Abstract: The present invention is directed to polymeric-prodrug transport forms of the formula: wherein: E1-4 are independently selected from the group consisting of hydrogen, C1-6 alkyls, C3-12 branched alkyls, C3-8 cycloalkyls, C1-6 substituted alkyls, C3-8 substituted cycloalkyls, aryls, substituted aryls, aralkyls, C1-6 heteroalkyls, substituted C1-6 heteroalkyls, C1-6 alkoxy, phenoxy, C1-6 heteroalkoxy, and at least one of E1-4 includes a B moiety, wherein B is a leaving group, OH, a residue of a hydroxyl-or amino-containing moiety or wherein J1 is the same as J, or another member of the group defining J and E5 is the same as E1-4, or another member of the group defining E1-4; Y1-2 are independently O, S or NR9; M is a heteroatom selected from either X or Q; wherein X is an electron withdrawing group and Q is a moiety containing a free electron pair positioned three to six atoms from C(=Y2); R2-5 and R7-9 are independently selected

Abstract: A microelectronic device having a self aligned metal diffusion barrier is disclosed. A microelectronic device having a substrate and a dielectric layer on the substrate. A trench having inside walls is formed through the dielectric layer. A lining of a barrier metal is on the inside walls of the trench and a fill metal is in the trench between the linings on the inside walls of the trench. The fill metal and the barrier metal have substantially different removal selectivities. A covering of the barrier metal is on the fill metal and the covering spans the linings on the inside walls of the trench and conforms to the top of the fill metal in the trench.

Abstract: The present invention relates to low dielectric constant nanoporous silica films and to processes for their manufacture. A substrate, e.g., a wafer suitable for the production of an integrated circuit, having a plurality of raised lines and/or electronic elements present on its surface, is provided with a relatively high porosity, low dielectric constant, silicon-containing polymer film composition.

Abstract: The invention relates to a filter device for the physical elimination of microbes, suspended matter and solids from water, which in a housing has a filter insert made of 200 to 10000 hollow-fiber membranes with a defined pore width between 0.001 and 1.0 &mgr;m and which can be mounted on a water tap with its top side. A disadvantage of previously known filter devices is that deposits will adhere to the fibers. In order to remedy this drawback, the bottom side of the device of the invention features separate outlets for filtered and unfiltered water and at least in the outlet for the unfiltered water a valve is fitted with which this outlet can be closed.

Abstract: The invention provides process for producing microelectronic devices such as integrated circuit devices. Such have vias, interconnect metallization and wiring lines using dissimilar low dielectric constant intermetal dielectrics. The use of both organic and inorganic low-k dielectrics offers advantages due to the significantly different plasma etch characteristics of the two kinds of dielectrics. One dielectric serves as the etchstop in etching the other dielectric so that no additional etchstop layer is required. A microelectronic device is formed having a substrate and a layer of a first dielectric material positioned on the substrate. A layer of a second dielectric material is positioned on the first dielectric layer. Either a sacrificial metal layer or and an additional layer the first dielectric material is positioned on the second dielectric material.

Abstract: Kits and methods for measuring enzyme activities and metabolites using NAD analogs and NADP analogs are disclosed. The analogs can be used as replacements for NAD and NADP cofactors in analytical procedures. Preferred aspects of the invention include kits containing the NAD analogs and NADP analogs for use in the measurement of ethanol, lactic acid, 3-hydroxybutyric acid, glucose, glycerol, triglycerides, alpha-glycerophosphate, bile acids, creatine kinase activity, glucose-6-phosphate dehydrogenase activity and lactic acid dehydrogenase activity in analytical samples.

Abstract: The invention provides a process for monitoring the quality of via or trench formation in the production of a semiconductor device. More particularly, the invention pertains to a process for detecting side wall oxidation of low dielectric constant materials during the formation of vias or trenches in dielectrics. At least one via and/or trench is cleaved and contacted with a solvent to remove partially oxidized portions of dielectrics on the side walls, enabling defects to be visually inspected.

Abstract: The present invention is directed to polymeric-prodrug transport forms of the formula: wherein: G is a linear or branched, terminally functionalized polymer residue; Y1 is O, S, or NR1; M is X or Q; wherein X is an electron withdrawing group and Q is a moiety containing a free electron pair positioned three to six atoms from C(═Y1); R1-5 are independently selected from the group consisting of hydrogen, C1-6 alkyls, C3-12 branched alkyls, C3-8 cycloalkyls, C1-6 substituted alkyls, C3-8 substituted cycloalkyls, aryls, substituted aryls, aralkyls, C1-6 heteroalkyls, substituted C1-6 heteroalkyls; R6 is OR7 or N3, NH2, NO2 or CN, where R7 is selected from the same group which defines R1-5; R8-9 are independently selected from the group consisting of hydrogen, fluoro, chloro, bromo, iodo, or R6; and a and n are each independently zero or a positive integer.

