Abstract: A fiber array includes a substrate made of a soft drillable material and a plurality of holes drilled through the substrate for holding a plurality of glass fibers.

Abstract: Methods of forming glass articles sensitive to aggressive heat treatment are disclosed. Glass preforms have sections of glass fusion bonded to the preforms, and the preforms are subsequently drawn into glass articles.

Abstract: Optical isolators and methods of manufacturing optical isolators are disclosed. The optical isolators are manufactured by directly bonding the parts of the isolators without the use of adhesive or mechanical devices to hold the individual parts together.

Abstract: Optical isolators and methods of manufacturing optical isolators are disclosed. The optical isolators are manufactured by directly bonding the parts of the isolators without the use of adhesive or mechanical devices to hold the individual parts together.

Abstract: Methods of improving the direct bonding of articles are disclosed. Lithium can be incorporated into the composition of one of the articles and/or lithium can be added to a bonding surface by ion exhchange, absorption, ion implantation, coating, or deposition. Bonding is achieved without use of adhesives or high temperature fusion. The invention is useful for bonding a wide variety of articles together such as optical components, optical fibers and articles having different coefficients of thermal expansion or refractive indices.

Abstract: A lens array and a method for fabricating a lens array that is relatively flat and has useful lenses with relatively uniform sag heights are described herein. In one embodiment, the lens array includes a one-dimensional array of useful lens and two sacrificial lens each of which is formed next to an end of a row of the useful lenses to help maintain relatively uniform sag heights across the useful lenses. In another embodiment, the lens array includes a two-dimensional array of useful lens and a plurality of perimeter lens each of which is formed next to an end of a row or a column of the useful lenses to help maintain relatively uniform sag heights across the useful lenses. In yet another embodiment, the lens array includes an array of useful lenses and a glass region (including possibly a glass matrix) located within a opal border and outside a opal region that surrounds the useful lenses to help minimize warpage of the lens array.

Abstract: A collimator array, a fiber array and a method for fabricating the fiber array are described herein. In one embodiment, that fiber array includes a plurality of optical fibers and a glass plate with a plurality of holes in each of which there is secured one of the optical fibers, wherein the holes were formed by etching away a plurality of opal regions within an exposed and heated photosensitive glass which after the etching became the glass plate. In another embodiment, the fiber array includes a plurality of optical fibers and a glass plate with a plurality of holes in each of which there is secured one of the optical fibers, wherein the holes were formed by etching away a plurality of opal regions within an exposed and heated photosensitive glass which after the etching became the glass plate that included a plurality of oversized holes which were filled with a moldable material that was then drilled to form the holes.

Abstract: A two-part reagent method for polishing an inorganic silicate substrate is provided. The method comprises: providing a silicate substrate; providing a reagent comprising: a first part consisting essentially of an aqueous solution of at least one metal oxide abrasive selected from the group consisting of titania, zirconia, germania, and germania-doped silica; and a second part consisting essentially of an alkali aqueous solution of colloidal silica having a buffered pH value of at least about 10; polishing a surface of said substrate with the metal oxide abrasive aqueous solution to a surface roughness (Ra) ranging from about 6 Å to about 10 Å; and further polishing the surface with said alkali aqueous solution of colloidal silica to a roughness of less than or equal to about 5 Å.

Abstract: Methods of bonding glass articles that are subsequently drawn into sheets, rods, fibers, etc. are disclosed. Bonding is achieved without use of adhesives or high temperature fusion. The invention is particularly useful for bonding optical fiber preforms prior to drawing of the optical fiber.

Abstract: The method of making optical fluoride crystal components provide optical components with beneficial final polished transmission surfaces for transmitting below 200 nm wavelengths of light, such as produced by excimer lasers and utilized in optical lithography. The invention utilizes colloidal silica soot in the polishing of optical fluoride crystal surfaces. This colloidal silica soot is a byproduct of chemical vapor deposition processing of fused silica or ultra low expansion glasses. The colloidal silica byproduct is referred to as “soot”. Retaining the same physical properties as the parent glass and having a spherical morphology, the colloidal silica soot is an ideal for final polishing applications of optical fluoride crystals, and particularly for optical fluoride crystals such as calcium fluoride which have high transmission levels to below 300 nm light such as produced by excimer lasers.

