Abstract: Provided are a single substrate cleaning apparatus, and a method for cleaning the backside of a substrate, where a substrate reversing device for cleaning the backside of a substrate is installed inside a processing chamber. According to the above the apparatus and the method, costs may be reduced through simplifying equipment for cleaning the backside of a substrate, processing steps may be simplified, and contamination of a substrate from particles may be minimized.

Abstract: A status indicator for a dishwasher that has a front-loading door and an upper basket having a wire frame within the dishwasher is made up of a body and a hook, where the hook is rotatingly affixed to the wire frame of the upper basket in one of two positions, the first position with the body rotated onto the outside of the upper basket so that the door is kept in an open state, and a second position, in which the body is rotated to the inside of the upper basket, so that the door is left in a closed state, and wherein the body of the indicator may be vertically rotated to display one of two rubrics, one indicating clean dishes, and the other dirty dishes.

Abstract: To provide a substrate processing unit, a substrate transfer method, a substrate cleansing process unit, and a substrate plating apparatus that make it possible for a substrate carry-in mechanism such as a robot arm to quickly release hold on the substrate after carrying in the substrate so as to shorten the time for holding the substrate and improve throughput. The substrate processing unit 10 includes a substrate holding mechanism 10 for holding the substrate 11 in a specified holding position, and a processing mechanism 32 for applying a specified process to the substrate held with the substrate holding mechanism in which a substrate guide mechanism 20 is provided with a guide pin 15 for guiding the substrate to vicinity of a holding position.

Abstract: A cleaning device for paint roller covers having a shell with one or more tapered body sections encircling a central axis between a first substantially circular opening at a wide end of the shell and a second substantially circular opening at a narrow end of the shell, the one or more tapered body sections sized to apply increasing frictional resistance to a paint roller cover when passed therethrough to effectively clean the cover. The cleaning device may include a plurality of notches or relief cuts spaced about a periphery of the narrow end and may include a flange extending from the wide end.

Abstract: Disclosed are a method and apparatus for etching disk-shaped members, especially a method and apparatus for etching semiconductor wafers. In a method wherein wafers (30) are rotated and etched in an etching chamber (12) which is filled with an etching solution, a non-rotating cell plate (26) is disposed between two rotating wafers (30). In an etching apparatus wherein multiple wafers (30) are supported and rotated by a rod (16), the cell plate (26) is disposed between each two wafers (30). The cell plate (26) has a surface area roughly equivalent to that of the wafer (30).

Abstract: The endoscope reprocessor includes a basin for receiving an endoscope to be reprocessed, a rack which secures thereto a portion of the endoscope and moves vertically within the basin, a drive unit for vertically moving the rack, a positioning member for adjusting a rack stopping position when the endoscope is to be set on the rack and a drive control unit for controlling the drive unit based on computed results from the positioning member.

Abstract: Disclosed is the compact type dishwasher, including: a washing space for accommodating dishes therein, a lower rack disposed inside the washing space, an upper rack disposed above the lower rack, and having a dish collision preventer for preventing a collision with the dishes placed at the lower rack, and a sub-rack mounted at the dish collision preventer so as to utilize a space formed above the dish collision preventer, wherein the sub-rack includes a plurality of first support members and a plurality of second support members crossing the first support members, and at least one concavo-convex portion is formed at the first support members, thereby enhancing utilization of the space above the dish collision preventer of the upper rack as well as meeting a customer's need for minimizing the size of the dishwasher.

Abstract: A dishwasher is disclosed which is suitable for mounting within a cavity under a bench. The dishwasher is chassis less and includes no outer wrapper or cabinet and as such is mounted directly to the cavity. Also disclosed are a number of embodiments relating to mechanisms for closing the lid on the retractable drawer wash system and various methods for sealing the lid onto the wash drawer.

Abstract: An apparatus for cleaning of dental instruments and medical instruments. The apparatus includes a body for holding such instruments that is biased apart from an immersion tank. The retained instruments can be lowered into the immersion tank by hand operation. After the hand pressure is removed, the instruments are biased to pull out of the immersion bath. The instruments are then blown dry by pressurized gas.

