Patents Assigned to ASML Holding N.V.
  • Patent number: 10705439
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Grant
    Filed: February 26, 2018
    Date of Patent: July 7, 2020
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Johannes Petrus Maria Smeulers, Stefan Philip Christiaan Belfroid, Herman Vogel
  • Patent number: 10698226
    Abstract: A method is disclosed that includes splitting a beam of radiation into a first part of the beam having a first polarization and a second part of the beam having a second polarization, forming a first beam with a first polarization distribution between the first polarization and the second polarization and/or a first intensity distribution by modulating the first part of the beam, forming a second beam with a second polarization distribution between the first polarization and the second polarization and/or a second intensity distribution by modulating the second part of the beam, and combining at least a portion of the first beam having the second polarization and at least a portion of the second beam having the first polarization.
    Type: Grant
    Filed: December 6, 2016
    Date of Patent: June 30, 2020
    Assignee: ASML Holding N.V.
    Inventor: Parag Vinayak Kelkar
  • Patent number: 10670978
    Abstract: A spectrally broadened radiation apparatus, including a laser configured to emit, through an output of the laser, radiation substantially only in the visible region of the electromagnetic spectrum, the radiation having a nominal wavelength, and an optical fiber optically coupled to the output of the laser, the optical fiber having an input to receive the radiation from the laser and having an output to provide spectrally broadened output radiation, the optical fiber configured to spectrally broaden the radiation from the laser to a spectral width of at least 0.5 nm around the nominal wavelength.
    Type: Grant
    Filed: August 11, 2015
    Date of Patent: June 2, 2020
    Assignee: ASML Holding N.V.
    Inventors: King Pui Leung, Tao Chen, Kevin J. Violette
  • Publication number: 20200166855
    Abstract: A system designed to couple a patterning device to a support structure having a plurality of burls includes a camera module, an actuator, and a controller. The camera module is designed to capture image data of a backside of the patterning device. The actuator is coupled to at least one burl of the plurality of burls and is designed to move the at least one burl. The controller is designed to receive the image data captured from the camera module and determine one or more locations of contamination on the backside of the patterning device from the image data. The controller is also designed to control the actuator to move the at least one burl of the plurality of burls away from the one or more locations of contamination on the backside of the patterning device, based on the determined locations of contamination.
    Type: Application
    Filed: June 28, 2018
    Publication date: May 28, 2020
    Applicant: ASML HOLDING N.V.
    Inventors: Andrew JUDGE, Aage BENDIKSEN, Pedro Julian RIZO DIAGO
  • Patent number: 10649349
    Abstract: A new way of drying and/or wetting a surface, such as a top surface of a substrate, is disclosed which is useful in immersion lithography. The surface is placed under a single phase extractor and a priming liquid is delivered between the single phase extractor and the surface. The single phase extractor is only activated after the priming liquid has been provided between the single phase extractor and the surface. Priming liquid is delivered to the single phase extractor during the whole of the drying and/or wetting process.
    Type: Grant
    Filed: December 20, 2018
    Date of Patent: May 12, 2020
    Assignees: ASML HOLDING N.V., ASML NETHERLANDS B.V.
    Inventors: Martinus Hendrikus Antonius Leenders, Sjoerd Nicolaas Lambertus Donders, Harry Sewell, Louis John Markoya, Marcus Martinus Petrus Adrianus Vermeulen, Diane Elaine Markoya
  • Publication number: 20200142326
    Abstract: An object stage that includes a first structure and a second structure movable relative to the first structure. The second structure is configured to support an object. The object stage also includes a seal plate movably coupled to the first structure or the second structure, but not both. Further, the object stage includes an actuator configured to move the seal plate such that a substantially constant gap is defined between the seal plate and the first structure or second structure that is not coupled to the seal plate.
    Type: Application
    Filed: July 18, 2018
    Publication date: May 7, 2020
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Yang-Shan HUANG, Daniel Nathan BURBANK, Marco Koert STAVENGA
  • Patent number: 10642166
    Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.
