From Fused Or Bridged Ring Containing Monomer Patents (Class 526/280)
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Patent number: 7524912Abstract: A polymerizable composition including a late transition metal complex, a non-polar olefin, a polar olefin, and a free radical scavenger, wherein the polymerizable composition is capable of forming a linear poly[(non-polar olefin)-(polar olefin)] substantially free of free radical addition polymer, is disclosed. A method of copolymerizing a non-polar olefin with a polar olefin, catalyzed by a late transition metal complex in the presence of a free radical scavenger, to produce a linear poly[(non-polar olefin)-(polar olefin)] substantially free of free radical addition polymer is also disclosed.Type: GrantFiled: February 13, 2008Date of Patent: April 28, 2009Assignee: Rohm and Haas CompanyInventors: Brian Leslie Goodall, Thomas Cleveland Kirk, Lester Howard McIntosh, III
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Patent number: 7504466Abstract: A process for preparing crosslinked polymer particles at high solids levels (i.e., >40 wt %). Also provided is a method for predicting whether a selection of reaction conditions for preparing crosslinked polymer particles will exhibit a potential for forming a gel and a method for predicting whether a selection of reaction conditions will or will not result in the formation of a gel.Type: GrantFiled: October 6, 2005Date of Patent: March 17, 2009Assignee: Rohm and Haas CompanyInventors: Wayne Devonport, Susan J. Fitzwater, Eric G. Lundquist
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Publication number: 20090058289Abstract: The present invention relates to triaylamines which are substituted by defined groups. These compounds can be used for producing organic electroluminescent devices.Type: ApplicationFiled: March 3, 2007Publication date: March 5, 2009Applicant: MERCK PATENT GMBHInventors: Philipp Stoessel, Holger Heil, Arne Buesing
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Publication number: 20090043064Abstract: A metal complex having a structure of the following general formula (1): (wherein, X1 and X2 represent independently a carbon atom or nitrogen atom. Bonds represented by X1C and X2N are a single bond or double bond. M represents a transition metal atom. A dihedral angle defined by a plane containing a structure represented by CX1—X2 and a plane containing a structure represented by X1—X2N is 9° to 16°, and the proportion of the sum of squares of orbital coefficients of the outermost d orbital of the metal atom M, in the highest occupied molecular orbital of the metal complex, occupying with respect to the sum of squares of all atom orbital coefficients, is divided by an energy difference S1?T1 between the lowest excitation singlet energy S1 and the lowest excitation triplet energy T1 of the metal complex, to give a value of 200 to 600%/eV.).Type: ApplicationFiled: February 21, 2007Publication date: February 12, 2009Applicants: SUMITOMO CHEMICAL COMPANY, LIMITED, SUMATION CO., LTD.Inventors: Nobuhiko Akino, Satoshi Mikami, Chizu Sekine
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Publication number: 20080248220Abstract: A light emitting material comprising a conjugated polymer compound (A) containing an aromatic ring in the main chain and a compound (B) showing light emission from the triplet excited state, wherein an energy difference between the vacuum level and the lowest unoccupied orbital (LUMO) level in the ground state, calculated by a computational chemical means, is 1.3 eV or more, or an energy difference between the vacuum level and the lowest unoccupied orbital (LUMO) level in the ground state, experimentally measured, is 2.2 eV or more, in the polymer compound (A), and either the following (Condition 1) or the following (Condition 2) or both of them are satisfied.Type: ApplicationFiled: September 10, 2004Publication date: October 9, 2008Inventors: Chizu Sekine, Nobuhiko Akino, Satoshi Mikami
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Patent number: 7422836Abstract: Oligomers of polycyclic olefin monomers, and optionally allylic or olefinic monomers, and a method of making such oligomers that includes reacting polycyclic olefin monomers in the presence of a Ni or Pd containing catalyst, or in the case of allylic monomers in the presence of a free radical initiator. The oligomers can be included in photoresist compositions as dissolution rate modifiers. The photoresist compositions can further include a polymeric binder resin, a photoacid generator, and solvents.Type: GrantFiled: February 20, 2004Date of Patent: September 9, 2008Assignee: Promerus LLCInventors: Larry F. Rhodes, Lawrence Seger, Brian L. Goodall, Lester H. McIntosh, III, Robert J. Duff
