Abstract: A polymer includes a repeating unit shown by a general formula (1) in which R1 represents a hydrogen atom or a methyl group, R2 represents a substituted or unsubstituted linear or branched monovalent alkyl group having 1 to 20 carbon atoms, an alicyclic group having 3 to 25 carbon atoms, or an aryl group having 6 to 22 carbon atoms, and X represents a substituted or unsubstituted methylene group or a substituted or unsubstituted linear, branched or alicyclic hydrocarbon group having 2 to 25 carbon atoms. The polymer has a polystyrene-reduced weight average molecular weight determined by gel permeation chromatography (GPC) of 3000 to 100,000.

Abstract: The invention provides a composition comprising an ethylene/?-olefin/non-conjugated diene interpolymer, which has the following properties: an Mz(abs)/Mz(Conv) value greater than 1.35; an Mz(BB)/Mw(abs) value greater than 1.6; and a non-conjugated diene content less than 10 weight percent, based on the total weight of the interpolymer. The invention also provides a process for forming a crosslinked composition, said process comprising: (a) forming a polymeric admixture comprising at least the following: (A) an ethylene/?-olefin/non-conjugated diene copolymer rubber (B) which has the following properties: an Mz(abs)/Mz(Conv) value less than 1.3; an Mz(BB)/Mw(abs) value greater than 1.6, but less than 2.5; and an Mw(abs) value less than 350,000 g/mole; and (B) a coupling amount of (i) at least one poly(sulfonyl azide) or (ii) at least one peroxide; and (b) heating the resulting admixture to a temperature at least the decomposition temperature of the crosslinking agent.

Abstract: A polymerizable composition is obtained by mixing a metathesis polymerization catalyst including benzylidene(1,3-dimethyl-4-imidazolidin-2-ylidene)(tricyclohexylphosphine)ruthenium dichloride, a cycloolefin monomer such as 2-norbornene or tetracyclo[6.2.1.13,6.02,7]dodec-4-ene, a chain transfer agent such as allyl methacrylate, and hollow particles such as Shirasu balloons. A crosslinkable resin composite is obtained by coating or impregnating the polymerizable composition onto or into a support medium, and carrying out bulk polymerization of the polymerizable composition. A crosslinked resin composite is obtained by crosslinking the crosslinkable resin composite.

Abstract: The present invention relates to a novel cyclic olefin compound, a polymer including the cyclic olefin compound, a liquid crystal alignment film including the polymer, and a liquid crystal display device including the liquid crystal alignment film. Since the polymer includes the cyclic olefin compound as a main chain, the thermal stability is excellent and the photoreactive speed is high. Accordingly, the production time can be reduced, the production cost can be reduced, and the anchoring force of the liquid crystal can be increased because the alignment property is stabilized due to the curing.

Abstract: The present invention provides hydrogenated ?-pinene-based polymers with excellent heat resistance and light resistance, low absorptivity and high transparency, as well as molded articles thereof. The polymers of the present invention contain 50% by mass or more of ?-pinene units and are hydrogenated ?-pinene-based polymers where the ratio of the proton integral value at 6 to 8 ppm to the total proton integral value in a 1H-NMR spectrum is 2.3×10?5 or less or the p-phenylene group content is 0.0055% by mass or less, and the ratio of the proton integral value at 4.5 to 6 ppm to the total proton integral value is 2.8×10?4 or less or the cyclohexene-1,4-diyl group content is 0.29% by mass or less. The molded articles of the present invention contain the above hydrogenated ?-pinene-based polymers.

Abstract: Copolymers prepared by copolymerization of at least one fluorinated vinyl ether are provided. In one embodiment, the at least one fluorinated vinyl ether comprises ethylene directly substituted at an olefinic carbon atom with a moiety —OR* and optionally substituted with one, two, or three additional nonhydrogen substituents, wherein R* comprises a fluorinated alkyl moiety substituted with a protected or unprotected hydroxyl group, and further wherein an atom within R* may be (i) taken together with one of the additional nonhydrogen substituents, if present, or (ii) directly bound to an olefinic carbon atom, to form a ring. The polymers are useful, for example, in lithographic photoresist compositions, particularly chemical amplification resists. In a preferred embodiment, the polymers are substantially transparent to deep ultraviolet (DUV) radiation, and are thus useful in DUV lithographic photoresist compositions.

