Abstract: A method is provided for removing exposed seed layers in the fabrication of solder interconnects on electronic components such as semiconductor wafers without damaging the interconnects or underlying wafer substrate and with a high wafer yield. The solder interconnects are lead free or substantially lead free and typically contain Sn. An oxalic acid solution is used to contact the wafer after an etching step to remove part of the seed layer. The seed layer is typically a Cu containing layer with a lower barrier layer containing barrier metals such as Ti, Ta and W. The lower barrier layer remains after the etch and the oxalic acid solution inhibits the formation of Sn compounds on the barrier layer surface which compounds may mask the barrier layer and the barrier layer etchant resulting in incomplete barrier layer removal on the wafer surface. Any residual conductive barrier layer can cause shorts and other wafer problems and result in a lower wafer yield.

Abstract: A multilayered circuit component includes one or more substrates. A first surface of one of the substrates includes circuit paths and other current carrying elements. A second surface of the same or another substrate also includes circuit paths and other current carrying elements. An aperture extends through at least a portion of the one or more substrates. The aperture is defined by a first opening on the first surface, a second opening on the second surface, and an internal surface of the one or more substrates that extends between the first surface and the second surface. A first trace element is provided over a portion of the internal surface of the aperture to extend between the first surface and the second surface. The first trace element extends onto the first surface to form a first partial perimeter of the first opening. A second trace element is provided over a portion of the internal surface of the aperture to extend between the first surface and the second surface.

Abstract: A lead frame used for the production of a semiconductor package, wherein each of terminals of the lead frame to be wire-bonded to electrodes provided on the top surface of the semiconductor device has one or two groove(s) for limiting a plating area of noble metal. Since grooves are provided in each terminal, the accuracy of the plating area can be easily checked visually. Further, the grooves absorb stress applied to the terminal when the molded semiconductor packages are individually separated from each other by punching or dicing, and the situation where molding compound comes off of the terminal is prevented. In addition, since the grooves absorb vibrational stress applied to the terminal after mounting a semiconductor on the printed circuit board, the reliability of assembly is improved.

Abstract: A semiconductor device including a semiconductor element having external terminals at a first level and external electrodes at a second level, higher than the first level. The external terminals include power terminals, ground terminals and signal terminals formed on a main surface of the semiconductor element. The external electrodes include power electrodes connected to the power terminals via power connecting sections, ground electrodes connected to the ground terminals via ground connecting sections and signal electrodes connected to the signal terminals via signal connecting sections. One of the signal terminals, signal electrodes and corresponding signal connecting sections are surrounded by either the power connecting sections connecting the power terminals and power electrodes or by the ground connection sections connecting the ground terminals and ground electrodes.

Abstract: The present invention discloses a device for testing electrical characteristics of a chip, which is capable of verifying whether each chip can meet the requirement of the electrical specifications, and sort out the chips under the specifications. The invention utilizes a probe to contact the extension area of the under bump metallurgy to detect if the electrical characteristics of the chip can meet the requirement of the specifications. As the bumps on the chip do not actually contact the probe, the intact profile for the bumps on the chips can be assuredly kept so that the problem of voids existing in the melted bumps during reflow process can be avoided.

Abstract: One method of achieving the above subjects is by connecting one of electroconductive members 12, which are pre-connected to the top and bottom of a semiconductor chip 11 and have thermal conductivity, to an electroconductive member 13, which is used with the semiconductor chip 11 to constitute a laminated structure, in electrically insulated form on the same surface as the installation surface of the electroconductive member 13 so as to straddle the laminated structure constituted by the semiconductor chip 11 and the electroconductive member 13.

Abstract: A dual-gate MOSFET with metal gates and a method for setting threshold voltage in such a MOSFET is provided. The method comprises: forming a gate oxide layer overlying first and second channel regions; forming a first metal layer having a first thickness overlying the gate oxide layer; forming a second metal layer having a second thickness overlying the first metal layer first thickness; selectively removing the second metal layer overlying the first channel region; forming a third metal layer; establishing a first MOSFET with a gate work function responsive to the thicknesses of the first and third metal layer overlying the first channel region; and, establishing a second MOSFET, complementary to the first MOSFET, with a gate work function responsive to the combination of the thicknesses of the first, second, and third metal layers overlying the second channel region.