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Publication number: 20080188634Abstract: Shape-persistent organic materials, including polymers, with large degrees of interior free volume are described, along with behaviors and phenomena enabled by their unique properties. One class of such a material is built up from triptycene base moieties wherein three benzene rings are bridged together about a [2.2.2] tricyclic ring system. These units can be assembled into discreet molecules and polymers. These materials and/or formulations thereof with liquid crystals or polymers are useful for the complexation of chemicals and/or polymers; they have very low dielectric constants for use as coatings in dielectric circuits, they provide additional ordering mechanisms in liquid crystals, and they display unusual mechanical responses when subjected to electrochemical, chemical, or mechanical stimuli.Type: ApplicationFiled: July 23, 2007Publication date: August 7, 2008Applicant: Massachusetts Institute of TechnologyInventors: Timothy M. Swager, Timothy M. Long, Zhengguo Zhu
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Patent number: 7408013Abstract: The invention pertains to low polydispersity copolymers useful for photoimaging and photoresist compositions, and to the photoimaging processes which use these compositions. The low polydispersity copolymers of this invention are prepared using controlled radical polymerization (CRP) techniques, such as RAFT (reversible addition fragmentation chain transfer) polymerization.Type: GrantFiled: September 20, 2004Date of Patent: August 5, 2008Assignee: Commonwealth Scientific and Industrial Research OrganizationInventors: Andrew Edward Feiring, Michael Fryd, Frank Leonard Schadt, III
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Patent number: 7393468Abstract: An adhesive adapted with particular optical properties, and its use to couple a substrate to a substrate holder during substrate processing are disclosed. After processing the substrate, the optical properties of the adhesive may be exploited to locate and/or remove adhesive residue that may be present on the substrate.Type: GrantFiled: February 23, 2005Date of Patent: July 1, 2008Assignee: Intel CorporationInventors: Daoqiang Lu, Eric J. Li
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Publication number: 20080145571Abstract: A polymer compound comprising a structure of the following formula (1): (wherein, A ring and B ring each independently represent an aromatic hydrocarbon ring optionally having a substituent, and C ring represents an alicyclic hydrocarbon ring containing no condensed aromatic compound and having at least one substituent. The alicyclic hydrocarbon may contain a hetero atom).Type: ApplicationFiled: December 21, 2005Publication date: June 19, 2008Applicant: Sumitomo Chemical Company, LimitedInventors: Shigeya Kobayashi, Satoshi Kobayashi
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Patent number: 7385018Abstract: The present invention involves a hydrogenated copolymer obtained by hydrogenating a copolymer having a softening point falling in a range of 45 to 55° C. determined by a ball & ring method, wherein the hydrogenated copolymer has a softening point of 85 to 95° C. determined by the ball & ring method, and a hot melt adhesive composition comprising this copolymer hydrogenated product. The hydrogenated copolymer of the present invention has a small weight reduction rate in heating and a good hue after heating. The hot melt adhesive composition comprising the same has excellent fluidity in heating and has a small heating loss and a small change in a hue in heating and has excellent heat stability.Type: GrantFiled: June 26, 2002Date of Patent: June 10, 2008Assignee: Idemitsu Kosan Co., Ltd.Inventor: Toshihiro Mine
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Patent number: 7357973Abstract: A flat plate made of a cycloolefin polymer comprising at least 30% by weight, based on the cycloolefin polymer, of repeating units (A) having an alicyclic structure. The repeating units (A) comprises at least 30% by weight, based on the repeating units (A), of repeating units (A-i) having no norbornane structure. The cycloolefin polymer has a weight average molecular weight of 5,000 to 50,000. The flat plate is especially useful as a light guide plate.Type: GrantFiled: October 25, 2004Date of Patent: April 15, 2008Assignee: Nippon Zeon Co., Ltd.Inventors: Kazuyuki Obuchi, Teruhiko Suzuki, Kenji Otoi
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Patent number: 7351461Abstract: An article comprising the compound of Formula (I) wherein X is hydrogen or a radical of Formula (II), R1 independently at each occurrence is a C1-C20 aliphatic radical, a C3-C10 cycloaliphatic radical, or a C3-C10 aromatic radical; R2, R3, R4 and R5 are independently at each occurrence a halogen, a nitro group, a cyano group, a hydroxy group, a C1-C20 aliphatic radical, a C3-C20 cycloaliphatic radical, or a C6-C20 aromatic radical; and “n”, “q”, and “p” are each independently integers having a value of 0 to 3, and “m” is an integer having a value of 0 to 4.Type: GrantFiled: June 5, 2007Date of Patent: April 1, 2008Assignee: General Electric CompanyInventors: Yogendrasinh B. Chauhan, Adil Minoo Dhalla, Rahul R. Khanwelkar, Krishnamoorthy Sivakumar, Kiran Arunkumar Puthamane
