Abstract: The invention relates to a method of decontaminating an oxide layer-comprising surface of a component or a system of a nuclear facility, wherein the oxide layer is treated with gaseous nitrogen oxide (NOx) as oxidizing agent.

Abstract: An acidic destaining composition for removing hard water and metal stains is disclosed. The composition comprises an acid in combination with a reducing agent and may preferably be formulated as a solid.

Abstract: A method for washing an article to remove contaminations such as oils and fats, foreign substances and the like from a surface of the article is provided. The washing method comprises the steps of: cooling a washing solution to obtain a super-cooled washing solution; heating an article to increase its surface temperature to the temperature which is not lower than the boiling point of the washing solution; and washing and drying the article concurrently, while spraying the super-cooled washing solution to the heated article. The washing apparatus for carrying out this washing method is also provided. Using these washing method and apparatus, it becomes possible to downsize a scale of the washing apparatus, and to operate the washing apparatus under the energy-saving conditions as a result of reduction in an amount of the consumed energies, and the washing process at an accelerated speed.

Abstract: Methods, systems, and computer programs are presented for processing a substrate in a processing chamber which includes a first chamber and a second chamber. A first surface of the substrate is exposed to the first chamber and a second surface of the substrate is exposed to the second chamber. One method includes an operation for applying a first fluid to the first surface of the substrate, where the first fluid is at a first temperature. Further, the method includes another operation for applying a second fluid to the second surface of the substrate, where the second fluid is at a second temperature. During processing of the substrate, the second temperature is higher than the first temperature, and the second fluid heats the substrate.

Abstract: Improved methods for stripping photoresist and removing etch-related residues from dielectric materials are provided. In one aspect of the invention, methods involve removing material from a dielectric layer using a hydrogen-based etch process employing a weak oxidizing agent and fluorine-containing compound. Substrate temperature is maintained at a level of about 160° C. or less, e.g., less than about 90° C.

Abstract: Methods and apparatuses for integrated cleaning of objects comprising a sequence of wet cleaning and vacuum drying in a same process chamber. The present integrated cleaning process can eliminate moving parts, improving the system reliability. Vacuum decontamination can be included for degassing and decontaminating the cleaned objects. In an embodiment, a cleaner system combines various movements into an integrated movement to be handled by a robot, for example, to improve the throughput. For example, an integrated robot movement comprising picking up a closed container from the input load port, moving both the lid and body together, and then depositing the body and lid separately into the appropriate positions in the cleaner to be cleaned.

Abstract: A method for removing corrosion products from a system, the method including: adjusting the system temperature to between 115° F. to 212° F.; injecting a cleaning dissolution solvent into the system; injecting a gas into the system after the system is filled with the cleaning dissolution solvent; the gas mixing with the solvent in the system; draining the solvent from the system after a predetermined period of time of dissolution; injecting a passivation composition into the system; injecting a gas into the system, the gas mixing the passivation composition; draining the system of the composition after a predetermined period of time of passivation; rinsing the system with a low volume solution; and rinsing the system at with a full volume solution.

Abstract: A process for quickly removing hydrocarbon contaminants and noxious gases in a safe and effective manner from catalytic reactors, other media packed process vessels and associated equipment in the vapor phase without using steam. The cleaning agent contains one or more solvents, such as terpenes or other organic solvents. The cleaning agent is injected into contaminated equipment, along with a carrier gas, in the form of a cleaning vapor.

Abstract: The substrate cleaning apparatus includes a first process chamber in which a liquid treating process is performed on a substrate by supplying a treating solution, a second process chamber in which a drying process is performed on the substrate, and a carrying unit carrying the substrate between the first process chamber and the second process chamber. The first process chamber includes a liquid treating housing providing a space in which the liquid treating process is performed on the substrate, a spin chuck supporting the substrate within the liquid treating housing, and a liquid supply member supplying the treating solution onto the substrate supported by the spin chuck. The second process chamber includes a drying housing providing a space in which the substrate is dried, a substrate support member supporting the substrate within the drying housing, and a heater heating the substrate.