Abstract: Electronic component, in particular a chip, which can be electrically bonded by means of a plurality of contacts provided on the component to mating contacts provided on a carrier, each contact having a raised elastic base of a conductive material which is connected to a lead on the component side, and to which there is applied on the upper side a metallic cap-like contact covering, only partially covering the base.

Abstract: Aspects of the invention provide microelectronic device assemblies including microelectronic components wire bonded to substrates, and methods of forming such assemblies. In one embodiment of the invention, a microelectronic component includes a plurality of multi-layered bond pads. Each of the multi-layered bond pads includes a bond pad base (which may comprise aluminum), an outer bond layer (which may comprise gold), and an intermediate layer between the bond pad base and the outer bond layer. This microelectronic component may be wire bonded to a substrate, with the outer bond layer and the bonding wire both comprising the same metal (e.g., gold). The bonding wire may be reliably stitch bonded to the outer bond layer of the multi-layered bond pads, facilitating manufacture of low profile microelectronic device assemblies.

Abstract: A process is described for semiconductor device integration at chip level or wafer level, in which vertical connections are formed through a substrate. A metallized feature is formed in the top surface of a substrate, and a handling plate is attached to the substrate. The substrate is then thinned at the bottom surface thereof to expose the bottom of the feature, to form a conducting through-via. The substrate may comprise a chip having a device (e.g. DRAM) fabricated therein. The process therefore permits vertical integration with a second chip (e.g. a PE chip). The plate may be a wafer attached to the substrate using a vertical stud/via interconnection. The substrate and plate may each have devices fabricated therein, so that the process provides vertical wafer-level integration of the devices.

Abstract: A device including a chip, and a resin package sealing the chip, the resin package having resin projections located on a mount-side surface of the resin package. Metallic films are respectively provided to the resin projections. Connecting parts electrically connect electrode pads of the chip and the metallic film.

Abstract: In one embodiment, an integrated circuit package includes a die associated with an integrated circuit and a die pad. The die has a bottom surface, and the pad has a top surface opposite the bottom surface of the die. Two or more bump pad traces are each coupled to the top surface of the pad, and one or more other traces are each coupled to the top surface of the pad in a corresponding inter-bump pad region between adjacent bump pad traces. A number of solder bumps each couple the die to the pad at a corresponding bump pad trace to provide electrical connectivity between circuitry associated with the die and circuitry associated with the die pad. Each inter-bump pad region is free from any solder mask material deposited to control collapse of the die towards the pad during a reflow process for bonding the die to the pad using the bumps, a supporting structure that contacts the die during the reflow process having been used instead.

Abstract: A multilayer switching assembly for switching high frequency signals has MEMS structures on a ceramic substrate having a top surface, a bottom surface and a plurality of insulating layers. The insulating layers are separated by a first conductor and a second conductor. The first conductor is connected to a ground potential. The second conductor is separated from the first conductor by one of the insulating layers. The second conductor presents a specific impedance (50 ohms) with respect to the first conductor to high frequency signals traveling on the second conductor. 64 MEMS structures are mounted on the top surface. Each MEMS has an input, an output, and a control. The input connected to the second conductor. The output is connected to a coplanar waveguide placed on the top surface. The control is connected to the bottom surface. The input to each MEMS is electrically shielded from the output and from the control by a third conductor connected to the first (grounded) conductor.

Abstract: To minimize a size of a semiconductor device and reduce a thickness thereof as well as improve the yield and lower the production cost in the production of a semiconductor package, a multi-layered semiconductor device is provided, wherein a film-like semiconductor package (10) incorporating therein a semiconductor chip (12) is disposed in a package accommodation opening (11a) of a circuit pattern layer to form a circuit board. A plurality of such circuit boards are layered together to electrically connect circuit patterns (13) of the circuit boards with each other via a low melting point metal (14) or lead beam bonding (13b).

