Abstract: A method for inspection of a sample includes irradiating the sample with a beam of X-rays and measuring a distribution of the X-rays that are emitted from the sample responsively to the beam, thereby generating an X-ray spectrum. An assessment is made of an effect on the spectrum of a non-uniformity of the beam, and the spectrum is corrected responsively to the effect.

Abstract: A void or particle content is determined using the X-ray small angle scattering measurement for a sample made of a thin film having voids or particles disorderly dispersed in the matrix, the diffraction peaks being not available for such a sample. The invention includes three aspects. The first aspect is that an equipment constant is determined and an unknown void or particle content is calculated based on the equipment constant. The second aspect is that a plurality of samples having unknown matrix densities are prepared, the matrix densities are determined so that differences in the matrix densities among the samples become a minimum, and a void or particle content is calculated based on the matrix density and the scale factor of the X-ray small angle scattering. The third aspect is for a plurality of samples having unknown particle densities, and executes procedures similar to those of the second aspect.

Abstract: An improved short-wavelength microscope is described in which a specimen sample is placed between a condenser zone plate lens and an objective zone plate lens so that the specimen is aligned with a diffraction order of the condenser zone plate lens that is greater than one and proximal to the condenser zone plate.

Abstract: A method is disclosed for scattered radiation correction in X-ray imaging, and an X-ray imaging system is disclosed for carrying out the method. In at least one embodiment of the method, measurement signals t from an X-ray detector are digitized and converted to logarithmic form, with these measurement signals t having been obtained by radiation through an examination object by the X-ray detector. Correction values which have been obtained from a series development of a logarithm 1n(1?s/t) are subtracted from the measurement signals that have been converted to logarithmic form, with this series development being terminated at the earliest after the first order, where s denotes a previously determined scattered radiation signal from radiation passed through the examination object. At least one embodiment of the method and the associated X-ray imaging system allow scattered radiation to be corrected for with increased accuracy, on the basis of measurement signals that had been converted to logarithmic form.

Abstract: A method of producing an active material for a lithium secondary battery, by which impurities causing problems in synthesizing an active material for a lithium secondary battery, including a lithium transition metal oxyanion compound are removed efficiently and enhancement of an energy density is realized, is provided. By cleaning the active material for a lithium secondary battery, including a lithium transition metal oxyanion compound, with a pH buffer solution, for example, it is possible to efficiently remove just only impurities such as Li3PO4 or Li2CO3, or a substance, other than LiFePO4, in which the valence of Fe is bivalent such as FeSO4, FeO or Fe3(PO4)2 without dissolving Fe of LiFePO4.

Abstract: The invention relates to a computed tomography method in which an examination zone is irradiated along a circular trajectory by a fan-shaped radiation beam. Radiation coherently scattered in the examination zone is measured by a detector unit, the variation in space of the scatter intensity in the examination zone being reconstructed from said measuring values. Reconstruction is performed by back projection in a volume which is defined by two linearly independent vectors of the rotational plane and a wave vector transfer.

Abstract: A method for producing X-ray optics includes providing a wafer of crystalline material having front and rear surfaces and a lattice spacing suitable for reflecting incident X-rays of a given wavelength. A thin film is deposited on the front surface of the wafer so as to generate compressive forces in the thin film sufficient to impart a concave curvature to the rear surface of the wafer with at least one radius of curvature selected for focusing the incident X-rays.

Abstract: A system for detecting contraband. A container is scanned with a first type of contraband detection apparatus. Based on results of the first scan, a plurality of risk values, which correspond to particular types of contraband, are generated. The container is then scanned with a second type (and/or a third type) of contraband detection apparatus. Based on the results of the second scan (and/or the third scan), the risk values are modified.

Abstract: A system and method for monitoring a surface or interfacial area. The system and method includes an intense X-ray beam directed to a surface or interface at a low angle to achieve specular reflection with phase contrast associated with an event, such as changing topography, chemistry or magnetic state being detected by a CCD. Upstream or downstream processing can be carried out with the X-ray phase contrast system.

