Specified Rate-affecting Material Contains A Ketone Group -c-(co)n-c-, The (co)n Not Being Part Of A Ring Patents (Class 522/33)
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Patent number: 6028123Abstract: An acrylic resin composition for a color filter containing 100 parts by weight of an acrylic resin having acid value of 5 to 100 mgKOH/g and 5 to 90 parts by weight of a coloring pigment is provided. The acrylic resin has been prepared by polymerizing a monomer mixture containing 1 to 6% by weight of .alpha., .beta.-unsaturated carboxylic acid, 10 to 80% by weight of .alpha., .beta.-unsaturated carboxylate, and 5 to 30% by weight of N-substituted maleimide.Type: GrantFiled: August 15, 1997Date of Patent: February 22, 2000Assignees: Nippon Oil Co., Ltd., Dai Nippon Printing Co., Ltd.Inventors: Takayuki Hirayama, Junichiro Tanimoto, Yutaka Otsuki, Masayuki Ando
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Patent number: 6022906Abstract: Compounds of the formulae I, II, III and IV ##STR1## wherein Ar for example is a phenyl, biphenyl or benzoylphenyl group, which is unsubstituted or substituted; Ar.sub.1, for example, has the same meanings as Ar; Ar.sub.2 is inter alia phenyl; X may be a direct bond; Y hydrogen, etc.; R.sub.1 and R.sub.2 for example C.sub.1 -C.sub.8 alkyl; R.sub.3 inter alia hydrogen or C.sub.1 -C.sub.12 alkyl; R.sub.4 is inter alia C.sub.1 -C.sub.12 alkyl; or R.sub.3 and R.sub.4 together are C.sub.3 -C.sub.7 alkylene; R.sub.5 is for example C.sub.1 -C.sub.6 alkylene; and Z is a divalent radical; provided that at least one of the radicals Ar, Ar.sub.1, Ar.sub.2, Ar.sub.3, R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5 or Y is substituted by 1 to 5 SH groups, or provided that Y contains at least one --SS-- group, are photoinitiators for the polymerization of ethylenically unsaturated compounds.Type: GrantFiled: December 1, 1997Date of Patent: February 8, 2000Assignee: Ciba Specialty Chemicals CorporationInventors: Masaki Ohwa, Hitoshi Yamoto, Jean-Luc Birbaum, Hiroko Nakashima, Akira Matsumoto, Hidetaka Oka
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Patent number: 6022907Abstract: Novel urethane prepolymers which can be applied onto substrates without using any solvent, processes for producing the same, and pressure-sensitive adhesives using the prepolymers, which are excellent in adhesive strength, holding power and low temperature properties are provided. The urethane prepolymer is represented by the following formula [I] or [II]:d-c-(a-c).sub.k -e [I]ord-c-(a-c).sub.n -(b-c).sub.m -(a-c).sub.1 -e [II]wherein k is from 4 to 100; n and 1 each are from 2 to 50; m is from 1 to 50; a represents a polyester group having a number average molecular weight of 1.times.10.sup.3 to 5.times.10.sup.3 ; b represents a divalent group; c represents an organic isocyanate group; d represents a monool having functional groups; and e is a monool, which is the same as or different from d, having a number average molecular weight of 5.times.10.sup.3 to 5.times.10.sup.5. Such an urethane prepolymer is crosslinked to increase its molecular weight, thereby providing a pressure-sensitive adhesive.Type: GrantFiled: May 28, 1998Date of Patent: February 8, 2000Assignees: Kyoeisha Chemical Co., Ltd., Nitto Denko CorporationInventors: Junichi Ikeda, Katsuya Kume
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Patent number: 6020394Abstract: A process for preparing a modified polyalkylene, preferably polyethylene or polypropylene, polymer product is described. The process involves treating the polymer in an impregnation step with UV radiation in the presence of a carbonyl bearing photoinitiator species and a crosslinking species. The radiation may take place in a gaseous or liquid environment which is substantially free of oxygen gas but which comprises at least one of the species.Type: GrantFiled: February 23, 1998Date of Patent: February 1, 2000Assignee: Celgard LLCInventors: Richard A. Jones, Ian M. Ward
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Patent number: 6008268Abstract: A method of generating reactive species which includes exposing a photoreactor composition to radiation, in which the photoreactor composition comprises a wavelength-specific sensitizer associated with one or more reactive species-generating photoinitiators. Also described are methods of polymerizing unsaturated monomers and curing an unsaturated oligomer/monomer mixture.Type: GrantFiled: January 22, 1998Date of Patent: December 28, 1999Assignee: Kimberly-Clark Worldwide, Inc.Inventors: Ronald Sinclair Nohr, John Gavin MacDonald
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Patent number: 6001894Abstract: A process for modifying the surface of a polymer substrate which comprises (1) pretreating the polymer substrate with a photoinitiator or thermoinitiator and at least one ethylenically unsaturated monomer, and (2) subjecting said pretreated polymer substrate to graft polymerization by said at least one monomer, optionally in the added presence of at least one ethylenically unsaturated monomer that is the same or different from the monomer of step (1), and products produced thereby.Type: GrantFiled: April 14, 1998Date of Patent: December 14, 1999Assignee: Huels AktiengesellschaftInventors: Peter Ottersbach, Martina Inhester