Abstract: A chip-type semiconductor light-emitting device includes a semiconductor light-emitting chip connected to a pair of electrodes formed on a substrate. The semiconductor light-emitting chip is molded, together with respective parts of the electrodes, by resin. The electrode has a layered structure having a Cu layer, an Ni layer and an Au layer in that order from the lowermost layer, to have a step formed inside the mold by changing the wall thickness of the Cu layer.

Abstract: A wafer bump fabrication process is provided in the present invention. A wafer with multiple bonding pads and a passivation layer, which exposes the bonding pads, is provided. The surface of each bonding pad has an under bump metallurgy layer. A patterned photoresist layer with a plurality of opening is formed which openings expose the under bump metallurgy layer. Afterwards a curing process is performed to cure the patterned photoresist layer. Following a solder paste fill-in process is performed to fill a solder paste into the openings. A reflow process is performed to form bumps from the solder paste in the openings. The patterned photoresist layer is removed.

Abstract: A semiconductor package and a fabrication method thereof can enhance adhesion between a solder and a package body by employing an irregular metal pattern, and improve stability. The semiconductor package includes a semiconductor substrate; a plurality of chip pads separately formed on an upper surface of the semiconductor substrate; an irregular metal pattern electrically connected to the plurality of chip pads; and an external terminal electrically connected to the metal pattern. In addition, a method of fabricating the semiconductor package includes the steps of separately forming a plurality of chip pads on an upper surface of a semiconductor substrate; forming an irregular metal pattern electrically connected to the plurality of chip pads; and forming an external terminal electrically connected to the metal of chip pads; and forming an external terminal electrically connected to the metal pattern.

Abstract: An implementing method for buffering devices is provided, so as to dispose the buffering devices on a chip. The chip includes a signal source root and the number X of output bonding pads, in which the number X is a positive integer. The implementing method of the present invention includes (a) implementing a buffering device for the Nth layer at a location close to the middle place between two output bonding pads, and electrically connecting each one of the output bonding pads to the corresponding one of the buffering devices for the Nth layer, respectively. (b) A buffering device for the N+1th layer is implemented at a location close to the middle place between two buffering devices for the Nth layer, and each one of the buffering devices for the Nth layer is electrically connected to the corresponding one of the buffering devices for the N+1th layer, respectively. Then, the number of the buffering devices for the N+1th layer is judged whether or not to be 1.

Abstract: A system and method of assembling a ball grid array (BGA) package with IC die support is described. A stiffener is attached to a substrate that includes a centrally located opening with an integrated circuit (IC) die support structure removably held therein. An IC die is mounted to a central region of the stiffener. Further assembly process steps may be performed on the BGA package with IC die support. The IC die support structure is removed from the centrally located opening. In aspects of the invention, the IC die support structure is removably held in the opening by an adhesive tape or by one or more substrate tabs.

Abstract: An IC (semiconductor device) comprises a package substrate provided on its face side with a plurality of wiring patterns such as electrode lands and wirings and provided on its back side with a plurality of electrode bumps corresponding to the wiring patterns, an IC chip mounted on the face side of the package substrate in a face-up manner, a sealing resin sealing the IC chip, and an indication provided on the back side of the package substrate for indicating the position of the IC chip. A method of inspecting a failure reason in the case of some failure of the IC chip comprises the steps of forming an opening by removing from the back side the package substrate in the region surrounded by the indication, mounting the IC chip on a test substrate, passing an electric current to the IC chip for operation, and inspecting and analyzing the reason of failure by a photo-emission analyzing method.

