Abstract: Oxime ester compounds of the formula I, II, III, IV or V, wherein Z is for example (formula A); Z1 for is NO2, unsubstituted or substituted C7-C20aroyl or unsubstituted or substituted C4-C20heteroaroyl; provided that at least one Z1 is other than NO2; Z2 is for example unsubstituted or substituted C7-C20aroyl; R1, R2, R3, R4, R5 and R6 for example are hydrogen, halogen, or unsubstituted or substituted C1-C20alkyl, unsubstituted or substituted C6-C20aryl, or unsubstituted or substituted C4-C20heteroaryl; R9, R10, R11, R12 and R13 for example are hydrogen, halogen, OR16, unsubstituted or substituted C1-C20alkyl; provided that R9 and R13 are neither hydrogen nor fluorine; R14 is for example unsubstituted or substituted C6-C20aryl or C3-C20heteroaryl Q is for example C6-C20arylene or C3-C20heteroarylene; Q1 is —C1-C20alkylene-CO—; Q2 is naphthoylene; Q3 is for example phenylene; L is for example O-alkylene-O—; R15 is for example hydrogen or C1-C20alkyl; R20 is for example hydrogen, or unsubstituted or substituted

Abstract: A method, system and computer program product for implementing an enhanced optical mirror coupling and alignment mechanism utilizing two-photon resist. An initial placement is provided for one or more vias on a printed circuit board. A via is filled with a resist. A series of tightly focused light beams suitably exposes the resist at varying depths in the via, the varying depths defining a sloped polymer in the via after removing resist that had not been at the focus of the light beam. The sloped polymer is coated with reflective material to reflect light into or out of the via.

Abstract: Provided is a method for manufacturing a liquid crystal display device that includes a photoalignment film. The photoalignment film is formed from a liquid crystal alignment agent, and aligns liquid crystal molecules horizontally to the main face of the at least one of the substrates. The liquid crystal alignment agent contains a solvent and at least two kinds of polyamic acids or their derivatives obtained by reacting diamine and tetracarboxylic dianhydride. At least two of the diamines and at least one of the tetracarboxylic dianhydrides are compounds represented by predetermined formulas. The method includes the steps of: (1) forming the film of the liquid crystal alignment agent; (2) pre-baking the film; (3) irradiating the pre-baked film with light; and (4) post-baking the irradiated film, the step (4) including an operation of post-baking the film multiple times at temperatures ranging from low to high temperatures.

Abstract: A light control film includes a light shielding layer and a light diffusion portion, and, when an area of a part where the light shielding layer is in contact with one surface of the base material is set to S1, and an area of a part where a low refractive index portion is exposed between light incidence end surfaces is set to S2, the light shielding layer and the light diffusion portion are formed so as to satisfy (S1?S2)/S1×100?50.

Abstract: A viewing angle extending film (a light diffusing member) includes a base material with optical transparency, a plurality of light-shielding layers dotted on one surface of the base material, and a transparent resin layer (optically transparent material layer) provided on the one surface of the base material. At least a light-shielding layer, which is part of the plurality of light-shielding layers, has a planar shape surrounded by a first figure and a second figure contained in the first figure or a planar shape surrounded by at least part of the first figure and at least part of the second figure overlaid with the first figure. Hollow portions are provided in a formation region of the light-shielding layers, each hollow portion being shaped so that a cross-sectional area obtained by cutting along a plane parallel to the one surface of the base material is large on the light-shielding layer side and is gradually decreased as being away from the light-shielding layer.

Abstract: A method of manufacturing an optical filter includes preparing a substrate having a panel region, a peripheral region, and an alignment region, forming an outer black matrix on the substrate, such that the outer black matrix surrounds the panel region, forming a dummy black matrix on the substrate, such that the dummy black matrix is in the peripheral region while exposing the alignment region, forming a first color photoresist layer on the substrate to cover the outer black matrix and the dummy black matrix, forming a first color pattern in the panel region and an alignment pattern in the alignment region by patterning the first color photoresist layer, forming a second color photoresist layer on the substrate, forming a second color pattern in the panel region by patterning the second color photoresist layer, and forming a third color pattern in the panel region.

