Patents Assigned to ASML Holding N.V.
  • Lithographic Apparatuses and Methods for Compensating For Eigenmode Coupling
    Publication number: 20130278915
    Abstract: A lithographic apparatus can include a component and a positioning system operatively coupled and configured to move the component along a first axis. The positioning system can be configured to measure a position of the component along a second axis or a third axis. The positioning system can also be configured to control movement of the component so as to compensate for an effect of eigenmode coupling between the movement of the component along the first axis and the measured position of the component along the second axis or the third axis. In some embodiments, the component is a reticle stage or a wafer stage.
    Type: Application
    Filed: April 11, 2013
    Publication date: October 24, 2013
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Christopher Charles WARD, Mark Henricus Wilhelmus VAN GERVEN, Bram Paul Theodor VAN GOCH
  • Thin film continuous spatially modulated grey attenuators and filters
    Patent number: 8558988
    Abstract: A system and method for use of a lithography apparatus having a substrate and an absorbing film formed on the substrate. A thickness of the absorbing film is spatially modulated across at least a part of the substrate to reduce a non-uniform intensity of a radiation beam transmitted through the substrate.
    Type: Grant
    Filed: November 5, 2008
    Date of Patent: October 15, 2013
    Assignee: ASML Holding N.V.
    Inventors: Yuli Vladimirsky, Lev Ryzhikov, Ronald A. Wilklow
  • Method for controlling the position of a movable object, a control system for controlling a positioning device, and a lithographic apparatus
    Patent number: 8553205
    Abstract: A control system controls a positioning device displaceable in at least one degree of freedom by a reluctance motor. A force sensing element and a controller adjust force applied by the motor responsive to a force sensing element configured to sense force applied by the motor. The controller receives a signal representing force applied by the motor from the force sensing element, obtain an acceleration trajectory plan associated with a velocity trajectory plan for the positioning device, obtain a force trajectory plan associated with the acceleration trajectory plan, compare the force applied with a required amount of force obtained from the force trajectory, and adjust the amount of force applied by the motor based on the comparison. Related methods are also presented.
    Type: Grant
    Filed: June 24, 2010
    Date of Patent: October 8, 2013
    Assignee: ASML Holdings N.V.
    Inventors: Stephen Roux, Frederick Michael Carter, Ross Ian Mackenzie
  • Optically compensated unidirectional reticle bender
    Patent number: 8553207
    Abstract: Patterning provided by a lithographic apparatus is optically corrected for focus errors that would result from a topology of a substrate being patterned. Focus control is provided in a cross-scan direction by bending a reticle about a scan axis based on a mapped topology of the substrate. The bending can be updated from field to field as the reticle is scanned. The bending may be unidirectional (e.g., down only), but an optical compensation element (e.g., a lens or mirror polished to a cylindrical shape or a transparent plate or mirror bent by a force actuator to a cylindrical shape) can be included in order to introduce either positive or negative curvature (or no curvature) to the beam wavefront, thereby simplifying the mechatronics of the bender.
    Type: Grant
    Filed: April 7, 2009
    Date of Patent: October 8, 2013
    Assignee: ASML Holdings N.V.
    Inventor: Santiago E. Del Puerto
  • Tunable Wavelength Illumination System
    Publication number: 20130258316
    Abstract: A lithographic apparatus has an alignment system including a radiation source configured to convert narrow-band radiation into continuous, flat and broad-band radiation. An acoustically tunable narrow pass-band filter filters the broad-band radiation into narrow-band linearly polarized radiation. The narrow-band radiation may be focused on alignment targets of a wafer so as to enable alignment of the wafer. In an embodiment, the filter is configured to modulate an intensity and wavelength of radiation produced by the radiation source and to have multiple simultaneous pass-bands. The radiation source generates radiation that has high spatial coherence and low temporal coherence.
    Type: Application
    Filed: May 21, 2013
    Publication date: October 3, 2013
    Applicant: ASML Holding N.V.
    Inventors: Arie Jeffrey DEN BOEF, Earl William EBERT, Harry SEWELL, Keith William ANDRESEN, Sanjeev Kumar SINGH
  • Tunable wavelength illumination system
    Patent number: 8508736
    Abstract: A lithographic apparatus has an alignment system including a radiation source configured to convert narrow-band radiation into continuous, flat and broad-band radiation. An acoustically tunable narrow pass-band filter filters the broad-band radiation into narrow-band linearly polarized radiation. The narrow-band radiation may be focused on alignment targets of a wafer so as to enable alignment of the wafer. In an embodiment, the filter is configured to modulate an intensity and wavelength of radiation produced by the radiation source and to have multiple simultaneous pass-bands. The radiation source generates radiation that has high spatial coherence and low temporal coherence.
