Patents Represented by Attorney Carl C. Kling
  • Patent number: 6515257
    Abstract: High-performance microelectronic modules, such as chip-scale packages, flip-chip modules, integrated micro-opto-electronic boards, fine-line printed circuits, and system-on-a-package modules, span a range of sizes and interconnect densities. Current technologies for via generation are not optimized for the varied cost considerations of different manufacturing requirements—direct-write tools address low-volume needs, whereas mask-projection systems are designed for very high via-density products. The system disclosed here will be highly cost-efficient for producing a wide range of modules. Its desirable features are high-speed via generation for different via densities, full via-pattern programmability, capability to drill high-threshold photo-ablation substrates, and full and efficient utilization of available high-power excimer lasers. A high-power laser beam is divided into multiple beamlets which are simultaneously directed to different via sites by a spatial light modulator array.
    Type: Grant
    Filed: March 26, 2001
    Date of Patent: February 4, 2003
    Assignee: Anvik Corporation
    Inventors: Kanti Jain, Nestor O. Farmiga
  • Patent number: 6511188
    Abstract: This single-actuator-and-cam, remotely adjustable, exterior vehicle rear-view mirror provides the driver with glare-free viewing toward the rear of the vehicle, by switching between a high-reflectivity position and a low-reflectivity position at the same view adjustment. The exterior rear-view mirrors are repositioned with only a single motor working with a rotary cam to scan all possible mirror positions. The single-motor mechanism increases the reliability of the mirror system. The single motor accomplishes both the directional alignment and the day/night reflectivity adjustment of the mirror by use of a cam which has positions for all predicted view positions, with two reflectivity positions for each view. This invention works equally well with flat wedge mirrors and wide-angle convex wedge mirrors.
    Type: Grant
    Filed: May 18, 2001
    Date of Patent: January 28, 2003
    Assignee: Anvik Corporation
    Inventors: Carl C. Kling, Kanti Jain
  • Patent number: 6483574
    Abstract: A dockable substrate chuck and demountable substrate frame, which can be placed atop the dockable substrate chuck, effectively extend the moving platform of an X-Y stage to access a larger substrate area. The system features a substrate chuck docking fixture. The dockable substrate chuck selectively grips or glides on a grip/glide plate on the stage. A bridge suspends the optics and Z-movable kinematic elements of a substrate chuck docking fixture. The docked dockable substrate chuck is fixed in space, in glide mode on a temporary air bearing. When the stage carriage reaches a new position with respect to the dockable substrate chuck, the substrate chuck docking fixture is turned off, and the puck of the dockable substrate chuck regains its grip on the grip/glide plate. The dockable substrate chuck is newly positioned on the stage, the demountable substrate frame is located with respect to the dockable substrate chuck, and the dockable substrate chuck vacuum grips the substrate for a high resolution scan.
    Type: Grant
    Filed: January 29, 2000
    Date of Patent: November 19, 2002
    Assignee: Anvik Corporation
    Inventor: Marc I. Zemel
  • Patent number: 6416908
    Abstract: A microlithography system, capable of performing high resolution imaging on large-area curved surfaces, based on projection lithography. The system utilizes a high-resolution lens to image a curved mask directly onto a curved substrate. The system uses a curved mask which is identical in shape to the curved substrate, in order to achieve a constant track length for conjugate object and image points, thereby maintaining focus over the full area of curved substrates having height variations that greatly exceed the depth-of-focus of the imaging lens. Magnification errors are controlled by continuous adjustments of the z-position of the projection lens during scanning, with the adjustments depending upon the topography of the curved mask and substrate. By performing the lithography using a step-and-scan seamless-patterning microlithography system, it is possible to pattern over large areas, greater than the field size of the lens.
    Type: Grant
    Filed: June 29, 2000
    Date of Patent: July 9, 2002
    Assignee: Anvik Corporation
    Inventors: Marc A. Klosner, Marc I. Zemel, Kanti Jain, Nestor O. Farmiga
  • Patent number: 6364494
    Abstract: This single-actuator-and-cam, remotely adjustable, exterior vehicle rear-view mirror provides a glare-free rear view, by switching between a high-reflectivity position and a low-reflectivity position at the same view adjustment. Exterior rear-view mirrors are repositioned by a single motor and rotary cam scanning all possible mirror positions. The single-motor mechanism increases reliability while accomplishing both directional alignment and day/night reflectivity selection, using a cam with positions for all predicted view positions, two reflectivity positions for each view. This invention works equally well with flat wedge mirrors and wide-angle convex wedge mirrors. Since each position is unique, each directional/reflectivity position is assigned a set of digital coordinates which can be stored for each vehicle driver and each glare condition, for an initial setting which can be easily, or even automatically, adjusted for changes as the driver desires.
