Abstract: The present disclosure provides a sensitizer for UV-LED photocuring, having a chemical structure as represented by formula (I). This sensitizer has a very good adaptability to existing photoinitiators, can significantly improve the curing efficiency under the irradiation of a UV-LED light source when used in a photocurable composition, and has excellent application properties.

Abstract: The invention provides a composition for forming a metal oxide-containing film comprising, as a component (A), a metal oxide-containing compound A1 obtained by hydrolysis and/or condensation of one or more kinds of hydrolysable metal compounds shown by the following general formula (A-1), as a component (B), an aromatic compound shown by the following general formula (B-1), the compound generating a hydroxyl group by thermal and/or an acid. There can be provided a composition for a resist lower layer film, which has high etching selectivity, capable of subjecting to stripping under mild conditions than the conventional process, has excellent pattern adhesiveness, and fine pattern formation can be performed.

Abstract: Methods and apparatus relating to very large scale FET arrays for analyte measurements. ChemFET (e.g., ISFET) arrays may be fabricated using conventional CMOS processing techniques based on improved FET pixel and array designs that increase measurement sensitivity and accuracy, and at the same time facilitate significantly small pixel sizes and dense arrays. Improved array control techniques provide for rapid data acquisition from large and dense arrays. Such arrays may be employed to detect a presence and/or concentration changes of various analyte types in a wide variety of chemical and/or biological processes. In one example, chemFET arrays facilitate DNA sequencing techniques based on monitoring changes in hydrogen ion concentration (pH), changes in other analyte concentration, and/or binding events associated with chemical processes relating to DNA synthesis.

Abstract: A positive resist composition comprises a polymer comprising repeat units having formula (1) or (2). Herein denotes an aromatic hydrocarbon group, R1 is H, methyl or trifluoromethyl, R2 is H, C1-C12 alkyl or aromatic hydrocarbon group, R3 is C1-C12 alkyl, or R2 and R3 may bond together to form a ring, and a is 1 or 2. When used in the ArF lithography, the resist composition exhibits high resolution. When used in the EB image writing for mask processing, the resist composition exhibits high resolution and sensitivity sufficient to comply with high-accelerating-voltage EB irradiation, and high etch resistance.

Abstract: A method and material layer for forming a pattern are disclosed. The method includes providing a substrate; forming a first material layer over the substrate; forming a second material layer over the first material layer, wherein the second material layer comprises a photoacid generator and a photobase generator; and exposing one or more portions of the second material layer.

Abstract: A donor substrate includes a base substrate; a light reflection layer on the base substrate and partially overlapping the base substrate; a light-to-heat conversion layer on the base substrate, and including a combination layer including an insulating material and a first metal material; and a transfer layer on the light-to-heat conversion layer. A ratio of the first metal material in the combination layer to the insulating material in the combination layer increases as a distance from the base substrate increases along a thickness direction of the light-to-heat conversion layer.

Abstract: A presensitized plate having a long press life and excellent resistance to scum and corrosive micro-stains and capable of on-press development is provided. The presensitized plate includes a photosensitive layer containing (A) a sensitizing dye, (B) a polymerization initiator, (C) a polymerizable compound, and (D) a binder polymer; and a protective layer which are formed on a support in this order. The support is prepared from an aluminum alloy plate containing intermetallic compound particles with a circle equivalent diameter of 0.2 ?m or more at a surface density of 35,000 pcs/mm2 or more and aluminum carbide particles with a maximum length of 1 ?m or more in an amount of up to 30,000 pcs/g.

Abstract: A printing plate comprises a substantially planar substrate, a porous non-anodic ungrained coating, having a thickness within the range of about 0.1 to about 30 microns and comprising at least one of metals, metal oxides and admixtures thereof, and an image recording layer, provided that where the porous coating consists essentially of oxide(s) only, it comprises at least one oxide of copper, magnesium, cadmium, aluminum, zirconium, hafnium, thorium, chromium, tungsten, molybdenum and (or) cobalt, and further provided that where the porous coating consists essentially of alumina only, it comprises specified pores. The invention also relates to an article of manufacture having a nanometric porous surface layer comprising at least one of metals, metal oxides and mixtures thereof, which comprises pores in the surface layer having a width in a range 0-100 nm, and wherein a major number of pores in this range have a width in a band of about 1 to about 30 nm.

