Patents Assigned to ASML Netherlands B.V.
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Publication number: 20240119212Abstract: Methods for configuring a patterning process based on results of another patterning process is described. The method includes obtaining a first set of contours by simulating a first patterning process using a design layout in a first orientation. The contours satisfy a design specification associated with the design layout and correspond to a first set of process window conditions. A second patterning process is configured based on a second orientation of the design layout, the first set of process window conditions and the first set of contours. The second patterning process is associated with one or more design variables (e.g., illumination, mask pattern) that affect a second set of contours. The configuring includes adjusting one or more design variables until the second set of contours are within a desired matching threshold with the first set of contours.Type: ApplicationFiled: February 25, 2022Publication date: April 11, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Jung Hoon SER, Sungwoon PARK, Xin LEI, Jinwoong JEONG, Rongkuo ZHAO, Duan-Fu Stephen HSU, Xiaoyang LI
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Publication number: 20240118625Abstract: A method of simulating an electromagnetic response of a metrology target comprising first and second gratings, wherein the second grating is below the first grating, the method comprising: receiving a model defining (i) the first grating as having a first number of grating lines within a pitch, each of the first number of grating lines separated by a first pitch; and (ii) the second grating as having a second number of grating lines within the pitch, each of the second number of grating lines separated by a second pitch; using the model and the first pitch to simulate properties of the first grating and generate a first scattering matrix; using the model and the second pitch to simulate properties of the second grating and generate a second scattering matrix; generating a scattering matrix defining properties of the metrology target by combining the first scattering matrix and the second scattering matrix.Type: ApplicationFiled: December 8, 2021Publication date: April 11, 2024Applicant: ASML NETHERLANDS B.V.Inventor: Markus Gerardus Martinus Maria VAN KRAAIJ
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Publication number: 20240118584Abstract: A broadband radiation source device configured for generating a broadband output radiation upon receiving pump radiation, the device including: a hollow-core photonic crystal fiber (HC-PCF) including at least one structurally varied portion having at least one structural parameter of the HC-PCF varied with respect to one or more main portions of the HC-PCF, wherein the at least one structurally varied portion includes at least a structurally varied portion located downstream of a position along the length of the HC-PCF where the pump radiation will be spectrally expanded by a modulation instability dominated nonlinear optical process, and wherein the at least one structurally varied portion is configured and located such that the broadband output radiation includes wavelengths in the ultraviolet region.Type: ApplicationFiled: November 9, 2023Publication date: April 11, 2024Applicant: ASML Netherlands B.V.Inventors: Janneke RAVENSBERGEN, Patrick Sebastian Uebel, Willem Richard Pongers
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Publication number: 20240118629Abstract: A method of processing measurement data relating to a substrate processed by a manufacturing process. The method includes obtaining measurement data relating to a performance parameter for at least a portion of the substrate; and fitting the measurement data to a model by minimizing a complexity metric applied to fitting parameters of the model while not allowing the deviation between the measurement data and the fitted model to exceed a threshold value.Type: ApplicationFiled: October 5, 2020Publication date: April 11, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Aliasghar KEYVANI JANBAHAN, Frans Reinier SPIERING, Jochem Sebastiaan WILDENBERG, Everhardus Cornelis MOS
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Patent number: 11953823Abstract: A method of controlling an imaging process uses a qualified optical proximity correction (OPC) model, the process including obtaining an OPC model that is configured to model the behavior of OPC modifications to a pre-OPC design in a process for forming a pattern on a substrate using a post-OPC design in a patterning process, using the patterning process in a manufacturing environment, collecting process control data in substrates patterned using the patterning process in the manufacturing environment, storing the collected process control data in a database, analyzing, by a hardware computer system, the stored, collected process control data to verify that the OPC model is correcting pattern features within a selected threshold, and for pattern features falling outside the selected threshold, determining a modification to the imaging process to correct imaging errors.Type: GrantFiled: August 12, 2019Date of Patent: April 9, 2024Assignee: ASML NETHERLANDS B.V.Inventor: Christopher Alan Spence
