Patents Assigned to ASML Holding N.V.
  • Patent number: 11906907
    Abstract: An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.
    Type: Grant
    Filed: November 27, 2018
    Date of Patent: February 20, 2024
    Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Derk Servatius Gertruda Brouns, Joshua Adams, Aage Bendiksen, Richard Jacobs, Andrew Judge, Veera Venkata Narasimha Narendra Phani Kottapalli, Joseph Harry Lyons, Theodorus Marinus Modderman, Manish Ranjan, Marcus Adrianus Van De Kerkhof, Xugang Xiong
  • Publication number: 20240053688
    Abstract: A pre-alignment system includes a common object lens group configured to collect diffracted beams from a patterning device, wherein the common object lens group is further configured to produce telecentricity in an object space of the pre-alignment system. The pre-alignment system also includes a multipath sensory array having at least one image lens system, wherein the at least one image lens system includes a telecentric converter lens configured to produce telecentricity in an image space of the pre-alignment system.
    Type: Application
    Filed: August 25, 2020
    Publication date: February 15, 2024
    Applicant: ASML Holding N.V.
    Inventors: Lev RYZHIKOV, Yuli VLADIMIRSKY
  • Patent number: 11899380
    Abstract: An apparatus for and method of sensing alignment marks in which a self-referencing interferometer based sensor outputs standing images of the alignment marks and camera device is used to capture the images as output by the sensor and a detector is used to obtain phase information about the alignment marks from the images as output by the sensor.
    Type: Grant
    Filed: September 28, 2020
    Date of Patent: February 13, 2024
    Assignee: ASML Holding N.V.
    Inventors: Krishanu Shome, Igor Matheus Petronella Aarts, Junwon Lee
  • Patent number: 11892779
    Abstract: An optical element and a lithographic apparatus including the optical element. The optical element includes a first member having a curved optical surface and a heat transfer surface, and a second member that comprises at least one recess, the at least one recess sealed against the heat transfer surface to form at least one closed channel between the first member and the second member to allow fluid to flow therethrough for thermal conditioning of the curved optical surface. In an embodiment, one or more regions of the heat transfer surface exposed to the at least one closed channel are positioned along a curved profile similar to that of the curved optical surface.
    Type: Grant
    Filed: October 21, 2020
    Date of Patent: February 6, 2024
    Assignee: ASML HOLDING N.V.
    Inventor: Victor Antonio Perez-Falcon
  • Publication number: 20240036485
    Abstract: A method includes irradiating a target structure with sequential illumination shots, directing scattered beams from the target structure towards an imaging detector, generating a detection signal using the imaging detector, and determining a property of the target structure based on at least the detection signal. An integration time for each illumination shot of the sequential illumination shots is selected so to reduce a low frequency error.
    Type: Application
    Filed: December 2, 2021
    Publication date: February 1, 2024
    Applicants: ASML Netheriands B. V., ASML Holding N.V.
    Inventors: Arjan Johannes Anton BEUKMAN, Sebastianus Adrianus GOORDEN, Stephen ROUX, Sergel SOKOLOV, Filippo ALPEGGIANI
  • Patent number: 11887881
    Abstract: A method of fabricating a substrate table includes supporting a table base and disposing a coating on a surface of the table base. The surface of the table base is substantially flat. The coating has a non-uniform thickness. The coating exerts a stress on the table so as to bend the table base. The non-uniform thickness causes a surface of the coating to become substantially flat after the bending.
    Type: Grant
    Filed: April 21, 2020
    Date of Patent: January 30, 2024
    Assignee: ASML HOLDING N.V.
    Inventors: Bruce Tirri, Ping Zhou, Elizabeth Mary Stone, David Hart Peterson, Mehmet Ali Akbas, Ryan Mayer, Richard Bryan Lewis
  • Publication number: 20240027913
    Abstract: A metrology system (400) includes a multi-source radiation system. The multi-source radiation system includes a waveguide device (502) and the multi-source radiation system is configured to generate one or more beams of radiation. The metrology system (400) further includes a coherence adjuster (500) including a multimode waveguide device (504). The multimode waveguide device (504) includes an input configured to receive the one or more beams of radiation from the multi-source radiation system (514) and an output (518) configured to output a coherence adjusted beam of radiation for irradiating a target (418). The metrology system (400) further includes an actuator (506) coupled to the waveguide device (502) and configured to actuate the waveguide device (502) so as to change an impingement characteristic of the one or more beams of radiation at the input of the multimode waveguide device (504).
    Type: Application
    Filed: December 2, 2021
    Publication date: January 25, 2024
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Sergei SOKOLOV, Simon Reinald HUISMAN, Jin LIAN, Sebastianus Adrianus GOORDEN, Muhsin ERALP, Henricus Petrus Maria PELLEMANS, Justin Lloyd KREUZER
  • Publication number: 20240012338
    Abstract: A metrology or inspection system, a lithographic apparatus, and a method are provided. The system includes an illumination system, an optical system, a first optical device, a second optical device, a detector, and a processor. The optical system is configured to split an illumination beam into a first sub-beam and a second sub-beam. The first optical device is configured to receive the first sub beam and direct the first sub-beam towards a first spot on a substrate. The substrate includes one or more target structures. The second optical device is configured to receive the second sub-beam and direct the second sub-beam towards a second spot on the substrate. The first spot is a different location than the second spot. The detector is configured to receive diffracted beams and to generate a detection signal. The processor is configured to determine a property of the one or more target structures.
