Abstract: There is provided a resist composition suitable for forming a microlens which is excellent in transparency, heat resistance, and sensitivity characteristics, excellent in solubility in a developer, and as the result thereof has high resolution. A positive resist composition comprising; a component (A): an alkali-soluble polymer; a component (B): a compound having an organic group to be photolyzed to generate an alkali-soluble group; a component (C): a crosslinkable compound of Formula (1): [where R1, R2, and, R3 are independently a C1-6 alkylene group or oxyalkylene group which are optionally branched; and E1, E2, and E3 are independently a group containing a structure of Formula (2) or Formula (3): (where R4 is a hydrogen atom or a methyl group)]; and a component (D): a solvent.

Abstract: An optical disc of the present invention includes at least a light reflection layer and a light transmission layer formed on a substrate, wherein recording and reading are performed by a laser beam through the light transmission layer, the light transmission layer is formed from a cured film of a ultraviolet-curable composition containing an epoxy acrylate resin obtained by reacting a half ester compound (A), which is obtained from a lactone-adduct of a hydroxyalkyl (meth)acrylate (a1) and a dibasic acid anhydride (a2), and an epoxy resin (B), and the film thickness of the light transmission layer is from 50 to 150 ?m.

Abstract: In general, in a first aspect, the invention features a method that includes forming a first layer comprising a first material over a surface of a second layer, wherein forming the first layer includes sequentially forming a plurality of monolayers of the second material over the surface of the second layer, the second layer comprises a plurality of rows of a second material extending along a first direction and spaced from one another in a second direction orthogonal to the first direction, and the first layer conforms to the surface of the second layer.

Abstract: The present invention relates to systems and methods for minimizing or eliminating diffusion effects. Diffused regions of a segmented flow of multiple, miscible fluid species may be vented off to a waste channel, and non-diffused regions of fluid may be preferentially pulled off the channel that contains the segmented flow. Multiple fluid samples that are not contaminated via diffusion may be collected for analysis and measurement in a single channel. The systems and methods for minimizing or eliminating diffusion effects may be used to minimize or eliminate diffusion effects in a microfluidic system for monitoring the amplification of DNA molecules and the dissociation behavior of the DNA molecules.

Abstract: Alignment of a single-mode polymer waveguide (PWG) array fabricated on a polymer with a silicon waveguide (SiWG) array fabricated on a silicon (Si) chip and thereby realizing an adiabatic coupling. A stub and a groove are fabricated with high precision and made to function as the absolute positioning reference to provide a self-alignment according to the groove and the stub. In a PWG patterning by photolithography, plural masks are used, but the fabrication is made along the alignment base line for mask and thus a high precision is achieved with respect to error ?x. In a PWG patterning by nano imprint, a high precision in the fabrication is also achieved with respect to error ?x and ?y.

Abstract: In a method of manufacturing a display apparatus, a first substrate including a plurality of pixels is formed, and a black column spacer is formed on the first substrate. A second substrate is formed, and a liquid crystal layer is formed between the first substrate and the second substrate. The black column spacer is formed by coating a photoresist on the first substrate, exposing the photoresist to a first light, developing the exposed photoresist and exposing the developed photoresist to a second light.

Abstract: A method and device for periodically perturbing the flow field within a microfluidic device to provide regular droplet formation at high speed.

Abstract: A photosensitive resin composition which includes (A) a cyclic olefin; (B) at least either one of a monomer having a cyclic ether group and an oligomer having a cyclic ether group, having a refractive index different from that of the component (A); and (C) a photoacid generator, is provided.

Abstract: A liquid crystal display panel including a first substrate, a second substrate, a liquid crystal layer, and a polymer stabilized alignment layer is provided. The second substrate is disposed opposite to the first substrate. The liquid crystal layer is disposed between the first substrate and the second substrate. The polymer stabilized alignment layer is disposed between the first substrate and the liquid crystal layer, and an average surface roughness of the polymer stabilized alignment layer is greater than or equal to 10 nm.

Abstract: A photoresist pattern forming method, comprising a first step of forming on an underlayer a photoresist film which includes a convex portion and a concave portion having a thickness thinner than a thickness of the convex portion, and a second step of processing the photoresist film to form, in a portion which has been the convex portion, an opening having a width narrower than a width of the convex portion, wherein in the second step, the convex portion of the photoresist film is at least partially exposed, and the photoresist film is then developed, and exposure light is condensed by the convex portion in exposing the photoresist film.