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Patent number: 7339006Abstract: The invention discloses an adhesion agent composition comprising at least one C3-C200 olefin compound having at least one metathesis active double bond, wherein the olefin is substituted or unsubstituted; and at least one compatibilizing functionality for interacting with a substrate surface. The substrate surface can be any surface, for example, silicate glasses, silicate minerals, metals, metal alloys, ceramics, natural stones, plastics, carbon, silicon, and semiconductors. The invention also discloses articles of manufacture utilizing these adhesion agents as well as methods for adhering a polyolefin to a substrate surface.Type: GrantFiled: June 24, 2002Date of Patent: March 4, 2008Assignee: Cymetech, L.L.C.Inventors: Michael A. Giardello, Christopher M. Haar
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Publication number: 20080020289Abstract: There is disclosed a polymer comprising: at least, a repeating unit of substitutable hydroxy styrene and a repeating unit of substitutable hydroxy vinylnaphthalene which are represented by the following general formula (1). There can be provided a polymer suitable as a base resin of a positive resist composition, in particular, a chemically amplified positive resist composition that can exhibit higher resolution than conventional positive resist compositions, that provides excellent pattern profiles after being exposed and that exhibits excellent etching resistance; a positive resist composition and a patterning process that use the polymer.Type: ApplicationFiled: June 12, 2007Publication date: January 24, 2008Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Jun Hatakeyama, Takanobu Takeda
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Publication number: 20080020290Abstract: There is disclosed a negative resist composition comprising, at least, a polymer comprising a repeating unit of hydroxy vinylnaphthalene represented by the following general formula (1). There can be provided a negative resist composition, in particular, a chemically amplified negative resist composition that can exhibit higher resolution than conventional hydroxy styrene or novolac negative resist compositions, that provides excellent pattern profiles after being exposed and that exhibits excellent etching resistance; and a patterning process that uses the resist composition.Type: ApplicationFiled: June 12, 2007Publication date: January 24, 2008Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Jun Hatakeyama, Takanobu Takeda
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Patent number: 7312285Abstract: The present invention relates to a method for preparing a cyclic olefin polymer by addition polymerization, and more particularly to a method for preparing a norbornene-based addition polymer, which comprises a step of contacting a norbornene-based monomer having an ester or acetyl group with a catalyst system comprising: a Group X transition metal compound; a compound comprising a neutral Group XV electron donor ligand having a cone angle of at least 160°; and a salt capable of offering an anion that can be weakly coordinated to the transition metal, in solvent. The norbornene-based addition polymer having an ester or acetyl group according to the present invention is transparent, has superior adhesivity and a low dielectric constant, and it generates no byproducts when attached to metal. Therefore, it can be used as an optical film, a retardation film, a protection film for a polarizer, POFs (plastic optical fiber), PCBs (printed circuit board), or insulators of electronic devices.Type: GrantFiled: July 7, 2003Date of Patent: December 25, 2007Assignee: LG Chem, Ltd.Inventors: Sung-Ho Chun, Won-Kook Kim, Sung-Cheol Yoon, Tae-Sun Lim, Heon Kim, Kyoung-Hoon Kim
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Patent number: 7312292Abstract: A polymer comprising polycyclic repeating units having recurring ion conducting groups and optional crosslinkable groups is disclosed. The present invention provides the capability of tailoring polymers to impart unique properties to membranes fabricated from the polymers. Membranes comprising the polymers and methods for preparing the membranes and their use in ion conducting membranes, particularly in fuel cells, are also provided.Type: GrantFiled: June 4, 2004Date of Patent: December 25, 2007Assignee: Promerus LLCInventors: Ravi Ravikiran, Xiaoming Wu, Larry F. Rhodes, Robert A. Shick, Hiroko Nakano, Hirotaka Nonaka, Huabin Wang, Saikumar Jayaraman, Robert John Duff, John-Henry Lipian
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Patent number: 7312291Abstract: A new family of concrete admixture additives can be derived from reacting a mixture of olefins/cyclic olefins-maleic anhydride copolymers and methoxy polyethylene glycol amines and/or polyethylene glycol monoalkyl ethers, or a mixture of styrene-maleic anhydride copolymers and methoxy polyethylene glycol amines and/or polyethylene glycol monoalkyl ethers, or a mixture of styrene-olefins/cyclic olefins-maleic anhydride terpolymers and methoxy polyethylene glycol amines and/or polyethylene glycol monoalkyl ethers. These reactions lead to formation of a kind of carboxylic salt containing polymer, which can be used alone in concrete. Only a small amount of this substance is needed to provide excellent water reduction, high concrete flowability and high early strength.Type: GrantFiled: September 4, 2003Date of Patent: December 25, 2007Assignee: Taiwan Gwan Chian Industrial Co., Ltd.Inventor: Theresa Tsai
