Abstract: Disclosed are compositions and methods for providing substantially planarized surfaces in the manufacture of electronic devices. Also disclosed are compositions and methods for protecting apertures in the manufacture of electronic devices.
Type:
Grant
Filed:
March 27, 2002
Date of Patent:
June 15, 2004
Assignee:
Shipley Company, L.L.C.
Inventors:
Edward W. Rutter, Jr., Peter Trefonas, III, Edward K. Pavelchek
Abstract: A system for facilitating viewer navigation through online information relating to chemical products is provided. The system includes a server in communication with at least one database; a link to an order fulfillment system; a link to a payment processing system; and a rink to a client system. The system is executing web server and application server software; a commerce tool for ordering one or more chemical products; database management and security tools; and a navigation tool. The navigation tool includes a user interface displaying objects relating to the chemical products in a form of a periodic table. Each objects is linked to information or services concerning the chemical products and each object is represented as an abbreviation of a function provided by the navigation tool.
Type:
Grant
Filed:
October 12, 2001
Date of Patent:
June 1, 2004
Assignee:
Shipley Company, L.L.C.
Inventors:
Joshua N. Laronge, Rajan Narayanan, David P. Planchet
Abstract: A method for forming copper-resin composite materials is disclosed. This method affixes a palladium or palladium-tin catalyst onto resin substrate, and then subjects the catalyst-containing resin to an electroless copper plating bath without performing a catalyst acceleration treatment step.
Abstract: Electroless gold plating baths and plating methods using these baths are provided. The electroless gold plating bath includes i) water-soluble gold compound, ii) complexing agent that stabilizes gold ions in the plating bath, but does not cause substantial dissolution of nickel, cobalt or palladium in the plating bath, and iii) a polyethyleneimine compound. When a material to be plated is subjected to such a gold plating bath, corrosion of the base metal under the surface of the material to be plated is reduced by controlling the substitution reaction rate immediately after initiation of the reaction, and adhesion between the base metal and deposited gold coating is increased.
Abstract: Provided are photodefinable compositions. The compositions include a silsesquioxane oligomer that has polymerized units of the formula (RSiO1.5), wherein R is selected from hydroxyphenyl or hydroxybenzy, and a photoactive component. The solubility of the silsesquioxane oligomer is altered upon exposure to actinic radiation. Also provided are methods of manufacturing optical waveguides, optical waveguides and electronic devices.
Abstract: Thin layer capacitors are formed from a first flexible metal layer, a dielectric layer between about 0.03 and about 2 microns deposited thereon, and a second flexible metal layer deposited on the dielectric layer. The first flexible metal layer may either be a metal foil, such as a copper, aluminum, or nickel foil, or a metal layer deposited on a polymeric support sheet. Depositions of the layers is by or is facilitate by combustion chemical vapor deposition or controlled atmosphere chemical vapor deposition.
Type:
Grant
Filed:
March 30, 2001
Date of Patent:
April 27, 2004
Assignee:
Shipley-Company, L.L.C.
Inventors:
Andrew T. Hunt, Tzyy Jiuan Hwang, Helmut G. Hornis, Wen-Yi Lin
Abstract: Disclosed are a plurality of particles having a narrow particle size distribution, a processes for forming the same, and films containing the same. The plurality of particles, includes one or more discrete polymer shells, wherein at least one of the polymer shells is crosslinked with at least one monomer containing two or more double bonds polymerizable by free radical means; and a core material encased in the polymer shells, wherein the plurality of particles have a polydispersity of from 1.3 to 1.0.
Type:
Grant
Filed:
September 24, 2002
Date of Patent:
April 13, 2004
Assignee:
Shipley Company, L.L.C.
Inventors:
Richard Roy Clikeman, Morris Christopher Wills, Katerina Elizabeth Dukes
Abstract: Disclosed are compositions useful for repair and electroplating of seed layers. Also disclosed are methods of repairing and electroplating such seed layers.