    Type: Grant
    Filed: March 31, 2010
    Date of Patent: August 13, 2013
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Arie Jeffrey Den Boef, Harry Sewell, Keith William Andresen, Earl William Ebert, Jr., Sanjeev Kumar Singh
  • Pulse to pulse energy equalization of light beam intensity
    Patent number: 8502957
    Abstract: A system for equalizing pulse to pulse energy of a light beam includes a group of optical devices including an optical device configured to exhibit nonlinear properties, e.g., higher order or third order nonlinear properties. Transmission properties of an unequalized light beam passing through the group of optical devices change such that an output intensity of a resulting light beam output from the optical devices is equalized. One example configuration includes at least first and second prisms having nonlinear properties, i.e., higher order or third order, and configured as a beam steering system.
    Type: Grant
    Filed: April 16, 2012
    Date of Patent: August 6, 2013
    Assignee: ASML Holding N.V.
    Inventor: Muhammad Arif
  • Image-compensating addressable electrostatic chuck system
    Patent number: 8477472
    Abstract: Systems and methods are provided for utilizing an image-compensating addressable electrostatic chuck to correct for imaging errors of a lithographic system. An image-compensating addressable electrostatic chuck comprises a substrate, a plurality of first electrodes, a plurality of second electrodes, and a support layer. The plurality of first electrodes are disposed on the substrate and spaced evenly in a first direction. The plurality of second electrodes are disposed on the substrate and spaced evenly in a second direction, the second direction being generally orthogonal to the first direction. The support layer is disposed above the pluralities of electrodes to support an object.
    Type: Grant
    Filed: June 15, 2010
    Date of Patent: July 2, 2013
    Assignee: ASML Holding N.V.
    Inventor: Matthew E. Hansen
  • System and method to increase surface tension and contact angle in immersion lithography
    Patent number: 8456611
    Abstract: A system and method to allow organic fluids to be used in immersion lithographic systems. This is done by providing a showerhead portion of a liquid supply system that is partially coated or made from a TEFLON like material. The TEFLON like material reduces wetness effect, and thus increases containment, when using an organic immersion fluid in a space between the last optic and the substrate.
    Type: Grant
    Filed: July 12, 2010
    Date of Patent: June 4, 2013
    Assignee: ASML Holding N.V.
    Inventor: Harry Sewell
  • Actuator system using multiple piezoelectric actuators
    Patent number: 8446562
    Abstract: A positioning system adjusts a position of an optical element within an optical device, such as a variable-zoom lens system. A frame supports the optical element, and an elongated surface of each of one or more elongated support structures supports the frame. The frame also supports one or more piezoelectric actuators that, respectively, engage one of the elongated support structures. A controller supplies a control signal to activate each of the one or more actuator modules. Upon activation, a piezoelectric element of each of the activated actuator modules applies a combination of a first force and a second force to an elongated surface of the respective elongated support structures to position the frame along the elongated surface. The combination of forces applied by the piezoelectric element advances the piezoelectric actuator module along the elongated support structure.
    Type: Grant
    Filed: July 24, 2009
    Date of Patent: May 21, 2013
    Assignee: ASML Holding N.V.
    Inventors: Michael F. Meehan, Fred Joseph Scipione
  • Lithographic apparatus and device manufacturing method
    Patent number: 8446563
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Grant
    Filed: August 14, 2009
    Date of Patent: May 21, 2013
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Johannes Petrus Maria Smeulers, Stefan Philip Christiaan Belfroid, Herman Vogel
  • System and method for using a two part cover and a box for protecting a reticle
    Patent number: 8446570
    Abstract: Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.
    Type: Grant
    Filed: September 15, 2010
    Date of Patent: May 21, 2013
    Assignee: ASML Holding N.V.
    Inventors: Santiago Del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olsen, Jonathan H. Feroce
  • Pneumatic Bearing with Bonded Polymer Film Wear Surface and Production Method thereof
    Publication number: 20130108203
    Abstract: Disclosed are pneumatic bearings with a bonded polymer film wear surface and production methods thereof. For example, a pneumatic bearing for supporting a payload is disclosed. The pneumatic bearing has a bearing surface having a polyimide film fastened to a substrate with a bonding layer. The polyimide film can comprise poly-oxydiphenylene-pyromellitimide and the bonding layer can comprise diglycidyl ether of bisphenol A, 1,4-butanediol diglycidyl ether, and 2,2,4-trimetylhexametylen-1,6-diamin.
    Type: Application
    Filed: April 6, 2011
    Publication date: May 2, 2013
    Applicant: ASML Holdings N.V.
