Patents Represented by Attorney Robert L. Goldberg
  • Patent number: 6632344
    Abstract: The invention is directed to a process for electroplating a non-conducting surface such as through-hole walls within a printed circuit board substrate. The process comprises formation of a conductive oxide coating over a substrate, preferably by immersion of said substrate in an aqueous oxidative desmear solution for a time sufficient to form a coating containing conductive dielectric oxidation residue and then, in the absence of a step of forming an additional conductive coating over the residue coating or removing the coating, electroplating metal onto said surface by immersion of the substrate having the coating in an electroplating solution.
    Type: Grant
    Filed: March 24, 2000
    Date of Patent: October 14, 2003
    Inventors: Robert L. Goldberg, Michael Gulla
  • Patent number: 6105960
    Abstract: Machine for playing competition and leisure game between two participants who can compete by actuation of a chip which floats on a gameboard by means of air blown from orifices provided in the board itself and which has underneath a high pressure chamber forming part of a closed circuit of air pressures. The chip is actuated by means of control systems, which are comprised of linear displacement bodies incorporating impulsers which act controllably as a function of the situation of push-buttons and presence sensors of the control unit. The goals are obtained by succeeding in making the chip go beyond the goal lines which are defended by the control systems; once the chip has passed over the goal line, it goes into the corresponding goal area wherein the chip is detected and the point is accounted for whereafter the chip may be taken out back to the playboard.
    Type: Grant
    Filed: March 19, 1997
    Date of Patent: August 22, 2000
    Inventor: Jose Antonio Carames
  • Patent number: 5942558
    Abstract: A storage solution for a hydrogel contact lens comprising a material having polar groups at one end and non-polar groups at the other end. The storage solution desirably further contains an oil. The material comprising polar and non-polar groups modifies the surface properties of the lens and facilitating the formation of a lipid layer over the lens.
    Type: Grant
    Filed: October 1, 1997
    Date of Patent: August 24, 1999
    Assignee: Ocular Research of Boston, Inc.
    Inventor: Donald R. Korb
  • Patent number: 5932389
    Abstract: This invention relates to alternating and block copolymer resins of uniform and controlled chain length and methods for preparing the same. The alternating copolymer resins are formed from the reaction of a bisoxymethylphenol, a reactive phenolic compound and a monooxymethylphenol. The alternating copolymer may then be further reacted with a second reactive compound in the presence of an aldehyde to form the substantially blocked copolymer. The resins of the invention are characterized by a low molecular weight distribution. The resins are useful for the formulation of high resolution photoresist materials.
    Type: Grant
    Filed: February 20, 1998
    Date of Patent: August 3, 1999
    Assignee: Shipley Company, L.L.C.
    Inventor: Anthony Zampini
  • Patent number: 5917024
    Abstract: A photoresist composition comprising an alkali soluble resin and the reaction product of an ortho-naphthoquinone diazide sulfonic acid ester and a vinyl ether. In use, the photoresist is characterized by having at least a portion of the hydroxyl groups on the alkali soluble resin reacted with the photoactive compound and then deblocked by acid generation.
    Type: Grant
    Filed: February 20, 1998
    Date of Patent: June 29, 1999
    Assignee: Shipley Company, L.L.C.
    Inventors: Roger F. Sinta, Daniel Y. Pai
  • Patent number: 5910394
    Abstract: Negative photoimageable compositions are disclosed which contain a radiation sensitive component for producing an acid when subjected to radiation at wavelengths of 320 to 420 nanometers, a resin binder and a reactive oligomer. The compositions are useful in constructing printed circuits and integrated circuit packages.
    Type: Grant
    Filed: June 18, 1997
    Date of Patent: June 8, 1999
    Assignee: Shipley Company, L.L.C.
    Inventor: James G. Shelnut
  • Patent number: 5900346
    Abstract: The present invention relates to novel compositions that contain an activator system that comprises a photoactivator, acid generator and chain extender. Methods and articles of manufacture that comprise such compositions are also provided. In a preferred aspect, the compositions are photoimageable.
    Type: Grant
    Filed: February 28, 1997
    Date of Patent: May 4, 1999
    Assignee: Shipley Company, L.L.C.
    Inventors: Roger F. Sinta, Juan C. Scaiano, Gary S. Calabrese
  • Patent number: 5887789
    Abstract: A foam break device and a system for use of said device. The system comprises an outlet tube for a filling machine using an air gap proportioner. The device has a plurality of vanes and beveled edges for positioning in the bottom of the outlet tube of the filling machine. The device reduces the amount of foam discharged from the system.
