Abstract: A substrate holding rotating mechanism is used to hold and rotate a substrate to be processed. The substrate holding rotating mechanism according to the present invention includes at least three spindles, clamp rollers mounted respectively on the spindles for holding a periphery of a substrate, a rotating device for rotating at least one of the clamp rollers, at least one base member on which at least one of the spindles is installed, and a rotational mechanism adapted to allow the base member to be rotatable.

Abstract: Equipment for washing carpet includes in the same frame a conveyor for transferring the carpet between equipment units, a control unit for controlling the operation of the equipment, and at least one washing unit, at least one drying unit located after the washing unit in the transport direction. The conveyor in the equipment is able to transfer the carpet through the equipment units at the same speed, the equipment is used for washing the carpets, the underside of which is substantially made of air impermeable material, the at least one washing unit includes a wet or dry cleaning unit with at least one brush and elements for transferring the carpet, each drying unit has an air blower blowing compressed air onto the carpet, the air blower being able to blow compressed air with a pressure of 2-15 bars onto the carpet's pile side, the blowing pressure being dependent on the carpet type.

Abstract: An aspect of the present invention provides a system and method for controlling a wafer cleaning system having a wafer carrier and a driving portion. The wafer carrier can move along a path in a first direction and a second direction. The driving portion can controllably move the wafer carrier in the first direction and the second direction. The control system includes a vibration sensor portion and a wafer carrier position controller. The vibration sensor portion can detect vibration of the wafer carrier and can output a vibration signal based on the detected vibration. The wafer carrier position controller can instruct the driving portion to modify motion of the wafer carrier based on the vibration signal to reduce the detected vibration.

Abstract: The present invention provides an apparatus and a method for an ultraviolet cleaning tool. The cleaning tool includes ultraviolet source spaced apart from a surface having contaminant particles. The ultraviolet source can create ozone between the surface and the ultraviolet source which breaks the chemical bonds between particles and the surface. The apparatus includes a gas feed which introduces a gas to aid the chemical bond. Additionally, the gas feed can introduce a gas to remove the particles from the surface.

Abstract: An apparatus for transporting an object from one workstation to another, where the object or workstations may be contaminated with unwanted dirt or dust particles. A movable transfer arm connected to a control unit has an end effector including an array of nano-scale projections, where each projection provides one or more distal contact ends. The density of the contact ends is such as to grip a surface of the object with an intermolecular force sufficient to hold the object for movement in accordance with a control unit program. In accordance with a control unit program, after moving the gripped object to the workstation, the end effector is manipulated to release the gripped object, and before, during or after transport of the object, bring the arm's end effector into contact with a cleaning surface.

Abstract: A magazine device (1) for storing a large number of blow moulds (10) outside a working mode of the blow moulds (10), which blow moulds (10) serve for transforming plastic preforms into plastic containers and which are in each case composed of multiple parts. According to the invention, the magazine device (1) comprises at least one cleaning device (2) for cleaning at least one region of the blow moulds (10).

Abstract: A shoe washing device including a motor for driving a rotor onto which the shoes are directly mounted as by aligning the soles of the shoes parallel to the axis of rotation of the rotor. The shoes are affixed onto the rotor by using a clip, strap, cage, or other attachment means. The shoes are then rotated within the wash compartment into which a wash fluid is introduced in a wash cycle and removed following a wash cycle. An integrated drying component may allow air drying of the shoes during a final spin cycle.

Abstract: In order to produce a cleaning plant for cleaning work pieces which comprises at least one cleaning station in which the workpiece is subjected to a cleaning process in such a manner that the cleaning process can be organized in a flexible manner and easily adapted to changes in the workpiece, it is proposed that the cleaning plant should comprise at least one manipulating device which picks up a workpiece prior to treatment in a treatment area of the cleaning station, supplies the workpiece to the treatment process within the treatment area of the cleaning station and passes on the workpiece after the treatment in the treatment area of the cleaning station.

Abstract: A liquid processing apparatus includes a substrate holding member configured to rotate along with a substrate held thereon in a horizontal state; a rotary cup configured to surround the substrate held on the substrate holding member, to rotate along with the substrate, and to receive the process liquid thrown off from the substrate; a rotation mechanism configured to integrally rotate the rotary cup and the substrate holding member; and a liquid supply mechanism configured to supply a process liquid onto the substrate. The apparatus further includes an annular drain cup and an annular exhaust cup with an exhaust port connected thereto to discharge a collected gas component. A gas-flow adjusting mechanism is disposed between the exhaust cup and the exhaust port and configured to adjust a gas flow of the gas component to flow toward the exhaust port from essentially all around within the exhaust cup.

