Abstract: A method is provided for preparing high surface-area texturing of a substrate using methods by which material from a substrate is subtracted from or added to the surface of the substrate. In one embodiment, the method is a subtractive lithographic method that involves exposing a laser-ablatable substrate, such as a polymeric or ceramic substrate, to laser light. A mask may be used to define the pattern of light incident on the substrate. High surface-area textured substrates, in particular, miniaturized planar analysis devices having high surface-area textured features, prepared by the methods disclosed herein, are also provided. A method by which the high surface-area textured substrate or the miniaturized planar analysis device is used as a master from which replicate copies thereof may be made is also provided.

Abstract: A planographic printing plate precursor comprises a substrate having disposed thereon a hydrophilic layer which includes hydrophilic graft chains and a crosslinked structure formed through hydrolytic polycondensation of an alkoxide of an element selected from Si, Ti, Zr and Al. An aluminum substrate for a planographic printing plate includes a hydrophilic surface which is formed by a hydrophilic polymer including a functional group that chemically bonds to the aluminum substrate directly or is chemically bindable to the aluminum substrate via structural component having a crosslinking structure. A surface-hydrophilic member comprises a substrate having disposed thereon a hydrophilic layer, wherein the hydrophilic layer includes hydrophilic graft chains and a crosslinked structure formed through hydrolytic polycondensation of an alkoxide of an element selected from Si, Ti, Zr and Al.

Abstract: A method for manufacturing a lithographic printing plate precursor requiring no dampening water including: a support, a light-to heat conversion layer; and a silicone rubber layer in this order. The method includes: subjecting a surface of the support to a corona discharge treatment in a discharge amount of 0.01 to 0.12 kW/m2/minute; or subjecting a surface of the support to a corona discharge treatment so that the surface has an element ratio of oxygen to carbon of 0.41 or more, which is measured by an X-ray photoelectron spectroscopic; and providing the light-to-heat conversion layer directly on the surface of the support.

Abstract: An antireflective composition and a lithographic structure comprising a silicon-metal oxide, antireflective material derived from the composition. The antireflective composition comprises a polymer of formula I, wherein 1?x?2; 1?y?5; 1?0; m>0; n>0; R is a chromophore, M is a metal selected from Group IIIB to Group VIB, lanthanides, Group IIIA, Group IVA except silicon; and L is an optional ligand. The invention is also directed to a process of making a lithographic structure including a silicon-metal oxide, antireflective material.

Abstract: A planographic printing plate precursor comprises a substrate having disposed thereon a hydrophilic layer which includes hydrophilic graft chains and a crosslinked structure formed through hydrolytic polycondensation of an alkoxide of an element selected from Si, Ti, Zr and Al. An aluminum substrate for a planographic printing plate includes a hydrophilic surface which is formed by a hydrophilic polymer including a functional group that chemically bonds to the aluminum substrate directly or is chemically bindable to the aluminum substrate via structural component having a crosslinking structure. A surface-hydrophilic member comprises a substrate having disposed thereon a hydrophilic layer, wherein the hydrophilic layer includes hydrophilic graft chains and a crosslinked structure formed through hydrolytic polycondensation of an alkoxide of an element selected from Si, Ti, Zr and Al.

Abstract: An undercoat-forming material comprising a novolak resin having a fluorene or tetrahydrospirobiindene structure, an organic solvent, an acid generator, and a crosslinker, optionally combined with an intermediate layer having an antireflective effect, has an absorptivity coefficient sufficient to provide an antireflective effect at a thickness of at least 200 nm and a high etching resistance as demonstrated by slow etching rates with CF4/CHF3 and Cl2. BCl3 gases for substrate processing.

Abstract: Disclosed herein is a photoacid generating polymer represented by Formula 1 below: wherein R1 is a C1-10 hydrocarbon or a C1-10 hydrocarbon in which the hydrogen atoms are wholly or partly replaced by fluorine atoms; R2 is hydrogen or a methyl group; and a, b, c and d represent the mole fraction of each monomer and are in the range between about 0.05 and about 0.9, such that the sum of a, b, c, and d equals one. Since the photoacid generating polymer of Formula 1 is not water-soluble and acts as a photoacid generator, it can be used to prepare a top anti-reflective coating composition for immersion lithography.

