Abstract: A clean gas circulates to pass through a loading area provided below a vertical heat treatment furnace. The clean gas unidirectionally flows through the loading area. After completion of wafer processing, a wafer boat lowers from the heat treatment furnace to the loading area, where the wafers are removed from the wafer boat. Subsequently, a clean gas jetting nozzle arranged in the loading area jets a clean gas toward the emptied wafer boat. Fragment of thin film which may readily peel off are blown away from the wafer boat, and are discharged out of the loading area together with the unidirectional flow. Thus, it is possible to avoid wafer contamination due to the unexpected peel-off of thin film fragments from the wafer boat.

Abstract: A wafer processing system has a wafer loading system accommodating sufficient wafer carriers to substantially maximize the processing speed capability of the processing system. Wafer carriers are placed into and removed from the loading system by one or two overhead carrier loading tracks. Carriers may be loaded or removed while other carriers are in work. One or more transfer robots may move wafers from the carriers to buffers. One or more process robots in a process module move wafers from buffers, or other locations, to processors in the process module.

Abstract: The invention is directed to a pod clamping unit for fixing a pod to a support table in a load port, the pod including a pod body capable of storing a wafer in the interior thereof and a lid, the load port having a pod opener that opens/closes the lid. The pod clamping unit includes a clamp portion that is provided on the support table and adapted to engage with a first engagement portion provided on a lower surface of the pod body to restrict upward movement of the pod relative to the support table, a restriction pin that is movable upwardly and downwardly relative to the support table and adapted to engage with a second engagement portion provided on the lower surface of the pod body to restrict movement of the pod in a disengaging direction that causes disengagement between the first engagement portion and the clamp portion, and a vertically driving portion that moves the restriction pin up to/down from the second engagement portion.

Abstract: Disclosed is a vertical type heat processing apparatus and a vertical type heat processing method, which can prevent fall down of the boat on a boat carrier mechanism to be caused by an external force, such as an earthquake or the like, by employing a simple structure, while taking a form of the two-boat system. The vertical type heat processing apparatus 1 includes a heating furnace 5 having a furnace port 5a, a cover 17 adapted to close the furnace port 5a, a pair of substrate holding tools 4 each adapted to hold multiple substrates W in a multistage fashion and configured to be placed on the cover 17 via a heat insulating mount 19, and a lifting mechanism 18 adapted to raise and lower the cover 17 so as to carry in and carry out each substrate holding tool 4 relative to the heating furnace 5. When one substrate holding tool 4 is in the heating furnace 5, the other substrate holding tool 4 is placed on a substrate-holding-tool table 22 for loading the substrates W thereon.

Abstract: A system adapted to exchange wafer carriers between an overhead transport mechanism and a platform is provided. The system employs a wafer carrier having at least one handle extending therefrom, an overhead transfer mechanism, a transporter coupled to the overhead transfer mechanism and adapted to move therealong and having a wafer carrier coupling mechanism adapted to couple to the at least one wafer carrier handle, a platform positioned below the overhead transfer mechanism such that wafer carriers traveling along the overhead transfer mechanism travel over the platform, and an actuator coupled to the platform and adapted so as to elevate the platform to an elevation wherein the loading platform may contact the bottom of a wafer carrier coupled to the overhead transfer mechanism.

Abstract: The present invention is a vertical heat processing apparatus comprising: a heat processing furnace having a furnace opening; a lid member for closing the furnace opening of the heat processing furnace; a first substrate holder and a second substrate holder, each of which is capable of holding a plurality of substrates in a tier-like manner and of being alternately placed on the lid member through a heat retention tube; an elevating mechanism that vertically moves the lid member to load one of the substrate holders into the heat processing furnace, and to unload the one of the substrate holders from the heat processing furnace; a holder table configured to be placed thereon the other of the substrate holders for transfer of the substrates, when the one of the substrate holders is in the heat processing furnace; and a holder conveying mechanism configured to convey the respective substrate holders between the holder table and the heat retention tube; wherein the holder table is provided with a holder gripping

Abstract: A photo spinner apparatus, including a spin coater for coating a plurality of wafers with photoresist, a bake device for hardening the photoresist coated by the spin coater, a developer for developing the photoresist hardened in the bake device, a transfer unit for transferring the plurality of wafers between the developer, the bake device, and the spin coater, and an indexer including a wafer carrier loader to vertically stack a plurality of wafer carriers into which the plurality of wafers transferred by the transfer unit are loaded.