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Patent number: 11953837Abstract: The present invention provides a testing substrate (W) for estimating stress in production substrates due to a substrate support, said testing substrate having a support surface (SS) divided into predefined portions, wherein the predefined portions comprise at least one first portion (1) having a first coefficient of friction being substantially uniform across the at least one first portion, and at least one second portion (2) having a second coefficient of friction being substantially uniform across the at least one second portion, wherein the second coefficient of friction is different to the first coefficient of friction. The present invention also provides a method for estimating stress in a substrate due to a substrate support and a system for making such an estimation.Type: GrantFiled: November 5, 2019Date of Patent: April 9, 2024Assignee: ASML Netherlands B.V.Inventors: Thomas Poiesz, Michel Ben Isel Habets, Abraham Alexander Soethoudt, Herman Marquart
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Patent number: 11953835Abstract: Method of exposing a substrate by a patterned radiation beam, comprising: —providing a radiation beam; —imparting the radiation beam by an array of individually controllable elements; —generating, from the radiation beam, a patterned radiation beam, by tilting the individually controllable elements between different positions about a tilting axis; —projecting the patterned radiation beam towards a substrate; —scanning a substrate across the patterned radiation beam in a scanning direction so as to expose the substrate to the patterned radiation beam, whereby the tilting axis of the individually controllable elements is substantially perpendicular to the scanning direction.Type: GrantFiled: December 28, 2020Date of Patent: April 9, 2024Assignee: ASML NETHERLANDS B.V.Inventor: Erwin John Van Zwet
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Patent number: 11953836Abstract: A reticle transport system having a magnetically levitated transportation stage is disclosed. Such a system may be suitable for use in vacuum environments, for example, ultra-clean vacuum environments. A magnetic levitated linear motor functions to propel the transportation stage in a linear direction along a defined axis of travel and to magnetically levitate the transportation stage.Type: GrantFiled: March 7, 2022Date of Patent: April 9, 2024Assignees: Massachusetts Institute of Technology, ASML Netherlands B.V.Inventors: Lei Zhou, David L. Trumper, Ruvinda Gunawardana
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Patent number: 11953450Abstract: Systems, methods, and apparatus are provided for determining overlay of a pattern on a substrate with a mask pattern defined in a resist layer on top of the pattern on the substrate. A first grating is provided under a second grating, each having substantially identical pitch to the other, together forming a composite grating. A first illumination beam is provided under an angle of incidence along a first horizontal direction. The intensity of a diffracted beam from the composite grating is measured. A second illumination beam is provided under the angle of incidence along a second horizontal direction. The second horizontal direction is opposite to the first horizontal direction. The intensity of the diffracted beam from the composite grating is measured. The difference between the diffracted beam from the first illumination beam and the diffracted beam from the second illumination beam, linearly scaled, results in the overlay error.Type: GrantFiled: November 16, 2022Date of Patent: April 9, 2024Assignee: ASML Netherlands B.V.Inventor: Arie Jeffrey Den Boef
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Publication number: 20240111221Abstract: A method of determining a measurement recipe for measurement of in-die targets located within one or more die areas of an exposure field. The method includes obtaining first measurement data relating to measurement of a plurality of reference targets and second measurement data relating to measurement of a plurality of in-die targets, the targets having respective different overlay biases and measured using a plurality of different acquisition settings for acquiring the measurement data. One or more machine learning models are trained using the first measurement data to obtain a plurality of candidate measurement recipes, wherein the candidate measurement recipes include a plurality of combinations of a trained machine learned model and a corresponding acquisition setting; and a preferred measurement recipe is determined from the candidate measurement recipes using the second measurement data.Type: ApplicationFiled: January 12, 2022Publication date: April 4, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Hendrik Adriaan VAN LAARHOVEN, Bastiaan Maurice VAN DEN BROEK, Vito Daniele RUTIGLIANI