Abstract: The polarization and diffraction characteristics of x-rays incident upon a magnetic material are manipulated to provide a desired magnetic sensitivity in the material. The contrast in diffracted intensity of opposite helicities of circularly polarized x-rays is measured to permit separation of magnetic signals by element type and by atomic environment. This allows for the direct probing of magnetic signals from elements of the same species in nonequivalent atomic environments to better understand the behavior and characteristics of permanent magnetic materials. By using known crystallographic information together with manipulation of the polarization of x-rays having energies tuned near element-specific electronic excitations and by detecting and comparing the incident and diffracted photons at the same frequency, more accurate magnetic measurements can be made over shorter observation periods.

Abstract: An x-ray mirror provides focusing and monochromatization while maintaining a high degree of reflectivity. The mirror has at least two mirror portions, one with a multilayer surface that provides the desired monochromating, and the other with a total external reflection surface. The multiple surfaces combine to provide the desired focusing of the x-rays from a source to a focus point. A variety of configurations may be used, each of which does the desired focusing and monochromatization with minimal energy loss. Relative positioning of the mirror portions may also allow for adjustment of the focus length.

Abstract: A micro collimator for compressing X-ray beams for use in a X-ray diffractometer is described, wherein said collimator has a channel means for providing a channel guiding said X-ray beams, said channel having a channel entrance portion and a channel exit portion. The object of the invention is to provide a micro beam collimator capable of being used in a conventional X-ray diffractometer with the Bragg-Brentano geometry, so as to enable the characterisation of very small sample regions without need of very large radiation sources (synchrotron). For solving this technical problem it is proposed to form the channel means by two opposite, polished, oblong plate means made of or coated with a material selected from the group consisting of the heavyweight metals and materials having total reflection properties comparable to those of the heavyweight metals.

Abstract: A method of analyzing patterns. The method comprises: receiving a first diffraction pattern; receiving a second diffraction pattern; receiving a third diffraction pattern; determining a similarity between the first and second diffraction patterns; determining a similarity between the first and third diffraction pattern; determining a similarity between the second and third diffraction pattern; and performing hierarchical cluster analysis on the first and second diffraction pattern based on the determined similarity.

Abstract: An X-ray examination method comprises setting a tube voltage of an X-ray tube to a tube voltage that makes an X-ray absorptance difference between a first X-ray propagation medium and a second X-ray propagation medium in an object become not more than 10%, applying an X-ray beam from the X-ray tube to the object while a tube voltage of the X-ray tube is set to the tube voltage, and detecting a transmitted X-ray image including an X-ray refraction image formed in a region along a contour of a boundary surface between the first X-ray propagation medium and the second X-ray propagation medium by refraction of the X-ray beam by the boundary surface in superimposition on an X-ray absorption image reflecting the X-ray absorbing power difference between the first X-ray propagation medium and the second X-ray propagation medium.

Abstract: A white X-ray generating means and an X-ray detecting means are respectively moved to a first position and a second position that are separated, X-ray intensities, for each energy, detected at respective positions by the X-ray detecting means are obtained as first data and second data, a third data, that is refraction-X-ray-only data, is obtained based on the difference between the first data and the second data, and data about fluorescent X-ray is obtained from the difference between the first or second data and the third data.

Abstract: A compact x-ray source includes an electron beam source with a metallic film on a diamond window. The metallic film, which may be copper or scandium, absorbs the electron beams and produces k-alpha x-rays. The diamond window is a single crystal of diamond with a crystallographic orientation to diffract the x-rays, thereby producing a monochromatic and well collimated x-ray beam. The orientation of the crystal lattice may be configured to produce multiple x-ray beams. A plurality of electron beam sources may also be used to generate multiple x-ray beams. A detector is used to receive the x-ray beam after it interacts with a sample to be measured.