Abstract: A running rail 9 and a second overhead vehicle 12 are arranged parallel to a running rail 7 for a first overhead vehicle 10 and closer to inspection devices 20 than the running rail 7. A buffer 14 is provided below the running rail 7. The overhead vehicle 12 conveys a cassette 40 between load ports 24 and the buffer 14. The overhead vehicle 10 conveys the cassette 40 between the buffer 14 and other positions. The present invention can deal with inspection devices or the like which have a high throughput by locally improving their conveying capability.

Abstract: A mount base is adapted to be fixed to a partition wall which is disposed between a stockyard for temporarily storing a wafer carrier which houses a wafer and a wafer processing device for processing the wafer. A wafer transfer window is provided on the mount base. A carrier stage has a table horizontally extended from a lower edge of the wafer transfer window and a carrier plate disposed on the table so as to support the wafer carrier and movable so as to transfer the wafer carrier to the processing device. A buffer stage has a buffer plate horizontally disposed below the table so as to temporarily store the wafer carrier.

Abstract: An article is conveyed from a load port 26a for a processing device 16 to a load port 26b for a processing device 20. An overhead buffer 28 is provided for each load port 26. An overhead travelling carriage 14 can freely deliver the article to the load port 26 or to the overhead buffer 28. The article can be conveyed directly between processing devices for different processes via inter-bay routes 6, 7. Only a short time is required for conveyance. It is unnecessary to provide stockers between the intra-bay routes 6, 7 and the inter-bay route 8.

Abstract: A combination of a FOUP (front opening unified pod) system and a reticle system utilized for the transport of wafers and a reticle system, the latter of which are used for transporting reticles from a first fabrication site to a further site at another location, and which provides for a unified system enabling the automated and trackable delivery of the reticles between these sites. Provided is a modified FOUP base structure, which is adapted to retain a reticle and to be able to employ existing equipment in a fabrication site which only necessitates a minimal modification of the equipment in order to render the latter universally adaptable to the combination of the systems.

Abstract: In one aspect, a substrate loading station for a processing tool includes plural load ports. Each load port is operatively coupled to the processing tool and has a mechanism for opening a substrate carrier. A carrier handler transports substrate carriers from a factory exchange location to the load ports without placing the carriers on any carrier support location other than the load ports. Numerous other aspects are provided.

Abstract: The present invention provides a substrate carrying and processing apparatus which is intended to reduce the size of the space for storing substrates in each substrate storing section as much as possible so as to downsize the apparatus and increase the number of substrates to be stored therein as well as to enhance the throughput. The substrate carrying and processing apparatus comprises a carrier block S1 which is adapted to position carriers 20 each receiving wafers W therein, a processing block S2 including processing units U1 to U4, 31 used for processing each wafer, a main arms A1 adapted to transfer each wafer to each processing unit, a rack unit U5 which is disposed between the carrier block and the processing block and able to store wafers to be processed, and a transfer arm D adapted to transfer each wafer to the rack unit.

Abstract: A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.

Abstract: A suspended platform is provided which can prevent an article from overturning and falling even when a great quake such as an earthquake occurs. The suspended platform is intended for an overhead traveling carriage which transfers an article having an abutting surface facing upward in a transfer direction on a horizontal plane and mounts the article on the suspended platform, the suspended platform including a tilt regulating part positioned, in relation to a receiving part on which the article is mounted, such that the tilt regulating part (i) does not touch the article when the article is transferred and mounted on the suspended platform, (ii) is above the abutting surface of the article when the article is transferred and mounted on the suspended platform, (iii) and regulates, by abutting the mounted article at the abutting surface, the tilt range of the article.

Abstract: A semiconductor processing system includes a casing forming a handling area. The handling area includes a main-process area and a pre-process area divided from each other and connected through an openable port. The main-process area and the pre-process area are connected to their own lines for vacuum-exhausting gas therefrom and their own lines for supplying an inactive gas thereinto and adjust pressure independently. A transfer port unit is disposed on the casing to place a transfer container that stores target objects. The transfer port unit allows the transfer container to open to the main-process area while maintaining an airtightness of the main-process area. The system includes a vertical batch main-processing apparatus. The system also includes a vertical batch pre-processing apparatus connected to the pre-process area and that performs a pre-process on the target objects and transforms a semiconductor oxide film on the target objects into an intermediate film.

