Patents Represented by Attorney Geoffrey L. Chase

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  • Process for the treatment of pulp with oxygen and steam using ejectors
    Patent number: 5690786
    Abstract: A process for using ejectors to combine high pressure steam and low pressure oxygen to produce a steam and oxygen enriched gas single phase gas mixture for introduction into various pulp treatments using oxygen with the benefit of low cost compression, low capital requirements and superior oxygen mixing.
    Type: Grant
    Filed: November 26, 1991
    Date of Patent: November 25, 1997
    Assignee: Air Products and Chemicals Inc.
    Inventors: John Frederick Cirucci, Jeffrey Alan Knopf, Vincent Louis Magnotta, William Paul Schmidt
  • Method and apparatus for transporting, storing and delivering dangerous chemicals
    Patent number: 5685350
    Abstract: Method and apparatus for transporting, storing and delivering dangerous chemicals in a high pressure stacked tube array configuration. Tubes are divided into sub-groups with outside tubes containing inert gases and inside tubes containing chemicals. Inside and outside tubes in each sub-group are manifolded to permit off loading of dangerous chemicals into outside tubes in the event of a leak in an inside tube or tubes in the sub-group. The apparatus includes a manifold system for segregation of source chemicals to provide two independent outlets.
    Type: Grant
    Filed: February 7, 1996
    Date of Patent: November 11, 1997
    Assignee: Air Products and Chemicals, Inc.
    Inventor: Naser Mahmud Chowdhury
  • Dynamic dilution system
    Patent number: 5661225
    Abstract: An apparatus for generating a low concentration calibration gas mixture containing percent, ppm, ppb or ppt amounts of a desired analyte from a high concentration gas mixture and a high purity diluent using a series of source gas containing vessels and a series of parallel gas or chemical conduits controlled by mass flow controllers in a purged enclosure with conduits to purge gas conduits of residual gases or corrosive gases.
    Type: Grant
    Filed: September 12, 1996
    Date of Patent: August 26, 1997
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Robert Gordon Ridgeway, Richard Vincent Pearce, Peter James Maroulis, Seksan Dheandhanoo, Suhas Narayan Ketkar
  • Nonfunctionalized poly(arylene ether) dielectrics
    Patent number: 5658994
    Abstract: An article of manufacture comprising a dielectric material on a microelectronic device, such as an integrated circuit, wherein the dielectric material contains a poly(arylene ether) polymer comprising a repeat unit of the structure: ##STR1## wherein m=0 to 1.0; and n=1.0-m; and Ar.sub.1, Ar.sub.2, Ar.sub.3 and Ar.sub.4 are individually divalent arylene radicals, but Ar.sub.1, Ar.sub.2, Ar.sub.3 and Ar.sub.4, other than a diradical 9,9-diphenylfluorene, cannot be isomeric equivalents.
    Type: Grant
    Filed: July 13, 1995
    Date of Patent: August 19, 1997
    Assignee: Air Products and Chemicals, Inc.
    Inventors: William Franklin Burgoyne, Jr., Lloyd Mahlon Robeson, Raymond Nicholas Vrtis
  • Multibed pressure swing adsorption apparatus and method for the operation thereof
    Patent number: 5656065
    Abstract: Pressure swing apparatus comprises at least three parallel beds of adsorbent operated on cycles of being on-line to adsorb contaminant from a feed gas stream under pressure, being depressurized, being regenerated by a purge gas, and being repressurised. Feed gas is transferred from a depres-surising bed to a repressurizing bed to reduce switch loss and repressurization is extended to occupy at least 50% of the cycle to smooth the feed gas output.
    Type: Grant
    Filed: October 4, 1995
    Date of Patent: August 12, 1997
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Mohammed Ali Kalbassi, Shyam Ramchand Suchdeo
  • Base treated alumina in pressure swing adsorption
    Patent number: 5656064
    Abstract: Pressure swing adsorption to remove CO.sub.2 from a gas stream is conducted using an improved alumina obtained by impregnating a starting alumina with a basic solution having a pH of at least 9, e.g. of a basic compound such as KHCO.sub.3, and drying at a temperature low enough to avoid decomposing the basic compound to a form which adsorbs CO.sub.2 such that the compound does not regenerate under reduced pressure purging.
