Patents Assigned to ASML Holding N.V.
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Publication number: 20240248415Abstract: The present disclosure is directed to a modular wafer table and methods for refurbishing a scrapped wafer to manufacture the modular wafer table. The method comprises removing one or more burls from a surface of a wafer table; polishing the surface of the wafer table after removing the one or more burls to form a core module; forming a burl module having a plurality of burls thereon; and bonding the core module to the burl module.Type: ApplicationFiled: April 28, 2022Publication date: July 25, 2024Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Shahab SHERVIN, Tammo UITTERDIJK, Matthew LIPSON, Marcus Martinus Petrus Adrianus VERMEULEN
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Publication number: 20240241453Abstract: A system includes a radiation source, an optical element, a detector, and a processor. The radiation source generates a beam of radiation. The optical element produces a non-uniform change in a phase of the beam of radiation and outputs a coherence-scrambled radiation for irradiating a target. An optical property of the optical element is tunable so as to change an amount of incoherence of the coherence-scrambled radiation. The detector receives radiation scattered by the target and generates a measurement signal based on the received radiation. The processor analyzes the measurement signal to determine a characteristic of the target.Type: ApplicationFiled: May 9, 2022Publication date: July 18, 2024Applicant: ASML Holding N.V.Inventor: Mohamed SWILLAM
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Publication number: 20240231242Abstract: A method includes detecting data associated with a patterning device and/or a lithographic apparatus, performing an action from a plurality of actions when a determination not to proceed is made, and performing the action on the patterning device and/or a lithographic apparatus.Type: ApplicationFiled: February 3, 2022Publication date: July 11, 2024Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Bram Paul Theodoor VAN GOCH, Johan Gertrudis Cornelis KUNNEN, Sae Na NA
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Patent number: 11994808Abstract: A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radiation waves. The waveguides guide radiation from a port of the plurality of ports to the optical elements. Phase modulators adjust phases of the radiation waves. One or both of the first and second phased arrays form a first beam and/or a second beam of radiation directed toward a target structure based on the port coupled to the radiation source. The detector receives radiation scattered by the target structure and generates a measurement signal based on the received radiation.Type: GrantFiled: September 23, 2020Date of Patent: May 28, 2024Assignee: ASML Holding N.V.Inventors: Mohamed Swillam, Tamer Mohamed Tawfik Ahmed Elazhary, Stephen Roux, Yuxiang Lin, Justin Lloyd Kreuzer
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Publication number: 20240167809Abstract: A method includes irradiating an object with an illumination beam, receiving, using a detector, scattered light from a first side of the object, generating a signal based on the scattered light, comparing the signal to a reference model, and determining a quantity of wear of the first side of the object based on the comparing. The first side of the object includes a layer of a coating material, and the irradiating is from a second side of the object. The scattered light includes transmitted light through the object from the second side to the first side.Type: ApplicationFiled: March 31, 2022Publication date: May 23, 2024Applicant: ASML Holding N.V.Inventors: Venkata Siva Chaithanya CHILLARA, Kellen SANNA
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Patent number: 11988971Abstract: A substrate table for supporting a substrate includes a surface and coarse burls. Each of the coarse burls includes a burl-top surface and fine burls. The coarse burls are disposed on the surface of the substrate table. The fine burls are disposed on the burl-top surface. The fine burls contact the substrate when the substrate table supports the substrate.Type: GrantFiled: May 5, 2020Date of Patent: May 21, 2024Assignees: ASML HOLDING N.V., ASML NETHERLANDS B.V.Inventors: Matthew Lipson, Satish Achanta, Benjamin David Dawson, Matthew Anthony Sorna, Iliya Sigal, Tammo Uitterdijk
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Publication number: 20240160151Abstract: A method of correcting a holographic image, a processing device, a dark field digital holographic microscope, a metrology apparatus and an inspection apparatus. The method includes obtaining a holographic image; determining at least one attenuation function due to motion blur from the holographic image; and correcting the holographic image, or a portion thereof, using the at least one attenuation function.Type: ApplicationFiled: March 4, 2022Publication date: May 16, 2024Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Willem Marie Julia Marcel COENE, Vasco Tomas TENNER, Hugo Augustinus Joseph CRAMER, Arie Jeffrrey DEN BOEF, Wouter Dick KOEK, Sergei SOKOLOV, Jeroen Johan Maarten VAN DE WIJDEVEN, Alexander Kenneth RAUB