Abstract: The present invention has been made in view of the above, and an object thereof is to provide a manufacturing technique capable of manufacturing a diffraction grating which is suitable for use in a spectrophotometer and has an apex angle of a convex portion of about 90° and can satisfy high diffraction efficiency and a low stray light amount. A method of manufacturing a diffraction grating, the method including: setting an exposure condition such that a sectional shape of a convex portion of a resist on a substrate, which has been formed by exposure, is an asymmetric triangle with respect to an opening portion shape of a mask having an opening portion with a periodic structure and an angle formed by a long side and a short side of the triangle is about 90°; and performing exposure.

Abstract: Exemplary embodiments provide methods for patterning large areas, beyond those accessible with the limited single-area exposure techniques, with nanometer scale features. The methods can include forming a grating pattern to make a first interferometric exposure of a first portion of a photosensitive material disposed over a substrate by interfering two or more laser beams, wherein the two or more laser beams comprise an apodized intensity profile having a continuous intensity variation. The method can further include aligning and overlapping the grating pattern to expose a second portion of the photosensitive material such that the first portion and the second portion form a continuous grating pattern.

Abstract: A color filter substrate and a fabrication method thereof, and a transflective liquid crystal display device are provided. The color filter substrate comprises: a transparent base substrate; a plurality of separators formed on a surface of the transparent base substrate and separating the surface of the transparent base substrate into a plurality of color filter regions; a plurality of color filter patterns that arrange alternatively with the separators, wherein each color filter pattern covers one color filter region; an aperture formed in the color filter pattern on at least one of the color filter regions; a flat protective layer at least disposed on the color filter pattern and the aperture, wherein an upper surface of a portion of the flat protective layer above the color filter pattern is even with an upper surface of a portion of the flat protective layer above the aperture.

Abstract: A touch screen panel and a method for preparing the same, and more specifically, a touch screen panel includes a window plate 311, a non-conductive color pattern 312 formed on a non-display part on one face of the window plate, and a non-conductive shielding pattern 313 formed on the non-conductive color pattern 312, so as to provide a non-conductive pattern having the desired colors and shielding effects, and to reduce failure rates during the formation of the non-conductive pattern, as well as a method for preparing the same.

Abstract: In a method of manufacturing a liquid crystal display device in which a plurality of pixels are arranged in a matrix, each of the pixels has an insulator wall structure at a boundary of the pixels, and a wall electrode is provided at least at a side of the wall structure, the wall structure being formed by: using a chemically amplified resist as a material of the wall structure, a step of applying the chemically amplified resist; a step of exposing and developing the chemically amplified resist; a step of irradiating light on an entire surface to perform post exposure; a step of pre-calcinating the chemically amplified resist at a temperature lower than a main calcination temperature; and a step of performing main calcination at a temperature higher than a pre-calcination temperature.

Abstract: Embodiments of the present invention provide a prism film and a method and an apparatus for manufacturing the prism film. The prism film comprises a substrate which is provided with prism protrusions formed of photoresist; wherein at least two prism protrusions have different heights. The embodiments of the present invention adopt the laser interference lithography apparatus for forming the prism film, such that the prism film has adjustable prism period and modulation depths. Moreover, the depth of modulation is distributed randomly on the surface of the manufactured prism film, and a prism direction and a prism period can be adjusted conveniently.

Abstract: A method of manufacturing a micro lens array, wherein the quality of an image is prevented from being deteriorated as a beam on an off-axis surface reaches a focal plane of a micro lens by forming a shading film for preventing the beam from penetrating through a space between micro lenses of the micro lens array, a micro lens having a high numerical aperture or any shape, such as an aspheric shape, is quickly manufactured at a low cost, and the micro lenses and a mask pattern are easily aligned by forming a mask pattern on a focus region formed by the micro lenses of the micro lens array.

