Abstract: The present invention relates to compositions, kits and processes for the brightening of metal surfaces by the application of the chemical compositions. These compositions act to release hydrofluoric acid as a brightening agent. The solutions are preferably mixed during application of the brightening composition to a metal surface by mixing the solutions immediately prior to or even during application of the solution. This can be readily accomplished by mixing two solutions, one having a fluoride source and the other having a strong acid to release hydrofluoric acid from the fluoride source, the mixing occurring immediately before spray application, during spraying, or immediately after spraying of the two solutions. Mixing may be done on-site, which means that mixing is performed at the site of use, usually on the same day of use or even within a few (less than 10) minutes of use.

Abstract: A cleaning solution is used to remove a byproduct derived from a decomposed substance of a process gas containing C and F. The cleaning solution contains 75 wt % N-methyl-2-pyrrolidone, 15 wt % ethylene glycol monobutyl ether, 0.5 wt % surfactant, and 9.5 wt % water. The content of an alkali metal in the cleaning solution is set to be less than 10 ppb.

Abstract: Aqueous acidic solutions of hydrogen peroxide used for metal surface treatments may be stabilized to decrease the rate of hydrogen peroxide decomposition by the use of an aryl sulfonic acid such as phenol sulfonic acid in combination with a triazole such as tolyltriazole.

Abstract: A restaurant cleaning towel made from a substrate such as a woven, nonwoven, or knit fabric. A sanitizer release polymer composition comprising at least one cationic (or alternatively, nonionic) surfactant is bound to the surface of the towel. Preferably, the cationic surfactant is present in the sanitizer release polymer composition in an amount of about 1 to about 10 weight percent, based on a total weight of the composition. The composition may also include at least one nonionic co-surfactant in combination with the cationic surfactant. The towel also includes a color label on its surface to identify the area of the restaurant in which the cleaning towel is to be utilized. The towel may optionally include an international icon, a tactile label, and/or a label in a plurality of languages identifying the area where the towel is to be utilized.

Abstract: The invention relates to a TFT-LCD high-performance stripper composition for a photoresist, and more particularly to a stripper composition for a photoresist comprising: 20-60 wt % of monoethanolamine, 15-50 wt % of N,N-dimethylacetamide, 15-50 wt % of carbitol, and 0.1-10 wt % of gallic acid. The invention also provides a stripper composition for a photoresist comprising: 20-60 wt % of monoethanolamine, 15-50 wt % of N,N-dimethylacetamide, and 15-50 wt % of carbitol. The stripper composition for a photoresist of the invention significantly reduces stripping time when applied to the TFT-LCD manufacturing process and leaves no impurity particles. By allowing the hard baking and ashing processes to be omitted, the gate process line can be simplified, which enables cost reduction. In addition, when it is applied to a process wherein silver (Ag) is used as reflective/transflective layer, it offers stripping ability and corrosion resistance of the pure Ag layer.

Abstract: An improved self-cleaning polish is obtained by adding a wax to an oil either pre-heated, or then subsequently heated, with stirring. Subsequently, and optionally, water and/or an acetic acid source, preferably vinegar, is added, either before or after partly or completely cooling the heated wax/oil mixture. Special-purpose additives may be added, such as salts, abrasives, suspending aids, preservatives, emulsifiers, colorants, fragrances, etc. However, no solvent other than the oil is necessary, a decided improvement over existing technology.

Abstract: In a cleaning apparatus 500, as a pre-cleaning step, cleaning is performed in a first and a second backup cleaning bath 602 and 603 using a hydrocarbon-based cleaning liquid composed of a normal paraffin, such as normal nonane or normal decane, as a primary component and a surfactant such as a fatty acid alkanol amide or a fatty acid N-alkyl alkylene diamine, and as a post-cleaning step, immersion cleaning, shower cleaning, and vapor cleaning are performed in a cleaning bath 601 using a hydrocarbon-based cleaning liquid containing no surfactant.