Abstract: Higher diamondoid derivatives capable of taking part in polymerization reactions are disclosed as well as intermediates to these derivatives, polymers formed from these derivatives and methods for preparing the polymers.

Abstract: A cycloolefin-based copolymer and a hydrogenation process are disclosed, wherein the cycloolefin-based copolymer is prepared by using: a monomer which can be easily and economically obtained by hydrogenating dicyclopentadiene that occupies much of C5 fractions from naphtha cracking; or a monomer which can be obtained by chemically bonding three molecules of cyclopentadiene via Diels-Alder reactions and then hydrogenating the cyclopentadiene. The copolymer can be used in various fields as an amorphous transparent resin.

Abstract: A resin comprises a structural unit derived from a compound represented by the formula (I); wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that optionally has one or more halogen atoms; X1 represents a C2 to C36 heterocyclic group, one or more hydrogen atoms contained in the heterocyclic group may be replaced by a halogen atom, a hydroxy group, a C1 to C24 hydrocarbon group, a C1 to C12 alkoxyl group, a C2 to C4 acyl group, or a C2 to C4 acyloxy group, and one or more —CH2— contained in the heterocyclic group may be replaced by —CO— or —O—.

Abstract: A compound of the present invention is represented by the formula (A); wherein R1 represents a hydrogen atom or a C1 to C6 alkyl group; Z1 represents a single bond, —CO—O—* or —CO—O—(CH2)k—CO—O—*; Z2 represents a single bond, *—O—CO—, *—CO—O—, *—O—(CH2)k—CO—, *—CO—(CH2)k—O—, *—O—(CH2)k—CO—O—, *—O—CO—(CH2)k—O— or *—O—CO—(CH2)k—O—CO—; k represents an integer of 1 to 6; * represents a binding position to W; W represents a C4 to C36 (n+1) valent alicyclic hydrocarbon group or a C6 to C18 (n+1) valent aromatic hydrocarbon group, one or more hydrogen atoms contained in the alicyclic hydrocarbon group and the aromatic hydrocarbon group may be replaced by a halogen atom, a C1 to C12 alkyl group, a C1 to C12 alkoxy group, a C2 to C4 acyl group or —OR10; R10 represents a hydrogen atom or a group represented by the formula (R2-2); R2 represents a hydrogen atom, a group represented by the formula (R2-1) or (R2-2); n represents an integer of 1 to 3; R4, R5 and R6 independently represent a C1 to C12 hydrocarbon group

Abstract: A method of polymerizing poly(cyclic)olefin monomers encompassing (a) combining a monomer composition containing the poly(cyclic)olefin monomers, a non-olefinic chain transfer agent and an activator compound to faun a mixture; (b) heating the mixture; and (c) adding a polymerization catalyst containing Ni and/or Pd. The non-olefinic chain transfer agent includes one or more compounds selected from H2, alkylsilanes, alkylalkoxysilanes, alkylgermanes, alkylalkoxygermanes, alkylstannanes, and alkylalkoxystannanes. The activator is characterized as having an active hydrogen with a pKa of at least 5. The resulting poly(cyclic)olefin polymers can be used in photoresist compositions.

Abstract: The present invention provides a method for preparation of an 1-alkene-acrylate based copolymer comprising a step of a radical polymerization reaction of 1-alkene and acrylate based monomer under presence of a metal oxide or Lewis acid, and a method for preparation of an alkene-acrylate based copolymer comprising reacting alkene with an acrylate based monomer under presence of a metal oxide. In the method of preparation according to the present invention, the process is simple and properties of the copolymer can be easily controlled by preparing the copolymer in a mild condition of 100° C. or less and 200 bar or less. In addition, the amount of the polar group of the copolymer prepared by the method is so high that the copolymer can be used for transparent optical products.

