Urethane Patents (Class 430/284.1)
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Patent number: 7338751Abstract: An object of the present invention is to provide a process for producing a printed wiring board, which is advantageous not only in that the reduction in size and increase in density of the wiring board are achieved and further the steps are simplified, but also in that the connection reliability of mount parts and the yield are improved, and a photosensitive resin composition used in the process.Type: GrantFiled: March 29, 2002Date of Patent: March 4, 2008Assignee: Hitachi Chemical Co., Ltd.Inventors: Toshihiko Akahori, Ken Sawabe, Michiko Natori, Tomoaki Aoki, Takuya Kajiwara
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Patent number: 7335460Abstract: An object of the present invention is to provide a photosensitive thermosetting resin composition that has a long shelf life and has excellent normal temperature storage stability, has good solder heat resistance after curing, and according to which high adhesive strength can be maintained. The present invention provides a photosensitive thermosetting resin composition containing a photosensitive prepolymer, a photosensitive monomer, a thermosetting resin, a curing agent, and a polymerization initiator, the photosensitive thermosetting resin composition containing (A) a carboxylic acid-modified bisphenol type epoxy (meth)acrylate as the photosensitive prepolymer.Type: GrantFiled: July 6, 2006Date of Patent: February 26, 2008Assignee: Arisawa Mfg. Co., Ltd.Inventors: Shinichi Hasegawa, Toru Ueki
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Patent number: 7309550Abstract: This disclosure relates to a photosensitive composition useful in preparing water-developable, relief printing plates and other photosensitive articles. The compositions comprise an unsaturated polyurethane pre-polymer, which is the reaction product of at least one polyether diol, at least one aliphatic diisocyanate, at least one hydroxyl-functionalized mono-, di- and tri-(meth)acrylate, and a particular photoinitiator. The resulting photosensitive resin compositions have reduced rates and levels of yellowing if subjected to additional UV-light or sunlight after processing.Type: GrantFiled: December 22, 2006Date of Patent: December 18, 2007Assignee: Chemence, Inc.Inventors: Joe F. Rach, Krasimir Chorbadzhiev
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Patent number: 7297460Abstract: A radiation curable ink composition comprising at least one initiator and at least one polyhedral oligomeric silsesquioxane (POSS) represented by the following empirical formula [R(SiO1.5)]n wherein n=4, 6, 8, 10, 12, 14, 16 and larger and each R is independently hydrogen, an inorganic group, an alkyl group, an alkylene group, an aryl group, an arylene group, or non-heterocyclic group-containing organo-functional derivatives of alkyl, alkylene, aryl or arylene groups; and a process for obtaining a colourless, monochrome or multicolour ink jet image comprising the steps of jetting one or more streams of ink droplets having the above-mentioned composition onto an ink-jet ink receiver material, and subjecting the obtained image to radiation curing.Type: GrantFiled: February 9, 2004Date of Patent: November 20, 2007Assignee: Agfa-GevaertInventors: Luc Vanmaele, Johan Loccufier, Roland Claes
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Patent number: 7291444Abstract: The present invention relates to a photosensitive ceramic composite and a method for manufacturing a multilayer substrate using the composite. The photosensitive ceramic composite and manufacturing method of the present invention are applicable to circuit members and components for ceramic multilayer substrates for high-frequency wireless communication. The photosensitive ceramic composite contain inorganic particles and a photo sensitive organic components. The inorganic particles have at least surface sections containing an inorganic material having a refractive index less than that of inner sections of the inorganic particles.Type: GrantFiled: October 28, 2002Date of Patent: November 6, 2007Assignee: Toray Industries, Inc.Inventors: Tomoya Yamashiki, Takenori Ueoka, Mitsuyo Shimba
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Patent number: 7285372Abstract: Radiation-sensitive element comprising (a) a substrate with at least one hydrophilic surface and (b) a radiation-sensitive coating on at least one hydrophilic surface of the substrate, wherein the coating comprises: (i) at least one free-radical polymerizable monomer and/or oligomer and/or polymer with at least one ethylenically unsaturated group each, (ii) at least one absorber selected from photoinitiators and sensitizers, which is capable of absorbing radiation of a wavelength in the range of 250 to 1,200 nm and (iii) at least one stabilizer comprising in its molecule at least one group capable of inhibiting free-radical polymerization, and at least one other group capable of sorption at the hydrophilic surface of the substrate.Type: GrantFiled: November 28, 2003Date of Patent: October 23, 2007Assignee: Kodak Graphic Communications GmbHInventors: Harald Baumann, Michael Flugel, Udo Dwars, Eduard Kottmair
