Abstract: A zero power identical pair of oppositely-oriented meniscus lens elements mounted in the projection light path, serves as curved mask support while compensating for optical anomalies such as beam shift and beam deviations produced by other transparent supports for the curved mask. The zero-power meniscus lens pair, without affecting the transmission beam characteristics, lets the beam diffract as efficiently as does a regular planar mask, thus preserving the partial coherence effects and resolution concepts of projection lithography. This simple but novel optics device is not only expected to clear several barriers for curved mask projection lithography but also find place in other applications where collimated or converging light beams have to travel extra paths without significant aberration.

Abstract: An enhanced spatial light modulator (ESLM) array, a microelectronics patterning system and a projection display system using such an ESLM for heat-minimization and resolution enhancement during imaging, and the method for fabricating such an ESLM array. The ESLM array includes, in each individual pixel element, a small pixel mirror (reflective region) and a much larger pixel surround. Each pixel surround includes diffraction-grating regions and resolution-enhancement regions. During imaging, a selected pixel mirror reflects a selected-pixel beamlet into the capture angle of a projection lens, while the diffraction grating of the pixel surround redirects heat-producing unused radiation away from the projection lens. The resolution-enhancement regions of selected pixels provide phase shifts that increase effective modulation-transfer function in imaging. All of the non-selected pixel surrounds redirect all radiation energy away from the projection lens.

Abstract: A compact, high-brightness, integrated illuminator in which collection of light from a point-arc source is maximized by a multi-curvature reflector section configuration of elliptical reflector and segmented spherical retroreflector directing all light rays into a well-defined numerical aperture. The invention also integrates a homogenizer and other optical elements with the multi-curvature reflector section, constructs any or all of these components in a single block of optical material, or, alternatively, constructs these components with molded hollow reflective cavities fabricated in metal or plastic blocks. Cooling is provided by internal fluid channels within the block.

Abstract: Portable personal water purifier with a microdischarge array sealed with a radiation emitter, preferably Xel, slightly above atmospheric or water pressure in a closely-configured treatment chamber. Each array is a polyimide film separating a copper layer or mesh cathode surface from a conductor pattern of nickel anodes at UV pixel via sites, juxtaposed in effective purifying range of all the water. In a canteen embodiment, the array is presented as a divider in the water chamber, or at its sides. In a continuous-flow embodiment, the array is presented as a spiral flow-through packet between input and output connections axial to a cylindrical water jacket. Battery or plug power is provided, along with any desired input filter. Two microdischarge arrays are preferably sealed in a twin-pack about a set of stiffener rods, extending outward for re-assembly in sockets after cleaning. Other separation assurance devices are spiral and chain separators.

Abstract: A compact light-beam homogenizer is realized by multiple reflections within internally-reflecting optical channels which are arranged in a folded configuration. The optical channels may be hollow with mirrored walls, or made of a solid transparent optical material. Light enters through an apertured mirror whose internally reflective surface sends back-reflected rays forward for recycling. Multiple entry ports may be provided for combining several beams or for reducing the intensity in the channels. The homogenizer may be used in reverse as a beam divider. Different shapes of the optical channels are provided for obtaining an effective emission surface of different shapes. Due to reflections from surfaces that are parallel to the optical axis, the numerical aperture of the input beams is preserved.

Abstract: A versatile maskless patterning system with capability for selecting rapidly among a plurality of projection lenses mounted on a turret. This provides the ability to rapidly select multiple choices for resolution and enables optimization of the combination of the imaging resolution and exposure throughput, making possible cost-effective fabrication of microelectronics packaging products. A preferred embodiment uses a digital micromirror device array spatial light modulator as a virtual mask. Another preferred embodiment use multiple closely spaced digital micromirror device array spatial light modulators to enhance throughput.

Abstract: An optimized illumination system that efficiently produces uniform illumination for exposure, photoablation, and laser crystallization systems. The illumination system includes a homogenizer that uniformizes and shapes a light beam, which is directed onto a mask by condenser optics. The illumination system recycles radiation by directing light reflected by the mask back into the illumination system, where an apertured mirror situated at the input end re-directs it back toward the mask. The relative areas of the mirror and aperture affect recycling efficiency and system throughput, so the system features a larger-diameter recycling segment enabling greater mirror-to-aperture area ratios. An added segment at the output end of the homogenizer matches the homogenizer diameter to the projection imaging system object field size. This standardizes the homogenizer and condenser lens integration, reducing the need for customized parts and thus reducing manufacturing time and expense.

