Abstract: A polymer comprising recurring units of formula (1) wherein R1 is H or methyl, R2 is H or C1-8 alkyl, R3 is CO2R4, and R4 is C1-15 alkyl and recurring units having a carboxylic acid protected with an acid-decomposable protecting group containing an adamantane structure or tetracyclo-[4.4.0.12,5.17,10]dodecane structure and having a Mw of 1,000-500,000 is novel.

Abstract: A butyl polymer having improved processability is described, together with a process for production thereof. The butyl polymer derived from a reaction mixture which contains: (i) a monomer mixture comprising a C4 to C7 monoolefin monomer (preferably isobutylene) and a C4 to C14 multiolefin monomer (preferably isoprene); (ii) a multiolefin cross-linking agent (preferably divinyl benzene); and (iii) a chain transfer agent (preferably diisobutylene (2,2,4-trimethyl-1-pentene)). The subject butyl polymer has an improved balance of cold flow, filler dispersion, extrusion rate and die swell.

Abstract: A photosensitive polymer includes a copolymer containing adamantylalkyl vinyl ether, and a resist composition includes the photosensitive polymer. For example, the photosensitive polymer may include a copolymer having a formula: wherein x is an integer between 1 and 4 inclusive, R1 is a hydrogen atom or a methyl group, R2 is an acid-labile C4 to C20 hydrocarbon group, p/(p+q+r)=0.1 to 0.4, q/(p+q+r)=0.1 to 0.5, and r/(p+q+r)=0.1 to 0.4.

Abstract: The present invention relates to a method for preparing a cyclic olefin polymer by addition polymerization, and more particularly to a method for preparing a norbornene-based addition polymer, which comprises a step of contacting a norbornene-based monomer having an ester or acctyl group with a catalyst system comprising: a Group X transition metal compound; a compound comprising a neutral Group XV electron donor ligand having a cone angle of at least 160°; and a salt capable of offering an anion that can be weakly coordinated to the transition metal, in solvent. The norbornene-based addition polymer having an ester or acetyl group according to the present invention is transparent, has superior adhesivity and a low dielectric constant, and it generates no byproducts when attached to metal. Therefore, it can be used as an optical film, a retardation film, a protection film for a polarizer POFs (plastic optical fiber), PCBs (printed circuit board), or insulators of electronic devices.

Abstract: A flat plate made of a cycloolefin polymer comprising at least 30% by weight, based on the cyclopolefin polymer, of repeating units (A) having an alicyclic structure. The repeating units (A) comprises at least 30% by weight, based on the repeating units (A), of repeating units (A-i) having no norbornane structure. The cycloolefin polymer has a weight average molecular weight of 5,000 to 50,000. The flat plate is especially useful as a light guide plate.

Abstract: A novel norbornene derivative represented by a general formula (1m) shown below is provided. By conducting a ring opening polymerization of this norbornene derivative, or by performing a subsequent hydrogenation following the ring opening polymerization, a ring opening polymer or a hydrogenated product thereof with an excellent low birefringence can be obtained.

Abstract: Atactic copolymers derived from an alpha-olefin, optionally ethylene and a non-conjugated diene are provided. The units derived front the diene provide pendant groups having internal or terminal double bonds. Suitable dienes for preparing such copolymers include: CH2═C(R1)—R2—C(R3)═CH2, CH2═C(R1)R4—C(R3)═CH—CH3, wherein R1 and R3 are indenpendently selected from hydrogen or an alkly group, R2 and R4 are alkylene moieties having a chain length of at least 3 carbon atoms and at least 1 carbon atom respectively, or a diene having a cyclic ring with one strained ring double bond and a substituent on the ring of the Formulae: ═CR5R6, —CR7═CH2, wherein R5 and R6 and R7 are independently selected from hydrogen or a C1-C3 alkyl. Also provided are processes for the functionalisation of the atactic copolymers and their use as lubricating oil additives.