Abstract: An object of the present invention is to provide a composition for washing a polishing pad which removes a water-insoluble compound which was separated from a surface to be polished during polishing, formed at least on the surface of a polishing pad, and comprised a metal ion ionized, and a method for washing a polishing pad using the same. The composition for washing a polishing pad of the present invention is obtained by, in the case a water-insoluble compound is a copper quinaldinic acid complex, blending ammonia as a component for rendering the water-insoluble compound water-soluble and glycine as a water-soluble complex forming component for forming a water-soluble complex with a copper ion, and stirring them. In addition, in a method for washing a polishing pad using the composition for washing a polishing pad, a polishing pad can be washed effectively, the productivity can be improved and, further, consumption of a polishing pad can be inhibited.

Abstract: A cleaning solution for cleaning microelectronic substrates, particularly for post-CMP or via formation cleaning. The cleaning solution comprises a quaternary ammonium hydroxide, an organic amine, a corrosion inhibitor, optionally an organic acid, and water. A preferred cleaning solution comprises tetramethylammonium hydroxide, monoethylanolamine, gallic acid ascorbic acid, and water with the alkalinity of the cleaning solution greater than 0.073 milliequivalents base per gram of solution.

Abstract: A cleaning composition for treating and removing stains from a non-porous surface has one or more salts, such as quaternary ammonium salts, sulfates and chlorides, a chelator and a dispersant, dissolved in an aqueous solution of alcohol. The preferred salts are myristyltrimethylammonium bromide and benzethonium chloride, the chelator is tetrasodium salt ethylenediamine of tetraacetic acid, and the dispersant is polyvinyl alcohol. The cleaning composition is incorporated into a product, which has a non-woven polyester carrier impregnated with the cleaning composition.

Abstract: A method and a solution are provided for cleaning a container, in particular a boiler of a conventional power station. The container is degreased and pickled in one method step using an alkaline cleaning solution. A suitable cleaning solution includes, for example, an ammonium EDTA salt, hydrazine and a surfactant.

Abstract: The present invention relates to a water-soluble composition for removing rust from steel bars and steel frames, which is environmentally harmless and permits improving work efficiency by allowing work to be conducted in a state where rust was simply removed from the steel bars and frames by applying it on the steel bars or frames with a spray or brush. The rust-removing preparation of the present invention comprises a mixture of 10-11% by weight of phosphoric acid, 6-7% by weight of sodium pyrophosphate, 6-7% by weight of a hard water softener, 7-8% by weight of zeolite, 2-3% by weight of xanthan, 2-3% by weight of a surfactant, 4-5% by weight of stearic acid, 6-7% by weight of methyl alcohol and 2-3% by weight of a defoamer in 50-51% by weight of water.

Abstract: The decontamination gel consists of one solution including: a) a thickening agent; b) an active agent of decontamination; in which the thickening agent (a), is an agent exclusively organic, chosen among water-soluble organic polymers. This gel is usable for radioactive decontamination of surfaces, especially metallic surfaces.

Abstract: An alkaline sensitive metal cleaning composition is provided. The alkaline sensitive metal cleaning composition contains an alkaline concentrate and a corrosion inhibitor concentrate. The alkaline concentrate includes a source of alkalinity in an amount sufficient to provide a use solution having a pH of at least 10.0, and a first chelant component that exhibits soil removal properties when used at a pH of at least 10.0. The corrosion inhibitor concentrate includes a corrosion inhibitor component for reducing corrosion of alkaline sensitive metals when used in a use solution having a pH of at least 10.0, a second chelant component for stabilizing the corrosion inhibitor in the corrosion inhibitor concentrate when the corrosion inhibitor concentrate is provided at a pH that is less than 8.0, and a surfactant component for providing cleaning properties when used at a pH of at least 10.0.

Abstract: A hard surface cleaning composition for removing cooked-, baked- or burnt-on soils from cookware and tableware, the composition comprising an organoamine solvent and wherein the composition has a liquid surface tension of less than about 24.5 mN/m and a pH, as measured in a 10% solution in distilled water, or least than 10.5. The composition can be used as pre-treatment prior to the dishwashing process. The composition provides excellent removal of polymerized grease from metal and glass substrates.