Abstract: A cleaning machine for containers, containing a housing in which various treatment stations, including a feed station and a discharge station, are accommodated, whereby the housing has two side walls located opposite each other. In order to simplify the installation of the cleaning machine, a modular construction is used, whereby at least the discharge station is formed as a module.

Abstract: A conventional invention has a structure of a washing chamber in which the work is set on a table and the entire surface of the work is consistently washed and dried by rotations in an orbital motion and a planetary motion of the washing and drying nozzles which are respectively provided in all four directions—top, bottom, right and left. The conventional invention effectively washes a greater area of the work or the like, but due to limitations of the structure, it can wash only small-sized works or small components. Also, it does not always sufficiently wash and dry large-sized works, and consequently overhaul such works. To resolve the problems, besides the above structures, the present invention provides an additional structure of a rotary frame to generate rotations in an orbital motion and planetary motion so that the works can be efficiently and entirely washed and dried, and the overhaul of the works can consequently be completed.

Abstract: A substrate having a liquid film formed by pre-processing unit is transported by a substrate transport robot from the pre-processing unit to a freeze processing unit disposed away from the pre-processing unit. In the freeze-processing unit, the liquid film is frozen. This causes the adhesion power of contaminants adhering to the surface of the substrate reduce, and therefore the contaminants is detached from the surface of the substrate. Subsequently, the substrate which was subjected to the freezing process, is transported from the freeze processing unit to a post-processing unit which is disposed away from the pre-processing unit and the freeze processing. In the post-processing unit, a cleaning liquid is supplied to the frozen film on the rotating substrate, thereby easily removing the contaminants adhering to the substrate together with the frozen film.

Abstract: An etching/cleaning apparatus is provided, which makes it possible to effectively remove an unnecessary material or materials existing on a semiconductor wafer without damaging the device area with good controllability. The apparatus comprises (a) a rotating means for holding a semiconductor wafer and for rotating the wafer in a horizontal plane; the wafer having a device area and a surface peripheral area on its surface; the surface peripheral area being located outside the device area; and (b) an edge nozzle for emitting an etching/cleaning liquid toward a surface peripheral area of the wafer. The etching/cleaning liquid emitted from the edge nozzle selectively removes an unnecessary material existing in the surface peripheral area.

Abstract: A cleaning/drying apparatus including a vapor area where vapor of an organic solvent inside the cleaning/drying apparatus is generated, an ejecting part configured to eject the organic solvent onto a cleaning/drying target, a first detecting part configured to determine whether the temperature of the cleaning/drying target is a first temperature equivalent to a temperature of the vapor in the vapor area, a second detecting part configured to determine whether the temperature of the cleaning/drying target is a second temperature enabling the organic solvent to condense on a surface of the cleaning/drying target, and a cleaning/drying control part configured to drive the ejecting part to eject the organic solvent when the first detecting part detects that the temperature of the cleaning/drying target is the first temperature and stop the ejection when the second detecting part detects that the temperature of the cleaning/drying target is the second temperature.

Abstract: An apparatus and method for removing debris from ophthalmic lens transfer tips during the manufacturing or the ophthalmic lenses.

Abstract: A wafer processing system has a moveable drain assembly having multiple drain rings. The drain rings may be spaced apart sufficiently to allow a process fluid applicator to move between them. Each drain ring provides a separate drain path, optionally in a separate recirculation loop carrying a single process fluid. The drain rings may be sequentially moved into position to collect process fluid moving off of the workpiece. As a result, process fluids may be more uniformly applied and used process fluids can be separately removed, collected, and either recycled or processed for disposal. Mixing of used process fluids is largely avoided. A lower process fluid outlet allows for processing the back side of the wafer as well, without flipping the wafer.