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Patent number: 7279266Abstract: A photosensitive composition comprising: (A) a polymerizable compound represented by the following formula (I): A—{O—[(CH(—R1)CH(—R2))m—O]n—C(?O)—C(—R3)?CH2}p??(I) wherein R1, R2and R3 each represents a hydrogen atom or a methyl group, A represents a polyhydric alcohol residue or a polyhydric phenol residue, m represents an integer of from 1 to 6, n represents an integer of from 1 to 20, and p represents an integer of from 1 to 6; (B) an infrared absorber; and (C) an onium salt.Type: GrantFiled: September 23, 2004Date of Patent: October 9, 2007Assignee: FUJIFILM CorporationInventors: Hiromitsu Yanaka, Takahiro Goto
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Patent number: 7273692Abstract: Disclosed are a planographic printing plate material and a planographic printing plate preparing process, the planographic printing plate material comprising a support and provided thereon, an image formation layer containing a colorant (a) having an absorption band in a wavelength region of from 700 to 1200 nm, a polymerization initiator (b) and a polymerizable ethylenically unsaturated compound (c), wherein the polymerization initiator (b) is a compound represented by the formula R1—CX2—(C?O)—R2.Type: GrantFiled: July 20, 2004Date of Patent: September 25, 2007Assignee: Konica Minolta Medical & Graphic, Inc.Inventor: Toshiyuki Matsumura
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Patent number: 7270939Abstract: A photoresist composition for LCD light diffuse reflecting film is disclosed, which comprises (a) 8 to 90% by weight of base-soluble resin; (b) 1 to 30% by weight of polyfunctional unit; (c) 0.1 to 20% by weight of photopolymerization initiator; (d) 0.1 to 20% by weight of thermosetting cross-linking reagent; (e) 0.01 to 10% by weight of ultraviolet absorber; and (f) 8 to 90% by weight of solvent.Type: GrantFiled: March 29, 2005Date of Patent: September 18, 2007Assignee: Everlight USA, Inc.Inventors: Chun-Wei Juan, Shao-Yun Liu
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Patent number: 7241557Abstract: A composition that is photopolymerizable upon absorption of light in the wavelength range from 300 to 450 nm, the composition comprising a binder, a polymerizable compound, a sensitizer and a photoinitiator, wherein the sensitizer is a fluorene compound that is conjugated via a double or triple bond with an aromatic or heteroaromatic group, and is characterized by a high sensitivity.Type: GrantFiled: July 29, 2005Date of Patent: July 10, 2007Assignee: Agfa Graphics NVInventors: Alexander Williamson, Paul Callant
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Patent number: 7232646Abstract: The invention relates to a biocompatible, low-viscous, radiation curable formulation, particularly for use in stereolithography, for use in medical technology, in particular, for producing earpieces, containing: a) 55-95% by weight of a monomeric or oligomeric dimethacrylate based on bisphenol A or bisphenol F; b) 0-20% by weight of a urethane methacrylate having a functionality of n<4 and a viscosity<15 Pa s; c) 2-15% by weight of a monomeric aliphatic or cycloaliphatic dimethacrylate having a viscosity<5 Pa s; d) 0-15% by weight of a monofunctional methacrylate having a viscosity<3 Pa s; e) 0.5-6% by weight of a photoinitiator or a combination of a number of photoinitiators whose absorption is located within the wavelength range of the laser beam used; f) 0.Type: GrantFiled: June 17, 2004Date of Patent: June 19, 2007Assignee: Dreve-Otoplastik GmbHInventors: Martin Klare, Reiner Altmann, Michael Kutschinski, Georgia Meissner, Thomas Veit
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Patent number: 7232651Abstract: A photopolymerisable system is disclosed which can be polymerised by exposure to UV light, for example, to form a solid, light-transmitting sheet material having volume refractive index variations defining an optical diffuser or a hologram, for example. The system includes a silicone monomer, prepolymer, macromonomer or co-monomer capable of undergoing free radical initiated polymerization and further includes a photoinitiator.Type: GrantFiled: November 9, 2001Date of Patent: June 19, 2007Assignee: Microsharp Holdings LimitedInventors: Robin J. T. Clabburn, Rifat Iqbal, Stephen Moratti
