Abstract: A positive-working resist composition comprising: (A1) a resin containing a repeating unit represented by the specific formula, which increases the solubility in an alkali developing solution by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with one of actinic rays and radiation.

Abstract: Disclosed herein is a novel norbornene, acrylate or methacrylate monomer as a photoresist monomer containing an oxepan-2-one group. Further disclosed are photoresist compositions comprising a polymer prepared from the monomer, methods for preparing the photoresist compositions, and methods for forming photoresist patterns using the photoresist compositions.

Abstract: The present application relates to a white, biaxially oriented, flame-retardant, UV-resistant polyester film with at least one base layer which comprises, based on the weight of the base layer, from 2 to 60% by weight of a cycloolefin copolymer (COC), where the glass transition temperature of the COC is within the range from 70 to 270° C. The film also comprises from 0.01 to 5.0% by weight of a UV stabilizer as light stabilizer and also comprises from 0.5 to 30% by weight of flame retardant, based in each case on the weight of the layer comprising the UV stabilizer and/or comprising the flame retardant. The film of the invention is suitable for packing foods or other consumable items which are sensitive to light and/or to air, or for use in industry, e.g. in the production of hot-stamping foils or as a label film, or for image-recording papers, printed sheets or magnetic recording cards.

Abstract: A copolymer has a polystyrene reduced number average molecular weight of 103-108, and includes repeating units represented by formulas (1), (2), and (3), ?—Ar1—??(3) The copolymer has an excellent solubility in an organic solvent, and a high glass transition temperature in good valance. Further, a polymer LED has high performance, such as low-voltage driving and high luminance.

Abstract: The invention relates to metathesis polymers wherein an aromatic group that has UV-light absorbing properties is attached with a bridge group to the polymer. Also disclosed is a polymerizable composition comprising a catalytically effective amount of a penta- or hexavalent ruthenium or osmium carbene catalyst, the process for preparing the metathesis polymer by applying the reaction conditions of Ring Opening Metathesis Polymerization (=ROMP) to the polymerizable composition; and various technical applications of the metathesis polymers.

Abstract: The invention provides a method for converting a less active or slower to initiate system to a higher activity system so that at the end of a polymerization the most active species is present in the system. The invention generally relates to a process for converting a less active or slower to initiate catalyst system to a higher activity catalyst system wherein the process comprises contacting a protected N-heterocyclic carbene with a metathesis catalyst and an olefin in the presence of energy. One of the benefits of the invention is that the amount of catalyst required is less than or lowered in the presence of the protected N-heterocyclic carbene as compared to the amount of catalyst required in the absence of the protected N-heterocyclic carbene. The protected N-heterocyclic carbene can be unsaturated or saturated. In addition, the invention describes novel ruthenium initiators and methods of making the same.

Abstract: A fluorene-based polymer of the following Formula (I) and electroluminescent devices using the same. wherein, R1, R2, R3 and R4 are same or different and represent hydrogen, aliphatic or alicyclic alkyl or alkoxy groups containing 1 to 22 carbon atoms, aryl or aryloxy group containing 6 to 18 carbon atoms, cyano, cyanoethyl, or an alkyl or aryl derivative of silicon, tin or germanium; X represents diacetylene, diethynyl aryl, divinylaryl group or a single bond; and n is an integer equal to or greater than 1.

Abstract: A novel polymer is obtained by copolymerizing a (meth)acrylic acid derivative with a vinyl ether compound, an allyl ether compound and an oxygen-containing alicyclic olefin compound. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.

Abstract: A charge transporting material provided by the present invention comprising a compound, a molecular structure of which has at least one repeating unit represented by the following formula (1): 1

Abstract: A flat plate made of a cycloolefin polymer comprising at least 30% by weight, based on the cyclopolefin polymer, of repeating units (A) having an alicyclic structure. The repeating units (A) comprises at least 30% by weight, based on the repeating units (A), of repeating units (A-i) having no norbornane structure. The cycloolefin polymer has a weight average molecular weight of 5,000 to 50,000. The flat plate is especially useful as a light guide plate.