    Type: Application
    Filed: November 16, 2021
    Publication date: January 11, 2024
    Applicant: ASML Holding N.V.
    Inventor: Douglas C. CAPPELLI
  • Publication number: 20240004308
    Abstract: A radiation source arrangement including: a radiation source operable to generate source radiation including source energy pulses; and at least one non-linear energy-filter operable to filter the source radiation to obtain filtered radiation including filtered energy pulses. The at least one non-linear energy-filter is operable to mitigate variation in energy in the filtered radiation by reducing the energy level of the source energy pulses which have an energy level corresponding to one of both extremities of an energy distribution of the source energy pulses by a greater amount than the source energy pulses which have an energy level corresponding to a peak of the energy distribution.
    Type: Application
    Filed: August 3, 2021
    Publication date: January 4, 2024
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Ali ALSAQQA, Aabid PATEL, Patrick Sebastian UEBEL, Amir ABDOLVAND, Paulus Antonius Andreas TEUNISSEN, Wisham F. KADHIM
  • Publication number: 20230400782
    Abstract: An inspection system, a lithographic apparatus, and a method are provided. The inspection system includes an illumination system, an optical system, a shutter system, an objective system and a detector. The illumination system is configured to generate an illumination beam. The optical system is configured to split the illumination beam into a first sub-beam and a second sub-beam. The shutter system is configured to independently control a transmittance of the first sub-beam and the second subbeam. The objective system is configured to receive the first sub-beam and the second beam from the optical system and direct the first sub-beam and the second sub-beam towards a substrate having a target structure. The detector is configured to receive an image or a diffracted image of the target structure.
    Type: Application
    Filed: October 14, 2021
    Publication date: December 14, 2023
    Applicant: ASML Holding N.V.
    Inventor: Douglas C. CAPPELLI
  • Patent number: 11841628
    Abstract: An apparatus for and method of sensing multiple alignment marks in which the optical axis of a detector is divided into multiple axes each of which can essentially simultaneously detect a separate alignment mark to generate a signal which can then be multiplexed and presented to a single detector or multiple detectors thus permitting more rapid detection of multiple marks.
    Type: Grant
    Filed: January 21, 2021
    Date of Patent: December 12, 2023
    Assignee: ASML Holding N.V.
    Inventors: Krishanu Shome, Justin Lloyd Kreuzer
  • Patent number: 11841626
    Abstract: An alignment method includes directing an illumination beam with a varying wavelength or frequency towards an alignment target, collecting diffraction beams from the alignment target and directing towards an interferometer. The alignment method also includes producing, by the interferometer, two diffraction sub-beams from the diffraction beams, wherein the diffraction sub-beams are orthogonally polarized, rotated 180 degrees with respect to each other around an alignment axis, and spatially overlapped. The alignment method further includes measuring interference intensity of the diffraction beams based on a temporal phase shift, wherein the temporal phase shift is a function of the varying wavelength or frequency of the illumination beam and a fixed optical path difference between the diffraction beams. The alignment method also includes determining a position of the alignment target from the measured interference intensity.
    Type: Grant
    Filed: July 22, 2020
    Date of Patent: December 12, 2023
    Assignee: ASML HOLDING N.V.
    Inventor: Muhsin Eralp
  • Patent number: 11835752
    Abstract: A measurement apparatus, including: a tapered optical fiber, the tapered optical fiber having an input to receive radiation and having an output to provide spectrally broadened output radiation toward a measurement target, the tapered optical fiber configured to spectrally broaden the radiation received at the input; and a detector system configured to receive a redirected portion of the output radiation from the measurement target.
    Type: Grant
    Filed: October 9, 2020
    Date of Patent: December 5, 2023
    Assignee: ASML HOLDING N.V.
    Inventors: King Pui Leung, Tao Chen, Ronan James Havelin, Igor Matheus Petronella AARTS, Adel Joobeur, Joseph Carbone
  • Publication number: 20230359127
    Abstract: A metrology tool that includes a substrate table to hold a substrate; a projection system configured to project a beam on a target portion of the substrate; an actuator configured to adjust a position of the projection system relative to the substrate on the substrate table; a sensor configured to determine a position of the substrate table; and a one or more processors configured to: determine, based on the position of the substrate table, a position error of the substrate table with respect to a reference; and control, via the actuator, a position of the projection system to compensate for the position error of the substrate table so that the beam projects on the target portion of the substrate.