Abstract: SU-8 photoresist compositions are modified to improve their adhesion properties by adding 1% to 6% of an adhesion promoter selected from the group consisting of glycidoxypropanetrimethoxysilane, mercaptopropyltrimethoxysilane, and aminopropyltrimethoxysilane. SU-8 photoresist compositions are modified to improve their resistance to cracking and film stress by adding 0.5% to 3% of a plasticizer selected from the group consisting of dialkylphthalates, dialkylmalonates, dialkylsebacates, dialkyladipates, and diglycidyl hexahydrophthalates. The improvements can be obtained simultaneously by adding both the adhesion promoter and the plasticizer to SU-8 photoresist compositions.

Abstract: A method is provided for simulating and/or demonstrating and/or enhancing photoactive properties, such as hydrophilicity, of a surface, such as a photoactive surface. One embodiment includes providing a photoactive surface and applying a peroxide-containing material, such as an aqueous hydrogen peroxide solution, over at least a portion of the surface. An optional resinous layer, such as an at least partly hydrolyzed polymethoxysiloxane layer, can be applied over the surface. A kit to practice the method and an article made using the method are also provided.

Abstract: New photoresists are provided that are suitable for short wavelength imaging, including sub-300 nm and sub-200 nm such as 193 nm and 157 nm. Photoresists of the invention contain a resin with photoacid-labile groups, one or more photoacid generator compounds, and an adhesion-promoting additive compound. Photoresists of the invention can exhibit significant adhesion to SiON and other inorganic surface layers.

Abstract: The present invention is directed to a thermally curable polymer composition, and a photolithographic substrate coated therewith, the composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography.

Abstract: A primer layer that includes a surface-tension modifier dispersed within a polymer binder is disposed between the imaging layer and the substrate of a lithographic printing member to inhibit the production of thermal degradation products that disrupt the oleophilicity of the exposed imaged areas, thereby improving print-making performance and efficiency. In addition, embodiments of the primer layer inhibit static charge buildup during production and during the print-making process.

Abstract: The present invention provides a planographic printing element suitable to receive and bond with a subsequently applied hydrophilic layer comprises a substrate layer, such as polyester film or paper, having coated thereon an adhesion layer, said adhesion layer comprising a polymer having a glass transition temperature of less than 15C and containing functional groups such as hydroxyl, epoxy or glycidyl groups capable of reacting with the hydrophilic layer. The polymer may be a terpolymer of a hydroxyalkyl methacrylate, an alkyl acrylate and an aminoalkyl methacrylate. The polymer may be mixed with gelatin and the mixture applied to the substrate as a coating. The hydrophilic layer, which may comprise metal oxide particles, such as aluminium oxide and/or titanium dioxide particles in a sodium silicate binder, is subsequently applied as a coating to the adhesion layer.

Abstract: Multilayer, positive working, thermally imageable, bakeable imageable elements have a substrate, an underlayer, and a top layer. The underlayer comprises a polymeric material that comprises, in polymerized form from about 5 mol % to about 30 mol % of recurring units derived from an ethylenically unsaturated polymerizable monomer having a carboxy group; from about 20 mol % to about 75 mol % of recurring units derived from N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, or a mixture thereof; and from about 3 mol % to about 50 mol % of recurring units derived from a compound represented by the formula: CH2?C(R2)—C(O)—NH—CH2—OR1, in which R1 is C1 to C12 alkyl, phenyl, C1 to C12 substituted phenyl, C1 to C12 aralkyl, or Si(CH3)3; and R2 is hydrogen or methyl. Other materials, such as a resin or resins having activated methylol and/or activated alkylated methylol groups, such as a resole resin, may be present in the underlayer.

Abstract: Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation (and possibly other radiation) at low energy levels are obtained using a polymer having acrylate/methacrylate monomeric units comprising a low activation energy moiety preferably attached to a naphthalene ester group. The resist allows the performance benefit of acrylate/methacrylate polymers with low activation energy for imaging thereby enabling improved resolution and reduced post-exposure bake sensitivity. The resist polymer also preferably contains monomeric units comprising fluoroalcohol moiety and a monomeric units comprising a lactone moiety.