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Patent number: 5994033Abstract: A screen printing stencil made from a composition comprising polyhydroxy compounds having a plurality of 1,2- or 1,3-diol groups along a polymer backbone, the diol groups grafted thereto a compound of formula (I) (where A is an arylene or an alkylene group; X is an oxygen atom, a sulfur atom, a carbon-carbon bond, or a group of formula (a), (b) or (c); R is a hydrogen atom or a methyl group; R.sup.1 is a (C.sub.1 -C.sub.4) alkyl group; m is an integer of from 1 to 8; n is an integer of from 1 to 3; and p is 1 or 2); or an acetal of the polyhydroxy, compound with ethylene glycol.Type: GrantFiled: June 2, 1999Date of Patent: November 30, 1999Assignee: Sericol LimitedInventors: Robert S. Davidson, Stuart J. Palmer, Julie E. Pratt, Stephen P. Wilson
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Patent number: 5973019Abstract: This invention relates to a method of curing unsaturated polyester resins or mixtures of such resins and a monomer copolymerizable therewith. More particularly, the invention relates to the curing of such resins and mixtures thereof with a composition comprising acetylacetone peroxide (AAP) in an amount of from about 30 to about 35 percent and a high temperature peroxide. Preferably, the high temperature peroxide is t-butyl peroxybenzoate (TBPB) and is present in an amount of from about 5 to about 10 percent of the composition.Type: GrantFiled: May 1, 1998Date of Patent: October 26, 1999Assignee: Flowtite Technology ASInventor: Kevin J Spoo
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Patent number: 5932625Abstract: A photo-curable resin composition suitable as a material for photo-fabricating and capable of producing cured products with excellent mechanical strength and high heat resistance. Further disclosed is a process for molding a resin-based mold which provides superior molding dimensional precision and superb repetition durability. The resin composition contains a monomer component containing (A) 30-70 wt % of a polyfunctional unsaturated monomer having a cyclic structure and (B) 70-30 wt % of a monofunctional unsaturated monomer having a cyclic structure of which the homopolymer has a glass transition temperature (Tg) of 70.degree. C. or higher; (C) a photo-initiator; and (D) an inorganic filler having an average particle diameter or an average fiber length of 1-50 .mu.Type: GrantFiled: May 30, 1997Date of Patent: August 3, 1999Assignees: DSM N.V., JSR Corporation, Japan Fine Coatings Co., Ltd.Inventors: Tsuyoshi Watanabe, Ayao Matsumura, Yuichi Haruta, Takashi Ukachi
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Patent number: 5928818Abstract: Polymers having an average molecular weight M.sub.w (weight average) of 5,000 to 1,000,000 (measured by gel permeation chromatography), comprising structural repeating units of the formulae I-IV: ##STR1## in which R.sub.1, R.sub.2, R.sub.3 and R.sub.4 independently of one another are hydrogen, methyl or halogen, R.sub.5 and R.sub.6 independently of one another are C.sub.1 -C.sub.6 alkyl, R.sub.7, R.sub.8, R.sub.9 and R.sub.10 independently of one another are hydrogen, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy or halogen, and w, x, y and z are numbers equal to or greater than 1, with the provision that the quotient ##EQU1## which is obtainable from the sum of the structural units having protecting groups divided by the sum of all of the structural units present, obeys the condition 0.10.ltoreq.Q.ltoreq.0.50, are suitable as binders for DUV photoresists of high processing stability and flow resistance.Type: GrantFiled: February 26, 1997Date of Patent: July 27, 1999Assignee: Olin Microelectronic Chemicals, Inc.Inventors: Carl-Lorenz Mertesdorf, Hans-Thomas Schacht, Norbert Muenzel, Pasquale Alfred Falcigno
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Patent number: 5919834Abstract: Disclosed are UV-cured heat transfer labels prepared from a mixture containing at least one thermoplastic resin, at least one material for solvating the thermoplastic resin, the solvating material being either a solvent or liquid monomer, and at least one photo-initiable material which initiates curing of the composition.Type: GrantFiled: September 29, 1997Date of Patent: July 6, 1999Assignee: Illinois Tool Works Inc.Inventors: Myron H. Downs, James D. Singelyn, Bruce W. Downs
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Patent number: 5902599Abstract: Biodegradable polymer networks are provided which are useful in a variety of dental and orthopedic applications. The biodegradable polymer networks can be formed in one embodiment by polymerizing anhydride prepolymers including crosslinkable groups, such as unsaturated moieties. The anhydride prepolymers can be crosslinked, for example in a photopolymerization reaction by irradiation of the prepolymer with light in the presence of a free radical initiator. Suitable anhydride prepolymers include dianhydrides of a dicarboxylic acid and a carboxylic acid molecule comprising a crosslinkable group. For example, methacrylic acid dianhydrides of monomers or oligomers of a diacid such as sebacic acid or 1,3-bis(p-carboxyphenoxy)-hexane can be used. The anhydride prepolymers can be applied in vivo to a site where an orthopedic implant is needed, and then may be crosslinked, for example, by irradiation with U.V. light, to form a biodegradable implant such as a rods, pin or plate.Type: GrantFiled: February 20, 1996Date of Patent: May 11, 1999Assignee: Massachusetts Institute of TechnologyInventors: Kristi S. Anseth, Robert Langer, Venkatram R. Shastri