Abstract: A system and method for providing training in a technical field to a student is provided and includes at least one educational institution that provides an educational program. Also included is at least one industry education provider that provides a training program in a technical field. An online education provider is also included wherein the online education provider is in communications with the at least one educational institution and the at least one industry education provider. The online education provider provides to the student a composite educational program including the educational program and the training program in said technical field.
Abstract: Disclosed are trialkylindium compounds containing two bulky alkyl groups that are liquids or easily liquefiable solids and have sufficient vapor pressure for use in vapor deposition processes, as well as methods of depositing indium containing films using such compounds.
Type:
Grant
Filed:
January 17, 2003
Date of Patent:
January 20, 2004
Assignee:
Shipley Company, L.L.C.
Inventors:
Deodatta Vinayak Shenai-Khatkhate, Ronald L. DiCarlo, Jr.
Abstract: Disclosed are electrolytes for copper electroplating that provide enhanced fill of small features with less overplate. Also disclosed are methods of plating substrates, such as electronic devices, using such electrolytes.
Type:
Grant
Filed:
October 12, 2001
Date of Patent:
January 20, 2004
Assignee:
Shipley Company, L.L.C.
Inventors:
Denis Morrissey, Robert D. Mikkola, Jeffrey M. Calvert
Abstract: Disclosed are new catalysts for electroless metallization deposition, particularly catalysts that can be selectively activated and may be free of palladium and/or tin. Catalysts of the invention are preferably employed for electroless copper deposition.
Abstract: Disclosed are methods for the reduction of defects during the manufacture of electronic devices. Also disclosed are electronic devices having reduced numbers of defects.
Abstract: Disclosed are methods of manufacturing electronic devices, particularly integrated circuits. Such methods include the use of low dielectric constant material prepared by using a removable porogen material.
Abstract: Disclosed are methods for repairing or enhancing discontinuous metal seed layers prior to subsequent metallization during the manufacture of electronic devices. Such repair methods do not require the use of a second electroplating bath.
Type:
Grant
Filed:
October 17, 2001
Date of Patent:
December 9, 2003
Assignee:
Shipley Company, L.L.C.
Inventors:
David Merricks, Denis Morrissey, Martin W. Bayes, Mark Lefebvre, James G. Shelnut, Donald E. Storjohann
Abstract: Disclosed are methods of preparing trialkyl Group VA metal compounds in high yield and high purity. Such trialkyl Group VA metal compounds are substantially free of oxygenated impurities, ethereal solvents and metallic impurities.
Type:
Grant
Filed:
April 6, 2002
Date of Patent:
December 9, 2003
Assignee:
Shipley Company, L.L.C.
Inventors:
Deodatta V. Shenai-Khatkhate, Michael B. Power, Artashes Amamchyan
Abstract: Multilayer dielectric structures particularly suitable for use in capacitors and having a plating dopant in an amount sufficient to promote plating of a conductive layer are provided, together with methods of forming such structures. Such dielectric structures show increased adhesion of subsequently applied conductive layers.
Type:
Grant
Filed:
October 10, 2002
Date of Patent:
December 9, 2003
Assignee:
Shipley Company, L.L.C.
Inventors:
Craig S. Allen, Maria Anna Rzeznik, S. Matthew Cairns
Abstract: Compositions suitable for removing photoresist, probing ink and wafer bonding adhesive from a substrate containing one or more (C6-C16)olefins, one or more (C1-C6)alkoxybenzenes, and one or more organic sulfonic acid compounds are provided. Such compositions show reduced metal corrosion, low toxicity and rapid removal rates of both photoresists and probing inks.
Abstract: Disclosed is a method of electroplating substrate such that small recessed features are completely filled with minimum thickness of the deposited metal over fields.
Type:
Grant
Filed:
October 13, 2001
Date of Patent:
November 18, 2003
Assignee:
Shipley Company, L.L.C.
Inventors:
Robert D. Mikkola, Jeffrey M. Calvert, Denis Morrissey