Abstract: Methods for the addition polymerization of cycloolefins using a cationic Group 10 metal complex and a weakly coordinating anion of the formula: [(R′)zM(L′)x(L″)y]b[WCA]d wherein [(R′)zM(L′)x(L″)y] is a cation complex where M represents a Group 10 transition metal; R′ represents an anionic hydrocarbyl containing ligand; L′ represents a Group 15 neutral electron donor ligand; L″ represents a labile neutral electron donor ligand; x is 1 or 2; and y is 0, 1, 2, or 3; and z is 0 or 1, wherein the sum of x, y, and z is 4; and [WCA] represents a weakly coordinating counteranion complex; and b and d are numbers representing the number of times the cation complex and weakly coordinating counteranion complex are taken to balance the electronic charge on the overall catalyst complex.

Abstract: A ring-opened metathesis copolymer formed by the ring-opening metathesis copolymerization of a cycloolefin monomer having a carboxylic anhydride group selected from bicycloheptene derivatives, tetracyclododecene derivatives and hexacycloheptadecene derivatives with a cycloolefin monomer selected from bicycloheptene derivatives, tetracycloheptene derivatives and hexacycloheptene derivatives; and a hydrogenation product of the copolymer. This copolymer is produced by using a polymerization catalyst comprises an organoruthenium compound having a heterocyclic carbene compound as a ligand. The ring-opened metathesis copolymer and the hydrogenation product thereof have a low dielectric constant, a low water absorption, a high adhesion to metals and a high heat resistance.

Abstract: A method of producing a highly stable packaging substrate in which are provided a first precursor having a first backbone and a first ethynyl group, and a second precursor having a second backbone and a second ethynyl group. Furthermore provided is a crosslinker having a first and a second reactive group. The first precursor, the second precursor, the crosslinker, and a solvent are applied onto a surface to form an electrically insulating layer. The first ethynyl group is reacted with the first reactive group in a first carbon-carbon bond formation reaction and the second ethynyl group is reacted with the second reactive group in a second carbon-carbon bond formation reaction to crosslink the first backbone with the second backbone, thereby forming the packaging substrate. The solvent is removed in a further step.

Abstract: A method for encoding a polymer. The method comprises incorporating, into a polymer formed by polymerizing at least one bulk monomer, from 0.1 ppm to 1% each of at least two additional monomer residues.

Abstract: There are provided a novel norbornene derivative which is a material for a chemically amplifying type photoresist for F2 laser, possesses excellent transparency and improved dry etching resistivity and has a fluorine-containing ketone unit or fluorine-containing tertiary alcohol unit directly bonded to the norbornene backbone; a fluorine-containing polymer obtained by using the norbornene derivative as a copolymerizable monomer; and a chemically amplifying type photoresist composition comprising the fluorine-containing polymer, a photoacid generator and a solvent.

Abstract: A photoresist polymeric compound includes a monomer unit represented by following Formula (I): The polymeric compound may further include at least one of monomer units represented by Formulae (IIa) to (IIg) as described in the specification. The photoresist polymeric compound can exhibit high adhesion to substrates and can highly precisely form fine patterns.

Abstract: A polymer represented by the following formula (1): (Am)p-(Bn)q-(Ck)r  (1) wherein A represents a monomer unit comprising one of a pyrrole, a thiophene, a furan, an indole, a carbazole, a benzothiophene, a dibenzothiophene, a benzofuran, a dibenzofuran, an indolizine, a thienothiophene, a thienopyrrole and an isoindole; B represents a monomer unit comprising one of an imidazole, a pyrazole, a pyridazine, a pyrimidine, a pyrazine, an oxazole, a thiazole, an isooxazole, an isothiazole, a triazole, a tetrazole, an oxadiazole, a thiadiazole, and a condensed ring thereof; C represents a monomer unit having a different structure from the monomer units represented by A and B; m and n each independently represents an integer of 1 or more; k represents an integer of 0 or more; p, q and r each independently denotes a mole fraction (%), p and q represent 1 to 99(%), r represents 0-98(%), the sum of p, q and r is 100(%); and at least one of the monomer units A, B and C comprises as a substituent at least one