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Patent number: 5882842Abstract: An active energy ray-curable resin composition, particularly an active energy ray-curable coating composition, both comprising:(A) a resin having oxetane functional groups and epoxy groups in the molecule, and(B) a photo-induced cationic polymerization initiator.Type: GrantFiled: February 12, 1997Date of Patent: March 16, 1999Assignee: Kansai Paint Co., Ltd.Inventors: Yu Akaki, Fumio Yamashita, Yasuo Takaya, Osamu Isozaki
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Patent number: 5859150Abstract: The present invention describes a prepolymer of an aliphatic polyoxaester having a polymerizable end group that may be used to produce hydrogels, surgical devices such as sutures, sutures with attached needles, molded devices, and the like.Type: GrantFiled: November 5, 1997Date of Patent: January 12, 1999Assignee: Ethicon, Inc.Inventors: Dennis D. Jamiolkowski, Rao S. Bezwada
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Patent number: 5855837Abstract: A novel method for producing thick composite parts based upon photopolymerizable compositions is disclosed. The constituents of the photopolymerizable mixture comprise a monomer or monomers capable of polymerizing by free radical or cationic mechanisms, and a photoinitiator system which possesses an absorbance characteristic which is effectively reduced, or self-eliminating, upon initiation of the polymerization reaction. Parts having thicknesses up to 2 cm and thicker for varying end use applications are made by photopolymerizing such compositions. In addition, using such compositions composite parts can be made using a reinforcement material such as a glass fiber mat present in an amount by weight of from about 5 to about 70%.Type: GrantFiled: June 6, 1995Date of Patent: January 5, 1999Assignee: Michigan State UniversityInventors: Alec B. Scranton, Bharath Rangarajan, Lindsay S. Coons
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Patent number: 5844017Abstract: The present invention describes a prepolymer of aliphatic polyoxaesters containing amines and/or amido groups having polymerizable end groups that may be used to produce surgical devices such as sutures, sutures with attached needles, molded devices, and the like.Type: GrantFiled: November 17, 1997Date of Patent: December 1, 1998Assignee: Ethicon, Inc.Inventors: Dennis D. Jamiolkowski, Rao S. Bezwada
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Patent number: 5837746Abstract: Compounds of the formulaRG--A--INwherein IN is a photoinitiator basic structure A is a spacer group and RG is a functional reactive group can be employed as coreactive photoinitiators for photo-polymerization of systems containing ethylenically unsaturated compounds.Type: GrantFiled: June 23, 1997Date of Patent: November 17, 1998Assignee: Ciba Specialty Chemicals CorporationInventors: Manfred Kohler, Jorg Ohngemach, Eike Poetsch, Rudolf Eidenschink, Gerhard Greber, Dieter Dorsch, Jurgen Gehlhaus, Konrad Dorfner, Hans Ludwig Hirsch
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Patent number: 5811199Abstract: A method of generating reactive species which includes exposing a photoreactor composition to radiation, in which the photoreactor composition comprises a wavelength-specific sensitizer associated with a reactive species-generating photoinitiator. Also described are methods of polymerizing unsaturated monomers and curing an unsaturated oligomer/monomer mixture.Type: GrantFiled: June 5, 1995Date of Patent: September 22, 1998Assignee: Kimberly-Clark Worldwide, Inc.Inventors: John Gavin MacDonald, Ronald Sinclair Nohr
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Patent number: 5811505Abstract: An energy-polymerizable composition derived from ingredients comprising: a cyanate ester monomer or oligomer comprising an organic radical bonded through aromatic carbon atoms to at least two --OCN groups; a low molecular weight polyalkylene glycol; and an organometallic compound in which at least one carbon atom of an organic group is bonded to a metal atom. The composition can be cured by at least one of thermal energy, radiation, and accelerated particles, to produce a cured, homogeneous composition.Type: GrantFiled: December 17, 1997Date of Patent: September 22, 1998Assignee: Minnesota Mining and Manufacturing CompanyInventor: Fred B. McCormick
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Patent number: 5798015Abstract: A method of generating reactive species which includes exposing a photoreactor composition to radiation, in which the photoreactor composition comprises a wavelength-specific sensitizer associated with a reactive species-generating photoinitiator. Also described are methods of polymerizing unsaturated monomers and curing an unsaturated oligomer/monomer mixture.Type: GrantFiled: June 5, 1995Date of Patent: August 25, 1998Assignee: Kimberly-Clark Worldwide, Inc.Inventors: Ronald Sinclair Nohr, John Gavin MacDonald