Abstract: A method of cleaning an ash material byproduct of a coal fired power plant of metal and hydrocarbon impurities. Dewatered feed material containing the ash material byproduct is preheated and crushed and then heated in a volatilizer to a temperature at which the metal and hydrocarbon impurities are volatilized. The ash is then separated from the volatilized materials.

Abstract: The present invention relates to a method of reducing allergenicity of natural rubber latex products caused by allergens by reducing extractable protein levels found for said products, said method comprising the steps of: subjecting said products to a wash in a strong alkaline solution to deteriorate the allergens, and a system for reducing allergenicity of natural rubber latex products caused by allergens by reducing extractable protein levels found for said products, and a product, such as a glover or condom, manufactured from natural rubber latex.

Abstract: A film-forming apparatus includes a heat generator exposed to a film-forming gas drawn into a chamber to generate film formation species. A film-forming gas supply system supplies the film-forming gas into the chamber. A control unit sets the heat generator in a non-heated state during a cleaning process that discharges a film formation residue from the chamber. A cleaning gas supplying system supplies a cleaning gas including ClF3 into the chamber. A temperature adjustment unit adjusts the chamber to a target temperature from 100° C. or higher to 200° C. or less in the cleaning process. A discharge system discharges a reaction product produced by a reaction between the film formation residue and the cleaning gas from the chamber.

Abstract: A method, system and device to use a dilute alkaline solution held at sub-critical temperature and pressure conditions to remove rapidly chloride ions from corroded iron artifacts.

Abstract: A method of cleaning a film-forming apparatus to remove at least a part of a silicon-based material deposited on a constituent member of the film-forming apparatus after used to form thin films includes introducing a first-gas including fluorine gas and a second gas including nitrogen monoxide gas into the film-forming apparatus, and heating the constituent member. The constituent member includes quartz or silicon carbide, and the silicon-based material includes silicon nitride.

Abstract: Processes and compositions for cleaning mixing devices are disclosed that improve the production and quality of thermoplastic polymer resins subsequently produced in the mixing device, while reducing the time needed for cleaning and/or change over. A cleaning mixture comprising polymeric resin pellets having a Rockwell R hardness of 85 to 140 externally coated with an aqueous solution containing sulfonate salts, alkyl aryl sulfonate salts, alkyl sulfate salts, C6 to C36 carboxylic acid salts, or mixtures thereof, is used to purge the mixing device. The surfactant salt is present in the aqueous solution at 0.2 to 30 wt % of the solution, the aqueous solution having a pH of 6.0 to 9.0.

Abstract: Processes and compositions for cleaning mixing devices are disclosed that improve the production and quality of polycarbonate resins subsequently produced in the mixing device, while reducing the time needed for cleaning and/or change over. A cleaning mixture comprising polycarbonate resin pellets coated with an alkyl aryl sulfonate salt aqueous solution are used to purge the mixing device.

Abstract: There is provided a method of controlling a dishwasher. The method includes performing a preliminary washing cycle, performing a main washing cycle, and performing a rinsing cycle. Steam is supplied during at least one of the main washing cycle and the rinsing cycle.

Abstract: A holder assembly comprises a first and a separable second part, the first part detachable from the second part, the first part comprising a tube and an environmental cell interface and the second part comprising an electron microscope interface, as a result of which the first part can be cleaned at high temperatures without exposing the second part to said high temperature. By forming the holder assembly from detachable parts, one part can be cleaned by heating it to a high temperature of, for example, 1000° C., clogging in the tubes can be removed by reduction of carbon, while keeping the other part (often comprising mechanical fittings, ball bearing, sliders, or such like) cool. The cleaning can be enhanced by blowing, for example, oxygen or hydrogen through the tubes.

Abstract: Provided is a method of cleaning the inside of a pressure vessel for blasting to enable a short-time treatment regardless of the state of residual substances. This method includes: a step of setting an explosive for cleaning, different from an explosive for blasting, in an amount necessary for decomposing a residue of the object inside of a pressure vessel after a blasting step of setting and blasting the object and the explosive for blasting in the pressure vessel; and a step of decomposing the residue by exploding the explosive for cleaning in the pressure vessel.