Abstract: A detection/cleaning device for reticles employed in the production of electronic components, wherein the detection/cleaning device has a cleaning unit, in which a cleaning chamber is constructed. At least one gas feed for introducing a pressurized fluid cleaning medium opens into the cleaning chamber, and at least one suction means, by means of which the gas can be discharged from the cleaning chamber, leads from the cleaning chamber. The cleaning chamber has at least one first opening for introducing and removing a reticle. A detection unit for detecting contaminants on articles used in semiconductor production is provided. The detection unit has a detection means, into which a reticle can be introduced from one feed side of the detection unit. The first opening of the cleaning chamber and the feed side lie opposite each other. A feeding device is provided for exchanging a reticle between the cleaning unit and the detection unit.

Abstract: Systems and methods for exposing semiconductor workpieces to vapors for through-hole cleaning and/or other processes are disclosed. A representative method includes exposing a semiconductor workpiece to a vapor, with the semiconductor workpiece having an opening extending from a first surface of the workpiece through the workpiece to a second surface facing opposite from the first surface. The opening can include a contaminant, and the method can further include drawing the vapor and the contaminant through at least a portion of the opening and away from the second surface of the semiconductor workpiece.

Abstract: The invention provides a substrate processing apparatus capable of removing unnecessary deposition films attached to a bevel portion of a substrate to be processed with high efficiency and at low cost without causing damage to the inner areas of the substrate to be processed having patterns formed thereto and without causing heavy metal contamination.

Abstract: A method and apparatus 30 are provided for cleaning of bottle filling equipment 10 that has a plurality of elevated valves 18, each valve being in flow communication with filling liquid supply means 14. The method includes storing a manifold 32 that has a plurality of cleaning openings 42 in a configuration resembling that of the valves, in a position that allows clear visibility and access to the operation of the valves. The manifold 32 is lowered relative to the valves 18, so that it is below the valves and is positioned underneath the valves, with each cleaning opening 42 in flow communication with a valve. The valves 18 are rinsed with liquid flowing through the filling liquid supply 14, the valves and the manifold 32. Afterwards, the manifold 32 is removed from the valves 18 and returned to its stored position.

Abstract: A device for stacking cutlery pieces is provided by means of which cutlery pieces may be easily accessible and can be housed in a space-saving and tidy manner in the rinsing chamber of a dishwashing machine. The device provides reliable isolation and easy loading and unloading of cutlery pieces. A pivoting stacking device is arranged on an external side of the washing-up basket and includes a holder, in which at least one separate cutlery receptacle may be introduced, whereby the cutlery receptacle is characterised by particular aids for individual stacking of the cutlery pieces.

Abstract: Devices, including a wash ring assembly, and methods are provided for the removal of excess fluid or solids from the exterior or interior of a probe used to transfer fluids, for instance, in an automated assay device. Typically, a probe is used to aspirate and dispense a sample fluid material such as whole blood or a reagent. The devices and methods provided herein are useful for removing excess fluid from the exterior or interior of the probe so as to prevent dripping and cross-contamination between samples or reagents. It is also contemplated that, utilizing the devices and methods provided herein, washing and/or drying can be performed simultaneously as the probe is in motion, aspirating a sample and/or dispensing a sample.

Abstract: A dishwasher is disclosed, by which an installation height of a rack is adjusted inside a washing chamber and in which the installation height is automatically adjusted by a button. The dishwasher includes a washing chamber having tableware washed therein, a rack movably installed in the washing chamber to hold the tableware thereon, a plurality of guide rollers fixed to both confronting sidewalls of the washing chamber, a guide rail provided between the plurality of guide rollers to slide back and forth, and a height adjustment device configured to move the rack upward and downward, the height adjust device being provided to slide on the guide rail.

Abstract: Method and device for wet treating a defined peripheral edge-region of a wafer-shaped article having a first surface plane W1, a second surface plane W2 and an edge surface. The device includes a support for holding the wafer-shaped article; liquid dispensing members for dispensing liquid onto the first surface plane W1 of the wafer-shaped article not facing the support and liquid guiding member connected to the support for guiding at least a part of the liquid around the edge surface of the wafer-shaped article towards the second surface plane W2 of the wafer-shaped article facing the support thereby wetting at least the edge surface, wherein the liquid guiding member has the form of a ring.

