Patents Represented by Attorney Carl C. Kling
  • Patent number: 5969870
    Abstract: This single-actuator-and-cam, remotely adjustable, exterior vehicle rear-view mirror provides the driver with glare-free viewing toward the rear of the vehicle, by switching between a high-reflectivity position and a low-reflectivity position at the same view adjustment. The exterior rear-view mirrors are repositioned with only a single motor working with a rotary cam to scan all possible mirror positions. The single-motor mechanism increases the reliability of the mirror system. The single motor accomplishes both the directional alignment and the day/night reflectivity adjustment of the mirror by use of a cam which has positions for all predicted view positions, with two reflectivity positions for each view. This invention works equally well with flat wedge mirrors and wide-angle convex wedge mirrors.
    Type: Grant
    Filed: September 18, 1997
    Date of Patent: October 19, 1999
    Assignee: Anvik Corporation
    Inventors: Kanti Jain, Marc Zemel, Teik-Meng Lee, Nestor O. Farmiga, Carl C. Kling
  • Patent number: 5933216
    Abstract: A high-performance projection optical system uses the multiple spectral peaks of an excimer laser system by using an optical dispersive system to physically separate the broadband laser output into separate narrowband beams which can be used for imaging different substrate surfaces simultaneously. The separated narrowband beams are directed along different optical paths and used to illuminate the object planes of different, identical projection lenses. The projection lenses are designed for the narrowed bandwidth corresponding to one spectral peak of the excimer laser rather than the broadband, multiple-peak laser output This dramatically simplifies both the design and the construction of the projection lens, leading to substantial cost-savings.
    Type: Grant
    Filed: October 16, 1997
    Date of Patent: August 3, 1999
    Assignee: Anvik Corporation
    Inventor: Thomas J. Dunn
  • Patent number: 5923403
    Abstract: This projection imaging system is capable of simultaneously exposing both the upper and lower sides of a substrate while providing high-resolution, a large exposure area, and high exposure throughput.
    Type: Grant
    Filed: July 8, 1997
    Date of Patent: July 13, 1999
    Assignee: Anvik Corporation
    Inventor: Kanti Jain
  • Patent number: 5897986
    Abstract: A large-format substrate patterning system, for microelectronics manufacturing, utilizes a substrate docking fixture to enable relative motion between the substrate stage and the substrate. This enables exposure of a large-format substrate which has been partitioned into different modules where each module contains an entire pattern transferred from a mask. This projection system enables patterning of a large multi-module substrate using a stage whose range of travel is smaller than the size of the substrate and using a mask whose area is smaller than the size of the substrate. This is accomplished by repositioning the substrate to expose each module sequentially. In order to reposition the substrate, its location is maintained fixed in space by a substrate docking fixture while the movable stage of the lithography system is repositioned to position a different module of the substrate in the image field of the lithography tool.
    Type: Grant
    Filed: May 28, 1997
    Date of Patent: April 27, 1999
    Assignee: Anvik Corporation
    Inventors: Thomas J. Dunn, Nestor O. Farmiga, Kanti Jain
  • Patent number: 5828505
    Abstract: An internally-mirrored tube of constant cross-section, for use as a beam-shaper-uniformizer in an optical lithography tool, requires precision assembly, closely approaching total internal reflection, to be able to accept at the entry end a beam of laser light of specified numerical aperture, having an arbitrary cross-section and a non-uniform intensity profile, and deliver at the exit a beam having the same numerical aperture, the desired cross-sectional shape, and a substantially uniform intensity profile across the illuminated area. Imperfections at the edges of the component slabs would interfere with operation. The difficulty of machining internal surfaces to mirror smoothness, and the difficulty of applying mirror finishes to internal surfaces, suggests that the uniformizer be assembled from mirrored slabs cemented together. Achieving precision without breakage or scuffing of mirrors is difficult.