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Patent number: 7220534Abstract: A photosensitive composition contains a photosensitive resin and a colorant. The photosensitive resin includes (A) a copolymer of (a1) at least one first polymerizable monomer containing 2 to 6 hydroxyl groups with (a2) at least one second polymerizable monomer other than the first polymerizable monomer, and (B) at least one compound (B) containing an ethylenically unsaturated double bond and a functional group capable of reacting with hydroxyl group. The compound (B) has been reacted with the copolymer (A). A color filter has at least one filter segment formed using the photosensitive composition.Type: GrantFiled: November 24, 2004Date of Patent: May 22, 2007Assignees: Toyo Ink Mfg. Co., Ltd., Toppan Printing Co., Ltd.Inventors: Fumiko Ikegami, Mie Shimizu, Takeshi Itoi
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Patent number: 7211368Abstract: Photocurable resin compositions are provided that are most useful in stereolithography. A photocurable resin includes a urethane acrylate oligomer, an acrylate monomer, and a polymerization modifier. The resin after curing provides a solid product that has characteristics that can depend on the resin composition.Type: GrantFiled: July 29, 2003Date of Patent: May 1, 2007Assignee: 3 Birds, Inc.Inventors: Alma L. Coats, James P. Harrison, James Scott Hay, Manuel Jacinto Ramos
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Patent number: 7169534Abstract: Radiation-sensitive elements are described whose radiation-sensitive coating comprises both a photopolymerizable oligomer with a biuret structural unit and a photopolymerizable phosphazene oligomer.Type: GrantFiled: November 28, 2003Date of Patent: January 30, 2007Assignee: Kodak Polychrome Graphics GmbHInventors: Harald Baumann, Michael Flugel, Udo Dwars, Hans-Horst Glatt
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Patent number: 7163779Abstract: Disclosed is a process of manufacturing a planographic printing plate from a planographic printing plate material comprising a support and provided thereon, at least one of an image formation layer and an ablation layer, the process comprising the steps of imagewise exposing the planographic printing plate material, and developing the exposed planographic printing plate material by supplying printing ink containing at least one of a polymerizable monomer and a polymerizable oligomer to the exposed planographic printing plate material.Type: GrantFiled: December 2, 2004Date of Patent: January 16, 2007Assignee: Konica Minolta Medical & Graphic, Inc.Inventor: Saburou Hiraoka
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Patent number: 7153632Abstract: A radiation-sensitive composition includes a radically polymerizable component that comprises carboxy groups, an initiator composition to generate radicals, and a polymeric binder comprising poly(alkylene oxide) segments and optionally pendant cyano groups. This composition can be used to prepare imageable elements such as negative-working, on-press developable printing plate precursors.Type: GrantFiled: August 3, 2005Date of Patent: December 26, 2006Assignee: Eastman Kodak CompanyInventors: Shashikant Saraiya, Heidi M. Munnelly, Frederic E. Mikell, Kevin D. Wieland
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Patent number: 7150958Abstract: Polymeric material, containing a latent acid which can be converted to an acid by irradiation by a laser and optionally further ingredients.Type: GrantFiled: June 4, 2002Date of Patent: December 19, 2006Assignee: Ciba Specialty Chemicals CorporationInventor: Michael Heneghan
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Patent number: 7141353Abstract: The present invention provides a PS plate for use in making a lithographic printing plate, comprising an aluminum substrate provided thereon with a light-sensitive layer comprising a polyurethane resin binder, an addition polymerizable ethylenically unsaturated bond-containing compound and a photopolymerization initiator, wherein the polyurethane resin binder is one synthesized from at least the following compounds (i) to (iv): (i) at least one di-isocyanate compound; (ii) at least one diol compound having at least one carboxyl group; (iii) at least one diol compound whose log P value is less than 0; and (iv) at least one diol compound whose log P value is higher than 0.Type: GrantFiled: March 13, 2003Date of Patent: November 28, 2006Assignee: Fuji Photo Film Co., Ltd.Inventor: Yasuhito Oshima
