Patents Assigned to ASML Holding N.V.
-
Publication number: 20100290017Abstract: A system and method are used to determine a parameter (e.g., angle, position, orientation, etc.) of a device. A first portion includes a source of radiation configured to produce a beam of radiation that is directed to be reflected from a reflective portion of the device. A second portion is coupled to the first portion and includes a measurement device and, optionally, a detector, such that the reflected beam transmits through the measurement device onto the detector. The parameter of the device is determined based on the interaction of the reflected beam and the measurement device. In one example, the first and second portions can form a folded optical encoder that measures an angle of a scanning mirror or a position or orientation of a stage within a lithography apparatus.Type: ApplicationFiled: December 18, 2008Publication date: November 18, 2010Applicant: ASML Holding N.V.Inventor: Christopher J. Mason
-
Patent number: 7830497Abstract: Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.Type: GrantFiled: April 18, 2007Date of Patent: November 9, 2010Assignee: ASML Holding N.V.Inventors: Santiago del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olsen, Jonathan H. Feroce
-
Patent number: 7826142Abstract: An embodiment of the present invention provides a method for designing optical surfaces. According to this method, m optical surfaces are defined, such that each successive optical surface receives a wavefront from a previous optical surface. Wavefront aberrations caused by each optical surface are calculated. The changes at each respective optical surface required to compensate for the wavefront aberration caused by the respective optical surfaces are then calculated. A desired optical profile for each of the m optical surfaces is determined in accordance with the calculated changes to each respective optical surface.Type: GrantFiled: April 29, 2005Date of Patent: November 2, 2010Assignee: ASML Holding N.V.Inventors: Nora-Jean Harned, Richard A. Gontin, Robert D. Harned, Azat M. Latypov, Stanislav Y. Smirnov
-
Publication number: 20100271605Abstract: A method for protecting a wet lens element from liquid degradation is provided. The method includes applying a thin coating of an organoxy-metallic compound to the side portions of a wet lens element to leave behind an optically inert, light absorbing metal oxide film. A liquid shield coating is applied on top of the metal oxide coating. The two coating layers protect the wet lens element from liquid degradation when the side portion of the wet lens element is submerged into a liquid. In an embodiment, the wet lens element is an immersion lithography wet lens element and the liquid is an immersion lithography liquid.Type: ApplicationFiled: July 13, 2010Publication date: October 28, 2010Applicant: ASML Holding N.V.Inventors: Matthew Lipson, Taras Shvets, Richard Bruls
-
Patent number: 7821625Abstract: Angular deviation of illumination beam is measured with high accuracy for an expanded continuous range of angles using grating sensors that are configured to exhibit Surface Plasmon Resonance effects at actinic wavelengths. The beam deviation measurement systems and procedures are applicable to both mask-based and maskless lithography tools. A control system adopts an appropriate calibration algorithm based on whether the SPR effect is detected or not. Relative intensity shift in an SPR-affected diffractive order, and/or relative position and slope change in non-SPR-affected diffractive orders are used as a basis of the adopted calibration algorithm.Type: GrantFiled: December 22, 2008Date of Patent: October 26, 2010Assignee: ASML Holding N.V.Inventor: Todd R. Downey
-
Publication number: 20100259743Abstract: A lithography system can include a radiation source, an illumination system, a patterning device, and a projection system. The illumination system can be configured to process a beam of radiation to produce a plurality of beams of radiation. The illumination system can include a pupil defining element, a condenser lens, a field defining element, a first relay that includes first and second lens arrays, a plurality of rods, a diaphragm having transmission areas, and a second relay. The patterning device can be configured to pattern the plurality of beams of radiation. Further, the projection system can be configured to project the patterned beams onto a substrate.Type: ApplicationFiled: June 30, 2010Publication date: October 14, 2010Applicant: ASML Holding N.V.Inventor: Stanislav Y. Smirnov
-
Publication number: 20100242465Abstract: A fluidic actuator and a control system for the fluidic actuator are described. A first component of the actuator may have two openings interconnected by a passageway. A second component may be moveably housed within the passageway and divide the passageway into two portions. A fluid delivery system may be connected to the two openings. The fluid delivery system may supply a first pressure of fluid to the first portion of the passageway causing the second component to move within the passageway at a first speed. When the second component is in a selected position within the passageway, the fluid delivery system may reduce the pressure of the fluid, causing a reduction in speed of the second component. The fluidic actuator may be used in a wafer processing system.Type: ApplicationFiled: April 29, 2010Publication date: September 30, 2010Applicant: ASML Holding N.V.Inventor: Andrew P. Nguyen
-