    Type: Grant
    Filed: May 10, 1996
    Date of Patent: October 27, 1998
    Assignee: Anvik Corporation
    Inventor: Nestor O. Farmiga
  • Patent number: 5825558
    Abstract: A three-dimensional Universal Mounting Component (UMC) system of UMC blocks provides general mounting for use in optical research in constructing layouts for experiments and breadboard-type prototypes. In such optical layouts laser beams or other light beams are directed about complex paths, often on several planes or levels. Use of the invention overcomes the problem of creating three-dimensional optical layouts with less standardized, and much more expensive, mounting adapters and posts. An economical, standardized set of UMC blocks, each with a number of holes in grid configurations, enables users to construct custom three-dimensional optical layouts. Each UMC block is a right rectangular solid of substantial standardized thickness sufficient to support it on edge. Each UMC block has a set of smooth counterbored holes from front to back and has another set of such holes from back to front.
    Type: Grant
    Filed: August 6, 1996
    Date of Patent: October 20, 1998
    Assignee: Anvik Corporation
    Inventors: Nestor O. Farmiga, Kanti Jain
  • Patent number: 5759606
    Abstract: Preparation of English muffin bagels by using a set of yeast-rising flour bread ingredients quite similar to ingredients for standard bagels, but configuring individual buns into the cornmeal coated bun configuration of standard bagels but eliminating the boiling step of standard bagels, and adding a very long (3 hour) proofing step after the second rising to achieve effective maximum rising prior to the final baking step. The result is a bun configured like a bagel, tasting like a standard English muffin, and having a chewiness and crumbliness intermediate the standard English muffin and the standard bagel.
    Type: Grant
    Filed: June 24, 1996
    Date of Patent: June 2, 1998
    Inventors: Robert W. Brown, Bruce A. Kade
  • Patent number: 5721606
    Abstract: For high-throughput, low-cost manufacturing of electronic modules, it is desirable to use a large-format, 1:1-imaging exposure system. In such a system, it is further desirable to have the capability to pattern a large substrate having multiple segments using a mask of the size of one substrate segment. The substrate is mounted on an x-y stage which moves the substrate with respect to the imaging optics, both within a segment and from segment to segment. For each mask position, moving from one substrate segment to another will result in a significant change in the length or orientation of the optical imaging path. Such problems are eliminated by using, in conjunction with the primary x-y stage, an auxiliary stage which maintains the optical parameters essentially constant for the imaging of different substrate segments.
    Type: Grant
    Filed: September 7, 1995
    Date of Patent: February 24, 1998
    Inventor: Kanti Jain
  • Patent number: 5710619
    Abstract: In numerous applications of large-area patterning systems, the preferred image magnification is unity. However, in some applications, the size of the substrate may change slightly due to various thermal and/or chemical processing steps. To compensate for scale changes of the substrate, the magnification of the imaging system must vary slightly from unit magnification (typically by a fraction of a percentage) so that a layer already patterned on the substrate will have, after processing, proper image registration with the subsequent layer.This disclosure describes a lithography system for exposing large substrates at high imaging resolution and high exposure throughput, and specifically relates to a scan-and-repeat patterning system that employs a unitary mask-substrate stage and enables projection imaging of a substrate with capability to control the image magnification to compensate for changes of substrate dimensions occurring as a result of previous process steps.
    Type: Grant
    Filed: October 31, 1995
    Date of Patent: January 20, 1998
    Assignee: Anvik Corporation
    Inventors: Kanti Jain, Jeffrey M. Hoffman
  • Patent number: 5696631
    Abstract: A unit magnification lens system suitable for imaging of features in photoresist designed for exposure at a wavelength of 248.4 nm using a krypton fluoride excimer laser. This lens system is characterized by a very long working distance in the object and image spaces to allow incorporation of minors in the imaging path. The optical system is refractive, telecentric, and symmetrical about the central aperture stop.