    Type: Grant
    Filed: July 22, 2019
    Date of Patent: May 5, 2020
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Güneş Nakíbo{hacek over (g)}lu, Lowell Lane Baker, Ruud Hendrikus Martinus Johannes Bloks, Hakki Ergün Cekli, Geoffrey Alan Schultz, Laurentius Johannes Adrianus Van Bokhoven, Frank Johannes Jacobus Van Boxtel, Jean-Philippe Xavier Van Damme, Christopher Charles Ward
  • Publication number: 20200124995
    Abstract: An alignment mark for determining a two-dimensional alignment position of a substrate is discussed. The alignment mark includes an array of patterns. The array of patterns includes a first set of patterns and a second set of patterns arranged. The first set of patterns is arranged in a first sequence along a first direction. The second set of patterns is arranged in a second sequence along the first direction. The second sequence is different from the first sequence. Each pattern of the array of patterns is different from other patterns of the array of patterns that are adjacent to the each pattern.
    Type: Application
    Filed: May 2, 2018
    Publication date: April 23, 2020
    Applicant: ASML Holding N.V.
    Inventors: Gerrit Johannes NIJMEIJER, Junqiang ZHOU, Piotr Jan MEYER, Jeffrey John LOMBARDO, Igor Matheus Petronella AARTS
  • Patent number: 10599054
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Grant
    Filed: June 12, 2019
    Date of Patent: March 24, 2020
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
  • Patent number: 10585359
    Abstract: Particle trap assemblies configured to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. The particle trap may be a gap geometric particle trap located between a stationary part and a movable part of the lithography apparatus. The particle trap may also be a surface geometric particle trap located on a surface of a particle sensitive environment in lithography or metrology apparatus.
    Type: Grant
    Filed: July 17, 2017
    Date of Patent: March 10, 2020
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Ronald Peter Albright, Lowell Lane Baker, Daniel Nathan Burbank
  • Publication number: 20200073255
    Abstract: A method including illuminating a product test substrate with radiation from a component, wherein the product test substrate does not have a device pattern etched therein and yields a non-zero sensitivity when illuminated, the non-zero sensitivity representing a change in an optical response characteristic of the product test substrate with respect to a change in a characteristic of the radiation; measuring at least a part of the radiation redirected by the product test substrate to determine a parameter value; and taking an action with respect to the component based on the parameter value.
    Type: Application
    Filed: April 17, 2018
    Publication date: March 5, 2020
    Applicant: ASML Holding N.V.
    Inventors: Leonardo Gabriel MONTILLA, Krishanu SHOME
  • Publication number: 20200073262
    Abstract: A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part of the apparatus by chemical reaction between the material and the contamination.
    Type: Application
    Filed: May 1, 2018
    Publication date: March 5, 2020
    Applicants: ASML HOLDING N.V., ASML NETHERLANDS B.V.
    Inventors: Matthew LIPSON, Christopher John MASON, Damoon SOHRABIBABAHEIDARY, Jimmy Matheus Wilhelmus VAN DE WINKEL, Bert Dirk SCHOLTEN
  • Publication number: 20200064731
    Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
    Type: Application
    Filed: October 30, 2019
    Publication date: February 27, 2020
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: David Ferdinand VLES, Erik Achilles ABEGG, Aage BENDIKSEN, Derk Servatius Gertruda BROUNS, Pradeep K. GOVIL, Paul JANSSEN, Maxim Aleksandrovich NASALEVICH, Arnould Willem NOTENBOOM, Mária PÉTER, Marcus Adrianus VAN DE KERKHOF, Willem Joan VAN DER ZANDE, Pieter-Jan VAN-ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willem-Pieter VOORTHUIJZEN, James Norman WILEY
  • Publication number: 20200064746
    Abstract: A method including: subsequent to a first device lithographic step of a device patterning process, measuring a degraded metrology mark on an object and/or a device pattern feature associated with the degraded metrology mark, the degraded metrology mark arising at least in part from the first device lithographic step on the object; and prior to a second device lithographic step of the device patterning process on the object, creating a replacement metrology mark, for use in the patterning process in place of the degraded metrology mark, on the object.
    Type: Application
    Filed: December 13, 2017
    Publication date: February 27, 2020
    Applicant: ASML HOLDING N.V.
