Abstract: Dental compositions and disulfide monomers described. The disulfide monomer comprises a disulfide backbone group wherein each of the sulfur atoms are bonded to a group terminating with an ethylenically unsaturated norbornyl group; and at least one other monomer comprising at least two ethylenically unsaturated groups.

Abstract: A compound represented by formula (I): wherein T1 represents a single bond or a C6-C14 aromatic hydrocarbon group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, L2 and L3 each independently represent a single bond or a C1-C6 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, ring W1 and ring W2 each independently represent a C3-C36 hydrocarbon ring, R1 and R2 each independently represent a hydrogen atom, a hydroxyl group, or C1-C6 alkyl group, R3 and R4 each independently represent a hydroxyl group, or C1-C6 alkyl group, R5 represents a hydroxyl group or a methyl group, m represents 0 or 1, and t and u each independently represent an integer of 0 to 2.

Abstract: There are provided a novel compound, a polymeric compound, a resist composition, an acid generator and a method of forming a resist pattern the compound represented by general formula (1-1): wherein each of R1 and R3 independently represents a single bond or a divalent linking group; A represents a divalent linking group; each of R2 and R4 independently represents a hydroxyl group, a hydrocarbon group which may have a substituent, or a group represented by general formula (1-an1), (1-an2) or (1-an3), provided that at least one of R2 and R4 represents a group represented by general formula (1-an1), (1-an2) or (1-an3); and n0 is preferably 0 or 1, and wherein Y1 represents a single bond or —SO2—; R5 represents a linear or branched monovalent hydrocarbon group of 1 to 10 carbon atoms, cyclic monovalent hydrocarbon group of 3 to 20 carbon atoms or monovalent hydrocarbon group of 3 to 20 carbon atoms having a cyclic partial structure which may be substituted with a fluorine atom; and M+ represents an organic ca

Abstract: Embodiments of the invention provide a class of butene/?-olefin block interpolymers. The butene/?-olefin inter-polymers are characterized by an average block index, ABI, which is greater than zero and up to about 1.0 and a molecular weight distribution, Mw/Mn, greater than about 1.3. Preferably, the block index is from about 0.2 to about 1. In addition or alternatively, the block butene/?-olefin interpolymer is characterized by having at least one fraction obtained by Temperature Rising Elution Fractionation (‘TREF’), wherein the fraction has a block index greater than about 0.3 and up to about 1.0 and the butene/?-olefin interpolymer has a molecular weight distribution, Mw/Mn, greater than about 1.4.

Abstract: Disclosed are a photoacid generator, a copolymer, a chemically amplified resist composition, and a method of forming a pattern using the chemically amplified resist composition. The photoacid is connected with a main chain of the copolymer, whereby the photoacid is equally dispersed within a resist layer, and characteristics of line edge roughness of a resist pattern is improved.

Abstract: A resist resin composition includes 100 parts by weight of a copolymer represented by Formula 3 below; 0.5 to 1.5 parts by weight of a photoacid generator and 700 to 1,500 parts by weight of a solvent: wherein R1, R2, and R3 are each independently a C1-30 alkyl group or a C3-30 cycloalkyl group that has or does not have hydrogen, an ether group, an ester group, a carbonyl group, an acetal group, an epoxy group, a nitrile group, or an aldehyde group, R4, R5, and R6 are each independently hydrogen or a methyl group, and l, m, n, and o each independently refer to the number of repeating units in a main backbone and satisfy the conditions: l+m+n+o=1, 0?l/(l+m+n+o)<0.4, 0<m/(l+m+n+o)<0.6, 0?n/(l+m+n+o)<0.6, and 0<o/(l+m+n+o)<0.4.