Abstract: Lactone-containing compounds having formula (1) are novel wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are H or monovalent hydrocarbon groups, or R2 and R3 may together form an aliphatic hydrocarbon ring, R4 is H or CO2R5, R5 is a monovalent hydrocarbon group, W is CH2, O or S, and k1 is 3, 4 or 5. They are useful as monomers to produce polymers which are transparent to radiation ?500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent properties including resolution, LER, pattern density dependency and exposure margin.

Abstract: An adamantane derivative capable of affording a cured product which is excellent in optical characteristics such as transparency and light resistance, durability such as long-term heat resistance, and electrical characteristics such as dielectric constant, a process for producing such an adamantane derivative, and a curable composition containing such an adamantane derivative, the adamantane derivative being represented by the general formula (I) shown below and having a group selected from an acrylate group, a methacrylate group and a trifluoromethacrylate group, where R1 represents a group selected from a hydroxyl group, an acrylate group, a methacrylate group and a trifluoromethacrylate group, R2 represents a group selected from a hydrogen atom, a methyl group and a trifluoromethyl group, k is an integer of 0 to 4 and n is an integer of 1 to 6.

Abstract: A catalyst system capable of producing a cyclic olefin polymer having a polar functional group and a high molecular weight with a high yield in which a catalyst is not deactivated due to polar functional groups of monomers, and a method of producing polymers using the same are provided. The catalyst system for polymerization of olefin according to the present invention has good thermal and chemical stability, and thus, in the method of preparing polyolefin using the catalyst system, the deactivation of a catalyst due to a polar functional group of the monomer can be prevented, and thus a high yield of the cyclic olefin polymer with a high molecular weight can be obtained when a ratio of the catalyst to the monomer is 1:5000, and the removal of a catalyst residue is not required.

Abstract: Provided are a photoreactive polymer that includes a multi-cyclicmulticyclic compound at as its main chain and a method of preparing the same. The photoreactive polymer exhibits excellent thermal stability since it includes a multi-cyclicmulticyclic compound having a high glass transition temperature at as its main chain. In addition, the photoreactive polymer has a relatively large vacancy so that a photoreactive group can move relatively freely in the main chain therein. As a result, a slow photoreaction rate, which is a disadvantage of a conventional polymer material used to form an alignment layer for a liquid crystal display device, can be overcome.

Abstract: Disclosed is a method for preparing a cycloolefin polymer containing polar functional groups, comprising: preparing a catalyst mixture including i) a precatalyst, containing a Group 10 transition metal having a ligand containing oxygen ions bonded to the metal; ii) a first cocatalyst which is an organic compound containing a Group 15 element; and iii) a second cocatalyst which is capable of providing an anion and weakly coordinating to the metal of the precatalyst; and subjecting a monomer solution comprising a norbornene-based compound containing a polar functional group to an addition polymerization reaction in the presence of an organic solvent and the catalyst mixture, at a temperature of 80-200° C., the total amount of the organic solvent being 50-800% by weight based on the total weight of the monomer contained in the monomer solution, and the product yield of the polymer being 50% by weight or more based on the total weight of the monomer.

Abstract: Disclosed is a method for preparing a cycloolefin polymer containing polar functional groups, comprising the steps of: a) preparing a catalyst mixture including i) a precatalyst; ii) a first cocatalyst; and iii) a second cocatalyst; and b) subjecting a monomer solution comprising a norbornene-based compound containing a polar functional group to an addition polymerization reaction in the presence of an organic solvent and the catalyst mixture, wherein the product yield of the prepared polymer is 50% by weight or more based on the total weight of the monomer.

Abstract: It relates to a norbornene-based polymer having low dielectric constant which is thus suitable for a low loss dielectric material, an insulating material using the same, an embedded printed circuit board and a functional device, in which the norbornene-based polymer includes at least one repeat unit of formula 1: wherein, at least one of R1 to R4 may be independently selected from the group consisting of hydrogen, in which R5, R6 and R7 are each independently selected from the group consisting of hydrogen, substituted or unsubstituted C1-C6 alkyl, C1-C6 alkyl substituted with an aliphatic bicyclo or multicyclo compound, substituted or unsubstituted C2-C6 alkenyl and substituted or unsubstituted C4-C31 arylalkyl, L is C1-C3 alkyl.

