Abstract: Extreme ultraviolet (EUV) exposure apparatuses and methods, and methods of manufacturing a semiconductor device by using the exposure method, which minimize an error caused by a mirror in an EUV exposure process to improve an overlay error, are provided. The EUV exposure apparatus includes an EUV source configured to generate and output EUV, first illumination optics configured to transfer the EUV to an EUV mask, projection optics configured to project the EUV, reflected from the EUV mask, onto an exposure target, a laser source configured to generate and output a laser beam for heating, and second illumination optics configured to irradiate the laser beam onto at least one mirror included in the projection optics.

Abstract: A cathode oxygen depletion (COD) control method is provided. The method includes determining whether a COD heater operates and calculating power generation and power consumption when the COD heater operates. Additionally, the power consumption is adjusted by comparing the calculated power generation and power consumption.

Abstract: A method for controlling an operation of a fuel cell of a fuel cell vehicle is provided. The method includes detecting a state of charge (SOC) of a high voltage battery and determining whether the detected SOC of the high voltage battery is within or beyond a preset range from a minimum recommended SOC to a maximum recommended SOC. Power generation of the fuel cell is performed or stopped by comparing a required current of the vehicle with a preset current value required to enter a fuel-cell stop mode in which the power generation of the fuel cell is stopped and a preset current value required to release the fuel-cell stop mode.

Abstract: A battery pack includes a base plate forming a bottom surface; a main frame combined to the base plate and extending in a height direction to form a wall structure for supporting both side portions of the plurality of battery modules; and a top plate combined to an upper portion of the main frame to form a ceiling, wherein at least one of the top plate and the base plate is provided in a plate body shape including a bead.

Abstract: Extreme ultraviolet (EUV) exposure apparatuses and methods, and methods of manufacturing a semiconductor device by using the exposure method, which minimize an error caused by a mirror in an EUV exposure process to improve an overlay error, are provided. The EUV exposure apparatus includes an EUV source configured to generate and output EUV, first illumination optics configured to transfer the EUV to an EUV mask, projection optics configured to project the EUV, reflected from the EUV mask, onto an exposure target, a laser source configured to generate and output a laser beam for heating, and second illumination optics configured to irradiate the laser beam onto at least one mirror included in the projection optics.

Abstract: Multiple model functions may be calculated by detecting alignment marks on a semiconductor wafer structure. The model functions may be combined to determine a combined model function by using a weight function that assigns a different weight to each of basis functions of the model functions. Thus, even when asymmetry of alignment marks or overlay marks has high dependency on a horizontal location on a wafer, reliability of exposure process is insured.

Abstract: Extreme ultraviolet (EUV) exposure apparatuses and methods, and methods of manufacturing a semiconductor device by using the exposure method, which minimize an error caused by a mirror in an EUV exposure process to improve an overlay error, are provided. The EUV exposure apparatus includes an EUV source configured to generate and output EUV, first illumination optics configured to transfer the EUV to an EUV mask, projection optics configured to project the EUV, reflected from the EUV mask, onto an exposure target, a laser source configured to generate and output a laser beam for heating, and second illumination optics configured to irradiate the laser beam onto at least one mirror included in the projection optics.

Abstract: A current limiting method of a fuel cell stack is capable of preventing current of the fuel cell stack from rapidly dropping to prevent jerking or shock from occurring while a vehicle travels. The method includes: determining whether performance deterioration of a unit cell of the fuel cell stack has occurred, employing a feed forward control type current limiting logic of the fuel cell stack before an output of the fuel cell vehicle is lowered, decreasing the current of the fuel cell stack to a predetermined level by the feed forward control type current limiting logic, and gradually restoring the current of the fuel cell stack to a maximum current usage value from a point in time when the current of a load is used.

Abstract: A control method for a motor-driven vehicle is provided. The method includes calculating a correction torque of a drive motor through a difference between speeds of wheels or a variance rate of the difference between speeds of the wheels and comparing a calculated correction torque with a current required torque of the drive motor. When the calculated correction torque is greater than the current required torque, the drive motor is operated based on the current required torque. When the calculated correction torque is less than or equal to the current required torque, the drive motor is operated based on the calculated correction torque, or the required torque of the drive motor is corrected to correspond to the calculated correction torque and the drive motor is operated based on a corrected required torque of the drive motor.

Abstract: A system for controlling a state of charge (SOC) of a battery includes a battery SOC control apparatus for controlling a revolution per minute (RPM) of an air blower based on the SOC of the battery and a number of charge/discharge cycles of the battery in a case where a vehicle is in a constant current driving state, and a memory device for storing the SOC of the battery calculated by the battery SOC control apparatus.