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Patent number: 7291689Abstract: The present invention provides norbornene-based copolymers for which one monomer is at least selected from a group consisting of norbornene and dicyclopentadiene, and the other from norbornene-based comonomers of Formula 1 shown below: In Formula 1, R1, R2 and a are defined in this specification. The present invention provides insulating elements for multi-chip packages and antireflection films for the exposure process of semiconductor fabrication using said norbornene-based copolymers. Norbornene-based copolymers according to the present invention have low dielectric constant as well as high thermal stability and excellent solubility to various organic solvents.Type: GrantFiled: May 1, 2006Date of Patent: November 6, 2007Assignee: Seoul National University Industry FoundationInventors: Jin Kyu Lee, Dong Woo Yoo, Seung Jae Yang, Kook Heon Char, Joo Hyeon Park
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Patent number: 7285370Abstract: Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused light reflection of bottom film layer or substrate and reduce standing waves caused by a variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF among processes for manufacturing semiconductor devices, and its preparation method. Also, the present invention discloses an organic anti-reflective coating composition comprising a light absorbent agent polymer for the organic anti-reflective coating and a pattern formation process using the coating composition.Type: GrantFiled: October 12, 2004Date of Patent: October 23, 2007Assignee: Hynix Semiconductor Inc.Inventors: Jae Chang Jung, Keun Kyu Kong, Jin-soo Kim
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Publication number: 20070224436Abstract: A film forming composition comprises a compound having a cage structure and a thermally decomposable compound, an insulating film is formed by using the film forming composition and an electronic device comprises the insulating film.Type: ApplicationFiled: March 22, 2007Publication date: September 27, 2007Applicant: FUJIFILM CorporationInventor: Hidetoshi Hiraoka
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Patent number: 7232639Abstract: As a polymer exhibiting improved transparency which is suitable for a resist resin used in a chemical-amplification-type resist being applicable for photolithography using exposure light at 180 nm or shorter, this invention provides a polymer comprising a repeating unit resulting from polymerization of a monomer exhibiting a polymerization activity, wherein the monomer has a fluorine-containing acetal or ketal structure represented by general formula (1): wherein R represents an atomic group containing a carbon-carbon double bond exhibiting polymerization activity; at least one of R1 and R2 is fluorinated alkyl group or fluorinated aryl group having 1 to 20 carbon atoms; and R3 represents a radical selected from the group consisting of hydrogen atom, alkyl group, alkoxy-substituted alkyl group, fluorinated alkyl group, aryl group, fluorinated aryl group, aralkyl group and fluorinated aralkyl group having 1 to 20 carbon atoms.Type: GrantFiled: February 25, 2003Date of Patent: June 19, 2007Assignee: NEC CorporationInventors: Katsumi Maeda, Kaichiro Nakano
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Patent number: 7220808Abstract: By resolving objections in the prior art, provided are a novel copolymer suitable as a coating polymers which is excellent in adhesion to a substrate and can be used suitably as the polymer for the coating film having durability against pattern collapse in the finer pattern formation for progressed lithography technology and a method for producing the copolymer, as well as a novel thiol compound useful as a chain transfer agent in the production of the copolymer. The novel thiol compound of the present invention has the structure represented by the formula (1); wherein R1 is a bivalent substituent selected from linear, branched or cyclic saturated hydrocarbon having 1 to 15 carbon atoms.Type: GrantFiled: February 23, 2004Date of Patent: May 22, 2007Assignee: Maruzen Petrochemical Co. Ltd.Inventors: Takanori Yamagishi, Takahito Mita
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Patent number: 7186773Abstract: There are provided a novel norbornene derivative which is a material for a chemically amplifying type photoresist for F2 laser, possesses excellent transparency and improved dry etching resistivity and has a fluorine-containing ketone unit or fluorine-containing tertiary alcohol unit directly bonded to the norbornene backbone; a fluorine-containing polymer obtained by using the norbornene derivative as a copolymerizable monomer; and a chemically amplifying type photoresist composition comprising the fluorine-containing polymer, a photoacid generator and a solvent.Type: GrantFiled: January 9, 2004Date of Patent: March 6, 2007Assignee: Daikin Industries, Ltd.Inventors: Takayuki Araki, Takuji Ishikawa, Takuji Kume, Akinori Yamamoto