Abstract: A material for a microlens having heat resistance, high resolution and high light-extraction efficiency is provided. A positive resist composition comprises an alkali-soluble polymer containing a unit structure having an aromatic fused ring or a derivative thereof, and a compound having an organic group which undergoes photodecomposition to yield an alkali-soluble group. The positive resist composition has coating film properties of a refractive index at a wavelength of 633 nm of 1.6 or more and a transmittance at wavelengths of 400 to 730 nm of 80% or more. A pattern forming method comprises applying the positive resist composition, drying the composition, exposing the composition to light, and developing the composition.

Abstract: Methods herein form a photoresist on an exterior of a cylinder and expose the photoresist to a light source while rotating the cylinder. Such methods develop the photoresist, after exposing, to change the photoresist into a patterned protective layer on the exterior of the cylinder. Then, these methods pattern the exterior of the cylinder while rotating the cylinder using the patterned protective layer to produce a patterned cylinder.

Abstract: The present invention relates to a process for the preparation of a polymeric relief structure by a) coating a substrate with a first coating composition comprising one or more radiation-sensitive ingredients, d) locally treating the coated substrate with electromagnetic radiation having a periodic or random radiation-intensity pattern, forming a latent image, e) polymerizing and/or crosslinking the resulting coated substrate to a first coating. This process is improved by applying a second coating composition on top of the first coating composition, said second coating composition comprising either an organic compound (Co) of a monomeric nature and wherein Co is also polymerized during the process, or wherein said second coating comprises a dissolved polymer (Cp). As a result a polymeric relief structure is obtained, where a substrate is coated with a functional, stacked, bi-layer, in which each layer exhibits a specific, and from each other differing function.

Abstract: A method for fabricating a photo spacer and an array substrate having the photo spacer are provided. At least one exposure process, a developing process, and a baking process are performed to a photo-sensitive material layer formed a substrate to fabricate a photo spacer, wherein the at least one exposure process includes a back side exposure process. The substrate has a light transmitting region and a light shielding region so that the photo-sensitive material layer is defined into a first block and a second block after the back side exposure process. The developing process is performed to at least remove the second block. A front side exposure process is performed to the first block. The baking process is performed to cure the first block of the photo-sensitive material layer to form a photo spacer.

Abstract: An optical element structure and a fabricating process for the same are provided. The optical element fabricating process includes providing a substrate forming thereon a protrusion; and forming an over coating layer over the protrusion and the substrate by a deposition scheme to form an optical element.

Abstract: A method is provided for mastering optically variable devices (OVDs) used to authenticate optical discs. The method generally includes the steps of providing a laser beam recorder (LBR), introducing a substrate to the LBR, and exposing a portion of the substrate to the LBR. The mastering system thus includes the LBR, which has a laser that emits a beam, a processor or computer for programming or otherwise controlling the beam in order to expose the substrate and create the desired optical effect. Depending on the material used for the substrate, the exposure is then developed, if necessary, and processed to generate a master for the OVD. The OVD can then be replicated in order to provide authentic resultant products or articles, such as optical discs.

Abstract: A pixel array is disclosed that comprises a storage capacitor, and the pixel array is coated with a color filter area, where the color filter areas comprises a first color filter area of the storage capacitor and a second color filter area of the regions beyond the storage capacitor. The thickness of the first color filter area is bigger than the thickness of the second color filter area, and the thickness of the regions beyond the storage capacitor is equivalent to the minimum value of thickness that retains the color chroma of the pixel array, which enables a pixel to hold the desired potential within a frame cycle while the area of the storage capacitor is diminished. The invention further provides a fabrication method of the pixel array.

Abstract: Volumetric Bragg grating devices that operate in middle-infrared region of the spectrum and methods for producing such devices are described. Such a Volumetric Bragg grating device can be produced by forming a plurality of color centers within an alkali-halide crystal and selectively removing a subset of the plurality of color centers to produce variations in refractive index of the alkali-halide crystal in the middle-infrared spectral region and to thereby produce a volumetric Bragg grating that operates in middle-infrared spectral range.

Abstract: A method of creating a region of index change in a photopolymer includes providing a photopolymer having a photosensitivity to light of a particular wavelength and creating a region of index change in the photopolymer by applying direct write lithography to expose the photopolymer of the region to light that includes the particular wavelength.