Abstract: A material for a planarization film, a spacer, and a microlens that satisfies heat resistance and transparency requirements without impairing a refractive index. A negative photosensitive composition includes a photopolymerizable polymer (A) having a fluorene skeleton, a monomer (B) having a fluorene skeleton and a photopolymerization initiator (C). The photopolymerizable polymer (A) having a fluorene skeleton may include a moiety that is soluble in an alkaline developer solution, or a unit structure of Formula (1): herein each R1 is independently a C1-10 alkyl group or a halogen atom; each L is an integer of 0 to 4; X is an organic group having an unsaturated bond at a terminal thereof; and Y is a linking group including a portion that is obtained by removing an acid radical from a tetracarboxylic dianhydride.

Abstract: A colored composition including at least one selected from the group consisting of a compound represented by the following formula (I) and a tautomer thereof. In formula (I), R2 to R5 each independently represent a hydrogen atom or a monovalent substituent, R7 represents a hydrogen atom, a halogen atom, an alkyl group, or the like, Ma represents a metal or a metal compound, X3 and X4 each independently represent NR, a nitrogen atom, an oxygen atom, or a sulfur atom, R represents a hydrogen atom, an alkyl group, or the like, Y1 and Y2 each independently represent NRc, a nitrogen atom, or a carbon atom, Rc represents a hydrogen atom, an alkyl group, or the like, and R8 and R9 each independently represent an alkyl group, an alkenyl group, or the like. Z represents an atomic group that forms a nitrogen-containing ring having a specific structure.

Abstract: An optical device that has an antireflection function, the optical device including: a base; and a plurality of structural bodies, which are formed by convex portions or concave portions, arranged on a surface of the base with a fine pitch that is equal to or smaller than a wavelength of visible light, wherein the plurality of structural bodies are arranged so as to form tracks of a plurality of rows on the surface of the base and form a quasi-hexagonal lattice pattern, a tetragonal lattice pattern, or a quasi-tetragonal lattice pattern, and wherein a packing ratio of the structural bodies to the surface of the base is equal to or higher than 65%.

Abstract: A method of manufacturing a display apparatus. The liquid crystal display includes a first substrate and a pixel electrode formed on the first substrate and having a plurality of branches. A plurality of alignment sections are interposed among the branches. An auxiliary liquid crystal layer having discotic liquid crystals is formed on the pixel electrode and the alignment sections. A main liquid crystal layer having a vertical alignment mode is formed on the auxiliary liquid crystal layer. A common electrode is formed on the main liquid crystal layer to apply an electric field to the main liquid crystal layer together with the pixel electrode. A second substrate is formed on the common electrode.

Abstract: A resin composition for an optical waveguide is provided, which has excellent adhesiveness to a cladding layer of the optical waveguide and excellent patternability for formation of a core portion of the optical waveguide and reduces the optical waveguide loss. An optical waveguide produced by using the resin composition is also provided. The resin composition comprises: (A) a multifunctional partially-acrylated epoxy resin, as a major component, having an epoxy group and a (meth)acrylate group in the same main chain thereof; and (B) a photopolymerization initiator as a curing component. The optical waveguide includes: a substrate; a cladding layer provided on the substrate; and a core portion provided on the cladding layer for transmission of an optical signal; wherein the core portion is formed from the resin composition.

Abstract: A method of forming an image having multiple phases is disclosed herein. The method includes forming exposed and unexposed areas, the exposed areas comprising a first polymer network exhibiting first and second phases that are chemically connected and have different refractive indices, the first phase being continuous, and the second phase comprising a plurality of structures dispersed within the first phase, and the unexposed areas comprising a second polymer network comprising third and fourth phases that are chemically connected and have different refractive indices, the third phase being continuous, and the fourth phase comprising a plurality of structures dispersed within the third phase. The first and second polymer networks are chemically connected, and morphology formed by the first and second phases is different than that formed by the third and fourth phases.

Abstract: Disclosed is a resin composition for a protective layer of a color filter including an acrylate-based resin including a repeating unit represented by each of Chemical Formulae 1 to 3, a melamine-based resin represented by Chemical Formula 4, a thermal acid generator (TAG), and a solvent.

Abstract: A system and method are provided for writing patterns onto substrates. First and second beams of extreme ultraviolet (EUV) radiation are produced. An exposure unit is used to project the first and second beams of EUV radiation onto a substrate. The first and second beams of radiation interfere with each other to expose a first set of parallel lines at an exposure field of the substrate.