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Patent number: 7183366Abstract: The present invention is generally directed to copolymers of fluorene. It further relates to devices that are made with the copolymers.Type: GrantFiled: September 14, 2004Date of Patent: February 27, 2007Assignee: E. I. du Pont de Nemours and CompanyInventors: Frank P. Uckert, Howard E. Simmons, III
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Patent number: 7183365Abstract: The present invention is generally directed to perfluoroalkylated fluorene polymers. It further relates to a process for preparing the polymers and devices that are made with the polymers.Type: GrantFiled: April 1, 2004Date of Patent: February 27, 2007Assignee: E. I. du Pont de Nemours and CompanyInventors: Frank P. Uckert, Andrew Edward Feiring
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Patent number: 7173097Abstract: A composition curable by a metathesis reaction upon mixing its components and comprising an olefin-containing substrate, a metathesis catalyst, and a reaction control agent for slowing the progress of the metathesis reaction. The metathesis catalyst is a ruthenium or osmium carbene complex catalyst having high activity and good air stability. In one embodiment, the catalyst is free of phosphine ligands. The reaction control agent is an organic compound that contains carbon-carbon double and/or triple bonds and one or more Group 14 atoms and is present in an amount effective to slow the progress of the metathesis reaction. In one embodiment, the olefin-containing substrate may comprise one or more oligomers or polymers having a >20 wt. % linear siloxane (Si—O—Si) backbone tethered and/or end-capped with functional olefin groups, such as cycloalkenyl groups.Type: GrantFiled: July 15, 2004Date of Patent: February 6, 2007Assignee: Kerr CorporationInventor: Christos Angeletakis
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Patent number: 7163993Abstract: This invention relates to olefin polymers particularly suited to satisfying the dielectric properties required in electrical device use. The olefin polymers can be prepared by contacting polymerizable olefin monomers with catalyst complexes of Group 3–11 metal cations and noncoordinating or weakly coordinating anion compounds bound directly to the surfaces of finely divided substrate particles or to polymer chains capable of effective suspension or solvation in polymerization solvents or diluents under solution polymerization conditions. Thus, the invention includes polyolefin products prepared by the invention processes, particularly ethylene-containing copolymers, having insignificant levels of mobile, negatively charged particles as detectable by Time of Flight SIMS.Type: GrantFiled: May 28, 2003Date of Patent: January 16, 2007Assignee: ExxonMobil Chemical Patents Inc.Inventor: Patrick Brant
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Patent number: 7160969Abstract: The invention relates to metathesis oligomers wherein one or more alkoxy ether groups are attached to the oligomer moiety. Also disclosed is a polymerizable composition comprising a catalytically effective amount of a penta- or hexavalent ruthenium or osmium carbene catalyst, the process for preparing the metathesis polymer by applying the reaction conditions of Ring Opening Metathesis Polymerization (=ROMP) to the polymerisable composition; and various technical applications of the metathesis oligomers as antifog agents.Type: GrantFiled: March 8, 2002Date of Patent: January 9, 2007Assignee: Ciba Specialty Chemicals Corp.Inventors: Piero Piccinelli, Manuel Vitali, Alessandro Zedda
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Patent number: 7157536Abstract: A composition that can be used as a component in auto clear coat and primer is disclosed. The composition comprises or is an alkoxylated amine having the formula of (A)[N(R1H)2]p including an isomer or mixture of isomers thereof. Also disclosed is a process, which comprises contacting an amine with an epoxide under a condition sufficient to produce an alkoxylated amine. Further disclosed is a composition that can be used as coating composition and primer, which comprises an alkoxylated amine and an organic polyisocyanate.Type: GrantFiled: January 19, 2004Date of Patent: January 2, 2007Assignee: E. I. du Pont de Nemours and CompanyInventors: Gia Huynh-Ba, Patrick Henry Corcoran, Carl Brent Douglas, Christian Peter Lenges, John Stuart Coates
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Patent number: 7148296Abstract: A thermoset composition exhibiting reduced water absorption in the cured state includes an olefinically unsaturated monomer and a capped poly(arylene ether) prepared by the reaction of an uncapped poly(arylene ether) with an anhydride capping agent. The capped poly(arylene ether) is isolated and/or purified by methods that reduce the concentrations of polar impurities that contribute to water absorption by the cured composition.Type: GrantFiled: October 3, 2003Date of Patent: December 12, 2006Assignee: General Electric CompanyInventors: Kenneth Paul Zarnoch, John Robert Campbell, Amy Rene Freshour, Hua Guo, John Austin Rude, Prameela Susarla, Michael Alan Vallance, Gary William Yeager