Abstract: A photosensitive resin composition contains a component (A) and at least one of a component (B) and a component (C). In addition, in the circuit board with metal support including: a metal support; a base insulating layer; a conductive layer formed of a wiring circuit pattern; and a cover insulating layer, at least one of the above-mentioned base insulating layer and cover insulating layer is made of the above-mentioned photosensitive resin composition. (A) a 1,4-dihydropyridine derivative represented by the following general formula (1) where R1 represents an alkyl group having 1 to 3 carbon atoms; and R2 and R3 each represent a hydrogen atom or an alkyl group having 1 or 2 carbon atoms and may be identical to or different from each other; (B) the following (x) and (y): (x) a carboxyl group-containing linear polymer; and (y) an epoxy resin (c) a linear polymer having a carboxyl group and an epoxy group.

Abstract: A negative resist composition, includes: (A) an alkali-soluble polymer containing a specific repeating unit as defined in the specification; (B) a crosslinking agent capable of crosslinking with the alkali soluble polymer (A) under an action of an acid; (C) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (D) a specific quaternary ammonium salt as defined in the specification; and (E) an organic carboxylic acid, and a pattern forming method uses the composition.

Abstract: A chemical amplification resist composition contains: (A) a polymer compound having a phenolic hydroxyl group and a group formed by substituting a substituent for a hydrogen atom of a hydroxyl group in a phenolic hydroxyl group and satisfying the following (a) to (c) at the same time: (a) the polydispersity is 1.2 or less, (b) the weight average molecular weight is from 2,000 to 6,500, and (c) the glass transition temperature (Tg) is 140° C. or more.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having a repeating unit represented by the following formula (1), a resist film using the composition, and a pattern forming method.

Abstract: An aluminum-containing substrate can be provided for use in lithographic printing plate precursors. Before radiation-sensitive layers are applied, a grained and sulfuric acid anodized aluminum-containing support is treated with an alkaline or acidic pore-widening solution to provide its outer surface with columnar pores. The diameter of the columnar pores at their outermost surface is at least 90% of the average diameter of the columnar pores. Directly on this treated surface, a hydrophilic layer is applied, which hydrophilic layer contains a non-crosslinked hydrophilic polymer having carboxylic acid side chains.

Abstract: Thick film photoresist compositions are disclosed.

Abstract: On-press developable, negative-working lithographic printing plate precursors have a sulfuric acid anodized aluminum-containing substrate in which the oxide layer pores have been widened using an acidic or alkaline treatment. Over the widened pores, a hydrophilic coating is applied, which coating comprises a non-crosslinked hydrophilic polymer having carboxylic acid side chains. This particular substrate provides improved adhesion and printing durability for on-press development and printing.

Abstract: An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.

Abstract: A photocurable composition comprising a photoresist component, and an ethylenically unsaturated perfluoropolyether is disclosed. The composition enables easier release of phototool from a photoresist.

Abstract: Electrochemically grained and anodized aluminum supports are treated with a post-treatment coating solution containing a polymer derived at least in part from vinyl phosphonic acid and phosphoric acid. This post-treated support is useful as substrates in the preparation of lithographic printing plate precursors. The post-treatment substrate treatment enables wide latitude in manufacturing and compatibility with silicate-free developers to achieve negligible background staining and oxide attack.

Abstract: The present invention relates to an underlayer composition comprising a polymer, an organic titanate compound and optionally a thermal acid generator, where the polymer comprises at least one fluoroalcohol group and at least one epoxy group. The invention also relates to a process for using this underlayer material as an antireflective coating composition and/or a hard mask for pattern transfer.

Abstract: The present invention relates to a positive resist composition and to a pattern forming process using the same. The present invention provides: a positive resist composition having an enhanced etching resistance and an excellent resolution and being capable of providing an excellent pattern profile even at a substrate-side boundary face of resist, in photolithography for fine processing, and particularly in lithography adopting, as an exposure source, KrF laser, extreme ultraviolet rays, electron beam, X-rays, or the like; and a pattern forming process utilizing the positive resist composition.

Abstract: A heat-sensitive negative-working lithographic printing plate precursor includes on a grained and anodized aluminum support a coating including hydrophobic thermoplastic polymer particles, a hydrophilic binder, and an organic compound, wherein the organic compound includes at least one phosphonic acid group or at least one phosphoric acid group or a salt thereof.