    Type: Grant
    Filed: September 23, 1999
    Date of Patent: April 2, 2002
    Assignee: Anvik Corporation
    Inventors: Carl C. Kling, Kanti Jain
  • Patent number: 6356337
    Abstract: Apparatus and method for side-by-side scanning of a substrate to use a single-approach projection optical system to provide a patterned image on each of two surfaces of a substrate panel, and more particularly a technique for pattern scanning a first surface, reverse, of the substrate panel at a reverse patterning station, flipping the substrate panel over and repositioning the substrate panel at the same or another location for patterning the opposite surface, obverse. This provides access to a second surface of the substrate panel for pattern scanning, and positions another substrate panel at the first station. The flipping mechanism may be a simple grabber/retractor with a rotatable wrist for substrate inverting. The forwarder may be a simple shuttle mechanism. Inexpensive standard pick-and-place loader/unloader mechanisms may be used for loading and unloading.
    Type: Grant
    Filed: March 8, 2000
    Date of Patent: March 12, 2002
    Assignee: Anvik Corporation
    Inventor: Marc I. Zemel
  • Patent number: 6304316
    Abstract: A projection microlithography system that can pattern very large, curved substrates at very high exposure speeds and any desired image resolution, the substrates being permitted to have arbitrary curvature in two dimensions. The substrate is held rigidly on a scanning stage, on which is also mounted a mask containing the pattern to be formed on the substrate. The mask is imaged on the substrate by a projection subsystem which is stationary and situated above the scanning stage. The mask is illuminated with a polygonal illumination beam which causes a patterned region of similar shape to be imaged on the substrate. Different regions of the substrate are moved in a direction parallel to the direction of the optical axis at the substrate (z-axis) by suitable amounts to keep the segment being exposed within the depth of focus of the imaging lens. The stage is programmed to scan the mask and substrate simultaneously across the polygonal regions so as to pattern the whole mask.
    Type: Grant
    Filed: October 22, 1998
    Date of Patent: October 16, 2001
    Assignee: Anvik Corporation
    Inventors: Kanti Jain, Nestor O. Framiga, Thomas J. Dunn
  • Patent number: 6238852
    Abstract: A maskless lithography system that provides large-area, seamless patterning using a reflective spatial light modulator such as a Deformable Micromirror Device (DMD) directly addressed by a control system so as to provide a first pattern, via a first projection subsystem, on a first photoresist-coated substrate panel, while simultaneously providing a duplicate pattern, which is a negative of the pattern on the first substrate panel, via a second projection subsystem, onto a second photosensitive substrate panel, thus using the normally-rejected non-pattern “off” pixel radiation reflected by the “off” pixel micromirrors of the DMD, to pattern a second substrate panel. Since the “off” pixel reflections create a pattern which is complementary to the “on” pixel pattern, using a complementary photoresist coating on the second substrate panel provides for a duplicate pattern, as is usually desired.
    Type: Grant
    Filed: January 4, 1999
    Date of Patent: May 29, 2001
    Assignee: Anvik Corporation
    Inventor: Marc A. Klosner
  • Patent number: 6224922
    Abstract: The invention is a specialty beverage container with a multiple colorant reservoir built into the cap 4. The colorant reservoir has a number of colorant chambers respectively for the colorants, such as primary colors red, yellow and blue, or others. The colorant reservoir 5 has a number of colorant chambers arrayed much like the sections of an orange, opening into a central cylindrical tube 7. Central cylindrical tube 7 is open into the main chamber 3 of the beverage container (bottle 1). The consumer purchases a bottle 1 filled with a neutral drink and with a colorizer cap 4. The consumer then proceeds to unlock the colorizer cap 4, select a color, and add colorant or colorants to achieve the desired hue and intensity. The consumer may then remove the colorant valve mechanism (or the entire colorizer cap) and drinks the beverage colored to his specifications.
    Type: Grant
    Filed: December 16, 1999
    Date of Patent: May 1, 2001
    Inventor: Mark J. Fonte
  • Patent number: 6201597
    Abstract: A large-format substrate patterning system, for microelectronics manufacturing, utilizes a substrate docking fixture to enable relative motion between the substrate stage and the substrate. This enables exposure of a large-format substrate which has been partitioned into different modules where each module contains an entire pattern transferred from a mask. This projection system enables patterning of a large multi-module substrate using a stage whose range of travel is smaller than the size of the substrate and using a mask whose area is smaller than the size of the substrate. This is accomplished by repositioning the substrate to expose each module sequentially In order to reposition the substrate, its location is maintained fixed in space by a substrate docking fixture while the movable stage of the lithography system is repositioned to position a different module of the substrate in the image field of the lithography tool.