    Type: Grant
    Filed: February 22, 1996
    Date of Patent: December 9, 1997
    Assignee: Anvik Corporation
    Inventor: Jeffrey M. Hoffman
  • Patent number: 5671285
    Abstract: Encryption/decryption capable terminal units, such as FAX point-of-sale units, on non-secure telecommunications, use public keys for accessing selected target terminals, but make their messages secure by encryption according to private keys. Each subscriber terminal registers, with a central database controller, a unique public key code. Each terminal includes a quick-access storage for a finite number of telephone numbers and related public keys for other terminals. To send a message, the source FAX first queries its local storage for the public key of the target terminal. If the public key is present, it sends a message encrypted with the public key for the target terminal, along with a digital signature. When the message is transmitted, the encrypted public key for the target terminal, and the digital signature of the source terminal user's private key are combined to form a message packet for decryption by the target terminal.
    Type: Grant
    Filed: December 13, 1995
    Date of Patent: September 23, 1997
    Inventor: Bruce D. Newman
  • Patent number: 5652645
    Abstract: A projection imaging system is described for patterning large, flexible substrates at high exposure speeds and desired resolution, the substrates being in the form of a continuous band fed from a roller for cost-effective electronic module manufacturing. From the continuous band, segments of one panel size are sequentially exposed one at a time. The segment being exposed is held rigidly on a scanning stage, on which is also mounted a mask containing the pattern to be formed on the substrate. The imaging subsystem is stationary and situated above the scanning stage. The mask is illuminated with a hexagonal illumination beam and a region of similar shape is imaged on the substrate. The stage is programmed to scan the mask and substrate simultaneously across the hexagonal regions so as to pattern one whole panel.
    Type: Grant
    Filed: July 24, 1995
    Date of Patent: July 29, 1997
    Assignee: Anvik Corporation
    Inventor: Kanti Jain
  • Patent number: 5565987
    Abstract: This invention describes a surface profilometry system which measures the surface topography of a sample on a sub-nanometer scale. The surface profile is determined through measurement of the change in distance between two mirrors of a multi-pass resonant cavity that is referenced to a frequency stabilized laser source. The contact stylus is in contact with the sample as it is translated along the plane to be measured. As the stylus traverses the sample, it is vertically deflected and transfers the motion directly to one of the mirrors of a multi-pass resonant cavity. The cavity is referenced to a frequency stabilized laser source that is synchronized with the resonant modes of the multi-pass cavity. Very small sub-nanometer deviations of the cavity can be detected by monitoring the laser beam incident on the multi-pass cavity. There are two embodiments by which the cavity length changes can be measured.
    Type: Grant
    Filed: March 23, 1995
    Date of Patent: October 15, 1996
    Assignee: Anvik Corporation
    Inventors: Kanti Jain, Subhash Chandra, Carl C. Kling
  • Patent number: 5562453
    Abstract: A prompt-providing adaptive speech tutor toy, is characterized by a programmed sequence of prompts in standard speech evoking a user's voice response of a word or phrase. Initially, a vocalized password provides a wake-up call during sleep mode to activate a start sequencer. This turns on the system. The user selects a category. A sequence of prompts and responses follows. Each response is accepted by a user input transducer, electronically treated to eliminate environmental noise and to put the response in a digitized form for computer evaluation. Computer evaluation follows. Frequency domain information from the user pattern is compared against frequency domain information from a standard pattern. Time domain information from the user pattern is compared against time domain information from a standard pattern. The comparisons are concatenated into a comparison score and this is checked against a threshold.