Abstract: An adhesive or coating composition prepared by mixing together at least one metathesizable highly-reactive cycloolefin (e.g., a norbornadiene) and a metathesis catalyst. The use of highly-reactive cycloolefins can provide exceptional adherence to a low-surface-tension substrate. Another embodiment is a two-part adhesive or coating system wherein the first part includes at least one first metathesizable material, and the second part includes at least one liquid metathesis oligomer or polymer and a metathesis catalyst.

Abstract: There is provided a fluorine-containing copolymer having an aliphatic monocyclic structure in the polymer trunk chain which has a number average molecular weight of from 500 to 1,000,000 and is represented by the formula (Ma):

Abstract: A refinish basecoat composition includes at least one pigment and an hydroxyl-functional acrylic polymer. The acrylic polymer has a number average molecular weight of at least about 6000 and is polymerized using at least about 45% by weight cycloaliphatic monomer, based on total monomer weight polymerized. A mixer system that can be used to prepare the refinish basecoat has a plurality of color components, each independently including at least one pigment dispersed by the hydroxyl-functional acrylic polymer, and a pigment-free component containing the hydroxyl-functional acrylic polymer.

Abstract: Shape-persistent organic materials, including polymers, with large degrees of interior free volume are described, along with behaviors and phenomena enabled by their unique properties. One class of such a material is built up from triptycene base moieties wherein three benzene rings are bridged together about a [2.2.2] tricyclic ring system. These units can be assembled into discreet molecules and polymers. These materials and/or formulations thereof with liquid crystals or polymers are useful for the complexation of chemicals and/or polymers; they have very low dielectric constants for use as coatings in dielectric circuits, they provide additional ordering mechanisms in liquid crystals, and they display unusual mechanical responses when subjected to electrochemical, chemical, or mechanical stimuli.

Abstract: The present invention relates to a process for preparing copolymer hydrogels with controlled molecular weights and having both thermo- and pH-responsive properties, wherein the process comprises the steps of (a) providing sulfonamide type styrenic or (meth)acrylamide-based monomers exhibiting different pKa values; (b) providing poly(N-isopropylacrylamide) or crosslinked poly(N-isopropylacrylamide-co-methylene bisacrylamide) hydrogels having thermo-responsive properties; and (c) providing several hydrogels exhibiting pH-sensitive properties and random or block copolymerizations of the sulfonamide type styrenic or (meth)acrylamide-based monomers prepared in step (a) with N-isopropylacrylamide and/or methylene bisacrylamide monomers used in step (b) in a polar or non-polar solvent; wherein said steps (b) and (c) are carried out by controlled/living radical polymerization using alkyl halides as the initiators and the transition metals with phosphine or amine ligands as the catalysts.

Abstract: An acetal group containing norbornene-based copolymer useful for a photoresist composition, a method for producing the same, and a photoresist composition containing the same are disclosed. According to the present invention, a copolymer of the present invention has excellent transparency at a wavelength of not more than about 250 nm, excellent resolution, excellent sensitivity, dry etching resistance and excellent adhesion to the substrate.

Abstract: The present invention provides: a novel water-soluble copolymer which is excellent in performance for uses, such as detergent builders, pigment dispersants, and scale inhibitors. In addition, the present invention provides: a novel liquid detergent builder which has extremely excellent compatibility, high transparency when a liquid detergent composition comprises it, and excellent detergency; and a novel liquid detergent composition comprising the liquid detergent builder.