Abstract: Provided are an optical modulator modulating optical signals and an optical module including the same. The optical modulator includes a lower clad layer, an optical transmission line extended in a first direction on the lower clad layer, and an upper clad layer on the optical transmission line and the lower clad layer. The optical transmission line may include graphene.

Abstract: The brightness of a TIR-based display is enhanced with a registered reflective element by recycling and reflecting light that passes through the dark pupil region of each hemi-spherical protrusion in the hemi-spherical surface back to the viewer. A method to fabricate a brightness enhanced TIR display comprising an apertured membrane with a thin conductive reflective metal layer facing and registered with the pupils of the hemi-spherical surface.

Abstract: A positive photosensitive siloxane composition containing: a polysiloxane (Ia), which is obtained by hydrolyzing and condensing the silane compound represented by RSi(OR1)3 in general formula (1) and the silane compound represented by Si(OR1)4 in general formula (2) in the presence of a basic catalyst, and a pre-baked film of which has a dissolution rate of 1,000 ?/second or less in a 5 wt % TMAH aqueous solution; a polysiloxane (Ib), which is obtained by hydrolyzing and condensing at least the silane compound represented by general formula (1) in the presence of an acid or basic catalyst, and a pre-baked film of which has a dissolution rate of 100 ?/second or more in a 2.38 wt % TMAH aqueous solution; and a diazonaphthoquinone derivative and solvent.

Abstract: A color conversion substrate includes a main plate having a first main surface and including a transparent substrate, and a fluorescent material layer including a light scattering layer formed at the first main surface for scattering incident light and emitting the light outside, and having a hole formed, and a fluorescent material body formed in said hole, exhibiting luminescence emission when light of an incident wavelength region is incident. The inner surface of the light scattering layer defining the hole reflects the light from the fluorescent material body output from the fluorescent material body towards the main plate.

Abstract: The optical waveguide with mirror 10 of the present invention includes: a lower clad layer 22; a core pattern 24 formed above the lower clad layer 22; a mirror 30 formed on the inclined surface 31 of the core pattern 24; an upper clad layer 26 covering the part other than the mirror 30 on the core pattern 24; and an opening 26a with an approximate pillar shape, the opening being formed on the upper clad layer 26, wherein the mirror 30 is formed in the opening 26a.

Abstract: The present invention pertains to a pattern phase difference film, which is used to display 3D images using a passive system, and provides a method for producing a pattern phase difference film that can be manufactured with high precision, easily and in large quantities. In a mask provided for manufacturing an alignment film, slits, which are provided for exposure treatment, are made so as to gradually narrow toward the ends in the longitudinal direction.

Abstract: A birefringence pattern builder used in a method of producing a patterned birefringent product including a step of patterned light exposure of an optically anisotropic layer and a step of heating the layer after the light exposure to 50° C. or higher but not higher than 400° C., which include the optically anisotropic layer, a support, and a laminate film in this order, is provided. The birefringence pattern builder prevents nonuniformity of functional layers that may generate in the production process, is useful for a production method that hardly causes nonuniformity in the patterned birefringent product even after a rolling-up step in the industrial production process, and enables a production of a thinner product.

Abstract: An embodiment of the present invention relates to a method of fabricating an optical device, the method comprising the steps of: depositing a photoresist layer on a carrier, said photoresist layer containing at least one optical component, determining the position of the at least one optical component inside the photoresist layer before exposing the photoresist layer to a first radiation, said first radiation being capable of transforming the photoresist layer from an unmodified state to a modified state, elaborating a device pattern based on the position of the at least one optical component, and fabricating the elaborated device pattern by locally exposing the photoresist layer to the first radiation and locally transforming the photoresist layer from the unmodified state to the modified state.

Abstract: Disclosed is a positive photosensitive resin composition which is characterized by containing (a) a polysiloxane that is synthesized by hydrolyzing and partially condensing a specific organosilane and an organosilane oligomer, (b) aluminum compound particles, tin compound particles, titanium compound particles, zirconium compound particles, composite particles of the aforementioned compounds or composite particles of any of the aforementioned compounds and a silicon compound, (c) a naphthoquinonediazide compound and (d) a solvent. The positive photosensitive resin composition is also characterized in that the organosilane oligomer contains a specific organosilane. The positive photosensitive resin composition has achieved excellent sensitivity and resolution without deteriorating high refractive index and high transparency.