Abstract: A multi-function parts washer for removing contaminants from parts either by hand or automatically using an aqueous cleaning fluid includes a base cabinet having sides, a floor and an open top defining a compartment. A parts receptacle is mounted in the compartment for receiving parts to be washed. The receptacle is mounted for reciprocating, vertical movement in the compartment. An agitator assembly includes one or more compressed gas bladders mounted to the parts receptacle. The bladder has an inlet for introducing compressed gas into the bladder and an outlet for discharge of the compressed gas from the bladder. As compressed gas is introduced into the bladder, the bladder inflates and the parts receptacle is raised, and as compressed gas is discharged from the bladder, the parts receptacle is lowered to provide an agitating motion of the parts receptacle and the parts thereon in the cleaning fluid. The agitator can include a hydraulic cylinder to effect movement of the parts receptacle.

Abstract: An apparatus for wet processing individual wafers comprising; a means for holding the wafer; a means for providing acoustic energy to a non-device side of the wafer; and a means for flowing a fluid onto a device side of the wafer.

Abstract: An apparatus for etching a substrate includes (a) a nozzle system including at least one nozzle through which acid solution containing at least hydrofluoric acid is sprayed onto the substrate, (b) a mover which moves at least one of the nozzle system and the substrate relative to the other in a predetermined direction in such a condition that the substrate and the nozzle system face each other, (c) a filter system which filters off particles out of the acid solution having been sprayed onto the substrate, and (d) a circulation system which circulates the acid solution having been sprayed onto the substrate, to the filter system, and further, to the nozzle system from the filter system.

Abstract: Methods and apparatus for removing particles from vials includes the use of a one sided pressure sensitive filament tape to remove external particles from vials. A roll of tape is juxtaposed relative to a line of vials moving along the production line. As each vial moves within the space between the tape the outside of the vial contacts the tape causing the particles to be removed and imbedded in the adhesive on the tape. A feed roll and a rewind roll provides for the tape to unwind while in contact with the outside of the vials and in conjunction with the movement of the vials along the production line. By causing the feed roll and the rewind roll to advance unused tape while in contact with the outside surface of the vials, the vials are caused to rotate at least 360 degrees while advancing down the line.

Abstract: A decoating device for axially symmetric components, particularly from aircraft engines is provided, the decoating process being carried out through the use of a decoating fluid-which is brought on a localized basis into contact with the component to be decoated, a receptacle for holding the decoating fluid being provided that rotates at least about one axis of rotation, and the decoating fluid surface forming a rotation paraboloid in response to the rotation, the component(s) to be decoated on a localized basis being accommodated in the receptacle and being dipped on the radially outer side into the decoating fluid. A decoating device is thereby devised which makes it possible for radially symmetric components to be decoated in the radially outer region in a simple process.

Abstract: Cleaning compounds, apparatus, and methods to remove contaminants from a substrate surface are provided. An exemplary cleaning compound to remove particulate contaminants from a semiconductor substrate surface is provided. The cleaning compound includes a viscous liquid with a viscosity between about 1 cP to about 10,000 cP. The cleaning compound also includes a plurality of solid components dispersed in the viscous liquid, the plurality of solid components interact with the particulate contaminants on the substrate surface to remove the particulate contaminants from the substrate surface.

Abstract: An apparatus for cleaning substrates includes a substrate support that is configured to support a plurality of substrates horizontally as spaced regularly one above the other, a rotating device for rotating the substrate support and a liquid supply system for dispensing cleaning liquid onto the substrates. The substrate support has a base plate and support rods extending upright on the base plate. The support rods include fixed rods and at least one movable rod. The movable rods is movable between an open position to provide a passage that allows the substrates to be placed between the support rods, and a closed position at which the substrates are held by and between the support rods. Once the substrates are supported in this way, the substrates are rotated. Then, the cleaning liquid, such as a chemical solution(s) followed by a rinsing liquid, is dispensed onto all of the substrates as the substrates are being rotated.

Abstract: The invention provides contact lens packages in which removal of the lens is facilitated by elevating the lens when the package is opened.

Abstract: A system, apparatus and method for processing flat articles, such as semiconductor wafers, with acoustical energy. In a cleaning process, the inventive system, apparatus and method can remove particles from both sides of a wafer more efficiently and effectively. In one aspect, the invention is a system for processing flat articles comprising: a first dispenser for applying a liquid to a first surface of a flat article; a second dispenser for applying liquid to a second surface of a flat article; a first transducer assembly positioned so as to transmit acoustical energy to the first surface of the flat article; and a second transducer assembly positioned so as to transmit acoustical energy to the second surface of the flat article.