Abstract: Significant advances in semiconductor microelectronics technologies have resulted in greatly enhanced chip performance. Systems studies have continuously shown that on-board interconnects between chips are the bottleneck in achieving board level performance that is comparable with this chip performance. This invention provides a multiple-layer photonic-electronic circuit board family that solves this interconnect performance problem. Multiple layers of patterned optical channel waveguides and patterned electrical conductors co-exist in a single circuit board structure, with optical vias to transport light between different photonics layers and electrical vias to transport electrical signals and power between different electronics layers. An all-lithographic fabrication technology is used to build the entire board structure with mutually compatible planar processing steps.

Abstract: A zero power identical pair of oppositely-oriented meniscus lens elements mounted in the projection light path, serves as curved mask support while compensating for optical anomalies such as beam shift and beam deviations produced by other transparent supports for the curved mask. The zero-power meniscus lens pair, without affecting the transmission beam characteristics, lets the beam diffract as efficiently as does a regular planar mask, thus preserving the partial coherence effects and resolution concepts of projection lithography. This simple but novel optics device is not only expected to clear several barriers for curved mask projection lithography but also find place in other applications where collimated or converging light beams have to travel extra paths without significant aberration.

Abstract: An alignable, low-profile substrate chuck for processing, one by one, a number of substrate panels, which may be larger than the chuck itself. The substrate chuck is adjustable in x, y and theta while on the movable platform of a stage, and comprises a nested set of rotatable or sliding brackets adjustable in x, y and theta a positionable vacuum diffuser plate mounted within a coplanar apron on the top bracket. The vacuum diffuser plate fits within a relief cut about the periphery of the apron, which, together with a pattern of islands with their tops coplanar to a ledge formed by the relief, provide location and both bottom and peripheral support for the high-flatness vacuum diffuser plate. The vacuum airflow passes through the vacuum diffuser plate, through the pattern around supporting islands and out through a central yaw shaft about which the yaw rotation centers.

Abstract: Imaging systems that use a spatial light modulator (SLM), such as maskless lithography systems using a digital micromirror device (DMD), suffer from low throughput at high resolution because of the increase in the number of pixels to be imaged. A possible solution to this problem is provided by using multiple SLMs. However, packaging multiple SLMs on a suitable base is inefficient because, in an SLM, surrounding the active region, a large inactive region is required for the chip kerf and the connector fan-in; these inactive regions thus prevent close packing of the SLMs. This invention enables close packing of a large number of SLMs by arranging them in twin planes, such that the kerf and fan-in regions overlap substantially.

Abstract: Single-stage projection systems typically have a twice-folded optical path, with mask leg, crossover, 1:1 projection lens system, and substrate leg. They offer seamless patterning of large microlithographic substrates by overlapping complementary small-field scanning. A reverser maintains mask/substrate pattern congruence despite optical reversal, but presents the requirement of large working distance to permit access to the scanning stage. The required working distance demands large-diameter lens elements which are expensive in materials, grinding and assembly. A high-resolution 1:1 projection lens, for high-fluence laser light, adds extreme expense. Dividing the projection lens into two distributed-part-lenses, in mask and substrate legs, maintains satisfactory working distance, minimizes lens diameter requirements, and thus cuts cost. The aperture stop is positioned at the midpoint of the optical path, preferably at the time of manufacture, by an auxiliary stage.

Abstract: Maskless microlithography provides a sub-pixel voting system using multiple, slightly-offset, digitally-controlled, unit-pixel, partial exposures with cumulative voting to identify regions of full exposure for sub-pixel-selection. Computer control of a virtual-mask pixel-selection device of unit-pixel resolution usually provides pixel-resolution patterns. To achieve sub-pixel resolution, the virtual mask, after a first partial exposure, is offset by less than a pixel-width and a second partial exposure is made. If the offset is ½ pixel-width, the result is a half-pixel size image region of full exposure. Finer voting can be defined by number of pulses, by significantly changing the offset, by offset in another dimension, and by increasing the multiplicity of exposures, thus enabling resolution enhancement by large multiples. The offsetting techniques can also be used to drill controlled-depth vias or to provide topography controls for laser-milling.

Abstract: Maskless patterning of high-resolution microelectronics features onto large curved substrates. A computer controls individual pixel elements in a spatial light modulator array (SLM) which provides the pattern. Maintaining optical track length constant is by software control of SLM vertical positioning, surface configuration and tilt. SLMs are on/off devices, either reflective or transmissive, such as digital micromirror devices (DMD) and liquid crystal light modulator arrays (LCLM). High-resolution spatial light modulator arrays currently have no capacity for changing or control of their average surface configurations. It is proposed to segment the SLM into smaller array chips, each mounted on a vertical positioner, such as a piezo-actuator, to provide the desired configuration to the surface defined by the spatial light modulator arrays.