Abstract: A black curable composition for forming a light-shielding color filter of solid-state imaging device is provided, which is capable of forming a pattern at low exposure dose even when containing a high concentration of an inorganic pigment, and preventing pattern defects. Also, a black curable composition for a wafer level lens is provided, which is capable of forming a cured film having excellent light shieldability and excellent in co-formability of both a large pattern and a fine pattern. The composition includes: an inorganic pigment; a copolymer containing a monomer having at least one of an amino group and a nitrogen-containing heterocyclic group, a monomer having at least one group of a carboxyl group, a phosphate group and a sulfonate group, and a macromonomer having a weight average molecular weight from 1,000 to 50,000; a polymerization initiator; a polymerizable compound; and an alkali-soluble resin having an unsaturated double bond.

Abstract: A process for preparing a subassembly, the process comprising: (a) defining the location of one or more grooves for receiving optical conduits on the top planar surface of a wafer or panel, the grooves corresponding to multiple interposers on the wafer or panel; and (b) etching the grooves into the wafer or panel, each groove having sidewalls and first and second terminal ends and a first facet at each terminal end perpendicular to the side walls, each first facet having a first angle relative to the top planar surface, each groove being shared by a pair of transmitting and receiving interposers on the wafer or panel prior to being diced such that the first and second terminal ends of each groove correspond to transmitting and receiving interposers, respectively.

Abstract: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.

Abstract: Films for optical use, articles containing such films, methods for making such films, and systems that utilize such films, are disclosed.

Abstract: A method of forming an alignment film is provided. A photosensitive polymer material is provided, wherein the photosensitive polymer material defines a first pixel area and a second pixel area respectively defining a first sub-pixel area and the second sub-pixel area. In a first exposure, the photosensitive polymer material is irradiate by a first exposure light and a second exposure light to form a first alignment portion and a second alignment portion with different alignment directions in the first sub-pixel of the first pixel area and the second sub-pixel of the second pixel area respectively. In a second exposure, the photosensitive polymer material is irradiated with the first exposure light and the second exposure light to form a third alignment portion and a fourth alignment portion with different alignment directions in the first sub-pixel of the second pixel area and the second sub-pixel of the first pixel area respectively.

Abstract: The present invention discloses a UV glass production method, comprising the steps: arranging a blade on an exposure stage; controlling the position of an exposure area on a glass substrate by regulating the position of the blade; removing a film layer from the area to be transparent; and forming a UV mask in the area to be shaded. In the present invention, a mask blade is adopted, can individually move and be accurately controlled individually; thus, rays of an exposure machine can be accurately positioned for producing a UV glass which meets standards. Moreover, in the present invention, there is no need to design a light cover especially so as to save the design and production cost of the light cover; thus, the present invention can ensure the production accuracy and effectively save the production cost.

Abstract: Embodiments of an apparatus including a color filter arrangement formed on a substrate having a pixel array formed therein. The color filter arrangement includes a clear filter having a first clear hard mask layer and a second clear hard mask layer formed thereon, a first color filter having the first clear hard mask layer and the second hard mask layer formed thereon, a second color filter having the first clear hard mask layer formed thereon, and a third color filter having no clear hard mask layer formed thereon. Other embodiments are disclosed and claimed.

Abstract: The present invention provides a colored composition for a light-shielding film including at least one selected from titanium atom-containing black titanium pigments and at least one organic pigment selected from the group consisting of a red organic pigment, a yellow organic pigment, a violet organic pigment, and an orange color organic pigment, which has a maximum value of the transmittance of light having a wavelength of 400 to 700 nm of 1.5% or less when a film is formed such that the light transmittance at a wavelength of 650 nm is 0.2%, has a wavelength showing the maximum transmittance at 400 to 550 nm, and has a light transmittance at a wavelength of 400 nm of 0.1% or more.

Abstract: An optical element structure and a fabricating process for the same are provided. The optical element fabricating process includes providing a substrate forming thereon a protrusion; and forming an over coating layer over the protrusion and the substrate by a deposition scheme to form an optical element.

