmitting below 200 nm wavelengths of light, such as produced by excimer lasers and utilized in optical lithography. The invention utilizes colloidal silica soot in the polishing of optical fluoride crystal surfaces. This colloidal silica soot is a byproduct of chemical vapor deposition processing of fused silica or ultra low expansion glasses. The colloidal silica byproduct is referred to as “soot”. Retaining the same physical properties as the parent glass and having a spherical morphology, the colloidal silica soot is an ideal for final polishing applications of optical fluoride crystals, and particularly for optical fluoride crystals such as calcium fluoride which have high transmission levels to below 300 nm light such as produced by excimer lasers.