Abstract: A substrate processing apparatus is provided. The apparatus has a casing, a low port interface and a carrier holding station. The casing has processing devices within for processing substrates. The load port interface is connected to the casing for loading substrates into the processing device. The carrier holding station is connected to the casing. The carrier holding station is adapted for holding at least one substrate transport carrier at the load port interface. The carrier holding station is arranged to provide a fast swap section for replacement of the substrate transport carrier from the carrier holding station.

Abstract: The present invention generally comprises an apparatus for transporting containers between a first transport system and a second transport system. In one embodiment, the first transport system comprises a ceiling-based conveyor and the second transport system comprises a floor-based conveyor. The present invention may further include storage shelves, preferably substantially horizontally aligned about a common vertical plane with a section of one of the transport systems. The transport system may be located either directly above the uppermost storage shelf or beneath the lowermost storage shelf in order to add storage capacity within the fab. A vertical module transports containers between the transport systems and the at least one storage shelf.

Abstract: An article transport facility comprises an article transporting mobile body movable along a moving path and having an article holding unit; an article support for article storage, the article support movable between an article transfer position for receiving an article from the holding unit of the mobile body and transferring the article to the holding unit, and an article storage position; and a operating device provided on the mobile body for moving the article support between the article storage position and the article transfer position when the mobile body is at an article transfer location corresponding to a location of the article support.

Abstract: The present invention comprises a stocker. The stocker comprises multiple container storage locations arranged in a horizontal array. The horizontal array of storage locations may be suspended from the facility ceiling or supported by the facility floor. The stocker may include one or more stocker robots for transporting a workpiece container within the stocker and/or to a material transport system. The stocker may also include features such as container elevators and conveyor loops.

Abstract: In a first aspect, a small lot size lithography bay is provided. The small lot size lithography bay includes (1) a plurality of lithography tools; and (2) a small lot size transport system adapted to transport small lot size substrate carriers to the lithography tools. Each small lot size substrate carrier is adapted to hold fewer than 13 substrates. Numerous other aspects are provided.

Abstract: The present invention generally comprises a tool load device for transferring a container between a container transport system and a processing tool. The tool load device may service a single load port or multiple load ports. Regardless, the tool load device is preferably located between the load port of the processing tool and the section of the container transport system passing the processing tool. The tool load device provides an improved method of moving containers between a conventional load port and, for example, a conveyor. In another embodiment, the tool load device is coupled with an x-drive assembly that moves the tool load device along a path that is substantially parallel to the container transport system passing in front of the load port—allowing the tool load device to service multiple load ports.

Abstract: A storage apparatus (1) stores a transported object (220) from a transporting carriage (110), which travels along a track (120) installed on or near a ceiling (210) while gripping the transported object. The storage apparatus is provided with a rack portion (30), on which the transported object is put; and a support member (10), whose upper end is supported by the track or ceiling and whose lower end supports the rack portion. The support member selectively has one of first and second shapes. The first shape allows the transporting carriage to put the transported object onto the rack portion at the predetermined position. The second shape allows the rack portion to move away from a position below the track.

Abstract: An automatic warehouse 8 is provided parallel to a running rail 4 for an overhead travelling carriage 6. Open shelves 16 each of which is open on its side are provided in a rack 10. According to the present invention, articles can be transferred directly to and from a shelf in the automatic warehouse.

Abstract: A system for processing semiconductor substrates includes a front-end with at least two vertical levels of input/output ports for transferring substrate cassettes into or out of the housing of the processing system. The front-end also includes at least one level of storage positions, e.g., two levels of storage positions, which can be disposed between the two vertical levels of the input/output ports. The two vertical levels of storage positions can each be provided with two storage positions and each of two levels of input/output ports can be provided with accommodations for two cassettes, allowing for a total of eight cassettes to be accommodated at the front-end of the processing system. Inside the housing of the processing system, interior storage positions can be provided adjacent a wafer handling chamber and spaced apart from a cassette store having rotary platforms for housing cassettes.

Abstract: A reticle rotatable rack is provided at an upper position, and a pod rotatable rack is provided at a lower position in a clean stocker. A clean gas is supplied downwardly. In the stocker, a pod transportation device and a reticle transportation device are elevated and lowered. Load ports, a pod opener, and the pod rotatable rack are connected by the pod transportation device. The pod opener and the reticle rotatable rack are connected by the reticle transportation device.

Abstract: Systems, tools, and methods are provided in which a first signal is transmitted from a tool to a Fab indicating that all substrates to be processed have been removed from a specific carrier and that the specific carrier may be temporarily unloaded from a loadport of the tool. A second signal is transmitted from the tool to the Fab indicating that the specific carrier may be returned to the tool. While the carrier is unloaded from the tool, other carriers may be loaded on the vacated loadport. Numerous other features and aspects of the invention are disclosed.