Abstract: There is provided an optical waveguide which has appropriate orientation properties, a production process of which is simple so as to be suitable for producing an electro-optical element, and is able to reduce power consumption of the element due to excellent electro-optical properties, and further can be formed into a thin film and be layered; and a material for the optical waveguide. A cladding material of an optical waveguide, characterized by comprising a polymer compound including a triarylamine structure, and a nonlinear optical compound; and an optical waveguide produced by using the cladding material.

Abstract: A pattern phase difference film, which is used to display 3D images using a passive system, and provides a method for producing a pattern phase difference film that can be manufactured with high precision, easily and in large quantities. A mask, which has slits that are made narrow compared to the width of a region that is to undergo exposure treatment and are provided for exposure treatment, is manufactured.

Abstract: The present invention provides a manufacturing method of transparent electrode and mask thereof. The method includes: forming a film on a glass substrate, and coating photo-resist on film; irradiating photo-resist through mask, wherein the mask at corresponding active area of liquid crystal panel forming, from outer area to inner area, at least a first area and a second area, gap of pattern corresponding to transparent electrode in first area being first gap, gap of pattern in second area being second gap, first gap being greater than corresponding default gap, difference between first gap and corresponding default gap being greater than difference between second gap and corresponding default gap: and performing photolithography and etching processes on substrate after exposure to form transparent electrodes on substrate. As such, the present invention can reduce gap errors of formed transparent electrodes in entire active area to improve display effect.

Abstract: A method of fabricating a phase plate, for use in a transmission electron microscope, with simple process steps is offered. The method includes a step (S100) of forming a first layer on a substrate, a step (S102) of patterning the first layer to form through-holes extending through the first layer, a step (S104) of etching the surface of the substrate opposite to the surface on which the first layer is formed to form an opening which is in communication with the through-holes and which exposes the first layer, and a step (S106) of forming a second layer on the first layer.

Abstract: Films for optical use, articles containing such films, methods for making such films, and systems that utilize such films, are disclosed.

Abstract: A reticle includes a repetition pattern and a peripheral pattern, one of which has a first side in a first direction and the other a second side in the first direction. The first side has a first length that is n times the second length of the second side, where n is an integer equal to or larger than 1. The first pattern has at least one of first misalignment measurement patterns provided at positions distant by a third length and ((the third length)+(n?1).times.(the second length)) from an upper end of the first pattern. The third length is equal to or smaller than the second length. The second pattern has a second misalignment measurement pattern provided at a position distant by the third length from an upper end of the second pattern.

Abstract: An organic-inorganic hybrid electroluminescent device having a semiconductor nanocrystal pattern prepared by producing a semiconductor nanocrystal film using semiconductor nanocrystals, where the nanocrystal is surface-coordinated with a compound containing a photosensitive functional group, exposing the film through a mask and developing the exposed film.

Abstract: A method is described for the direct photochemical modification and micro-patterning of polymer surfaces, without the need to use a photoresist. For example, micropatterns of various functional chemical groups, biomolecules, and metal films have been deposited on poly(carbonate) and poly(methyl methacrylate) surfaces. These patterns may be used, for example, in integrated electronics, capture elements, or sensing elements in micro-fluidic channels.

Abstract: A method for manufacturing a waveguide lens is provided. A planar waveguide is provided, wherein the planar waveguide includes a top surface and a side surface perpendicularly connecting with the top surface, the side surface is coupled to a laser light source, and the laser light source emits a laser beam having a divergent angle and an optical axis substantially perpendicular to the side surface. A media film grating is formed on the top surface. The media film grating is made of a high refractive index material. The media film grating includes a plurality of parallel media film strips, each of which is substantially perpendicular to the side surface. A pair of strip-shaped electrodes is formed on the top surface and is arranged at opposite sides of the media film grating and the optical axis. The pair of strip-shaped electrodes is substantially parallel to the media film strips.

Abstract: A photosensitive composition contains (A) a hollow or porous particle, (B) a compound capable of generating an active species upon irradiation with an actinic ray or radiation, and (C) a compound capable of changing in the solubility for an alkali developer by the action of the active species.