Abstract: The formation of high-resolution resist patterns by liquid immersion lithography with various fluids is enabled by protecting a resist film from deterioration (such as bridging) during the immersion exposure in a fluid (such as water) and the fluid from deterioration and improving the stability of a resist film in the storage after exposure without increase in the number of treatment steps. A material for forming resist protection films which comprises an alkali-soluble polymer for forming a protective overcoat for a resist film, characterized in that the contact angle of the polymer to water is 90° or above. The polymer is preferably an acrylic polymer which comprises as the essential components constituent units derived from (meth) acrylic acid and constituent units derived from a specific acrylic ester.

Abstract: A vinyl ether compound represented by formula (1-a) or formula (1-b): wherein n represents 0 or 1, and R1 and R2 each independently represent a hydrogen atom, a methyl group, or an ethyl group, provided that a total of the number of carbon atoms of R1 and the number of carbon atoms of R2 is 1 or 2.

Abstract: The present invention provides a 4-methyl-1-pentene/?-olefin copolymer being excellent in lightness, stress absorption, stress relaxation, vibration damping properties, scratch resistance, abrasion resistance, toughness, mechanical properties and flexibility, having no stickiness during molding operation and being excellent in the balance among these properties; a composition comprising the polymer; and uses thereof. The 4-methyl-1-pentene/?-olefin copolymer (A) of the present invention satisfies specific requirements, and comprises 5 to 95 mol % of a structural unit (i) derived from 4-methyl-1-pentene, 5 to 95 mol % of a structural unit (ii) derived from at least one kind of ?-olefin selected from ?-olefins having 2 to 20 carbon atoms excluding 4-methyl-1-pentene and 0 to 10 mol % of a structural unit (iii) derived from a non-conjugated polyene, provided that the total of the structural units (i), (ii), and (iii) is 100 mol %.

Abstract: An isobutylene-based polymer comprising a structural unit represented by the following formula (1): and a structural unit represented by the following formula (2): wherein X represents a divalent group; Y represents a substituted or unsubstituted alicyclic group having an unsaturated bond in the ring; and n represents 0 or 1.

Abstract: Disclosed is a method for purifying a polymer in which a solution containing a cyclic olefin polymer having at least a repeating structural unit [A] represented by the general formula (1) and a metal component is brought into contact with an organic compound having a basic functional group and an acidic functional group, and then the resulting solution is brought into contact with a basic adsorbent to remove the metal component contained in the solution.

Abstract: A polymer comprising a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, X represents a linear or branched chain C1-C6 alkylene group, Z represents a group represented by the formula (Ia): wherein R2 is independently in each occurrence a linear or branched chain C1-C6 alkyl group and m represents an integer of 0 to 15, and a structural unit represented by the formula (II): wherein R3 represents a hydrogen atom or a methyl group, R4 is independently in each occurrence a linear or branched chain C1-C6 alkyl group and n represents an integer of 0 to 4.

Abstract: Optical devices of excellent optical and physical properties produced from cured resins are disclosed. The resins and/or the cured hybrid polymer material made with the resins are characterized by a high level of cycloaliphatic-containing groups. Specific additives that can participate in crosslinking the curable polysiloxane provide additional physical property advantages.

Abstract: Disclosed is an adhesive composition for optical use and, more particularly, an adhesive composition which includes; 30 to 80 wt. % of a mono-functional urethane acrylate oligomer having a weight average molecular weight of 10,000 and 35,000, 10 to 60 wt. % of an acrylate monomer; and 0.1 to 10 wt. % of a free radical photo-initiator, so as to retain physical properties of the adhesive composition such as coating property and adhesiveness and, in addition, reduce incurring of setting shrinkage during photo-polymerization, thereby exhibiting a uniform thickness and excellent surface appearance, durability such as heat resistance and moist heat resistance, and storage elasticity. Moreover, the inventive composition does not contain an alternative solvent, thus enabling manufacturing of a thick film type adhesive film.

Abstract: The present invention provides a copolymer which can prevent problems associated with immersion lithography (including occurrence of a pattern defect such as water mark, and variation in sensitivity or abnormal patterning due to elution of an additive such as a radiation-sensitive acid-generator) and which provides surface characteristics suitable for immersion lithography, and a composition containing the copolymer.