Abstract: Disclosed is an norbornene-based copolymer for photoresist, a preparation method thereof, and a photoresist composition comprising the same. The copolymer of the present invention exhibits high transparency to light of 193 nm wavelength and an excellent etching resistance, excellent resolution due to the remarkable difference between light-exposed part and light-unexposed part in the dissolving rate and excellent adhesion to the substrate due to very hydrophilic diketone group of its own. As a result, the copolymer of the present invention is very useful as ArF exposure photoresist material in the fabrication of semiconductor devices.

Abstract: The invention concerns a monomer of general formula A—(Q—S)p wherein: A=an aromatic or heteroaromatic ring; Q=a carbonaceous or siliceous divalent radical, respectively corresponding to general formulae: (CR1R2)n wherein: R1, R2=H, alkyl, alkenyl comprising between 1 to 4 carbon atoms and n ranges between 4 and 24; and [O—Si(R1R2)]n wherein R1, R2=H, alkyl, alkenyl comprising between 1 and 4 carbon atoms and n ranges between 3 and 24; S=a solvating segment consisting of at least an aliphatic chain comprising at least a polar heteroatom. 1≦p≦6. The invention also concerns the polymer (homopolymer or copolymer) incorporating said monomer, and their use in organic electroluminescent devices.

Abstract: A process for producing a copolymer of an isoolefin and at least one other comonomer comprising the step of polymerizing a reaction mixture comprising an isoolefin, a catalyst and at least one of a cycloconjugated muitiolefin and an unconjugated cyclic olefin in the presence of an activator comprising a carbo cation producing species, a silica cation producing species and mixtures thereof. The process can be practiced using a slurry polymerization approach. One of the main benefits achieved with the present invention is the conversion of the monomers over a shorter period of time and higher percent conversion than when the activator is not used.

Abstract: A pattern formation material of this invention contains a base polymer including a unit represented by Chemical Formula 1 and, and an acid generator: 1

Abstract: The present invention relates to a process for preparing copolymer hydrogels with controlled molecular weights and having both thermo- and pH-responsive properties, wherein the process comprises the steps of (a) providing sulfonamide type styrenic or (meth)acrylamide-based monomers exhibiting different pKa values; (b) providing poly(N-isopropylacrylamide) or crosslinked poly(N-isopropylacrylamide-co-methylene bisacrylamide) hydrogels having thermo-responsive properties; and (c) providing several hydrogels exhibiting pH-sensitive properties and random or block copolymerizations of the sulfonamide type styrenic or (meth)acrylamide-based monomers prepared in step (a) with N-isopropylacrylamide and/or methylene bisacrylamide monomers used in step (b) in a polar or non-polar solvent; wherein said steps (b) and (c) are carried out by controlled/living radical polymerization using alkyl halides as the initiators and the transition metals with phosphine or amine ligands as the catalysts.

Abstract: Process for the catalytic copolymerisation (ROMP) of strained activated cyclic olefins comprising contacting an activated strained mono (poly)cyclic olefin monomer of formula with at least 1 wt % of an activated strained di (poly)cyclic olefin monomer of formula in the presence of a catalyst or an initiating agent wherein the group represents a strained (poly)cyclic olefin, tail Y and spacer X comprise preferably electron withdrawing and property modulating groups whereby the monomers form a copolymer comprising the repeating unit and at least 1 wt % of the unit which is adapted for subsequent cross linking of respective copolymer chains in the presence of heat and catalyst to form an amount of a cross linked copolymer comprising the unit, and polymeric products obtained thereby, novel monomers and intermediates, a method for selecting monomers for reaction a method for the preparation of shaped produc

Abstract: A scaleable and high-yielding method of preparing copolymers that is useful as a component of a radiation sensitive resin composition is provided. The method includes the step of reacting at least one monomer A which is an unsaturated alicyclic monomer and forms a polymer main chain by dissociation of the unsaturated bond, and at least one unsaturated monomer B, which also forms a polymer chain by dissociation of an unsaturated bond, wherein less than two electron-withdrawing groups are directly appended to said unsaturation, and where said monomer B is other than the unsaturated alicyclic monomer and forms a polymer main chain, in the presence of a free radical initiator. The reacting step is carried out in a stoichiometric excess of monomer A as compared to monomer B. By carrying out the reacting step in an excess of monomer A as compared to monomer B, the resultant copolymer will have a greater molar concentration of monomer A than is obtainable using other methods.