Abstract: A light-diffusion member includes a substrate having light transparency, a plurality of light-diffusion parts formed on one surface of the substrate, and a light-absorbing layer formed in a region other than a region where the light-diffusion parts are formed, among the one surface of the substrate. Each light-diffusion part includes a light-emission end surface on the side of the substrate and a light-incident end surface of an area larger than an area of the light-emission end surface on a side opposite to the side of the substrate. The height from the light-incident end surface of the light-diffusion part to the light-emission end surface thereof is larger than the thickness of the light-absorbing layer. The plurality of light-diffusion parts are randomly arranged on the one surface of the substrate.

Abstract: A method for producing an optical orientation film is disclosed, the method being able to realize highly accurate exposure in a pattern, even if a simple device and non-parallel light are used and a long continuous resin substrate is used and fed continuously. The method for producing the optical orientation film includes the steps of: (i) preparing an irradiation target substrate and a long continuous photomask (ii) feeding the irradiation target substrate continuously; (iii) feeding the photomask continuously; (iv) producing a laminate by laminating the photomask fed in step (iii) on an orientation layer of the irradiation target substrate fed in step (ii); (v) exposing the orientation layer in the pattern by irradiating with light, while feeding the laminate obtained in step (iv) in the longitudinal direction of the laminate; and (vi) removing the photomask from the laminate irradiated in step (v).

Abstract: A method of producing a patterned birefringent product, comprising at least steps [1] to [3] in this order: [1] producing a birefringent pattern building material comprising at least one optically anisotropic layer, which is formed by a process including: coating and drying a composition containing at least one rod-like liquid crystalline compound having at least two reactive groups and at least one chiral agent to form a cholesteric liquid crystal phase; and then subjecting the cholesteric liquid crystal phase to heating or exposure to radiation to form the optically anisotropic layer containing a polymer fixed by polymerization and fixing; [2] subjecting the birefringent pattern building material to a patterned exposure to light; and, [3] baking a laminate obtained after the step [2] at 50° C. or higher and 400° C. or lower.

Abstract: The invention relates to optical parts, and in particular to a process for applying an optically active structuring to a substrate, and also to a component produced using a process of this type. The process for applying an optically active structuring to a substrate comprises in particular photolithographic techniques and the deposition of material via physical vapor deposition processes.

Abstract: A method of manufacturing a plurality of diffractive optical elements includes providing a partially transmissive slide, providing a first piece of PTR glass, and directing first UV radiation through the partially transmissive slide to impinge on the first piece of PTR glass. The method also includes exposing predetermined portions of the first piece of PTR glass to the first UV radiation and thermally treating the exposed first piece of PTR glass. The method further includes providing a second piece of PTR glass and directing second UV radiation through the thermally treated first piece of PTR glass to impinge on the second piece of PTR glass. The method additionally includes exposing predetermined portions of the second piece of PTR glass to the second UV radiation, thermally treating the exposed second piece of PTR glass, and repeating providing and processing of the second piece of PTR glass using additional pieces of PTR glass.

Abstract: A method for manufacturing an electrowetting display unit includes the following steps. A first substrate and a second substrate are provided. A first conductive layer is disposed on one side of the first substrate. A second conductive layer is disposed on one side of the second substrate. A polymer layer, which includes a siloxane containing a light-induced cross linkable group and a Si—H bond, is disposed on the first conductive layer. The molecular weight of the monomer of the siloxane is equal to or greater than 5000. A part of the polymer layer is exposed to a light so as to form a plurality of hydrophobic sections. A hydrophilic section is developed by treating a developing agent. The hydrophilic section and the plurality of hydrophobic sections form a pattern layer together. Polar liquid and non-polar liquid are disposed between the pattern layer and the second conductive layer.

Abstract: There is provided a method for forming an image on a transparent member, the method comprising: a) forming a coating layer on a surface of the transparent member; b) attaching a dry film photoresist on the coating layer; c) exposing the dry film photoresist by covering the dry film photoresist with a photo mask having an image pattern and irradiating the photo mask with UV; d) performing a development process for removing other area of the dry film photoresist except for an image area of the dry film photoresist; e) performing an etching process for removing other area of the coating layer except for the image area of the coating layer facing the image area of the dry film photoresist; and f) performing a strip process for removing the image area of the dry film photoresist.