Abstract: A process for obtaining purified carbon monoxide from a gaseous mixture of hydrogen and carbon monoxide and one or more additional impurities to be removed by one or more vapor-liquid separation devices is provided which includes the steps of providing a feed stream of the gaseous mixture, cooling and partially condensing the feed stream to partially separate the feed stream into at least one hydrogen rich vapor substream and at least one carbon monoxide rich liquid substream, withdrawing a first and a second substream from one of the carbon monoxide rich substreams, passing the first substream through a first expansion valve to let down the pressure to a pressure nominally the same as that of a vapor-liquid separation device downstream, vaporizing the second substream using a heat exchange device to produce a third substream at a pressure substantially above that of the vapor-liquid separation device, passing the third substream through a work extraction device to provide a substantial portion of all refrige

Abstract: A chemical delivery system for delivering chemicals having at least a high purity includes at least one first reservoir for containing a fluid and at least one second reservoir for containing the fluid. The system also includes a first conduit, a first fluid sensor, and a controller. The first conduit is for transferring the fluid over time from the at least one first reservoir to the at least one second reservoir. The first conduit is metallic and has a first end in communication with the at least one first reservoir and a second end in communication with the at least one second reservoir. The fluid being transferred from the at least one first reservoir to the at least one second reservoir flows through the first conduit from the first end to the second end. The first fluid sensor is adjacent the first conduit, and the first fluid sensor is adapted to detect a presence of the fluid and to detect an absence of the fluid in the first conduit.

Abstract: The present invention provides a pressure swing adsorption process. The process includes providing a pressure swing adsorption apparatus having a discharge end adsorption layer of activated carbon, feeding through the apparatus a feed gas including hydrogen, carbon monoxide and at least one of argon and oxygen, and collecting a product gas from the apparatus, wherein the product gas is high purity hydrogen. Also provided is a method for decreasing an amount of impurities in a product gas from a pressure swing adsorption process for separating hydrogen from impurities including carbon monoxide, and at least one of argon and oxygen.

Abstract: Diaryl-, dialkoxyalkyl-, alkylalkoxyalkyl-, arylalkoxyalkyl- and cyclic aminosulfur trifluorides fluorinating agents are disclosed.

Abstract: The present invention is a composition for deposition of a mixed metal or metal compound layer, comprising a solventless mixture of at least two metal-ligand complex precursors, wherein the mixture is liquid at ambient conditions and the ligands are the same and are selected from the group consisting of alkyls, alkoxides, halides, hydrides, amides, imides, azides cyclopentadienyls, carbonyls, and their fluorine, oxygen and nitrogen substituted analogs.

Abstract: The present invention is an apparatus and process for blending high purity chemicals to produce a high purity chemical mixture with circulation, purification and sensing of said chemical mixture between blending of said high purity chemicals and storage of said high purity chemicals for use, ultimately to produce a high purity chemical mixture for on-site use in treating semiconductor materials, such as at a semiconductor fabrication facility that processes silicon wafers.

Abstract: A fluorination method of oxygen and halogen sites with diaryl-, dialkoxyalkyl-, alkylalkoxyalkyl-, arylalkoxyalkyl- and cyclic aminosulfur trifluorides fluorinating reagents is disclosed.

Abstract: An adsorbent and method for making it and its use in removing water from gaseous hydrogen halide. Magnesium halide supported on an activated carbon prepared under vacuum will remove water at 1 to 500 ppm.

Abstract: A dynamic blending gas delivery system and method are disclosed. A blended gaseous mixture produced in accordance with the method is used in chemical vapor deposition tools or similar process tools. One embodiment is a multi-step method for processing a plurality of fluids to form a blended gaseous mixture and supplying the blended gaseous mixture to a distribution header from which the blended gaseous mixture is delivered to at least one tool. The first step is to supply a first fluid. The second step is to heat the first fluid to a temperature where at least some portion of the first fluid is a vapor. The third step is to superheat the vapor portion of the first fluid to a temperature sufficient to avoid condensation of the blended gaseous mixture delivered to the at least one tool. The fourth step is to supply a second fluid.

Abstract: Diaryl-, dialkoxyalkyl-, alkylalkoxyalkyl-, arylalkoxyalkyl- and cyclic aminosulfur trifluorides fluorinating agents are disclosed.

Abstract: A process for producing a nanoporous polymer film of no greater than 10 micron thickness having low dielectric constant value, including the steps of: (a) providing a polymer in a solution with at least two solvents for the polymer in which a lowest boiling solvent and a highest boiling solvent have a difference in their respective boiling points of approximately 50° C. or greater; (b) forming a film of the polymer in solution with at least the two solvents on a substrate; (c) removing a predominant amount of the lowest boiling solvent; (d) contacting the film with a fluid which is a non-solvent for the polymer, but which is miscible with the at least two solvents to induce phase inversion in the film; (e) forming an average pore size in the film in the range of less than 30 nanometers. The present invention is also nanoporous films made by the above process.