Abstract: Block copolymers having a polyisobutylene segment and a polycycloaliphatic diene polymer segment are presented. Star block copolymers with 2 to 16 block copolymer arms, wherein each of the arms has a polyisobutylene segment and a polycycloaliphatic diene polymer segment, are presented. The star block copolymers are synthesized via the “core first” method.

Abstract: A disengagement vessel employing a lock hopper effectively reduces concentration of non-polymer-associated components in the polymer product slurry of a first olefin slurry polymerization reactor, allowing cascading of a second slurry polymerization reactor operating at lesser concentration of comonomers, hydrogen, and other components to produce multicompositional polyolefin polymers and/or polymers having a multimodal monomer distribution, e.g. diblock polymers having substantially non-overlapping comonomer contents between the blocks.

Abstract: The invention relates to a fluorine-containing compound containing a substituent represented by the formula 1: 1

Abstract: A tire provided with a tire tread made from a rubber composition comprising (A) a random copolymer based on non-conjugated cyclic polyene comprising structural units originated from one or more &agr;-olefins (A1) and originated from one or more non-conjugated cyclic polyene (A2), the said random copolymer having a content of the structural unit(s) originated from one or more &agr;-olefins (A1) in the range of 93 to 70 mole %; a content of the structural unit originated from one or more non-conjugated cyclic polyene (A2) in the range of 7 to 30 mole %; an intrinsic viscosity [&eegr;], determined in decalin at 135° C., in the range of 0.01 to 20 dl/g; a glass transition temperature (Tg) of not higher than 40° C.; and an iodine value in the range of 50 to 150, and (B) a rubber based on diene, in a weight proportion of {the random copolymer based on non-conjugated cyclic polyene (A)} versus {the rubber based on diene (B)} in the range from 60/40 to 0.1/99.

Abstract: An ether compound of formula (1) is provided wherein R1 is H or C1-6 alkyl, R2 is C1-6 alkyl, R3 is H, C1-15 acyl or C1-25 alkoxycarbonyl which may be substituted with halogen atoms, k is 0 or 1, m is from 0 to 3, and n is from 3 to 6. The ether compound is polymerized to form a polymer having improved reactivity, robustness and substrate adhesion. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV.

Abstract: A poly(&agr;-olefin) copolymer obtained from the polymerization of at least one &agr;-olefin having from 2 to about 20 carbon atoms and at least one bulky olefin, the process comprising polymerizing the monomers in the presence of hydrogen and a catalytically effective amount of a catalyst comprising the product obtained by combining a metallocene procatalyst with a cocatalyst; lubricant compositions comprising such poly(&agr;-olefin) copolymer; and a method for improving the viscosity index of a lubricant composition using such poly(&agr;-olefin) copolymer.

Abstract: The present invention provides a phase retarder made of a copolymer prepared by polymerizing one non-cyclic olefin monomer (A) selected from ethylene and &agr;-olefin compound having 3 to 20 carbon atoms, one cyclic olefin monomer (B) selected from cyclic olefin compound such as norbornene, and one cyclic vinyl monomer (C) selected from vinyl compound having a cyclic unit made of an aromatic hydrocarbon or an alicyclic hydrocarbon such as styrene or vinylcyclohexane; wherein (1) an amount of the aromatic vinyl monomer is from about 1 to about 20 mol % and a total amount of the non-cyclic olefin monomer (A) and the cyclic olefin monomer (B) is from about 80 to about 99 mol % in case the component (C) is the aromatic vinyl monomer, or (2) an amount of the alicyclic vinyl monomer is from about 80 to about 99 mol % and a total amount of the non-cyclic olefin monomer and the cyclic olefin monomer is from about 1 to about 20 mol % in case the component (C) is the alicyclic vinyl monomer.

Abstract: An acetal group containing norbornene-based copolymer useful for a photoresist composition, a method for producing the same, and a photoresist composition containing the same are disclosed. According to the present invention, a copolymer of the present invention has excellent transparency at a wavelength of not more than about 250 nm, excellent resolution, excellent sensitivity, dry etching resistance and excellent adhesion to the substrate.