Abstract: A photoresist polymeric compound includes a monomer unit represented by following Formula (I): 1

Abstract: A polymer comprising recurring units of formula (1) and/or (2) wherein R1 and R2 are H, C1-15 alkyl, acyl or alkylsulfonyl or C2-15 alkoxycarbonyl or alkoxyalkyl which may have halogen substituents; R3 and R4 are H, C1-15 alkyl or alkoxy or C2-15, alkoxyalkyl which may have halogen substituents, and R3 and R4 may together bond with the carbon atom to form an aliphatic ring, or R3 and R4, taken together, may be an oxygen atom; and k=0 or 1, and having a Mw of 1,000-500,000 is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.

Abstract: A polymer comprising recurring units of formula (1-1) or (1-2) wherein R1 and R2 are H or C1-15 alkyl, R1 and R2, taken together, may form a ring; R3 is H, C1-15 alkyl, acyl or alkylsulfonyl or C2-15 alkoxycarbonyl or alkoxyalkyl which may have halogen substituents, not all R1, R2 and R3 are hydrogen; and k=0 or 1, and having a Mw of 1,000-500,000 is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.

Abstract: Provided are polymers derived from fluoroalkyl norbornenes, fluorinated crotonates, fluorinated allyl alcohols, and combinations of two or more thereof for use in a wide variety of applications, including photoresist compositions. Also provided are methods for producing the fluoroalkyl norbornenes, fluorinated crotonates, and fluorinated allyl alcohols for use in the present polymers.

Abstract: The instant invention relates to an epoxy/alkylation-type hydrocarbon resin alloy comprising an epoxy resin, an alkylation-type hydrocarbon resin, and a curative. The alkylation-type hydrocarbon resin is characterized as a product formed by an alkylation reaction between a cyclic diolefin and aromatic solvent. A particularly effective alkylation-type hydrocarbon resin in this invention is the alkylation resin formed by the reaction of dicyclopentadiene (DCPD) with alkylnaphthalene solvent. The alkylation-type hydrocarbon resin can be readily dissolved into various epoxy resins and easily processed into resin impregnated glass cloth prepreg for ultimate conversion into electronic laminate products. These epoxy/alkylation-type hydrocarbon resin alloys retain high Tg values with minimal increase in thermal expansion.

Abstract: A photorefractive compositions of the present invention includes a copolymer component that provides both photoconductive (charge transport) ability and non-linear optical ability, and optionally sensitizer and plasticizer components. Both of the photoconductive and non-linear optical components are incorporated into the chemical structure of the copolymer itself, typically as side groups. Furthermore, the composition includes a copolymer component that provides photoconductive (charge transport) ability, non-linear optical ability, and plasticizer ability, optionally, sensitizer and plasticizer components.

Abstract: The present invention relates to a white, biaxially oriented polyester film having at least a base layer, the characterizing features of which are that at least this base layer comprises a cycloolefin copolymer (COC) at a concentration of from 4 to 60% by weight, based on the base layer, where the glass transition temperature of cycloolefin copolymer (COC) is within the range from 70 to 270° C.

Abstract: The present invention discloses a polymer having a repeated unit of the formula (II), wherein R1 is H, haloalkyl group or C1-C4 alkyl group; R2 is hydroxyl group, C1-C8 alkoxy group or C1-C8 thioalkyl group; G is (CH2)n, O or S, wherein n is 0, 1, 2, 3 or 4; Rc is a lactone group; and m is 1, 2 or 3. The polymer of the present invention can be used to form the chemical amplified photoresist composition, which can then be applied to general lithography processes, and particularly to the lithography of ArF, KrF or the like light source, and exhibit excellent resolution, figures and photosensitivity.

