Patents Represented by Attorney Howson & Howson LLP
  • Patent number: 7723332
    Abstract: In one embodiment, compounds of the following structure are described, wherein R1to R7are described herein. Also provided are methods for preparing these compounds and methods of contraception; treating or preventing fibroids; treating or preventing uterine leiomyomata; treating or preventing endometriosis, dysfunctional bleeding, and polycystic ovary syndrome; treating or preventing hormone-dependent carcinomas; providing hormone replacement therapy; stimulating food intake; synchronizing estrus; and treating cycle-related symptoms using the compounds described herein.
    Type: Grant
    Filed: March 4, 2008
    Date of Patent: May 25, 2010
    Assignee: Wyeth LLC
    Inventors: Casey Cameron McComas, Andrew Fensome, Michael Anthony Marella
  • Patent number: 7718095
    Abstract: A sputtering target is provided that has a relative density of 80% or more and contains a compound having as its principal component zinc oxide satisfying AXBYO(KaX+KbY)/2(ZnO)m, 1<m, X?m, 0<Y?0.9, X+Y=2, where A and B are respectively different positive elements of trivalence or more, and the valencies thereof are respectively Ka and Kb. A ZnO based sputtering target is obtained which does not contain ZnS and SiO2, and, upon forming a film via sputtering, is capable of reducing the affect of heating the substrate, of performing high speed deposition, of adjusting the film thickness to be thin, of reducing the generation of particles (dust) and nodules during sputtering, of improving the productivity with small variation in quality, and which has fine crystal grains and a high density of 80% or more, particularly 90% or more.
    Type: Grant
    Filed: July 24, 2008
    Date of Patent: May 18, 2010
    Assignee: Nippon Mining & Metals Co., Ltd.
    Inventors: Hideo Hosono, Kazushige Ueda, Masataka Yahagi, Hideo Takami
  • Patent number: 7716806
    Abstract: Provided is a tantalum sputtering target having a crystal structure in which the (222) orientation is preferential from a position 10% of the target thickness toward the center face of the target, and a manufacturing method of a tantalum sputtering target, including the steps of forging and recrystallization annealing, and thereafter rolling, a tantalum ingot or billet having been subject to melting and casting, and forming a crystal structure in which the (222) orientation is preferential from a position of 10% of the target thickness toward the center face of the target. As a result, evenness (uniformity) of the film is enhanced, and quality of the sputter deposition is improved.
    Type: Grant
    Filed: September 19, 2006
    Date of Patent: May 18, 2010
    Assignee: Nippon Mining & Metals Co., Ltd.
    Inventor: Kunihiro Oda
  • Patent number: 7713155
    Abstract: In the check valve of a hydraulic tensioner, a bell-shaped retainer is provided with plural, branched, leg portions which resiliently grip the outer surface of a ball seat. Oil induction slots are formed between adjacent branched leg portions of the retainer to provide oil flow paths that are unimpeded by the plunger-biasing spring of the tensioner.
    Type: Grant
    Filed: December 4, 2007
    Date of Patent: May 11, 2010
    Assignee: Tsubakimoto Chain Co.
    Inventors: Tsutomu Namie, Toyonaga Saitoh
  • Patent number: 7713156
    Abstract: In a chain transmission having a sprocket with an elastic ring sandwiched between a central hub and an annular toothed outer member, the tooth form is such that the root diameter, that is, the diameter of the tooth gap bottom circle, is greater than the root diameter in a sprocket having a standard ISO tooth form.
    Type: Grant
    Filed: December 5, 2007
    Date of Patent: May 11, 2010
    Assignee: Tsubakimoto Chain Co.
    Inventors: Shunji Sakura, Akira Hirai
  • Patent number: 7713364
    Abstract: A manganese alloy sputtering target characterized in that oxygen is 1000 ppm or less, sulfur is 200 ppm or less and a forged texture is provided, and a method for producing a forged manganese alloy target stably by eliminating the drawbacks of manganese alloy that it is susceptible to cracking and has a low rupture strength. A manganese alloy sputtering target which can form a thin film exhibiting high characteristics and high corrosion resistance while suppressing generation of nodules or particles is thereby obtained.
    Type: Grant
    Filed: March 19, 2007
    Date of Patent: May 11, 2010
    Assignee: Nippon Mining & Metals Co., Ltd.
    Inventor: Yuichiro Nakamura
  • Patent number: 7710496
    Abstract: The invention relates to a carrier that holds a component in a defined position on a circuit board in a housing or housing part. In particular, the invention relates to a carrier for a sensor board on which a light-sensitive sensor is mounted. According to the invention, it is proposed that the carrier have at least one mechanical keying that interacts with a corresponding mechanical keying on the circuit board.
    Type: Grant
    Filed: June 13, 2006
    Date of Patent: May 4, 2010
    Assignee: Basler AG
    Inventors: Björn Schomann, Ralf Brachmann, Friedrich Diercks, Michael Schmidt
  • Patent number: 7699733
    Abstract: In a chain transmission, vibration reduction is improved by an elastic member, sandwiched between an inner hub of a sprocket and a toothed outer circumferential member, in combination with a sprocket tooth configuration in which two or three different tooth form pitch angles are arranged irregularly along the sprocket's pitch circle.