Abstract: The invention provides a photosensitive resin composition that can form resists with excellent adhesiveness for conductive layers and that does not easily produce conductive layer discoloration, as well as a photosensitive film employing the composition. A preferred photosensitive film (1) according to the invention comprises a support (11), resin layer (12) and protective film (13), where the resin layer (12) is composed of a photosensitive resin composition comprising a binder polymer, a photopolymerizing compound, a photopolymerization initiator and a benzotriazole derivative represented by the following general formula (1).

Abstract: There is disclosed a chemically amplified positive resist composition to form a chemically amplified resist film to be used in a lithography, wherein the chemically amplified positive resist composition comprises at least, (A) a base resin, insoluble or poorly soluble in an alkaline solution, having a repeating unit whose phenolic ydroxyl group is protected by a tertiary alkyl group, while soluble in an alkaline solution when the tertiary alkyl group is removed; (B) an acid generator; (C) a basic component; and (D) an organic solvent, and a solid component concentration is controlled so that the chemically amplified resist film having the film thickness of 10 to 100 nm is obtained by a spin coating method.

Abstract: The present invention provides a process for producing a surface-modified layer system comprising a substrate (2) and a self-assembled monolayer (SAM) (1) anchored to its surface. The SAM (1) is comprised by aryl or rigid alicyclic moiety species. The process comprises providing a polymorphic SAM (1) anchored to the substrate (2), and thermally treating (4) the SAM to change from a first to a second structural form thereof. The invention also provides a thermolithographic form of process in which the thermal treatment (4) is used to transfer a pattern (3) to the SAM (1), which is then developed.

Abstract: The present invention provides a method of forming a threshold voltage adjusted gate stack in which an external acid diffusion process is employed for selectively removing a portion of a threshold voltage adjusting layer from one device region of a semiconductor substrate. The external acid diffusion process utilizes an acid polymer which when baked exhibits an increase in acid concentration which can diffuse into an underlying exposed portion of a threshold voltage adjusting layer. The diffused acid reacts with the exposed portion of the threshold voltage adjusting layer providing an acid reacted layer that can be selectively removed as compared to a laterally adjacent portion of the threshold voltage adjusting layer that is not exposed to the diffused acid.

Abstract: Novel, developer-soluble anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a multi-functional acid reacted with a multi-functional vinyl ether to form a branched polymer or oligomer. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light and post-exposure baking, the cured polymers/oligomers will decrosslink and depolymerize, rendering the layer soluble in typical photoresist developing solutions (e.g., alkaline developers).

Abstract: Novel, developer-soluble, hard mask compositions and methods of using those compositions to form microelectronic structures are provided. The composition comprises the compound a compound for controlling development rate, and a crosslinking agent in a solvent system. The methods involve applying the composition to a substrate and curing the composition. An imaging layer is applied to the composition, followed by light exposure and developing, during which the light-exposed portions of the imaging layer are removed, along with portions of the hard mask composition adjacent said light-exposed portions. The size of the hard mask composition structures are controlled by the development rate, and they yield feature sizes that are a fraction of the imaging layer feature sizes, to give a pattern that can ultimately be transferred to the substrate.

Abstract: A photosensitive resin composition comprising (A) a binder polymer, (B) a photopolymerizing compound with a polymerizable ethylenic unsaturated bond, (C) a photoradical polymerization initiator containing a 2,4,5-triarylimidazole dimer or its derivative, and (D) a compound represented by the following general formula (1) (wherein R1 and R2 each independently represent C1-20 alkyl, etc., and R3, R4, R5, R6, R7, R8, R9 and R10 each independently represent hydrogen, etc.).

Abstract: A photolithographic process, wherein a photosensitive layer is formed on a surface of a body to be defined; the photosensitive layer is exposed through a photolithographic mask having zones with lower transparency and zones with higher transparency so as to obtain exposed portions and shielded portions of the photosensitive layer; selective portions of the photosensitive layer chosen between the exposed portions and the shielded portions of the photosensitive layer are removed; and portions of the body under the selective portions of the photosensitive layer are selectively removed. The composite layer includes photoresist and carbon nanotubes, which are embedded in the photoresist and extend in a direction generally transverse to, and in electrical contact with, the body.

Abstract: An embodiment of the present invention is a relief printing plate for forming a high-definition pattern by a printing method, having a convex part comprising a resin layer, a base material supporting the convex part and a light reflection controlling layer, the light wave length being in range of 400 nm-800 nm, and the layer being between the convex part and the base material.