Abstract: Apparatus for analysis of a sample includes a radiation source, which is configured to direct a beam of radiation along a beam axis to impinge on a target area on a surface of the sample. A detector assembly is configured to sense the radiation scattered from the sample. A beam control assembly includes a beam blocker, which has a lower side adjoining the surface of the sample, and which contains front and rear slits perpendicular to the lower side that together define a beam plane that contains the beam axis and passes through the target area. The front slit is located between the radiation source and the target area, and the rear slit is located between the target area and the detector assembly.

Abstract: A method for operating an X-ray or neutron-optical system and beam stop comprising an X-ray or neutron source (1) from which corresponding radiation is guided as a primary beam (2) to a sample (4) under investigation, with an X-ray or neutron detector (6) for receiving radiation diffracted or scattered from the sample (4), wherein the source (1), the sample and the detector are disposed substantially on one line (=z-axis) and wherein a beam stop (5; 31; 41) is provided between the sample and the detector whose cross-sectional shape is adjusted to the cross-section of the primary beam is characterized in that the beam stop is disposed to be displaceable along the z-direction for optimum adjustment of the amounts of useful and interfering radiation impinging on the detector.

Abstract: A phase-contrast x-ray computed tomography scanner, a monochromatic diffraction computed tomography scanner, a rotatable monochromatic diffraction computed tomography scanner, and a combination phase-contrast and monochromatic computed tomography scanner are provided. In addition, a method of identifying an unknown sample is provided.

Abstract: A void or particle content is determined using the X-ray small angle scattering measurement for a sample made of a thin film having voids or particles disorderly dispersed in the matrix, the diffraction peaks being not available for such a sample. The invention includes three aspects. The first aspect is that an equipment constant is determined and an unknown void or particle content is calculated based on the equipment constant. The second aspect is that a plurality of samples having unknown matrix densities are prepared, the matrix densities are determined so that differences in the matrix densities among the samples become a minimum, and a void or particle content is calculated based on the matrix density and the scale factor of the X-ray small angle scattering. The third aspect is for a plurality of samples having unknown particle densities, and executes procedures similar to those of the second aspect.

Abstract: A sample analysis system makes use of both X-ray diffraction analysis and Raman spectroscopy of a sample. The sample is part of a sample library that is mounted on an XYZ stage that allows each sample to be examined in turn, as the XYZ stage is moved to position successive samples to a sample location. The system components may be mounted on a goniometer to allow their repositioning. A video system may be used for optical examination of the sample, and a knife edge may be used to prevent X-ray radiation from reaching a sample adjacent to the sample positioned at the sample location. A controller may be used to automatically control the operation of the analysis components and the movement of the sample holder to as to allow automated analysis of all of the samples in the sample holder.

Abstract: A system and method for displaying graphical information indicative of a plurality of material characteristics for a portion of a part under test. Energy is directed at the selected portion of the part under test. Resultant energy is detected from the selected portion of the part under test and data representative of each of a plurality of material characteristics for the portion of the part under test is obtained based, at least in part, upon the detected energy. A plurality of graphs is formed based upon the obtained data. Each of the graphs has information indicative of a separate one of the plurality of material characteristics. The plurality of graphs is displayed discrete from each other in a manner that facilitates substantially simultaneous visual comparisons between the information contained in each of the plurality of graphs.

Abstract: An X-ray or neutron-optical analysis device comprising means for directing radiation from a source (1) onto a sample (2), and a detector (7) with n substantially identical detector elements (Di) which are disposed parallel, next to each other in a first direction x and which extend in strips in a second direction y, wherein i=1, . . .

Abstract: In a method for X-ray reflectance measurement in which an intensity of a reflected X-ray is observed for each incident angle, a measuring scale for the incident angle ? is corrected, before the reflectance measurement, using an analyzer crystal. In the corrective operation, the aperture width of the receiving slit is made wider than in the X-ray reflectance measurement, and the analyzer crystal is inserted in the reflection path, and then the reflected X-ray intensity is detected. In this condition, the incident angle ? of the incident X-ray to the sample surface can be determined accurately, and thus the measuring scale for the incident angle can be corrected. Thereafter, the analyzer crystal is removed from the reflection path, and the X-ray reflectance measurement for the sample surface is carried out.

