Patents Represented by Attorney Robert L. Goldberg

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  • Electroplating process and composition
    Patent number: 5415762
    Abstract: A process for electroplating a nonconducting substrate comprising formation of a film of a conductive polymer on the surface of a nonconducting substrate and electrolytic deposition of metal thereover. The conductive film is formed by deposition of the conductive polymer onto said surface from an aqueous suspension of said polymer.
    Type: Grant
    Filed: August 18, 1993
    Date of Patent: May 16, 1995
    Assignee: Shipley Company Inc.
    Inventors: George R. Allardyce, Kevin Bass, John E. Graves, James G. Shelnut
  • Light-sensitive composition and process
    Patent number: 5397685
    Abstract: A photoimageable composition and process for use of the same. The composition comprises a binder that is a mixture of a phenolic resin and a multifunctional epoxy or vinyl compound and a curing system comprising a photoactive compound capable of generating a curing catalyst capable of crosslinking the binder components. The process for use of the composition comprises application of the composition to a substrate, drying of the same, exposing the dried coating to activating radiation, curing the binder in light exposed areas, developing the coating and thermally curing the developed image. The composition is especially useful as a solder mask.
    Type: Grant
    Filed: November 26, 1993
    Date of Patent: March 14, 1995
    Assignee: Shipley Company Inc.
    Inventors: George R. E. Daniels, Michael J. Oddi, Kevin J. Cheetham, Stephen S. Rodriguez
  • Plating catalyst formed from noble metal ions and bromide ions
    Patent number: 5395652
    Abstract: A process and catalyst for electroless plating of metal over a substrate. The process involves providing a catalyst that is the product of reaction of a noble metal with bromide ions where the ratio of bromide ions to noble metal ions is at least 100 to 1 and the noble metal is present in a concentration sufficient to catalyze an electroless plating reaction, contacting a substrate to be plated with the catalyst, and reducing the catalyst prior to or during plating of the substrate.
    Type: Grant
    Filed: January 5, 1994
    Date of Patent: March 7, 1995
    Assignee: Shipley Company Inc.
    Inventors: Roger F. Bernards, Gordon L. Fisher, Wade W. Sonnenberg
  • Keyboard stand
    Patent number: 5395088
    Abstract: The disclosed invention describes a stand used to support a keyboard in an elevated position. The stand may be adjustable so that the angle at which the keyboard is positioned may be changed as desired by the user.
    Type: Grant
    Filed: September 26, 1991
    Date of Patent: March 7, 1995
    Inventor: Jacob J. Ginsberg
  • Additive plating process
    Patent number: 5391421
    Abstract: A method for electroplating over a nonconducting substrate comprising the steps of applying a thin film of a non-metallic conductive coating having a surface resistivity not exceeding 100 megaohms over said substrate, applying an electrically nonconductive coating over said conductive coating, said nonconductive coating having imaged recesses therein and electroplating metal into said recesses. The method is particularly useful for the manufacture of printed circuit boards.
    Type: Grant
    Filed: November 15, 1993
    Date of Patent: February 21, 1995
    Assignee: Shipley Company Inc.
    Inventor: Michael Gulla
  • Processes and compositions for electroless metallization
    Patent number: 5389496
    Abstract: Methods and compositions for electroless metallization. In one aspect, the invention is characterized by the use of chemical groups capable of ligating with an electroless metallization catalyst, including use of ligating groups that are chemically bound to the substrate. In a preferred aspect, the invention provides a means for selective metallization without the use of a conventional photoresist patterning sequence, enabling fabrication of high resolution metal patterns in a direct and convenient manner.
    Type: Grant
    Filed: May 17, 1993
    Date of Patent: February 14, 1995
    Assignees: Rohm and Haas Company, United States of America
    Inventors: Jeffrey M. Calvert, Walter J. Dressick, Gary S. Calabrese, Michael Gulla
  • Photoimageable compositions for electrodeposition
    Patent number: 5384229
    Abstract: The present invention provides photoimageable compositions, processes and articles of manufacture. In particular, the invention provides a process comprising electrophoretically applying a coating layer of a photoimageable composition onto a conductive surface, the composition comprising a material that contains one or more photoacid labile groups. The photoimageable compositions of the invention preferably comprise a photoacid generator, a material that contains one or more acid-clearable functional groups, and a carrier resin that contains one or more functional groups that are, or can be treated to be, at least partially ionized.
    Type: Grant
    Filed: May 7, 1992
    Date of Patent: January 24, 1995
    Assignee: Shipley Company Inc.