Abstract: Particulate and metal ion contamination is removed from a surface, such as a semiconductor wafer containing copper damascene or dual damascene features, employing aqueous composition comprising a fluoride containing compound; a dicarboxylic acid and/or salt thereof; and a hydroxycarboxylic acid and/or salt thereof.

Abstract: An article for sanitizing a surface with a sanitizing solution while maintaining the concentration level of a sanitizer in the sanitizing solution at an effective concentration level. A substrate that absorbs and holds the sanitizing solution is treated with a sanitizer release polymer composition. The substrate may be a woven, nonwoven, or knit fabric, a foam or sponge, or the like. The sanitizer release polymer composition may include a cationic or nonionic surfactant or binder that is operable to maintain the concentration level of the sanitizer at the effective level during prolonged periods of use.

Abstract: Methods and solutions for cleaning a polished aluminum-containing layer, and the structures formed by these methods. The method for cleaning the polished aluminum-containing layer is practiced by contacting a polished aluminum-containing layer with a solution comprising water and a corrosion-inhibiting agent. In these methods and solutions, the water may be deionized water, the corrosion-inhibiting agent may be citric acid or one of its salts, and the solution may contain additional additives, such as chelating agents, buffers, oxidants, antioxidants, and surfactants. These methods and solutions reduce the corrosion caused by DI water used in cleaning polished aluminum-containing layers and maintain a passivative environment which protects the exposed aluminum structures.

Abstract: The present invention provides an aqueous dispersion for chemical mechanical polishing suitable for polishing of copper, which has a high polishing speed and a low erosion rate with overpolishing. The aqueous dispersion for chemical mechanical polishing of the invention contains a compound having a heterocycle, a surfactant and an oxidizing agent, wherein the compound having a heterocycle and the surfactant are in a weight ratio of 1:10 to 1:0.03. The aqueous dispersion may also contain abrasive particle. The compound having a heterocycle is preferably quinaldic acid, benzotriazole or the like. The surfactant is preferably a sulfonic acid salt such as potassium dodecylbenzenesulfonate or ammonium dodecylbenzenesulfonate, and the oxidizing agent is preferably ammonium persulfate, hydrogen peroxide or the like. The abrasive particle used may be inorganic particle such as colloidal silica, an organic particle such as polymer particle, or an organic/inorganic composite particle comprising a combination thereof.

Abstract: The present invention relates to a maskant system for use with a fluoride cleaning system. The maskant system comprises a parting compound applied to a surface which requires protection and a chromium rich maskant for substantially preventing intergranular attack and which reduces a depletion zone. The parting compound contains colloidal silica, de-ionized water, fused alumina grains, and alumina powder. The maskant is comprised of chromium powder mixed with a binder, a wetting agent, a thickening agent, and water. The maskant system may be used to clean components formed from nickel-based or cobalt-based alloys using a fluoride cleaning system and has particular utility when components formed from single crystal nickel based alloys are cleaned using a fluoride cleaning system.

Abstract: A descaling composition for use in removing scale deposited on a member made of titanium or a titanium alloy, the descaling composition containing a hydroxycarboxylic acid, a sulfamic acid and ammonium sulfate as effective components and effectively inhibiting titanium ions from dissolving out.

Abstract: The invention provides a, non- or minimized streaking/filming antimicrobial formulation, the cleaner containing: a. an akoxylated quaternary ammonium surfactant, present in a cleaning-effective amount; b. an alkoxylated short chain nonionic surfactant, also present in a cleaning-effective amount; c. alkanolamine as an alkalinity source, present in an amount effective to enhance soil removal in said cleaner; d. a quaternary ammonium compound in an amount present for antimicrobial efficacy; e. at least one water-soluble or dispersible organic solvent having a vapor pressure of at least 0.001 mm Hg at 25° C., said at least one organic solvent present in a solubilizing—or dispersion—effective amount; and f. the remainder, water.