    Type: Grant
    Filed: December 4, 2007
    Date of Patent: April 20, 2010
    Assignee: Tsubakimoto Chain Co.
    Inventors: Shunji Sakura, Akira Hirai
  • Patent number: 7699948
    Abstract: A manufacturing method of a Ta sputtering target in which a Ta ingot or billet formed by melting and casting is subject to forging, annealing, rolling processing and the like to prepare a sputtering target, wherein the ingot or billet is forged and thereafter subject to recrystallization annealing at a temperature of 1373K to 1673K. As a result of improving and devising the forging process and heat treatment process, the crystal grain diameter can be made fine and uniform, and a method of stably manufacturing a Ta sputtering target superior in characteristics can be obtained thereby.
    Type: Grant
    Filed: July 29, 2003
    Date of Patent: April 20, 2010
    Assignee: Nippon Mining & Metals Co., Ltd.
    Inventor: Kunihiro Oda
  • Patent number: 7699965
    Abstract: Proposed is a zinc oxide-based transparent conductor characterized in having zinc oxide as its primary component, containing an element at 1 to 10 atomic % which has a smaller ion radius than zinc in the zinc oxide and serves as an n-type dopant for the zinc oxide, and containing nitrogen in which the atomicity ratio of nitrogen in relation to the n-type dopant (nitrogen/n-type dopant) is 0.3 to 0.6. In the development of a transparent conductor that does not contain In, which is an expensive raw material with concern of resource depletion, the limit of the conventional development technique known as the single-dopant method is exceeded, a guide to dopant selection as a specific means for realizing the co-doping theory is indicated, and a transparent conductor having low resistivity is provided.
    Type: Grant
    Filed: February 19, 2007
    Date of Patent: April 20, 2010
    Assignee: Nippon Mining & Metals Co., Ltd.
    Inventors: Masakatsu Ikisawa, Masataka Yahagi
  • Patent number: 7695527
    Abstract: Provided are high purity copper sulfate wherein the content of Ag impurities is 1 wtppm or less, and having a purity of 99.99 wt % or higher, and a manufacturing method of high purity copper sulfate including the steps of dissolving crude copper sulfate crystals or copper metal, and subjecting this to active carbon treatment or solvent extraction and active carbon treatment in order to realize recrystallization. The present invention aims to provide a manufacturing method of high purity copper sulfate capable of efficiently removing impurities at a low cost by dissolving commercially available copper sulfate crystals in purified water or acid and thereafter subjecting this to the refining process, and high purity copper sulfate obtained thereby.
    Type: Grant
    Filed: July 28, 2004
    Date of Patent: April 13, 2010
    Assignee: Nippon Mining & Metals Co., Ltd
    Inventors: Yuichiro Shindo, Kouichi Takemoto
  • Patent number: 7691172
    Abstract: Provided is iron-based metal powder for powder metallurgy including a metallic soap containing at least one or more types selected from a group of Ag, Au, Bi, Co, Cu, Mo, Ni, Pd, Pt, Sn, Te and W having a higher standard oxidization potential than iron, and an iron sintered body having a rust prevention function, wherein at least one or more types of metallic soap selected from a group of Ag, Au, Bi, Co, Cu, Mo, Ni, Pd, Pt, Sn, Te and W having a higher standard oxidization potential than iron is added to iron-based metal powder for powder metallurgy, and sintering is performed thereto. As a result, obtained is mixed powder for powder metallurgy capable of improving the rust prevention effect easily without having to hardly change the conventional processes.
    Type: Grant
    Filed: August 5, 2005
    Date of Patent: April 6, 2010
    Assignee: Nippon Mining & Metals Co., Ltd.
    Inventors: Toru Imori, Atsushi Nakamura, Yasushi Narusawa, Masataka Yahagi
  • Patent number: 7691884
    Abstract: Compounds of Formula (I), wherein R1, R2, R3, R4, R5, R6, T, W, X, Y and Z are as defined herein are provided, together with pharmaceutically acceptable salt, hydrates and/or prodrugs thereof. Methods of using these compounds for determining ?-amyloid levels in a subject are described.
    Type: Grant
    Filed: March 16, 2005
    Date of Patent: April 6, 2010
    Assignees: Wyeth, ArQule, Inc.
    Inventors: Anthony Frank Kreft, Derek C. Cole, Kevin R. Woller, Joseph R. Stock, George Diamantidis, Dennis M. Kubrak, Kristina M. Kutterer, William J. Moore, David S. Casebier
  • Patent number: 7691020
    Abstract: In a roller or bushing chain transmission a standard roller or bushing chain having a uniform chain pitch meshes with a sprocket having at least two different tooth form pitches.
    Type: Grant
    Filed: June 25, 2007
    Date of Patent: April 6, 2010
    Assignee: Tsubakimoto Chain Co.