Abstract: A cap layer that enables a photopatternable, spin-on material to be used in the formation of semiconductor device structures at wavelengths that were previously unusable. The photopatternable, spin-on material is applied as a layer to a semiconductor substrate. The cap layer and a photoresist layer are each formed over the photopatternable layer. The cap layer absorbs or reflects radiation and protects the photopatternable layer from a first wavelength of radiation used in patterning the photoresist layer. The photopatternable, spin-on material is convertible to a silicon dioxide-based material upon exposure to a second wavelength of radiation.

Abstract: A negative-working photopolymerization type photosensitive lithographic printing plate precursor capable of conducting image recording with laser, includes: a hydrophilic support; a photopolymerizable photosensitive layer containing (i) a sensitizing dye having an absorption maximum in a wavelength range of from 360 to 450 nm, (ii) a hexaarylbiimidazole compound and (iii) an addition polymerizable compound having an ethylenically unsaturated double bond; and a protective layer, in this order, wherein the protective layer has oxygen permeability at 25° C. under one atmosphere of from 25 ml/m2·day to 200 ml/m2·day.

Abstract: There is provided a resist underlayer coating forming composition used in processes for manufacturing a mask blank and a mask, and a mask blank and a mask manufactured from the composition. The resist underlayer coating forming composition comprises a polymer compound having a halogen atom-containing repeating structural unit and a solvent. In a mask blank including a thin film for forming transfer pattern and a chemically-amplified type resist coating on a substrate in that order, the composition is used for forming a resist underlayer coating between the thin film for forming transfer pattern and the resist coating. The polymer compound is preferably a compound containing a halogen atom in an amount of at least 10 mass %.

Abstract: A recording layer including a novel dye for a high density optical recording medium, employing short wavelength laser source with a wavelength not longer than 530 nm for recording high density information and reproduction/playback of the high density information recordings, is provided.

Abstract: Imageable printing forms are irradiated by radiant energy corresponding to the image information, the energy being absorbed in the printing form. The energy coupled in this manner is available for patterning the printing form surface. A printing form having a plurality of substantially planar functional zones, which have at least one informational zone that is modifiable in accordance with image information and an absorption zone for absorbing energy from a radiation is distinguished in that a buffer zone is provided which differs at least partially from the absorption zone, receives energy from the absorption zone, and releases energy to the informational zone.

Abstract: Provided is an article that comprises a substrate comprising an acid-etchable layer, a water-soluble polymer matrix, and a photoacid generator. Also provided is a method for patterning that can provide patterned layers that can be used to form electroactive devices.

Abstract: Novel, wet developable anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a polymer and/or oligomer having acid functional groups and dissolved in a solvent system along with a crosslinker and a photoacid generator. The preferred acid functional group is a carboxylic acid, while the preferred crosslinker is a vinyl ether crosslinker. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light, the cured compositions will decrosslink, rendering them soluble in typical photoresist developing solutions (e.g., alkaline developers).

Abstract: To provide a conductive film forming photosensitive material from which a conductive film having high electromagnetic wave shielding properties and high transparency simultaneously can be manufactured and which is reduced with respect to pressure properties. A conductive film forming photosensitive material including a support having thereon an emulsion layer containing a silver salt emulsion and capable of manufacturing a conductive film by exposing the emulsion layer, performing a development treatment and further performing physical development and/or plating treatment, wherein the emulsion layer is disposed substantially in an uppermost layer; and the emulsion layer contains an antioxidant.

Abstract: A negative-working photosensitive material is provided which includes: a support; an undercoat layer; and a photosensitive layer including a polymerization initiator, a polymerizable compound, and a binder polymer, wherein the support, the undercoat layer, and the photosensitive layer are sequentially layered, the undercoat layer includes a polymer including a structural unit (a) including at least one of a carboxylic acid or a carboxylic acid salt and a structural unit (b) including at least one carboxylic acid ester; and the content of the structural unit (a) in the polymer is from 30% to 90% by mole. Also, a negative-working planographic printing plate precursor including the negative-working photosensitive material is provided.

Abstract: To provide a negative photosensitive material containing a quaternary ammonium salt in an amount of 5 to 30 weight parts based on 100 weight parts of a polyimide precursor having repeating units of the following general formula (I), wherein said quaternary ammonium salt is a photobase generator for generating a tertiary amine by irradiation with an active ray, and said tertiary amine contains one or more nitrogen atoms and oxygen atoms respectively in a molecule, wherein, in the formula (I), X is a tetravalent aliphatic group or a tetravalent aromatic group; and Y is a divalent aliphatic group or a divalent aromatic group.