Abstract: The present disclosure relates to an organic anti-reflective coating composition and a method for forming photoresist patterns using the same. The anti-reflective coating compositions are useful for preventing reflection of a lower film layer or a substrate of a photoresist film, reducing standing waves caused by light and variations in the thickness of the photoresist itself, and increasing the uniformity of the photoresist patterns. More particularly, the present invention relates to an organic anti-reflective coating composition comprising particular organo-silicon based polymers and a method for forming photoresist patterns using the same. The organic anti-reflective coating composition can prevent excessive absorbency of an anti-reflective film formed therefrom and, thus, minimize the reflectivity of the film so that it can efficiently remove standing waves and increase the uniformity of the photoresist pattern.

Abstract: A multilayer lithographic structure which includes a substrate, having on a major surface thereof a first layer including a water and/or aqueous base soluble material which includes Ge, O, and H, and optionally X, wherein X is at least one of Si, N, and F; and disposed on the first layer a second layer which includes an energy photoactive material.

Abstract: Antireflective hardmask compositions and techniques for the use of antireflective hardmask compositions for processing of semiconductor devices are provided. In one aspect of the invention, an antireflective hardmask layer for lithography is provided. The antireflective hardmask layer comprises a carbosilane polymer backbone comprising at least one chromophore moiety and at least one transparent moiety; and a crosslinking component. In another aspect of the invention, a method for processing a semiconductor device is provided. The method comprises the steps of: providing a material layer on a substrate; forming an antireflective hardmask layer over the material layer. The antireflective hardmask layer comprises a carbosilane polymer backbone comprising at least one chromophore moiety and at least one transparent moiety; and a crosslinking component.

Abstract: The invention relates to a photoresist composition having a protecting group and a protected material incorporated in a cyclic chemical structure. In this invention a protected material has a cyclic ether group or cyclic ester group as a protecting group. A specific example of a cyclic ether group is an alkylene oxide, such as an oxetane group, substituted with one or more fluorinated alkyl groups. A specific example of a cyclic ester is a lactone which may be substituted with methyl groups. The photoresist composition further includes a photoactive component. The photoresist composition of this invention has a high transparency to ultraviolet radiation, particularly at short wavelengths such as 193 nm and 157 nm.

Abstract: There is disclosed an anti-reflection film material used in lithography containing at least a polymer compound having repeating units for copolymerization represented by the following general formula (1), or those containing a polymer compound having repeating units for copolymerization represented by the following general formula (2) and a polymer compound having repeating units for copolymerization represented by the following general formula (3).

Abstract: A heat-sensitive lithographic printing plate precursor comprising on a support, a hydrophilic layer having a protrusion structure on at least one surface thereof.

Abstract: A printing plate material including: a plastic support; a hydrophilic layer on the plastic support; and a back layer on the plastic support, being provided on the opposite side to the hydrophilic layer, wherein the back layer includes a matting agent, and a distribution width of a projection amount of the matting agent is 1 to 20%.

Abstract: Photoacid generators (PAGs) comprising photoactive moieties and perfluorinated, multifunctional anionic moieties (or incipient anionic moieties) are disclosed which provide photoacids with high acid strength, low volatility and low diffusivity. The present invention further relates to photoacid generators as they are used in photoinitiated or acid-catalyzed processes for uses such as photoresists for microlithography and photopolymerization.

Abstract: A thermosensitive lithographic printing plate comprising: a hydrophilic support; a lower layer comprising a water-insoluble and alkali-soluble resin; and an upper thermosensitive layer comprising a water-insoluble and alkali-soluble resin and an infrared absorbing dye, whose dissolution in an alkaline aqueous solution increases upon exposure, wherein a surface of the upper thermosensitive layer has protrusions caused by ununiformity of thickness of the upper thermosensitive layer in a proportion of 0.1 or more and not more than 7 per ?m2 or the upper thermosensitive layer comprises at least two alkali-soluble resins having a different dissolution speed in an alkaline aqueous solution from each other, and the at least two alkali-soluble resin cause phase separation from each other.