Abstract: The present invention relates to a polymeric compound comprising, as structural units, groups each represented by the following general formula (1); and an insulating film for a semiconductor integrated circuit which comprises the polymeric compound: —R1—C?C—C?C—, wherein R1 represents a group having a cage-shaped structure. The insulating film has a high heat resistance, a high mechanical strength and a low dielectric constant. In addition, the insulating film has a high stability of its dielectric constant with the elapse of time. Furthermore, the present invention can provide an interlayer insulating film for electronic devices having a high heat resistance, a high mechanical strength and a low dielectric constant which can be maintained over an extremely long period of time as well as an electronic device whose layer structure is provided with such an insulating film as a constituent thereof.

Abstract: According to one embodiment, an ultraviolet-curable resin material to be used contains a monomer represented by formula (1) presented earlier, a resin stamper is used as a stamper, and the surface of a magnetic recording layer and the three-dimensional pattern surface of the resin stamper are contacted in a vacuum.

Abstract: A polymer and composition useful in forming an insulating film provided with a low permittivity, a high heat resistance, and a high mechanical strength and an insulating film obtained from these and an electronic device having the same are provided. The polymer for forming an insulating film according to the present invention is characterized by being obtained by polymerizing a reactive compound represented by Formula (1). The insulating film according to the present invention is formed using a composition for forming an insulating film including that polymer, has molecular spaces having an average space size of 0.7 nm to 5 nm, and has a permittivity of 2.3 or less. The electronic device according to the present invention has the insulating film.

Abstract: Disclosed is a method for preparing a cycloolefin polymer containing polar functional groups, comprising: preparing a catalyst mixture including i) a precatalyst, containing a Group 10 transition metal having a ligand containing oxygen ions bonded to the metal; ii) a first cocatalyst which is an organic compound containing a Group 15 element; and iii) a second cocatalyst which is capable of providing an anion and weakly coordinating to the metal of the precatalyst; and subjecting a monomer solution comprising a norbornene-based compound containing a polar functional group to an addition polymerization reaction in the presence of an organic solvent and the catalyst mixture, at a temperature of 80-200° C., the total amount of the organic solvent being 50-800% by weight based on the total weight of the monomer contained in the monomer solution, and the product yield of the polymer being 50% by weight or more based on the total weight of the monomer.

Abstract: A polymer is provided comprising recurring units having formulas (1), (2), (3), (4), (5), and (6) in amounts of 1-60 mol % (1), 1-60 mol % (2), 1-50 mol % (3), 0-60 mol % (4), 0-30 mol % (5), and 0-30 mol % (6), and having a Mw of 3,000-30,000 and a Mw/Mn of 1.5-2.5. R1, R3, R4, R7, R9, and R11 are H or CH3, Y is methylene or O, R2 is CO2R10 when Y is methylene and R2 is H or CO2R10 when Y is O, R10 is C1-C15 alkyl which may be separated by O, R5 and R6 are H or OH, R8 is a tertiary ester type acid-labile protective group, and R12 is OH-containing fluoroalkyl. A resist composition comprising the polymer has a high resolution and is improved in line edge roughness and I/G bias.

Abstract: The present invention relates to a polymer resin compound including a new polycyclic compound, and a photosensitive resin composition including the polymer resin compound as an effective binder matrix. In particular, the photosensitive resin composition according to the present invention uses a polymer resin compound, which includes a compound having double cyclic structure in one molecule as a monomer, as a binder matrix. Accordingly, the photosensitive resin composition has an excellent photosensitivity and an excellent developing property, and has a low distortion property during plastic processing. For this reason, the photosensitive resin composition has an advantage of curing various transparent photosensitive materials used to manufacture a color filter of a liquid crystal display, for example, a column spacer, an overcoat, a passivation material, and the like.