    Inventors: Shunji Sakura, Akira Hirai, Masatoshi Sonoda
  • Patent number: 7687666
    Abstract: Processes for preparing amino alcohols or salts thereof and sulfonamide substituted alcohol compounds are provided. Desirably, the sulfonamide substituted alcohol compounds are heterocyclic sulfonamide trifluoroalkyl-substituted alcohol compounds or phenyl sulfonamide trifluoroalkyl-substituted alcohol compounds.
    Type: Grant
    Filed: February 15, 2007
    Date of Patent: March 30, 2010
    Assignee: Wyeth
    Inventors: Anita Wai-Yin Chan, Jianxin Ren, Mousumi Ghosh, Arkadiy Rubezhov, Panolil Raveendranath, Joseph Zeldis
  • Patent number: 7686718
    Abstract: In the timing drive of an internal combustion engine, cyclic variations in chain tension, in the span traveling from a camshaft sprocket toward the crankshaft sprocket are leveled by synchronous reciprocating movement of a guide in sliding contact with that span of chain. The maximum rearward speed of the guide coincides approximately with the maximum tension in the span of chain, and the maximum forward speed of the guide coincides approximately with the minimum tension in the chain.
    Type: Grant
    Filed: July 6, 2007
    Date of Patent: March 30, 2010
    Assignee: Tsubakimoto Chain Co.
    Inventors: Yoshikazu Nakano, Kohei Kunimatsu
  • Patent number: 7686985
    Abstract: Provided is a high density gallium oxide-zinc oxide series sintered body sputtering target for forming a transparent conductive film containing 20 to 500 mass ppm of aluminum oxide. In a gallium oxide (Ga2O3)-zinc oxide (ZnO) series sputtering target (GZO series target) for forming a transparent conductive film, trace amounts of specific elements are added to obtain a target capable of improving the conductivity and the bulk density of the target; in other words, capable of improving the component composition to increase the sintered density, inhibit the formation of nodules, and prevent the generation of an abnormal electrical discharge and particles. Also provided are a method for forming a transparent conductive film using such a target, and a transparent conductive film formed thereby.
    Type: Grant
    Filed: May 30, 2006
    Date of Patent: March 30, 2010
    Assignee: Nippon Mining & Metals Co., Ltd
    Inventor: Kozo Osada
  • Patent number: 7682529
    Abstract: Provided is a high density gallium oxide-zinc oxide series sintered body sputtering target for forming a transparent conductive film containing 20 to 2000 mass ppm of zirconium oxide. In a gallium oxide (Ga2O3)-zinc oxide (ZnO) series sputtering target (GZO series target) for forming a transparent conductive film, trace amounts of specific elements are added to obtain a target capable of improving the conductivity and the bulk density of the target; in other words, capable of improving the component composition to increase the sintered density, inhibit the formation of nodules, and prevent the generation of an abnormal electrical discharge and particles. Also provided are a method for forming a transparent conductive film using such a target, and a transparent conductive film formed thereby.
    Type: Grant
    Filed: June 6, 2006
    Date of Patent: March 23, 2010
    Assignee: Nippon Mining & Metals Co., Ltd.
    Inventor: Kozo Osada
  • Patent number: 7674813
    Abstract: Compounds useful for lowering beta amyloid levels are provided. The compounds have the structure of formula Ia: wherein, R1 is lower alkyl, substituted lower alkyl, phenyl, substituted phenyl, benzyl, substituted benzyl, benzyloxy, substituted benzyloxy, or SO2R5; R5 is phenyl, substituted phenyl, heterocycle, substituted heterocycle, alkyl, or substituted alkyl; R2 is lower alkyl, substituted lower alkyl, CF3, alkenyl, substituted alkenyl, alkynyl, substituted alkynyl, phenyl, substituted phenyl, or cycloalkyl; R3 is hydrogen, lower alkyl, or substituted lower alkyl; R4 is phenyl, substituted phenyl, heterocycle, substituted heterocycle, thiophene, or substituted thiophene; R6 is hydrogen, lower alkyl, substituted lower alkyl, CF3, alkenyl, substituted alkenyl, alkynyl, substituted alkynyl, phenyl, substituted phenyl, cycloalkyl, or substituted cycloalkyl; W, X and Y are independently CR7 or N; and R7 is hydrogen, halogen, lower alkyl, or substituted lower alkyl.
    Type: Grant
    Filed: June 19, 2008
    Date of Patent: March 9, 2010
    Assignee: Wyeth
    Inventors: Lynn Resnick, Donna M. Huryn, Joan E. Sabalski, Joshua D. Berkowitz, Anthony Frank Kreft, Dennis Martin Kubrak, Thomas Joseph Caggiano, Koi Michele Morris
  • Patent number: RE41253
    Abstract: This invention provides the use of a combination of CCI-779 and EKB-569 in the treatment of neoplasms.
    Type: Grant
    Filed: October 26, 2007
    Date of Patent: April 20, 2010
    Assignee: Wyeth
    Inventors: John Leo Considine, Sylvain Daigneault, Warren Chew, Silvio Iera, Scott Duncan, Jiaxin Ren