Patents Assigned to ASML Holding N.V.
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Patent number: 12066762Abstract: A sensor apparatus includes a sensor chip, an illumination system, a first optical system, a second optical system, and a detector system. The illumination system is coupled to the sensor chip and transmits an illumination beam along an illumination path. The first optical system is coupled to the sensor chip and includes a first integrated optic to configure and transmit the illumination beam toward a diffraction target on a substrate, disposed adjacent to the sensor chip, and generate a signal beam including diffraction order sub-beams generated from the diffraction target. The second optical system is coupled to the sensor chip and includes a second integrated optic to collect and transmit the signal beam from a first side to a second side of the sensor chip. The detector system is configured to measure a characteristic of the diffraction target based on the signal beam transmitted by the second optical system.Type: GrantFiled: August 5, 2020Date of Patent: August 20, 2024Assignee: ASML Holding N.V. & ASML Netherlands B.V.Inventors: Mohamed Swillam, Stephen Roux, Tamer Mohamed Tawfik Ahmed Mohamed Elazhary, Arie Jeffrey Den Boef
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Publication number: 20240248415Abstract: The present disclosure is directed to a modular wafer table and methods for refurbishing a scrapped wafer to manufacture the modular wafer table. The method comprises removing one or more burls from a surface of a wafer table; polishing the surface of the wafer table after removing the one or more burls to form a core module; forming a burl module having a plurality of burls thereon; and bonding the core module to the burl module.Type: ApplicationFiled: April 28, 2022Publication date: July 25, 2024Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Shahab SHERVIN, Tammo UITTERDIJK, Matthew LIPSON, Marcus Martinus Petrus Adrianus VERMEULEN
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Publication number: 20240241453Abstract: A system includes a radiation source, an optical element, a detector, and a processor. The radiation source generates a beam of radiation. The optical element produces a non-uniform change in a phase of the beam of radiation and outputs a coherence-scrambled radiation for irradiating a target. An optical property of the optical element is tunable so as to change an amount of incoherence of the coherence-scrambled radiation. The detector receives radiation scattered by the target and generates a measurement signal based on the received radiation. The processor analyzes the measurement signal to determine a characteristic of the target.Type: ApplicationFiled: May 9, 2022Publication date: July 18, 2024Applicant: ASML Holding N.V.Inventor: Mohamed SWILLAM
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Publication number: 20240231242Abstract: A method includes detecting data associated with a patterning device and/or a lithographic apparatus, performing an action from a plurality of actions when a determination not to proceed is made, and performing the action on the patterning device and/or a lithographic apparatus.Type: ApplicationFiled: February 3, 2022Publication date: July 11, 2024Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Bram Paul Theodoor VAN GOCH, Johan Gertrudis Cornelis KUNNEN, Sae Na NA
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Patent number: 11994808Abstract: A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radiation waves. The waveguides guide radiation from a port of the plurality of ports to the optical elements. Phase modulators adjust phases of the radiation waves. One or both of the first and second phased arrays form a first beam and/or a second beam of radiation directed toward a target structure based on the port coupled to the radiation source. The detector receives radiation scattered by the target structure and generates a measurement signal based on the received radiation.Type: GrantFiled: September 23, 2020Date of Patent: May 28, 2024Assignee: ASML Holding N.V.Inventors: Mohamed Swillam, Tamer Mohamed Tawfik Ahmed Elazhary, Stephen Roux, Yuxiang Lin, Justin Lloyd Kreuzer
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Publication number: 20240167809Abstract: A method includes irradiating an object with an illumination beam, receiving, using a detector, scattered light from a first side of the object, generating a signal based on the scattered light, comparing the signal to a reference model, and determining a quantity of wear of the first side of the object based on the comparing. The first side of the object includes a layer of a coating material, and the irradiating is from a second side of the object. The scattered light includes transmitted light through the object from the second side to the first side.Type: ApplicationFiled: March 31, 2022Publication date: May 23, 2024Applicant: ASML Holding N.V.Inventors: Venkata Siva Chaithanya CHILLARA, Kellen SANNA
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Patent number: 11971665Abstract: An alignment method includes directing an illumination beam with a first polarization state to form a diffracted beam with a second polarization state from an alignment target, and passing the diffracted beam through a polarization analyzer. The alignment method further includes measuring a polarization state of the diffracted beam and determining a location of the alignment target from the measured polarization state relative to its initial polarization state. The alignment target includes a plurality of diffraction gratings with a single pitch and two or more duty cycles, wherein the pitch is smaller than a wavelength of the illumination beam, and the location of the alignment target corresponds to the duty cycle of the diffraction grating.Type: GrantFiled: February 6, 2020Date of Patent: April 30, 2024Assignee: ASML Holding N.V.Inventors: Joshua Adams, Yuxiang Lin, Krishanu Shome, Gerrit Johannes Nijmeijer, Igor Matheus Petronella Aarts