Abstract: A mask substrate, photomask and method for forming the same are provided. The photomask includes a substantially light transparent substrate and a circuitry pattern disposed over the light transparent substrate. The circuitry pattern includes a phase shifting layer disposed over the substantially light transparent substrate. A substantially light shielding layer is disposed over the phase shifting layer. At least one barrier layer is disposed over the substantially light shielding layer. An uppermost portion of the substantially light shielding layer does not comprise anti-reflective properties and the at least one barrier layer comprises an uppermost hardmask layer and an underlying anti-reflective layer.

Abstract: In general, in one aspect, the invention features a method that includes forming layer of a mask material on a surface of a first layer, patterning the layer of the mask material to obtain a mask feature, the mask feature having a surface comprising a depression, inducing mass transport of the mask material of the mask feature to obtain a modified mask feature, and transferring a profile of the modified mask feature into the first layer to form a first structure. In general, in another aspect, the invention features a method that includes forming layer of a mask material on a surface of a first layer, patterning the layer of the mask material to obtain a mask feature, inducing mass transport of the mask material of the mask feature to obtain a modified mask feature, and transferring a profile of the modified mask feature into the first layer to form a first structure.

Abstract: A light diffusion member includes a light-transmissive base, a plurality of light diffusion portions, a connecting portion, and a light absorbing layer. The light diffusion portions are arranged on one surface of the base and have light-incident end surfaces each positioned on the side away from the base and having a larger area than a light-emergent end surface thereof. The connecting portion connects at least two adjacent ones of the plural light diffusion portions to each other, and is positioned near the light-incident end surfaces of the adjacent light diffusion portions. The light absorbing layer is formed on the one surface of the base in a region different from a region where the light diffusion portions are formed. A size from the light-incident end surface to the light-emergent end surface of the light diffusion portion is larger than a thickness of the light absorbing layer.

Abstract: A processing method of an optical panel used in an electronic device is disclosed. The processing method includes: selecting a light transparent panel and coating a photoresist on one surface of the light transparent panel; forming a plurality of light transmission hole patterns on a photomask; and forming a light shielding layer after the photoresist is exposed via the photomask and developing; and the light transmission hole patterns are transferred to the light shielding layer and a plurality of light transmission holes are formed on the light shielding layer.

Abstract: A thermal transfer method for selectively transferring a red organic light material of a transfer layer from a donor substrate to a recipient substrate to form a red organic light emitting element. The donor substrate has a reflecting layer in a planned formation region of the transfer layer and an absorbing layer in a region other than the planned formation region of the transfer layer. The transfer layer is formed on an area on the front face side of the base. The transfer layer in the region where the absorbing layer is formed is selectively removed. the donor substrate and the other substrate are placed in opposition. The transfer layer on the reflecting layer is transferred to the recipient substrate.

Abstract: A method of creating a region of index change in a photopolymer includes providing a photopolymer having a photosensitivity to light of a particular wavelength and creating a region of index change in the photopolymer by applying direct write lithography to expose the photopolymer of the region to light that includes the particular wavelength.

Abstract: A method is provided for production of a medical marker (4) made of an X-ray-opaque material, including the following steps: a) photolithographic application of a mask (31) on a substrate (1); b) deposition of the X-ray-opaque material (40) of the marker (4) on the substrate (1); c) removal of the mask (31); and d) elimination of the substrate (1).

Abstract: A resin composition for an optical waveguide is provided, which permits easy formation of a core pattern using an alkali developing liquid and suppresses degradation of the alkali developing liquid. An optical waveguide produced by using the resin composition is provided. The resin composition comprises: (A) an alkali soluble resin, as a major component, having a structural unit represented by formula (1): wherein R1, R2 and R3, which may be the same or different, are each a hydrogen atom or a methyl group; R5 and R6, which may be the same or different, are each a hydrogen atom or a methyl group; R4 is and m+n+p=1, m>0, n>0 and p>0; and (B) a photopolymerization initiator. The optical waveguide includes a substrate, a cladding layer provided thereon, and a core portion provided in the cladding layer for transmitting an optical signal.