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Patent number: 5776995Abstract: A photosensitive resin composition comprising the following components (A), (B) and (C): (A) a photopolymerizable urethane (meth)acrylate compound containing at least two acryloyl or methacryloyl groups, (B) an alkali-soluble polymer compound having an acid value of from 50 to 250 mgKOH/g, and (C) a photopolymerization initiator, wherein the photosensitive resin composition has an electrical insulation resistance of 8.0.times.10.sup.9 to 1.0.times.1.0.sup.14 .OMEGA..multidot.cm after photocuring. A photosensitive resin laminated film comprising a flexible film, a photosensitive layer provided on the flexible film, and a releasable film layer provided on the photosensitive layer, wherein the photosensitive layer comprises the above photosensitive resin composition.Type: GrantFiled: October 25, 1996Date of Patent: July 7, 1998Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Hiroyuki Obiya, Ryuma Mizusawa
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Patent number: 5773486Abstract: The specification describes techniques for the manufacture of optical gratings in optical fibers. The grating pattern is written into the core of the fiber without removing the fiber coating. Coating compositions with high transparency to the actinic (writing) radiation but which are UV curable are described in detail. The coating compositions contain a UV photoinitiator that absorbs sufficient UV radiation to effectively cure the polymer but is relatively transparent to UV radiation used for writing the grating. The photoinitiator is one or more compounds selected from a specified group of aliphatic and cycloaliphatic ketones.Type: GrantFiled: September 26, 1996Date of Patent: June 30, 1998Assignee: Lucent Technologies Inc.Inventors: Edwin Arthur Chandross, Mark Anthony Paczkowski, Debra Ann Simoff
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Patent number: 5773531Abstract: A modified acrylic urethane prepolymer composition and an unsaturated polyester resin composition to which the prepolymer has been added. The prepolymer composition includes an acrylic urethane prepolymer prepared by the reaction of diisocyanate, like MDI, with an hydroxyl-containing acrylate monomer, such as a pentaerythritol triacrylate, which prepolymer composition may contain a styrene monomer and an inhibitor, such as benzoquinone, to retard the reaction of the prepolymer and styrene monomer prior to the addition of the prepolymer composition into the polyester resin composition. The employment of the modified urethane prepolymer composition provides for the reduction in the amount of styrene monomer used in the unsaturated resin composition and also provides for improved chemical and physical properties of the cured, unsaturated resin composition, such as a reduction in glass roll-out when the resin composition is employed with fiberglass.Type: GrantFiled: August 29, 1997Date of Patent: June 30, 1998Assignee: Hehr International Inc.Inventor: Stuart B. Smith
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Patent number: 5753720Abstract: The present invention relates to a hardenable organopolysiloxane composition having a viscosity of less than 30,000 Poise at 25.degree. C. comprising (A) 30 to 75 wt % of a silicone resin, (B) 70 to 25 wt % of a mercapto functional organopolysiloxane, (C) 0.1 to 10 parts by weight per 100 parts by weight of (A)+(B) of a mercapto functional organosilane, and (D) 0.01 to 10 parts by weight per 100 parts by weight of (A)+(B) of a condensation catalyst. The present invention also relates to an article of manufacture obtained by applying the hardenable organopolysiloxane composition to a substrate, exposing the composition and substrate to high energy radiation, and then applying a solid support to the coated substrate.Type: GrantFiled: January 31, 1997Date of Patent: May 19, 1998Assignee: Dow Corning Toray Silicone Co., Ltd.Inventors: Junji Nakanishi, Makoto Yoshitake
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Patent number: 5747550Abstract: A method of generating reactive species which includes exposing a photoreactor composition to radiation, in which the photoreactor composition comprises a wavelength-specific sensitizer associated with a reactive species-generating photoinitiator. Also described are methods of polymerizing unsaturated monomers and curing an unsaturated oligomer/monomer mixture.Type: GrantFiled: June 5, 1995Date of Patent: May 5, 1998Assignee: Kimberly-Clark Worldwide, Inc.Inventors: Ronald Sinclair Nohr, John Gavin MacDonald