Abstract: A method of polymerizing poly(cyclic)olefin monomers encompassing (a) combining a monomer composition containing the poly(cyclic)olefin monomers, a non-olefinic chain transfer agent and an activator compound to form a mixture; (b) heating the mixture; and (c) adding a polymerization catalyst containing Ni and/or Pd. The non-olefinic chain transfer agent includes one or more compounds selected from H2, alkylsilanes, alkylalkoxysilanes, alkylgermanes, alkylalkoxygermanes, alkylstannanes, and alkylalkoxystannanes. The activator is characterized as having an active hydrogen with a pKa of at least 5. The resulting poly(cyclic)olefin polymers can be used in photoresist compositions.

Abstract: A copolymer contains 10 to 69 mol % of a structural unit derived from propylene, 1 to 50 mol % of a structural unit derived from at least one ?-olefin having a carbon number of from 4 to 20 and 30 to 89 mol % of a structural unit derived from at least one cyclic olefin represented by the formula (1) as defined herein, and has a weight average molecular weight of from 50,000 to 1,000,000.

Abstract: A catalyst system capable of producing a cyclic olefin polymer having a polar functional group and a high molecular weight with a high yield in which a catalyst is not deactivated due to polar functional groups of monomers, and a method of producing polymers using the same are provided. The catalyst system for polymerization of olefin according to the present invention has good thermal and chemical stability, and thus, in the method of preparing polyolefin using the catalyst system, the deactivation of a catalyst due to a polar functional group of the monomer can be prevented, and thus a high yield of the cyclic olefin polymer with a high molecular weight can be obtained when a ratio of the catalyst to the monomer is 1:5000, and the removal of a catalyst residue is not required.

Abstract: The invention provides useful organic insulating materials exhibiting low permittivity, high heat resistance and high mechanical strength, as well as resin films and semiconductor devices employing them. The organic insulating materials of the invention comprise prepolymers of adamantane structure compounds having polymerizable unsaturated bond-containing groups. The prepolymers have number-average molecular weights of between 2,000 and 500,000 based on polystyrene, as measured by gel permeation chromatography. The polymerizable unsaturated bond-containing groups are preferably groups that contain carbon-carbon triple bonds. The resin films of the invention are obtained by crosslinking reaction of the organic insulating materials or varnishes for resin film containing them, by heating and/or active irradiation, and condensation reaction.

Abstract: There are provided organic insulating materials exhibiting low permittivity, high heat resistance and high mechanical strength, as well as organic insulating films with low permittivity, high heat resistance and high mechanical strength that employ the same, and semiconductor devices comprising the foregoing. An organic insulating material comprising a compound represented by general formula (1), or a polymer obtained by polymerizing a compound represented by general formula (1), or a mixture of a compound represented by general formula (1) and the polymer. X-V?W?nY??(1) (In formula (1), X and Y each independently represent one or more groups with polymerizable functional groups. V and W each represent a group having an adamantane or polyamantane structure, and they may be the same or different. The letter n represents an integer of 0 or greater).

Abstract: The invention provides a process of polymerizing ethylene and at least one ?-olefin, said process comprises polymerizing the ethylene and the at least one ?-olefin in the presence of 5-ethylidene-2-norbornene, which comprises low levels of impurities, as determined by the absorbances at the following wavelengths: 320 nm and 343 nm. The invention also provides a method of increasing the catalysts efficiency, and a method of determining the expected catalyst efficiency, each in a polymerization of ethylene and at least one ?-olefin in the presence of the 5-ethylidene-2-norbornene, which comprises low levels of impurities, as determined by the absorbances at the above wavelengths. The invention further provides a method of purifying 5-ethylidene-2-norbornene to form a purified 5-ethylidene-2-norbornene, which comprises low levels of impurities, as determined by the absorbances of the above wavelengths.