Abstract: A battery pack including at least one battery cell; a pack case configured to accommodate the battery cell and having a cooling hole formed therethrough; a flow meter provided at an outer side of the pack case and disposed adjacent to the cooling hole; and an opening and closing unit configured to open or close the cooling hole according to a temperature change inside the pack case.

Abstract: A pressure control system of a fuel cell stack includes: an air supply control unit for controlling a revolutions per minute (RPM) of an air compressor for supplying air to a cathode side of the fuel cell stack based on a required output of the fuel cell stack; a hydrogen supply control unit for controlling a pressure at an anode side of the fuel cell stack with a target pressure based on the required output of the fuel cell stack; and a differential pressure control unit for controlling the air supply control unit or the hydrogen supply control unit to calculate a differential pressure between the anode side and the cathode side of the fuel cell stack, and to modify the target pressure or the RPM of the air compressor based on the calculated differential pressure.

Abstract: An energy storage device includes: a battery rack fixedly installed in a building or a container and having a partitioned space; and a plurality of battery modules installed in the partitioned space of the battery rack, wherein each of the plurality of battery modules is inserted into the battery rack in a sliding manner, wherein a front surface of each of the plurality of battery modules is fixed to the battery rack with a bolt, and wherein a rear surface of each of the plurality of battery modules is fixed to the battery rack with a hook.

Abstract: Extreme ultraviolet (EUV) exposure apparatuses and methods, and methods of manufacturing a semiconductor device by using the exposure method, which minimize an error caused by a mirror in an EUV exposure process to improve an overlay error, are provided. The EUV exposure apparatus includes an EUV source configured to generate and output EUV, first illumination optics configured to transfer the EUV to an EUV mask, projection optics configured to project the EUV, reflected from the EUV mask, onto an exposure target, a laser source configured to generate and output a laser beam for heating, and second illumination optics configured to irradiate the laser beam onto at least one mirror included in the projection optics.

Abstract: Multiple model functions may be calculated by detecting alignment marks on a semiconductor wafer structure. The model functions may be combined to determine a combined model function by using a weight function that assigns a different weight to each of basis functions of the model functions. Thus, even when asymmetry of alignment marks or overlay marks has high dependency on a horizontal location on a wafer, reliability of exposure process is insured.

Abstract: An air supply control method of a fuel cell controls an amount of air supplied to the fuel cell according to an output of power required to be generated by the fuel cell. The method includes steps of: monitoring a charging level of a power storage device that stores power output from the fuel cell; modifying the amount of air supplied to the fuel cell on the basis of the monitored charging level of the power storage device; and controlling an air supply system that supplies air to the fuel cell on the basis of the modified amount of air supplied.

Abstract: An operation control device for a fuel cell vehicle includes: a stack current determination unit monitoring a stack current of the fuel cell stack and determining whether an operation state of a fuel cell stack is in an upper-limit voltage limiting section; a battery state determination unit monitoring a state of charge (SOC) of a high voltage battery and determining whether the SOC of the high voltage battery is in a set reference SOC range; and an air flow rate control unit determining a compensation for an air flow rate of an air supply system according to the SOC of the high voltage battery, and outputting a control signal to an air compressor and an air pressure control valve according to the compensated air flow rate, when the operation state of the fuel cell stack is in the upper-limit voltage limiting section.

Abstract: A control method for a motor-driven vehicle is provided. The method includes calculating a correction torque of a drive motor through a difference between speeds of wheels or a variance rate of the difference between speeds of the wheels and comparing a calculated correction torque with a current required torque of the drive motor. When the calculated correction torque is greater than the current required torque, the drive motor is operated based on the current required torque. When the calculated correction torque is less than or equal to the current required torque, the drive motor is operated based on the calculated correction torque, or the required torque of the drive motor is corrected to correspond to the calculated correction torque and the drive motor is operated based on a corrected required torque of the drive motor.

Abstract: A cathode oxygen depletion (COD) control method is provided. The method includes determining whether a COD heater operates and calculating power generation and power consumption when the COD heater operates. Additionally, the power consumption is adjusted by comparing the calculated power generation and power consumption.

Abstract: The present invention relates to a data processing method and apparatus. The invention provides an electronic device including: a communication module; a first location calculating module; a second location calculating module; and a first processor electrically connected to at least one of the first location calculating module and/or the second location calculating module. The first processor may be configured to: identify property information of at least one application that is driven by the first processor and requests location information; determine a location accuracy level on the basis of the identified property information of the at least one application; and select one of the first location calculating module and/or the second location calculating module in order to calculate the location of the electronic device by using a signal obtained through the communication module, according to the determined location accuracy level.