Patents Assigned to ASML Holding N.V.
  • Publication number: 20210208500
    Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
    Type: Application
    Filed: March 19, 2021
    Publication date: July 8, 2021
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: David Ferdinand VLES, Erik Achilles ABEGG, Aage BENDIKSEN, Derk Servatius Gertruda BROUNS, Pradeep K. GOVIL, Paul JANSSEN, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Mária PÉTER, Marcus Adrianus VAN DE KERKHOF, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willem-Pieter VOORTHUIJZEN, James Norman WILEY
  • Patent number: 11054751
    Abstract: A method and apparatus to measure a target (e.g., an alignment mark (e.g., on a substrate)) is disclosed. Relative movement between the target and a measurement spot of a measurement system in a “fly-in” direction (e.g., movement of the target towards the measurement spot) is performed so that a first measurement for the target can be made. Thereafter, relative movement between the target and the measurement spot is made in an opposite “fly-in” direction so that a second measurement for the target can be made. By combining (e.g., averaging) these two measurements, an error is cancelled out, and higher accuracy in the measurement may be achieved.
    Type: Grant
    Filed: September 30, 2016
    Date of Patent: July 6, 2021
    Assignee: ASML Holding N.V.
    Inventors: Hong Ye, Gerrit Johannes Nijmeijer
  • Publication number: 20210202293
    Abstract: Various burl designs for holding an object in a lithographic apparatus are described. A lithographic apparatus includes an illumination system, a first support structure, a second support structure, and a projection system. The illumination system is designed to receive radiation and to direct the radiation towards a patterning device that forms patterned radiation. The first support structure is designed to support the patterning device on the first support structure. The second support structure has a plurality of burls and is designed to support the substrate on the plurality of burls. A topography of a top surface of each of the plurality of burls is not substantially flat, such that a contact area between the substrate and each of the plurality of burls is reduced. The projection system is designed to receive the patterned radiation and to direct the patterned radiation towards the substrate.
    Type: Application
    Filed: October 4, 2018
    Publication date: July 1, 2021
    Applicant: ASML HOLDING N.V.
    Inventors: Mehmet Ali AKBAS, David Hart PETERSON, Tammo UITTERDIJK, Michael PERRY, Richard Bryan LEWIS, Iliya SIGAL
  • Patent number: 11048175
    Abstract: Methods and systems are described for cleaning a support such as a clamp of a chuck that holds a patterning device or a wafer in a lithographic apparatus. The method includes loading a electrostatic cleaning substrate into a lithographic apparatus. The electrostatic cleaning substrate includes at least one electrode. The method further includes bringing the electrostatic cleaning substrate near to the clamping surface to be cleaned and connecting the electrode to a voltage source. Particles present on the support are then transferred to the electrostatic cleaning substrate.
    Type: Grant
    Filed: July 31, 2018
    Date of Patent: June 29, 2021
    Assignee: ASML Holding N.V.
    Inventors: Victor Antonio Perez-Falcon, Michael Andrew Chieda
  • Publication number: 20210181640
    Abstract: An optical assembly and a method of making an optical assembly in which additive manufacturing techniques are used to form a support structure either directly on an optical element or on a carrier that is subsequently bonded to an optical element.
    Type: Application
    Filed: October 5, 2018
    Publication date: June 17, 2021
    Applicant: ASML Holding N.V.
    Inventors: Stephen ROUX, Christopher William REED
  • Publication number: 20210173315
    Abstract: A lithographic apparatus that includes an illumination system that conditions a radiation beam, a first stationary plate having a first surface, and a reticle stage defining, along with the first stationary plate, a first chamber. The reticle stage supports a reticle in the first chamber, and the reticle stage includes a first surface spaced apart from a second surface of the first stationary plate, thereby defining a first gap configured to suppress an amount of contamination passing from a second chamber to the first chamber. The first stationary plate is between the reticle stage and both the illumination system and a projection system configured to project a pattern imparted to the radiation beam by the patterning device onto a substrate.
    Type: Application
    Filed: July 18, 2018
    Publication date: June 10, 2021
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Yang-Shan HUANG, Marcel Joseph Louis BOONEN, Han-Kwang NIENHUYS, Jacob BRINKERT, Richard Joseph BRULS, Peter Conrad KOCHERSPERGER
  • Publication number: 20210173312
    Abstract: Methods and systems are described for reducing adhesion and controlling friction between a wafer and a wafer table during semiconductor photolithography wherein the tops of burls on the wafer table have a layer with a nanoscale topography.
    Type: Application
    Filed: November 29, 2018
    Publication date: June 10, 2021
    Applicant: ASML HOLDING N.V.