    Type: Grant
    Filed: October 4, 1995
    Date of Patent: August 12, 1997
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Timothy Christopher Golden, Fred William Taylor, Andrew Wilson Wang, Mohammed Ali Kalbassi
  • VSA adsorption process with energy recovery
    Patent number: 5656067
    Abstract: A vacuum swing adsorption process for separating a feed gas mixture into a more strongly adsorbable component and a less strongly adsorbable component in a process employing two vacuum pumps and three adsorbent beds containing an adsorbent selective for the more strongly adsorbable component using countercurrent depressurization and cocurrent ambient feed repressurization simultaneous with product end to product end pressure equalization and a common-shaft machinery arrangement which allows the expansion energy contained in the countercurrent depressurization and cocurrent ambient feed repressurization streams to be recovered and utilized to reduce overall process power consumption. Addition of three valves and an expander element will also allow expansion energy in the product purge and pressure equalization streams to be recovered. Oxygen product can be recovered from air at low cost using the process.
    Type: Grant
    Filed: February 23, 1996
    Date of Patent: August 12, 1997
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Charles Franklin Watson, Rakesh Agrawal, Paul Anthony Webley, Joseph Gerard Wehrman
  • Cryogenically purged mini environment
    Patent number: 5644855
    Abstract: A portable contamination-sensitive component transport container provides a continuously purged environment for the components. The container includes an attached cryogenically liquefied inert gas insulated storage vessel from which vaporized liquefied inert gas is used to generate a gaseous nitrogen purge to the container.
    Type: Grant
    Filed: April 6, 1995
    Date of Patent: July 8, 1997
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Wayne Thomas McDermott, Richard Carl Ockovic, Robert William Wimmer, II
  • Ultra high purity delivery system for liquefied compressed gases
    Patent number: 5644921
    Abstract: A method and apparatus for storing ultra high purity non-cryogenic liquefied compressed gases, such as ammonia (NH.sub.3), and delivering a vaporized gaseous product from those liquefied gases for semiconductor processing applications. The delivery method includes withdrawing and heating gaseous product from a storage vessel containing the liquefied compressed gas, and then piping the heated gas through the liquid contained in the storage vessel in a heat exchange fashion. The heat exchange with the liquid inside the vessel induces boiling to maintain a vaporized gaseous product under a minimum positive pressure in said vessel. After liberating its heat, the gaseous product is delivered to a semiconductor manufacturing point of use.
    Type: Grant
    Filed: May 22, 1996
    Date of Patent: July 8, 1997
    Assignee: Air Products and Chemicals, Inc.
    Inventor: Naser Mahmud Chowdhury
  • Process for nitrogen trifluoride synthesis
    Patent number: 5637285
    Abstract: The present invention is directed to a method for the synthesis of nitrogen trifluoride from elemental fluorine gas and a source of ammonia in a gas-liquid phase reaction comprising;3 F.sub.2 +NH.sub.4 H.sub.(x-1) F.sub.x .fwdarw.NF.sub.3 +(3+x)HFwherein the melt ratio HF/NH.sub.3 represented by x in the above formula is at least 2.55 and the reaction liquid is agitated or mixed with a mixing apparatus with power input to the mixing apparatus at a high level equivalent to or greater than 1000 watts per cubic meter. This improved synthesis method allows for enhanced nitrogen trifluoride yields of 70% or greater.
    Type: Grant
    Filed: January 30, 1996
    Date of Patent: June 10, 1997
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Daniel G. Coronell, Thomas H.-L. Hsiung, Howard P. Withers, Jr., Andrew J. Woytek
  • Chemical vapor deposition (CVD) of silicon dioxide films using oxygen-silicon source reactants and a free radical promoter
    Patent number: 5637351
    Abstract: A low temperature chemical vapor deposition method for depositing silicon dioxide comprising the steps of heating a substrate upon which deposition is desired to a temperature of between 250.degree. C. (482.degree. F.) and 420.degree. C. (788.degree. F.) in a vacuum having a pressure of from about 0.1 to about 2.0 torr and introducing, together with a silane and oxygen or oxygen-containing silane, a free radical promoter (e.g., di-t-butylperoxide, t-butylhydroperoxide, or n-butylnitrite) as a co-reactant into the vacuum.
