Patents Assigned to ASML Holding N.V.
  • Publication number: 20240319618
    Abstract: A lithographic apparatus includes an illumination system to illuminate a pattern of a patterning device, a projection system to project an image of the pattern onto a substrate, a movable stage to support the patterning device or the substrate, a slotted object, and a locking device (700) to prevent a motion of the movable stage. The locking device comprises an actuator (702) and a wheel device (704) comprising a ring feature (708) and coupled to the actuator. The actuator rotates the wheel device about a rotation axis (706). The ring feature has a width (710) defined parallel to the rotation axis. The width is variable with respect to azimuthal direction of the wheel device. The ring feature engages a slot of the slotted object. The rotating adjusts the width of the ring feature within the slot such that a relative motion between the device and the slotted object is prevented.
    Type: Application
    Filed: June 28, 2022
    Publication date: September 26, 2024
    Applicant: ASML Holding N.V.
    Inventors: Daniel Nathan BURBANK, Andi DINE
  • Publication number: 20240319617
    Abstract: A metrology system includes a radiation source (708), a phased array (722a,b;724a,b;726;734), a detector, and a comparator. The phased array includes optical elements (706), waveguides (704), and phase modulators (702). The phased array generates a beam of radiation and directs the beam toward a surface of an object. The optical elements radiate radiation waves. The waveguides guide radiation from the radiation source to the optical elements. The phase modulators adjust phases of the radiation waves such that the radiation waves combine to form the beam. The detector receives radiation scattered from the surface and generates a detection signal based on the received radiation. The comparator analyzes the detection signal and determines a location of a defect on the surface based on the analyzing.
    Type: Application
    Filed: June 28, 2022
    Publication date: September 26, 2024
    Applicant: ASML Holding N.V.
    Inventors: Mohamed SWILLAM, Wei GUO, Stephen ROUX
  • Publication number: 20240319608
    Abstract: Systems, apparatuses, and methods are provided for adjusting illumination slit uniformity in a lithographic apparatus. An example method can include irradiating, by a radiation source, a portion of a finger assembly with radiation. The example method can further include receiving, by a radiation detector, at least a portion of the radiation in response to the irradiating of the portion of the finger assembly. The example method can further include determining, by a processor, a change in a shape of the finger assembly based on the received radiation. The example method can further include generating, by the processor, a control signal configured to modify a position of the finger assembly based on the determined change in the shape of the finger assembly. Subsequently, the example method can include transmitting, by the processor, the control signal to a motion control system coupled to the finger assembly.
    Type: Application
    Filed: January 16, 2022
    Publication date: September 26, 2024
    Applicant: ASML Holding N.V.
    Inventors: Roberto B. WIENER, Kalyan Kumar MANKALA, Todd R. DOWNEY
  • Publication number: 20240302753
    Abstract: A lithographic apparatus includes an illumination system, a projection system, a temperature-sensitive object, and a temperature sensor that includes a detector and waveguide device that is thermally coupled to the temperature-sensitive object and includes an input end, a downstream end, and first and second scattering features. The illumination system illuminates a pattern of a patterning device. The projection system projects an image of the pattern onto a substrate. Based on temperature, the first scattering feature reflects a first spectrum. Radiation not reflected by the first scattering feature is allowed downstream. Based on temperature, the second scattering feature reflects a second spectrum different from the first spectrum. Radiation not reflected by the second scattering feature is allowed downstream. The detector is disposed to receive radiation including the reflected first and second spectra from the input end and generates a measurement signal based on the received radiation.
    Type: Application
    Filed: March 21, 2022
    Publication date: September 12, 2024
    Applicants: ASML HOLDING N.V., ASML NETHERLANDS B.V.
    Inventors: Mahesh Upendra AJGAONKAR, Gerardus SWINKELS, Laurentius VAN BOKHOVEN, Joost KLUGKIST, Koen BOS
  • Publication number: 20240295832
    Abstract: Embodiments herein describe systems, methods, and devices for thermal conditioning of patterning devices at a litho-graphic apparatus. A patterning device cooling system for thermally conditioning a patterning device (202) of a lithographic apparatus is described, the cooling system including a thermal conditioner that thermally conditions the patterning device, and a controller that controls the thermal conditioner to determine a temperature state of the patterning device, determine a production state of the litho-graphic apparatus, and thermally condition the patterning device for exposures based on the temperature state and a production state of the lithographic apparatus.