Abstract: A polymer removing apparatus for use in removing polymer annularly adhered to a peripheral portion of a target substrate includes a processing chamber for accommodating the target substrate having the polymer annularly adhered to the peripheral portion thereof; a mounting table for mounting the target substrate thereon; and a laser irradiation unit for irradiating ring-shaped laser light at once to the whole polymer annularly adhered to the target substrate. The polymer removing apparatus further includes an ozone gas supply unit for supplying an ozone gas to the polymer annularly adhered to the target substrate and a gas exhaust unit for exhausting the ozone gas.

Abstract: A method of controlling a dish washer includes performing a wash cycle for washing dishes with wash liquid and performing a rinse cycle for rinsing the washed dishes. Cold water is supplied to a sump after completion of the rinse cycle, the cold water lowering the temperature with a tub. After completion of supplying the cold water, a drying cycle for drying an inside of the tub is performed.

Abstract: There is disclosed a method of cleaning a liquid hydrocarbon-cooled bipropellant rocket engine. In an embodiment, method includes heating the engine to a temperature. The method includes applying ozone for a period of time. The method includes determining the temperature and the period of time are each sufficient to remove carbonaceous deposits. In another embodiment, the method may further include thermally imaging the heat transfer surfaces. There is disclosed apparatus for cleaning a liquid hydrocarbon-cooled bipropellant rocket engine. In one embodiment, the apparatus includes a heater, an ozone source, and a thermal camera. Other embodiments are also disclosed.

Abstract: Ignition sections are provided at two locations on each of lower portions of the side surfaces on both sides of a film-forming chamber so as to be provided at four locations in total. A flowing current is applied to the ignition sections when a flammable by-product is ignited. A first detecting section for measuring a pressure in the film-forming chamber is formed on the side surface of the film-forming chamber. A second detecting section is formed at the lower portion of the side surface of the film-forming chamber. A third detecting section for measuring a spatial temperature in the film-forming chamber is formed at an upper portion of the film-forming chamber.

Abstract: According to one embodiment, the disclosure provides a system for removal of deleterious chemicals from a fiber optic line. The system may a fiber optic line having two ends, an outer tube, an optical fiber, and an inner volume, a fluid operable to move through the inner volume, the fluid operable to remove at least one deleterious chemical other than hydrogen from the fiber optic line, and a fluid controller connected to at least one end of the fiber optic line and operable to control movement of the fluid through the inner volume. According to another embodiment, the disclosure provides a method of removing a deleterious chemical from a fiber optic line. According to a third embodiment, the disclosure provides a method of removing a deleterious chemical from a fiber optic line by introducing a vacuum in an inner volume of a sealed fiber optic line in a static or cyclical manner.

Abstract: A substrate cleaning method is capable of preventing a liquid stream on a substrate from being cut and circuit patterns thereon from being damaged. The substrate cleaning method includes a liquid film forming process that forms a liquid film on an entire substrate surface by supplying a cleaning liquid L from a central portion of the substrate W toward a peripheral portion thereof while rotating the substrate; a drying region forming process that discharges a gas G on the substrate surface and removes the cleaning liquid on the substrate surface; and a residual liquid removing process that removes the cleaning liquid remaining between the circuit patterns by discharging a gas G while moving in a diametrical direction of the substrate.

Abstract: An appliance and method for non-thermal heater protection during prolonged operation of the appliance is provided. A time limit determination apparatus may prevent prolonged operation heater protection that prevents significant damage to the appliance.

Abstract: A fill protection algorithm for determining whether the water level in a dishwasher is sufficient to enable operation of the wash pump of the dishwasher without burn-out or other damage to the wash pump and/or heating element of the dishwasher due to insufficient water level. A change in water temperature TEMPDELTA is detected and is compared to a predetermined water temperature change level or amount, TEMPMIN—DELTA, and if the detected change in water temperature TEMPMIN—DELTA is greater than or equal to the minimum water temperature change TEMPMIN—DELTA, operation of the dishwasher is allowed to proceed.