Abstract: The present invention is a process for thermal, vapor phase removal of silicon oxides and metal-containing contaminants from a surface of a substrate of a type used in manufacturing semiconductor devices comprising contacting the substrate at an elevated temperature at an elevated temperature appropriate to generate and maintain an effective amount of a cleaning reagent to form volatile by-products of the silicon oxides and the metal-containing contaminants and removing the volatile by-products from the surface, wherein the cleaning reagent is a complex of hydrogen fluoride and an oxygen-containing compound selected from the group consisting of one or more of trifluoroacetic acid, trifluoroacetic anhydride, 1,2-propanedione, a .beta.-diketone and a .beta.

Abstract: Process for solvent purging a process line of process chemical in a process chemical delivery system typically used to dispense toxic chemicals from replaceable process chemical containers in the electronic fabrication industry.

Abstract: A method [and an apparatus are] is disclosed for detecting an occurrence of a liquid dry condition in a container containing a liquefied compressed gas while the gaseous phase of the liquefied compressed gas is being removed from the container over time. The [apparatus includes] method uses a first sensor, a second sensor, and a computer, preferably a programmed logic controller (PLC). The first sensor senses temperature (T) inside the container and provides a signal indicative thereof. The second sensor senses pressure (P) inside the container and provides a signal indicative thereof. The computer receives signals from the first and second sensors, and determines the rates of change in the pressure (dP/dt) and the temperature (dT/dt) inside the container over time.

Abstract: A solid state composition is provided having the formula Cu(A).sub.n Z, where A is CO or olefin, n>1 and Z is a unitary or composite monovalent anion. Further provided are an apparatus adapted to adsorb and a method for adsorbing an adsorbate A from a fluid mixture. The apparatus and method employ an adsorbent having the formula Cu(A), Z, where A is CO or olefin, n>0 and Z is a unitary or composite monovalent anion. Z can be selected from the group consisting of: a) X.sup.- where X.sup.- is BF.sub.4.sup.-,PF.sub.6.sup.- or SbF.sub.6.sup.- ; b) (Al.sub.x (OR).sub.y).sup.- where R is fluoroalkyl or perfluoroalkyl, and x is 0 and y is 1, or x is 1 and y is 4; c) (RCO.sub.2).sup.- where R is alkyl, fluoroalkyl, perfluoroalkyl, aryl, fluoroaryl or perfluoroaryl; d) (RSO.sub.3).sup.- where R is alkyl, fluoroalkyl, perfluoroalkyl, aryl, fluoroaryl or perfluoroaryl; e) (H(RCO.sub.2).sub.2).sup.- where R is alkyl, fluoroalkyl, perfluoroalkyl, aryl, fluoroaryl or perfluoroaryl; f) (H(RSO.sub.3).sub.2).sup.

Abstract: Carbon dioxide, water, nitrous oxide and optionally ethylene are removed from a feed air stream by a temperature swing adsorption using a first adsorbent such as alumina to adsorb water, a second adsorbent such as 13X zeolite to adsorb carbon dioxide, and a third adsorbent such as binderless calcium exchanged X zeolite to adsorb nitrous oxide and optionally ethylene, prior to cryogenic separation of the purified air stream.

Abstract: A process for destroying NF.sub.3 in a gas containing NF.sub.3 by contacting the gas with a fluidized bed of metal particles capable of reacting with NF.sub.3 wherein the metal particles have a particle size essentially no greater than approximately 300 microns. The process can be conducted in parallel connected switching fluidized beds wherein the beds are switched based upon achieving a predetermined bed height expansion based upon the reaction of the metal particles with the NF.sub.3.

Abstract: In a process for the synthesis of a first metal-ligand complex, M.sup.+n (L.sup.-).sub.n, where n.gtoreq.1, from a metal compound precursor and a ligand precursor, where the metal of the metal compound precursor may during the synthesis change to a valence in excess of n; the improvement, to suppress formation of a second metal-ligand complex of the metal with a valence in excess of n, of adding the elemental form of the metal to the synthesis of the first metal-ligand complex.

Abstract: A process for synthesizing an aminosulfur trifluoride is provided. The process includes reacting a secondary amine with SF.sub.4 to produce the aminosulfur trifluoride product and a liquid amine-HF adduct. Substantially no solid amine-HF adduct is produced in the one-step reaction of the process. The reaction is conducted in a reaction solvent containing a tertiary amine. The process produces aminosulfur trifluorides, such as dialkyl, diaryl and arylalkyl aminosulfur trifluorides, in high yields.

Abstract: Carbon dioxide, water, carbon monoxide and hydrogen are removed from a gas stream such as air or nitrogen by adsorbing water and carbon dioxide on a solid absorbent of alumina, or zeolite and oxiding carbon monoxide over a solid catalyst to carbon dioxide and adsorbing the resulting carbon dioxide and chemisorbing the hydrogen on the catalyst, which may be palladium on alumina.