Abstract: Disclosed is a stocking system that effectively copes with contingencies such as a sudden increase in the number of units to be stocked or malfunctions that render a port disabled. The stocking system includes a plurality of input ports and output ports that are operated automatically, and in input/output port that is normally operated manually, but is configurable to be operated automatically in conjunction with the other input ports and output ports. The stocking system also includes a conversion controller for switching the input/output port between manual and automatic mode.

Abstract: When FOUPs (front opening unified pods) (80a, 80b) are mounted on shelves (111d, 121c), respectively, shelves (121a, 121b, 121c) are moved in the vertical direction by cylinders (127a, 127b, 127c), respectively. The FOUP (80b) is thereby moved above the FOUP (80a) to create a space (129), for ensuring a transport path (AR6) for the FOUP (80a). The FOUP 80a can therefore be transported to a shelf (141) without moving the FOUP (80b) to another shelf, achieving improved throughput of substrate processing.

Abstract: A device for temporarily loading, storing and unloading a container without deforming the container and affecting its contents. An enclosure (2) having struts (3) at both its left and right sides is provided. A support beam (4) of a transporter (10) that is provided with a pair of horizontal retaining fingers (13, 13) is attached in a vertically movable manner between the struts on the rear-surface side of the enclosure (2), and a plurality of horizontal shelves (20) is arranged between the struts on the rear-surface side of the enclosure with spaces (H) in a height direction of the container (19), the spaces being larger than the height dimension (h) of the container (19). Further, the retaining fingers (13, 13) of the transporter (10) are made to protrude toward the shelves (20) and the distance (L) between the pair of retaining fingers (13, 13) is made to be suitable for lifting the container.

Abstract: Apparatus of the invention for transporting substrates (3) comprises a mini-environment enclosure (1) that is movable and that can be coupled to a conditioning station (22). The mini-environment enclosure (1) includes a micropump (12) whose inlet is connected to an inside cavity (2) that is to contain the substrate (3) to be transported. An energy supply (16) is also provided in the mini-environment enclosure (1) to power the micropump (12). The mini-environment enclosure (1) comprises a peripheral shell (4) open to two opposite main faces (5, 6), and including a closable side opening (7). A first main wall (8) is fitted to close the first main face (5) in leaktight manner. A second main wall (9) is fitted and secured to close the second main face (6) in leaktight manner. The first and second main walls are disposed in planes parallel to the plane containing the substrate.

Abstract: A suspended type transporting carriage (16) is provided with: a gripping mechanism (22) for gripping a transported object (17); a hoisting mechanism (21) for hoisting the gripping mechanism; and a traveling mechanism (60), on which the hoisting mechanism is mounted in a suspended condition, for traveling on a rail (20) installed on or near a ceiling. The gripping mechanism is provided with (i) an elongating and contracting device (23) capable of horizontally elongating and contracting and (ii) a gripping device (24) disposed at a tip portion of the elongating and contracting device for selectively gripping the transported object.

Abstract: An improved apparatus and method is provided for storing semiconductor wafer carriers, and for loading wafers or wafer carriers to a fabrication tool. The apparatus preferably provides an elevated port for receipt of wafer carriers from an overhead factory transport, allows for local interconnection among a plurality of the inventive apparatuses, and enables independent loading of the factory load port and the tool load port. An inventive wafer handling method which divides a lot of wafers into sublots and distributes the sublots among tools configured to perform the same process is also provided.

Abstract: A coating apparatus has a stage module, a temperature regulating module which adjusts a temperature of a substrate to a set temperature, a coating module which applies a coating liquid to the temperature-regulated substrate, and a heating module which heats the coating-liquid applied substrate, arranged in a process section in order from an upstream end of transfer along a transfer path of the substrate, and has a dummy stage placed between the coating module and the heating module so that when by means of a substrate transfer mechanism which has an upper arm and a lower arm, provided one on the other and advanceable and retreatable independently of each other, substrates are transferred one by one from an upstream module to a downstream module in order by alternately operating the upper arm and the lower arm, that arm which performs transfer from the temperature regulating module to the coating module differ from that arm which receives a substrate from the heating module, that numbers are sequentially assig

Abstract: A substrate processing apparatus having a station for loading and unloading substrates from the apparatus, includes an aperture closure for sealing a loading and unloading aperture of the station, apparatus for removing a door of a substrate magazine and thus opening the substrate magazine, and for operating the aperture closure to open the aperture, and an elevator for precisely positioning the open substrate magazine along a vertical axis within a usable range of motion. The station may also include a sensor for mapping locations of the substrates, and a mini-environment for interfacing the station to a substrate processing system.