Abstract: The present invention provides a small-sized and inexpensive semiconductor device wherein a synchronous dynamic random access memory and a flash memory are built in a single encapsulater. A flash memory chip and a synchronous dynamic random access memory chip (SDRAM chip) are fixed to a main surface of a wiring board in a parallel state, and another SDRAM chip is fixed onto the flash memory chip. Electrodes for the respective semiconductor chips are respectively exposed and these electrodes are connected to their corresponding electrodes of the wiring board. An encapsulater formed of an insulating resin is formed on the main surface side of the wiring board so as to cover wires. Since the encapsulater is formed by cutting a block encapsulater formed by block molding by dicing, the side faces of the encapsulater result in cut surfaces. Bump electrodes are provided on the back surface of the wiring board in an array fashion.

Abstract: A manufacturing method of an electrode structure and a thin-film structural body, which can remove a sacrifice film without removing other insulating films. An anchor hole which provides an opening to the surface of a wiring is covered with a sacrifice film and a nitride film. The anchor hole is constituted by a hole section formed in the nitride film and an opening of the sacrifice film. The hole section is opened to enter the wiring inward from an edge of the surface of the wiring by a first predetermined distance. The opening is opened to retreat from the hole section by a second predetermined distance. The existence of the first and second predetermined distances makes it possible to lengthen the entering distance to the oxide film of etchant to be used for removing the sacrifice film.

Abstract: A semiconductor device with under bump metallurgy (UBM) and a method for fabricating the semiconductor device are provided, wherein a passivation layer is deposited on a surface of the semiconductor device where a plurality of bond pads are disposed, and formed with a plurality of openings for exposing the bond pads. A first metal layer is deposited over part of each of the bond pads and a portion of the passivation layer around the bond pad; then, a second metal layer is formed over the first metal layer and part of the bond pad uncovered by the first metal layer; subsequently, a third metal layer is formed over the second metal layer to thereby fabricate a UBM structure. Finally, a solder bump is formed on the UBM structure so as to achieve good bondability and electrical connection between the solder bump and UBM structure.

Abstract: It is possible to prevent deterioration of a soldering portion and improve strength of thermal fatigue resistance by providing barrier metal layers on at least one of lead and land to cover parent materials comprising Cu-containing materials, feeding a soldering material between the lead and the land and allowing to contact in a fused condition with barrier metal layers and solidify, and thus soldering together the lead and the land.

Abstract: A non-leaded semiconductor package and method of fabricating the same is proposed, which can be used for the fabrication of a non-leaded type of semiconductor package, such as a CQFN (Carrierless Quad Flat No-lead) package. The proposed semiconductor packaging technology is characterized by the use of a metal plate as provisional chip carrier during fabrication and by the use of RDL (Redistribution Layer) technology to provide internal electrical interconnections between the I/O pads of the packaged chip and the non-leaded external electrical contacts. These features allow the fabrication of the CQFN package to be implemented without the use of bonding wires for internal electrical connections and without the use of substrate as a permanent chip carrier.

Abstract: The present invention is to provide a power semiconductor device including a heat radiator having a principal surface and an insulating substrate bonded on the principal surface of the heat radiator via a first solder layer. The power semiconductor device also includes at least one semiconductor chip mounted on the insulating substrate via a second solder layer. The insulating substrate has a thin-layer and thick-layer edges, and is bonded on the principal surface of the heat radiator so that the first solder layer has a thickness thinner towards a direction from the thin-layer edge to the thick-layer edge (T1>T2). Also, the semiconductor chip is mounted on the insulating substrate so that a first distance between the thick-layer edge and the semiconductor chip is less than a second distance between the thin-layer edge and the semiconductor chip (L1<L2).

Abstract: There are provided a high density and low manufacturing cost wiring board with high reliability in connection, a semiconductor device and a producing method therefor. The invention relates to a wiring board comprising a board having an electrode and being coated with an insulation layer with a hole for exposing the electrode; a wiring consisting of a Cr or Ti layer, which is connected to the electrode and closely contacts with the insulation layer, and of a Cu layer which is closely contacts with the Cr or Ti layer; a protective film which covers the wiring and is provided with another hole for soldering; and a solder for the outer connection which is mounted in the both holes and brought to diffuse into the Cu layer to produce an alloy, and brought to reach the Cr or Ti layer thereby connecting the solder to the Cr or Ti layer.