Abstract: A system for analyzing a thin film uses an energy beam, such as a laser beam, to remove a portion of a contaminant layer formed on the thin film surface. This cleaning operation removes only enough of the contaminant layer to allow analysis of the underlying thin film, thereby enhancing analysis throughput while minimizing the chances of recontamination and/or damage to the thin film. An energy beam source can be readily incorporated into a conventional thin film analysis tool, thereby minimizing total analysis system footprint. Throughput can be maximized by focusing the probe beam (or probe structure) for the analysis operation at the same location as the energy beam so that repositioning is not required after the cleaning operation. Alternatively, the probe beam (structure) and the energy beam can be directed at different locations to reduce the chances of contamination of the analysis optics.

Abstract: A method and apparatus for analyzing a membrane structure by fitting simulated operation data to measured data obtained by X-ray reflectivity measurement to analyze the membrane structure. The analysis result obtained by the fitting can be prevented from falling into a local solution, so as to obtain an analysis result of the membrane structure with high accuracy. The method for analyzing a membrane structure for analyzing a structure of a membrane specimen having a single layer membrane or a multi-layer membrane by an X-ray reflectivity measurement, includes a step of simultaneously analyzing plural pieces of measured data obtained by measuring the membrane specimen under plural sets of measuring conditions different from each other in at least one of a resolution and a dynamic range.

Abstract: A method for inspection of a sample having a surface layer. The method includes acquiring a first reflectance spectrum of the sample while irradiating the sample with a collimated beam of X-rays, and processing the first reflectance spectrum to measure a diffuse reflection property of the sample. A second reflectance spectrum of the sample is acquired while irradiating the sample with a converging beam of the X-rays. The second reflectance spectrum is analyzed using the diffuse reflection property so as to determine a characteristic of the surface layer of the sample.

Abstract: X-ray detecting devices and apparatus for analyzing a sample using the same are disclosed. A disclosed X-ray detecting device has an X-ray detector to detect X-rays emitted from a sample. The X-ray detector includes a collimator to collimate the X-rays, an electron trap to remove electrons included in the collimated X-rays, a window to transmit the X-rays and defining an interior space of the X-ray detector, a crystal to receive the X-rays which pass through the window and to generate a corresponding electric current, a field effect transistor to generate a signal in response to the electric current, and a vacuum pump to create a vacuum within the interior of the X-ray detector containing the field effect transistor and the crystal to suppress noise associated with at least one of the crystal and/or the field effect transistor.

Abstract: A reconfigurable collimated radiation detector, system and related method includes at least one collimated radiation detector. The detector has an adjustable collimator assembly including at least one feature, such as a fin, optically coupled thereto. Adjustments to the adjustable collimator selects particular directions of travel of scattered radiation emitted from an irradiated object which reach the detector. The collimated detector is preferably a collimated detector array, where the collimators are independently adjustable. The independent motion capability provides the capability to focus the image by selection of the desired scatter field components. When an array of reconfigurable collimated detectors is provided, separate image data can be obtained from each of the detectors and the respective images cross-correlated and combined to form an enhanced image.

Abstract: An X-ray reflectance is measured with the use of an X-ray detector, which is not less than 107 cps in upper-limit counting rate and is not more than twenty cps in noise level, under the condition that a measuring time length per interval of scattering angle 2? is not more than fifty milliseconds, so that the measurement of one reflectance curve is completed in a short time as several seconds. In another aspect of the invention, the X-ray detector used is not less than 107 cps in upper-limit counting rate and is not more than 0.01 cps in noise level, and the measuring time length per interval is not less than a hundred seconds, so that the X-ray reflectance curve is obtained with not less than a nine-digit dynamic range. The X-ray detector may be an avalanche photo diode.

Abstract: Disclosed are an apparatus and a method for simultaneously measuring integrated reflectivity of X-rays with different orders of reflections in crystal. Continuous X-rays are incident into the crystal and reflection intensities of the X-rays reflected from the crystal with different orders of reflections are measured based on Bragg's law, thereby measuring reflectivity of X-rays with different orders of reflections.

