Patents by Inventor Shinichi Hoshi

Shinichi Hoshi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Semiconductor device, method of fabricating the same, and sputtering apparatus
    Patent number: 5903023
    Abstract: A method of fabricating a semiconductor device comprises the steps of: (a) forming a mask layer over an upper surface of a semiconductor substrate such that the mask layer has an aperture penetrating the mask layer and having an inclined lateral wall so as to make the aperture inverted taper shaped; (b) forming a first dielectric layer at a first area over the upper surface of the semiconductor substrate within the aperture by sputtering at a first sputtering incidence direction; and (c) forming a first electrode layer at a second area over the upper surface of the semiconductor substrate within the aperture by sputtering at a second sputtering incidence direction which is different from the first sputtering incidence direction.
    Type: Grant
    Filed: February 12, 1997
    Date of Patent: May 11, 1999
    Assignee: Oki Electric Industry Co., Ltd.
    Inventor: Shinichi Hoshi