Abstract: A light shielding film for a display device, comprising a polymer binder, metal particles dispersed in the polymer binder, and a compound including a sulfur atom or a nitrogen atom. A substrate for a display device comprising the light shielding film. And a color filter comprising the light shielding film.

Abstract: The use of a positive resist composition that includes a resin with a specific structure improves the resolution and yields a resist pattern with a favorable shape. In addition, when a resist layer is formed on either a magnetic film or a metallic oxidation prevention film formed on the magnetic film, the layer is less prone to tailing and undercutting phenomena.

Abstract: An embodiment of the present invention is a relief printing plate for forming a high-definition pattern by a printing method, having a convex part comprising a resin layer, a base material supporting the convex part and a light reflection controlling layer, the light wave length being in range of 400 nm-800 nm, and the layer being between the convex part and the base material.

Abstract: A method is provided for preparing high surface-area texturing of a substrate using methods by which material from a substrate is subtracted from or added to the surface of the substrate. In one embodiment, the method is a subtractive lithographic method that involves exposing a laser-ablatable substrate, such as a polymeric or ceramic substrate, to laser light. A mask may be used to define the pattern of light incident on the substrate. High surface-area textured substrates, in particular, miniaturized planar analysis devices having high surface-area textured features, prepared by the methods disclosed herein, are also provided. A method by which the high surface-area textured substrate or the miniaturized planar analysis device is used as a master from which replicate copies thereof may be made is also provided.

Abstract: A donor substrate for laser induced thermal imaging (LITI) and a method of fabricating an organic light emitting display (OLED) using the donor substrate are provided. A conductive frame is disposed on and connected to an anti-static layer of the donor substrate and frames the periphery of the donor substrate. The conductive frame is connected to a grounded stage. An organic layer is formed using LITI, and the generation of static electricity is controlled.

Abstract: Disclosed is a presensitized plate composed of a support having thereon an image recording layer which includes: an infrared absorber (A) that is a cyanine dye having at least one fused ring composed of a nitrogen-containing heterocycle in combination with an aromatic ring or a second heterocycle, and having on the aromatic ring or second heterocycle an electron-withdrawing group or a heavy atom-containing group, a radical generator (B), and a radical-polymerizable compound (C), and which is removable with printing ink and/or dampening water. The presensitized of the present invention can be imaged with an infrared light-emitting laser to directly record an image from digital data on a computer or the like and is then subjected to on-machine development without carrying out a development step, which is capable of providing a large number of good impressions with a practical amount of energy.

Abstract: There is provided an alkaline soluble positive-type photosensitive composition having an infrared wavelength range laser sensitive characteristic. There is also provided a positive-type photosensitive composition not requiring any burning operation, capable of attaining a requisite and sufficient close fitness in coating operation under a condition of indoor working room humidity of 25 to 60%, capable of attaining a development not producing any residuals while keeping a high sensitivity, cutting it with a sharp contour, attaining a quite hard resist film and improving an anti-scar characteristic in a handling before developing operation. This composition includes an alkaline soluble organic high molecular substance having a phenolic hydroxyl group; photo-thermal conversion substance for absorbing infrared rays of an image exposure light source; and a close-fitness modifying agent such as polyvinylpolypirrolidone/polyvinylacetatecopolymer and the like.

Abstract: A thermal transfer donor element is provided which comprises a support, a light-to-heat conversion layer, an interlayer, and a thermal transfer layer. When the above donor element is brought into contact with a receptor and imagewise irradiated, an image is obtained which is free from contamination by the light-to-heat conversion layer. The construction and process of this invention is useful in making colored images including applications such as color proofs and color filter elements.

Abstract: A heat-sensitive lithographic printing plate precursor comprising a support having thereon two image-forming layers each containing a polymer insoluble in water and soluble in an aqueous alkaline solution, wherein an upper layer of the image-forming layers contains a copolymer including a monomer unit represented by formula (A) defined in the specification.

Abstract: New polymers and new anti-reflective compositions containing such polymers are provided. The compositions comprise a polymer (e.g., epoxy cresol novolac resins) bonded with a chromophore (4-hydroxybenzoic acid, trimellitic anhydride). The inventive compositions can be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.