Abstract: An X-ray analysis apparatus includes: an X-ray radiation unit that irradiates a sample with X-ray; an X-ray detection unit that detects X-ray emission from the sample; a unit that allows the X-ray detection unit to perform scanning operation for changing the angle of the X-ray detection unit with respect to the sample; and an image controller that displays information related to X-ray intensity detected by the X-ray detection unit and information related to a scanning angle of the X-ray detection unit as a 3D image. The image controller displays the 3D image simultaneously with the scanning operation of the X-ray detection unit. Further, simultaneously with the scanning operation of the X-ray detection unit, two or all of 1D, 2D, and 3D images are displayed in one screen. A measurement result starts being displayed as a 3D image before information related to all measurement results has been obtained.

Abstract: A system for analyzing a thin film uses an energy beam, such as a laser beam, to remove a portion of a contaminant layer formed on the thin film surface. This cleaning operation removes only enough of the contaminant layer to allow analysis of the underlying thin film, thereby enhancing analysis throughput while minimizing the chances of recontamination and/or damage to the thin film. An energy beam source can be readily incorporated into a conventional thin film analysis tool, thereby minimizing total analysis system footprint. Throughput can be maximized by focusing the probe beam (or probe structure) for the analysis operation at the same location as the energy beam so that repositioning is not required after the cleaning operation. Alternatively, the probe beam (structure) and the energy beam can be directed at different locations to reduce the chances of contamination of the analysis optics.

Abstract: Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a thin film characteristic and an electrical property of a specimen. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.

Abstract: A scanning line detector according to the present invention uses a detector with a linear arrangement of detection elements that is moved along a range of diffracted x-ray directions to collect data across a multidimensional detection area. The scanning line detector allows for the simulation of a two-dimensional detector system without the need for a two-dimensional detector. The detector may follow a desired path to simulate a desired shape, such as a cylinder. A slit may be included to limit the detector line width, and a scatter shield may be used to minimize noise from air-scattered x-rays. The detector may also use a specially designed monochromator for conditioning the diffracted x-rays. The detector may be rotatable about an axis parallel to a direction along which x-rays are diffracted, allowing it to be used in different orientations.

Abstract: An X-ray image radiographing system for radiographing a subject is provided with an X-ray source to emit X-rays; a digital X-ray detector to detect a digital X-ray image of the subject, wherein the subject is placed between the X-ray source and the digital X-ray detector in an arrangement to satisfy the following formulas so that an edge of the digital X-ray image is enhanced oven an edge-enhanced width: 0.1 m?R1?10 m, and 0.15 m?R2?10 m, where R1 is a distance between the X-ray tube and the subject and R2 is a distance between the subject and the digital X-ray detector. The digital X-ray detector has a pixel size almost equal to the half of the edge-enhanced width.

Abstract: The present invention provides an apparatus capable of X-ray imaging utilizing phase of X-rays. An X-ray imaging apparatus equipped with first and second diffraction gratings and an X-ray image detector are described. The first diffraction grating generates a Talbot effect and a second diffraction grating diffracts X-rays diffracted by the first diffraction grating. An image detector is provided to detect the X-rays diffracted by the second diffraction grating. In this manner, image contrasts caused by changes in phase of X-rays due to a subject arranged in front of the first diffraction grating or between the first diffraction grating and the second diffraction grating can be achieved.

Abstract: An x-ray metrology system includes an e-beam generator to cause a test sample to emit x-rays, x-ray optics for focusing the x-rays, and an x-ray imager to generate an image of the test sample from the focused x-rays. Because the x-ray imager provides a direct representation of the x-ray emission characteristics of the test sample, the resolution of a measurement taken using such a sensor is limited only by the resolution of the sensor (and any focusing optics), rather than by the amount of e-beam spread in the thin film. The x-ray imaging can be performed for object planes at the test sample that are not parallel to the test sample, thereby allowing vertical dimension data to be accurately generated by the x-ray imaging system.