Abstract: A cleaning probe capable of providing uniform cleaning to an entire wafer while not damaging the edge portion of the wafer, and a megasonic cleaning apparatus having the cleaning probe are provided. The cleaning probe comprises a front portion located near the center of the wafer, a rear portion connected to a piezoelectric transducer, and a protrusion located between the rear portion and the front portion, located on an edge portion of the wafer, and having a larger cross section width than the front portion.

Abstract: A substrate treatment method for treating a substrate by supplying a treatment liquid to the substrate while rotating the substrate. The method comprises the steps of: performing a first substrate rotation process for rotating the substrate while clamping the substrate by a first clamping member set; performing a second substrate rotation process after the first substrate rotation step for rotating the substrate while clamping the substrate by the first clamping member set and a second clamping member set provided separately from the first clamping member set; and performing a third substrate rotation process after the second substrate rotation step by unclamping the substrate from the first clamping member set for rotating the substrate while clamping the substrate by the second clamping member set.

Abstract: A washing machine for glass lenses (11) or other similar items of the type including a conveyor (1) has a bearing surface (10) for moving the lenses through a washing chamber (12) made of a succession of washing means (21). The traction force transmitted to the aforementioned bearing surface (10) is carried out by two chains (13) with endless links (14), located on the both sides of the aforementioned bearing surface (10), each chain (13) being joined at the longitudinal side corresponding to the aforementioned bearing surface (10) and is stretched tight between two driving gears, of axis parallel to the plane of the aforementioned bearing surface and perpendicular to the direction of the displacement.

Abstract: The invention aims at improving a cleaning fluid container (3) for a cleaning device (RV) for personal needs, in particular for cleaning a shaving head (SK) of a dry shaving apparatus (R), with a housing (20), with an inlet port (15) provided on the housing (20) to admit cleaning fluid (11), with an outlet port (14) equally provided on the housing (20) to discharge the cleaning fluid (11), and with a filter element (F), said filter element (F) being provided with filter pores for filtering out solid particles, particularly hair particles, and being arranged in a flow area between the inlet port (15) and the outlet port (14), in a manner enabling the pump capacity to be significantly reduced or the service life of a cartridge (K) to be substantially increased. This is accomplished in that the filter element (F) has pores of a size causing part of the particles to penetrate the filter element (F) according to their size.

Abstract: Described herein is a dish-washing machine, in which there is provided: at least one supporting structure; a washing station, defined by one or more washing arms; a rinsing station, defined by one or more rinsing arms and by at least two attachment assemblies for attachment of the rinsing arms, which are positioned on opposite sides of the washing arms; and reversible movement means for displacing a dish rack from the washing station to the rinsing station.

Abstract: A pad washing system is provided. This system includes a filter device that further includes: a filter component having a textured top surface and at least one baffle formed on the underside thereof; a filter support apparatus adapted to receive the filter device, wherein the filter support apparatus further includes: a base, a plurality of vertical support columns formed integrally with the base, a plurality of caps mounted on top of the vertical columns, and a plurality of biasing members disposed between the caps and the tops of the vertical columns; a bucket for receiving both the filter device and the filter support apparatus; a threaded rim attached to or formed integrally with the top edge the bucket; and a splash guard mountable within the threaded rim.

Abstract: A vessel having an implement located in a fluid receiving space inside the vessel. The vessel includes an enclosure for enclosing a closed space around the implement. An actuator actuates the enclosure to and fro between an open position, in which the enclosure does not enclose a closed space around the implement, and a closed position, in which the enclosure forms a fluid tight or at least essentially fluid tight casing that encloses a closed space around the implement so as to prevent fluid in the fluid receiving space outside the closed space from flowing into the closed space. A method for cleaning and/or calibrating an implement located in a fluid receiving space inside such a vessel and a method for removing an implement from or inserting an implement into a fluid receiving space inside a vessel.

Abstract: Embodiments of the invention generally relate to a modular, configurable system in which distinct cleaning and drying modules can be arranged in different combinations selectable by a user of the system. In one embodiment a configurable system for substrate cleaning is provided. The configurable system provides a frame including first and second bays, the first and second bays each adapted to hold one or more cleaning or drying modules, and a transfer area positioned between the first and second bays including a robot adapted to move substrates to and from the one or more modules positioned within the first and second bays, wherein the frame is adapted to hold a user selectable set of one or more cleaning or drying modules in the first and second bays.