Patent number: 7804601Abstract: Characterization of an optical system is quickly and easily obtained in a single acquisition step by obtaining image data within a volume of image space. A reticle and image plane are positioned obliquely with respect to each other such that a reticle having a plurality of feature sets thereon, including periodic patterns or gratings, is imaged in a volume of space, including the depth of focus. Metrology tools are used to analyze the detected or recorded image in the volume of space through the depth of focus in a single step or exposure to determine the imaging characteristics of an optical system. Focus, field curvature, astigmatism, spherical, coma, and/or focal plane deviations can be determined. The present invention is particularly applicable to semiconductor manufacturing and photolithographic techniques used therein, and is able to quickly characterize an optical system in a single exposure with dramatically increased data quality and continuous coverage of the full parameter space.Type: GrantFiled: October 25, 2004Date of Patent: September 28, 2010Assignee: ASML Holding N.V.Inventor: Matthew E. Hansen
-
Patent number: 7797985Abstract: Provided are a methods and systems for determining a topography of an object. In an embodiment, a system includes a reference probe configured to measure a surface of a reference surface and to generate a reference signal, a measuring probe configured to measure a surface of an object and to generate a measurement signal, a sensor configured to sense a position of the measuring probe and to generate a sensor signal, and a combiner configured to receive the sensor signal and the measurement signal and to generate a combination signal therefrom. A desired distance between the measuring probe and the object is substantially maintained by adjusting the position of the measuring probe based on the measurement signal. A topography of the object is determined based at least on a comparison of the reference signal and the combination signal.Type: GrantFiled: September 12, 2008Date of Patent: September 21, 2010Assignee: ASML Holding N.V.Inventors: Daniel N. Galburt, Boguslaw F. Gajdeczko
-
Patent number: 7786607Abstract: A method and apparatus for correcting overlay errors in a lithography system. During lithographic exposure, features being exposed on the wafer need to overlay existing features on the wafer. Overlay is a critical performance parameter of lithography tools. The wafer is locally heated during exposure. Thermal expansion causes stress between the wafer and the wafer table, which will cause the wafer to slip if it exceeds the local frictional force. To increase the amount of expansion allowed before slipping occurs, the wafer chuck is uniformly expanded after the wafer has been loaded. This creates an initial stress between the wafer and the wafer table. As the wafer expands due to heating during exposure, the expansion first acts to relieve the initial stress before causing an opposite stress from thermal expansion. The wafer may be also be heated prior to attachment to the wafer chuck, creating the initial stress as the wafer cools.Type: GrantFiled: February 19, 2004Date of Patent: August 31, 2010Assignee: ASML Holding N.V.Inventor: Peter Kochersperger
-
Publication number: 20100214544Abstract: A fluid handling device for an immersion lithographic apparatus, the fluid handling device comprising: at least one body with a surface facing a space for fluid; a plurality of openings for the flow of fluid therethrough defined in the surface; at least one barrier moveable relative to the plurality of openings for selectively allowing or preventing the flow of fluid through selected openings of the plurality of openings.Type: ApplicationFiled: February 24, 2010Publication date: August 26, 2010Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Harry Sewell, Sjoerd Nicolaas lambertus Donders, Louis John Markoya, Diane McCafferty, Ralph Joseph Meijers
-
Patent number: 7781029Abstract: A method for protecting a wet lens element from liquid degradation is provided. The method includes applying a thin coating of an organoxy-metallic compound to the side portions of a wet lens element to leave behind an optically inert, light absorbing metal oxide film. A liquid shield coating is applied on top of the metal oxide coating. The two coating layers protect the wet lens element from liquid degradation when the side portion of the wet lens element is submerged into a liquid. In an embodiment, the wet lens element is an immersion lithography wet lens element and the liquid is an immersion lithography liquid.Type: GrantFiled: June 23, 2006Date of Patent: August 24, 2010Assignee: ASML Holding N.V.Inventors: Matthew Lipson, Taras Shvets, Richard Bruls
-
Patent number: 7777862Abstract: A system and method form illumination that efficiently illuminates target areas of an object. For example, target areas can be transmission areas of a diaphragm and/or active areas of a patterning device. A plurality of beams formed by a field defining element are directed onto respective entrance faces of a plurality of rods using a relay of first and second lens arrays. The rods process the beams to form illumination that impinges substantially only within a boundary of the target areas, e.g., the transmission areas and/or the active areas. The rods are arranged in number, configuration, and cross-sectional shape corresponding to a number, configuration, and a cross-sectional shape of the target areas, e.g., the transmission areas and/or the active areas. Thus, substantially all the illumination falls within the boundary of the target areas, increasing illumination efficiency.Type: GrantFiled: April 13, 2006Date of Patent: August 17, 2010Assignee: ASML Holding N.V.Inventor: Stanislav Y. Smirnov
-