Abstract: A substrate cleaning method for cleaning and removing foreign materials adhered to a surface of a substrate includes heating the substrate to peel off the foreign materials from the surface of the substrate by a thermal stress, removing the foreign materials from the surface of the substrate by a temperature gradient created in a proximity of the surface of the substrate, and collecting the foreign materials removed from the surface of the substrate by a collecting unit facing the substrate.

Abstract: A device and method for processing wafer-shaped articles comprises a process chamber and a rotary chuck located within the process chamber. The rotary chuck is adapted to be driven without physical contact through a magnetic bearing. The rotary chuck comprises a series of gripping pins adapted to hold a wafer shaped article in a position depending downwardly from the rotary chuck. The rotary chuck further comprises a plate that rotates together with the rotary chuck. The plate is positioned above an area occupied by the wafer-shaped article, and shields upper surfaces of the process chamber from liquids flung off of a wafer-shaped article during use of the rotary chuck.

Abstract: A fuel mixture characterized by reduced SOx and NOx emissions from combustion of the fuel, comprising: fuel; and an ester additive derived from reaction of i) a C6-C16 aliphatic straight chain or branched chain monocarboxylic acid, wherein aliphatic is defined as of or relating to a major group of organic compounds, structured in open or branched chains, including alkanes, e.g. paraffins, alkenes, e.g. olefins, and alkynes e.g., acetylenes, and either, ii) an aliphatic polyhydric alcohol having three or more primary alcohol groups, or iii) a C1-C16 aliphatic straight or branched chain monohydric alcohol. A method of reducing SOx and NOx emissions from combustion of the fuel, comprising: mixing fuel and an ester additive; and combusting the mixture, wherein SOx and NOx emissions are at least about 20% to about 40% w/w of the SOx and NOx emissions from combustion of the fuel without admixture with the ester additive.

Abstract: A cleaning method includes: producing an oxidizing solution by electrolysis of sulfuric acid; and cleaning a workpiece with the oxidizing solution. The oxidizing solution is heated by heat of mixing to clean the workpiece. A method for manufacturing an electronic device includes: producing a workpiece; producing an oxidizing solution by electrolysis of sulfuric acid; and cleaning the workpiece with the oxidizing solution. The oxidizing solution is heated by heat of mixing to clean the workpiece.

Abstract: A foreign substance removing apparatus includes a mounting table for mounting and rotating a substrate; and a laser beam irradiation unit for removing foreign substances attached to a surface of the substrate by irradiating foreign substance cleaning laser beam onto the substrate mounted and rotated on the mounting table. In the foreign substance removing apparatus, the laser beam irradiation unit irradiates laser beam having an elongate shaped irradiation cross section onto the surface of the substrate.

Abstract: Methods of extending the lifetime of pressure gauges coupled to process chambers are disclosed herein. In some embodiments, the methods may include isolating the pressure gauge from a processing volume of the process chamber, increasing a moisture content of the processing volume to above a desired moisture level while the pressure gauge is isolated from the processing volume of the process chamber, reducing a moisture content of the processing volume to a desired moisture level, wherein the processing volume has a leak rate of about 2 mTorr/min or less at the desired moisture level, and exposing the pressure gauge to the processing volume after reaching the desired moisture level. In some embodiments, the moisture content of the process chamber may be increased by performing a cleaning process in the process chamber or by allowing air to enter the processing volume.

Abstract: A method for cleaning a hot-wall type film formation apparatus having a batch processing system with industrially high mass productivity is provided. In the method, a carbon film deposited on an inner wall or the like of a reaction chamber of the apparatus is removed efficiently in a short time. To remove the carbon film deposited on the inner wall of the reaction chamber by a thermal CVD method, the reaction chamber is heated at a temperature higher than or equal to 700° C. and lower than or equal to 800° C., and oxygen is introduced into the reaction chamber.