    Type: Grant
    Filed: February 5, 1999
    Date of Patent: March 13, 2001
    Assignee: Anvik Corporation
    Inventors: Thomas J. Dunn, Nestor O. Farmiga, Kanti Jain
  • Patent number: 6149856
    Abstract: In making thermoset and photo-set polymer-matrix composite parts, curing is the key process step that transforms the molecular structure of the composite material, stabilizing it in the desired shape. This curing system applies carefully controlled ultraviolet (UV) radiation dosages, appropriately distributed over the entire surface of the composite part, thereby rapidly curing the material while enabling direct monitoring and control of the curing energy. Previous photo-curing methods have applied generalized radiation to a part with conventional UV lamps. We provide great benefits in cure depth, speed and process control by precisely controlling all parameters of UV dosage, by computed control, by markings on the part, or by dynamic feedback control from embedded sensors or non-contact sensors. This system can apply greater radiation dose to areas of increased quantities of resin, such as support ribs, and lesser radiation dose to areas of decreased quantities of resin.
    Type: Grant
    Filed: November 13, 1998
    Date of Patent: November 21, 2000
    Assignee: Anvik Corporation
    Inventors: Marc I. Zemel, Thomas J. Dunn
  • Patent number: 6142638
    Abstract: This single-actuator-and-cam, remotely adjustable, exterior vehicle rear-view mirror provides the driver with glare-free viewing toward the rear of the vehicle, by switching between a high-reflectivity position and a low-reflectivity position at the same view adjustment. The exterior rear-view mirrors are repositioned with only a single motor working with a rotary cam to scan all possible mirror positions. The single-motor mechanism increases the reliability of the mirror system. The single motor accomplishes both the directional alignment and the day/night reflectivity adjustment of the mirror by use of a cam which has positions for all predicted view positions, with two reflectivity positions for each view. This invention works equally well with flat wedge mirrors and wide-angle convex wedge mirrors.
    Type: Grant
    Filed: September 23, 1999
    Date of Patent: November 7, 2000
    Assignee: Anvik Corporation
    Inventors: Marc Zemel, Carl C Kling, Kanti Jain, Nestor O Farmiga
  • Patent number: 6142639
    Abstract: This single-actuator-and-cam, remotely adjustable, exterior vehicle rear-view mirror provides the driver with glare-free viewing toward the rear of the vehicle, by switching between a high-reflectivity position and a low-reflectivity position at the same view adjustment. The exterior rear-view mirrors are repositioned with only a single motor working with a rotary cam to scan all possible mirror positions. The single-motor mechanism increases the reliability of the mirror system. The single motor accomplishes both the directional alignment and the day/night reflectivity adjustment of the mirror by use of a cam which has positions for all predicted view positions, with two reflectivity positions for each view. This invention works equally well with flat wedge mirrors and wide-angle convex wedge mirrors.
    Type: Grant
    Filed: September 23, 1999
    Date of Patent: November 7, 2000
    Assignee: Anvik Corporation
    Inventors: Kanti Jain, Carl C Kling
  • Patent number: 6094306
    Abstract: An energy saving window system operates selectively in different seasons and climatic conditions to optimize transfer of the sun's radiation through the window into an interior space. Two sets of diffraction gratings are deployed, with two mode settings--a summer or capture mode and a winter or transmittance mode. In the summer mode, transfer of heat into the interior is undesirable. Unwanted heat rays are redirected to a scupper by additive diffraction through two diffraction gratings in series. The scupper redirects the undesired radiation to a heat sink or back out through the window. In the winter mode, transfer of heat into the interior is desirable. By repositioning the two diffraction gratings so that their deflections are subtractive, the sun's rays are redirected to be essentially undiffracted so as to miss the scupper and enter the room. The essentially undiffracted light rays are acceptable as a view and are effectively unblocked as to solar heat gain.
    Type: Grant
    Filed: April 13, 1993
    Date of Patent: July 25, 2000
    Assignee: Anvik Corporation
    Inventor: Kanti Jain
  • Patent number: 6077139
    Abstract: The float tube paddle fin 1 includes a web 2 which has two edge-supporting rib sleeves 3 and a central fold-supporting rib sleeve 4, encapsulating ribs 5. There is an arch strap 6 sewn onto the width of the leading edge of web 2, with free ends extending outward from web 2. Attached at the juncture of the leading edge of the web 2 and the free ends of arch strap 6 is ankle strap 7 which has an adjustment buckle 7 at one free end. Also attached to outer tube sleeves 3, at intermediate points 9, is a heel strap 10, which has an adjustment buckle 8 at one free end. The trailing edge of web 2 is hemmed to seal the supporting rib sleeves 3 and 4. Ankle strap 7 and heel strap 10 bridge the web 2, and to support the web 2 so as to fit snugly against the arch of the foot of the floatstrider, and to trail easily through the water in a "V," like closed butterfly wings, as the foot strides forward, on dry land, on river bottom, or through deep water.