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Patent number: 5708047Abstract: A method for decorating a substrate with hot stamping foil comprising the steps of:a) applying an ink composition comprised of a cationically radiation cured cycloaliphatic epoxide to the substrate in a predetermined design, said ink being operable when cured to bond to the substrate,b) curing the ink on the substrate by exposing to the radiation by which it is curable, thereby bonding the ink composition to the substrate,c) pressing a sheet of hot stamping foil against the substrate with a die heated to a temperature sufficient to cause a portion of the hot stamping foil to adhere to the heated, cured ink design but not to the ink-free areas of the substrate, andd) removing the die, thereby leaving behind a portion of the foil adhered to the ink design.Type: GrantFiled: December 30, 1994Date of Patent: January 13, 1998Assignee: Revlon Consumer Products CorporationInventors: Melvin Edwin Kamen, Bhupendra Patel
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Patent number: 5698285Abstract: An adhesive for use in producing an optical disk comprising two transparent substrates bonded to each other with a photocurable adhesive at respective bonding surfaces thereof and having an information recording layer formed on one or both of the bonding surfaces is disclosed, which is a composition comprising ingredient (A) shown below and a photopolymerization initiator comprising ingredient (B) and/or ingredient (C) shown below:(A) a radical-polymerizable vinyl compound,(B) an acylphosphine oxide compound represented by the general formula ##STR1## and (C) an .alpha.-aminoacetophenone compound represented by the following formula. ##STR2## With this adhesive, optical disk substrates having an extremely low light transmittance can be easily bonded to each other in a short time period without impairing their appearance.Type: GrantFiled: October 16, 1996Date of Patent: December 16, 1997Assignee: Three Bond Co., Ltd.Inventor: Kazuhiro Kojima
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Patent number: 5693725Abstract: Novel polymers of general formula: ##STR1## wherein where n is a whole number from 2 to 10; R is a spacing group comprising (a) at least one of m methylene units where m is a whole number from 1 to 20, m' methine units where m' is a whole number from 0 to 20, a mixture of m methylene units and m' methine units where m+m'.ltoreq.20, and units of formula --(CH.sub.2 -CHX-O).sub.m" --, where m" is a whole number from 0 to 200 and X is H, CH.sub.3 or C.sub.2 H.sub.5, or (b) an aromatic ring having one, two or three members; R' is H, an alkyl group having no more than 20 carbon atoms, an aryl group having no more than three rings, or a combination thereof; R" is a group containing at least two active hydrogen atoms and having at least two but no more than 20 carbon atoms; and R'" is a group containing at least two active hydrogen atoms and is selected from the group consisting of alkyl, aryl and mixed alkyl-aryl species having from 1 to 200 carbon atoms; polyalkylene oxides; and urea formaldehyde resin.Type: GrantFiled: August 29, 1995Date of Patent: December 2, 1997Assignees: Lifesource International, Ltd., Jojani, Inc.Inventor: Nicholas M. Irving
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Patent number: 5688838Abstract: Process for preparing hydrogen-containing fluoropolymers, wherein the corresponding olefinic monomers are (co) polymerized in an organic suspending medium in the presence of a radical photoinitiator and of ultraviolet-visible radiation at a temperature of from -60.degree. C. to +30.degree. C. Hydrogen-containing fluoropolymers are thus obtained having high second melting temperature and high maximum operating temperature, using as initiators non-hazardous products, which can be easily handled and kept also at room temperature.Type: GrantFiled: July 28, 1995Date of Patent: November 18, 1997Assignee: Ausimont S.p.A.Inventors: Julio A. Abusleme, Pier Antonio Guarda, Ralph De Pasquale
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Patent number: 5627006Abstract: A photoresist composition comprising (a) a difficultly alkali-soluble special resin, (b) a photo-sensitive compound capable of generating a carboxylic acid, and (c) a solvent, is effective for pattern formation using deep ultraviolet light, KrF excimer laser beams, etc.Type: GrantFiled: April 18, 1995Date of Patent: May 6, 1997Assignees: Wako Pure Chemical Industries, Ltd., Matsushita Electric Industrial Co., Ltd.Inventors: Fumiyoshi Urano, Keiji Oono, Hirotoshi Fujie
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Patent number: 5585219Abstract: A resist composition and a process for forming a resist pattern using a resist composition are disclosed. The present composition includes 100 parts by weight of a copolymer of a 2-norbornene-2-substituent unit and an acrylic acid ester unit of the formula I; ##STR1## wherein, X is a cyano or chloro group, R is tert-butyl, dimethylbenzyl, or tetrahydropyranyl, m is an integer of 9 to 2390, and n is an integer of 21 to 5180, and 1 to 20 parts by weight of a photo acid generator. A finely-resolved resist pattern with high sensitivity and good dry etch resistance is obtained by the present composition and present process for forming the resist pattern.Type: GrantFiled: May 10, 1995Date of Patent: December 17, 1996Assignee: Fujitsu LimitedInventors: Yuko Kaimoto, Koji Nozaki