    Inventors: Daniel Y. Pai, Stephen S. Rodriguez, Roger F. Sinta
  • Electroplating process and composition
    Patent number: 5374346
    Abstract: A process of electroplating comprising formation of a semiconductive coating over an article having both metallic and non-metallic portions, dissolving the metal surface underlying the semiconductive coating and removing the semiconductive coating by a high pressure water spray. The process is useful for the formation of printed circuit boards.
    Type: Grant
    Filed: August 9, 1993
    Date of Patent: December 20, 1994
    Assignee: Rohm and Haas Company
    Inventors: John J. Bladon, Carl Colangelo, John Robinson, Michael Rousseau
  • Dry eye treatment process and solution
    Patent number: 5371108
    Abstract: A method and composition for reducing evaporation of an aqueous layer from the surface of the eye. The method comprises applying a gel of oil and wax over the eye, preferably in the form of a meta-stable oil in water emulsion in a dosage not exceeding 100 microliters. The gel is formed by gelling a hydrocarbon oil with a wax, preferably dispersed in aqueous medium at a pH of at least about 8.0.
    Type: Grant
    Filed: March 15, 1993
    Date of Patent: December 6, 1994
    Assignee: Ocular Research of Boston, Inc.
    Inventors: Donald R. Korb, Thomas Glonek
  • Method of forming relief image having line width less than 0.35 microns utilizing copolymer binder having phenolic and nonaromatic cyclic alcohol units
    Patent number: 5368993
    Abstract: The present invention relates to photoresists particularly suitable for deep U.V. exposure and having the capability of forming highly resolved features. The invention is characterized by use of a resist resin binder that comprises a nonaromatic cyclic alcohol-phenol copolymer that has a relatively low molecular weight and narrow distribution of molecular weight and cyclic alcohol concentration.
    Type: Grant
    Filed: April 15, 1994
    Date of Patent: November 29, 1994
    Assignee: Shipley Company Inc.
    Inventors: James W. Thackeray, Mark Denison, George W. Orsula
  • Methods for treating photoresists
    Patent number: 5366852
    Abstract: The present invention comprises methods for treating photoresists and forming photoresist relief images, including a method comprising providing a photoresist coating having a crosslinked surface layer, treating the photoresist coating with an organometallic material, and developing the photoresist coating to provide a relief image comprising an etch resistant effective amount of organometallic material.
    Type: Grant
    Filed: September 21, 1992
    Date of Patent: November 22, 1994
    Assignees: Shipley Company, Inc., Digital Equipment Corporation
    Inventors: Edward K. Pavelchek, Peter W. Freeman, John F. Bohland, Susan K. Jones, Bruce W. Dudley
  • Photoimageable compositions comprising polybutadiene having internal epoxide groups
    Patent number: 5366846
    Abstract: Radiation sensitive compositions, processes for using the compositions, and articles of manufacture comprising the compositions. The photoimageable compositions of the invention comprises a radiation sensitive component, a resin binder and a polybutadiene that comprises one or more internal epoxide groups. In preferred aspects, the compositions of the invention further comprise a crosslinking agent such as a melamine or an epoxidized material, or mixtures thereof.
    Type: Grant
    Filed: June 28, 1993
    Date of Patent: November 22, 1994
    Assignee: Shipley Company Inc.
    Inventors: Philip D. Knudsen, Charles R. Shipley, Daniel Y. Pai
  • Radiation sensitive compositions comprising polymer having acid labile groups
    Patent number: 5362600
    Abstract: The invention provides a radiation sensitive composition having a polymer binder of phenolic and cyclic alcohol units. At least a portion of the phenolic units and/or cyclic alcohol units of the polymer are bonded to acid labile groups. High solubility differentials between exposed and unexposed regions are realized with only moderate substitution of the binder with the acid labile groups.
    Type: Grant
    Filed: May 25, 1993
    Date of Patent: November 8, 1994
    Assignee: Shipley Company Inc.
    Inventors: Roger Sinta, Richard C. Hemond, David R. Medeiros, Martha M. Rajaratnam, James W. Thackeray, Dianne Canistro
  • Point-of-use purification
    Patent number: 5350714
    Abstract: The invention is for a process of removal of dissolved contaminants from an organic solution. The process of the invention involves placing a module containing an ion exchange resin, activated carbon or a mixture of the two between a container from which the organic solution is dispensed and the point at which the solution is to be used. The solution is then passed through the module to remove contaminants. The inventions is useful for removal of dissolved contaminants from organic solutions requiring high purity for use.