Abstract: Elastomeric interpolymers comprising at least two, or more, cyclic olefin monomers that are prepared by ring opening metathesis polymerization, and that are characterized by having no crystallinity, a glass transition temperature (Tg) of less than ?80° C., and a number average molecular weight (Mn) of at least 40 kg/mole, and functionalized products thereof. A ring opening metathesis polymerization process for producing the elastomeric interpolymers having no crystallinity. Uses of the elastomeric interpolymers in applications such as rubber compounds, tires, and the like. Cores of golf balls that are prepared by using metathesis polymerization produced elastomeric interpolymers having 0 to about 30% crystallinity.

Abstract: Disclosed is a method for producing a norbornene monomer composition, a norbornene polymer produced using the norbornene monomer composition, an optical film including the norbornene polymer, and a method for producing the norbornene polymer. The method includes reacting a reaction solution that contains cyclopentadiene, dicyclopentadiene, or a mixture of cyclopentadiene and dicyclopentadiene, an acetate compound, and a solvent so that a content of an exo isomer is 50 mol % or more. Variables such as a reaction temperature, a reaction time, a molar ratio between reactants, and addition of a solvent are controlled so that the exo isomer is contained in content of 50 mol % or more. Accordingly, it is possible to industrially produce an acetate norbornene addition polymer by using the acetate norbornene monomer composition containing the exo isomer in content of 50 mol % or more.

Abstract: A composition for film formation according to the present invention includes polymerizable compounds each having at least one polymerizable functional group, and the polymerizable compound includes a partial structure containing an adamantane type cage structure and at least one polymerizable reactive group contributing to polymerization reaction in one molecule thereof. Further, the polymerizable reactive group contains an aromatic ring and at least one ethynyl or vinyl group directly bonded to the aromatic ring as the polymerizable functional group, and the number of carbon atoms derived from the aromatic ring is in the range of 15 to 38% with respect to the number of total carbon atoms of the polymerizable compound.

Abstract: Disclosed is an ultraviolet-curable resin composition for multilayer optical discs, which contains (A) dioxane glycol di(meth)acrylate and/or tricyclodecane dimethylol di(meth)acrylate, and (B) a photopolymerization initiator.

Abstract: An isobutylene-based polymer comprising a structural unit represented by the following formula (1): and a structural unit represented by the following formula (2): wherein X represents a divalent group; Y represents a substituted or unsubstituted alicyclic group having an unsaturated bond in the ring; and n represents 0 or 1.

Abstract: There are provided a resist composition, a method of forming a resist pattern using the resist composition, a novel polymeric compound and a compound useful as a monomer for the polymeric compound, the resist composition including a base component (A) that exhibits changed solubility in a developing solution under action of acid and an acid generator component (B) that generates acid upon exposure, wherein the base component (A) contains a resin component (A0) including a structural unit (a0) represented by general formula (a0) shown below [wherein A represents a divalent linking group; and R1 represents a hydrogen atom or a hydrocarbon group of 1 to 6 carbon atoms which may have a substituent.

Abstract: A polymer includes a repeating unit (a-1) shown by a following formula (a-1), a repeating unit (a-2) shown by a following formula (a-2), and a GPC weight average molecular weight of about 1000 to about 100,000, wherein R0 represents an alkyl group having 1 to 5 carbon atoms in which at least one hydrogen atom is substituted by a hydroxyl group, and R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R2 represents an alkyl group having 1 to 4 carbon atoms, and R3 represents an alkyl group having 1 to 4 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 4 to 20 carbon atoms, or a divalent cyclic hydrocarbon group having 4 to 20 carbon atoms formed by R3 and R3 bonding to each other together with a carbon atom.