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Patent number: 5578378Abstract: An anti-fogging coating comprises from 40 to 80% by weight of at least one acrylic or methacrylic acid monomer, from 20 to 60% by weight of at least one short chain acrylic or methacrylic acid ester monomer and, in relation to the total weight of the preceding monomers, from 1 to 15% of a crosslinking agent and from 0.1 to 5% of a polymerization initiator compound using the action of ultraviolet radiation. Transparent products formed from a glass or poly(methyl methacrylate) support and a layer of the preceding composition, polymerized and crosslinked by the action of ultraviolet radiation, exhibit good anti-fogging and mechanical resistance properties.Type: GrantFiled: July 20, 1995Date of Patent: November 26, 1996Assignee: Saint-Gobain VitrageInventors: Albert A. Kruger, Pascal Chartier
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Patent number: 5561029Abstract: The present invention sets forth the incorporation of a substituted 2-phenyl-4,6-bis (trichloromethyl)-1,3,5-triazine in photoresists of lithographic printing plates for the purpose of promoting their shelf-life, room light stability, and developability. The present invention provides a photocurable composition comprising at least a photopolymerizable ethylenically unsaturated monomer having at least one terminal ethylenic group and capable of forming a polymer upon exposure to actinic radiation; and an s-triazine capable of initiating free radical polymerization of the photopolymerizable ethylenically unsaturated monomer and being represented by the following general formula [I]: ##STR1## wherein R.sub.1 is either OR.sub.4 or NR.sub.5 R.sub.6, wherein R.sub.5 and R.sub.6 may or may not be identical with each other, either R.sub.5 or R.sub.6 may represent hydrogen, and wherein R.sub.4 and at least one of R.sub.5 and R.sub.Type: GrantFiled: April 28, 1995Date of Patent: October 1, 1996Assignee: Polaroid CorporationInventors: Maurice J. Fitzgerald, Frederick R. Kearney, Rong-Chang Liang, William C. Schwarzel, Donna J. Guarrera, John M. Hardin, John C. Warner
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Patent number: 5532112Abstract: Compounds of the formulaRG--A--INwhereinIN is a photoinitiator basic structureA is a spacer group andRG is a functional reactive groupcan be employed as coreactive photoinitiators for photopolymerization of systems containing ethylenically unsaturated compounds.Type: GrantFiled: June 2, 1994Date of Patent: July 2, 1996Assignee: Ciba-Geigy CorporationInventors: Manfred Kohler, Jorg Ohngemach, Eike Poetsch, Rudolf Eidenschink, Gerhard Greber, Dieter Dorsch, Jurgen Gehlhaus, Konrad Dorfner, Hans L. Hirsch
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Patent number: 5516812Abstract: A radiation and moisture curable silicone conformal coating composition comprises a silicone fluid of a monovalent ethylenically unsaturated functional group endcapped silicone and at least one (meth)acryl-functionalized silicone; and a photoinitiator effective for radiation curing of the silicone composition. The encapped silicone is the product of a reaction between a silanol terminated silicone and a silane cross linker having joined directly to a silicon atom thereof a monovalent ethylenically unsaturated functional group and at least 2 hydrolyzable groups.Type: GrantFiled: August 1, 1994Date of Patent: May 14, 1996Assignee: Loctite CorporationInventors: Hsien K. Chu, Robert P. Cross, Lester D. Bennington
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Patent number: 5480917Abstract: An anti-fogging coating comprises from 40 to 80% by weight of at least one acrylic or methacrylic acid monomer, from 20 to 60% by weight of at least one short chain acrylic or methacrylic acid ester monomer and, in relation to the total weight of the preceding monomers, from 1 to 15% of a crosslinking agent and from 0.1 to 5% of a polymerization initiator compound using the action of ultraviolet radiation. Transparent products formed from a glass or poly(methyl methacrylate) support and a layer of the preceding composition, polymerized and crosslinked by the action of ultraviolet radiation, exhibit good anti-fogging and mechanical resistance properties.Type: GrantFiled: December 29, 1994Date of Patent: January 2, 1996Assignee: Saint-Gobain VitrageInventors: Albert A. Kruger, Pascal Chartier
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Patent number: 5459174Abstract: A radiation curable functionalized polymer is disclosed. The functionalized polymer is a copolymer of an isoolefin of 4 to 7 carbon atoms and para-alkylstyrene, wherein the para-alkylstyrene is functionalized with an acrylate or a mixture of acrylates and/or a photosensitizer and/or other functional groups at the para-alkyl groups of the para-alkylstyrene.Type: GrantFiled: June 24, 1994Date of Patent: October 17, 1995Inventors: Natalie A. Merrill, Hsian-Chang Wang, Anthony J. Dias