Abstract: An X-ray crystal orientation measuring apparatus and a method thereof, for enabling to measure distribution of crystal orientations upon a crystal having the sub-grain structure, lineage structure, other than the single domain, with using X-ray, comprises, an XY stage 20 for mounting a crystal S to be measured thereon and being movable in X-Y directions, an X-ray generating device 50 for irradiating X-ray at a predetermined angle upon a measuring surface of the crystal to be measured on the stage, a high-sensitive two-dimensional detector 60 for detecting the diffraction image of X-ray, which is irradiated from the X-ray generating device upon the measuring surface of the crystal to be measured, and a control PC, wherein the control PC calculates out a central position of the diffraction image detected, from the detected screen, so as to calculate out the crystal orientation upon the measuring surface of the crystal to be measured.

Abstract: An X-ray analysis apparatus is disclosed, in which X-rays emitted from an X-ray source are applied to a sample and a two-dimensional CCD sensor detects the X-rays diffracted by the sample. The X-ray analysis apparatus has a 2?-rotation drive and a program. The 2?-rotation drive moves the two-dimensional CCD sensor. The program is executed to control the motion of the CCD sensor. The 2?-rotation drive rotates the CCD sensor around ?-axis that extends over the surface of the sample. The program synchronizes the transfer of charges in the CCD sensor with the motion of the CCD sensor driven by the 2?-rotation drive. Hence, data items for the same diffraction angle can be accumulated in the pixels of the two-dimensional CCD sensor. This achieves high-speed and high-sensitivity in detection of diffracted X-rays.

Abstract: Thin film thickness measurement accuracy in x-ray reflectometry systems can be enhanced by minimizing scattering and beam spreading effects. A reflectometry system can include an x-ray tube that can produce an x-ray beam having any cross-sectional shape by scanning an electron beam in an appropriate pattern over a target in an x-ray tube. For example, the electron beam can be scanned over the target in a pattern having a non-unitary aspect ratio, so that the x-ray beam is generated from a source region having a non-unitary aspect ratio. The elongation allows the beam direction dimension to be substantially reduced, without causing overheating of the target. By blocking portions of the x-ray beam focused on the thin film and generating reflectivity curves in increments, the effects of scattering can be minimized.

Abstract: The thickness of a thin film can be measured based on the X-ray diffraction method. An X-ray is allowed to be incident upon a surface of the thin film. An intensity of a diffracted X-ray is measured with the incident angle ? being changed to obtain a measured rocking curve. On the other hand, a theoretical rocking curve is calculated in consideration of an orientation density distribution function ? of the thin film. A scale factor is predetermined for a standard sample having a known film thickness. A parameter fitting operation is carried out in a manner that the characteristic parameter of the function ? and the film thickness t are adjusted so that the theoretical rocking curve including the scale factor can approach the measured rocking curve as closely as possible.

Abstract: Apparatus for analysis of a sample includes a radiation source, which is adapted to direct a converging beam of X-rays toward a surface of the sample. At least one detector array is arranged to sense the X-rays scattered from the sample as a function of elevation angle over a range of elevation angles simultaneously, and to generate output signals responsively to the scattered X-rays. The detector array has a first configuration in which the detector array senses the X-rays that are reflected from the surface of the sample at a grazing angle, and a second configuration in which the detector array senses the X-rays that are diffracted from the surface in a vicinity of a Bragg angle of the sample. A signal processor processes the output signals so as to determine a characteristic of the surface layer of the sample.

Abstract: A non-uniform density sample analyzing method for analyzing a distribution state of particle-like matter in a non-uniform density sample, where an actually measured X-ray scattering curve is an in-plane X-ray scattering curve obtained by in-plane diffraction measurement, and fitting between the in-plane X-ray scattering curve and the simulated X-ray scattering curve is performed. The value of the fitting parameter when the simulated X-ray scattering curve agrees with the in-plane X-ray scattering curve serves to indicate the in-plane direction distribution sate of the particle-like matter in the non-uniform density sample. This method can analyze the in-plane direction distribution state of the particle-like matter in the anisotropic non-uniform density sample easily and accurately. Its device and system are also disclosed.