Abstract: A colloidal composition for application to the walls of a clean, warm oven and accessories contained therein to prevent the adherence of carbon-based residues thereto. The composition is shaken to disburse the colloidal particles, then applied to the clean, warm (˜140° F.) surface of the oven walls with an applicator such as a brush or sponge and the oven is ready for use. After a coating of carbonized residue has accumulated on the composition-coated surface, both the residue and the composition are easily removed with a mild detergent solution using a sponge or towel. The composition is nontoxic, environmentally safe and its use does not expose the user to harsh chemicals or fumes. In a preferred embodiment, the colloidal composition is provided in a container having a removable lid with a fine-bristled nylon applicator brush affixed thereto.

Abstract: A cleaning composition is provided according to the invention. The cleaning composition includes a product of mixing an acid component, a source of phosphoric acid component, and an oxidant component. The molar ratio of oxidant component to phosphoric acid component is preferably between about 2:1 and about 1:2, and the molar ratio of oxidant component to acid component is preferably between about 1:3 and about 1:5. A method of cleaning an aluminum surface is provided The method includes a step of applying the cleaning composition to an aluminum surface, and rinsing the cleaning composition from the aluminum surface.

Abstract: The present invention relates to compositions, kits and processes for the brightening of metal surfaces by the application of the chemical compositions. These compositions act to release hydrofluoric acid as a brightening agent. The solutions are preferably mixed during application of the brightening composition to a metal surface by mixing the solutions immediately prior to or even during application of the solution. This can be readily accomplished by mixing two solutions, one having a fluoride source and the other having a strong acid to release hydrofluoric acid from the fluoride source, the mixing occurring immediately before spray application, during spraying, or immediately after spraying of the two solutions. Mixing may be done on-site, which means that mixing is performed at the site of use, usually on the same day of use or even within a few (less than 10) minutes of use.

Abstract: To provide a detergent which does not comprise a halogen-based solvent having high cleaning capabilities. The detergent of the present invention comprises (A) a glycol ether having low compatibility with water, preferably propylene glycol alkyl ether having a solubility in water at 60° C. of 50 vol % or less, (B) an imidazolidinone compound represented by the following formula (I): wherein R1 and R2 are each independently a methyl group or ethyl group, and (C) water, and forms a homogeneous phase.

Abstract: Brass articles having leachable lead are contacted with an aqueous caustic solution that contains a chelating agent. A brass article can optionally be post-treated by contacting it with an aqueous solution containing hydrogen peroxide.

Abstract: An inexpensive and safe copper removal method in the fabrication of integrated circuits is described. Copper is stripped or removed by a chemical mixture comprising an ammonium salt, an amine, and water. The rate of copper stripping can be controlled by varying the concentration of the ammonium salt component and the amount of water in the mixture. Also a novel chemical mixture for stripping copper and removing copper contamination is provided. The novel chemical mixture for removing or stripping copper comprises an ammonium salt, an amine, and water. For example, the novel chemical mixture may comprise ammonium fluoride, water, and ethylenediamine in a ratio of 1:1:1.

Abstract: A low-foaming, liquid composition is disclosed. Methods of making and using the low-foaming, liquid composition are also disclosed.

Abstract: Compositions for the removal of polymeric material from a substrate are provided where the compositions include a polyol compound selected from (C3-C20)alkanediols, substituted (C3—C20)alkanediols, (C3-C20)alkanetriols or substituted (C3-C20)alkanetriols, a glyco ether, at least 5% wt water based on the total weight of the composition, and a fluoride salt selected from ammonium fluoride, ammonium bifluoride, ammonium-tetramethylammonium bifluoride or mixtures thereof. Methods of removing polymeric material using these compositions are also provided.

Abstract: A composition for removal of chemical residues from metal or dielectric surfaces or for chemical mechanical polishing of a copper or aluminum surface is an aqueous solution with a pH between about 3.5 and about 7. The composition contains a monofunctional, difunctional or trifunctional organic acid and a buffering amount of a quaternary amine, ammonium hydroxide, hydroxylamine, hydroxylamine salt, hydrazine or hydrazine salt base. A method in accordance with the invention for removal of chemical residues from a metal or dielectric surface comprises contacting the metal or dielectric surface with the above composition for a time sufficient to remove the chemical residues. A method in accordance with the invention for chemical mechanical polishing of a copper or aluminum surface comprises applying the above composition to the copper or aluminum surface, and polishing the surface in the presence of the composition.