Abstract: A monomer compound that contains at least one polymerizable functional group per molecule, and at least one bicycloheptyl-, bicycloheptenyl-, or branched (C5-C42)alkyl-polyether radical per molecule, wherein the bicycloheptyl- or bicycloheptenyl-polyether radical may optionally be substituted on one or more of the ring carbon atoms by one or two (C1-C6)alkyl groups per ring carbon atom is useful in making polymers, particularly pH responsive polymers.

Abstract: The present invention relates to a branched copolymer comprising a hydrophilic component obtainable by an addition polymerisation process and compositions and uses thereof said copolymer comprising: i) a residue of at least one monofunctional monomer comprising one polymerisable double bond per molecule and a molecular weight of less than 1000 Daltons; ii) a residue of at least one multifunctional monomer comprising at least two polymerisable double bonds per molecule and a molecular weight of less than 1000 Daltons; and wherein the end termini of the copolymer chains comprise one or more of a residue of a chain transfer agent; an initiator or a terminal group derived from a termination reaction; wherein; the molar ratio of the monofunctional monomer to multifunctional monomer is between 50:1 to 2.

Abstract: The invention provides hetero-functional compound compounds useful in a variety of adhesive applications. More particularly, the invention provides compounds bearing at least one electron rich olefinic bond and at least one electron poor olefinic bond, wherein the two olefinic bonds are separated by a C3 to about C500 aliphatic, cycloaliphatic, or aromatic spacer.

Abstract: Norbornene-based biocidal polymers having primary, secondary or tertiary amine or phosphine end groups, the parent monomers, processes for preparing the monomers and polymers, and their use.

Abstract: Disclosed therein are a cyclic olefin compound, a photoreactive polymer, and an alignment layer comprising the photoreactive polymer, where the cyclic olefin compound can be used to provide the photoreactive polymer having not only excellences in liquid crystal alignment and alignment rate but also readiness for change in the alignment direction depending on the polarization direction.

Abstract: Disclosed therein are a photoreactive polymer, and an alignment layer comprising the same that exhibit excellences in alignment rate and alignment stability. The photoreactive polymer comprises a cyclic olefin-based repeating unit with at least one photoreactive substituent, and the maximum absolute value of a variation in dichloric ratio per unit UV dose as given by d(dichloric ratio)/d(mJ/cm2) upon exposure to a polarized UV radiation having a wavelength of 150 to 450 nm at a total exposure dose of 20 mJ/cm2 or less is at least 0.003.

Abstract: Disclosed therein is a novel cyclic olefin compound having a photoreactive group and a novel photoreactive polymer. The cyclic olefin compound is applicable to various photoreactions, such as of liquid crystal alignment films and can be preferably used as a precursor of different organic compounds or polymers.

Abstract: The invention relates to a process for the preparation of a polymer comprising monomeric units of ethylene, an ?-olefin and a vinyl norbornene applying as a catalyst system: a. a bridged or an group 4 metal containing an unbridged catalyst having a single cyclopentadienyl ligand and a mono substituted nitrogen ligand, wherein said catalyst is defined by the formula (I): b. an aluminoxane activating compound, c. 0-0.20 mol per mol of the catalyst of a further activating compound, wherein Y is a substituted carbon or nitrogen atom. The invention further relates to a polymer obtainable with the process of the invention.

Abstract: A photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group or one of a specified subset of alicyclic hydrocarbon groups, alicyclic hydrocarbon groups, or hydrocarbon groups; R6 is a hydrogen atom or one of a specified subset of hydrocarbon groups or alicyclic hydrocarbon groups; x, y and z are optional values which meet x+y+z=1, 0<x?1, 0?y<1 and 0?z<1. Also disclosed is a resin having a (meth)acrylate unit of an alicyclic lactone structure represented by the formula (3): wherein R8 is a hydrogen atom or a methyl group, and R9 is one of a specified subset of hydrocarbon groups.