    Type: Grant
    Filed: June 12, 1997
    Date of Patent: March 30, 1999
    Assignee: The Butcher Company
    Inventor: Glenn Louis Szabo
  • Patent number: 5886102
    Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly for deep UV applications. The ARCs of the invention in general comprise a crosslinker and novel ARC resin binders that effectively absorb reflected deep UV exposure radiation.
    Type: Grant
    Filed: June 11, 1996
    Date of Patent: March 23, 1999
    Assignee: Shipley Company, L.L.C.
    Inventors: Roger F. Sinta, Timothy G. Adams, James Michael Mori
  • Patent number: 5885343
    Abstract: The adsorption of cationic dyes on nanosize negatively charged silica particles to form colored pigments is disclosed. The dyes are chemisorbed and their uptake is controlled by the strong chemical reaction between the negative surface of the adsorbent silica particles preferably with sodium counter ions and the positive charge of the dyes. The prepared pigments are useful in the formation of color films and their optical properties are described. Photoresists using nanosized pigments are also disclosed herein which are useful in making color filters for liquid crystal displays.
    Type: Grant
    Filed: May 30, 1997
    Date of Patent: March 23, 1999
    Assignee: Shipley Company, L.L.C.
    Inventors: George J. Cernigliaro, Egon Matijevic, Daniel Y. Pai, Todd A. Richardson
  • Patent number: 5879856
    Abstract: Photoresist compositions are provided comprising 1) a resin binder having photoacid-labile groups, 2) an acid generator and 3) a photospeed control agent. Photoresists of the invention exhibit good photospeed and can provide highly resolved relief images of small dimensions, including lines of sub-micron and sub-half micron dimensions with at least essentially vertical side walls. Methods are also provided that include control of photospeed of a photoresist composition of the invention.
    Type: Grant
    Filed: December 5, 1995
    Date of Patent: March 9, 1999
    Assignee: Shipley Company, L.L.C.
    Inventors: James W. Thackeray, Peter R. Hagerty
  • Patent number: 5879738
    Abstract: An apparatus and method for treating the walls of apertures passing through a planar substrate with a fluid treatment solution. The method comprises placement of a pressurized fluid wedge beneath, above, or both beneath and above a planar substrate as it passes through a treatment chamber. The apparatus that forms the fluid wedge is a roller assembly comprising a roller within a shroud which carries fluid as it rotates through a gap between the roller and the shroud. The roller provides the dual function of forming the fluid wedge and conveying the planar substrate through the treatment chamber.
    Type: Grant
    Filed: May 21, 1997
    Date of Patent: March 9, 1999
    Assignee: Allan H. McKinnon
    Inventors: Allan H. McKinnon, Charles R. Kidd, Michael Gulla
  • Patent number: 5876899
    Abstract: A method for making an acrylic resin photoresist characterized by polymerization of an acrylic monomer in a solvent that dissolves all monomers and resultant polymers. The use of the solvent permits formation of acrylic resins suitable for use in the preparation of photoresists without recovery from its reaction mixture. Photoresists prepared from such polymers have improved transparency, especially at exposures of 193 mn or less.
    Type: Grant
    Filed: September 18, 1996
    Date of Patent: March 2, 1999
    Assignee: Shipley Company, L.L.C.
    Inventors: Charles R. Szmanda, Gary N. Taylor, Robert L. Brainard, Manuel DoCanto
  • Patent number: 5871872
    Abstract: The adsorption of anionic dyes on nanosize alumina modified silica particles to form colored pigments is disclosed. The dyes are chemisorbed and their uptake is controlled by the strong chemical reaction between positive surface of the absorbent and negative charge of the adsorbates. The prepared pigments are useful in the formation of color films and their optical properties are described. Photoresists using nanosized pigments are also disclosed herein which are useful in making color filters for liquid crystal displays.
    Type: Grant
    Filed: May 30, 1997
    Date of Patent: February 16, 1999
    Assignee: Shipley Company, LL.C.