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Patent number: 5436281Abstract: Proposed is an improved radiation-curable organopolysiloxane composition capable of giving a cured surface film on a substrate surface which exhibits excellent releasability against sticky substances. The composition is obtained by combining two kinds of (meth)acryloxyalkyl-containing organopolysiloxanes in a specified weight proportion, of which one has a relatively large degree of polymerization but contains only a relatively small amount of the silicon-bonded (meth)acryloxyalkyl groups while the other has a relatively small degree of polymerization but contains a relatively large amount of the silicon-bonded (meth)acryloxyalkyl groups.Type: GrantFiled: May 13, 1994Date of Patent: July 25, 1995Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Shinji Irifune, Toshio Ohba
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Patent number: 5416126Abstract: A composition which is cured upon exposure to ultraviolet light in the absence of solvent is disclosed. The liquid composition is prepared by combining a liquid maleate polyester and at least one of a vinyl compound and an allyl functional compound. A photoinitiator is then added to the polymerizable liquid composition. A substrate is impregnated with the polymerizable liquid composition and exposed to actinic energy of a sufficient dosage for a sufficient amount of time to polymerize the composition to a sufficient degree to impart useful properties to the substrate. The composition can be used as a binder for fiberglass insulation, in the manufacture of transparent or semi-transparent paper and to manufacture paper for use in photocopy machines.Type: GrantFiled: February 17, 1993Date of Patent: May 16, 1995Assignee: DSM N.V.Inventors: Edward J. Murphy, Edward P. Zahora, Sami A. Shama
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Patent number: 5407972Abstract: A photocurable composition comprising the reaction products of hydroxy terminated liquid sulfide or polysulfide oligomers with photocurable ethylenically unsaturated compounds. The products provide improved sealants for air and marine vehicles.Type: GrantFiled: August 2, 1993Date of Patent: April 18, 1995Assignee: Sunrez Corp.Inventors: W. Novis Smith, Mark Livesay
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Patent number: 5407970Abstract: The invention relates to adhesive compositions comprising terpolymers C.sub.6 to C.sub.10 unsaturated .alpha.-olefin monomers, C.sub.2 to C.sub.5 .alpha.-olefin monomers and polyene monomers and an effective amount of photoactive cross-linking agent to cross-link composition upon radiation from a source of active radiation.Type: GrantFiled: April 13, 1993Date of Patent: April 18, 1995Assignee: Minnesota Mining and Manufacturing CompanyInventors: James R. Peterson, Gaddam N. Babu
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Patent number: 5391438Abstract: The surface of a polymer such as polypropylene, may be treated by contact with an amine donor such as ethylene diamine followed by irradiation with ultraviolet light of wave length of about 1800.ANG.-2800.ANG. to improve surface wettability.Type: GrantFiled: October 1, 1993Date of Patent: February 21, 1995Assignee: Texaco Inc.Inventor: Mordechai Pasternak
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Patent number: 5371116Abstract: Vulcanizable organopolysiloxane compositions comprise a hydroxy-terminated organopolysiloxane, an acrylic or methacryllc functional alkoxy silane, a divalent tin compound, an alkoxy-.alpha.-silyl ester, a photopolymerization initiator, and a curing catalyst whereby the composition is cured by UV irradiation and/or by the action of moisture in air. The composition has good shelf stability and can yield rubber elastomers having good physical properties.Type: GrantFiled: July 13, 1993Date of Patent: December 6, 1994Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Takafumi Sakamoto, Masatoshi Arai, Kei Miyoshi
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Patent number: 5354784Abstract: A keto arene-cyclopentadienyl iron complex salt of the formula:[(R.sup.2 CO)(R.sup.1).sub.m C.sub.6 H.sub.5--m Fe.sup.II Cp].sup.+1 A.sup.-1wherein R.sup.1 is an alkyl group, R.sup.2 is an alkyl group or phenyl group, m is an integer of 1 to 5, Cp is an .eta..sup.5 -cyclopentadienyl group and A.sup.-1 is a non-nucleophilic anion, e.g. pentamethylacetophenone-Fe(II)-Cp.sup.+ PF.sub.6.sup.-1 salt or pentamethylbenzophenone-Fe(II)-Cp.sup.+ PF.sub.6.sup.-1 salt, which is useful as a photoinitiator for cationically polymerizable compounds, especially for epoxy resins, and has an improved environmental safety and a high absorptivity, and which can be easily produced by a direct replacement reaction between dicarbonyl-.eta..sup.5 -(2,4-cyclopentadien-1-yl)iron(II) halide and an alkyl substituted keto arene to be replaced for the carbonyl ligands.Type: GrantFiled: August 10, 1992Date of Patent: October 11, 1994Assignee: Arakawa Kagaku Kogyo Kabushiki KaishaInventors: Scott F. Timmons, Hiroshi Sawada, Stephen T. Willinghoff, Robert E. Lyle, Jr., Belinda K. Taylor