Abstract: The present invention provides method of preparing alkene-acrylate-norbornene terpolymer by polymerization of a monomer mixture consisting of alkene, acrylate and norbornene by a radical initiator under the presence of a Lewis acid. In the method of preparing the alkene-acrylate-norbornene terpolymer of the present invention, the terpolymer may be prepared in the mild condition of low temperature and low pressure by using the Lewis acid so that the process is simple and the property of the terpolymer may be easily controlled. In addition, the terpolymer prepared by the method includes the ethylene and the norbornene simultaneously so that it has high glass transition temperature, and the brittle property in forming of film is improved.

Abstract: A positive resist composition is provided comprising (A) a resin component having a carboxylic acid moiety protected with an acetal protective group which is decomposable under the action of an acid, wherein in the carboxylic acid moiety protected with an acetal protective group, deprotection occurs not by way of ?-elimination, and (B) a photoacid generator. The resist composition exhibits a high resolution when processed by ArF lithography.

Abstract: A film forming composition includes a polymer of a compound represented by formula (I): wherein R1, R2 and R3 each independently represents a substituent containing a carbon-carbon double bond or carbon-carbon triple bond; X1, X2 and X3 each independently represents any substituent; l and n each stands for an integer of from 0 to 15 and m stands for an integer of from 0 to 14, with the proviso that l, m and n do not represent 0 simultaneously; o and q each independently stands for an integer of from 0 to 15 and p independently stands for an integer of from 0 to 14; and r stands for 0 or 1, with the proviso that when r=0, R1 and R3 each independently represents a substituent containing a carbon-carbon double bond.

Abstract: The positive resist composition of the present invention is a polymer compound comprising at least one constituent unit (a1) selected from the group consisting of constituent units represented by the following general formulas (1) and (1)?, a constituent unit (a2) derived from an (?-lower alkyl)acrylate ester having a lactone-containing monocycle or a polycyclic group, and a constituent unit (a3) which is a constituent unit other than the constituent unit (a1) and the constituent unit (a2) and is derived from an (?-lower alkyl)acrylate ester which has an aliphatic cyclic group-containing non-acid dissociable dissolution inhibiting group and does not have a polar group: wherein R represents a hydrogen atom, a fluorine atom, a lower alkyl group having 20 or less carbon atoms, or a fluorinated lower alkyl group having 20 or less carbon atoms, R1 represents at most 20-membered cyclic group which may have a substituent, n represents 0 or an integer of 1 to 5, and m represents 0 or 1.

Abstract: A photosensitive polymer for a photoresist and a photoresist composition having the same are provided. The photosensitive polymer for a photoresist includes the repeating unit represented by the formula below: wherein R1 is a C1-C20 hydrocarbon group or a C1-C20 hetero hydrocarbon group including at least one hetero atom selected from the group consisting of nitrogen, fluorine and sulfur.

Abstract: The present invention provides a polymerizable compound having an alicyclic structure and a polymerizable group and represented by the general formula (1) or (19). The polymerizable compound exhibits high adhesion to substrates, reduced swelling during development, a reduced amount of water absorption during exposure in water, and high dry-etching resistance. Also provided are a polymer of such a polymerizable compound, a process for producing the same and a photoresist composition containing the polymer.

Abstract: A (meth)acrylic copolymer is endowed with a good profile of rigidity and hydrophilicity by introducing not only polycyclic structure units, but also recurring units having a high polarity. A chemically amplified positive resist composition comprising the polymer has a high sensitivity, resolution and etch resistance and improved substrate adhesion and developer affinity.

Abstract: The invention relates to polymeric transition metal catalysts, to processes for preparing them, to intermediates and also to the use of the transition metal catalysts as catalysts in organic reactions, in particular in olefin metathesis reactions.

Abstract: Provided are a ring-opening metathesis polymer and a hydrogenated product thereof that are useful as materials for an optical component, and a method for preparation thereof. The present invention relates to a ring-opening metathesis polymer comprising at least repeating structural units [A] represented by the following General Formula [1] and repeating structural units [B] represented by the following General Formula [2] at a constitutional molar ratio [A]/[B] of 0.1/99.9 to 100/0. The present invention relates to a ring-opening metathesis polymer comprising at least repeating structural units [A] represented by the following General Formula [1] and repeating structural units [B] represented by the following General Formula [2] at a constitutional molar ratio [A]/[B] of 0.1/99.9 to 100/0.