Abstract: A material supply device for diffusion furnaces includes a main body, a fixing pedestal mechanism, a transmission mechanism and a cover mechanism for a furnace door. The main body includes a base portion and a main rod. The base portion is mounted on the main rod and the main rod extends through the base portion. The fixing pedestal mechanism is mounted on the main rod and is pivotedly mounted on a fixing pedestal. The transmission mechanism is mounted on the base portion and has a transmission rod slidably mounted on the base portion. The cover mechanism for a furnace door is fixed on an end of the transmission rod which is far away from the main body and is turnablely mounted on a cover of the furnace door. Based on the above assemblies, the present invention runs smoothly and improves production quality.

Abstract: In a load port portion of a conventional clean device, it can happen that cleanliness is reduced by dust caused by wear of bellows and a lid is not separated by its weight from a main body. In order to solve such problems, a clean device is structured as follows: a lid of a clean box has a non-circular reception hole, a load port portion of the clean device has an opening/closing mechanism with a projection fittable in the receiving hole and has a buffer chamber, one end of bellows of the buffer chamber is connected to the bottom surface of the buffer chamber, and the other end of the bellows is fixed, on the outside of the buffer chamber, to raising/lowering means of a port door.

Abstract: An exposure apparatus for executing an exposure of a substrate to light via a mask. The apparatus includes a booth which stores the mask in an atmospheric pressure, a processing chamber in which the exposure is executed in a first vacuum pressure, a vacuum chamber, arranged between the booth and the processing chamber, stores the mask at a second vacuum pressure that is higher than the first vacuum pressure and is between 0.1 Pa and 100 Pa, a first load lock chamber, arranged between the booth and the vacuum chamber, through which the mask is transferred, in which the atmospheric pressure and the second vacuum pressure are replaceable, and a second load lock chamber arranged between the vacuum chamber and the processing chamber, through which the mask is transferred, in which the second vacuum pressure and the first vacuum pressure are replaceable.

Abstract: Provided is a complex sintering furnace to sequentially perform a bake-out process and a sintering process for molding ceramic products. The complex sintering furnace includes: a support frame; a pair of furnace bodies supported on the top of the support frame and having a built-in heat insulator covered by a disc-shaped cover; a pair of rails arranged under the support frame in parallel in a length direction along arrangement of the furnace bodies; a rotating base horizontally transferred along the rails and rotatably connected to bottoms of the furnace bodies when the rotating base is vertically transferred directly under the bottoms of the furnace bodies, the rotating base including a separately rotating setter mounted the top thereof; and an ascending/descending apparatus mounted under the rotating bases and having a ball-screw type rotation shaft to vertically ascend/descend the rotating base at the same time of the separate rotation of the setters.

Abstract: A frame and vacuum expansion chuck are used in combination for stretching a tape carrying a plurality of singulated devices to facilitate removal of the devices with reduced risk of contact between a device being removed from the tape and an adjacent device on the tape. The combination includes a frame for holding edges of a tape carrying a plurality of singulated devices, and a vacuum chuck having upper surfaces for contacting an underside of a tape carrying a plurality of singulated devices. The vacuum chuck extends along a perimeter circumscribing the singulated devices, and at least one groove is defined in the upper surface of the vacuum chuck. Conduit for providing fluid communication between the groove and a vacuum source are provided. Upon evacuation of the volume defined between the groove and the tape, the tape is drawn down into the groove and stretched, thereby increasing the separation or gap between adjacent dice and reducing the risk of damage upon removal of the dice.

Abstract: The present invention comprises a container transport and loading system. The system generally comprises a load port for presenting articles to a tool and a container transport system. In one embodiment, the load port includes a vertically movable FOUP advance plate assembly that is adapted to load and unload a FOUP from a conveyor that passes by the load port and move the FOUP horizontally. In another embodiment, the load port includes a vertically movable support structure that is adapted to load and unload a container from a shuttle that passes by the load port. The various embodiments of the load port and container transport system are improvements over conventional container transport systems. The present invention also includes a shuttle for simultaneously transporting multiple containers that a load port may load or unload a container from.