Abstract: A composition useful as a paint remover, including alkylene carbonate such as propylene carbonate or ethylene carbonate, and an alcohol such as benzyl alcohol. Also, a process for removing paint, comprising: applying a composition containing alkylene carbonate and an alcohol to a painted surface for a time and under conditions effective to reduce adhesion between the top coats and the primer or undercoat of the paint. In another aspect, this paint remover includes dialkyl carbonate and an alcohol, optionally containing a glycol ether. In another aspect, the process includes applying a composition containing dialkyl carbonate and an alcohol. This paint remover may include a thickener, a surfactant, or a corrosion inhibitor.

Abstract: A method is provided for in situ cleaning of lubricated parts of a machine in which the machine is operated with a lubricating fluid that contains an effective concentration of a cleaning composition comprising a synthetic ester of a naturally occurring fatty acid for an amount of time sufficient to remove from the lubricated parts adhered debris which is not removed by the lubricating fluid conventionally used in the machine.

Abstract: Engine cleaner compositions are reported comprising a single phase solution comprising a polar solvent having a Hildebrand solubility parameter of about 10 cal½ cm−3/2 or greater; a non-polar solvent, immiscible with the polar solvent, having a Hildebrand solubility parameter of about 10 cal½ cm−3/2 or less; and a fugitive cosolvent having a higher evaporation rate than the polar solvent and the non-polar solvent. The engine cleaner compositions are suitable for cleaning internal combustion engines.

Abstract: A method is provided for cleaning a surface of a semiconductor wafer after a CMP operation. In one example, an improved cleaning chemical (ICC) is applied to the surface of the wafer. The ICC is configured to transform a copper film on the surface of the wafer into a water soluble form. The wafer surface is scrubbed. The wafer is then rinsed with a liquid. The scrubbing and the rinsing are configured to remove a controlled amount of the water soluble copper from the surface of the wafer and the brush, wherein the applying, the scrubbing, and the rinsing are performed in a brush box.

Abstract: The present invention describes liquid acidic cleaning compositions suitable for cleaning bathroom surfaces comprising a homo- or copolymer or vinylpyrrolidone, or a mixture thereof, a polysaccharide polymer, or a mixture thereof, an anionic surfactant, and an acid. These compositions deliver improved shine to the treated surface as well as improved next-time cleaning benefit on said surface.

Abstract: A descaling composition for use in removing scale deposited on a member made of titanium or a titanium alloy, the descaling composition containing a hydroxycarboxylic acid, a sulfamic acid and ammonium sulfate as effective components and effectively inhibiting titanium ions from dissolving out.

Abstract: Disclosed are compositions useful for the removal of polymeric material from substrates, such as electronic devices. The compositions of the present invention are particularly suitable for removing polymer residues from advanced magnetic devices. Also disclosed are methods of removing such polymeric material.

Abstract: The present invention relates to a pickling agent for the chemical conversion coating of a heat exchanger which is capable of cleaning the complicated structure comprising fins and tubes of a heat exchanger in preparation for the successful formation of a chemical conversion film, a method of pickling a heat exchanger, a method of treating a heat exchanger comprising said pickling method, and a heat exchanger produced by using said treating method. The present invention provides pickling agent for the chemical conversion coating of a heat exchanger which comprises an acidic aqueous solution containing nitric acid and/or sulfuric acid and at least one metal and/or metal oxoanion salt derived from any metal selected from the group consisting of iron, nickel, cobalt, molybdenum and cerium.

Abstract: Cleaning compositions which, as powder or as aqueous formulation based on sodium bicarbonate, sodium chloride and/or sugar, comprise a water-soluble polymeric polycarboxylate as dispersant with the exception of those formulations containing only sodium bicarbonate and polyaspartic acids and/or their salts, to the use of these cleaning compositions for the abrasive cleaning of hard surfaces. A method for cleaning surfaces contaminated with deposits using these cleaning compositions.

Abstract: A cleaning corrosion inhibitor based on N-alkyl-beta-alanine derivatives and their salts.