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Patent number: 7119360Abstract: Novel pentaphenylenes having the following general formula are described; These polymers generally exhibit blue electroluminescence and are useful in electronic devices.Type: GrantFiled: October 29, 2003Date of Patent: October 10, 2006Assignee: Max-Plank-SocietyInventors: Klaus Mullen, Andrew C. Grimsdale, Josemon Jacob
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Patent number: 7115899Abstract: Novel pentaphenylene copolymers which are useful in electronic devices are described.Type: GrantFiled: October 29, 2003Date of Patent: October 3, 2006Assignee: E. I. du Pont de Nemours and CompanyInventor: Frank P. Uckert
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Patent number: 7115688Abstract: The invention provides a method of preparing nanoparticles having at least one polymer shell attached to them, each polymer shell having a selected property or properties. The method comprises attaching initiation monomers to the surfaces of the nanoparticles, contacting the nanoparticles having the initiation monomers attached to them with a transition metal ring-opening metathesis catalyst to activate the initiation monomers, and contacting the nanoparticles with one or more types of propagation monomers of the formula P—L—N under conditions effective so that the monomers are polymerized to form the one or more polymer shells. In the formula P—L—N, N is a cyclic olefin-containing group, P is a moiety which gives each polymer shell a selected property or properties, and L is a bond or linker. The invention also provides polymers formed by polymerizing the propagation monomers.Type: GrantFiled: November 30, 1999Date of Patent: October 3, 2006Assignee: Nanosphere, Inc.Inventors: Chad A. Mirkin, SonBinh T. Nguyen
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Patent number: 7105258Abstract: There is provided a charge transport material which can easily be coated to form a film, is less likely to be crystallized during or after film formation, has excellent charge transport capability, and high applicability to electronic devices. A charge transport monomer comprising conventional CBP with a specific substituent introduced thereinto is polymerized to prepare a polymer which is brought to a charge transport material comprising this polymer.Type: GrantFiled: November 9, 2004Date of Patent: September 12, 2006Assignees: Dai Nippon Printing Co., Ltd., Takasago International CorporationInventors: Satoshi Suzuki, Masato Okada, Yoshinobu Kashibuchi, Tohru Kobayashi
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Patent number: 7060770Abstract: A composition curable by a metathesis reaction upon mixing its components and comprising an olefin-containing substrate, a metathesis catalyst, and a reaction control agent for slowing the progress of the metathesis reaction. The metathesis catalyst is a ruthenium or osmium curbene complex catalyst, such as one containing an alkylidene ligand with basicity higher than that of tricyclohexylphosphine (PCy3) and a neutral electron donor ligand with a basicity lower than that of PCy3, whereby the catalyst initiates the metathesis reaction of the composition upon mixing with the substrate. The reaction control agent is an organic compound that contains carbon-carbon double and/or triple bonds and one or more Group 14 atoms and is present in an amount effective to slow the progress of the metathesis reaction.Type: GrantFiled: May 6, 2003Date of Patent: June 13, 2006Assignee: Kerr CorporationInventor: Christos Angeletakis
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Patent number: 7060769Abstract: A method of controlled curing by a metathesis reaction upon mixing its components, the method including the step of mixing an olefin-containing substrate, a metathesis catalyst, and a reaction control agent. The metathesis catalyst is a ruthenium or osmium carbene complex catalyst, such as one containing an alkylidene ligand with basicity higher than that of tricyclohexylphosphine (PCy3) and a neutral electron donor ligand with a basicity lower than that of PCy3, whereby the catalyst initiates the metathesis reaction of the composition upon mixing with the substrate. The reaction control agent is effective to slow the progress of the metathesis reaction and prevent its completion in the absence of an elevated temperature. The control agent may be a hydrocarbon containing carbon-carbon double bonds and/or triple bonds, or maybe a modified hydrocarbon with one or more Group 14 or 15 atoms.Type: GrantFiled: May 6, 2003Date of Patent: June 13, 2006Assignee: Kerr CorporationInventor: Christos Angeletakis