    Type: Grant
    Filed: February 2, 1993
    Date of Patent: October 8, 1996
    Inventor: Sheree H.-R. Wen
  • Patent number: 5555089
    Abstract: The absolute distance measuring interferometer (ADMI) is a multi-pass interferometer which is a resonant cavity consisting of two plane parallel mirrors whose length is referenced to a stabilized laser system. The resonant cavity can be used in order to measure very precisely (to within a fraction of a wavelength) the distance between a reference plane and an object. Due to its multi-pass nature, the length of the cavity can be measured much more accurately than for a conventional interferometer. The optical transmission bandwidth of the resonant cavity is inversely proportional to its length. A direct measure of the transmission bandwidth provides an extremely precise (to within a fraction of a wavelength) absolute measure of the length of the cavity. This eliminates the need for careful alignment during the motion of one of the mirrors of the multi-pass interferometer.
    Type: Grant
    Filed: November 30, 1994
    Date of Patent: September 10, 1996
    Assignee: Anvik Corporation
    Inventors: Thomas J. Dunn, Dharmesh G. Panchal
  • Patent number: 5522755
    Abstract: An interactive toy in which a supercompressed sponge novelty item in an internal chamber expands or pops open a pop-open door when significant water is intoduced into the chamber. There is a water receiving device for water entry, which is connected to the interanl chamber so as to trigger a surprise expansion of the supercompressed sponge novelty items in the chamber. The supercompressed sponge novelty item, or plurality of novelty items positioned together or separately, expand to interesting size or pop open the door when the expansion becomes sufficient. The interactive toy may be in various forms, including a cookstove embodiment with expandible food novelty items including bread, rolls, cake, etc. or nonexpandible items such as a roast. Another form may be a guts-gushing monster with a belly chamber full of expandible entrail novelty items. Another form is a race car.
    Type: Grant
    Filed: January 6, 1992
    Date of Patent: June 4, 1996
    Inventors: Dennis A. Farrell, Gregory E. Hyman
  • Patent number: 5502563
    Abstract: A Fabry-Perot resonator, also called a Fabry-Perot cavity, is a spectroscopic device of extremely high resolving power and is a very useful tool for alignment of mask and wafer for the multiple exposures necessary to make a semiconductor integrated circuit. When a Fabry-Perot cavity is used for alignment in a multi-exposure imaging procedure, the cavity itself must be very accurately aligned for each exposure. For proper alignment system operation, it is necessary that one of the mirrors of the resonant cavity be fixed with respect to the mask, and the other mirror be fixed with respect to the wafer. This invention provides a mechanical system and method to maintain the alignment of a Fabry-Perot cavity for each exposure. This invention describes a technique in which the Fabry-Perot cavity is transported from one exposure area to the next without need for realignment.
    Type: Grant
    Filed: October 21, 1994
    Date of Patent: March 26, 1996
    Assignee: Anvik Corporation
    Inventors: Thomas J. Dunn, Kanti Jain
  • Patent number: 5473408
    Abstract: A system is described for recycling radiation reflected by an illuminated patterning mask in a via-hole drilling or exposure tool. The mask is illuminated by high-energy laser radiation, and the illuminated region is imaged onto a substrate by a projection, proximity, or contact method. The source radiation is suitably shaped by a lens assembly and focused into an optical intensity homogenizer with the desired numerical aperture. The homogenizer has the base function of converting the focused beam to self-luminous light required for drilling of via-holes or other processes accomplished by the tool, while maintaining the numerical aperture of the beam. The homogenizer also participates in the radiation-recycling function. An apertured reflector allows radiation from the source to enter the homogenizer. The radiation passing through and exiting the homogenizer is image by a lens to illuminate a portion of the mask.
    Type: Grant
    Filed: July 1, 1994
    Date of Patent: December 5, 1995
    Assignee: Anvik Corporation
    Inventors: Jeffrey M. Hoffman, Kanti Jain
  • Patent number: D402410
    Type: Grant
    Filed: February 24, 1998
    Date of Patent: December 8, 1998
    Inventor: Dennis A. Farrell
  • Patent number: D403118
    Type: Grant
    Filed: February 24, 1998
    Date of Patent: December 22, 1998
    Assignee: Daftco
    Inventors: Dennis A. Farrell, Cynthia A. Woodie