Abstract: A reversing unit includes a fixed plate, a first movable plate provided so as to face one surface of the fixed plate, a second movable plate provided so as to face the other surface of the fixed plate and a rotary actuator. The rotary actuator rotates the first movable plate, the second movable plate and the fixed plate around a horizontal axis. A distance between the first movable plate and the fixed plate and a distance between the second movable plate and the fixed plate are set to be substantially equal to a difference in height between two hands of a main robot that carry a substrate in and out.

Abstract: A dish washer capable of washing dishes of various sizes is provided. The dishwasher includes a rack assembly having a plurality of dish holders into which dishes may be inserted and by which the dishes supported are separated from each other on the rack assembly. The plurality of dish holders includes first and second dish holders having different heights disposed adjacent to one another.

Abstract: A substrate processing apparatus has an indexer block and a processing block. One side of the processing block has a vertical stack of a plurality of top surface cleaning units and the other side of the processing block has a vertical stack of a plurality of back surface cleaning units. Reversing units for reversing the substrate W are provided one above the other between the indexer block and the processing block. For example, one reversing unit is used for reversing the substrate before a back surface cleaning processing by the back surface cleaning unit or for other purposes, and the other reversing unit is used for placing the substrate W after a top surface cleaning processing by the top surface cleaning unit or for other purposes.

Abstract: A cleaning system for removing contaminants from a catalytic converter includes a vibrator for vibrating the catalytic converter when the converter is placed in a cleaning liquid. The vibrator is mounted on a lift-connector of the system. The lift-connector defines a pair of forklift-openings for receiving forks of a forklift.

Abstract: A vessel holder and a dish washing machine having the same, in which, when vessels are put into and washed in the dish washing machine, the vessels can be stably washed by improving a fixed state of each thereof. The dish washing machine includes a washing space, a vessel basket installed in the washing space, and includes wires, at least one vessel holder detachably installed to the vessel basket, and allowing a vessel to be inserted thereinto and supported therein. The vessel holder includes a plurality of supports elastically supporting the vessel, and an inserting part provided between the supports and allowing the vessel to be inserted thereinto.

Abstract: A residue removal device includes an object, a sink, and a conveying device. The object includes a contact surface. Residue exists on the contact surface. A solution is contained in the sink. The sink is disposed below the contact surface. The solution corresponds to the contact surface. The conveying device drives the relative motion between the object and the sink. When the residues on the contact surface are contacted by the solution and relative motion is generated between the residues of the contact surface and the solution, the residues are removed by the solution.

Abstract: A dishwasher rack basket assembly that includes a water impervious basket of open mesh construction, the basket is selectively positionable between a first size and a second size, the first size securing small items while permitting flow of liquid therethrough, the second size smaller than the first size and not securing small items while permitting flow of liquid therethrough, and a projection positioned on the basket, wherein the projection is engageable to transform the basket from the first size to the second size.

Abstract: The invention relates to a method of cleaning tubes, in which the tube is at least partially filled with a cleaning medium, wherein a cleaning medium is atomized, in which case the droplets of cleaning medium are accelerated, at least in part, essentially in the direction of a center axis of the tube.

Abstract: A dishwasher is disclosed which includes a rack arranged inside of a washing cabinet, a plurality of shelves arranged on the rack, and a shelf holder installed on the tack. The shelf holder may include a plurality of shelf fixing parts that fix the shelves together. The dishwasher so configured is capable of minimizing the number of shelf holders needed to fix a plurality of shelves to a rack and, therefore, simplifies the assembly process.

Abstract: The portable, compact, silverware-only washing apparatus is disclosed. The apparatus is manufactured so as to easily mount on top of a kitchen countertop or to be easily portable to other locales. The appliance is designed so as to not be connected to a water supply within a home or apartment, but rather rely upon the user to pour in water in a manner similar to a home coffee maker. The device includes a motor and pump assembly to spray pressurized water and detergent against the silverware loaded therein and automatically drain the water and waste after completion of the washing cycle The appliance is configured with a specialized basket for holding the silverware in individualized compartments.