Abstract: The invention relates to optical fluoride crystals, and particularly to optical fluoride crystals such as calcium fluoride, which have high transmission levels to below 200 nm light, such as produced by excimer lasers. In particular the invention relates to making optical fluoride crystals with improved transmission surfaces. The invention relates to the elimination of mid-spatial frequency roughness 1-1000 &mgr;m spatial wavelengths and high-spatial frequency<1 &mgr;m spatial wavelengths from optical fluoride crystal surfaces. The removal of the mid-spatial frequency 1-1000 &mgr;m spatial wavelengths and high-spatial frequency<1 &mgr;m spatial wavelengths from the optical fluoride crystal surfaces provides improved transmission at below 200 nm optical lithography wavelengths such as 193 nm and 157 nm.

Abstract: The present invention relates to reflective masks and their use for reflecting extreme ultraviolet soft x-ray photons to enable the use of extreme ultraviolet soft x-ray radiation projection lithographic methods and systems for producing integrated circuits and forming patterns with extremely small feature dimensions. The projection lithographic method includes providing an illumination sub-system for producing and directing an extreme ultraviolet soft x-ray radiation &lgr; from an extreme ultraviolet soft x-ray source; providing a mask sub-system illuminated by the extreme ultraviolet soft x-ray radiation &lgr; produced by the illumination sub-system and providing the mask sub-system includes providing a patterned reflective mask for forming a projected mask pattern when illuminated by radiation &lgr;.

Abstract: Methods of bonding glass and silicon-containing articles are disclosed. Bonding is achieved without use of adhesives or high temperature fusion. A wide variety of glass and silicon-containing articles may be bonded by the methods of the invention.

Abstract: Methods of bonding glass articles that are subsequently drawn into sheets, rods, fibers, etc. are disclosed. Bonding is achieved without use of adhesives or high temperature fusion. The invention is particularly useful for bonding optical fiber preforms prior to drawing of the optical fiber.

Abstract: Methods of bonding optical components are disclosed. Bonding is achieved without use of adhesives or high temperature fusion. The invention is useful for bonding optical fibers together and for bonding optical fiber arrays to lens arrays.

Abstract: Methods of bonding glass and silicon-containing articles are disclosed. Bonding is achieved without use of adhesives or high temperature fusion. A wide variety of glass and silicon-containing articles may be bonded by the methods of the invention.

Abstract: Methods of bonding optical components are disclosed. Bonding is achieved without use of adhesives or high temperature fusion. The invention is useful for bonding optical fibers together and for bonding optical fiber arrays to lens arrays.

Abstract: The invention relates to optical fluoride crystals, and particularly to optical fluoride crystals such as calcium fluoride, which have high transmission levels to below 200 nm light, such as produced by excimer lasers. In particular the invention relates to making optical fluoride crystals with improved transmission surfaces. The invention relates to the elimination of mid-spatial frequency roughness 1-1000 &mgr;m spatial wavelengths and high-spatial frequency <1 &mgr;m spatial wavelengths from optical fluoride crystal surfaces. The removal of the mid-spatial frequency 1-1000 &mgr;m spatial wavelengths and high-spatial frequency <1 &mgr;m spatial wavelengths from the optical fluoride crystal surfaces provides improved transmission at below 200 nm optical lithography wavelengths such as 193 nm and 157 nm.

Abstract: The invention includes a method of finishing a polycrystal silicon nitride surface. The method of finishing the polycrystal silicon nitride includes providing a polycrystal silicon nitride composite which includes a plurality of silicon nitride crystal grains and a glassy-phase grain boundary medium. The method further includes providing an abrading finishing mixture with the finishing mixture including an abrasive and an oxidant. The method includes concurrently oxidizing the silicon nitride grains and abrading the silicon nitride composite to provide a finished polycrystal silicon nitride surface.

Abstract: The present invention relates to reflective masks and their use for reflecting extreme ultraviolet soft x-ray photons to enable the use of extreme ultraviolet soft x-ray radiation projection lithographic methods and systems for producing integrated circuits and forming patterns with extremely small feature dimensions. The projection lithographic method includes providing an illumination sub-system for producing and directing an extreme ultraviolet soft. x-ray radiation &lgr; from an extreme ultraviolet soft x-ray source; providing a mask sub-system illuminated by the extreme ultraviolet soft x-ray radiation &lgr; produced by the illumination sub-system and providing the mask sub-system includes providing a patterned reflective mask for forming a projected mask pattern when illuminated by radiation &lgr;.