    Type: Application
    Filed: June 13, 2022
    Publication date: September 5, 2024
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Jean-Philippe Xavier VAN DAMME, Richard John JOHNSON, Raaja Ganapathy SUBRAMANIAN
  • Patent number: 12066758
    Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
    Type: Grant
    Filed: April 25, 2022
    Date of Patent: August 20, 2024
    Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: David Ferdinand Vles, Erik Achilles Abegg, Aage Bendiksen, Derk Servatius Gertruda Brouns, Pradeep K. Govil, Paul Janssen, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, Willem-Pieter Voorthuijzen, James Norman Wiley
  • Patent number: 12066762
    Abstract: A sensor apparatus includes a sensor chip, an illumination system, a first optical system, a second optical system, and a detector system. The illumination system is coupled to the sensor chip and transmits an illumination beam along an illumination path. The first optical system is coupled to the sensor chip and includes a first integrated optic to configure and transmit the illumination beam toward a diffraction target on a substrate, disposed adjacent to the sensor chip, and generate a signal beam including diffraction order sub-beams generated from the diffraction target. The second optical system is coupled to the sensor chip and includes a second integrated optic to collect and transmit the signal beam from a first side to a second side of the sensor chip. The detector system is configured to measure a characteristic of the diffraction target based on the signal beam transmitted by the second optical system.
    Type: Grant
    Filed: August 5, 2020
    Date of Patent: August 20, 2024
    Assignee: ASML Holding N.V. & ASML Netherlands B.V.
    Inventors: Mohamed Swillam, Stephen Roux, Tamer Mohamed Tawfik Ahmed Mohamed Elazhary, Arie Jeffrey Den Boef
  • Publication number: 20240248415
    Abstract: The present disclosure is directed to a modular wafer table and methods for refurbishing a scrapped wafer to manufacture the modular wafer table. The method comprises removing one or more burls from a surface of a wafer table; polishing the surface of the wafer table after removing the one or more burls to form a core module; forming a burl module having a plurality of burls thereon; and bonding the core module to the burl module.
    Type: Application
    Filed: April 28, 2022
    Publication date: July 25, 2024
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Shahab SHERVIN, Tammo UITTERDIJK, Matthew LIPSON, Marcus Martinus Petrus Adrianus VERMEULEN
  • Publication number: 20240241453
    Abstract: A system includes a radiation source, an optical element, a detector, and a processor. The radiation source generates a beam of radiation. The optical element produces a non-uniform change in a phase of the beam of radiation and outputs a coherence-scrambled radiation for irradiating a target. An optical property of the optical element is tunable so as to change an amount of incoherence of the coherence-scrambled radiation. The detector receives radiation scattered by the target and generates a measurement signal based on the received radiation. The processor analyzes the measurement signal to determine a characteristic of the target.
    Type: Application
    Filed: May 9, 2022
    Publication date: July 18, 2024
    Applicant: ASML Holding N.V.
    Inventor: Mohamed SWILLAM
  • Publication number: 20240231242
    Abstract: A method includes detecting data associated with a patterning device and/or a lithographic apparatus, performing an action from a plurality of actions when a determination not to proceed is made, and performing the action on the patterning device and/or a lithographic apparatus.
    Type: Application
    Filed: February 3, 2022
    Publication date: July 11, 2024
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Bram Paul Theodoor VAN GOCH, Johan Gertrudis Cornelis KUNNEN, Sae Na NA
  • Patent number: 11994808
    Abstract: A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radiation waves. The waveguides guide radiation from a port of the plurality of ports to the optical elements. Phase modulators adjust phases of the radiation waves. One or both of the first and second phased arrays form a first beam and/or a second beam of radiation directed toward a target structure based on the port coupled to the radiation source. The detector receives radiation scattered by the target structure and generates a measurement signal based on the received radiation.
    Type: Grant
    Filed: September 23, 2020
    Date of Patent: May 28, 2024
    Assignee: ASML Holding N.V.
    Inventors: Mohamed Swillam, Tamer Mohamed Tawfik Ahmed Elazhary, Stephen Roux, Yuxiang Lin, Justin Lloyd Kreuzer
  • Publication number: 20240167809
    Abstract: A method includes irradiating an object with an illumination beam, receiving, using a detector, scattered light from a first side of the object, generating a signal based on the scattered light, comparing the signal to a reference model, and determining a quantity of wear of the first side of the object based on the comparing. The first side of the object includes a layer of a coating material, and the irradiating is from a second side of the object. The scattered light includes transmitted light through the object from the second side to the first side.
    Type: Application
    Filed: March 31, 2022
    Publication date: May 23, 2024
    Applicant: ASML Holding N.V.
    Inventors: Venkata Siva Chaithanya CHILLARA, Kellen SANNA
  • Patent number: 11988971
    Abstract: A substrate table for supporting a substrate includes a surface and coarse burls. Each of the coarse burls includes a burl-top surface and fine burls. The coarse burls are disposed on the surface of the substrate table. The fine burls are disposed on the burl-top surface. The fine burls contact the substrate when the substrate table supports the substrate.
    Type: Grant
    Filed: May 5, 2020
    Date of Patent: May 21, 2024
    Assignees: ASML HOLDING N.V., ASML NETHERLANDS B.V.