Abstract: A sheeting and a method of forming a sheeting from a master tool are described where the sheeting has a composite image that floats above or below the sheeting. The method includes providing a first sheeting comprising a first array of microlenses and a photopolymerizable first material layer adjacent to the first array of microlenses. Another step is exposing the first sheeting to a radiation source to form a master tool comprising a plurality of polymerized first structured areas in the first material layer, wherein at least some of the first structured areas include a portion shape in common with at least some of the first structured areas and wherein each first structured area is associated with one of the first array of microlenses. Yet another step is replicating the plurality of first structured areas using a substance that conforms to the plurality of structured areas to form a second material layer having a plurality of replicated structured areas.

Abstract: A phase mask method to geometrically transform and to optically transfer a standard planar radial grating pattern into a cylindrical photoresist pattern at the circularly cylindrical wall of a given element. The planar radial grating pattern can be written with an integer number of lines having strictly constant period without any stitching problem. The photolithographic transfer is made by an illumination device providing a normal incident beam on the phase mask. The annular radial grating diffracts this normal incident beam, formed by plane waves, into two cylindrical waves of the first diffraction order (T+1 and Tr?1) which impinge on the circularly cylindrical wall and interfere in a photoresist layer deposited on the circularly cylindrical wall to give rise to an interferogram.

Abstract: Example embodiments herein relate to compositions useful in forming organic active patterns that may, in turn, be incorporated in organic memory devices. The compositions comprise N-containing conjugated electroconductive polymer(s), photoacid generator(s) and organic solvent(s) capable of dissolving suitable quantities of both the electroconductive polymer and the photoacid generator. Also disclosed are methods for patterning organic active layers formed using one or more of the compositions to produce organic active patterns, portions of which may be arranged between opposed electrodes to provide organic memory cells. The methods include directly exposing and developing the organic active layer to obtain fine patterns without the use of a separate masking pattern, for example, a photoresist pattern, thereby tending to simplify the fabrication process and reduce the associated costs.

Abstract: A method of forming a polarizing material is provided including exposing a layer of dichroic material to activating light illumination to provide an ordered structure with a distinguished absorption axis and thus photo-induce polarization, and fixing the induced polarization by polymerization of the dichroic layer. Novel polarizing materials formed thereby are also provided. By selectively exposing regions of the dichroic material to differing activating radiation, different regions with different polarization axes can be created. The polarizing material can also be provided with a coating or coatings to alter the spectral responses, and a stack formed of a plurality if dichroic layers can be provided.

Abstract: An optical waveguide forming epoxy resin composition is free from a diluent component irrelevant to a curing reaction, and comprises: (A) a liquid epoxy resin; and (B) a photoacid generator; wherein the liquid epoxy resin (A) comprises a liquid epoxy resin represented by the following general formula (1) in a proportion of 40 to 75 wt % based on the overall amount of a resin component: wherein R1 and R2 are each a hydrogen atom or a methyl group; R3 to R6 are each a hydrogen atom, a methyl group, a chlorine atom or a bromine atom; X is a C2 to C15 alkylene group, an ethyleneoxy group, a di(ethyleneoxy) group, a tri(ethyleneoxy) group, a propyleneoxy group, a propyleneoxypropyl group, a di(propyleneoxy)propyl group or a tri(propyleneoxy)propyl group; and n is a natural number and has an average value of 1.2 to 5.

Abstract: The invention relates to a photo-embossing process for the preparation of a polymeric relief structure comprising the steps of: a) coating a substrate with a coating composition comprising one or more radiation-sensitive ingredients and less than 30 wt % polymeric binder material; b) locally treating the coated substrate with electromagnetic radiation having a periodic, non-periodic or random radiation-intensity pattern, forming a latent image, at a temperature below a transition temperature of the coating composition; and c) polymerizing and/or crosslinking the resulting coated substrate, at a temperature above said transition temperature, wherein the transition temperature is a temperature that defines a transition of the coating composition between a state of high viscosity and low viscosity and wherein the coating composition comprises a compound A comprising at least one radiation curable group and a photoinitiator, the coating composition having a transition temperature between 30° C. and 120° C.