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Patent number: 7129022Abstract: This invention relates to a photo-polymerization type photosensitive electrode paste composition for a plasma display panel that is capable of preventing a bubble from occurring on an electrode surface during an electrode paste printing process and a damage of an electrode pattern caused by adhesive strength reduction, and a method of fabricating the electrode using the same. A photo-polymerization type photo-sensitive electrode paste composition for a PDP according to the present invention includes a binder polymer for increasing viscosity; at least one of a multi-functional monomer and a multi-functional oligomer that are combined in the shape of chain in reaction to a radical; metal powder; a frit glass for gluing the metal powder; and a photo-initiator and solvent for generating the radical in reaction to a light.Type: GrantFiled: November 27, 2002Date of Patent: October 31, 2006Assignee: LG Electronics Inc.Inventors: Sang Tae Kim, Seung Tae Park, Lee Soon Park, Jong Woo Park
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Patent number: 7122289Abstract: A mixture and method for preparing a composition curable thermally and with actinic radiation comprising a binder free from carbon-carbon double bonds activatable with actinic radiation, at least one blocked or unblocked polyisocyanate having at least one soft, flexibilizing segment, and at least one unsaturated polyfunctional urethane that is free from isocyanate-reactive functional groups and contains on average per molecule more than four carbon-carbon double bonds activatable with actinic radiation and at least one hardening segment.Type: GrantFiled: March 14, 2002Date of Patent: October 17, 2006Assignee: BASF Coatings AGInventors: Guido Wilke, Ulrike Röckrath, Karl-Heinz Joost, Egon Wegner, Hubert Baumgart, Uwe Meisenburg
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Patent number: 7074546Abstract: Disclosed are a light sensitive planographic printing plate precursor and its processing method, the precursor comprising a hydrophilic support and provided thereon, a photopolymerizable light sensitive layer containing a compound represented by the following formula (1) or (2) and a compound represented by the following formula (3) or (4):Type: GrantFiled: May 22, 2003Date of Patent: July 11, 2006Assignee: Konica CorporationInventor: Kazuhiko Hirabayashi
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Patent number: 7056644Abstract: A method for producing a photosensitive planographic printing plate may comprise (i) carrying out electrolysis to an aluminum support in an aqueous solution of hydrochloric acid or nitric acid so as to provide the aluminum support with a roughened surface; (ii) coating a photosensitive composition on the roughed surface of the aluminum support to obtain a photosensitive layer, the photosensitive composition containing: (A) a monomer having an ethylenic double bond which is also polymerizable; (B) a photoinitiator composition containing an iron arene complex compound; and (C) a polymer binder, (iii) drying the photosensitive layer.Type: GrantFiled: April 20, 2004Date of Patent: June 6, 2006Assignee: Konica Minolta Medical & Graphic, Inc.Inventor: Kazuhiko Hirabayashi
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Patent number: 7045266Abstract: A lithographic printing original plate, a lithographic printing plate using the lithographic printing original plate and a process for producing the lithographic printing plate are disclosed. The lithographic printing original plate has, on a substrate, a photosensitive layer made of a crosslinked polymer comprising a hydrophilic polymer, a crosslinking agent and a light absorbing compound or comprising a hydrophilic polymer, a crosslinking agent, a light absorbing compound and a hydrophobic polymer, and has properties that the photosensitive layer is changed from ink-repellent to ink-receptive by irradiation with a light.Type: GrantFiled: April 26, 2001Date of Patent: May 16, 2006Assignee: Mitsui Chemicals, Inc.Inventors: Hiroshi Mase, Sumio Hirose, Yuko Suzuki, Katsuru Matsumoto, Takayuki Sanada
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Patent number: 7041431Abstract: A photosensitive lithographic printing plate comprises a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate for image formation at a wavelength of 410 nm (S410) is at most 100 ?J/cm2, and the relation between the minimum exposure for image formation at a wavelength of 450 nm (S450) and the minimum exposure for image formation at a wavelength of 410 nm (S410) is 0<S410/S450?0.1.Type: GrantFiled: December 18, 2003Date of Patent: May 9, 2006Assignee: Lastra S.p.A.Inventors: Toshiyuki Urano, Kazuhiro Kohori, Hideaki Okamoto
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Patent number: 7033725Abstract: An infrared-sensitive photosensitive composition comprising (A) an alkali-soluble resin containing a repeating unit having an alkylene oxide group, and (B) a light-to-heat converting agent; and an infrared-sensitive photosensitive composition comprising (A?) a polyurethane resin having a specific diol as a constituent, (B) a light-to-heat converting agent, and (C) a novolak resin.Type: GrantFiled: November 27, 2002Date of Patent: April 25, 2006Assignee: Fuji Photo Film Co., Ltd.Inventors: Ikuo Kawauchi, Takeshi Serikawa