Abstract: Method and apparatus for precisely removing dusts from a side edge of a wafer, improving a production yield of wafers, and reducing a manufacturing cost for semiconductor devices. The apparatus includes: a retaining table having a circular top plan view, capable of retaining the wafer disposed on the top surface, and being rotated in the wafer cleaning; a feeding unit for supplying a cleaning solution to a top surface of the wafer; a cup member for recovering the cleaning solution supplied to the wafer, the cup member surrounding a radially outer circumference and a bottom of the retaining table; and a guard member disposed inside the cup member so as to be spaced apart from the retaining table, which surrounds the radially outer circumference of the retaining table.

Abstract: Provided are a single substrate cleaning apparatus, and a method for cleaning the backside of a substrate, where a substrate reversing device for cleaning the backside of a substrate is installed inside a processing chamber.

Abstract: A dishwasher including a cutlery basket that has an adjustable compartment. The adjustable compartment receives a cutlery item that is adjustable between a loading position for loading and/or unloading the adjustable compartment and an angled position for carrying out cleaning and/or drying the cutlery item. In the angled position, a first clearance height of the cutlery item is reduced in relation to a second clearance height of the cutlery item in the loading position.

Abstract: A bottle cleaning machine and to a method for cleaning bottles with a bottle transporting device for transporting the bottles to be cleaned and with spraying nozzles. The bottle transporting device is configured such that the bottles are transported past the spraying nozzles along a substantially spiral transportation path, and preferably about a horizontal axis.

Abstract: Apparatus to clean silicon electrode assembly surfaces which controls or eliminates possible chemical attack of electrode assembly bonding materials, and eliminates direct handling contact with the parts to be cleaned during acid treatment, spray rinse, blow dry, bake and bagging. Aspects of the apparatus include a kit including an electrode carrier to hold an electrode assembly, a treatment stand to allow access to the electrode assembly, a spider plate to clamp the electrode assembly in the electrode carrier, a nitrogen purge plate to supply nitrogen gas to the backside of the electrode assembly during acid cleaning of the electrode, a water rinse plate to supply water to the electrode face, a blow dry plate to supply nitrogen to dry the electrode assembly and a bake stand to support the electrode assembly during a bake before placing the clean electrode assembly in a bag.

Abstract: A dishwasher apparatus includes a dish rack having a wire member, and a feed tube for a spray arm rotatably disposed beneath the dish rack. An intensive washing zone is provided in a region of the dish rack, the intensive washing zone including a rod-shaped pipe element attached to the wire member and having an outlet nozzle. A pipe branch for the intensive washing zone is provided, the pipe branch being disposed in a region of the feed tube and communicating with the pipe element via a T-piece. An actuator is provided that cooperates with the pipe element so as to enable the intensive washing zone to be activated and deactivated.

Abstract: An aqueous tube cleaning system as described herein can be utilized to clean a plurality of tubes having different lengths. The system includes a tower assembly having a wash chamber that houses the tubes during the cleaning cycle. The tower assembly is held in a horizontal load/unload position for loading and unloading of the tubes. The system rotates the tower assembly into a vertical cleaning orientation to accommodate cleaning with cleaning and rinse solutions, which flow through and around the tubes using the force of gravity. After rinsing and draining, the tower assembly is rotated back to the horizontal position for unloading.

Abstract: Washing apparatus includes a washing chamber having two lateral walls, bottom wall and upper wall, and at the front an aperture for inlet and/or outlet; a main distribution circuit to distribute treatment fluid inside the chamber; a trolley-type movement device, insertable into the chamber, including a frame to support objects to be subjected to a washing cycle in the chamber and on which treatment fluid distribution elements are mounted. The frame formed by hollow tubular elements functioning as a secondary distribution circuit of washing liquid towards the distribution elements; a connector element located on a frame upper part as a secondary distribution circuit delivery element; and a hydraulic connection pipe mounted on the upper wall, to connect hydraulically the main distribution circuit to the secondary distribution circuit connector element, selectively movable vertically between a first position connected to the connector element and a second position separate from the connector element.

