Abstract: When forming transistor elements on the basis of sophisticated high-k metal gate structures, the efficiency of a replacement gate approach may be enhanced by more efficiently adjusting the gate height of transistors of different conductivity type when the dielectric cap layers of transistors may have experienced a different process history and may thus require a subsequent adaptation of the final cap layer thickness in one type of the transistors. For this purpose, a hard mask material may be used during a process sequence for forming offset spacer elements in one gate electrode structure while covering another gate electrode structure.

Abstract: When forming a complex metallization system in which vias of different lateral size have to be provided, a split patterning sequence may be applied. For this purpose, a lithography process may be specifically designed for the critical via openings and a subsequent second patterning process may be applied for forming the vias of increased lateral dimensions, while the critical vias are masked. In this manner, superior process conditions may be established for each of the patterning sequences.

Abstract: By selectively modifying the spacer width, for instance, by reducing the spacer width on the basis of implantation masks, an individual adaptation of dopant profiles may be achieved without unduly contributing to the overall process complexity. For example, in sophisticated integrated circuits, the performance of transistors of the same or different conductivity type may be individually adjusted by providing different sidewall spacer widths on the basis of an appropriate masking regime.

Abstract: In extremely scaled semiconductor devices, an asymmetric transistor configuration may be established on the basis of tilted implantation processes with increased resist height and/or tilt angles during tilted implantation processes by providing an asymmetric mask arrangement for masked transistor elements. For this purpose, the implantation mask may be shifted by an appropriate amount so as to enhance the overall blocking effect for the masked transistors while reducing any shadowing effect of the implantation masks for the non-masked transistors. The shift of the implantation masks may be accomplished by performing the automatic alignment procedure on the basis of “shifted” target values or by providing asymmetrically arranged photolithography masks.

Abstract: By performing a two-step approach for predicting a quality distribution during the fabrication of semiconductor devices, enhanced flexibility and efficiency may be accomplished. The two-step approach first models electrical characteristics on the basis of measurement data, such as inline measurement data, and, in a second step, an appropriate distribution for the electrical characteristics may be established, thereby obtaining modeled wafer sort data which may then be used for predicting a quality distribution of the semiconductor devices under consideration.

Abstract: The present invention provides a method of operating a paging controller in a wireless communication system including a first network that operates according to a first radio access technology and a second network that operates according to a second radio access technology. The first network includes a first control plane entity and the second network includes a second control plane entity. The method includes providing, to at least one first base station in the first network, a request to transmit a page to a first tracking area associated with the mobile unit. The first tracking area is defined in the first network. The method also includes providing, via an interface between the first control plane entity and the second control plane entity, a request to transmit the page to a second tracking area associated with the mobile unit. The second tracking area is defined in the second network.

Abstract: By providing an under-specified specification for designating a destination carrier in a respective control job or control message, a high degree of flexibility in determining the destination of processed substrates may be obtained, thereby also allowing the removal of a source carrier for enhancing load port availability in complex semiconductor facilities.

Abstract: The present invention provides a method implemented in a mobile unit configured to communicate with at least one base station over an uplink. The method includes receiving, at the mobile unit and from the base station, a first attribute indicative of a traffic-to-pilot power ratio and a second attribute indicative of a resource provision limit. The first attribute is formed based on a priority weight associated with best effort communication with the mobile unit. The second attribute is formed based on a maximum throughput associated with best effort communication with the mobile unit. The method also includes modifying an uplink transmission power based upon the first attribute and information indicative of congestion at the base station.

Abstract: A method sensing at least two physiological parameters and, for each of the at least two physiological parameters, generating a first series of signals representative of the physiological parameter sensed over a first time period, storing each of said first series of signals as a time sequence data stream, and determining when a physiological event has occurred in a patient. The method further comprises analyzing each of said time sequence data streams for a predetermined time interval preceding the occurrence of a physiological event to determine at least one marker as a predictor of the event, and again sensing the physiological parameters. Furthermore, the method comprises generating a second series of signals representative of the physiological parameter sensed, analyzing each of the second series of signals to determine whether the marker is present, and stimulating a cranial nerve when the marker is present in the second series of signals.

Abstract: A method, apparatus, and a system for performing a product feedback for process control are provided. Metrology data relating to a first workpiece is received. An end of line parameter relating to the first workpiece is received. The end of line parameter is correlated with the metrology data. A process control associated with a plurality of processes to be performed on a second workpiece is adjusted based upon the correlating.

Abstract: A method for monitoring a Christmas tree assembly installed on a subsea hydrocarbon well includes receiving a plurality of parameters associated with the Christmas tree assembly. A health metric for the Christmas tree assembly is determined based on the parameters. A problem condition with the Christmas tree assembly is identified based on the determined health metric.

Abstract: A method and an apparatus is provided for monitoring and adjusting a power level of a transmitting component. The method comprises receiving a request from a remote unit to provide a power level associated with a transmitting component, wherein the request is transmitted over a communications protocol. The method includes measuring a power level of a signal provided by the transmitting component in response to receiving the request from the remote unit, and providing the measured power level to the remote unit over the communications protocol.

Abstract: A computer-implemented method and apparatus for programming a computing apparatus are disclosed. The method is a computer-implemented method for use in a computer programming environment, and comprises invoking a script; and determining an execution order for the invoked script predicated on the passing of parameters between scripted actions. The apparatus, in a first aspect, includes a program storage medium encoded with instructions that, when executed by a processor, performs the method. In a second aspect, the apparatus includes a computing apparatus programmed to perform the method.

Abstract: The present invention provides a method involving at least one base station and at least one mobile unit is provided. The method includes receiving rate control information associated with at least one wireless communication channel between the at least one base station and the at least one mobile unit. The method also includes determining at least one outflow rate to the at least one base station based on the rate control information.

Abstract: A method, apparatus, and a system for prioritizing processing of a workpiece is provided. At least one workpiece is processed. A tag associated with the workpiece is provided. The tag includes process priority data for determining an order relating to processing the workpiece.

Abstract: By locally adapting the size and/or density of a contact structure, for instance, within individual transistors or in a more global manner, the overall performance of advanced semiconductor devices may be increased. Hence, the mutual interaction between the contact structure and local device characteristics may be taken into consideration. On the other hand, a high degree of compatibility with conventional process strategies may be maintained.

Abstract: A process for producing a starch comprises treating a feed starch that comprises amylopectin with glucanotransferase to produce a chain-extended starch, and treating the chain-extended starch with a debranching enzyme to produce a starch product that comprises amylose fragments. At least about 38% by weight of the amylose fragments have a degree of polymerization (DP) of at least about 35.

Abstract: By using an implantation mask having a high intrinsic stress, SMT sequences may be provided in which additional lithography steps may be avoided. Consequently, a strain source may be provided without significantly contributing to the overall process complexity.

Abstract: The RMS database for a semiconductor process line is established on the basis of product groups or categories, wherein all members of a category are linked by a common feature, such as a common basic design or a common basic technology. Common process recipes in a specified category may then be set up only once, thereby reducing the amount of effort for establishing the database. Moreover, new product types may be readily incorporated into the categories, thereby enabling the employment of the already-established category-specific context information.

Abstract: By providing a protective layer in an intermediate manufacturing stage, an increased surface protection with respect to particle contamination and surface corrosion may be achieved. In some illustrative embodiments, the protective layer may be used during an electrical test procedure, in which respective contact portions are contacted through the protective layer, thereby significantly reducing particle contamination during a respective measurement process.