    Inventors: Dragos Pariza, Santiago E. Del Puerto
  • Anti-reflective coating for optical elements
    Patent number: 8421995
    Abstract: An optical element including an anti-reflective coating is provided. The optical element includes a silicon substrate and a reflective layer disposed onto a first portion of the surface of the silicon substrate. An anti-reflective layer is disposed onto a second portion of the surface of the silicon substrate such that destructive interference at the anti-reflective layer substantially reduces any reflection of radiation incident on the anti-reflective layer.
    Type: Grant
    Filed: October 6, 2009
    Date of Patent: April 16, 2013
    Assignee: ASML Holding N.V.
    Inventor: Parag Vinayak Kelkar
  • Linear Motor and Lithography Arrangement Including Linear Motor
    Publication number: 20130063711
    Abstract: A lithographic apparatus including a uniformity correction system is disclosed. The lithographic apparatus comprises an illumination system configured to condition a beam of radiation. The illumination system comprises a uniformity correction system located at a plane configured to receive a substantially constant pupil when illuminated with the beam of radiation. The uniformity correction system includes fingers configured to be movable into and out of intersection with a radiation beam so as to correct an intensity of respective portions of the radiation beam. A linear motor actuator arrangement drives the fingers to their respective appropriate positions to compensate for non-uniform illumination. Control is provided by a control system that precisely manipulates carriers of the fingers.
    Type: Application
    Filed: May 16, 2012
    Publication date: March 14, 2013
    Applicant: ASML Holding N.V.
    Inventor: Peter C. KOCHERSPERGER
  • Multi nozzle proximity sensor employing common sensing and nozzle shaping
    Patent number: 8390782
    Abstract: A fluid proximity sensor having one or more measurement nozzles and a reference nozzle coupled to a common chamber. Diaphragms coupled to the measurement nozzles can be sensed by optical, capacitive or inductive means so as to detect changes in pressure. In addition, the number of pressure detectors can be minimized through the use of control valves to selectively couple the nozzles to the detectors, while maintaining the required high level of topographic sensitivity. Further, the measurement nozzle dimensions can be adjusted to optimize proximity measurements in response to accuracy, speed and similar requirements.
    Type: Grant
    Filed: August 11, 2009
    Date of Patent: March 5, 2013
    Assignee: ASML Holding N.V.
    Inventor: Joseph H. Lyons
  • Pre-filter for a servo control loop, and applications thereof
    Patent number: 8392003
    Abstract: A method, system and computer program product to control position of an error control module in a lithography apparatus using a servo control loop is described herein. The system comprises a filter, a servo controller coupled to the filter and configured to receive a control signal and an actuator coupled to the servo controller and configured to control the position of the error control module. The filter is configured to filter the control signal by modulating the amplitude and phase of the control signal in a desired frequency range, prior to the servo control loop.
    Type: Grant
    Filed: December 8, 2008
    Date of Patent: March 5, 2013
    Assignee: ASML Holding N.V.
    Inventor: Roberto B. Wiener
  • ELECTROSTATIC CLAMP, LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING AN ELECTROSTATIC CLAMP
    Publication number: 20130033690
    Abstract: An electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The clamp comprises a first layer of material, an electrode disposed over the first layer, an isolating, dielectric or semi-dielectric material deposited between portions of the electrode, and a second layer disposed over the electrode. Further, a method of manufacturing of the electrostatic clamp is described.
    Type: Application
    Filed: August 1, 2012
    Publication date: February 7, 2013
    Applicant: ASML Holding N.V.
    Inventors: Peter Richard HELMUS, Ronald A. Wilklow
  • System and Method for Using a Two Part Cover and a Box for Protecting a Reticle
    Publication number: 20130010277
    Abstract: Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.
    Type: Application
    Filed: September 14, 2012
    Publication date: January 10, 2013
    Applicant: ASML Holding N.V.
    Inventors: Santiago del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olsen, Jonathan H. Feroce
  • Optical position measuring system and method using a low coherence light source
    Patent number: RE44434
    Abstract: An optical position measuring system (e.g., an interferometer) includes a superluminescent device (SLD) (e.g., a laser diode having at least one anti-reflective coated surface) and a detector. The SLD generates a light beam having a short coherence length (e.g., about 0.1 mm to about 0.5 mm, less than the optical path length of an optical element, and/or less than a spacing between optical elements). Through use of the short coherence length light beam, interference effects from spurious or ghost reflections that exist in conventional position measuring systems are substantially reduced or eliminated.
    Type: Grant
    Filed: August 31, 2012
    Date of Patent: August 13, 2013
    Assignee: ASML Holding N.V.
    Inventor: J. Christian Swindal