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Patent number: 6984483Abstract: The invention relates to organically modified, stable in storage, UV curable, NIR permeable silicic acid polycondensates which are photostructurable in layers having a thickness of 1 to 150 ?m. The invention also relates to the production and use thereof as negative resists. The polycondensates according to the invention are obtainable by condensation of organically modified silanediols of the formula I with organically modified silanes of the formula II. Ar2Si(OH)2 ??(I) RSi(OR?)3 ??(II) The radicals are identical or different and have the following meaning: Ar=a radical having 6 to 20 carbon atoms and at least one aromatic group, R=an organic radical having 2 to 15 carbon atoms and at least one epoxy group and/or at least one C?C double bond, R?=methyl or ethyl. Condensation occurs without the addition of water. The molar ratio of said compounds I and II is 1:1.Type: GrantFiled: May 31, 2000Date of Patent: January 10, 2006Assignee: Fraunhofer-Gesellschaft zur Foerderung der angewandten Forschung e.V.Inventors: Christof Roscher, Ralf Buestrich
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Patent number: 6960422Abstract: The present invention discloses a negative planographic printing plate precursor for infrared exposure having an image recording layer containing an infrared absorbing agent, a radical generator and a radical polymerizable compound on a support characterized in that a sensitivity ratio (S1/S60) of a sensitivity (S60) when developed 60 minutes after infrared laser exposure to a sensitivity (S1) when developed one minute after exposure is at least 0.5 and less than 1.0 in the image recording layer. It is preferable that this composition contains a polymer compound which has a functional group having high radical reactivity and can be dissolved or swollen in water or an aqueous alkali solution.Type: GrantFiled: June 5, 2003Date of Patent: November 1, 2005Assignee: Fuji Photo Film Co., Ltd.Inventor: Takahiro Goto
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Patent number: 6951700Abstract: The use of a compound of formula (A), which comprises a group of sub-formula (I) where R1, R2, R3, R4, R5, R6, X1 and Y1 are various specified organic groups wherein at least one of said groups has sufficient electron whitdrawing properties to activate the multiple bonds to polymerisation, in a stereolithographic composition. Stereolithographic applications of these compounds are also described and claimed.Type: GrantFiled: November 30, 2000Date of Patent: October 4, 2005Assignee: Qinetiq LimitedInventors: John W Goodby, Alan W Hall, Keith M Blackwood, Paul E Y Milne, Andrew G Biggs, Ryan M Heath, Robert W Bannister
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Patent number: 6949327Abstract: Thermally imageable elements useful as on-press developable lithographic printing plate precursors are disclosed. The elements comprise a substrate and a layer of an imageable composition over the substrate. The imageable composition comprises a photothermal conversion material, particles of a polyurethane polymer, and, optionally, a water soluble polymer. The polyurethane polymer comprises urethane linkages in the main chain, but does not comprise side chain urethane groups.Type: GrantFiled: July 9, 2003Date of Patent: September 27, 2005Assignee: Kodak Polychrome Graphics LLCInventors: Shiying Zheng, Elizabeth Knight, S. Peter Pappas
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Patent number: 6946231Abstract: A presensitized lithographic printing plate comprises a hydrophilic support and an image-forming layer. The image-forming layer contains microcapsules. The microcapsules consist of a shell and a core. The shell comprises a polymer. The polymer has a decomposition temperature in the range of 150 to 280° C. The core comprises a polymerizable compound.Type: GrantFiled: August 8, 2003Date of Patent: September 20, 2005Assignee: Fuji Photo Film Co., Ltd.Inventor: Naonori Makino
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Patent number: 6939661Abstract: A composition for forming a radiation absorbing coating which comprises an organic solvent, a radiation absorbing polymer or a radiation absorbing material dissolved therein and a crosslinking agent having blocked isocyanate groups. Since the isocyanate groups of the crosslinking agent have been blocked, the composition containing the crosslinking agent has excellent storage stability. When the composition applied to a substrate and then baked, crosslinking proceeds to give an antireflective coating, which does not intermix with a resist layer to be formed thereon by coating and is free from diffusion of a photo-generated acid thereinto from the resist layer. As a result, a resist image free from footing or scum can be formed.Type: GrantFiled: August 30, 2002Date of Patent: September 6, 2005Assignee: Clariant Finance (BVI) LimitedInventors: Wen-Bing Kang, Ken Kimura, Shoko Matsuo, Yoshinori Nishiwaki, Hatsuyuki Tanaka