Abstract: An anti-settling additive, compositions containing anti-settling additives and methods for use, the additive containing a monomer or polymer compound that contains at least one polymerizable functional group per molecule, and at least one bicycloheptyl-, bicycloheptenyl-, or branched (C5-C42)alkyl-polyether radical per molecule, wherein the bicycloheptyl- or bicycloheptenyl-polyether radical may optionally be substituted on one or more of the ring carbon atoms by one or two (C1-C6)alkyl groups per ring carbon atom is useful in making polymers.

Abstract: The present invention relates to a (meth)acrylate polymer for preparing a coating composition, where the (meth)acrylate polymer comprises 0.5% to 20% by weight of units derived from (meth)acrylic monomers which in the alkyl radical have at least one double bond and 8 to 40 carbon atoms, 0.1% to 60% by weight of units derived from hydroxyl-containing monomers which have up to 9 carbon atoms, 0.1% to 95% by weight of units derived from (meth)acrylates having 1 to 12 carbon atoms in the alkyl radical, and 0.1% to 60% by weight of units derived from styrene monomers, based in each case on the weight of the (meth)acrylate polymer, and the (meth)acrylate polymer has a weight-average molecular weight in the range from 2000 to 60 000 g/mol. The present invention further relates to a coating composition and to a method of producing a coating. The present invention describes, furthermore, a coated article comprising a coating obtainable by the method.

Abstract: Curable compositions are disclosed. Also disclosed are optical media comprising said curable compositions when cured and methods of making such optical media.

Abstract: Provided are an adamantane derivative represented by the following formula (1), a method for producing the same, a polymer containing an acrylate compound having the adamantane structure represented by formula (1) in a repeat unit, and a functional resin composition which contains the polymer, has excellent alkali developability and substrate adhesiveness, and can improve the resolution and the line edge roughness as a chemically amplified resist sensitive to far-ultraviolet rays represented by KrF excimer laser light, ArF excimer laser light, F2 excimer laser light or EUV without spoiling fundamental properties thereof as a resist such as pattern forming properties, dry etching resistance, heat resistance and the like.

Abstract: A reverse dispersion retardation film, formed by stretching a film comprising a norbornene-based ring-opening copolymer containing a structural unit (A) represented by the following general formula (1): [in the formula (1), m represents an integer of any one of 0 and 1, R1 represents a hydrogen atom or the like, X1 represents a group represented by a formula: —CH2CH2— or the like, a and b each independently represent an integer of 0 to 6, Y represents a methylene group or the like, and represents a methylene group or the like] and a structural unit (B) represented by the following general formula (2): [in the formula (2), n represents an integer of any one of 0 and 1, X2 represents a group represented by a formula: —CH2CH2— or the like, R2, R3, R4, and R5 each represent a hydrogen atom or the like, wavy lines d and e each represent a configuration of any one of an endo and an exo, and a wavy line f represents a configuration of any one of an endo and an exo], wherein a total amount of the structural u

Abstract: A polymerizable composition suitable as an electric material and the like used in an electric circuit board, which comprises a norbornene monomer, a metathesis polymerization catalyst, and a chain transfer agent composed of a compound represented by formula (A): CH2?CH—Y—OCO—CR1?CH2 wherein Y represents a divalent hydrocarbon group having 3 to 20 carbon atoms, and R1 represents a hydrogen atom or a methyl group. By further comprising a crosslinking agent in the polymerizable composition, obtaining a crosslinkable resin by carrying out bulk polymerization, and crosslinking the crosslinkable resin to obtain a molded article and a crosslinked resin composite having excellent characteristics such as electric insulation, adhesion, mechanical strength, heat resistance, dielectric properties and the like.

Abstract: A polymer is obtained from a hydroxyphenyl methacrylate monomer having an acid labile group substituted thereon. A positive resist composition comprising the polymer as a base resin has a very high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good profile and minimal line edge roughness of a pattern after exposure, a retarded acid diffusion rate, and good etching resistance.