Abstract: An object is to improve the cleanness achieved by washing through effectively suppressing the residual of solvent remained on a wash-target after washing. The present invention is a wash-target holder soaked in a wash tank by holding a wash-target, which comprises a tray for placing the wash-target, a surrounding member, which is provided standing up on a wash-target placing face of the tray, for surrounding the periphery, and a defluxion-restricting member for restricting the defluxion of the wash-target from the tray. In the periphery of the wash-target surrounded by the surrounding member, an opening for letting in and out the solvent used for washing the wash-target is formed.

Abstract: A dishwashing machine including a housing and a pair of retractable pull-out dishwashing system containers mounted one above the other in the housing. The housing having an internal height and the pair of retractable pull-out dishwashing system containers having a total combined height less than the internal height of the housing. The lower container can be height adjustably mounted and the upper and lower containers can have different individual heights.

Abstract: An apparatus for cleaning a surface of wafer or substrate includes a plate being positioned with a gap to surface of the wafer or substrate, and the plate being rotated around an axis vertical to surface of wafer or substrate. The rotating plate surface facing surface of the wafer or substrate has grooves, regular patterns, and irregular patterns to enhance the cleaning efficiency. Another embodiment further includes an ultra sonic or mega sonic transducer vibrating the rotating plate during cleaning process.

Abstract: A novel semiconductor wafer lifter is disclosed for handling wafers during wet bench processing. In particular, the lifter has a plurality of holes formed in its vertical support surface to allow cleaning or rinsing fluid to flow through the vertical support instead of around its sides. These holes facilitates a constant flow of fluid across the wafer during recirculation of the tank contents during etching and rinsing operations, thus ensuring more even etching of all wafers and minimizing the deposition of particulate matter on wafer surfaces.

Abstract: The shopping cart washing machine includes a cart transporting means (200) which continuously transports a cart in a forward direction, a high pressure washing water spraying means (300) which washes the cart by spraying high pressure washing water to a surface of the cart, a handle washing means (400) which washes a handle (4) of the cart by brushing upper and lower surfaces of the handle (4) of the cart, a cart outside surface washing unit (500) which washes the outside surface of a container part (1) of the cart by brushing the sides of the container part (1), a cart inside space washing means (600) which is disposed inside the container part (1) and removes dirt from the container part (1) by vertical vibrations, a rinsing means (700) which removes dirt remaining on the surface of the washed cart by spraying high pressure washing water again, and a drying means (800) which removes water droplets remaining on the surface of the washed cart using hot air.

Abstract: A drawer guide is provided for a dishwasher or other device through which there is a flow of liquid or gas. The drawer guide has guide rails and at least one rolling member assembly to guide the guide rails in a displaceable manner on another guide rail. A cage is provided for the rolling members. At least one of the guide rails has a rear rail portion with fluid passage openings that allow liquid or gas to flow through the guide rail when the device is in operation. At least one cage for the rolling members of the drawer guide can include a rear cage portion that is provided with fluid passage openings that allow liquid or gas to flow therethrough when the device is in operation.

Abstract: The present invention deals with a dishwasher comprising a tub (2) for receiving at least one object that is to be washed, wherein the tub (2) has a tub bottom (7) that is downwardly inclined from a first portion of the tub (2) close to a first side (6) of the tub towards a second portion of the tub (2) close to a second side (5) of the tub, which second side is opposite to the first side, such that a distance (D) between the tub bottom (7) and a plane comprising an upper edge (11) of the tub increases towards the second portion of the tub. Thereby, it will be possible to receive large items in the tub, such as plates with a large diameter, without increasing the total height of the dishwasher. The invention is especially advantageous in drawer dishwashers, and when the tub bottom (7) is downwardly inclined from a front portion of the tub towards a rear portion of the tub.

Abstract: A dishwasher including a processing chamber and at least one rack-type storage container arranged in the processing chamber. The at least one rack-type storage container includes at least one holding device and supporting devices horizontally arranged on the at least one holding device. The supporting devices support items to be cleaned in the at least one holding device. The supporting devices have an alterable supporting distance.

Abstract: A conveyor-type warewash machine includes a housing through which racks of wares are passed along a conveyance path for cleaning. A rack drive system includes a rack engaging structure that moves back and forth in first and second directions. When moving in the first direction, the rack engaging structure moves an adjacent rack forward along the conveyance path. When moving in the second direction, the rack engaging structure leaves the adjacent rack substantially stationary. The drive system is configured to move the rack engaging structure in the first direction at a first average speed and to move the rack engaging structure in the second direction at a second average speed. The second average speed is faster than the first average speed so that the adjacent rack spends more time moving forward than being stationary. A seal assembly may be provided about a drive shaft of the drive system.