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Patent number: 6916598Abstract: This invention discloses compositions that can be polymerized/crosslinked imagewise upon exposure to ionization radiation such as x-ray, electron beam, ion beam, and gamma-ray. This invention also discloses methods of use for these compositions for microfabrication of ceramics, for stereolithography, and for x-ray, e-beam, and ion-beam lithography which can be used for photoresists.Type: GrantFiled: March 21, 2003Date of Patent: July 12, 2005Assignee: E. I. du Pont de Nemours and CompanyInventor: Ying Wang
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Patent number: 6905810Abstract: A permanent resist obtained by at least photoexposure and alkali development of a photosensitive resin composition, the permanent resist containing a metal carboxylate group, or a carboxyl group (a carboxyl anhydride group is also included among a carboxyl group according to the invention) and a metal carboxylate group, wherein an alkaline earth metal carboxylate group constitutes at least 30 mole percent of the total of a carboxyl group and a metal carboxylate group.Type: GrantFiled: June 6, 2003Date of Patent: June 14, 2005Assignee: Hitachi Medical Co., Ltd.Inventors: Tetsuya Yoshida, Naoki Sasahara, Katsunori Tsuchiya, Akio Nakano
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Patent number: 6902866Abstract: Negative thermosensitive lithographic printing plates comprise on a hydrophilic substrate an oleophilic thermosensitive layer comprising a polymeric binder, urethane (meth)acrylate monomer having at least 6 (meth)acrylate groups, a non-urethane (meth)acrylate monomer having at least 4 (meth)acrylate groups, a free-radical initiator, and an infrared absorbing dye; wherein the weight ratio of said urethane (meth)acrylate monomer to said non-urethane (meth)acrylate monomer is from 0.10 to 3.0, and said thermosensitive layer is capable of hardening upon exposure to an infrared radiation. Lithographic plates with such compositions have excellent press durability.Type: GrantFiled: November 24, 2003Date of Patent: June 7, 2005Inventor: Gary Ganghui Teng
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Patent number: 6893797Abstract: Negative working thermally imageable elements useful as lithographic printing plate precursors and methods for their use are disclosed. The elements have a substrate, a layer of imageable composition over the substrate, and, optionally, an overcoat layer over the layer of imageable composition. The imageable composition has an allyl-functional polymeric binder. Optimum resolution and on-press performance can be attained without a post-exposure bake. The elements do not require a post-exposure bake and can be used in on-press development applications.Type: GrantFiled: August 12, 2002Date of Patent: May 17, 2005Assignee: Kodak Polychrome Graphics LLCInventors: Heidi M. Munnelly, Paul R. West, Shashikant Saraiya, Jian Bing Huang
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Patent number: 6890702Abstract: Disclosed are a light sensitive composition containing A) an addition polymerizable ethylenically double bond-containing monomer, B) a photopolymerization initiator, and C) a polymer binder, wherein the addition polymerizable ethylenically double bond-containing monomer is a reaction product of a tertiary amine having two or more hydroxyl groups in the molecule, a diisocyanate having an aromatic ring in the molecule and a compound having a hydroxyl group and an addition polymerizable ethylenically double bond in the molecule, and a light sensitive planographic printing plate precursor comprising the light sensitive composition.Type: GrantFiled: June 25, 2003Date of Patent: May 10, 2005Assignee: Konica CorporationInventor: Toshiyuki Matsumura
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Patent number: 6884568Abstract: The use of certain mercapto compounds as shelf life improvers for infrared-sensitive lithographic printing plate precursors is disclosed. The compounds are five-membered heteroaromatic rings containing a nitrogen atom and at least one other heteroatom, which can be oxygen, sulfur, or another nitrogen atom, such that two ring heteroatoms are bonded to a ring carbon bearing a thiol group.Type: GrantFiled: April 25, 2002Date of Patent: April 26, 2005Assignee: Kodak Polychrome Graphics, LLCInventors: Hans-Joachim Timpe, Tobias Wittig, Ursula Müller