Abstract: The invention relates to microstructured components comprising at least one cycloolefin copolymer, to a process for producing these microstructured components, and also to the use of these microstructured components.

Abstract: This invention relates to a process to polymerize olefins comprising contacting, in a polymerization system, olefins having three or more carbon atoms with a catalyst compound, activator, optionally comonomer, and optionally diluent or solvent, at a temperature above the cloud point temperature of the polymerization system and a pressure no lower than 10 MPa below the cloud point pressure of the polymerization system, where the polymerization system comprises any comonomer present, any diluent or solvent present, the polymer product, where the olefins having three or more carbon atoms are present at 40 weight % or more.

Abstract: The present invention is a polar group-containing olefin copolymer having excellent adhesion properties to metals or polar resins and excellent compatibility therewith. A process for preparing the copolymer, a thermoplastic resin composition containing the copolymer, and uses thereof are also described. The polar group-containing olefin copolymer comprises a constituent unit derived from an &agr;-olefin of 2 to 20 carbon atoms, and a constituent unit derived from a straight-chain, branched or cyclic polar group-containing monomer having at the end a polar group such as a hydroxyl group or an epoxy group and/or a constituent unit derived from a macromonomer having at the end a polymer segment obtained by anionic polymerization, ring-opening polymerization or polycondensation.

Abstract: Disclosed herein are processes for polymerizing ethylene, acyclic olefins, and/or selected cyclic olefins, and optionally selected olefinic esters or carboxylic acids, and other monomers. The polymerizations are catalyzed by selected transition metal compounds, and sometimes other co-catalysts. Since some of the polymerizations exhibit some characteristics of living polymerizations, block copolymers can be readily made. Many of the polymers produced are often novel, particularly in regard to their microstructure, which gives some of them unusual properties. Numerous novel catalysts are disclosed, as well as some novel processes for making them. The polymers made are useful as elastomers, molding resins, in adhesives, etc.

Abstract: An alicyclic (meth)allyl ester monomer obtained by a specific production process. An alicyclic (meth)allyl ester compound for plastic lenses, which can be obtained by a simple and easy production process and which can endure a long-term storage, is produced using the monomer, and a plastic lens is obtained using the compound.

Abstract: The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Polymers of the invention contain in specified molar ratios both nitrile and photoacid labile groups that have an alicyclic moiety, particularly a bridged bicyclic or tricyclic group or other caged group. Polymers and resists of the invention can exhibit substantial resistance to plasma etchants.

Abstract: A copolymer of an acrylate monomer containing fluorine at &agr;-position with a norbornene derivative is highly transparent to VUV radiation and resistant to dry etching. A resist composition using the resin as a base polymer is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, and is suited for lithographic microprocessing.

Abstract: The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Polymers of the invention contain in specified molar ratios both nitrile and photoacid labile groups that have an alicyclic moiety, particularly a bridged bicyclic or tricyclic group or other caged group. Polymers and resists of the invention can exhibit substantial resistance to plasma etchants.

Abstract: This invention relates generally to synthetic polymers, generally with improved balance of processability, resilience and durability. These polymers are generally of the ethylene, alpha-olefin, diene terpolymer type.

Abstract: The present invention relates to a novel polymer comprising at least one unit derived from an ethylenically unsaturated compound containing at least one cyano functionality and at least one nonaromatic cyclic unit. The novel polymer is particularly useful when used in a photoresist composition sensitive in the deep ultraviolet region.