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Patent number: 7037994Abstract: Novel compounds acetoxymethylacenaphthylene and hydroxymethylacenaphthyleneare disclosed. A polymer prepared from these novel compounds containing a structural unit of the formula (3), wherein R1 is a hydrogen atom and R2and R3 individually represent a monovalent atom or a monovalent organic group is also disclosed. The polymer is suitable as a component for an antireflection film-forming composition exhibiting a high antireflection effect and not causing intermixing with a resist film.Type: GrantFiled: July 23, 2003Date of Patent: May 2, 2006Assignee: JSR CorporationInventors: Hikaru Sugita, Keiji Konno, Masato Tanaka, Tsutomu Shimokawa
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Patent number: 7037974Abstract: A poly(?-olefin) copolymer obtained from the polymerization of at least one ?-olefin having from 2 to about 20 carbon atoms and at least one bulky olefin, the process comprising polymerizing the monomers in the presence of hydrogen and a catalytically effective amount of a catalyst comprising the product obtained by combining a metallocene procatalyst with a cocatalyst; lubricant compositions comprising such poly(?-olefin) copolymer; and a method for improving the viscosity index of a lubricant composition using such poly(?-olefin) copolymer.Type: GrantFiled: February 4, 2004Date of Patent: May 2, 2006Assignee: Uniroyal Chemical Company, Inc.Inventors: Anthony DiMaio, Thomas P. Matan
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Patent number: 7034095Abstract: A bicyclic conjugated diene polymer obtained by polymerizing a monomer (M) comprising at least one kind of bicyclic conjugated diene monomer represented by formula (I), and a bicyclic conjugated diene copolymer obtained by copolymerizing monomer (M) with at least one kind of unsaturated compound other than said monomer: wherein, R1 to R6 are the same or different and are each hydrogen, halogen, or alkyl or halogenated alkyl of 1 to 20 carbon; n and m are each an integer of from 0 to 10; X1, X2, Y1 and Y2 are the same or different from each other and are each hydrogen, halogen or alkyl or halogenated alkyl of 1 to 20 carbon; and, when m or n is 2 or more, each of mX1's, mX2's, nY1's and nY2's are the same or different.Type: GrantFiled: February 14, 2003Date of Patent: April 25, 2006Assignee: Nippon Petrochemicals Co., Ltd.Inventors: Saisuke Watanabe, Teppei Tsujimoto, Shuichi Tajima
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Patent number: 7033729Abstract: Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused reflection of lower film layer or substrate and reduce standing waves caused by variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF among processes for manufacturing semiconductor device, and its preparation method. Also, the present invention discloses an organic anti-reflective coating composition comprising the light absorbent agent polymer for the organic anti-reflective coating and a pattern formation process using the coating composition.Type: GrantFiled: October 12, 2004Date of Patent: April 25, 2006Assignee: Hynix Semiconductor Inc.Inventors: Jae-chang Jung, Keun Kyu Kong, Seok-kyun Kim
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Patent number: 7022457Abstract: The present invention pertains to photoimaging and the use of photoresists (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The present invention also pertains to novel hydroxy ester-containing polymer compositions that are useful as base resins in resists and potentially in many other applications.Type: GrantFiled: September 24, 2003Date of Patent: April 4, 2006Assignee: E. I. du Pont de Nemours and CompanyInventors: William Brown Farnham, Andrew Edward Feiring, Frank Leonard Schadt, III, Weiming Qiu
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Patent number: 7019093Abstract: The invention is a photoswitchable benzocyclobutene-based polymer that while remaining aqueous developable, avoids the problem of significant moisture uptake. The oligomer or polymer comprises a polymeric backbone, benzocyclobutene reactive groups, and photoswitchable pendant groups. The pendant groups are bonded to the polymeric backbone and are characterized by the presence of a moiety that converts to carboxylic acid upon exposure to activating wavelengths of radiation a carboxylic acid. When the oligomer or polymer is subsequently heated to cause cure of the oligomer or polymer, carbon dioxide is emitted and the group forms a substantially non-polar moiety. The invention is also a method of making such a polymer and a method of forming a patterned film using such a polymer.Type: GrantFiled: October 18, 2002Date of Patent: March 28, 2006Assignee: Dow Global Technologies Inc.Inventors: Ying Hung So, Keith J. Watson, Scott J. Bis