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Patent number: 6878505Abstract: A photosensitive composition comprising (i) a sensitizing dye represented by the following formula (I), (II) or (III) defined in the specification, (ii) a titanocene compound and (iii) a compound of undergoing a reaction with at least one of a radical and an acid to change at least one of its physical and chemical properties and maintaining the changed physical or chemical property, and a lithographic printing plate having a photosensitive layer comprising the photosensitive composition.Type: GrantFiled: May 28, 2002Date of Patent: April 12, 2005Assignee: Fuji Photo Film Co., Ltd.Inventors: Akinori Shibuya, Kazuto Kunita
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Patent number: 6864040Abstract: The present invention relates to IR-sensitive compositions containing an initator system comprising: (a) at least one compound capable of absorbing IR radiation selected from triarylamine dyes, thiazolium dyes, indolium dyes, oxazolium dyes, cyanine dyes, polyaniline dyes, polypyrrole dyes, polythiophene dyes and phthalocyanine pigments (b) at least one compound capable of producing radicals selected from polyhaloalkyl-substituted compounds (c) at least one polycarboxylic acid represented by the following formula I wherein Y is selected from the group consisting of O, S and NR7, each of R4, R5 and R6 is independently selected from the group consisting of hydrogen, C1-C4 alkyl, aryl which is optionally substituted, —COOH and NR8CH2COOH, R7 is selected from the group consisting of hydrogen, C1-C6 alkyl, —CH2CH2OH, and C1-C5 alkyl substituted with -COOH, R8 is selected from the group consisting of —CH2COOH, —CH2OH and —(CH2)2N(CH2COOH)2 and r is 0, 1, 2 or 3 with the proviso that at least one of R4, R5, RType: GrantFiled: April 11, 2001Date of Patent: March 8, 2005Assignee: Kodak Polychrome Graphics LLCInventors: Ursula Müller, Tobias Wittig, Hans-Joachim Timpe
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Patent number: 6858373Abstract: A photosensitive composition comprising a resin containing a repeating unit corresponding to a monomer having a structure represented by formula (I) defined in the specification, and a negative working lithographic printing plate having a negative working photosensitive layer comprising the above-described photosensitive composition.Type: GrantFiled: March 27, 2002Date of Patent: February 22, 2005Assignee: Fuji Photo Film Co., Ltd.Inventor: Kazuto Kunita
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Patent number: 6855480Abstract: Disclosed are photoimageable compositions having improved stripping properties as well as methods for manufacturing printed wiring boards using such photoimageable compositions.Type: GrantFiled: April 6, 2002Date of Patent: February 15, 2005Assignee: Shipley Company, L.L.C.Inventors: Stephen H. Wheeler, Randall W. Kautz, Robert K. Barr
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Patent number: 6844137Abstract: A heat mode corresponding negative-type image recording material by which ablation in laser scanning when recording is suppressed, the intensity of the formed image portion can be high and a planographic plate excellent in plate life can be formed is provided. It is characterized in that it contains (A) polyurethane resin insoluble in water and soluble in an aqueous alkaline solution or a polymeric compound which has on the side chain thereof a group represented by the general formula (39) or the general formula (40) as a polymeric compound insoluble in water and soluble in an aqueous alkaline solution, (B) a radical-polymerizable compound, (C) a light-to-heat converting agent and (D) a compound generating a radical by heat mode exposure of a light of wavelength which can be absorbed by (C) a light-to-heat converting agent and image recording can be carried out by the heat mode exposure.Type: GrantFiled: March 1, 2001Date of Patent: January 18, 2005Assignee: Fuji Photo Film Co., Ltd.Inventors: Kazuhiro Fujimaki, Tadahiro Sorori
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Patent number: 6844136Abstract: This present invention discloses a photopolymerisable mixture comprising a polymer binder, a radically photopolymerisable component containing at least one photooxidisable group, a polyethylene glycol di(meth)acrylate containing 2 or more ethylene glycol units, a photoreducible dye and a metallocene. This mixture can be used for preparing high-speed light-sensitive recording materials showing a particularly high resolution, especially for small negative types.Type: GrantFiled: August 24, 2000Date of Patent: January 18, 2005Assignee: AGFA-GevaertInventors: Thorsten Lifka, Sabine Kosack, Thomas Leichsenring, Hans-Joachim Schlosser