Abstract: The invention relates to a photoresist composition comprising a polymeric binder; a photoactive component; and at least one dissolution inhibitor comprising a paraffinic or cycloparaffinic compound containing at least one functional group having the structure —C(Rf)(Rf?)OR wherein Rf and Rf? are the same or different fluoroalkyl groups of from one or taken together are (CF2)a wherein a is an integer ranging from 2 to about 10 and R is a hydrogen atom or an acid labile protecting group. Typically, the dissolution inhibitor has an absorption coefficient of less than about 4.0 ?m at a wavelength of 157 nm.

Abstract: The present disclosure relates to an organic anti-reflective coating composition and a method for forming photoresist patterns using the same. The anti-reflective coating compositions are useful for preventing reflection of a lower film layer or a substrate of a photoresist film, reducing standing waves caused by light and variations in the thickness of the photoresist itself, and increasing the uniformity of the photoresist patterns. More particularly, the present invention relates to an organic anti-reflective coating composition comprising particular organo-silicon based polymers and a method for forming photoresist patterns using the same. The organic anti-reflective coating composition can prevent excessive absorbency of an anti-reflective film formed therefrom and, thus, minimize the reflectivity of the film so that it can efficiently remove standing waves and increase the uniformity of the photoresist pattern.

Abstract: The invention includes polymers that contain a heterocyclic ring, preferably an oxygen- or sulfur-containing ring. The heterocyclic ring is preferably fused to the polymer backbone. The invention also provides photoresists that contain such polymers, particularly for imaging at short wavelengths such as sub-200 nm.

Abstract: Imageable elements that contain silicate-coated polymer particles in the imageable layer, stacks of these elements, and methods for forming images using these elements are disclosed. The elements do not stick to each other when stacked without interleaving paper, and only one imageable element is lifted at a time when the imageable elements are handled by automatic processing equipment. Blanket piling is not observed when silicate-coated particles are present in the imageable layer.

Abstract: A positive working printing plate precursor is disclosed which comprises a hydrophilic support and a coating provided thereon which comprises in the order given a first layer containing an oleophilic resin soluble in an aqueous alkaline developer and a second layer comprising a water repellent-compound. Furthermore, the coating comprises an infrared absorbing dye containing a perfluoroalkyl group providing a printing plate precursor with high sensitivity.

Abstract: A presensitized plate in which an image recording layer is formed on a support for a lithographic printing plate obtainable by performing a treatment with an aqueous solution containing one or more divalent or multivalent cations at a concentration ranging from 0.0001 mol/L to less than 0.020 mol/L is excellent in both scum resistance and press life when processed into a lithographic printing plate.

Abstract: The present invention provides a thermal type planographic printing plate which is writable by infrared laser beam exposure, can record images with high sensitivity and can provide a high quality printed matter which does not have stains. The planographic printing plate comprises a recording layer which is writable by infrared-laser exposure on a support formed with an anodic oxidation coating having a predetermined density and/or vacancy ratio on a roughened surface of an aluminum substrate.

Abstract: Disclosed is a support for a lithographic printing plate, wherein an adhering amount of a rare-earth element atom to a surface thereof is 0.1 to 20 mg/mg2, and a presensitized plate provided with an image recording layer on the support for a lithographic printing plate. The presensitized plate achieving both high scum resistance and long press life can be realized, which is the same in the case the image recording layer containing an infrared absorbent, where scum would easily occur, is provided onto the support.

Abstract: A negative photoresist composition is used for the formation of thick films and includes (A) a novolak resin, (B) a plasticizer, (C) a crosslinking agent and (D) an acid generator. The composition is applied onto a substrate and thereby yields a photoresist film 5 to 100 ?m thick. Likewise, the composition is applied onto a substrate of an electronic part, is patterned, is plated and thereby yields a bump.