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Publication number: 20240134289Abstract: A method includes detecting data associated with a patterning device and/or a lithographic apparatus, performing an action from a plurality of actions when a determination not to proceed is made, and performing the action on the patterning device and/or a lithographic apparatus.Type: ApplicationFiled: February 3, 2022Publication date: April 25, 2024Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Bram Paul Theodoor VAN GOCH, Johan KUNNEN, Sae Na NA
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Patent number: 11966169Abstract: A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radiation waves. The waveguides guide radiation from a port of the plurality of ports to the optical elements. Phase modulators adjust phases of the radiation waves. One or both of the first and second phased arrays form a first beam and/or a second beam of radiation directed toward a target structure based on the port coupled to the radiation source. The detector receives radiation scattered by the target structure and generates a measurement signal based on the received radiation.Type: GrantFiled: September 23, 2020Date of Patent: April 23, 2024Assignee: ASML Holding N.V.Inventors: Mohamed Swillam, Tamer Mohamed Tawfik Ahmed Elazhary, Stephen Roux, Yuxiang Lin, Justin Lloyd Kreuzer
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Patent number: 11960216Abstract: A pre-alignment system includes a common object lens group configured to collect diffracted beams from a patterning device, wherein the common object lens group is further configured to produce telecentricity in an object space of the pre-alignment system. The pre-alignment system also includes a multipath sensory array having at least one image lens system, wherein the at least one image lens system includes a telecentric converter lens configured to produce telecentricity in an image space of the pre-alignment system.Type: GrantFiled: August 25, 2020Date of Patent: April 16, 2024Assignee: ASML Holding N.V.Inventors: Lev Ryzhikov, Yuli Vladimirsky
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Patent number: 11953838Abstract: Apparatus for and method of removing a contaminant from a working surface of a lithography support such as a reticle or wafer stage in an EUV or a DUV photolithography system in which a cleaning substrate provided with a coating made a selected material and configuration is pressed against the working surface so that the contaminant is transferred from the working surface to the coating.Type: GrantFiled: October 31, 2019Date of Patent: April 9, 2024Assignee: ASML Holding N.V.Inventors: Keane Michael Levy, Akshay Dipakkumar Harlalka
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Publication number: 20240094641Abstract: The system includes a radiation source, a diffractive element, an optical system, a detector, and a processor. The radiation source generates radiation. The diffractive element diffracts the radiation to generate a first beam and a second beam. The first beam includes a first non-zero diffraction order and the second beam includes a second non-zero diffraction order that is different from the first non-zero diffraction order. The optical system receives a first scattered beam and a second scattered radiation beam from a target structure and directs the first scattered beam and the second scattered beam towards a detector. The detector generates a detection signal. The processor analyzes the detection signal to determine a target structure property based on at least the detection signal. The first beam is attenuated with respect to the second beam or the first scattered beam is purposely attenuated with respect to the second scattered beam.Type: ApplicationFiled: December 2, 2021Publication date: March 21, 2024Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Justin Lloyd KREUZER, Simon Reinald HUISMAN, Sebastianus Adrianus GOORDEN, Filippo ALPEGGIANI
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Patent number: 11927889Abstract: An apparatus includes a first substrate, a second substrate, and an intermediate layer disposed between the first and second substrates. The intermediate layer is configured to be a first point of failure or breakage of the apparatus under an applied force. The apparatus can further include a bonding layer disposed between the first and second substrates. The bonding layer is configured to bond the intermediate layer to the first and second substrates. The apparatus can further include a fastener coupled to the first and second substrates. The fastener is configured to secure the intermediate layer to the first and second substrates. The intermediate layer can include a coating applied to the first substrate or the second substrate. The apparatus can further include a second intermediate layer disposed between the first substrate and the fastener or the second substrate and the fastener.Type: GrantFiled: January 27, 2020Date of Patent: March 12, 2024Assignee: ASML Holding N.V.Inventors: Kushal Sandeep Doshi, Eric Justin Monkman, John Robert Burroughs, Sudhanshu Nahata, Stefan Luka Colton
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Publication number: 20240077308Abstract: A metrology system includes a radiation source, an adjustable diffractive element, an optical system, an optical element, and a processor. The radiation source generates radiation. The adjustable diffractive element diffracts the radiation to generate first and second beams of radiation. The first and second beams have first and second different non-zero diffraction orders, respectively. The optical system directs the first and second beams toward a target structure such that first and second scattered beams of radiation are generated based on the first and second beams, respectively. The metrology system adjusts a phase difference of the first and second scattered beams. The optical element interferes the first and second scattered beams at an imaging detector that generates a detection signal. The processor receives and analyzes the detection signal to determine a property of the target structure based on the adjusted phase difference.Type: ApplicationFiled: January 4, 2022Publication date: March 7, 2024Applicant: ASML Holding N.V.Inventors: Mohamed SWILLAM, Justin Lloyd KREUZER, Stephen ROUX, Michael Leo NELSON, Muhsin ERALP