    Inventors: Matthew LIPSON, David Allen HEALD, Iliya SIGAL
  • Publication number: 20210165334
    Abstract: A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit. The seal unit may include a first seal positioned outward of and surrounding the plurality of support elements. A position of a substrate contact region of an upper surface of the first seal may be arranged at a distance from the plurality of support elements sufficient enough such that during the loading/unloading of the substrate, a force applied to the first seal by the substrate is greater than a force applied to the plurality of support elements by the substrate. A profile of the contact region, in a cross section through the seal, may have a shape which is configured such that during the loading/unloading of the substrate, the substrate contacts the seal via at least two different points of the profile.
    Type: Application
    Filed: November 22, 2018
    Publication date: June 3, 2021
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Thomas POIESZ, Coen Hubertus Matheus BALTIS, Abraham Alexander SOETHOUDT, Mehmet Ali AKBAS, Dennis VAN DEN BERG, Wouter VANESCH, Marcel Maria Cornelius Franciscus TEUNISSEN
  • Publication number: 20210157248
    Abstract: Disclosed is a metrology sensor apparatus comprising: an illumination system operable to illuminate a metrology mark in on a substrate with illumination radiation; an optical collection system configured to collect scattered radiation, following scattering of the illumination radiation by the metrology mark; and a wavelength dependent spatial filter for spatially filtering the scattered radiation, the wavelength dependent spatial filter having a spatial profile dependent on the wavelength of the scattered radiation. The wavelength dependent spatial filter may comprise a dichroic filter operable to substantially transmit scattered radiation within a first wavelength range and substantially block scattered radiation within a second wavelength range and at least one second filter operable to substantially block scattered radiation at least within the first wavelength range and the second wavelength range.
    Type: Application
    Filed: April 13, 2018
    Publication date: May 27, 2021
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Sebastianus Adrianus GOORDEN, Johannes Antonius Gerardus AKKERMANS, Simon Reinald HUISMAN, Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY
  • Patent number: 11016396
    Abstract: A method including illuminating a product test substrate with radiation from a component, wherein the product test substrate does not have a device pattern etched therein and yields a non-zero sensitivity when illuminated, the non-zero sensitivity representing a change in an optical response characteristic of the product test substrate with respect to a change in a characteristic of the radiation; measuring at least a part of the radiation redirected by the product test substrate to determine a parameter value; and taking an action with respect to the component based on the parameter value.
    Type: Grant
    Filed: April 17, 2018
    Date of Patent: May 25, 2021
    Assignee: ASML Holding N.V
    Inventors: Leonardo Gabriel Montilla, Krishanu Shome
  • Patent number: 11016401
    Abstract: A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part of the apparatus by chemical reaction between the material and the contamination.
    Type: Grant
    Filed: May 1, 2018
    Date of Patent: May 25, 2021
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Matthew Lipson, Christopher John Mason, Damoon Sohrabibabaheidary, Jimmy Matheus Wilhelmus Van De Winkel, Bert Dirk Scholten
  • Patent number: 11009794
    Abstract: A substrate provided with an anti-reflective coating where the anti-reflective coating is made up of a layer of nanostructures. The nanostructures may be formed by depositing a material such as SiO2 and then using a process such as reactive ion etching in conjunction with an inductively coupled plasma source. Other aspects of the fabrication process are also disclosed.
    Type: Grant
    Filed: March 5, 2019
    Date of Patent: May 18, 2021
    Assignee: ASML Holding N.V.
    Inventor: Parag Vinayak Kelkar
  • Patent number: 11009803
    Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
    Type: Grant
    Filed: September 30, 2019
    Date of Patent: May 18, 2021
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Matthias Kruizinga, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Erik Willem Bogaart, Derk Servatius Gertruda Brouns, Marc Bruijn, Richard Joseph Bruls, Jeroen Dekkers, Paul Janssen, Mohammad Reza Kamali, Ronald Harm Gunther Kramer, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Matthew Lipson, Erik Roelof Loopstra, Joseph H. Lyons, Stephen Roux, Gerrit Van Den Bosch, Sander Van Den Heijkant, Sandra Van Der Graaf, Frits Van Der Meulen, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge
  • Patent number: 11003095
    Abstract: A positioning system for positioning an object. The positioning system includes a stage, a balance mass and an actuator system. The stage is for holding the object. The actuator system is arranged to drive the stage in a first direction while driving the balance mass in a second direction opposite to the first direction. The stage is moveable in the first direction in a movement range. When the stage is moving in the first direction and is at an end of the movement range, the positioning system is arranged to collide the stage frontally into the balance mass.