    Inventors: Egon Matijevic, George J. Cernigliaro, Yie-Shein Her, Daniel Y. Pai, Todd A. Richardson
  • Patent number: 5867823
    Abstract: The present invention relates to a maintenance analysis and instruction system particularly useful for a retail center such as a grocery store. In preferred aspects, the invention provides systems and methods that comprise a portable-device that can instruct a retail center or other worker to attend to various incidents that may occur at a retail center or other location such as product spills, and systems and methods for maintaining an accurate and reliable record of sweeping, mopping and other tasks completed at the retail center. In another preferred aspect, the invention provides systems and methods for accurately tracking work completed at the retail center or other location such as sweeping, spill clean-up or inspection of various areas of the retail center or other location.
    Type: Grant
    Filed: September 15, 1995
    Date of Patent: February 2, 1999
    Assignee: The Butcher Company, Inc.
    Inventor: Owen Richardson
  • Patent number: 5866299
    Abstract: A photoresist composition and process that minimizes the effect of photogenerated acid migration. The photoresist comprises an alkali soluble resin, a photoacid generating compound that undergoes photolysis within a wavelength of from 330 to 700 nm to yield a strong acid, a crosslinking agent capable of crosslinking the composition when activated by photogenerated hydrohalide acid and a buffer comprising a mixture of an organic carboxylic acid and a strong base having a pK.sub.b of 5 or less present in a concentration sufficient to immobilize from 0.1 to 25 mole percent of photogenerated acid. The buffer is responsible for immobilization of the acid.
    Type: Grant
    Filed: June 18, 1997
    Date of Patent: February 2, 1999
    Assignee: Shipley Company, L.L.C.
    Inventors: Charles R. Szmanda, Peter Trefonas, III
  • Patent number: 5861231
    Abstract: The present invention provides novel copolymers and photoresist compositions that contain such copolymers as a resin binder component. Preferred copolymers include three distinct repeating units: 1) units that contain acid-labile groups; 2) units that are free of both reactive and hydroxy moieties; and 3) units that contribute to aqueous developability of a photoresist containing the copolymer as a resin binder. Photoresists of the invention exhibit surprising lithographic improvements including substantially enhanced plasma etch resistance and isolated line performance as well as good dissolution rate control.
    Type: Grant
    Filed: June 11, 1996
    Date of Patent: January 19, 1999
    Assignees: Shipley Company, L.L.C., IBM Corporation
    Inventors: George G. Barclay, Michael F. Cronin, Ronald A. Dellaguardia, James W. Thackeray, Hiroshi Ito, Greg Breyta
  • Patent number: 5858605
    Abstract: A photoresist composition comprising an alkali soluble resin and the reaction product of an ortho-naphthoquinone diazide sulfonic acid ester and a vinyl ether. In use, the photoresist is characterized by having at least a portion of the hydroxyl groups on the alkali soluble resin reacted with the photoactive compound and then deblocked by acid generation.
    Type: Grant
    Filed: March 8, 1997
    Date of Patent: January 12, 1999
    Assignee: Shipley Company, L.L.C.
    Inventors: Roger F. Sinta, Daniel Y. Pai
  • Patent number: 5858198
    Abstract: A process for electroplating a metal clad substrate by coating the substrate with a coating of carbonaceous particles. The coating of particles is applied to the substrate from an aqueous dispersion and then the coating is saturated with an etchant for the metal cladding on the substrate to undercut the carbonaceous coating and facilitate its removal from areas where plating is undesired.
    Type: Grant
    Filed: September 8, 1997
    Date of Patent: January 12, 1999
    Assignee: Shipley Company, L.L.C.
    Inventors: Steven M. Florio, Jeffrey P. Burress, Carl J. Colangelo, Edward C. Couble, Mark J. Kapeckas
  • Patent number: 5853953
    Abstract: The invention provides novel polymers and photoresist compositions that comprise a photoactive component and use such polymers as a resin binder component. The polymers of the invention in general comprise at least one repeating unit that includes a moiety that has a high carbon content, and preferably is an aromatic group. Preferred polymers of the invention comprise at least one repeating unit that includes a moiety that is an extended aromatic ring, or polycyclic aromatic ring system containing 2 or more rings, preferably at least two of the rings being fused, and from about 3 to 8 ring members in each ring. Photoresists of the invention include both positive-acting and negative-acting compositions and contain a resin binder component that comprises the described polymer.
    Type: Grant
    Filed: September 6, 1996
    Date of Patent: December 29, 1998
    Assignee: Shipley Company, L.L.C.
    Inventor: Jacque H. Georger, Jr.