Patent number: 7777861Abstract: A method, system, and computer program product are provided for printing a pattern on a photosensitive surface using a maskless lithography system including a spatial light modulator (SLM). The method, system, and computer program product define two or more exposure areas within a predetermined region of the surface, each area corresponding to selected pixels of the SLM. An overlap region is formed between the two or more exposure areas, the overlapping region being defined by respective overlapping edges of the exposure areas, the overlapping edges corresponding to overlapping pairs of the selected pixels from each area. The pixels within each pair are alternately activated such that only one of the pixels within the pair is used to produce the pattern.Type: GrantFiled: August 9, 2007Date of Patent: August 17, 2010Assignee: ASML Holding N.V.Inventors: Azat Latypov, Karel Van Der Mast
-
Patent number: 7773195Abstract: A system and method to allow organic fluids to be used in immersion lithographic systems. This is done by providing a showerhead portion of a liquid supply system that is partially coated or made from a TEFLON like material. The TEFLON like material reduces wetness effect, and thus increases containment, when using an organic immersion fluid in a space between the last optic and the substrate.Type: GrantFiled: November 29, 2005Date of Patent: August 10, 2010Assignee: ASML Holding N.V.Inventor: Harry Sewell
-
Patent number: 7773199Abstract: A method and system are provided of using a patterning device. An exemplary method includes defining a first region on a surface, the first region being associated with a first element of the patterning device, defining a second region on the surface, the second region being associated with a second element of the patterning device, activating the first element to expose the overlapping region, and deactivating the second element when the first element is active. The first region and the second region overlap in an overlapping region.Type: GrantFiled: December 13, 2007Date of Patent: August 10, 2010Assignee: ASML Holding N.V.Inventors: Arno Bleeker, Wenceslao A. Cebuhar, Justin Kreuzer, Azat Latypov, Yuli Vladimirsky
-
Patent number: 7773287Abstract: A method and system for determining specific pixel modulation states of a spatial light modulator (SLM) to print a desired pattern on a substrate are disclosed. The method includes selecting at least one super-pixel in an object plane of the desired pattern, the super-pixel being formed of at least two pixels. At least one edge of the desired pattern crosses a boundary within the super-pixel, the at least one edge being defined by specific slope and position parameters relative to the super-pixel. The method also includes (i) forming an interpolation table to tabulate pre-calculated pixel modulation states and (ii) determining the specific pixel modulation states for each of the pixels in accordance with the interpolation table. Disclosed also are a method and system for providing a spatial light modulator (SLM). The SLM includes a plurality of mirrors structured to form groups of super-pixels.Type: GrantFiled: April 24, 2007Date of Patent: August 10, 2010Assignee: ASML Holding N.V.Inventors: Azat M. Latypov, Kars Zegar Troost, Johannes Jacobus Matheus Baselmans
-
Publication number: 20100195081Abstract: A system and method substantially eliminate reticle slip during the movement of a reticle stage. The system includes a mask holding system, a mask force device, and a support transport device. The mask holding system includes a support device and a holding device where the holding device releasably couples a mask, e.g., a patterning device such as a reticle having a pattern, to the support device. The mask force device is releasably connected to the mask in order to provide an accelerating force to the mask, such that a projection optic in a lithographic apparatus may accurately project a pattern imparted by the patterning device onto a target portion of the substrate by using a radiation beam. The support transport device is coupled to and moves the mask support device concurrently with the mask force device.Type: ApplicationFiled: November 30, 2009Publication date: August 5, 2010Applicant: ASML Holding N.V.Inventors: Santiago E. DEL PUERTO, Enrico Zordan
-
Patent number: 7751130Abstract: The present invention is directed to optical element damping systems. In particular, an eddy current damper is disclosed. The eddy current damper includes a rod, a series of conducting plates coupled to the rod, and layers of magnets. The alternating layers have alternating magnetic fields. When an optical element moves, the optical element will exert a force on the rod. The rod causes the conducting plates to move relative to the alternating layers of magnets to generate eddy currents within each of the conducting plates, such that the eddy currents damp the motion of an optical element. In an alternative embodiment, an eddy current damper motion amplifier is used to provide additional mechanical advantage that significantly increases the damping provided by the eddy current damper. Eddy current dampers are provided within conventional scanning lithography devices and optical maskless lithography devices to improve performance by stabilizing optical element motion.Type: GrantFiled: December 7, 2006Date of Patent: July 6, 2010Assignee: ASML Holding N.V.Inventors: Stephen Roux, Peter Kochersperger, Justin Kreuzer
-
Patent number: 7751030Abstract: A lithographic projection apparatus includes an illumination system, an interchangeable upper optics module, and a lower optics module. The illumination system provides a beam of radiation. The interchangeable upper optics module receives the beam and includes, sequentially, a beam splitter that splits the beam into portions, an aperture plate, and a plurality of reflecting surfaces. The lower optics module receives portions of the beam from respective ones the reflecting surfaces and directs the portions of the beam onto a substrate. Interference fringes or contact hole patterns are formed on the substrate using the portions of the beam.Type: GrantFiled: January 30, 2006Date of Patent: July 6, 2010Assignee: ASML Holding N.V.Inventors: Louis Markoya, Aleksandr Khmelichek, Diane C. McCafferty, Harry Sewell, Justin L. Kreuzer