    Type: Grant
    Filed: December 19, 1996
    Date of Patent: June 20, 2000
    Inventor: Richard J. Celik
  • Patent number: 6068198
    Abstract: A generator/dispenser for mono-dispersed aerosol, with droplet size precisely controlled by a stepper motor and a nozzle array having a great number of operational micro-vias, and with fluid volume dosage control. A specified dose is delivered over an accurately controlled interval of time, by decrementing the volume of a fluid reservoir upon each of a specified number of control pulses to a stepper motor, which moves a ball screw linear actuator with great precision on each control pulse. The reservoir is closed at the aerosol delivery position by a nozzle array, which is a thin sheet with myriad micro-via holes. The micro-vias are of the same dimensions and orientation, producing for a medical inhaler the desired micro-droplet volume, for example the volume of a 3-.mu.m diameter droplet from each micro-via, for each pulse.
    Type: Grant
    Filed: March 23, 1999
    Date of Patent: May 30, 2000
    Inventor: Umesh Gupta
  • Patent number: 6040552
    Abstract: Economical production of laser-drilled high-precision, ultra-miniature multiple-via-hole patterns is accomplished by multiplexing the homogenized, shaped, nearly-collimated output of a high-power excimer laser into a modular set of condenser lens/mask/projection lens beamlines. A substrate delivery subsystem provides a continuous supply of film substrate segments as blanks during production. Functional modularization permits the building and easy retooling of a hard-tooling multiple-beamline system powered by a high-power laser. Vertical modularization permits the building of a single-beamline soft-tooling pilot system, which may be used to demonstrate a production technique, or may be used for short production runs, and which may later be incremented with additional vertical subassemblies for additional beamlines.
    Type: Grant
    Filed: January 30, 1997
    Date of Patent: March 21, 2000
    Inventors: Kanti Jain, Thomas J. Dunn, Nestor O. Farmiga, Carl Weisbecker, Carl C. Kling
  • Patent number: 6018383
    Abstract: In the manufacturing of flexible, large-area electronic modules such as flat-panel displays (FPDs), the high cost and low yields of currently available patterning equipment represent a significant barrier to cost-effective production. This invention provides a projection imaging system that can pattern very large, flexible substrates at very high exposure speeds with almost any desired image resolution. The master pattern to be imprinted on the substrate is contained on a mask which, similar to the substrate, is made of a flexible material The mask and substrate are scanned by rollers through the object and the image field, respectively, of a 1:1 projection lens. All of the rollers are driven by identical drive systems linked to a common motor; therefore, the scanning of the mask and substrate is perfectly synchronized. Both the mask and the substrate, along with their rollers, are mounted on a linear translation stage.
    Type: Grant
    Filed: August 20, 1997
    Date of Patent: January 25, 2000
    Assignee: Anvik Corporation
    Inventors: Thomas J. Dunn, Nestor O. Farmiga, Marc Zemel, Carl Weisbecker, Kanti Jain
  • Patent number: 6014845
    Abstract: An energy saving skylight cover system operates selectively in summer and winter to optimize transfer of the sun's radiation through the skylight into an interior space. The skylight cover system comprises optical transmission modifying panels and radiation scuppers that make its functional characteristics responsive to the sun's incidence angle. In summer mode, with high average inclination of the sun, the skylight cover system absorbs or reflects back the undesirable solar heat. In winter mode, the skylight cover system permits majority of the sun's rays to enter the interior space, permitting desirable solar heat gain. The determination of rejecting or accepting solar heat gain is made by the skylight cover system according to a designed-in characteristic angle. The characteristic angle is a function of the orientation of the skylight and the roof, and the geographical location of the building.
    Type: Grant
    Filed: May 24, 1993
    Date of Patent: January 18, 2000
    Assignee: Anvik Corporation
    Inventors: Kanti Jain, Carl C. Kling
  • Patent number: D446370
    Type: Grant
    Filed: January 3, 2000
    Date of Patent: August 7, 2001
    Inventors: Corazon Avila Adikimenakis, Gloria Avila, Rodolfo A de la Cruz