Abstract: Photolithographic processes require alignment of substrate to mask prior to exposure. Alignment accuracy becomes critical as feature size diminishes. For alignment tolerances above 1 &mgr;m, off-axis camera-based techniques are acceptable, but require frequent calibration. Through the lens (TTL) on-axis alignment is much preferred, not requiring frequent calibrations and having superior alignment accuracies, even though usually more complicated and expensive. This invention provides a simple, easy to incorporate TTL, on-axis alignment technique for alignment accuracies of 1 &mgr;m, such as scan-and-repeat patterning systems that employ a unitary mask-substrate stage and a folded projection imaging system. There is a master alignment mark adjacent to the mask, which is imaged onto a phosphor screen with the same radiation as is to be used for patterning.

Abstract: Pixel-level monitoring and reconfiguring of both text inter-word spacing and individual character widths minimizes undesirable moire′ channels and moire′-glyphs, and more particularly relates to operator-selected automatic intra-word space manipulation and automatic intra-character width manipulation to achieve a pleasing overall page effect with maximized freedom from moire′-maze and moire′-glyph visual effects, both in proportional spaced fonts and fixed-character-width fonts. Selective scrolling may be by black-spot instead of actual characters, to make the white moire′-effects stand out more clearly. The typesetter may alternate positive and negative, which is another way to emphasize the moire′-effects. A further sub-variant, called “blush,” causes graying of spaces which are so surrounded by characters that they cannot participate in moire′-effects. This emphasizes the actual moiré-effects.

Abstract: Apparatus and method for patterned sequential lateral solidification of a substrate surface, avoiding the need for demagnification to avoid mask damage from fluence sufficient to overcome the threshold for sequential lateral solidification, while using the high throughput of a common stage presenting both 1:1 mask and substrate simultaneously for patterning. The radiation source provides imaging beam and non-imaging beam, each of fluence below the threshold of sequential lateral solidification, but with aggregate fluence above the threshold. The imaging beam path includes a relatively delicate 1:1 mask and 1:1 projection subsystem, with optical elements including a final fold mirror proximate to the substrate surface, put the below-threshold mask pattern on the substrate surface. The non-imaging beam bypasses the delicate elements of imaging beam path, passing through or around the final fold mirror, to impinge on the substrate surface at the same location.

Abstract: A materials-processing system based on projection irradiation using a pulsed-laser source is disclosed. The salient features include a novel illumination system containing a homogenizer that produces a self-luminous light beam of selected cross-section, spatially uniform intensity, and selected numerical aperture, as well as a novel high-efficiency, energy-recycling exposure system that provides pulse-duration extension. The output of the pulsed-laser source is shaped, optionally attenuated, and homogenized, and the pulse duration is extended by the illumination system, including beam-shaping optics, homogenizer, and optionally a condenser lens or pulse-extender-plate (PEP). The illumination is imaged either onto the mask, which is in turn imaged onto the substrate, or the illumination is imaged onto the substrate directly. The high-fluence irradiation effects a desired physical change in the material, for example melting and solidification as required in the sequential lateral solidification (SLS) process.

Abstract: Apparatus and method for side-by-side scanning of substrate panels to use a single-approach projection optical system to provide a patterned image on each of two substrate surfaces. More particularly, the system provides a technique for pattern scanning obverse and reverse surfaces, patterning one substrate surface, inverting the substrate panel and repositioning the substrate panel for patterning the opposite substrate surface. The inversion provides access to both surfaces of a substrate panel for pattern scanning by the same optics and the same precision x-y stage in quick succession. The system positions the same substrate panel inverted, or another substrate panel, as required, twice at one station or sequentially at first and second stations. The flipping mechanism may be a simple grabber/retractor with a rotatable wrist for substrate inverting; the stage selects the imaging station. Forwarders may be Inexpensive standard pick-and-place, slide-shuttle or carousel loader/unloader mechanisms.

Abstract: This single-actuator-and-cam, remotely adjustable, exterior vehicle rear-view mirror provides the driver with glare-free viewing toward the rear of the vehicle, by switching between a high-reflectivity position and a low-reflectivity position at the same view adjustment. The exterior rear-view mirrors are repositioned with only a single motor working with a rotary cam to scan all possible mirror positions. The single-motor mechanism increases the reliability of the mirror system. The single motor accomplishes both the directional alignment and the day/night reflectivity adjustment of the mirror by use of a cam which has positions for all predicted view positions, with two reflectivity positions for each view. This invention works equally well with flat wedge mirrors and wide-angle convex wedge mirrors.