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Patent number: 6841336Abstract: A plate-making method of a lithographic printing plate comprising exposing imagewise a photosensitive lithographic printing plate comprising an aluminum support and a photosensitive layer comprising a photosensitive composition of photopolymerization type, which contains a compound having a nitrogen atom and an ethylenically unsaturated double bond, a photopolymerization initiator and a polymer binder, and developing the exposed printing plate with a developing solution containing (1) an inorganic alkali agent and (2) a nonionic surface active agent having a polyoxyalkylene ether group.Type: GrantFiled: October 16, 2001Date of Patent: January 11, 2005Assignee: Fuji Photo Film Co., Ltd.Inventor: Shunichi Kondo
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Patent number: 6841332Abstract: A photoresist compound or composition achieves a uniform volume growth in a chemical expansion on a chemically expandable photomask during a method for structuring a layer of the photoresist compound. The photoresist composition comprises a film-forming polymer having molecular groups that can be converted into alkali-soluble groups through acid-catalyzed separation reactions, and reactive molecular groups that can react with an expansion component so as to form a chemical bond. In addition, the photoresist composition comprises a photoacid generator that releases an acid upon exposure with radiation from a suitable wavelength range, and a thermoacid generator that releases an acid when supplied with sufficient thermal energy.Type: GrantFiled: April 26, 2002Date of Patent: January 11, 2005Assignee: Infineon Technology AGInventors: Gertrud Falk, Eberhard Kuehn, Ernst Christian Richter, Michael Sebald
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Patent number: 6830861Abstract: A photopolymerizable composition that is highly sensitive not only to ultraviolet light, but also light in the range from visible light to infrared light, and a recording material containing the photopolymerizable composition, which is excellent in sensitivity and decolorization property in the background part, and which is capable of forming sharp images with high contrast. The photopolymerizable composition contains a polymerizable compound having an ethylenic unsaturated bond and a radical generator capable of forming a radical by the action of the compound and the radical generator upon each other.Type: GrantFiled: February 1, 2002Date of Patent: December 14, 2004Assignee: Fuji Photo Film Co., Ltd.Inventors: Masanobu Takashima, Yuuichi Fukushige
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Publication number: 20040234893Abstract: The present invention provides a resin composition that includes (A) a polymer compound that has, on a side chain of a main chain polymer, through a linkage group containing a hydrogen-bonding group and a ring structure, a terminal ethylenic unsaturated bond, and is soluble or swelling in water or an alkali aqueous solution, and (B) a compound that generates radicals when exposed to light or heat. The invention further provides a thermo/photosensitive composition that includes (A′) a polymer compound that has a non-acidic hydrogen-bonding group on a side chain and is soluble or swelling in water or an alkali aqueous solution, and (B′) a compound that generates radicals when exposed to light or heat.Type: ApplicationFiled: August 12, 2003Publication date: November 25, 2004Applicant: FUJI PHOTO FILM CO., LTD.Inventor: Kazuhiro Fujimaki
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Patent number: 6818378Abstract: A lithographic printing plate precursor comprising a support having provided thereon an image-recording layer containing a substance that absorbs light to generate heat, an aqueous alkali solution-soluble resin having phenolic hydroxy group and a polyvinyl acetal resin including an acid group having a pKa of not more than 5.Type: GrantFiled: November 25, 2002Date of Patent: November 16, 2004Assignee: Fuji Photo Film Co., Ltd.Inventor: Akihiro Endo
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Publication number: 20040219457Abstract: A photopolymerisable system is disclosed which can be polymerised by exposure to UV light, for example, to form a solid, light-transmitting sheet material having volume refractive index variations defining an optical diffuser or a hologram, for example. The system includes a silicone monomer, prepolymer, macromonomer or co-monomer capable of undergoing free radical initiated polymerization and further includes a photoinitiator.Type: ApplicationFiled: October 16, 2003Publication date: November 4, 2004Inventors: Robin J.T. Clabburn, Rifat Iqbal, Stephen Moratti