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Patent number: 11982946Abstract: A patterning device for patterning product structures onto a substrate and an associated substrate patterned using such a patterning device. The patterning device includes target patterning elements for patterning at least one target from which a parameter of interest can be inferred. The patterning device includes product patterning elements for patterning the product structures. The target patterning elements and product patterning elements are configured such that the at least one target has at least one boundary which is neither parallel nor perpendicular with respect to the product structures on the substrate.Type: GrantFiled: July 6, 2020Date of Patent: May 14, 2024Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Nikhil Mehta, Maurits Van Der Schaar, Markus Gerardus Martinus Maria Van Kraaij, Hugo Augustinus Joseph Cramer, Olger Victor Zwier, Jeroen Cottaar, Patrick Warnaar
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Patent number: 11971665Abstract: An alignment method includes directing an illumination beam with a first polarization state to form a diffracted beam with a second polarization state from an alignment target, and passing the diffracted beam through a polarization analyzer. The alignment method further includes measuring a polarization state of the diffracted beam and determining a location of the alignment target from the measured polarization state relative to its initial polarization state. The alignment target includes a plurality of diffraction gratings with a single pitch and two or more duty cycles, wherein the pitch is smaller than a wavelength of the illumination beam, and the location of the alignment target corresponds to the duty cycle of the diffraction grating.Type: GrantFiled: February 6, 2020Date of Patent: April 30, 2024Assignee: ASML Holding N.V.Inventors: Joshua Adams, Yuxiang Lin, Krishanu Shome, Gerrit Johannes Nijmeijer, Igor Matheus Petronella Aarts
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Publication number: 20240134182Abstract: An optical filter apparatus including an optical divergence device, operable to receive optical pulses and spatially distribute the optical pulses over an optical plane in dependence with a pulse energy of each of the optical pulses; and a spatial filter, located at the optical plane, operable to apply spatial filtering to the optical pulses based on a location of each of the optical pulses at the optical plane resulting from the spatial distributing.Type: ApplicationFiled: January 12, 2022Publication date: April 25, 2024Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Ali ALSAQQA, Patrick Sebastian UEBEL, Paulus Antonius Andreas TEUNISSEN
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Publication number: 20240134289Abstract: A method includes detecting data associated with a patterning device and/or a lithographic apparatus, performing an action from a plurality of actions when a determination not to proceed is made, and performing the action on the patterning device and/or a lithographic apparatus.Type: ApplicationFiled: February 3, 2022Publication date: April 25, 2024Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Bram Paul Theodoor VAN GOCH, Johan KUNNEN, Sae Na NA
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Patent number: 11966169Abstract: A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radiation waves. The waveguides guide radiation from a port of the plurality of ports to the optical elements. Phase modulators adjust phases of the radiation waves. One or both of the first and second phased arrays form a first beam and/or a second beam of radiation directed toward a target structure based on the port coupled to the radiation source. The detector receives radiation scattered by the target structure and generates a measurement signal based on the received radiation.Type: GrantFiled: September 23, 2020Date of Patent: April 23, 2024Assignee: ASML Holding N.V.Inventors: Mohamed Swillam, Tamer Mohamed Tawfik Ahmed Elazhary, Stephen Roux, Yuxiang Lin, Justin Lloyd Kreuzer
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Patent number: 11960216Abstract: A pre-alignment system includes a common object lens group configured to collect diffracted beams from a patterning device, wherein the common object lens group is further configured to produce telecentricity in an object space of the pre-alignment system. The pre-alignment system also includes a multipath sensory array having at least one image lens system, wherein the at least one image lens system includes a telecentric converter lens configured to produce telecentricity in an image space of the pre-alignment system.Type: GrantFiled: August 25, 2020Date of Patent: April 16, 2024Assignee: ASML Holding N.V.Inventors: Lev Ryzhikov, Yuli Vladimirsky
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Patent number: 11953838Abstract: Apparatus for and method of removing a contaminant from a working surface of a lithography support such as a reticle or wafer stage in an EUV or a DUV photolithography system in which a cleaning substrate provided with a coating made a selected material and configuration is pressed against the working surface so that the contaminant is transferred from the working surface to the coating.Type: GrantFiled: October 31, 2019Date of Patent: April 9, 2024Assignee: ASML Holding N.V.Inventors: Keane Michael Levy, Akshay Dipakkumar Harlalka