    Type: Grant
    Filed: August 31, 2017
    Date of Patent: May 11, 2021
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Krijn Frederik Bustraan, Yang-Shan Huang, Antonius Franciscus Johannes De Groot, Minkyu Kim, Jasper Anne Frido Marikus Simons, Theo Anjes Maria Ruijl, Ronald Josephus Maria Lamers
  • Publication number: 20210132509
    Abstract: An alignment sensor apparatus includes an illumination system, a first optical system, a second optical system, a detector system, and a processor. The illumination system is configured to transmit an illumination beam along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target on a substrate. The second optical system includes a first polarizing optic configured to separate and transmit an irradiance distribution. The detector system is configured to measure a center of gravity of the diffraction target based on the irradiance distribution outputted from a first polarization branch and a second polarization branch. The processor is configured to measure a shift in the center of gravity of the diffraction target caused by an asymmetry variation in the diffraction target and determine a sensor response function of the alignment sensor apparatus based on the center of gravity shift.
    Type: Application
    Filed: April 3, 2019
    Publication date: May 6, 2021
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Simon Reinald HUISMAN, Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY, Yuxiang LIN, Vu Quang TRAN, Sebastianus Adrianus GOORDEN, Justin Lloyd KREUZER, Christopher John MASON, Igor Matheus Petronella AARTS, Krishanu SHOME, Irit TZEMAH
  • Patent number: 10983431
    Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
    Type: Grant
    Filed: October 30, 2019
    Date of Patent: April 20, 2021
    Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: David Ferdinand Vles, Erik Achilles Abegg, Aage Bendiksen, Derk Servatius Gertruda Brouns, Pradeep K. Govil, Paul Janssen, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, Willem-Pieter Voorthuijzen, James Norman Wiley
  • Publication number: 20210095957
    Abstract: A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radiation waves. The waveguides guide radiation from a port of the plurality of ports to the optical elements. Phase modulators adjust phases of the radiation waves. One or both of the first and second phased arrays form a first beam and/or a second beam of radiation directed toward a target structure based on the port coupled to the radiation source. The detector receives radiation scattered by the target structure and generates a measurement signal based on the received radiation.
    Type: Application
    Filed: September 23, 2020
    Publication date: April 1, 2021
    Applicant: ASML Holding N.V.
    Inventors: Mohamed SWILLAM, Tamer Mohamed Tawfik Ahmed Mohamed Elazhary, Stephen Roux, Yuxiang Lin, Justin Lloyd Kreuzer
  • Publication number: 20210072654
    Abstract: A lithography system comprises an illumination system configured to produce abeam of radiation, a support configured to support a patterning device configured to impart a pattern on the beam, a projection system configured to project the patterned beam onto a substrate, and an alignment system comprising an illuminator. The illuminator comprises an optical fiber, an optical fiber protector (714), an optical fiber support (700) comprising a first support arm assembly configured to support the optical fiber protector, an optical system, and an optical system support comprising a second support arm assembly configured to support the optical system.
    Type: Application
    Filed: May 2, 2019
    Publication date: March 11, 2021
    Applicant: ASML Holding N.V.
    Inventors: David TAUB, Joseph Ashwin FRANKLIN, Jeffrey John KOWALSKI
  • Publication number: 20210053177
    Abstract: A treatment tool for reconditioning the top surfaces of a plurality of projections of a substrate support in a lithographic tool. The treatment tool includes a reconditioning surface which is rough relative to smoothed top surfaces of the projections and which reconditioning surface has material harder than that of the material of the top surfaces of the projections. A reconditioning method involves causing an interaction between the reconditioning surface of the treatment tool and the top surfaces of the projections of the substrate support, so as to leave these top surfaces rougher than they were prior to the interaction.
    Type: Application
    Filed: January 24, 2019
    Publication date: February 25, 2021
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Bert Dirk SCHOLTEN, Satish ACHANTA, Aydar AKCHURIN, Pavlo ANTONOV, Coen Hubertus Matheus BALTIS, Jeroen BOUWKNEGT, Ann-Sophie m. FARLE, Christopher John MASON, Ralph Nicholas PALERMO, Thomas POIESZ, Yuri Johannes Gabriel VAN DE VIJVER, Jimmy Matheus Wilhelmus VAN DE WINKEL
  • Patent number: 10928738
    Abstract: A method of applying a measurement correction includes calculating a first correction value based on a first coefficient and the measurement; calculating a second correction value based on a second coefficient, greater than the first coefficient, and the measurement; and calculating a third correction value based on a third coefficient, greater than the second coefficient, and the measurement. The method also includes applying the third correction value to the measurement if a difference between the first correction value and the third correction value is above a first threshold value; applying the second correction value to the measurement if a difference between the first correction value and the second correction value is above a second threshold value; and applying the first correction value to the measurement if the difference between the first correction value and the second correction value is below or equal to the second threshold value.
    Type: Grant
    Filed: June 26, 2017
    Date of Patent: February 23, 2021
    Assignee: ASML Holding N.V.
    Inventors: Eric Brian Catey, Igor Matheus Petronella Aarts, Robert Anthony Augelli, Sergey Malyk