Abstract: Provided are a resin composition containing a (meth)acrylate compound (A) having a specific structure and a rigid moiety, and a (meth)acrylate compound (B) having a flexible moiety; a resin composition further containing a silane-based (meth)acrylate compound (C-1), an antioxidant (C-2) or an aliphatic compound (C-3) having a specific structure; and an optical component. A resin for an optical component can be produced from those resin compositions, the resin having excellent transparency, causing no cracks, being stable against heat without causing yellowing, and having a low coefficient of thermal expansion, a low water content, excellent shape stability, with excellent mold releasability, and excellent adhesiveness with a coating material that suppresses surface reflection and improves transmittance.

Abstract: Carboxyl-containing lactone compounds having formula (1) are novel wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are H or monovalent hydrocarbon groups, or R2 and R3 may together form an aliphatic ring, W is CH2, O or S, k1 is an integer of 0 to 4, and k2 is 0 or 1. They are useful as monomers to produce polymers which are transparent to radiation?500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent properties including resolution, LER, pattern density dependency and exposure margin.

Abstract: A hydrogenated crystalline norbornene ring-opening polymer is obtained by hydrogenating 80% or more of carbon-carbon double bonds of a ring-opening polymer that is obtained by ring-opening polymerization of norbornene monomers including 90 to 100 wt % of 2-norbornene and 0 to 10 wt % of a 2-norbornene derivative having a substituent which does not include an aliphatic carbon-carbon double bond in the presence of a branching agent, the hydrogenated crystalline norbornene ring-opening polymer having a melting point of 110 to 145° C. and a branching index of 0.3 to 0.98, and a molded article is obtained by molding the hydrogenated crystalline norbornene ring-opening polymer. The hydrogenated crystalline norbornene ring-opening polymer has excellent industrial productivity, and the molded article has excellent productivity and moisture resistance.

Abstract: A topcoat material for application on top of a photoresist material is disclosed. The topcoat material comprises an acid-inert compound. The topcoat material also comprises a polymer or an oligomer or a cage structure which shows negligible intermixing with the imaging layer and is soluble in aqueous base developer. A method of forming a patterned material layer on a substrate and a coated substrate comprising the topcoat material is also disclosed.

Abstract: The invention provides a process of polymerizing ethylene and at least one ?-olefin, said process comprises polymerizing the ethylene and the at least one ?-olefin in the presence of 5-ethylidene-2-norbornene, which comprises low levels of impurities, as determined by the absorbances at the following wavelengths: 320 nm and 343 nm. The invention also provides a method of increasing the catalysts efficiency, and a method of determining the expected catalyst efficiency, each in a polymerization of ethylene and at least one ?-olefin in the presence of the 5-ethylidene-2-norbornene, which comprises low levels of impurities, as determined by the absorbances at the above wavelengths. The invention further provides a method of purifying 5-ethylidene-2-norbornene to form a purified 5-ethylidene-2-norbornene, which comprises low levels of impurities, as determined by the absorbances of the above wavelengths.

Abstract: A film comprising a norbornene (NB) compound addition polymer that is excellent in chemical resistance, optical properties and the like, has a high Tg, a low water absorption ratio and a low linear expansion coefficient, and is soluble in an ordinary solvent. The film comprising a NB compound addition polymer essentially consisting of repeating units derived from NB compound monomers, wherein the addition polymer has a specific Mw and has a sum of the units (A1) and (A2) of 70% by mol or more based on the total units, wherein the molar number of each unit satisfies the following equations: 70/30?[{(A1)+(A2)}/(B)]?100 and 10/90?(A1)/(A2)?98/2, or the addition polymer has a specific Mw and Mn and essentially consists of the units (A1) and (B), wherein the molar number of each unit satisfies the following equation: 70/30?[(A1)/(B)] ?98/2.