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Publication number: 20240077803Abstract: Systems, apparatuses, and methods are provided for heating a plurality of optical components. An example method can include receiving an input radiation beam from a radiation source. The example method can further include generating a plurality of output radiation beams based on the input radiation beam. The example method can further include transmitting the plurality of output radiation beams towards a plurality of heater head optics configured to heat the plurality of optical components. Optionally, the example method can further include controlling a respective power value, and realizing a flat-top far-field profile, of each of the plurality of output radiation beams.Type: ApplicationFiled: December 30, 2021Publication date: March 7, 2024Applicants: ASML NETHERLANDS B.V., ASML Holding N.V.Inventors: Laurentius Johannes Adrianus VAN BOKHOVEN, Mahesh Upendra AJGAONKAR
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Publication number: 20240053688Abstract: A pre-alignment system includes a common object lens group configured to collect diffracted beams from a patterning device, wherein the common object lens group is further configured to produce telecentricity in an object space of the pre-alignment system. The pre-alignment system also includes a multipath sensory array having at least one image lens system, wherein the at least one image lens system includes a telecentric converter lens configured to produce telecentricity in an image space of the pre-alignment system.Type: ApplicationFiled: August 25, 2020Publication date: February 15, 2024Applicant: ASML Holding N.V.Inventors: Lev RYZHIKOV, Yuli VLADIMIRSKY
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Patent number: 11899380Abstract: An apparatus for and method of sensing alignment marks in which a self-referencing interferometer based sensor outputs standing images of the alignment marks and camera device is used to capture the images as output by the sensor and a detector is used to obtain phase information about the alignment marks from the images as output by the sensor.Type: GrantFiled: September 28, 2020Date of Patent: February 13, 2024Assignee: ASML Holding N.V.Inventors: Krishanu Shome, Igor Matheus Petronella Aarts, Junwon Lee
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Publication number: 20240036485Abstract: A method includes irradiating a target structure with sequential illumination shots, directing scattered beams from the target structure towards an imaging detector, generating a detection signal using the imaging detector, and determining a property of the target structure based on at least the detection signal. An integration time for each illumination shot of the sequential illumination shots is selected so to reduce a low frequency error.Type: ApplicationFiled: December 2, 2021Publication date: February 1, 2024Applicants: ASML Netheriands B. V., ASML Holding N.V.Inventors: Arjan Johannes Anton BEUKMAN, Sebastianus Adrianus GOORDEN, Stephen ROUX, Sergel SOKOLOV, Filippo ALPEGGIANI
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Publication number: 20240027913Abstract: A metrology system (400) includes a multi-source radiation system. The multi-source radiation system includes a waveguide device (502) and the multi-source radiation system is configured to generate one or more beams of radiation. The metrology system (400) further includes a coherence adjuster (500) including a multimode waveguide device (504). The multimode waveguide device (504) includes an input configured to receive the one or more beams of radiation from the multi-source radiation system (514) and an output (518) configured to output a coherence adjusted beam of radiation for irradiating a target (418). The metrology system (400) further includes an actuator (506) coupled to the waveguide device (502) and configured to actuate the waveguide device (502) so as to change an impingement characteristic of the one or more beams of radiation at the input of the multimode waveguide device (504).Type: ApplicationFiled: December 2, 2021Publication date: January 25, 2024Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Sergei SOKOLOV, Simon Reinald HUISMAN, Jin LIAN, Sebastianus Adrianus GOORDEN, Muhsin ERALP, Henricus Petrus Maria PELLEMANS, Justin Lloyd KREUZER
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Publication number: 20240012338Abstract: A metrology or inspection system, a lithographic apparatus, and a method are provided. The system includes an illumination system, an optical system, a first optical device, a second optical device, a detector, and a processor. The optical system is configured to split an illumination beam into a first sub-beam and a second sub-beam. The first optical device is configured to receive the first sub beam and direct the first sub-beam towards a first spot on a substrate. The substrate includes one or more target structures. The second optical device is configured to receive the second sub-beam and direct the second sub-beam towards a second spot on the substrate. The first spot is a different location than the second spot. The detector is configured to receive diffracted beams and to generate a detection signal. The processor is configured to determine a property of the one or more target structures.Type: ApplicationFiled: November 16, 2021Publication date: January 11, 2024Applicant: ASML Holding N.V.Inventor: Douglas C. CAPPELLI