    Inventor: Justin Lloyd KREUZER
  • Publication number: 20200057394
    Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
    Type: Application
    Filed: September 30, 2019
    Publication date: February 20, 2020
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Matthias KRUIZINGA, Maarten Mathijs Marinus JANSEN, Jorge Manuel AZEREDO LIMA, Erik Willem BOGAART, Derk Servatius Gertruda BROUNS, Marc BRUIJN, Richard Joseph BRULS, Jeroen DEKKERS, Paul JANSSEN, Mohammad Reza KAMALI, Ronald Harm Gunther KRAMER, Robert Gabriël Maria LANSBERGEN, Martinus Hendrikus Antonius LEENDERS, Matthew LIPSON, Erik Roelof LOOPSTRA, Joseph H. LYONS, Stephen ROUX, Gerrit VAN DEN BOSCH, Sander VAN DEN HEIJKANT, Sandra VAN DER GRAAF, Frits VAN DER MEULEN, Jérôme François SylvainVirgile VAN LOO, Beatrijs Louis Marie-Joseph Katrien VERBRUGGE
  • Patent number: 10558129
    Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
    Type: Grant
    Filed: November 16, 2015
    Date of Patent: February 11, 2020
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Matthias Kruizinga, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Erik Willem Bogaart, Derk Servatius Gertruda Brouns, Marc Bruijn, Richard Joseph Bruls, Jeroen Dekkers, Paul Janssen, Mohammad Reza Kamali, Ronald Harm Gunther Kramer, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Matthew Lipson, Erik Roelof Loopstra, Joseph H. Lyons, Stephen Roux, Gerrit Van Den Bosch, Sander Van Den Heijkant, Sandra Van Der Graaf, Frits Van Der Meulen, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge
  • Patent number: 10558131
    Abstract: A metrology system includes a radiation source that generates light, an optical modulation unit, a reflector, an interferometer, and a detector. The optical modulating unit temporally separates a first polarization mode of the light from a second polarization mode of the light. The reflector directs the light towards a substrate. The interferometer interferes the diffracted light from a pattern on the substrate, or reflected light from the substrate, and produces output light from the interference. The detector receives the output light from the interferometer. The first and second polarization modes of the output light are temporally separated at the detector. Additionally, an optical rotator can be configured to receive the first polarized light and rotate the polarization of the first polarized light.
    Type: Grant
    Filed: April 19, 2019
    Date of Patent: February 11, 2020
    Assignee: ASML Holding N.V.
    Inventors: Krishanu Shome, Justin Lloyd Kreuzer
  • Patent number: 10520824
    Abstract: A light combiner (500) for use in a metrology tool includes a plurality of light sources (LED 1, LED 2, LED 3, LED 4, LED 5), a first filter (502), and a second filter (504). The first filter is designed to substantially reflect light generated from a first source of the plurality of light sources, and to substantially transmit light generated from a second source of the plurality of light sources. The second filter is designed to substantially reflect light generated from the first source and the second source of the plurality of light sources, and to substantially transmit light generated from a third source of the plurality of light sources. An angle of incidence of the light generated from the first source on a surface of the first filter is less than 30 degrees.
    Type: Grant
    Filed: February 7, 2017
    Date of Patent: December 31, 2019
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Ronald Franciscus Herman Hugers, Parag Vinayak Kelkar, Paulus Antonius Andreas Teunissen
  • Publication number: 20190391501
    Abstract: Systems and methods are disclosed that provide a support system in the Z direction for patterning devices that can function under high acceleration and deceleration with minimal effect on travel and hysteresis in the X and Y directions. A reticle clamping system includes a support device and a holding device. The holding device is configured to releasably couple a reticle to the support device. The holding device includes a plurality of burls. The reticle clamping system further includes a metallic support system coupled to the support device. The metallic support system provides a vacuum path from a vacuum channel to the holding device.
    Type: Application
    Filed: January 17, 2018
    Publication date: December 26, 2019
    Applicant: ASML Holding N.V.
    Inventors: Enrico ZORDAN, Brandon Adam EVANS, Daniei Nathan BURBANK, Ankur Ramesh BAHET!, Samir A. NAYFEH
  • Patent number: 10514620
    Abstract: A method of determining the position of an alignment mark on a substrate, the alignment mark having first and second segment, the method including illuminating the alignment mark with radiation, detecting radiation diffracted by the alignment mark and generating a resulting alignment signal. The alignment signal has a first component received during illumination of the first segment only, a second component received during illumination of the second segment only, and a third component received during simultaneous illumination of both segments. The positions of the segments are determined using the first component, the second component and the third component of the alignment signal.
    Type: Grant
    Filed: August 14, 2017
    Date of Patent: December 24, 2019
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Franciscus Godefridus Casper Bijnen, Simon Gijsbert Josephus Mathijssen, Vassili Demergis, Edo Maria Hulsebos