Abstract: This invention relates to a process for removing rust from metal surfaces. The process uses an aqueous solution of a benzoate.

Abstract: A cleaning composition for treating and removing stains from a non-porous surface has one or more salts, such as quaternary ammonium salts, sulfates and chlorides, a chelator and a dispersant, dissolved in an aqueous solution of alcohol. Optional active ingredients include methyl cellosolve and ammonia. The quaternary ammonium salts are myristyltrimethylammonium bromide and benzethonium chloride, the chelator is tetrasodium salt ethylenediamine of tetraacetic acid, and the dispersant is polyvinyl alcohol. The cleaning composition is incorporated into a product, which has a non-woven polyester carrier impregnated with the cleaning composition.

Abstract: An automobile wash and wax composition suitable for simultaneously washing and waxing a soiled exterior surface of a vehicle without buffing. The automotive wash and wax composition being an aqueous emulsion containing an anionic surfactant, a silicone oil, an amino-functional silicone, a wax, and a cationic emulsifier. The wash and wax composition is applied to a pre-wetted exterior surface of a vehicle so as to substantially coat the surface of the vehicle that requires cleaning and polishing. After the coated surface has substantially dried, the surface is washed with a sufficient quantity of water to rinse away the soil particles and the residue of the anionic surfactant, leaving behind a durable, evenly distributed, high-gloss, water resistant protective film of silicones and wax on the vehicle surface, without any buffing of the surface.

Abstract: A method for treating the surface of a substrate with a surface treatment composition, wherein the surface treatment composition comprises a liquid medium containing a complexing agent as a metal deposition preventive, the complexing agent comprising at least one member selected from Group A complexing agents and at least one member selected from Group B complexing agents as defined hereinafter.

Abstract: A cleaning solution for cleaning microelectronic substrates, particularly for post-CMP or via formation cleaning. The cleaning solution comprises a quaternary ammonium hydroxide, an organic amine, a corrosion inhibitor, and water. A preferred cleaning solution comprises tetramethylammonium hydroxide, monoethylanolamine, ascorbic acid, and water with the alkalinity of the cleaning solution greater than 0.073 milliequivalents base per gram of solution.

Abstract: A cleaning composition is provided according to the invention. The cleaning composition includes a product of mixing an acid component, a source of phosphoric acid component, and an oxidant component. The molar ratio of oxidant component to phosphoric acid component is preferably between about 2:1 and about 1:2, and the molar ratio of oxidant component to acid component is preferably between about 1:3 and about 1:5. A method of cleaning an aluminum surface is provided. The method includes a step of applying the cleaning composition to an aluminum surface, and rinsing the cleaning composition from the aluminum surface.

Abstract: A chromium oxide coating is removed from a surface of an article by cleaning the article in an alkaline degreasing/rust removal solution at a degreasing/rust removal temperature of from about 180° F. to about 200° F., scale conditioning the article in an alkaline permanganate conditioning solution at a scale-conditioning temperature of from about 160° F. to about 200° F., and contacting the article to an acidic stripping solution comprising hydrochloric acid and an etching inhibitor at a stripping temperature of from about 130° F. to about 140° F.

Abstract: Brass articles having leachable lead are contacted with an aqueous caustic solution having a pH of about 10 to about 14 that contains a chelating agent. During contact, the brass articles can be sonicated. The brass articles can be optionally pretreated by contacting them with an aqueous solution containing an organic carboxylic acid and an inorganic per-salt. The brass article can optionally further be post treated by contacting them with an aqueous solution containing thiourea.

Abstract: Problems of extensive foaming and/or of sticky deposits on process equipment that often arise when metal soaps from metal articles that have been given a metal soap containing surface to aid in drawing are removed with aqueous alkaline clearners can be avoided by including in the cleaners used anions such as calcium and magnesium that are capable of precipitating the anions of the metal soaps. The cleaners advantageously also contain chelants, a mixture of nonionic and anionic surfactants, and phosphorus containing anions. Anions from the metal soaps are eventually precipitated from the cleaners used as non-sticky sludge that can be easily separated from the cleaners.