Abstract: The present invention provides a process for improved incorporation of diallyldimethylammonium chloride (DADMAC) into an acrylamide polymer. This invention makes use of a copolymerizable promoter monomer. Also provided by the present invention are inverse emulsion terpolymers of diallyldimethylammonium chloride. The improved incorporation resides in the use of a promoter monomer that is more reactive with acrylamide than is the DADMAC monomer and is selected from ##STR1## wherein R is --H or CH.sub.3 ;X is --O--, or --NH--;n has a value of 2-4; andA is an ion selected from the group consisting of Cl.sup. -, CH.sub.3 SO.sub.4.sup.-, HSO.sub.4.sup.- and NO.sub.3.sup.-.Specific monomers within this formula included, for example, 2-methacryloylethyltrimethylammonium chloride and 2-acryloylethyltrimethylammonium chloride.Typical of such promoter monomers are 2-methacryloylethyl trimethyl ammonium chloride and 2-acryloylethyl trimethyl ammonium chloride.

Abstract: A gaseous mixture of SF.sub.6, a nitriding gas component and an oxidizer gas component is disclosed as an effective SiO.sub.2 etchant having enhanced selectively for use in either the plasma or reactive ion etch process. By adding an oxidizing gas to the SF.sub.6 nitriding gas plasma etchant, the selectively for SiO.sub.2 over silicon or polysilicon is marked improved. The optional addition of an inert diluent gas did not substantially change these results.

Abstract: A novel class of copolymeric negative photoresists is provided whose sensitivity is based upon the presence of .alpha.-chloro ketone moieties. The general structure for the monomers from which the copolymers can be formed is: ##STR1## where R is a substituent selected from 1 to 6 carbon alkyl and halogen substitutes alkyl, phenyl, and halogen substituted phenyl and napthyl and the comonomers are comonomers selected from the group consisting of 1-4 carbon alkyl acrylates and methacrylates, styrene vinyl toluene and vinyl acetate and may include additionally other comonomers that are compatible and have the polymerizable >C.dbd.C< group. The copolymers form crosslinked networks and provide useful negative photoresists which are sensitive in the ultraviolet wavelength range of between about 200 nm to 300 nm.

Abstract: Azeotrope-like compositions comprising of trichlorotrifluoroethane, ethanol, acetone, nitromethane and hexane are stable and have utility as degreasing agents and as solvents in a variety of industrial cleaning applications.

Abstract: Polyalkylene imines containing 2-hydroxypropyltrimethylammonium salt side chains are obtained by reaction between alkylene imine polymers and copolymers and a glycidyltrimethylammonium salt. These polymers are very effective flocculants, particularly in the area of water clarification. They are obtained from a variety of sources, e.g. by modification of either commercial polyethylene imines or polymers derived from oxazolines, and oxazinolines, from the polymerization of aziridine monomers or from the condensation of a low molecular weight polyamine and a dihaloalkane.

Abstract: A stable creosote product is prepared from which little or no sludge heel settles and which does not require heat to be applied to prevent settling out of solids. The stable product is obtained by a method that mechanically reduces the particle size or the salts that form upon cooling below the limpid point. The layer of salt which settles on the bottom of the beaker is then mechanically broken and homogenized. The fine salts which had previously settled and were homogenized, did not resettle but remained relatively evenly dispersed throughout the mixture and remained dispersed even after prolonged periods of uninterrupted standing. The salts are not allowed to settle before homogenizing. Little or no heel formation was detected in the creosote in which the settled and material was homogenized as described.

Abstract: The use of TiO.sub.2 spin-on glass films for reduction of electrostatic charging of a semiconductor substrate upon electron beam exposure is described. Specifically, the disclosure relates to electron beam lithographic processing during semiconductor device or mask fabrication. The TiO.sub.2 glass films may also be utilized for charge dissipation during ion implantation. A thin TiO.sub.2 composition spin-on glass film is used as a charge dissipation layer. This mechanism is effective as a resolution enhancement mechanism during electron beam or ion beam processing of semiconductors. The TiO.sub.2 composition films are prepared from spin-on materials that consist of partially hydrolyzed organotitanium species dissolved in organic solvents which produce glassy films of TiO.sub.2 upon application to silicon and other substrates and subsequent heating. The films are completely amorphous, have extremely low pinhole and particulate densities, are uniform in thickness and free of radial striations.