    Type: Grant
    Filed: November 8, 1993
    Date of Patent: September 27, 1994
    Assignee: Shipley Company Inc.
    Inventors: Peter Trefonas, III, Richard J. Carey
  • Benzyl-substituted photoactive compounds and photoresist compositions comprising same
    Patent number: 5344742
    Abstract: The present invention comprises certain benzyl-substituted photoactive compounds and photoresist compositions comprising such photoactive compounds. The benzyl-substituted photoactive compounds of the invention are particularly suitable as the photoactive component in chemically amplified positive-acting and negative-acting compositions.
    Type: Grant
    Filed: April 21, 1993
    Date of Patent: September 6, 1994
    Assignee: Shipley Company Inc.
    Inventors: Roger F. Sinta, George Barclay, Martha M. Rajaratnam
  • Photoresist compositions with copolymer binder having phenolic and nonaromatic cyclic alcohol units where the distribution of the cyclic alcohol concentration is less than 8 mole percent
    Patent number: 5340696
    Abstract: The present invention relates to photoresists particularly suitable for deep U.V. exposure and having the capability of forming highly resolved features. The invention is characterized by use of a resist resin binder that comprises a nonaromatic cyclic alcohol-phenol copolymer that has a relatively low molecular weight and narrow distribution of molecular weight and cyclic alcohol concentration.
    Type: Grant
    Filed: January 29, 1993
    Date of Patent: August 23, 1994
    Assignee: Shipley Company Inc.
    Inventors: James W. Thackeray, Mark Denison, George W. Orsula
  • Method for manufacture of multilayer circuit board
    Patent number: 5334488
    Abstract: The invention is for the formation of multilayer circuit boards where layers are formed sequentially using selective plating techniques and imaging of dielectric materials to achieve fine line resolution and interconnections between circuits. The invention permits the sequential formation of multilayers of higher density using imaging techniques.
    Type: Grant
    Filed: May 10, 1993
    Date of Patent: August 2, 1994
    Assignee: Shipley Company Inc.
    Inventor: Charles R. Shipley, Jr.
  • Method of forming a relief image comprising amphoteric compositions
    Patent number: 5314789
    Abstract: The invention provides radiation sensitive compositions that comprise an amphoteric polymer, the polymer comprising at least two distinct carrier groups so that the polymer is positively polarized or negatively polarized upon treatment with an acid or base, respectively, enabling the compositions to be electrodeposited either anaphoretically or cataphoretically. Employing this amphoteric polymer in a radiation sensitive composition also allows the use of either an acid or base solution to image and remove the deposited composition irrespective of whether the composition was applied cataphoretically or anaphoretically. The compositions of the invention are also suitably formulated as liquid coating compositions or used to form dry film resists.
    Type: Grant
    Filed: October 1, 1991
    Date of Patent: May 24, 1994
    Assignee: Shipley Company Inc.
    Inventors: Robert E. Hawkins, Daniel Y. Pai
  • Light-sensitive composition and process
    Patent number: 5312715
    Abstract: A photoimageable composition and process for use of the same. The composition comprises a binder that is a mixture of a phenolic resin and a multifunctional epoxy or vinyl ether pound and a curing system comprising a photoactive compound capable of generating a curing catalyst capable of crosslinking the binder components. The process for use of the composition comprises application of the composition to a substrate, drying of the same, exposing the dried coating to activating radiation, curing the binder in light exposed areas, developing the coating and thermally curing the developed image. The composition is especially useful as a solder mask.
    Type: Grant
    Filed: February 3, 1992
    Date of Patent: May 17, 1994
    Assignee: Shipley Company Inc.
    Inventors: George R. E. Daniels, Michael J. Oddi, Kevin J. Cheetham, Stephen S. Rodriguez
  • Radiation sensitive compositions comprising blends of an aliphatic novolak resin and an aromatic novolak resin
    Patent number: 5302490
    Abstract: The invention relates to radiation sensitive compositions having high uniformity when deposited as thick films. The compositions of the invention comprise a radiation sensitive component and a resin binder blend. The resin binder blend is a mixture of an aliphatic novolak resin component and an aromatic novolak resin component.
    Type: Grant
    Filed: April 1, 1993
    Date of Patent: April 12, 1994
    Assignee: Shipley Company Inc.
    Inventors: Theodore H. Fedynyshyn, Marc Connelly