    Type: Application
    Filed: August 24, 2021
    Publication date: November 9, 2023
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Hans BUTLER, Arie Jeffrey DEN BOEF, Mark Constant Johannes BAGGEN, Jeroen Arnoldus Leonardus Johannes RAAYMAKERS, Richard Carl ZIMMERMAN
  • Publication number: 20230350308
    Abstract: Systems, apparatuses, and methods are provided for increasing the throughput of a particle inspection system. During a first portion of an exposure time period of the particle inspection system, an example method can include irradiating a first region of a substrate surface, blocking all reflected radiation outside the first region, and generating a first sub-image of the first region based on radiation reflected from the first region. During a second portion of the exposure time period, the example method can further include irradiating a second region of the substrate surface, blocking all reflected radiation outside the second region, and generating a second sub-image of the second region based on radiation reflected from the second region. Subsequently, the example method can include generating a composite image based on the first sub-image and the second sub-image.
    Type: Application
    Filed: July 20, 2021
    Publication date: November 2, 2023
    Applicant: ASML Holding N.V.
    Inventor: Michal Emanuel PAWLOWSKI
  • Patent number: 11803130
    Abstract: An alignment apparatus includes an illumination system configured to direct one or more illumination beams towards an alignment target and receive the diffracted beams from the alignment target. The alignment apparatus also includes a self-referencing Interferometer configured to generate two diffraction sub-beams, wherein the two diffraction sub-beams are orthogonally polarized, rotated 180 degrees with respect to each other around an alignment axis, and spatially overlapped. The alignment apparatus further includes a beam analyzer configured to generate interference between the overlapped components of the diffraction sub-beams and produce two orthogonally polarized optical branches, and a detection system configured to determine a position of the alignment target based on light intensity measurement of the optical branches, wherein the measured light intensity is temporally modulated by a phase modulator.
    Type: Grant
    Filed: August 5, 2020
    Date of Patent: October 31, 2023
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Franciscus Godefridus Casper Bijnen, Muhsin Eralp, Simon Reinald Huisman, Arie Jeffrey Den Boef
  • Patent number: 11803119
    Abstract: A system (400) includes an illumination system (402), a detector (404), and a comparator (406). The illumination system includes a radiation source (408) and a spatial light modulator (410). The radiation source generates a beam of radiation (442). The spatial light modulator directs the beam toward a surface (436) of an object (428) and adjusts a spatial intensity distribution of the beam at the surface. The detector receives radiation (444) scattered at the surface and by a structure (434) near the surface. The detector generates a detection signal based on the received radiation. The comparator receives the detection signal, generates a first image based on the detection signal, and distinguishes between a spurious signal and a signal corresponding to a presence of a foreign particle on the surface based on the first image and the adjusted spatial intensity distribution.
    Type: Grant
    Filed: December 8, 2020
    Date of Patent: October 31, 2023
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Michal Emanuel Pawlowski, Aage Bendiksen, Ryan Alan Munden, Han-Kwang Nienhuys
  • Publication number: 20230341785
    Abstract: A system includes an illumination system, an optical element, a switching element and a detector. The illumination system includes a broadband light source that generates a beam of radiation. The dispersive optical element receives the beam of radiation and generates a plurality of light beams having a narrower bandwidth than the broadband light source. The optical switch receives the plurality of light beams and transmits each one of the plurality of light beams to a respective one of a plurality of alignment sensor of a sensor array. The detector receives radiation returning from the sensor array and to generate a measurement signal based on the received radiation.
    Type: Application
    Filed: June 7, 2021
    Publication date: October 26, 2023
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Simon Reinald HUISMAN, Sergey MALYK, Yuxiang LIN, Daan Maurits SLOTBOOM
  • Patent number: 11789368
    Abstract: A system (500) includes an illumination system (502), a lens element (506), and a detector (504). The illumination system generates a beam of radiation (510) having a first spatial intensity distribution (800) at a pupil plane (528) and a second spatial intensity distribution (900) at a plane of a target (514). The first spatial intensity distribution comprises an annular intensity profile (802) or an intensity profile corresponding to three or more beams. The lens element focuses the beam onto the target. The second spatial intensity distribution is a conjugate of the first intensity distribution and has an intensity profile corresponding to a central beam (902) and one or more side lobes (904) that are substantially isolated from the central beam. The central beam has a beam diameter of approximately 20 microns or less at the target. The detector receives radiation scattered by the target and generates a measurement signal based on the received radiation.
    Type: Grant
    Filed: September 14, 2020
    Date of Patent: October 17, 2023
    Assignee: ASML Holding N.V.
    Inventors: Yuxiang Lin, Joshua Adams, Tamer Mohamed Tawfik Ahmed Mohamed Elazhary, Krishanu Shome
  • Publication number: 20230324817
    Abstract: A metrology system includes a beam splitter and first and second sensors. The beam splitter splits scattered radiation scattered by a target into first and second portions of radiation. The first sensor receives the first portion. The second sensor receives the second portion after the second portion propagates along a path that includes a wedge system comprising a first wedge configured to diverge the second portion.
    Type: Application
    Filed: July 24, 2021
    Publication date: October 12, 2023
    Applicant: ASML Holding N.V.
    Inventors: Earl William EBERT, Roxana REZVANI NARAGHI