Abstract: A chemical decontamination apparatus of the present invention chemically dissolves radioactive substance-containing oxide films formed or adhering on the surface of a decontamination object by using ozone water to conduct decontamination. The chemical decontamination apparatus includes an ozone generating unit for generating ozone gas, an ozone supplying device for supplying the generated ozone gas to an ozone supplying unit in water, and a sintered metal element 37 which is disposed in the ozone supplying unit and to which ozone gas is supplied from the ozone supplying device. The ozone gas supplied to a sintered metal element interior from the ozone supplying device is allowed to flow out of the element into water so as to generate ozone water.

Abstract: A method and apparatus for cleaning a tubular member is disclosed. A storage device holds the tubular member in a finished form and a translation device passes the tubular member from the first storage device. A gas is supplied through the tubular member. A heating device heats the drawn tubular member and the gas passing through the tubular member to clean debris from inside the tubular member.

Abstract: A sustainable method and system for producing bio-fuels from citrus peels and the recovery of limonene and pectin prior to fermentation of the peel solids. In one embodiment a sustainable method and system for the concurrent recovery of limonene and pectin from citrus peels is disclosed. The peels are optionally zested, mixed with water and an acid, and then exploded in a jet cooker or a pressurized extruder. The exploded peels are transferred to a flash vessel where the remaining limonene and water vapor are separated into water and limonene. The pectin fraction is removed from the flash tank and extracted by centrifuge, precipitation and/or filtration. The remaining peel solids are fermented in an anaerobic digester which produces methane, ethanol, acids, CO2 or other end products which can be used as fuel for power generation equipment sufficient to supply the processing system for sustainable operations as described herein.

Abstract: A process flow exposing and cleaning contact surfaces employing a liquid cleaning agent such as flux to penetrate the interface between the glassy coats and the surface of metal and to delaminate the coats from the metal, and then, at elevated temperatures, to use the agent's vapor pressure to break up the glassy coats into smaller pieces. The glassy coats are prevented by their low density to penetrate into the molten solder. Finally, at ambient temperature, the floating filler debris is water-washed and rinsed away. Cleaning agents include low-viscosity liquids (oils) and flux, which do not decompose at elevated temperatures and are mixed with components operable to provide, at the elevated temperatures, the fumes for sufficient vapor pressure to break up and dislodge the coats from the metal contacts.

Abstract: Dishwashers and methods of control for operation of dishwashers are disclosed. The operation of the dishwasher can include a drying cycle which uses a steam generator to supply steam to heat a washing compartment. The steam can evaporate moisture on the dishes in the washing compartment. When a condition of the dishwasher is met, such as a temperature or operation time meeting a preset value, an exhaust fan may exhaust air from inside the washing compartment. The operation of the dishwasher can improve power consumption and dry dishes more efficiently.

Abstract: Selective non-catalytic reduction (SNCR) of pollutant remissions in a fossil fuel combustion furnace having water cannons installed therein for removing combustion incrustation is accomplished by using the water cannons intended for de-slagging by mixing a reagent with water and administering the mixture under high velocity and high blast flow rate to the interior of the furnace for reduction of pollutant emissions, such as NOx, with the water cannons. The water cannons may be switched from the SNCR function to a de-slagging function.

Abstract: A chandelier cleaning apparatus includes a tent-like enclosure made of a transparent plastic. In a first embodiment, the enclosure includes a main body having a flat top panel and a flat, imperforate bottom panel. A central aperture is formed in the top panel and a zipper extends from the central aperture to an outer periphery of the top panel so that the central opening is enlarged when the zipper is open. The chandelier passes through the central aperture when the zipper is open and is enclosed within the enclosure when the zipper is closed. A mist of hot water is sprayed onto the chandelier with a wand that extends though a small opening in the enclosure. The time required to clean a typical chandelier drops from hours to minutes, no chemicals are used, and the chandelier is touched only by the hot mist.