    Inventors: Matthew Lipson, Satish Achanta, Benjamin David Dawson, Matthew Anthony Sorna, Iliya Sigal, Tammo Uitterdijk
  • Publication number: 20240160151
    Abstract: A method of correcting a holographic image, a processing device, a dark field digital holographic microscope, a metrology apparatus and an inspection apparatus. The method includes obtaining a holographic image; determining at least one attenuation function due to motion blur from the holographic image; and correcting the holographic image, or a portion thereof, using the at least one attenuation function.
    Type: Application
    Filed: March 4, 2022
    Publication date: May 16, 2024
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Willem Marie Julia Marcel COENE, Vasco Tomas TENNER, Hugo Augustinus Joseph CRAMER, Arie Jeffrrey DEN BOEF, Wouter Dick KOEK, Sergei SOKOLOV, Jeroen Johan Maarten VAN DE WIJDEVEN, Alexander Kenneth RAUB
  • Patent number: 11982946
    Abstract: A patterning device for patterning product structures onto a substrate and an associated substrate patterned using such a patterning device. The patterning device includes target patterning elements for patterning at least one target from which a parameter of interest can be inferred. The patterning device includes product patterning elements for patterning the product structures. The target patterning elements and product patterning elements are configured such that the at least one target has at least one boundary which is neither parallel nor perpendicular with respect to the product structures on the substrate.
    Type: Grant
    Filed: July 6, 2020
    Date of Patent: May 14, 2024
    Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Nikhil Mehta, Maurits Van Der Schaar, Markus Gerardus Martinus Maria Van Kraaij, Hugo Augustinus Joseph Cramer, Olger Victor Zwier, Jeroen Cottaar, Patrick Warnaar
  • Patent number: 11971665
    Abstract: An alignment method includes directing an illumination beam with a first polarization state to form a diffracted beam with a second polarization state from an alignment target, and passing the diffracted beam through a polarization analyzer. The alignment method further includes measuring a polarization state of the diffracted beam and determining a location of the alignment target from the measured polarization state relative to its initial polarization state. The alignment target includes a plurality of diffraction gratings with a single pitch and two or more duty cycles, wherein the pitch is smaller than a wavelength of the illumination beam, and the location of the alignment target corresponds to the duty cycle of the diffraction grating.
    Type: Grant
    Filed: February 6, 2020
    Date of Patent: April 30, 2024
    Assignee: ASML Holding N.V.
    Inventors: Joshua Adams, Yuxiang Lin, Krishanu Shome, Gerrit Johannes Nijmeijer, Igor Matheus Petronella Aarts
  • Publication number: 20240134289
    Abstract: A method includes detecting data associated with a patterning device and/or a lithographic apparatus, performing an action from a plurality of actions when a determination not to proceed is made, and performing the action on the patterning device and/or a lithographic apparatus.
    Type: Application
    Filed: February 3, 2022
    Publication date: April 25, 2024
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Bram Paul Theodoor VAN GOCH, Johan KUNNEN, Sae Na NA
  • Publication number: 20240134182
    Abstract: An optical filter apparatus including an optical divergence device, operable to receive optical pulses and spatially distribute the optical pulses over an optical plane in dependence with a pulse energy of each of the optical pulses; and a spatial filter, located at the optical plane, operable to apply spatial filtering to the optical pulses based on a location of each of the optical pulses at the optical plane resulting from the spatial distributing.
    Type: Application
    Filed: January 12, 2022
    Publication date: April 25, 2024
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Ali ALSAQQA, Patrick Sebastian UEBEL, Paulus Antonius Andreas TEUNISSEN
  • Patent number: 11966169
    Abstract: A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radiation waves. The waveguides guide radiation from a port of the plurality of ports to the optical elements. Phase modulators adjust phases of the radiation waves. One or both of the first and second phased arrays form a first beam and/or a second beam of radiation directed toward a target structure based on the port coupled to the radiation source. The detector receives radiation scattered by the target structure and generates a measurement signal based on the received radiation.
    Type: Grant
    Filed: September 23, 2020
    Date of Patent: April 23, 2024
    Assignee: ASML Holding N.V.
    Inventors: Mohamed Swillam, Tamer Mohamed Tawfik Ahmed Elazhary, Stephen Roux, Yuxiang Lin, Justin Lloyd Kreuzer
  • Patent number: 11960216
    Abstract: A pre-alignment system includes a common object lens group configured to collect diffracted beams from a patterning device, wherein the common object lens group is further configured to produce telecentricity in an object space of the pre-alignment system. The pre-alignment system also includes a multipath sensory array having at least one image lens system, wherein the at least one image lens system includes a telecentric converter lens configured to produce telecentricity in an image space of the pre-alignment system.
    Type: Grant
    Filed: August 25, 2020
    Date of Patent: April 16, 2024
    Assignee: ASML Holding N.V.
    Inventors: Lev Ryzhikov, Yuli Vladimirsky