Abstract: A dishwasher is disclosed which includes a washing cabinet, a frame disposed within the washing cabinet, and a basket, which is placed on the frame, and whose height is adjustable by a back and forth movement. With this construction, there is no need to lift the basket, rotate it 90°, and reposition the basket to adjust a height of the basket. Rather, it is possible to adjust the height of the basket by a simple operation of pulling the basket forward or pushing it rearward.

Abstract: An automatic cart wash apparatus. The automatic cart wash apparatus provides improved cleaning of stock carts on a regular basis over manual cleaning by store employees. The automatic cart wash apparatus includes three main stages: a debris removal (vacuum) stage, a cleaning (wash, sanitize, rinse) stage, and a drying stage. The debris removal stage uses forced air and/or suction to remove solid and generally non-soluble waste, such as a paper or other trash and debris, from a stock cart. The cleaning stage uses a selection of detergents, sanitizing agents, and rinse agents to remove soluble or sticky waste, such as food and liquids, and to kill germs, viruses, and bacteria present on the cart. The drying stage removes excess liquids from the cart making it ready for use by the next customer.

Abstract: Apparatus removes contaminants from edge areas of a wafer by spinning the wafer. Nozzles spray or jet fluid onto both the first and second sides of the wafer, near the edge of the wafer. Typically the spray or jet is at an acute angle to the wafer surface. Contaminants are removed and re-deposition of removed contaminants is reduced or avoided. The nozzle locations and angles may be varied to change the areas on the wafer cleaned by the sprays or jets.

Abstract: A substrate treatment apparatus according to the present invention includes: a substrate holding unit which holds a substrate; a push-pull plate to be positioned in spaced opposed relation to one surface of the substrate held by the substrate holding unit, the push-pull plate having a plurality of outlet ports which discharge a treatment liquid and a plurality of suction ports which suck the treatment liquid discharged from the outlet ports, the outlet ports and the suction ports being provided in a surface of the push-pull plate to be opposed to the one surface of the substrate; and a relative rotation unit which rotates the substrate held by the substrate holding unit and the push-pull plate relative to each other.

Abstract: An apparatus for simultaneously rinsing and drying front and back surfaces of a workpiece comprises a chuck adapted to spin the workpiece, a plurality of posts coupled to the chuck and adapted to support the workpiece, and first and second mechanical arms. The first mechanical arm is adapted to be positioned between the chuck and the workpiece, and to sweep along at least part of the workpiece back surface. The first mechanical arm comprises at least a first rinsing liquid nozzle, and a first tensioactive vapor nozzle. The second mechanical arm is adapted to be positioned adjacent to the workpiece front surface, and to sweep along at least part of the workpiece front surface. The second mechanical arm comprises at least a second rinsing liquid nozzle, and a second tensioactive vapor nozzle.

Abstract: A dishwasher includes a housing, a dish rack movably disposed in the housing, and a first and a second roller respectively disposed on opposite sides of the dish rack. The first and second rollers are configured to movably support the dish rack on respective first and second running surfaces. A respective angle of inclination of at least a respective portion of the first and second running surfaces is adjustable so as to enable the dish rack to automatically move outward from the housing.

Abstract: A surface treatment device (10) is provided for applying a surface treatment medium to an article (60). The device comprises an application member (12, 14) for holding and applying the surface treatment medium to the article. The device has a securing arrangement (40) for securing the application member to the article.

Abstract: An apparatus for cleaning a paint roller includes a container having a top with an insertion opening for introducing a paint-carrying surface of the paint roller into the container and a bottom with a discharge opening for discharging paint out of the container. A spray pipe has holes formed therein for directing water toward the paint-carrying surface within the container. The spray pipe rotates and the paint roller is movable vertically, for washing paint off substantially all of the paint-carrying surface and out of the discharge opening.

Abstract: A workpiece processor has a process chamber for holding a liquid. A sonic element, such as a megasonic transducer, is positioned to provide sonic energy into the liquid. A workpiece holder is moveable from a first position, wherein a workpiece is held immersed in the liquid, for sonic processing, to a second position where the workpiece is generally aligned with spray nozzles. Process liquids and gases may be sprayed or otherwise provided onto the workpiece, optionally while the workpiece is rotating within the process chamber. A process chamber gas or vapor exhaust assembly prevents escape of process gases or vapors from the processor. The processor can provide both sonic processing, as well as liquid and/or gas chemical processing.