Abstract: On a surface of an electronic component facing a substrate, a plurality of electrode terminals are provided which are of circular plane shapes. On regions of the main surface of the substrate facing the electrode terminals, a plurality of interconnect electrodes are provided which are of circular plane shapes.

Abstract: The invention is a semiconductor device and method of fabricating the device. The device includes a semiconductor substrate with an active region, and a low dielectric constant insulating layer formed over the substrate. An additional insulating layer is formed over the low dielectric constant layer by a low temperature deposition, such as ion beam assistance deposition. A metal layer can then be formed over the additional layer using lift-off techniques. The metal layer can be patterned to form a bond pad which may be displaced from the area over the active region. Wire bonds can be made on the bond pad using ultrasonic energy.

Abstract: A semiconductor device has multiple through electrodes with the same cross-sectional area extending through a semiconductor chip linking its front to back surface. The number of electrodes used is determined in accordance with the magnitude of the electric current for the same signal. Hence, a semiconductor device and a chip-stack semiconductor device are provided which are readily capable of preventing the electrodes' resistance from developing excessive voltage drop, heat, delay, and loss, and also from varying from one electrode to the other.

Abstract: A semiconductor package production method in which the semiconductor package is produced by having via holes for electrically connecting top and bottom surfaces of a double-sided copper clad substrate and cutting the substrate. The production method includes the steps of: forming wiring patterns between the top and bottom surfaces of the double-sided copper clad substrate; forming via holes each connecting the top and bottom surfaces of the substrate; attaching semiconductor chips on the wiring patterns; sealing an entire body of the substrate with resin; and cutting the substrate on a line which separates the via hole into half, thereby separating the semiconductor packages from one another. Each via hole has an oval shape in top view which is created by forming two or more circular holes partially overlapped with one another on a horizontal surface of the substrate.

Abstract: In a semiconductor device, a lead frame is adhered to a base substrate for heat dissipation via an insulating layer, and an outward guided terminal portion is formed by perpendicularly upwardly bending an end of the lead frame after the mounting of one or more of power semiconductor elements on the lead frame. A recessed portion is formed beforehand in a portion of the lead frame to be bent, and it is ensured that the lead frame does not adhere to the surface of the base substrate in this recessed portion when the lead frame is adhered to the base substrate via the insulating layer before the bending of the lead frame. By virtue of this structure, manufacturing is simplified and manufacturing costs are reduced.

Abstract: Degradation of organic-doped silica glass low-k inter-layer dielectrics during fabrication is significantly reduced and resolution of submicron features is improved by the formation of dual nature capping/ARC layers on inter-layer dielectric films. The capping/ARC layer is formed in-situ on the organic-doped silica glass inter-layer dielectric. The in-situ formation of the capping/ARC layer provides a strongly adhered capping/ARC layer, formed with fewer processing steps than conventional capping and ARC layers.

Abstract: Parts of pad electrodes formed on an interconnection board so as to correspond to bump electrodes of a semiconductor pellet that neighbor parts superposed with the bump electrodes are caused to extend in substantially the same direction, and ultrasonic vibration is applied in this extension direction so as to make a connection between the pad electrodes and the bump electrodes.

Abstract: Aspects of the invention provide microelectronic device assemblies including microelectronic components wire bonded to substrates, and methods of forming such assemblies. In one embodiment of the invention, a microelectronic component includes a plurality of multi-layered bond pads. Each of the multi-layered bond pads includes a bond pad base (which may comprise aluminum), an outer bond layer (which may comprise gold), and an intermediate layer between the bond pad base and the outer bond layer. This microelectronic component may be wire bonded to a substrate, with the outer bond layer and the bonding wire both comprising the same metal (e.g., gold). The bonding wire may be reliably stitch bonded to the outer bond layer of the multi-layered bond pads, facilitating manufacture of low profile microelectronic device assemblies.

