Patents Assigned to ASML Holding N.V.
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Publication number: 20240319618Abstract: A lithographic apparatus includes an illumination system to illuminate a pattern of a patterning device, a projection system to project an image of the pattern onto a substrate, a movable stage to support the patterning device or the substrate, a slotted object, and a locking device (700) to prevent a motion of the movable stage. The locking device comprises an actuator (702) and a wheel device (704) comprising a ring feature (708) and coupled to the actuator. The actuator rotates the wheel device about a rotation axis (706). The ring feature has a width (710) defined parallel to the rotation axis. The width is variable with respect to azimuthal direction of the wheel device. The ring feature engages a slot of the slotted object. The rotating adjusts the width of the ring feature within the slot such that a relative motion between the device and the slotted object is prevented.Type: ApplicationFiled: June 28, 2022Publication date: September 26, 2024Applicant: ASML Holding N.V.Inventors: Daniel Nathan BURBANK, Andi DINE
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Publication number: 20240319617Abstract: A metrology system includes a radiation source (708), a phased array (722a,b;724a,b;726;734), a detector, and a comparator. The phased array includes optical elements (706), waveguides (704), and phase modulators (702). The phased array generates a beam of radiation and directs the beam toward a surface of an object. The optical elements radiate radiation waves. The waveguides guide radiation from the radiation source to the optical elements. The phase modulators adjust phases of the radiation waves such that the radiation waves combine to form the beam. The detector receives radiation scattered from the surface and generates a detection signal based on the received radiation. The comparator analyzes the detection signal and determines a location of a defect on the surface based on the analyzing.Type: ApplicationFiled: June 28, 2022Publication date: September 26, 2024Applicant: ASML Holding N.V.Inventors: Mohamed SWILLAM, Wei GUO, Stephen ROUX
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Publication number: 20240319608Abstract: Systems, apparatuses, and methods are provided for adjusting illumination slit uniformity in a lithographic apparatus. An example method can include irradiating, by a radiation source, a portion of a finger assembly with radiation. The example method can further include receiving, by a radiation detector, at least a portion of the radiation in response to the irradiating of the portion of the finger assembly. The example method can further include determining, by a processor, a change in a shape of the finger assembly based on the received radiation. The example method can further include generating, by the processor, a control signal configured to modify a position of the finger assembly based on the determined change in the shape of the finger assembly. Subsequently, the example method can include transmitting, by the processor, the control signal to a motion control system coupled to the finger assembly.Type: ApplicationFiled: January 16, 2022Publication date: September 26, 2024Applicant: ASML Holding N.V.Inventors: Roberto B. WIENER, Kalyan Kumar MANKALA, Todd R. DOWNEY
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Publication number: 20240302753Abstract: A lithographic apparatus includes an illumination system, a projection system, a temperature-sensitive object, and a temperature sensor that includes a detector and waveguide device that is thermally coupled to the temperature-sensitive object and includes an input end, a downstream end, and first and second scattering features. The illumination system illuminates a pattern of a patterning device. The projection system projects an image of the pattern onto a substrate. Based on temperature, the first scattering feature reflects a first spectrum. Radiation not reflected by the first scattering feature is allowed downstream. Based on temperature, the second scattering feature reflects a second spectrum different from the first spectrum. Radiation not reflected by the second scattering feature is allowed downstream. The detector is disposed to receive radiation including the reflected first and second spectra from the input end and generates a measurement signal based on the received radiation.Type: ApplicationFiled: March 21, 2022Publication date: September 12, 2024Applicants: ASML HOLDING N.V., ASML NETHERLANDS B.V.Inventors: Mahesh Upendra AJGAONKAR, Gerardus SWINKELS, Laurentius VAN BOKHOVEN, Joost KLUGKIST, Koen BOS
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Publication number: 20240295832Abstract: Embodiments herein describe systems, methods, and devices for thermal conditioning of patterning devices at a litho-graphic apparatus. A patterning device cooling system for thermally conditioning a patterning device (202) of a lithographic apparatus is described, the cooling system including a thermal conditioner that thermally conditions the patterning device, and a controller that controls the thermal conditioner to determine a temperature state of the patterning device, determine a production state of the litho-graphic apparatus, and thermally condition the patterning device for exposures based on the temperature state and a production state of the lithographic apparatus.Type: ApplicationFiled: June 13, 2022Publication date: September 5, 2024Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Jean-Philippe Xavier VAN DAMME, Richard John JOHNSON, Raaja Ganapathy SUBRAMANIAN