Abstract: Process for the catalytic copolymerisation (ROMP) of strained activated cyclic olefins comprising contacting an activated strained mono (poly)cyclic olefin monomer of formula with at least 1 wt % of an activated strained di (poly)cyclic olefin monomer of formula in the presence of a catalyst or an initiating agent wherein the group represents a strained (poly)cyclic olefin, tail Y and spacer X comprise preferably electron withdrawing and property modulating groups whereby the monomers form a copolymer comprising the repeating unit and at least 1 wt % of the unit which is adapted for subsequent cross linking of respective copolymer chains in the presence of heat and catalyst to form an amount of a cross linked copolymer comprising the unit, and polymeric products obtained thereby, novel monomers and intermediates, a method for selecting monomers for reaction a method for the preparation of shaped produc

Abstract: A polymer comprising recurring units of formula (1) and/or (2) wherein R1 and R2 are H, C1-15 alkyl, acyl or alkylsulfonyl or C2-15 alkoxycarbonyl or alkoxyalkyl which may have halogen substituents; R3 and R4 are H, C1-15 alkyl or alkoxy or C2-15, alkoxyalkyl which may have halogen substituents, and R3 and R4 may together bond with the carbon atom to form an aliphatic ring, or R3 and R4, taken together, may be an oxygen atom; and k=0 or 1, and having a Mw of 1,000-500,000 is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.

Abstract: A polymer comprising recurring units of formula (1-1) or (1-2) wherein R1 and R2 are H or C1-15 alkyl, R1 and R2, taken together, may form a ring; R3 is H, C1-15 alkyl, acyl or alkylsulfonyl or C2-15 alkoxycarbonyl or alkoxyalkyl which may have halogen substituents, not all R1, R2 and R3 are hydrogen; and k=0 or 1, and having a Mw of 1,000-500,000 is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.

Abstract: This invention relates to olefin polymerization processes for polymerizing ethylene, higher alpha-olefin comonomer and dienes, especially vinyl norbornene, and especially process for producing amorphous or semi-crystalline polymers such as EPDM. The invention also relates to the novel polymers produced by such processes. The invention furthermore relates to articles of manufacture with an improved balance of toughness and curing properties.

Abstract: There is provided a process for preparing a polymer compound for a resist, which can improve the performance, such as the heat resistance, sensitivity and resolution of the resist, without causing film loss of the resist, line width reduction of the resist or deterioration of the dry etching resistance of the polymer. This process comprises dissolving a styrene-based monomer containing at least a 4-acetoxystyrene monomer, and a dimethyl-2,2′-azobiscarboxylate ester in a solvent, thereby to polymerize the styrene-based monomer; adding an alkali catalyst to the resulting polymer solution, thereby to hydrolyze the polymer solution; and washing the resulting polymer compound with water.

Abstract: Using a polymerization catalyst comprising as a main ingredient a metal compound containing a transition metal of group 6 of the periodic table and having at least one imide group and at least two substituent (A) selected from the group consisting of an alkoxy group, an aryloxy group, an alkylamide group and an arylamide group, a polycyclic norbornene monomer is polymerized to give a ring-opened norbornene polymer having a weight average molecular weight of 500 to 1,000,000 as expressed in terms of polystyrene and a melting point of 140° C. or higher. This polymer is hydrogenated to give a hydrogenated product having a melting point of 140° C. or higher.

Abstract: A photosensitive polymer which maintains transparency even when exposed to a short-wavelength light source of 193 nm or below, exhibits improved adhesiveness to a substrate, improved contrast and improved resistance to dry etching. The photosensitive polymer includes a first monomer which is alicyclic hydrocarbon carboxylate having an acid-labile C6 to C20 tertiary alicyclic hydrocarbon group as a substituent, and a second monomer which is capable of free radical polymerization.

Abstract: The present invention relates to polymerizable compositions for the manufacture of optical lenses with a high refractive index and a high Abbe number, and optical lenses comprising these compositions.