    Type: Grant
    Filed: May 11, 1995
    Date of Patent: June 10, 1997
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Harry E. O'Neal, Morey A. Ring, John G. Martin
  • Plasma etch with trifluoroacetic acid and derivatives
    Patent number: 5626775
    Abstract: The present invention is directed to the etching of a material selected from the group consisting of silicon dioxide, silicon nitride, boronphosphorus silicate glass, fluorosilicate glass, siliconoxynitride, tungsten, tungsten silicide and mixtures thereof under plasma etch conditions, particularly for cleaning operations to remove silicon dioxide or silicon nitride from the walls and other surfaces within a reaction chamber of a plasma-enhanced chemical vapor deposition reactor. The etching chemicals used in the etch process are trifluoroacetic acid and it derivatives, such as; trifluoroacetic anhydride, trifluoromethyl ester of trifluoroacetic acid and trifluoroacetic acid amide and mixtures thereof.
    Type: Grant
    Filed: May 13, 1996
    Date of Patent: May 6, 1997
    Assignee: Air Products and Chemicals, Inc.
    Inventors: David A. Roberts, Raymond N. Vrtis, Arthur K. Hochberg, Robert G. Bryant, John G. Langan
  • Purification of gases using solid adsorbents
    Patent number: 5614000
    Abstract: A method for the removal from a feed gas stream such as air of at least two contaminating gas components such as water and CO.sub.2 features repeated cycles of operation the improvement which comprise: feeding a regenerating gas such as dry nitrogen at a higher temperature, e.g. 70.degree. C., in a direction counter-current to the feed direction in contact with the adsorbent to produce a heat pulse travelling in the counter-current direction to desorb the less strongly adsorbed second contaminating gas component from the downstream (with respect to the feed direction) portion of the adsorbent by TSA while at the same time desorbing the more strongly adsorbed second contaminating gas component from the upstream (with respect to the feed direction) portion of the adsorbent by PSA.
    Type: Grant
    Filed: October 4, 1995
    Date of Patent: March 25, 1997
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Mohammed A. Kalbassi, Timothy C. Golden
  • Enhanced sensitivity for oxygen and other interactive gases in sample gases using gas chromatography
    Patent number: 5612489
    Abstract: The present invention is directed to a method of detecting trace levels of contained interactive gas, such as oxygen, in gases containing trace levels of interactive gas, such as oxygen, by doping a known low level amount of interactive gas (i.e., oxygen) into the detection apparatus to saturate interactive gas reactive or adsorptive sites in the apparatus, thus allowing the accurate, reproducible and responsive detection of contained interactive gas. More particularly, the present invention dopes a carrier gas of a gas chromatograph with low levels of oxygen in order to detect contained trace oxygen in a sample of a gas being analyzed for contained trace oxygen.
    Type: Grant
    Filed: February 14, 1996
    Date of Patent: March 18, 1997
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Daniel J. Ragsdale, George H. Smudde, Jr., David A. Zatko
  • Predecomposition of organic chlorides for silicon processing
    Patent number: 5599425
    Abstract: A process for the use of organic chlorides having the general formula C.sub.x H.sub.y Cl.sub.y, C.sub.z Cl.sub.s, C.sub.r O.sub.u Cl.sub.2(r-u+1), C.sub.r O.sub.u Cl.sub.r-u+1 H.sub.r-u+1, wherein x=1-10, more preferably 1-6; y=x+1, x or x-1; z=1-10, more preferably 1-6; s=2(x+1, x or x-1), r=1-10, more preferably 2-4; u=1, 2 and up to r, as precursors for decomposition to chlorine and oxygen-containing reactive reagents for subsequent use for vapor cleaning of silicon, thermal oxidation of silicon in a range of 200.degree. C.-1200.degree. C., rapid thermal oxidation of silicon and silicon polishing or etching.