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Patent number: 12066758Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.Type: GrantFiled: April 25, 2022Date of Patent: August 20, 2024Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: David Ferdinand Vles, Erik Achilles Abegg, Aage Bendiksen, Derk Servatius Gertruda Brouns, Pradeep K. Govil, Paul Janssen, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, Willem-Pieter Voorthuijzen, James Norman Wiley
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Patent number: 12066762Abstract: A sensor apparatus includes a sensor chip, an illumination system, a first optical system, a second optical system, and a detector system. The illumination system is coupled to the sensor chip and transmits an illumination beam along an illumination path. The first optical system is coupled to the sensor chip and includes a first integrated optic to configure and transmit the illumination beam toward a diffraction target on a substrate, disposed adjacent to the sensor chip, and generate a signal beam including diffraction order sub-beams generated from the diffraction target. The second optical system is coupled to the sensor chip and includes a second integrated optic to collect and transmit the signal beam from a first side to a second side of the sensor chip. The detector system is configured to measure a characteristic of the diffraction target based on the signal beam transmitted by the second optical system.Type: GrantFiled: August 5, 2020Date of Patent: August 20, 2024Assignee: ASML Holding N.V. & ASML Netherlands B.V.Inventors: Mohamed Swillam, Stephen Roux, Tamer Mohamed Tawfik Ahmed Mohamed Elazhary, Arie Jeffrey Den Boef
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Publication number: 20240248415Abstract: The present disclosure is directed to a modular wafer table and methods for refurbishing a scrapped wafer to manufacture the modular wafer table. The method comprises removing one or more burls from a surface of a wafer table; polishing the surface of the wafer table after removing the one or more burls to form a core module; forming a burl module having a plurality of burls thereon; and bonding the core module to the burl module.Type: ApplicationFiled: April 28, 2022Publication date: July 25, 2024Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Shahab SHERVIN, Tammo UITTERDIJK, Matthew LIPSON, Marcus Martinus Petrus Adrianus VERMEULEN
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Publication number: 20240241453Abstract: A system includes a radiation source, an optical element, a detector, and a processor. The radiation source generates a beam of radiation. The optical element produces a non-uniform change in a phase of the beam of radiation and outputs a coherence-scrambled radiation for irradiating a target. An optical property of the optical element is tunable so as to change an amount of incoherence of the coherence-scrambled radiation. The detector receives radiation scattered by the target and generates a measurement signal based on the received radiation. The processor analyzes the measurement signal to determine a characteristic of the target.Type: ApplicationFiled: May 9, 2022Publication date: July 18, 2024Applicant: ASML Holding N.V.Inventor: Mohamed SWILLAM
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Publication number: 20240231242Abstract: A method includes detecting data associated with a patterning device and/or a lithographic apparatus, performing an action from a plurality of actions when a determination not to proceed is made, and performing the action on the patterning device and/or a lithographic apparatus.Type: ApplicationFiled: February 3, 2022Publication date: July 11, 2024Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Bram Paul Theodoor VAN GOCH, Johan Gertrudis Cornelis KUNNEN, Sae Na NA
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Patent number: 11994808Abstract: A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radiation waves. The waveguides guide radiation from a port of the plurality of ports to the optical elements. Phase modulators adjust phases of the radiation waves. One or both of the first and second phased arrays form a first beam and/or a second beam of radiation directed toward a target structure based on the port coupled to the radiation source. The detector receives radiation scattered by the target structure and generates a measurement signal based on the received radiation.Type: GrantFiled: September 23, 2020Date of Patent: May 28, 2024Assignee: ASML Holding N.V.Inventors: Mohamed Swillam, Tamer Mohamed Tawfik Ahmed Elazhary, Stephen Roux, Yuxiang Lin, Justin Lloyd Kreuzer
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Publication number: 20240167809Abstract: A method includes irradiating an object with an illumination beam, receiving, using a detector, scattered light from a first side of the object, generating a signal based on the scattered light, comparing the signal to a reference model, and determining a quantity of wear of the first side of the object based on the comparing. The first side of the object includes a layer of a coating material, and the irradiating is from a second side of the object. The scattered light includes transmitted light through the object from the second side to the first side.Type: ApplicationFiled: March 31, 2022Publication date: May 23, 2024Applicant: ASML Holding N.V.Inventors: Venkata Siva Chaithanya CHILLARA, Kellen SANNA
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Patent number: 11988971Abstract: A substrate table for supporting a substrate includes a surface and coarse burls. Each of the coarse burls includes a burl-top surface and fine burls. The coarse burls are disposed on the surface of the substrate table. The fine burls are disposed on the burl-top surface. The fine burls contact the substrate when the substrate table supports the substrate.Type: GrantFiled: May 5, 2020Date of Patent: May 21, 2024Assignees: ASML HOLDING N.V., ASML NETHERLANDS B.V.Inventors: Matthew Lipson, Satish Achanta, Benjamin David Dawson, Matthew Anthony Sorna, Iliya Sigal, Tammo Uitterdijk