Abstract: A method for inspection of a sample includes directing a beam of X-rays toward a sample and configuring an array of detector elements to capture the X-rays scattered from the sample. The sample is shifted in a direction parallel to the axis of the array between at least first and second positions, which positions are separated one from another by an increment that is not an integer multiple of the pitch of the array. At least first and second signals are generated by the detector elements responsively to the X-rays captured thereby while the sample is in at least the first and second positions, respectively. The first and second signals are combined so as to determine an X-ray scattering profile of the sample as a function of position along the axis.

Abstract: Disclosed herein is a sample-analyzing method, in which an incident beam slit is provided between an X-ray source and a sample, a receiving side beam slit is provided between the sample and an X-ray detector, the X-ray detector detects X-rays scattered again from the sample and coming through the receiving side beam slit when the sample is irradiated with the X-rays applied through the incident beam slit, and a value is measured from a value detected by the X-ray detector. In the method, a true value is measured from the value, by using a slit function representing an influence which the incident beam slit and receiving side beam slit impose on the detected value. The slit function is determined from an intensity distribution of the X-rays scattered again from the sample. The method obtains an accurate slit function in accordance with the structure of the optical system employed and can therefore analyze the sample with high precision.

Abstract: A double crystal analyzer linkage includes the fixed pivot point, a fixed pivot point shaft, and three sliding axis points constrained to allow only sliding motion along given linear, parallel paths. The three paths are arranged such that one path passes through the fixed pivot point shaft on a central path and the two remaining paths are on opposite sides and equidistant from the central path. Two diffracting devices (200, 200?) are mounted to axis points which traverse the outer paths (204, 204?). A right angle slide (210) constrains the two linear paths to only slide through a single axis point and constrains the two linear paths to be at right angles to each other. An inline slide constrains two paths to slide through a single axis point, and constrains the two paths to be parallel to each other. First (212) and second linkage (214) devices are connected to the right angle slide (210) and the two remaining axis points, and constrain the two diffracting devices (200, 200?) to remain parallel at all times.

Abstract: An apparatus for detecting properties of a sample. An electron beam generator produces an electron beam and directs the electron beam at a desired point on the sample. The sample thereby emits characteristic x-rays at takeoff angles. A collimator receives and parallelizes the x-rays and converts the takeoff angles of the x-rays to positional differences between the parallelized x-rays. A diffractor receives and deflects the x-rays. A position sensitive detector receives the deflected x-rays and detects the positional differences between the x-rays, and generates signals that are characteristic of the received x-rays. An analyzer receives the signals from the detector and determines the properties of the sample based at least in part on the positional differences between the x-rays.

Abstract: X-ray apparatus, consisting of a single X-ray tube which is adapted to generate X-rays and a first optic which is adapted to focus a first portion of the X-rays onto a region of a sample via a first beam path, thereby generating first scattered X-rays from the region. The apparatus also includes a second optic which is adapted to focus a second portion of the X-rays onto the region of the sample via a second beam path, different from the first beam path, thereby generating second scattered X-rays from the region. A detector assembly simultaneously collects the first and the second scattered X-rays.

Abstract: A system configured for measurement of a specimen is provided. The system includes an optical subsystem configured to perform measurements of the specimen. The optical subsystem includes a light source that is configured to generate light having a relatively large number of separated spectral peaks with substantially no continuous background. In some embodiments, the light may include vacuum ultraviolet light, extreme ultraviolet light, and/or soft x-rays. A carrier medium is also provided that includes program instructions executable on a computer system to analyze data generated by a detector of an optical subsystem by partitioning the data into individual peaks spaced apart across a wavelength spectrum. Partitioning the data preferably corrects for spectrum shift, drift, stretching, shrinking, or a combination thereof at the detector. The individual peaks correspond to separated spectral peaks in light generated by a light source of the optical subsystem.