Abstract: The invention presented comprises an operation system in which items to be processed by an operator, such as a washer/dryer, bulk sterilizer, or kiln, are fed into and removed from the operator by a continuous conveyor. A microcontroller controls actuators in loading zones distributed along the conveyor that switch the individual loading zones from bypass to push mode to alternately allow the items to remain stationary on the moving conveyor or be moved to a downstream loading zone when in the push mode. In a preferred embodiment, at least one loading zone is located at least partly within the operator.

Abstract: A dishwasher is disclosed which is suitable for mounting within a cavity under a bench. The dishwasher is chassis less and includes no outer wrapper or cabinet and as such is mounted directly to the cavity. Also disclosed are a number of embodiments relating to mechanisms for closing the lid on the retractable drawer wash system and various methods for sealing the lid onto the wash drawer.

Abstract: A cooking apparatus including a cooking appliance mounted over a sink basin so that the cooking appliance can be rinsed into the sink. The cooking appliance can preferably be raised vertically, from a lowered position where the base of the cooktop is seated into the sink basin to a raised position where the sides and bottom of the cooking appliance are easily accessible for cleaning or service. A hot water connection is preferably mounted so as to be able to provide water to both the sink basin and the exterior surfaces of the cooking appliance.

Abstract: A modular laundry system comprises at least one laundry appliance and a module adjacent to the at least one laundry appliance. The module comprises a vertically oriented housing and a shelf assembly comprising a shelf and movably mounted to the housing. The shelf can move between a first position, where the shelf is vertically oriented and at least partially received within the housing, and a second position, where the shelf is horizontally oriented and located exteriorly of the housing.

Abstract: A substrate (W) is held and rotated in its horizontal position on a spin base (10). A processing liquid can be supplied from a processing liquid lower nozzle 15 to the lower surface of the substrate (W). The upper surface of the substrate (W) is covered with an atmosphere blocking plate (30). A splash guard (50) is disposed so as to circumscribe the substrate (W). A guard (52) is curved such that the vertical cross section of a recovery port (52f) of the splash guard (50) is of substantially U-shape opening to the center of the splash guard (50), so that the maximum internal diameter part of the recovery port (52f) is brought near a guard (53). The space between the internal wall surface of the recovery port (52f) and the substrate (W) is increased to thereby suppress the bounce of the processing liquid flying spattering from the substrate (W) in rotation.

Abstract: An apparatus and method are disclosed in which a semiconductor substrate having a surface containing contaminants is cleaned or otherwise subjected to chemical treatment using a foam. The semiconductor wafer is supported either on a stiff support (or a layer of foam) and foam is provided on the opposite surface of the semiconductor wafer while the semiconductor wafer is supported. The foam contacting the semiconductor wafer is pressurized using a form to produce a jammed foam. Relative movement between the form and the semiconductor wafer, such as oscillation parallel and/or perpendicular to the top surface of the semiconductor wafer, is then induced while the jammed foam is in contact with the semiconductor wafer to remove the undesired contaminants and/or otherwise chemically treat the surface of the semiconductor wafer using the foam.

Abstract: A dishwasher assembly is disclosed including one or more racks for retaining one or more dishware items to be washed. A washer system is provided for respectively washing and drying the dishware item. A dishwasher housing is used for retaining the rack and the washer system. The dishwasher housing includes a door for accessing the rack, to enable the inserting and removing the dishware item. Preferably, the rack is a rotary rack that cooperates with a rotation assembly for rotating the rack. Also, the dishwasher housing preferably includes a first wall-facing side and a second wall-facing side. The first and second wall-facing sides are preferably formed at a desired angle, so as to fit into a corner.

Abstract: Provided are a substrate support unit and a substrate treating apparatus and method using the same. The substrate support unit includes a first support part and a second support part. The first support part is movable in a first direction. The first support part supports a first portion of a substrate in which a processing fluid is supplied in a direction corresponding to the first direction. The second support part is movable in a second direction. The second support part supports a second portion of the substrate. At least one of the first support part and the second support part supports the substrate while the processing fluid is supplied.