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Publication number: 20240160151Abstract: A method of correcting a holographic image, a processing device, a dark field digital holographic microscope, a metrology apparatus and an inspection apparatus. The method includes obtaining a holographic image; determining at least one attenuation function due to motion blur from the holographic image; and correcting the holographic image, or a portion thereof, using the at least one attenuation function.Type: ApplicationFiled: March 4, 2022Publication date: May 16, 2024Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Willem Marie Julia Marcel COENE, Vasco Tomas TENNER, Hugo Augustinus Joseph CRAMER, Arie Jeffrrey DEN BOEF, Wouter Dick KOEK, Sergei SOKOLOV, Jeroen Johan Maarten VAN DE WIJDEVEN, Alexander Kenneth RAUB
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Patent number: 11982946Abstract: A patterning device for patterning product structures onto a substrate and an associated substrate patterned using such a patterning device. The patterning device includes target patterning elements for patterning at least one target from which a parameter of interest can be inferred. The patterning device includes product patterning elements for patterning the product structures. The target patterning elements and product patterning elements are configured such that the at least one target has at least one boundary which is neither parallel nor perpendicular with respect to the product structures on the substrate.Type: GrantFiled: July 6, 2020Date of Patent: May 14, 2024Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Nikhil Mehta, Maurits Van Der Schaar, Markus Gerardus Martinus Maria Van Kraaij, Hugo Augustinus Joseph Cramer, Olger Victor Zwier, Jeroen Cottaar, Patrick Warnaar
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Patent number: 11971665Abstract: An alignment method includes directing an illumination beam with a first polarization state to form a diffracted beam with a second polarization state from an alignment target, and passing the diffracted beam through a polarization analyzer. The alignment method further includes measuring a polarization state of the diffracted beam and determining a location of the alignment target from the measured polarization state relative to its initial polarization state. The alignment target includes a plurality of diffraction gratings with a single pitch and two or more duty cycles, wherein the pitch is smaller than a wavelength of the illumination beam, and the location of the alignment target corresponds to the duty cycle of the diffraction grating.Type: GrantFiled: February 6, 2020Date of Patent: April 30, 2024Assignee: ASML Holding N.V.Inventors: Joshua Adams, Yuxiang Lin, Krishanu Shome, Gerrit Johannes Nijmeijer, Igor Matheus Petronella Aarts
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Publication number: 20240134289Abstract: A method includes detecting data associated with a patterning device and/or a lithographic apparatus, performing an action from a plurality of actions when a determination not to proceed is made, and performing the action on the patterning device and/or a lithographic apparatus.Type: ApplicationFiled: February 3, 2022Publication date: April 25, 2024Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Bram Paul Theodoor VAN GOCH, Johan KUNNEN, Sae Na NA
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Publication number: 20240134182Abstract: An optical filter apparatus including an optical divergence device, operable to receive optical pulses and spatially distribute the optical pulses over an optical plane in dependence with a pulse energy of each of the optical pulses; and a spatial filter, located at the optical plane, operable to apply spatial filtering to the optical pulses based on a location of each of the optical pulses at the optical plane resulting from the spatial distributing.Type: ApplicationFiled: January 12, 2022Publication date: April 25, 2024Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Ali ALSAQQA, Patrick Sebastian UEBEL, Paulus Antonius Andreas TEUNISSEN
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Patent number: 11966169Abstract: A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radiation waves. The waveguides guide radiation from a port of the plurality of ports to the optical elements. Phase modulators adjust phases of the radiation waves. One or both of the first and second phased arrays form a first beam and/or a second beam of radiation directed toward a target structure based on the port coupled to the radiation source. The detector receives radiation scattered by the target structure and generates a measurement signal based on the received radiation.Type: GrantFiled: September 23, 2020Date of Patent: April 23, 2024Assignee: ASML Holding N.V.Inventors: Mohamed Swillam, Tamer Mohamed Tawfik Ahmed Elazhary, Stephen Roux, Yuxiang Lin, Justin Lloyd Kreuzer
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Patent number: 11960216Abstract: A pre-alignment system includes a common object lens group configured to collect diffracted beams from a patterning device, wherein the common object lens group is further configured to produce telecentricity in an object space of the pre-alignment system. The pre-alignment system also includes a multipath sensory array having at least one image lens system, wherein the at least one image lens system includes a telecentric converter lens configured to produce telecentricity in an image space of the pre-alignment system.Type: GrantFiled: August 25, 2020Date of Patent: April 16, 2024Assignee: ASML Holding N.V.Inventors: Lev Ryzhikov, Yuli Vladimirsky