Abstract: A method for cleaning the surface of a silicon substrate, covered by a layer of silicon oxide includes: a) exposing the surface for 60 to 900 seconds to a radiofrequency plasma, generated from a fluorinated gas, to strip the silicon oxide layer and induce the adsorption of fluorinated elements on the substrate surface, the power density generated using the plasma being 10 mW/cm2 to 350 mW/cm2, the fluorinated gas pressure being 10 mTorrs to 200 mTorrs, and the substrate temperature being lower than or equal to 300° C.; and b) exposing the surface including the fluorinated elements for 5 to 120 seconds to a hydrogen radiofrequency plasma, to remove the fluorinated elements from the substrate surface, the power density generated using the plasma being 10 mW/cm2 to 350 mW/cm2, the hydrogen pressure being 10 mTorrs to 1 Torr, and the substrate temperature being lower than or equal to 300° C.

Abstract: According to one embodiment, a method for cleaning a semiconductor substrate comprises supplying water vapor to a surface of a semiconductor substrate on which a concave-convex pattern is formed while heating the semiconductor substrate at a predetermined temperature, cooling the semiconductor substrate after stopping the heating and the supply of the water vapor and freezing water on the semiconductor substrate, after freezing the water, supplying pure water onto the semiconductor substrate and melting a frozen film, and after melting the frozen film, drying the semiconductor substrate.

Abstract: A method and device for the pretreatment of polymer surfaces of components to be painted. At least one polymer surface of at least one component is preheated to a temperature that minimizes condensation on the component when the component is subsequently cleaned inside a pretreatment cell and then treated with an oxidizing flame. The cleaning of the polymer surface as well as the treatment of the polymer surface with an oxidizing flame are performed inside the same pretreatment cell.

Abstract: Imprint lithography system may provide for an energy source for solidification of material positioned between a template and a substrate. Additionally, the energy source and/or an additional energy source may be used to clean contaminants from the template and/or the substrate.

Abstract: A substrate cleaning method includes removing a foreign material attached to a substrate while preventing deterioration of the substrate and any film formed on or above the substrate. A cleaning gas at a pressure between 0.3 MPa and 2.0 MPa is sprayed towards a wafer W with attached foreign material 22 placed in a near-vacuum, producing clusters 21 made up of a multitude of gas molecules 20, and the clusters 21 collide with the wafer W without undergoing ionization.

Abstract: A vapor growth method includes: loading a wafer into a reaction chamber and placing the wafer on a support unit; heating the wafer with a heater provided below the support unit and controlling an output of the heater so that the wafer reaches a predetermined temperature; rotating the wafer and supplying process gas onto the wafer, thereby forming a film on the wafer; unloading the wafer from the reaction chamber; supplying etching gas into the reaction chamber and removing a reaction product deposited inside the reaction chamber by etching; and detecting an etching end point based on variation in a first temperature, which is a temperature on the support unit when the output of the heater is controlled to have a predetermined amount, or variation in the output of the heater, which is controlled so that the first temperature reaches a predetermined temperature.

Abstract: Provided is a method for cleaning the inside of a pressure tight container for a blasting treatment, wherein the inside of a pressure tight container can be cleaned for a short period of time after a blasting treatment.

Abstract: A method for removing hot gas deposits from a system via pressure pulses is provided. The method includes regulating a flow of a mixture of detonation fluid and oxidizer into an expansion chamber; and generating a detonation within the expansion chamber by igniting the mixture of detonation fluid and oxidizer in the expansion chamber producing a high-pressure wave, the high-pressure wave propagating along a fluid path of the system in a supersonic rate removing hot gas deposits in the fluid path while the system is in fired operation, the expansion chamber directing the high-pressure wave towards the fluid path of the system.

Abstract: A system for cleaning the interior surface of an oven appliance using heat and steam cycles is provided. More particularly, the present invention uses a heat cycle to break down water insoluble food residues into soluble materials that are then cleaned by a steam cycle. Following the steam cycle, the remaining food residues can be removed from the interior surface of the oven appliance.