Abstract: The invention is a process of removing metal ion contaminants from an organic solution, especially one having acid labile components. The process comprises modifying a cationic exchange resin by treatment with ammonia or amine and contacting said modified ion exchange resin with an organic solution containing metal ion contaminants. The process is especially useful for treating photoresist compositions.

Abstract: A process for electroplating a nonconducting substrate comprising formation of a film of a conductive polymer on the surface of a nonconducting substrate and electrolytic deposition of metal thereover. The conductive film is formed by deposition of the conductive polymer onto said surface from an aqueous suspension of said polymer containing a polymeric stabilizer having repeating alkylene oxide groups and a hydrophilic--lipophilic balance of at least 10.

Abstract: A method for manufacturing a color liquid crystal display device is available where light-blocking layers are provided for the color filter stripes on a pixel-by-pixel basis by inserting the light-blocking layers between stripes of transparent conductive films that are already striped as scanning electrodes. The manufacturing method is characterized by the steps of the formation of a transparent conductive film on a first transparent substrate, patterning of the transparent conductive film by coating the transparent conductive film with a colored, positive resist, exposure and development, coating of patterned transparent conductive films with a blackened, negative resist, formation of black stripes of the negative resist between the patterned transparent conductive films by performing back exposure through the first transparent substrate and development, and the removing the positive resist remaining on the patterned transparent conductive films.

Abstract: A photoresist composition comprising an alkali soluble resin, an o-naphthoquinone diazide sulfonic acid ester photoactive compound, and a vinyl ether compound. The o-naphthoquinone diazide sulfonic acid ester is replaced in part with the vinyl ether composition to decrease the concentration of the photoactive compound while increasing the photospeed of the composition.

Abstract: The instructional method of the present invention demonstrates each portion of a Material Safety Data Sheet (MSDS) to the user, using a multimedia equipped computer, in an interactive manner. The MSDS is displayed on the screen and the user can use the mouse, for example, to click onto various portions of the displayed MSDS. Once the user has clicked onto an MSDS portion, the multimedia computer presents the user with an instructional demonstration, using, for example, spoken word, computer graphics, photographs and video, of the information contained in that portion of the MSDS.

Abstract: A photoresist composition comprising an alkali soluble resin and an ortho-naphthoquinone diazide sulfonic acid ester of a polyhydroxy alcohol. The photoresist is characterized by having at least a portion of its free hydroxyl groups on the photoactive compound blocked with an acid labile blocking group that generates a hydroxide upon cleavage.

Abstract: Reduction of reflection from an integrated circuit substrate during exposure of a photoresist layer on a surface such as an integrated circuit wafer is minimized by incorporating an antireflective coating between the photoresist layer and the integrated circuit substrate. The antireflective layer, after exposure and development of the photoresist layer, is preferably removed by exposing the non-masked antireflective layer to activating radiation while heating the coating to induce a solubilizing reaction in an antireflective coating and a curing reaction in an overlying photoresist mask. Thereafter, the exposed portions of the antireflective layer are removed by treatment with a suitable developer.

Abstract: A process for electroplating a metal clad substrate by forming a sacrificial coating over the metal cladding and then coating the substrate with a coating of carbonaceous particles. The coating of particles is applied to the substrate from an aqueous dispersion and then the coating is contacted with an etchant for the sacrificial coating to undercut the carbonaceous coating and facilitate its removal from areas where plating is undesired.

Abstract: A radiation sensitive composition, process for using said composition, and substrates coated with said composition. The photoimageable composition comprises a photobase generator compound, a resin binder and a material capable of crosslinking in the presence of base. In preferred aspects, the invention provides a negative-acting, aqueous developable photoimageable composition comprising a photobase generator compound, a resin binder which preferably is a phenolic polymer, a crosslinking agent that comprises one or more active groups that will undergo base-initiated crosslinking, and a curing agent.

Abstract: A new photoactive compound for use in the formulation of a photoresist comprises a bisphenol compound having an alkyl linkage substituted with a heterocyclic group. The new photoactive compound may be admixed with an alkali soluble resin to formulate a photoresist composition. The new photoactive compounds exhibit enhanced long term solubility in conventional photoresist solvents.