Abstract: A process for forming a nanoporous silica dielectric coating on a substrate. A substrate containing a deposited film is suspended within a sealable hotplate, while remaining free of contact with the hotplate. The hotplate is sealed and an inert gas is flowed across the substrate. The hotplate is heated to a temperature of from about 350° C. or higher, and the substrate is forced to contact the heated hotplate. The substrate is heated for a time that sufficiently removes outgassing remnants from the resultant nanoporous dielectric coating.

Abstract: The invention relates to a method for preparing a nanocomposite material based on a polymeric matrix and a layered double hydroxide, comprising the steps of: a) providing a layered double hydroxide which contains an amount of anions of at least 20%, based on the total number of anions of the layered double hydroxide, which anions are compatible and/or reactive with the polymeric matrix: b) mixing the layered double hydroxide with a monomeric material for forming the polymeric matrix, in an amount such that the polymeric matrix is present in the nanocomposite material in an amount of at least 50% by weight, based on the nanocomposite material; c) polymerizing the monomeric material to form the polymeric matrix. The invention further relates to a nanocomposite material obtainable by such method and to a shaped article manufactured from such nanocomposite material.

Abstract: The invention relates to a nanocomposite material based on a polymeric matrix and a layered double hydroxide, wherein the polymeric matrix is present in an amount of at least 50% by weight, based on the nanocomposite material, and wherein the layered double hydroxide contains an amount of anions of at least 20%, based on the total number of anions of the layered double hydroxide, which anions are compatible and/or reactive with the polymeric matrix, and wherein at least 5% of the above amount of anions contain a second charge-carrying group. The invention further relates to a method for preparing such a nanocomposite material and to a shaped article from such a nanocomposite material.

Abstract: A process for increasing the etch resistance of the upper surface of photoresists by a surface-intensive dose of electron beam radiation. Such imparts increased surface etch resistance to the photoresist without causing as much shrinkage in the bulk of the film. A photographic image is produced by imagewise exposing a photographic composition layer on a substrate to activating energy to produce a latent pattern on the layer. This is followed by developing the photographic layer to thereby remove the nonimage areas thereof and leaving the image areas thereof in the form of a pattern on the substrate. The imaged layer is then overall irradiated to electron beam radiation for the full depth of the layer and then overall irradiated to electron beam radiation one or more additional times at a depth which is less than the full depth of the layer.

Abstract: A dry film coating composition for forming a coating suspension for film coating nutritional supplements, pharmaceutical tablets, and the like, including tapica dextrin and a detackifier.

Abstract: A compact, modular sonar assembly for use on the bow of a ship having separate transmitting and receive arrays confined within a single acoustic housing. The narrow and compact design fits much better into the hydrodynamically desirable bulbous bow deign than the typical bow dome sonar design and achieves good performance at a low cost with reduced size and weight.

Abstract: A process for decreasing the linewidth of photoresist images which are suitable for use in the production of microelectronic devices such as integrated circuits. A photosensitive composition is coated onto a substrate, exposed to activating energy to decompose the polymer in the imagewise exposed areas; and developed to remove the exposed nonimage areas thus producing a pattern of lines having a linewidth of from about 100 nm to about 200 nm. Then the image areas are controllably irradiated to sufficient electron beam radiation to thereby reduce the linewidth by an amount of from about 5% to about 50%.

Abstract: The invention relates to an impeller for radial blowers or fans, comprising a cover, a central bore for fixing to a driving shaft and a plurality of impeller blades passing in part spiral manner from the outside to the bore. Radial blowers with such impellers have an inadequate power or capacity for certain applications. In addition, they cannot be operated independently of the mains and are also overdimensioned. A high pressure impeller for small volume flows with a significantly increased efficiency and incorporated into a miniaturized, mains-independent radial blower would be highly desirable. The latter is obtained in that the cross-section Ak of the impeller blade channel in its last third up to the circumferential edge becomes smaller or remains constant, in that it is given a profile-like configuration corresponding to the impeller blade thickness, the blade entry angle &bgr;1 having a value >40°.

Abstract: A process for forming a uniform nanoporous dielectric film on a substrate. The process includes horizontally positioning a flat substrate within a cup; depositing a liquid alkoxysilane composition onto the substrate surface; covering the cup such that the substrate is enclosed therein; spinning the covered cup and spreading the alkoxysilane composition evenly on the substrate surface; exposing the alkoxysilane composition to water vapor and base vapor to thereby form a gel; and then curing the gel. The invention also provides an apparatus for spin depositing a liquid coating onto a substrate. The apparatus has a cylindrical cup with an open top section and removable cover which closes the top. A vapor injection port extends through the center of the cover. Suitable means hold a substrate centered within the cup and spin the cup.

Abstract: A surface-coated nanoporous silica dielectric film that is prepared by a process comprising the steps of forming a nanoporous silica dielectric coating on a substrate, and coating the formed nanoporous silica dielectric film with a coating composition comprising a polymer precursor, under conditions effective to form a strength-enhancing and/or hydrophobicity enhancing layer on the treated nanoporous silica dielectric film.