    Type: Grant
    Filed: February 6, 1995
    Date of Patent: February 4, 1997
    Assignees: Air Products and Chemicals, Inc., Advanced Micro Devices
    Inventors: Andre Lagendijk, Damon K. DeBusk
  • High micropore volume low silica EMT-containing metallosilicates
    Patent number: 5584912
    Abstract: The present invention is a composition, a synthesis of the composition and a method of using the composition for selectively adsorptively separating nitrogen from oxygen wherein the composition is a crystalline EMT with a Si/Al ratio less than 2.0 and a micropore volume determined in the sodium and/or potassium form of at least 0.20 cm.sup.3 /g and a lithium cation exchange of at least 80%, preferably including an intergrowth with a crystalline FAU structure, wherein the pure or intergrowth compositions have the chemical formula:M.sub.2/n O:X.sub.2 O.sub.3 :(2.0 to <4.0)SiO.sub.2wherein M=one or more metal cations having a valence of n, and X is selected from the group consisting of aluminum, gallium and boron, preferably aluminum.
    Type: Grant
    Filed: April 3, 1996
    Date of Patent: December 17, 1996
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Hong-Xin Li, Charles G. Coe, Thomas R. Gaffney, Yanliang Xiong, Johan A. Martens, Pierre A. Jacobs
  • Use of nitrogen from an air separation plant in carbon dioxide removal from a feed gas to a further process
    Patent number: 5582029
    Abstract: A cryogenic air separation unit (ASU) provides flows of oxygen and nitrogen. The oxygen is used in a process such as COREX iron making or the partial oxidation of hydrocarbons, or in an oxycoal fuelled blast furnace, producing an off-gas containing useful components (H.sub.2 and CO) and carbon dioxide. The carbon dioxide is removed by pressure swing adsorption using nitrogen from the ASU as a regeneration gas and the purified off-gas becomes a feed gas to a further process such as production of iron by direct reduction of iron ore or the production of a NH.sub.3 making ammonia or is recycled into the first process as a feed gas.
    Type: Grant
    Filed: October 4, 1995
    Date of Patent: December 10, 1996
    Assignee: Air Products and Chemicals, Inc.
    Inventors: James M. Occhialini, Rodney J. Allam, Mohammed A. Kalbassi
  • High micropore volume low silica EMT-containing metallosilicates
    Patent number: 5573745
    Abstract: The present invention is a composition, a synthesis of the composition and a method of using the composition for selectively adsorptively separating nitrogen from oxygen wherein the composition is a crystalline EMT with a Si/Al ratio less than 2.0 and a micropore volume determined in the sodium and/or potassium form of at least 0.20 cm.sup.3 /g and a lithium cation exchange of at least 80%, preferably including an intergrowth with a crystalline FAU structure, wherein the pure or intergrowth compositions have the chemical formula:M.sub.2/n O:X.sub.2 O.sub.3 :(2.0 to <4.0)SiO.sub.2wherein M=one or more metal cations having a valence of n, and X is selected from the group consisting of aluminum, gallium and boron, preferably aluminum.
    Type: Grant
    Filed: May 12, 1994
    Date of Patent: November 12, 1996
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Hong-Xin Li, Charles G. Coe, Thomas R. Gaffney, Yanliang Xiong, Johan A. Martens, Pierre A. Jacobs
  • Handling and delivery system for dangerous gases
    Patent number: 5569151
    Abstract: Method and apparatus to contain dangerous gases venting or leaking from a primary containment vessel. An outer containment vessel holds the primary containment vessel in fluid tight relationship to the outer vessel. The outer vessel has an internal volume large enough to contain the entire contents of the inner vessel and includes means to absorb or scrub gas leaking from the inner vessel. Removal of gas from the inner vessel to a point of use is controlled by valves and conduits contained in the outer vessel, the valves being controlled from outside the vessels.
    Type: Grant
    Filed: May 8, 1995
    Date of Patent: October 29, 1996
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Eugene J. Karwacki, Arron D. Varn, Howard P. Withers, Jr., Andrew J. Woytek
  • Process for improved quality of CVD copper films
    Patent number: RE35614
    Abstract: Chemical Vapor Deposition of copper films is enhanced by simultaneously introducing in the reactor vapor of an organometalic copper precursor and .?.copper complex.!. vapor of a volatile ligand or the hydrate of the ligand.
    Type: Grant
    Filed: June 20, 1996
    Date of Patent: September 23, 1997
    Assignee: Air Products and Chemicals, Inc.
    Inventors: John A. T. Norman, Arthur K. Hochberg, David A. Roberts