Abstract: Disclosed herein is a coating and developing apparatus 1 whose decreases in substrate-conveying accuracy can be suppressed. A processing block S2 of the coating and developing apparatus 1 includes multiple resist-film forming blocks G2, G3, and a developing block G1. A conveyance element 12 for substrate loading into the processing block S2 is provided to convey substrates W from a carrier C to the resist-film forming blocks G2, G3. Also, a conveyance element I for substrate loading into an exposure apparatus S4 is provided in an interface block S3 to load the substrates W into the exposure apparatus S4 and after unloading the substrates W from the exposure apparatus S4, convey the substrates W to the developing block G1.

Abstract: A cassette stocker includes a plurality of cassette storage shelves positioned adjacent a cleanroom wall above a cassette docking station, and a cassette mover to carry a cassette between the shelves and the docking station. An interstation transfer apparatus includes an overhead support beam and a transfer arm adapted to carry a cassette between processing stations.

Abstract: A transporting apparatus is provided with: a transporting device (120) having: a loading device (220) which can elongate in an elongation direction toward a side of the track portion; and an elongation mechanism (600) for elongating the loading device. The elongation mechanism is provided with: a first rack (510) fixed to the main body device (210) and a second rack (520) fixed to the loading device, the first rack and the second rack each extending in the elongation direction and facing each other with a space therebetween; and a first pinion (610) engaged with the first rack, a second pinion (620) engaged with the second rack, and an odd number of third pinions (630) engaged between the first and second pinions.

Abstract: A tray transportation device is disclosed in this invention. The tray transportation device includes a transfer stage, a loading handler, an operation handler and an unload stage. The transfer stage has a buffer area and an operation area. The loading handler is disposed on the buffer area to handle a tray in the buffer area. The operation handler is disposed on the operation area to handle a tray in the operation area. The unload stage is used to carry the tray transferred from the transfer stage. The loading handler and the operation handler move together, when the operation handler transfers the tray from the operation area to the unload stage; the loading handler transfers the tray from the buffer area to the operation area.

Abstract: The present invention provides an overhead travelling carriage with a hoist which suppresses transmission of vibration to an article during conveyance. A chuck mechanism 10 is provided in a hoist 7 to support the top of an article 4. A fall preventing mechanism 14 is provided to prevent the article 4 supported by the chuck mechanism 14 from falling. Movable members 18 are provided which can move in a horizontal direction so as to advance toward and retreat from the housed article 4. Each of the movable members 18 has an L-shaped side cross section that extends so as to cross the direction in which it advances and retreats. A horizontal portion 18a of the movable portion 18 acts as means for preventing the article from falling. Rubber dampers 19 are provided on that surface of a vertical portion 18a of the movable member which is closer to the article 4, so as to constitute members pressed against the article 4.

Abstract: In at least one aspect, a system is provided that includes (1) a substrate carrier having first docking features; and (2) a loadport having second docking features. The second docking features are adapted to block docking of substrate carriers that do not include the first docking features and to allow docking of substrate carriers that include the first docking features. Numerous other aspects are provided.

Abstract: An improved apparatus and method is provided for storing semiconductor wafer carriers, and for loading wafers or wafer carriers to a fabrication tool. The apparatus preferably provides an elevated port for receipt of wafer carriers from an overhead factory transport, allows for local interconnection among a plurality of the inventive apparatuses, and enables independent loading of the factory load port and the tool load port. An inventive wafer handling method which divides a lot of wafers into sublots and distributes the sublots among tools configured to perform the same process is also provided.

Abstract: A variable lot size load port assembly includes a tool interface, an advance plate, and a seal plate. The tool interface extends generally in a vertical dimension and has a front surface, a back surface generally parallel to the front surface, and an aperture. An advance plate is positioned to the front of the tool interface below the aperture. The advance plate extends generally horizontally and is configured to support a front opening unified pod (FOUP). The advance plate translates between a retracted position and an advanced position. The advanced position is proximate the tool interface and the retracted position is spaced from the tool interface. The seal plate has an upper end secured to the tool interface and a lower end covering a portion of the aperture to form a reduced aperture. The seal plate is shaped to form a proximity seal with a front flange of a FOUP of a selected capacity mounted to the advance plate and brought to the advanced position.

Abstract: A kinematic pin and a substrate carrier adapted to deter dislodgment of the substrate carrier from the kinematic pin are provided. A shear member on the kinematic pin interacts with a shear feature of the substrate carrier to deter lateral movement of the substrate carrier relative to the kinematic pin. A substrate carrier handler that employs the kinematic pin is also provided.