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Patent number: 7005484Abstract: A method for making a polymer or oligomer comprising the steps of making a first monomer comprising a substituted aromatic or heteroaromatic group by providing an aromatic or heteroaromatic group substituted with first and second director groups, performing metalisation at a first position on the aromatic or heteroaromatic group, performing electrophilic substitution so as to provide a first substituent group at the first position, and contacting in a reaction mixture the first monomer with at least two further monomers that independently are the same or different from the first monomer under conditions so as to form a polymer or oligomer, wherein the nature and positions of the first and second director groups regioselect the first position.Type: GrantFiled: July 24, 2000Date of Patent: February 28, 2006Assignee: Cambridge Display Technology LimitedInventors: Andrew B. Holmes, Florence D. Geneste, Rainer E. Martin, Franco Cacialli
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Patent number: 6989426Abstract: The current major way of making nanofibers is electrospinning. However, the minimum fiber diameter is limited to be about 300–500 nm, which is not compliant with the physical definition of nano structures (in the region of 1 to 100 nm). Futher, the productivity is relatively low. This invention provides a method for manufacturing a nano-sized di-block polymer including at least a hard-segment polymer and a soft-segment polymer. First, a sample containing the hard-segment polymer, the soft-segment polymer, and a catalyst is dissolved in a first solvent. Then the dissolved sample is cast on substrate, and then the first solvent to is removed form a dried sample. Finally, the nano-sized di-block polymer is formed by crew-cutting.Type: GrantFiled: June 12, 2003Date of Patent: January 24, 2006Assignee: The Hong Kong Polytechnic UniversityInventors: Jinlian Hu, Subrata Mondal
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Patent number: 6977284Abstract: It is an object of the present invention to provide a polymerizable composition and a cured resin composition, linear expansion coefficients of which are significantly improved without impairment of the excellent properties such as heat resistance, mechanical strength and the like of norbornene-based resins. The present invention is a polymerizable composition, which comprises a polymerizable substance containing a norbornene-based monomer or oligomer as a main component, a metathesis polymerization catalyst and silica powder, the weight content of the silica powder being larger than the weight content of the polymerizable substance.Type: GrantFiled: February 17, 2003Date of Patent: December 20, 2005Assignee: Sekisui Chemical Co., Ltd.Inventors: Takeharu Morita, Nobuhiro Goto, Hiroshi Yoshitani, Hiroshi Hiraike
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Patent number: 6969751Abstract: The present invention relates to a method for preparing homo- and co-polymers having high molecular weights in high yields by polymerizing cyclic olefin compounds using a complex prepared by mixing a nickel salt compound, an organoaluminoxane compound, and at least one fluorine-containing compound.Type: GrantFiled: November 24, 2004Date of Patent: November 29, 2005Assignee: Korea Kumho Petrochemical Co., Ltd.Inventors: Young Chan Jang, Hyun Kyung Sung, Eun Joo Park
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Patent number: 6960398Abstract: A charge transporting material provided by the present invention comprising a compound, a molecular structure of which has at least one repeating unit represented by the following formula (1): wherein, Ar is a non-substituted or substituted arylene group having 6 or more to 60 or less carbon atoms related to a conjugated bond or a non-substituted or substituted heterocyclic group having 4 or more to 60 or less carbon atoms related to a conjugated bond, and wherein, each R may be independently selected from the group consisting of hydrogen atom, alkyl group having 1 to 20 carbon atoms, alkoxyl group having 1 to 20 carbon atoms, alkylthio group having 1 to 20 carbon atoms, alkylsilyl group having 1 to 60 carbon atoms, alkylamino group having 1 to 40 carbon atoms, aryl group having 6 to 60 carbon atoms, aryloxyl group having 6 to 60 carbon atoms, arylalkyl group having 7 to 60 carbon atoms, arylalkoxyl group having 7 to 60 carbon atoms, arylalkenyl group having 8 to 60 carbon atoms, arylamino group having 6Type: GrantFiled: January 15, 2004Date of Patent: November 1, 2005Assignee: Dai Nippon Printing Co., LtdInventors: Junji Kido, Satoshi Suzuki, Kiyoshi Itoh
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Patent number: 6960637Abstract: Polymers comprising repeating units of the formula I: where the variables are defined as follows: a is an integer from 0 to 3, R1, R2, R3 are identical or different and are selected independently from among hydrogen, C1-C20-alkyl, C1-C20-alkyl containing one or more Si, N, P, O or S atoms, C6-C30-aryl, preferably C6-C14-aryl, C4-C14-heteroaryl, —N(C6-C14-aryl)2, and Y1, where Y1 may be identical or different and are selected from among —CH?CH2, trans- or cis-CH?CH—C6H5, acryloyl, methacryloyl, methylstyryl, O—CH?CH2 and glycidyl, where Y2 is selected from among —CH?CH2, trans- or cis- CH?CH—C6H5, acryloyl, methacryloyl, methylstyryl, —O—CH?CH2 and glycidyl, and one or more groups Y1 or Y2 may be crosslinked to one another.Type: GrantFiled: March 4, 2003Date of Patent: November 1, 2005Assignee: BASF AktiengesellschaftInventors: Reinhold Schwalm, Yvonne Heischkel, Horst Weiss