Abstract: The present invention relates to a lead frame for semiconductor devices having an outer lead part improved in solder wettability which comprises i. a substrate comprising an alloy comprising at least one member selected from the group consisting of nickel, copper, iron and (nickel and copper and iron), ii. an inner lead part having a surface treated layer A, the surface treated layer A comprising silver or an alloy comprising silver, and iii. an outer lead part having a surface treated layer B, the surface treated layer B comprising silver and tin, or copper and tin, wherein the surface treated layer B has on its surface an oxidized layer comprising tin and oxygen, the atomic ratio of oxygen to tin in the oxidized layer is 0.5-1.8 and the thickness of the layer is not more than 20 nm.

Abstract: A solder bump structure and a method for forming the same are disclosed. Over a contact pad a first and a second metal film are deposited, wherein the second metal film is patterned prior to the deposition of a solder bump material such that an opening isolates an inner region of the second metal film from an outer region of the second metal film. The solder material deposited on the inner region and, at least partially, in the opening serves as an etch stop for a subsequent removal of the outer region.

Abstract: A flip chip ball grid array package includes a thin die having a die thickness reduced from a wafer thickness to reduce mismatch of a coefficient of thermal expansion between the thin die and a substrate; a plurality of thin film layers formed on the thin die wherein each of the plurality of thin film layers has a coefficient of thermal expansion that is greater than that of the thin die and is less than that of the substrate; and a plurality of wafer bumps formed on the thin die for making electrical contact between the thin die and the substrate.

Abstract: Described herein is a stacked package according to the present invention, wherein a plurality of tape carriers which seal semiconductor chips, are multilayered in upward and downward directions. In the stacked package, one ends of leads formed over the whole surfaces of each tape carrier are electrically connected to their corresponding connecting terminals of the semiconductor chip. Other ends of the leads are electrically connected to their corresponding through holes defined in the tape carrier. Connecting terminals common to the plurality of semiconductor chips are formed at the same places of the plurality of tape carriers and withdrawn to the same external connecting terminals through a plurality of mutually-penetrated through holes.

Abstract: The invention provides a film carrier tape for mounting electronic devices thereon, which film carrier tape enables reliable formation of a predetermined wiring pattern in a pattern-forming region and lower production cost. The film carrier tape of the present invention for mounting electronic devices thereon, including an insulating film serving as a tape substrate, and a wiring pattern formed of a conductor layer provided on a surface of the insulating film, the insulating film having a plurality of sprocket holes provided along respective side of longitudinal edges of the wiring pattern, wherein the shortest distance between said sprocket holes and corresponding edges of said wiring pattern is less than 0.7 mm. Thus, production cost of the film carrier tape can be reduced. The invention also provides a method of manufacturing the film carrier tape.

Abstract: Arrangements are used for minimizing signal path discontinuities.

Abstract: Novel interconnect structures possessing a relatively low internal stress and dielectric constant for use in semiconductor devices are provided herein. The novel interconnect structures comprise a first layer having a coefficient of thermal expansion greater than about 20 ppm and a first internal stress associated therewith, the first layer having a first set of metallic lines formed therein; a second layer having a coefficient of thermal expansion less than about 20 ppm and a second internal stress associated therewith, the second layer having a second set of metallic lines formed therein; and one or more stress adjustment cap layers formed between the first layer and the second layer, the cap layer(s) having a third internal stress to offset the first stress of the first layer and the second stress of the second layer and inducing a favorable relief of stress on the interconnect structure. Methods for making a semiconductor device having a substantially reduced internal stress are also provided.

Abstract: A light-emitting diode with which the LED chip will not be destroyed comprises an LED chip 40 mounted on plate-shaped wiring means 60 inside a light-emitting diode. Wiring means 60 comprises conductive paths 61 and 62 that electrically lead to a pair of opposing surfaces. The top surface is used for mounting the LED chip. Part of the conductive paths 61, 62 are connected electrically to LED chip 40, extending from the position where the LED is mounted to leads 21 and 22, to which they are connected by soldering. LED chip 40 is supported by being held inside concave part 23 in one lead 21 at this time.