Abstract: A positive working thermal imaging assembly comprising: A) a substrate; and B) a thermally sensitive imaging element of a composite layer structure comprising: (I) a first layer on the substrate of a polymeric material soluble in aqueous alkali solution, optionally containing compounds that absorb and convert light to heat and/or a coloured dye or pigment; said first layer being converted at its surface by treatment with solutions at elevated temperatures that contain an active compound or compounds capable of rendering said first polymeric material less soluble in an aqueous alkali developer at the point of contact; the first layer being oleophilic; (ii) optionally, a first intermediate layer between the substrate and the said first layer with a second polymeric material which is soluble or dispersible in aqueous solution optionally containing compounds that absorb and convert light or radiation to heat and/or a coloured dye or pigment coated from a solvent that does not substantially dissolve the first laye

Abstract: The present invention pertains to photoimaging and the use of photoresists (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The present invention also pertains to novel hydroxy ester-containing polymer compositions that are useful as base resins in resists and potentially in many other applications.

Abstract: An improved digitally imageable relief printing element having an increased direct-cure imaging speed upon exposure to lasers and other digital sources of actinic radiation. The printing elements of the invention comprise a reflective layer beneath a photosensitive resin layer so that instead of being absorbed by the reflective layer, photons of actinic radiation are reflected back up into the photosensitive layer, thereby speeding up the curing rate of the printing element.

Abstract: The invention provides a planographic printing plate precursor, utilizing a support member having a hydrophilic surface excellent in hydrophilicity and durability, providing effects of improving scumming in the printing operation and capable of forming large numbers of prints of high image quality even under severe printing conditions. The precursor comprises a support including an aluminum substrate and a hydrophilic layer disposed thereon, the hydrophilic layer formed by chemically bonding a hydrophilic polymer, which includes a reactive group able to chemically bond to a surface of the aluminum substrate directly or via a structural component comprising a crosslinked structure; and a positive working recording layer disposed on the support and including a light-absorbing and heat-generating material, and a polymer compound, which is insoluble in water and soluble in alkali, wherein solubility of the recording layer in an alkaline aqueous solution increases upon exposure to light.

Abstract: The invention is a directly imageable waterless planographic printing plate precursor comprising: at least a heat insulating layer, a heat sensitive layer, and an ink repellent layer that are provided in that order on a substrate, wherein a transmittance of the heat insulating layer for a light having a wavelength within a range of 400 to 650 nm is at most 15% over the entire range of the wavelength. The invention provides a directly imageable waterless planographic printing plate precursor that allows measurement of the dot area ratio on the printing plate with a densitometer or the like.

Abstract: A positive working printing plate precursor is disclosed which comprises a hydrophilic support and a coating provided thereon which comprises in the order given a first layer containing an oleophilic resin soluble in an aqueous alkaline developer and a second layer comprising a water repellent-compound. Furthermore, the coating comprises an infrared absorbing dye containing a polysiloxane group providing a printing plate precursor with high sensitivity.

Abstract: A negative resist composition is disclosed, wherein the resist composition includes a polymer having at least one fluorosulfonamide monomer unit having one of the following two formulae: wherein: M is a polymerizable backbone moiety; Z is a linking moiety selected from the group consisting of —C(O)O—, —C(O)—, —OC(O)—, —O—C(O)—C(O)—O—, or alkyl; P is 0 or 1; R1 is a linear or branched alkyl group of 1 to 20 carbons; R2 is hydrogen, fluorine, a linear or branched alkyl group of 1 to 6 carbons, or a semi- or perfluorinated linear or branched alkyl group of 1 to 6 carbons; and n is an integer from 1 to 6.

Abstract: A positive type resist composition having an alkali-soluble siloxane polymer expressed by the following Formula (1), a photosensitive compound, and a 1 ?m thick resist film formed of the positive type resist composition which has 5% to 60% of transmittance to i-line radiation; in the Formula (1), R1 and R2 express a monovalent organic group, and may be identical or different; “A” is a group expressed by the following Formula (2) having at least one phenolic hydroxyl group; and “a”, “b,” and “c” satisfy the following relation; a+b+c=1, in the Formula (2), R3, R4, and R5 express one of a hydrogen atom and a monovalent organic group, and may be identical or different, “m” expresses an integer, and “n” expresses an integer of 1 to 5. Preferably, 0.25?a?0.60, and 0?c?0.25. The composition is preferably used in a resist film undergoing oxygen plasma etching.