Abstract: The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.

Abstract: A film forming composition includes a compound having a cage structure; and a compound having a conjugated diene structure.

Abstract: A fuel cell-purpose electrolyte material having a structural unit represented by a general formula (1): where n is 0 or a positive integer, and R1 represents H or CH3, and R2 represents (CH2)mSO3H (m is 0 or a positive integer).

Abstract: A polar group-containing olefin copolymer having excellent adhesion properties to metals or polar resins and excellent compatibility therewith, a process for preparing the copolymer, a thermoplastic resin composition containing the copolymer, and uses thereof. The polar group-containing olefin copolymer comprises a constituent unit derived from an ?-olefin of 2 to 20 carbon atoms, and a constituent unit derived from a straight-chain, branched or cyclic polar group-containing monomer having at the end a polar group such as a hydroxyl group or an epoxy group and/or a constituent unit derived from a macromonomer having at the end a polymer segment obtained by anionic polymerization, ring-opening polymerization or polycondensation. The polar group-containing olefin copolymer can be prepared by polymerizing the ?-olefin with the polar group-containing monomer and/or the macromonomer in the presence of a metallocene catalyst.

Abstract: The present invention provides a negative C-plate type optical anisotropic film having negative birefringence along the thickness direction. In particular, the present invention provides a film comprising cycloolefin addition polymer, which is prepared by addition polymerizing norbornene-based monomers, a method for preparing the same, and a liquid crystal display comprising the same. The film of the present invention can be used for optical compensation films of a variety of LCD (liquid crystal display) modes because the refractive index alone the thickness direction can be controlled by the kind and amount of functional groups introduced to the cycloolefin addition polymer.

Abstract: Some embodiments in accordance with the present invention relate to norbornene-type polymers and to photosensitive dielectric resin compositions formed therefrom. Other embodiments relate to films formed from such compositions and to devices, such as electrical, electronic and optoelectronic devices, that encompass such films.

Abstract: A polymer obtained by polymerizing a compound represented by formula (I) in a presence of a polymerization accelerator; a film-forming composition comprising the polymer; an insulating film formed by utilizing the composition; and an electronic device, in formula (I), R1 and R2 each independently represents a substituent containing a carbon-carbon triple bond; X1 and X2 each independently represents a substituent except for a substituent containing a carbon-carbon triple bond; l and m each independently represents an integer of 0 to 15, provided that l and m are not 0 at the same time; and p and n each independently represents an integer of 0 to 14.

Abstract: A novel hybrid polymer has a structure in which a polyolefin segment and a polar polymer segment are connected not via a bonding group containing a heteroatom. A method of the invention produces the hybrid polymer with industrial advantages. The hybrid polymer includes a polyolefin segment (A) and a polar polymer segment (B), the polar polymer segment being obtained by radical polymerization of a radically polymerizable monomer.

Abstract: A polymer including a monomer represented by the following Formula and a photoresist composition including the same are disclosed. The polymer and photoresist composition can improve the resolution and the process margin due to the low activation energy of the deprotection reaction of the alcohol ester group including saturated cyclic hydrocarbyl group, and also can produce fine photoresist patterns because they have a stable PEB(Post Exposure Baking) temperature sensitivity, and further, can improve the focus depth margin and the line edge roughness of the resist layer. In the above Formula, R* is a hydrogen or methyl group, R1 is saturated hydrocarbyl group of 1 to 5 carbon atoms, R is mono-cyclic or multi-cyclic homo or hetero saturated hydrocarbyl group of 3 to 50 carbon atoms, and n is an integer of at least 2.

Abstract: A novel lactone-containing compound is provided as well as a polymer comprising units of the compound. The polymer is used as a base resin to formulate a resist composition having a high sensitivity, resolution and etching resistance.