Abstract: A bump is formed at a predetermined position on a surface of a semiconductor wafer and a sealing resin is formed so as to cover the surface and to make a surface of the bump exposed. Then, a reinforcing plate is bonded to the sealing resin and the exposed surface of the bump through an adhesive, and a rear portion of the semiconductor wafer is ground using a grind stone or removed by wet etching. Then, the rear surface of the thinned semiconductor wafer is covered with another sealing resin.

Abstract: Described herein is a stacked package according to the present invention, wherein a plurality of tape carriers which seal semiconductor chips, are multilayered in upward and downward directions. In the stacked package, one ends of leads formed over the whole surfaces of each tape carrier are electrically connected to their corresponding connecting terminals of the semiconductor chip. Other ends of the leads are electrically connected to their corresponding through holes defined in the tape carrier. Connecting terminals common to the plurality of semiconductor chips are formed at the same places of the plurality of tape carriers and withdrawn to the same external connecting terminals through a plurality of mutually-penetrated through holes.

Abstract: A chip-size semiconductor package includes a semiconductor chip; a metal pad formed on the semiconductor chip; a wafer coat formed over the semiconductor chip; a conductive wiring pattern formed on the wafer coat, in which the metal pad is electrically connected to the conductive pattern; a molding resin formed over the conductive wiring pattern; a conductive post which is formed in the molding resin and is connected to the conductive wiring pattern; and a terminal which is formed on the molding resin and is connected to the conductive post. A connecting portion (boundary portion) of the conductive wiring pattern and conductive post is provided with a slit to disperse stress to be applied to the connecting portion.

Abstract: An IGFET (40 or 42) has a channel zone (64 or 84) situated in body material (50). Short-channel threshold voltage roll-off and punchthrough are alleviated by arranging for the net dopant concentration in the channel zone to longitudinally reach a local surface minimum at a location between the IGFET's source/drain zones (60 and 62 or 80 and 82) and by arranging for the net dopant concentration in the body material to reach a local subsurface maximum more than 0.1 &mgr;m deep into the body material but not more than 0.4 &mgr;m deep into the body material.

Abstract: In a semiconductor device, a lead frame is adhered to a base substrate for heat dissipation via an insulating layer, and an outward guided terminal portion is formed by perpendicularly upwardly bending an end of the lead frame after the mounting of one or more of power semiconductor elements on the lead frame. A recessed portion is formed beforehand in a portion of the lead frame to be bent, and it is ensured that the lead frame does not adhere to the surface of the base substrate in this recessed portion when the lead frame is adhered to the base substrate via the insulating layer before the bending of the lead frame. By virtue of this structure, manufacturing is simplified and manufacturing costs are reduced.

Abstract: A semiconductor package including a bottom leadframe having a bottom plate portion and a first terminal extending from the bottom plate portion, and a second terminal being co-planar with the first terminal. The semiconductor package also comprises a semiconductor power enhancement mode JFET die having a bottom surface and a top surface on which a first metalized region and a second metalized region are disposed. The bottom surface of the JFET die is coupled to the bottom plate of the leadframe. The semiconductor package also comprises a copper plate coupled to and spanning a substantial part of the first metalized region, and at least one beam portion sized and shaped to couple the copper plate portion to the second terminal such that it is electrically coupled to the source.

Abstract: There are provided a high density and low manufacturing cost wiring board with high reliability in connection, a semiconductor device and a producing method therefor.The invention relates to a wiring board comprising a board having an electrode and being coated with an insulation layer with a hole for exposing the electrode; a wiring consisting of a Cr or Ti layer, which is connected to the electrode and closely contacts with the insulation layer, and of a Cu layer which is closely contacts with the Cr or Ti layer; a protective film which covers the wiring and is provided with another hole for soldering; and a solder for the outer connection which is mounted in the both holes and brought to diffuse into the Cu layer to produce an alloy, and brought to reach the Cr or Ti layer thereby connecting the solder to the Cr or Ti layer.