Abstract: Provided are a resin for an optical component, which has heat resistance, does not suffer from yellowing because of its stability against heat, and is excellent in transparency and workability; a raw material composition used for the resin for an optical component; and an optical component. Specifically, provided is a resin for an optical component containing a (meth)acrylate compound unit (A1), in which a hydrocarbon group containing an adamantane structure is ester-bonded, and a (meth)acrylate compound unit (B1) having a polyfunctional group, which is other than the unit (A1). Also, provided is a raw material composition used for a resin for an optical component, which contains a (meth)acrylate compound (A2) in which a hydrocarbon group containing an adamantane structure is ester-bonded, and a (meth)acrylate compound (B2) having a polyfunctional group, which is other than the compound (A2). Further, provided is an optical component which is obtained by polymerizing and molding the raw material composition.

Abstract: The present invention relates to a norbornene polymer that comprises a norbornene monomer having a photoreactive functional group, and a method of manufacturing the same. The norbornene polymer comprises at least 50 mol % of exo isomers among the norbornene monomers having the photoreactive functional group. Since the norbornene polymer according to the present invention comprises at least 50 mol % of exo isomers among the norbornene monomers having the photoreactive functional group, a molecular weight is significantly increased while the yield is not reduced during the manufacturing of the polymer. In views of the three dimensional structure, stability is ensured because the polymer has a planar structure in which the photoreactive groups between the molecules are close to each other. Therefore, the distance between the photoreactive groups is reduced, thus increasing the photoreaction rate.

Abstract: The present invention provides a polymer containing a structural unit represented by the formula (Ia) or (Ib): wherein R1, R2, R3, n, Z1, R4, R5 and m are defined in the specification, a structural unit represented by the formula (II): wherein R6, R7, R8, R9, Z2, n? and Z? are defined in the specification, and a structural unit represented by the formula (III): wherein R10, R11, 1? and Z3 are defined in the specification.

Abstract: An organic insulating material includes a prepolymer of a cage structure compound having a polymerizable unsaturated bond-containing group and a cage structure with an adamantane structure as the minimal unit. The prepolymer has a number-average molecular weight of between 2,000 and 500,000 based on polystyrene and measured by gel permeation chromatography. The prepolymer includes unsaturated bonds produced by reaction between the polymerizable unsaturated bonds and the unreacted polymerizable unsaturated bonds. The prepolymer has a residue rate of unreacted polymerizable unsaturated bonds of between 20% and 80%.

Abstract: Provided are apparatus and methods relating to the finishing line of a continuous solution polymerization plant. In one aspect, an apparatus includes a pelletizer having cooling liquid, e.g., water or aqueous solution, into which is added a pelletization aid. In another aspect, the apparatus comprises means to remove residual polymer particles from the pelletizer cooling liquid. In a further aspect, the apparatus comprises conduits of at least 50 m in length for carrying propellant cooling liquid from the pelletizer to a drying apparatus. The residence time of the pellets in the cooling liquid may be 10 seconds or more. In a further aspect, a drying apparatus is provided for the pellets which comprises first and second drying zones. In a further aspect, a pneumatic conveyor is provided for carrying pellets to a packaging apparatus. In a further aspect, a packaging apparatus is provided comprising a blender silo.

Abstract: The invention provides a copolymer rubber excellent in processability in kneading and processability in extrusion; rubber compositions containing the rubber; and crosslinked moldings of the compositions excellent in sealing properties and shape retention. A random copolymer rubber of ethylene (A), a C3-20 ?-olefin (B) and a nonconjugated polyene (C) which satisfies the following requirements (1) to (5): (1) the structural units (A) and (B) are contained at an (A)/(B) molar ratio of 40/60 to 95/5, (2) the structural unit (C) content is 0.01 to 5% by mole, (3) the limiting viscosity [?] is 1.0 to 5.0 dl/g as determined in decahydronaphthalene at 135°., (4) the Mw/Mn is 1 to 8, and (5) the P value is 0.46 to 1.00 as defined by formula (1): P=Ln(limiting viscosity [?])?5.0×105×?*(10) (1) (wherein Ln is a natural logarithm; and ?*(10) is viscosity (Pa·sec) as determined at 190° C. and at 10 rad/sec.