Abstract: The preparation of anhydrous, pure, crystalline N-(3-chloro-2-hydroxypropyl) trialkylammonium salts is disclosed by a process entailing reaction of epichlorohydrin with a trimethylammonium salt in an organic solvent which is a solvent for the two reactants and a non-solvent for the reaction product.A fine crystalline, chemically pure, anhydrous N-(3-chloro-2-hydroxypropyl) trimethylamine hydrochloride is produced by a process that does not entail an aqueous medium or the use of gaseous trimethylamine. The process comprises reacting trimethylammonium chloride with epichlorohydrin in an organic solvent which is a solvent for either of the two reactants and a non-solvent for the reaction product. Though a number of organic solvents may be used, it was found that chloroform was particularly suited. The reaction proceeds readily at temperatures within the range of 0.degree. to 50.degree. C.

Abstract: Photoresist materials that are sensitive in suitable range including the 200 nm to 300 nm ultraviolet radiation range are provided which permit relatively higher resolution and thus a higher information density in microcircuits. The positive photoresist materials are copolymers of(a) monomers selected from those of 1,4-disubstituted-2-butene-1,4-diones of the general structures of ##STR1## wherein R.sub.1, R.sub.2 are the same or different and are substituent selected from the group of 1 to 6 carbon atom alkyl and halogen substitutes alkyl radicals methoxy and ethoxy radicals, aryl, halogen substituted aryl, alkyl substituted aryl, alkoxy substituted aryl, nitro substituted aryl, cyano substituted aryl and amino substituted aryl radicals, and benzyl, naphthyl and anthryl radicals with(b) at least one vinylidene monomer of the general formula ##STR2## where R.sub.3 represents hydrogen, halogen or an alkyl group, and R.sub.

Abstract: Azeotrope-like compositions comprising trichlorotrifluoroethane, ethanol, nitromethane and 2-methylpentane or a mixture of hexanes which are stable and have utility as degreasing agents and as solvents in a variety of industrial cleaning applications.

Abstract: A method for treating process waste consisting of uranium hexafluoride, UF.sub.6, molybdenum hexafluoride, MoF.sub.6 and molybdenum oxytetrafluoride, MoOF.sub.4 is provided wherein the foregoing mixture is hydrolyzed in an aqueous solution of ammonium carbonate and ammonium hydroxide. The resulting mother liquor is digested at 60.degree.-80.degree. C. to drive off carbon dioxide and convert the ammonium uranyl carbonate, (NH.sub.4).sub.4 UO.sub.2 (CO.sub.3).sub.3 to ammonium diuranate, (NH.sub.4).sub.2 U.sub.2 O.sub.7. The pH is maintained above 9 to prevent premature precipitation of the molybdenum values as molybdic acid or uranyl molybdate.The ammonium diuranate which forms as a yellow solid is filtered, slurried in aqueous ammonium hydroxide, filtered and dried. The yield is quantitative. Pyrolysis results in conversion of the diuranate salt to uranium oxide, U.sub.3 O.sub.8, of suitable purity to be recycled in the uranium hexafluoride production process.

Abstract: Allyl phosphonate diesters are converted to vinyl phosphonate diesters by isomerization with a catalytically effective amount of one or more metal hydroxide catalysts.

Abstract: BF.sub.3 based mixtures for selectively etching thin layers of silicon dioxide over silicon for use in the plasma etch process for integrated circuits manufacture is disclosed.In the process, when trace amounts of formaldehyde are added to the etch system the rate on oxide inceases markedly. The effect on the silicon is not substantial. The optional addition of an inert diluent gas did not substantially change these results.