Abstract: An olefinic copolymer having a cyclic structure is prepared by copolymerizing a) ethylene (M1) and b) dicyclopentadiene or tricyclopentadiene (M2), and, optionally c) a cyclic olefin (M3), in the presence of a catalyst which contains a metallocene compound (A) having formula [1]: H2C(R′mCp)(R″nCp)MX2[1], wherein M is zirconium or hafnium, Cp has a cyclopentadienyl skeleton, each of R′ and R″ is a hydrocarbon group having 1 to 10 carbon atoms, each of two X's which may be the same or different from each other, is a halogen, a hydrogen, a hydrocarbon group having 1 to 20 carbon atoms, a halogenated hydrocarbon group, an alkylamino group, an alkoxy group, an aryloxy group of the formula —O—Ar—Yp, a thioalkyl group, or a thioaryl group of the formula —S—Ar—Yp; wherein Ar is an aromatic ring, Y is a halogen, a hydrogen, a hydrocarbon group having 1 to 20 carbon atoms, a halogenated hydrocarbon group, an alkoxy group, an alkylamino

Abstract: An ether compound of formula (1) is provided wherein R1 is H or C1-6 alkyl, R2 is C1-6 alkyl, R3 is H, C1-15 acyl or C1-15 alkoxycarbonyl which may be substituted with halogen atoms, k is 0 or 1, m is from 0 to 3, and n is from 3 to 6. The ether compound is polymerized to form a polymer having improved reactivity, robustness and substrate adhesion.

Abstract: The present invention relates to polycyclic polymers, methods for producing polycyclic polymers, and methods for their use as photoresists in the manufacture of integrated circuits. In one embodiment, the present invention relates to photoresist compositions formed from the polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer. In another embodiment, the present invention relates to photoresist compositions formed from the co-polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer with at least one non-halogenated polycyclic monomer.

Abstract: A catalyst composition and process for preparing norbornene-type homopolymers or copolymers. The norbornene-type homopolymers or copolymers can be prepared using an in-situ catalyst composition including: (a) a transition metal compound of ML4, wherein M is a Group 10 metal and L is a neutral electron donor ligand; (b) a hydrocarbyl halogen containing a double bond or a triple bond; and (c) a salt of a non or weakly coordinative anion that can replace a halogen bonded to a metal. The catalyst composition is in a mixing state of components (a), (b), and (c), or in a mixing state of a reaction product of components (a) and (b) together with component (c).

Abstract: 1.

Abstract: A polymeric compound for photoresist of the invention includes at least one monomer unit represented by following Formula (I): 1

Abstract: A copper-mediated process for the synthesis of random copolymers of methyl acrylate with non-polarolefins, ranging from ethene to 1-octene, norbornene and norbornene derivatives, and capable of synthesizing copolymers having greater than 5% incorporation of the olefin, as well as copolymers synthesized using the process are described. The process displays many of the characteristics of a living polymerization process: the polydispersities of the copolymers obtained are less than about 1.7, preferably from about 1.1 to about 1.4, and it is possible to synthesize novel block terpolymers of methyl acrylate with olefins by the sequential addition of the latter monomers.

Abstract: A catalyst composition for preparing olefin polymers. The catalyst composition includes a metallocene compound and an activating cocatalyst. In the metallocene compound, two cyclopentadienyl groups are bridged by X (carbon, silicon, germanium or tin) in a ring structure. The bite angle &thgr; formed by the two cyclopentadienyl rings and X is equal to or greater than 100 degrees. The obtained olefin polymer has high cycloolefin conversion and a high glass transition temperature. In addition, the catalyst composition can still maintain relatively high activity at high temperature reaction conditions.

Abstract: There are provided a photosensitive polymer and a photoresist compositing containing the same. The photosensitive polymer is represented by the following formula: wherein R1 is an acid-labile tertiary alkyl ester group, R2 is hydrogen atom, methyl, ethyl, carboxyl, &ggr;-butyrolactone-2-yl ester, &ggr;-butyrolactone-3-yl ester, pantolactone-2-yl ester, mevalonic lactone ester, 3-tetrahydrofuranyl ester, 2,3-propylenecarbonate-1-yl ester, 3-methyl-&ggr;-butyrolactone-3-yl ester or C3 to C20 alicyclic hydrocarbon, a/(a+b+c) is 0.1˜0.7, b/(a+b+c) is 0.1˜0.8, c/(a+b+c) is 0.0˜0.8, and n is an integer in the range of 0 to 2.