Abstract: A planar optical waveguide includes a trunk, and a first branch and a second branch each extending from the trunk in a manner that the first branch and the second branch cooperatively form a division. The trunk, the first branch and the second branch are located at a same plane. The trunk defines a butt end surface at the division, and the first and second branches are connected by the butt end surface. A method for making the planar optical waveguide is also provided.

Abstract: A material for forming a conductive antireflection film contains: a base resin having conductivity; a crosslinking agent; a thermal acid generator; and a solvent.

Abstract: An optical lens includes a lens member and two shade layers on opposite sides of the lens member. The lens member respectively has a lens portion on each side thereof. Each shade layer has an aperture above the corresponding lens portion of the lens member to serve the function of aperture. A method uses optical lithography technique to make such optical lens in a fast way, and the shade layers will have a strong bonding strength with the lens member.

Abstract: A manufacturing method of a polymer film with the photonic crystal structure includes a mixing step for at least mixing an achiral liquid crystal (LC), a chiral dopant, a monomer and a photo initiator together to form an LC-monomer mixture, at least one exposure step for exposing the LC-monomer mixture through a mask, at least one diffusion step for diffusing the monomer from the area around one of the exposure areas to the exposure area, and a LC removing step for removing the achiral LC to form the polymer film. By implementing the diffusion step after the exposure step, the polymerization rate of the monomers is enhanced so as to increase the proportion of the polymer in the polymer film and raise the imprint rate of chirality. Therefore, the polymer film can reveal stronger photonic crystal structure and property of Bragg reflection when it is not filled with any fluid.

Abstract: An optical information recording medium including a recording layer that can record a large amount of information is manufactured using a simple system. A single recording layer is formed by bonding two optically transparent substrates on which the first photosensitive polymer and the second photosensitive polymer are spread such that the layers of the photosensitive polymers face each other. Furthermore, since the absorptivity of light in the recording layer increases as the focal point of light for information recording moves in a depth direction, information can be recorded without decreasing the recording transfer rate of the information.

Abstract: A curable coloring composition includes a quinophthalone dye of Formula (1). A color filter employing the composition, a method for producing the color filter, and a quinophthalone dye of Formula (2) are also described. The curable coloring composition and color filter have good color hue, high transmittance properties, high light fastness and heat fastness, and excellent stability over time and solvent resistance.

Abstract: The present invention provides a color filter substrate and a method for producing the same, in which the uniformity in thickness of a color filter can be improved. The present invention is a method for producing a color filter substrate, the method including: a step for forming a photoresist film; a step for conducting an exposure process on the photoresist film through a photomask; a step for forming a bank defining an opening by developing the exposed photoresist film; and a step for discharging ink into the opening. The photomask has a transparent region, a light-shielding region, and a translucent region. The transmittance of the translucent region is less than the transmittance of the transparent region and is greater than the transmittance of the light-shielding region, and the translucent region is provided between the transparent region and the light-shielding region along an outline of the transparent region and the light-shielding region, respectively.

Abstract: Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a rotatable mask is used to image a radiation-sensitive material. Typically the rotatable mask comprises a cylinder. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the substrate is in contact or close proximity with the substrate. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a rotating cylinder surface comprises metal nano holes or nanoparticles.

Abstract: A system for processing a substrate includes a light source to provide light pulses, a stage to support a substrate, optics to focus the light pulses onto the substrate, a scanner to scan the light pulses across the substrate, a computer to control properties of the light pulses and the scanning of the light pulses such that color centers are generated in various regions of the substrate, and at least one of (i) an ultraviolet light source to irradiate the substrate with ultraviolet light or (ii) a heater to heat the substrate after formation of the color centers to stabilize a transmittance spectrum of the substrate.

Abstract: The present inventive concept relates to an electrowetting display device including a lyophobic colloid material and a polymer resin such as an organic layer or a polyimide (PI), and a lyophobic layer including a supporting layer supporting the lyophobic colloid material and using a photoreactive fluorine-based surfactant for a fluorine-based material to be positioned above and for a hardened photoreactive material layer to be positioned below through exposure in a single step without separately performing a hydrophilic treatment and then a water-repellent treatment, thereby reducing the number of processes, the manufacturing time, and the cost.

Abstract: The invention concerns a security element in the form of a multi-layer film body having a volume hologram layer with two different items of optical information and a process for the production of such a security element.