Abstract: Polymers comprising repeating units of the formula I 1

Abstract: There are provided novel blue light-emitting organic electroluminescent polymers having a main chain consisting of 9,10-diphenylanthracene and vinylene, and electroluminescent devices using the same. With the introduction of substituents which are of high thermal stability and are capable of steric hindrance at the alpha position of the vinyl group, the electroluminescent polymers make it easy to conduct inter- and intra-molecular energy transfer, and the injection and transportation of holes or electrons, as well as restraining &pgr;-stacking between polymer chains. Also, the prevention of intermolecular two- and three-dimensional interference by the introduced bulky substituents leads to reduced extinction of excitons, whereby the organic electroluminescent device can emit blue light at high luminous efficiency.

Abstract: The present invention relates to a copolymer resin for a photoresist used in far ultraviolet ray such as KrF or ArF, process for preparation thereof, and photoresist comprising the same resin. The copolymer resin according to the present invention is easily prepared by conventional radical polymerization due to the introduction of mono-methyl cis-5-norbonen-endo-2,3-dicarboxylate unit to a structure of norbornene-maleic anhydride copolymer for photoresist. The resin has high transparency at 193 nm wavelength, provides increased etching resistance and settles the problem of offensive odor occurred in the course of copolymer resin synthesis. Further, as the resin composition can be easily controlled due to the molecular structure, the resin can be manufactured in a large scale.

Abstract: A copolymer having a polystyrene reduced number average molecular weight of 103-108, and comprising repeating units represented by formulas (1), (2), and (3), 1

Abstract: By blending novel organosiloxane polymers of the invention with a crosslinking agent and a photoacid generator, photo-curable resin compositions are formulated which can be exposed to radiation in a broad wavelength range and readily form a thin film without oxygen attack. From the compositions, fine patterns having improved dry etching resistance can be formed. Cured coatings of the compositions having improved substrate adhesion, heat resistance, and electrical insulation are suitable as a protective film for electric and electronic parts.

Abstract: The invention relates to a method for polymerizing polar substituted norbornenes and/or cycloalkenes, optionally, in the presence of another unsaturated compound. The method is characterized in that the polymerization is carried out in the presence of one or more tungsten carbine complexes and/or molybdenum carbine complexes.

Abstract: Disclosed is an norbornene-based copolymer for photoresist, a preparation method thereof, and a photoresist composition comprising the same. The copolymer of the present invention exhibits high transparency to light of 193 nm wavelength and an excellent etching resistance, excellent resolution due to the remarkable difference between light-exposed part and light-unexposed part in the dissolving rate and excellent adhesion to the substrate due to very hydrophilic diketone group of its own. As a result, the copolymer of the present invention is very useful as ArF exposure photoresist material in the fabrication of semiconductor devices.

Abstract: The present invention relates to a polymer composition comprising one or more cycloolefin copolymers and one or more suitably formulated additives, having improved resistance to stress cracking in air or else in contact with media which give rise to stress cracking.

Abstract: A photoresist polymeric compound includes a monomer unit represented by following Formula (I): The polymeric compound may further include at least one of monomer units represented by Formulae (IIa) to (IIg) as described in the specification. The photoresist polymeric compound can exhibit high adhesion to substrates and can highly precisely form fine patterns.

Abstract: The positive image-forming material comprises a resin including a repeating unit corresponding to a specific monomer having an &agr;-heteromethyl structure.

Abstract: The present invention relates to polymer compositions and methods of polymerizing such compositions. Furthermore, the present invention relates to polymer compositions that are useful in forming waveguides and to methods for making waveguides using such polymer compositions.