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Publication number: 20240103386Abstract: An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.Type: ApplicationFiled: October 3, 2023Publication date: March 28, 2024Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Derk Servatius Gertruda BROUNS, Joshua ADAMS, Aage BENDIKSEN, Richard JACOBS, Andrew JUDGE, Veera Venkata Narasimha Narendra Phani KOTTAPALLI, Joseph Harry LYONS, Theodorus Marinus MODDERMAN, Manish RANJAN, Marcus Adrianus VAN DE KERKHOF, Xugang XIONG
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Publication number: 20240094641Abstract: The system includes a radiation source, a diffractive element, an optical system, a detector, and a processor. The radiation source generates radiation. The diffractive element diffracts the radiation to generate a first beam and a second beam. The first beam includes a first non-zero diffraction order and the second beam includes a second non-zero diffraction order that is different from the first non-zero diffraction order. The optical system receives a first scattered beam and a second scattered radiation beam from a target structure and directs the first scattered beam and the second scattered beam towards a detector. The detector generates a detection signal. The processor analyzes the detection signal to determine a target structure property based on at least the detection signal. The first beam is attenuated with respect to the second beam or the first scattered beam is purposely attenuated with respect to the second scattered beam.Type: ApplicationFiled: December 2, 2021Publication date: March 21, 2024Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Justin Lloyd KREUZER, Simon Reinald HUISMAN, Sebastianus Adrianus GOORDEN, Filippo ALPEGGIANI
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Patent number: 11927889Abstract: An apparatus includes a first substrate, a second substrate, and an intermediate layer disposed between the first and second substrates. The intermediate layer is configured to be a first point of failure or breakage of the apparatus under an applied force. The apparatus can further include a bonding layer disposed between the first and second substrates. The bonding layer is configured to bond the intermediate layer to the first and second substrates. The apparatus can further include a fastener coupled to the first and second substrates. The fastener is configured to secure the intermediate layer to the first and second substrates. The intermediate layer can include a coating applied to the first substrate or the second substrate. The apparatus can further include a second intermediate layer disposed between the first substrate and the fastener or the second substrate and the fastener.Type: GrantFiled: January 27, 2020Date of Patent: March 12, 2024Assignee: ASML Holding N.V.Inventors: Kushal Sandeep Doshi, Eric Justin Monkman, John Robert Burroughs, Sudhanshu Nahata, Stefan Luka Colton
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Publication number: 20240077308Abstract: A metrology system includes a radiation source, an adjustable diffractive element, an optical system, an optical element, and a processor. The radiation source generates radiation. The adjustable diffractive element diffracts the radiation to generate first and second beams of radiation. The first and second beams have first and second different non-zero diffraction orders, respectively. The optical system directs the first and second beams toward a target structure such that first and second scattered beams of radiation are generated based on the first and second beams, respectively. The metrology system adjusts a phase difference of the first and second scattered beams. The optical element interferes the first and second scattered beams at an imaging detector that generates a detection signal. The processor receives and analyzes the detection signal to determine a property of the target structure based on the adjusted phase difference.Type: ApplicationFiled: January 4, 2022Publication date: March 7, 2024Applicant: ASML Holding N.V.Inventors: Mohamed SWILLAM, Justin Lloyd KREUZER, Stephen ROUX, Michael Leo NELSON, Muhsin ERALP
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Publication number: 20240077803Abstract: Systems, apparatuses, and methods are provided for heating a plurality of optical components. An example method can include receiving an input radiation beam from a radiation source. The example method can further include generating a plurality of output radiation beams based on the input radiation beam. The example method can further include transmitting the plurality of output radiation beams towards a plurality of heater head optics configured to heat the plurality of optical components. Optionally, the example method can further include controlling a respective power value, and realizing a flat-top far-field profile, of each of the plurality of output radiation beams.Type: ApplicationFiled: December 30, 2021Publication date: March 7, 2024Applicants: ASML NETHERLANDS B.V., ASML Holding N.V.Inventors: Laurentius Johannes Adrianus VAN BOKHOVEN, Mahesh Upendra AJGAONKAR
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Patent number: 11906907Abstract: An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.Type: GrantFiled: November 27, 2018Date of Patent: February 20, 2024Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Derk Servatius Gertruda Brouns, Joshua Adams, Aage Bendiksen, Richard Jacobs, Andrew Judge, Veera Venkata Narasimha Narendra Phani Kottapalli, Joseph Harry Lyons, Theodorus Marinus Modderman, Manish Ranjan, Marcus Adrianus Van De Kerkhof, Xugang Xiong