Abstract: Olefins are polymerized by novel transition metal complexes of selected iminocarboxylate and iminoamido ligands, sometimes in the presence of cocatalysts such as alkylaluminum compounds or neutral Lewis acids. Olefins which may be (co)polymerized include ethylene, &agr;-olefins, and olefins containing polar groups such as olefinic esters for example acrylate esters. Also described are certain “Zwitterionic” transition metal complexes as polymerization catalysts for making polar copolymers. The resulting polymers are useful as thermoplastics and elastomers.

Abstract: Ethylene and norbornene-type monomers are efficiently copolymerized by certain metal complexes, particularly nickel complexes, containing selected anionic and neutral bidentate ligands. The polymerization process is tolerant of polar functionality on the norbornene-type monomer and can be carried out at elevated temperatures.

Abstract: The ethylene/aromatic vinyl compound/vinylnorbornene terpolymer according to the present invention is prepared by copolymerizing 50-90 mol % of ethylene, 1-55 mol % of an aromatic vinyl compound and 1-55 mol % of a vinylnorbornene under a catalyst system consisting of a transition metal compound represented by formula (I) and a cocatalyst, where M represents a transition metal of Group IV of the Periodic Table such as titanium, zirconium or hafnium; Cp′ is a non-substituted cyclopentadienyl group; a cyclopentadienyl group with 1 to 4 liner alkyl substitutes; an indenyl group; a substituted indenyl group; a fluorenyl group; or a substituted fluorenyl group; Y is a hydrogen or a silyl group of C1-10, an alkyl group of C1-10, an aryl group of C1-10, or a combination thereof; A is an alkyl group of C1-30, an alkylamide group of C1-30 or a derivative of cyclopentadienyl group which is identical to Cp′; and X is selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl group, an ar

Abstract: By blending novel organosiloxane polymers of the invention with a crosslinking agent and a photoacid generator, photo-curable resin compositions are formulated which can be exposed to radiation in a broad wavelength range and readily form a thin film without oxygen attack. From the compositions, fine patterns having improved dry etching resistance can be formed. Cured coatings of the compositions having improved substrate adhesion, heat resistance, and electrical insulation are suitable as a protective film for electric and electronic parts.

Abstract: A catalyst system and a process for the bulk addition polymerization or of polycyclic olefins, such as norbornene, methylnorbornene, ethylnorbornene, butylnorbornene or hexylnorbornene, 1,2,3,4,4a,5,8,8a-octahydro-1,4:5,8-dimethanonapthalene, 5,5′-(1,2-ethanediyl)bisbicyclo[2.2.1]hept-2-ene, and 1,4,4a,4b,5,8,8a,8b-octahydro-1,4:5,8-dimethanobiphenylene are disclosed. The catalyst includes an organonickel or organopalladium transition metal procatalyst and an activator compound. Polymerization can be carried out in a reaction injection molding process to yield thermoplastic and thermoset molded polymeric articles possessing high glass transition temperatures.

Abstract: Novel ethylene styrene interpolymers having triads with double reverse styrene incorporation (SSS) may be prepared in the presence of a transition metal phosphinimine compound and an activator.

Abstract: A metallocene catalyst may be temporarily and reversibly passivated by contact with an effective amount of an unsaturated hydrocarbon passivating compound.

Abstract: Conjugated diolefins, optionally in combination with other unsaturated compounds which may be copolymerized with the diolefins, are polymerized by performing the polymerization of the diolefins in the presence of catalysts based on monocyclopentadienyl compounds of vanadium and alumoxanes in the presence of aromatic vinyl compounds as the solvent at temperatures of −30 C. to +80 C. By means of the process according to the invention, it is possible to straightforwardly produce solutions of polydiolefins, such as polybutadiene, having 1,2 unit contents of 10 to 30% in aromatic vinyl compounds, which solutions may then, for example, be further processed to yield ABS or HIPS.