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Patent number: 5344353Abstract: A method for manufacturing a cathode ray tube is provided which comprises (a) spraying on the inner surface of a phosphor layer of a phosphor coated panel, an organic composition for forming a heat labile film, the organic composition being free of flammable or explosive organic solvents and including an initiator capable of forming a radical or cation when exposed to ultraviolet or electron rays and at least one resin containing at least one group consisting of acrylate, vinyl and diazo functional groups to form a heat labile film thereon; (b) exposing the heat labile film to ultraviolet or electron rays to from a hardened film layer; (c) forming an aluminum layer on a surface of the hardened film layer to form a screen; (d) sealing with heat the panel and a funnel to form a bulb with a mount including an electron gun and a stem, wherein the step of sealing to form a bulb decomposes the hardened film layer.Type: GrantFiled: November 1, 1991Date of Patent: September 6, 1994Assignee: Samsung Electron Devices Co., Ltd.Inventors: Dong-sik Jang, Byeong-yong Lee
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Patent number: 5340847Abstract: A composition useful as a liquid gasket, having high working efficiency and high initial pressure resistance, is provided. The composition, characterized by being curable by ultraviolet light and by moisture, includes (a) a polysiloxane containing, on at least one molecular end, at least one group selected from the group consisting of (meth)acryl, glycidyl, propenyloxysilyl and thiol; (b) a polyorganosiloxane having silanol groups at both molecular ends; (c) a polyorganosiloxane having, on at least one molecular end, a hydrolyzable group; (d) a photopolymerization catalyst; and (e) a condensation catalyst.Type: GrantFiled: July 23, 1993Date of Patent: August 23, 1994Assignee: Three Bond Co., Ltd.Inventors: Yasuo Hanazuka, Ikuzo Usami, Kazuyuki Chiba, Noriko Mizutani
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Patent number: 5328941Abstract: The instant invention pertains to an organopolysiloxane composition for the formation of a cured release film wherein said organopolysiloxane composition cures rapidly under exposure to ultraviolet radiation to form a cured film that tightly adheres to various types of supports or base materials.The organopolysiloxane composition for the formation of a cured release film of the instant invention is comprised of (A) an organopolysiloxane that contains in each molecule at least 2 higher alkenyl groups as represented by the general formulaH.sub.2 C.dbd.CH--(CH.sub.2).sub.n --wherein n has a value of 2 to 8, (B) an organopolysiloxane that contains at least 2 mercaptoalkyl groups in each molecule, (C) an organopolysiloxane selected from the group consisting of organopolysiloxanes that contain in each molecule 1 higher alkenyl group with the general formulaC.sub.2 C.dbd.CH--(CH.sub.2).sub.n -wherein n=2 to 8 and organopolysiloxanes that contain 1 mercaptoalkyl group in each molecule, and (D) a photosensitizer.Type: GrantFiled: June 22, 1993Date of Patent: July 12, 1994Assignee: Dow Corning Toray Silicone Co., Ltd.Inventors: Masushi Hayashi, Nobuo Kaiya, Shosaku Sasaki
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Patent number: 5304456Abstract: A negative photoresist composition containing an alkali-soluble resin which is obtainable through a condensation reaction of an aldehyde with a phenol compound containing a compound of the general formula: ##STR1## wherein R.sup.1 to R.sup.9 are independently a hydrogen atom, an alkyl group, an alkenyl group, an alkylcarbonyl group, a halogen atom or a hydroxyl group, provided that at least one of R.sup.1 to R.sup.9 is a hydroxyl group and, at the ortho- or para-position to the hydroxyl group, at least two hydrogen atoms are present; a cross linking agent; and a photo-acid generator, and a negative photoresist composition comprising an alkali-soluble resin, a cross linking agent and a photo-acid generator having a trifluoromethanesulfonic acid ester group, which can increase resolution and contrast of a photoresist pattern.Type: GrantFiled: January 29, 1992Date of Patent: April 19, 1994Assignee: Sumitomo Chemical Company, LimitedInventors: Yuji Ueda, Hiromi Ueki, Naoki Takeyama, Takehiro Kusumoto
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Patent number: 5296511Abstract: The present film-former composition comprises (a) an organosilazane copolymer having a perfluoroalkyl group-containing structural unit and a methacryloyloxy group-containing structural unit, (b) a photosensitizer soluble in an organic solvent, and (c) an organic solvent. The composition is cured by irradiation with ultraviolet light for a short period of time to form a film excellent in water repellency, oil repellency, and hardness.Type: GrantFiled: February 7, 1992Date of Patent: March 22, 1994Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Yoshihito Ohsawa, Kohei Hasegawa, Masanori Sutou, Satoshi Kuwata
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Patent number: 5262444Abstract: The invention relates to a breathable, plastic film, useful as a wall covering material. A low boiling additive, such as water, is added to a plastisol before extrusion. During extrusion and curing of the plastisol into a film or coating, the low boiling additive is volatilized and the resulting evolved gas perforates the forming film. In this manner a permeable plastic film, such as vinyl, is produced.Type: GrantFiled: November 30, 1992Date of Patent: November 16, 1993Assignee: Borden, Inc.Inventors: George Rusincovitch, Paul J. Roe, Richard C. Andrews