Abstract: A process for electroplating a substrate by coating the substrate with a coating of conductive particles. The coating of conductive particles is applied to the substrate from an unstable aqueous dispersion essentially free of a dispersing agent using physical dispersion means to maintain the stability of the dispersion.

Abstract: A process for electroplating a substrate by coating the substrate with a coating of conductive particles. The coating of conductive particles is applied to the substrate from an aqueous dispersion containing a dissolution agent for metallic regions of the substrate. The dissolution agent removes the top surface of the metal as the conductive particle coating is formed thereby facilitating removal of the same from the metallic regions of the substrate.

Abstract: A resin suitable for use as a photoresist that is the esterification product of an o-quinonediazide compound and an aromatic novolak resin. The aromatic novolak resin may be the condensation product of a reactive phenol with a bis(hydroxymethyl)phenol or an aromatic aldehyde. The aromatic resin may be chain extended by further reaction with an additional aldehyde. The resin has a maximum of 20 percent of its phenolic hydroxyl groups esterified with the o-quinonediazide sulfonate compound.

Abstract: A method and composition for reducing evaporation of an aqueous layer from the surface of the eye. The method comprises applying an admixture of a charged phospholipid and a non-polar oil over the eye, preferably in the form of a meta-stable oil in water emulsion in a dosage not exceeding 100 microliters.

Abstract: An essentially aromatic alkali soluble novolak resin comprising the product resulting from the acid condensation of an aromatic aldehyde and a phenol where the resin has a molecular weight in excess of 1500 and a glass transition temperature in excess of 125.degree. C. If desired, the aromatic novolak resin may be blended with a conventional novolak resin to regulate the glass transition temperature of the resin. The aromatic novolak resin and blends formed therefrom are especially suitable as coating resins and are useful for the formation of photoresist coating compositions.

Abstract: The invention is a process of removing metal ion contaminants from an organic solution, especially one having acid labile components. The process comprises modifying a cationic exchange resin by treatment with ammonia or amine and contacting said modified ion exchange resin with an organic solution containing metal ion contaminants. The process is especially useful for treating photoresist compositions.

Abstract: A color filter assembly comprising a topcoat layer which comprises a composition, wherein the composition in general comprises a crosslinking agent and a reactive resin binder, i.e., a resin that can undergo self-condensation and/or crosslinking with one or more other components of the composition upon thermal treatment or other activation. Preferred resin binders include those resins that contain pendant polar functional groups, particularly acidic moieties such as carboxyl (COOH) and/or hydroxyl (OH). Acrylic resins containing such groups are particularly preferred. Compositions of the invention exhibit low thickness loss and have exceptional light transmission properties. Compositions of the invention are also useful as carriers for pigments and dyes for forming color filter elements.

Abstract: An alkali soluble resin, preferably a phenolic resin, having a portion of its phenolic hydroxyl groups reacted to form a blocking group inert to acid or base. The polymer is used for the formulation of acid hardening photoresists and the presence of the inert blocking group enables development of an exposed photoresist with a strong developer without formation of microbridges between fine line features.

Abstract: Processes for uniformly coating substrates, including applying fluid substantially simultaneously onto at least two sides of a substrate. In one aspect, the invention provides positioning a substrate above one or more fluid applicators, and flowing fluid through the one or more fluid applicators upwardly onto the substrate, the fluid applied with a controlled volume per unit surface area of the substrate. A substrate surface also may be aligned along a substantially vertical plane with fluid being applied laterally. In another aspect, at least one fluid applicator faces a first side of a substrate and at least one applicator faces a second side of the substrate, and fluid flows through the fluid applicators onto the first and second substrate sides, the fluid applied with a controlled volume per unit surface area of the substrate.

Abstract: The invention provides a method for forming a photoresist mask on a substrate resistant to reticulation during plasma etching. The method comprises the steps of forming an imaged and developed photoresist coating over an integrated circuit substrate where the photoresist contains an essentially unreacted acid activated cross linking agent, and subjecting said substrate to an etching plasma in a gaseous stream that contains a Lewis acid. Contact of the surface of the photoresist film with the Lewis acid causes cross linking of the surface of the photoresist film during plasma etching with the formation of a reticulation resistant surface layer.