Abstract: A polymeric borazole is produced by reacting BCl.sub.3 and an amine at temperatures between -60.degree. C. and -5.degree. C. in an inert solvent to form an intermediate triaminoborane, and then further polymerizing the intermediate after removal of the amine hydrochloride salt via thermal condensation at a temperature in the range of 380.degree. C. to 420.degree. C. This polymer, in the form of a glassy resin, and other borazole polymers derived by the polymerization of monomers of the formula(XBNY).sub.3wherein X and Y are used to designate the indicated position of H, OH, OR halogen, amino and R, substituents on the polymer and wherein R is selected from the group consisting of alkyl radicals of 1-4C atoms, cyclohexyl, phenyl and methyl and ethyl substituted phenyl radicals is dissolved in toluene or xylene at the 1 to 20% (wt/wt) level.

Abstract: The present invention is directed to a method of separating and purifying palladium which is present in a solution with at least one other platinum group metal by adjusting the pH of the solution to from about 0 to 5, contacting the acidified solution with an ortho alkoxy substituted phenyl oxime of the formula: ##STR1## or a composition comprising of one or more of said compounds dissolved in an organic solvent, wherein:n is an integer of from 1 to 4;R.sub.1 is alkyl, cycloalkyl, or aralkyl; andR.sub.2 is nitro, halogen, hydrogen or substituted ro unsubstituted alkyl, alkoxy, aryloxy, cycloalkyl, aryl, aralkyl or alkaryl, wherein permissible substituents are those which are inert to process conditions; andR.sub.

Abstract: The present invention provides an apparatus useful for the removal of inclusions from a molten ferrous-based alloy in a continuous casting process. The apparatus includes a replaceable barrier to flow, that has numerous perforations. The individual perforations disturb molten alloy flow sufficiently to enhance inclusion agglomeration. As a result, molten alloy exiting from the perforations is agglomerated inclusions-enriched, compared to molten alloy entering the perforations. The agglomerated inclusions are enabled to float to the molten alloy surface prior to exiting from a tundish in which the replaceable barrier is used. Also provided by the present invention is an improved continuous casting process.

Abstract: Negative photoresist materials are provided that are sensitive in the deep ultraviolet (UV) light range of about 200 nm-300 nm. These materials permit higher resolution then those sensitive to longer wavelengths and thus a higher information density in the microcircuits manufactured using them. This sensitivity in the deep UV is obtained without loss of the other normal attributes of a resist material: good adhesion to substrates, good contrast in images formed, and good etch resistance properties.The polymeric negative photoresist molecules are the homopolymers of N-benzyl acrylamide and its analogues of the general structure ##STR1## where R=alkyl, aryl, halogen, or nitrogen, and copolymers thereof with at least one vinylidene monomer of the general formula ##STR2## wherein R.sub.2 and R.sub.

Abstract: A device for measuring the clamping force of a nut and bolt assembly is disclosed. The device includes a pair of adjacent, parallel metal plates each having a passage therethrough, which are in axial alignment with each other. Positioned between the plates is some pressure sensing means for sensing pressure, such as hydraulic cylinder, which is in pressure transmitting communication with some pressure measuring device, as for example a pressure gauge.

Abstract: The present invention is a process to form a composition comprising from 5 to 50% by weight and preferably from 10 to 30% by weight polycaprolactam and from 50 to 95% by weight and preferably 70 to 90% by weight poly(hexamethylene adipamide). The process comprises heating the composition to from 440.degree. to 505.degree. F. and preferably 450.degree. to 485.degree. F. The preferred forming process is to form the composition into a film.

Abstract: An improvement is provided for the manufacture of perhalogenated polymer, e.g., PTFE, bonded electrodes.The formulation comprises a mixture of an active material is carbon monofluoride (otherwise known as fluorinated graphite or fluorinated carbon or CF.sub.x or (C.sub.2 F).sub.n); a conductive carbon additive, such as acetylene black or graphite; and polytetrafluoroethylene (PTFE).The process comprises high shear mixing to cause the PTFE to fibrillate. The mixture is then wet with a non-polymeric pore-former to make the mixture more pliable and to create micropores in the electrode when the solution is removed by evaporation. The wet mixture is then sequentially suitably formed into a, e.g., extruded, or calendered or pressed to flatten the mixture to a thin sheet and rolled up and folded and pressed out again until a uniform sheet is obtained and the like.