Abstract: A paint roller includes a spindle adapted to hold a rotatable cylindrical paint pad, and an arm connecting the spindle to a handle. A semi-cylindrical cover curves about the roller's spindle. A liquid manifold is integral with the cover to deliver a curtain of liquid to the paint roller for washing the cylindrical pad. The liquid manifold is made up of a tubular section having a hollow interior, a closed lower end and an open upper end adapted for attachment to a hose, the section including a plurality of spaced, longitudinally aligned holes in communication with the interior, whereby liquid is capable of flowing from the tubular section upper end through the hollow interior for discharge through the holes. An adapter plate for adapting the paint roller cover, to cover all types of rollers including different length spindles or roller cages, is slidably attachable to the cover outer surface.

Abstract: A cartridge filter 7 is vertically movably placed in a processing vessel 1 having a cylindrical profile. An ultrasonic washer 55 is fitted to the lateral wall 3a of the spray casing of the processing vessel 1. Washing liquid 56 is injected into the processing vessel 1 and the filter 7 is moved downward and immersed in the washing liquid 56. The washer 55 is activated under this condition to wash the filter 7. Since the washer 55 is arranged near the filter 7, the ultrasonic oscillation is easily transmitted to the filter 7 to efficiently remove the foreign objects adhering to the filter 7. Thus, with this arrangement, it is possible to wash the filter 7 in the processing vessel 1 without removing the filter 7 from a fluidized bed apparatus. In a filter washing apparatus 101, a cartridge filter 103 is contained in a processing vessel 102 and immersed in washing liquid 110.

Abstract: After rinsing, while rotating a substrate, a front layer part of a rinsing liquid (DIW) adhering to a substrate surface is drained and removed from the substrate surface. This is followed by supply to the substrate surface of a liquid mixture which is obtained by mixing IPA and DIW together. Since a majority of the rinsing liquid on the substrate surface is removed off from the substrate surface, even when micro patterns are formed on the substrate surface, the liquid mixture replaces the liquid component adhering to the gaps between the patterns. Further, the IPA concentration in the liquid mixture supplied to the substrate surface is set to 50% or below.

Abstract: A system and method for cleaning a substrate, such as a semiconductor wafer, utilizes a rotatable wafer supporting assembly with a cylindrical body to provide stability for the substrate being cleaned, even at high rotational speeds. The rotatable wafer supporting assembly may include wafer holding mechanisms with pivotable confining members that are configured to hold the substrate using centrifugal force when the wafer supporting assembly is rotated. In an embodiment, the cleaning system may include a positioning system operatively connected to an acoustic transducer to provide meaningful control of the acoustic energy applied to a surface of the substrate by selectively changing the distance between the acoustic transducer and the substrate surface so that the substrate can be cleaned more effectively.

Abstract: A system and method for sanitizing articles including a rectangular apparatus defining an enclosure through which the articles may be transported, a tank for sanitizing solution, sprayers for spraying sanitizing solution on the top and bottom of articles in the enclosure, and a container for catching used sanitizing solution; a mechanism for moving the articles through the rectangular enclosure from the first entry end and out of the enclosure at the second exit end; a mechanism for automatic triggering of release of water from the tank when an article enters the enclosure; a mechanism for carrying used water to either the container for sanitizing solution or a drain system; and a sanitizing solution capable of disinfecting the articles when sprayed on the articles without requiring rinsing of the articles after the articles have been sprayed with the sanitizing solution.

Abstract: A substrate treating apparatus includes a spin chuck for supporting a substrate to be rotatable in a plane including a principal surface of the substrate, a motor for rotating the spin chuck, a circulating pump for circulating a removal liquid and transmitting the removal liquid to a first nozzle, and a heater for heating the removal liquid in circulation. When removing a reaction product, the spin chuck is rotated at a rotational frequency of at least 100 rpm and not exceeding 3,000 rpm, and the first nozzle supplies the removal liquid at a rate of at least 50 ml per minute to the surface of the substrate supported and rotated by the spin chuck.