Abstract: The invention provides a hydrophilic member and a support for a planographic printing plate with a hydrophilic surface having hydrophilic graft chains and a cross-linked structure on a substrate surface formed by hydrolysis of an alkoxide of a metal selected from Si, Ti, Zr, and Al and condensation polymerization and it is characteristic that the hydrophilic surface contains a hydrophilic graft polymer, which is a copolymer of a macromer having hydrophilic functional groups and a structural unit having a silane coupling group. Further, the invention provides a hydrophilic graft polymer that is copolymer of macromers having hydrophilic functional groups and structural units having silane coupling groups.

Abstract: A method is provided for preparing high-surface area texturing of a substrate using methods by which material from a substrate is subtracted from or added to the surface of the substrate. In one embodiment, the method is a subtractive lithographic method that involves exposing a laser-ablatable substrate, such as a polymeric or ceramic substrate, to laser light. A mask may be used to define the pattern of light incident on the substrate. High-surface area textured substrates, in particular, miniaturized planar analysis devices having high-surface area textured features, prepared by the methods disclosed herein are also provided. A method by which the high-surface area textured substrate or the miniaturized planar analysis device is used as a master from which replicate copies thereof may be made is also provided.

Abstract: The invention relates to a photoresist composition having a protecting group and a protected material incorporated in a cyclic chemical structure. In this invention a protected material has a cyclic ether group or cyclic ester group as a protecting group. A specific example of a cyclic ether group is an alkylene oxide, such as an oxetane group, substituted with one or more fluorinated alkyl groups. A specific example of a cyclic ester is a lactone which may be substituted with methyl groups. The photoresist composition further includes a photoactive component. The photoresist composition of this invention has a high transparency to ultraviolet radiation, particularly at short wavelengths such as (193) nm and (157) nm.

Abstract: New organic-based radiation absorbing compositions are provided that are suitable for use as an antireflective coating composition (“ARC”) for an overcoated photoresist. These compositions also serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectively from an undercoated dielectric layer.

Abstract: There are provided steps of forming a lower resist layer on a patterning objective layer, forming an organic intermediate layer made of organic material, that contains no Si—O bond in its structure, on the lower resist layer, forming an upper resist layer made of alicyclic resin on the organic intermediate layer, forming a pattern by exposing/developing the upper resist layer, transferring the pattern of the upper resist layer onto the organic intermediate layer by etching the organic intermediate layer while using the upper resist layer as a mask, transferring a pattern of the organic intermediate layer onto the lower resist layer by etching the lower resist layer while using the organic intermediate layer as a mask, and etching the patterning objective layer while using the lower resist layer as a mask.

Abstract: An intermediate layer composition for a three-layer resist process comprising (A) an octakis(silsesquioxane) skeleton-containing polymer obtained by hydrosilylation polymerization of a compound represented by formula (I) defined in the specification with bis(substituted ethynyl) compound in the presence of a platinum-containing catalyst.

Abstract: A heat-sensitive lithographic printing plate precursor comprising a support having provided thereon (A) an ink-receiving layer and (B) a hydrophilic layer comprising 80 to 99 parts by weight of a colloidal particulate oxide or hydroxide of at least one element selected from a group consisting of beryllium, magnesium, aluminum, silicon, titanium, boron, germanium, tin, zirconium, iron, vanadium, antimony and a transition metal, and 1 to 20 parts by weight of a polyacrylic acid having a weight-average molecular weight of more than 50,000, and at least one of the ink-receiving layer and the hydrophilic layer including a light-heat converting agent.

Abstract: Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment, the polymers include a light-attenuating moiety having a structure selected from the group consisting of: where: each of X1 and Y is individually selected from the group consisting of electron withdrawing groups; R2 is selected from the group consisting of alkyls and aryls; and R3 is selected from the group consisting of hydrogen and alkyls. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.

Abstract: A resist composition comprising (A) a substantially alkali-insoluble polymer having acidic functional groups protected with acid labile groups, which becomes alkali soluble upon elimination of the acid labile groups, (B) a photoacid generator, and (C) a nonionic fluorinated organosiloxane compound consisting of perfluoroalkyl-containing siloxane bonds and polyoxyethylene type polyether bonds is exposed to UV having a wavelength of at least 150 nm and developed with an alkaline solution to form a pattern without leaving scum.