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Publication number: 20240111218Abstract: A method of determining a characteristic of one or more processes for manufacturing features on a substrate, the method including: obtaining image data of a plurality of features on a least part of at least one region on a substrate; using the image data to obtain measured data of one or more dimensions of each of at least some of the plurality of features; determining a statistical parameter that is dependent on the variation of the measured data of one or more dimensions of each of at least some of the plurality of features; determining a probability of defective manufacture of features in dependence on a determined number of defective features in the image data; and determining the characteristic of the one or more processes to have the probability of defective manufacture of features and the statistical parameter.Type: ApplicationFiled: November 6, 2023Publication date: April 4, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Wim Tjibbo TEL, Hermanus Adrianus DILLEN, Marc Jurian KEA, Mark John MASLOW, Koen THUIJS, Peter David ENGBLOM, Ralph Timotheus HUIJGEN, Daan Maurits SLOTBOOM, Johannes Catharinus Hubertus MULKENS
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Publication number: 20240111214Abstract: A method for representing control parameter data for controlling a lithographic apparatus during a scanning exposure of an exposure field on a substrate, the method including: obtaining a set of periodic base functions, each base function out of the set of periodic base functions having a different frequency and a period smaller than a dimension associated with the exposure field across which the lithographic apparatus needs to be controlled; obtaining the control parameter data; and determining a representation of the control parameter data using the set of periodic base functions.Type: ApplicationFiled: December 20, 2021Publication date: April 4, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Jacob Fredrik Friso KLINKHAMER, Michel Alphons Theodorus VAN HINSBERG
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Patent number: 11947256Abstract: A method of manufacturing a pellicle for a lithographic apparatus, the method including locally heating the pellicle using radiative heating, and depositing coating material simultaneously on both sides of the pellicle, and pellicles manufactured according to this method. Also disclosed is the use of a multilayer graphene pellicle with a double-sided hexagonal boron nitride coating in a lithographic apparatus.Type: GrantFiled: June 26, 2018Date of Patent: April 2, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Evgenia Kurganova, Adrianus Johannes Maria Giesbers, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Pieter-Jan Van Zwol, David Ferdinand Vles, Willem-Pieter Voorthuijzen
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Patent number: 11947266Abstract: A method for determining a correction relating to a performance metric of a semiconductor manufacturing process, the method including: obtaining a set of pre-process metrology data; processing the set of pre-process metrology data by decomposing the pre-process metrology data into one or more components which: a) correlate to the performance metric; or b) are at least partially correctable by a control process which is part of the semiconductor manufacturing process; and applying a trained model to the processed set of pre-process metrology data to determine the correction for the semiconductor manufacturing process.Type: GrantFiled: November 14, 2019Date of Patent: April 2, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Nicolaas Petrus Marcus Brantjes, Matthijs Cox, Boris Menchtchikov, Cyrus Emil Tabery, Youping Zhang, Yi Zou, Chenxi Lin, Yana Cheng, Simon Philip Spencer Hastings, Maxim Philippe Frederic Genin
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Patent number: 11947264Abstract: An actuator, configured to move a first object with respect to a second object, that includes a first body having an annular ring, a second body, arranged movably with respect to the first body, having a longitudinal shaft at least partially disposed within the annular ring, and at least one spring device, arranged between the first body and the second body, wherein the at least one spring device is configured to guide relative movements between the first body and the second body in a range of movement, and the at least one spring device has two or more leaf springs, wherein each of the two or more leaf springs is connected to the first body and to the second body, and wherein at least one of the leaf springs is in a non-planar state when the spring device is in an equilibrium position.Type: GrantFiled: April 3, 2020Date of Patent: April 2, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Patrick Willem Paul Limpens, Gerard Johannes Boogaard, Michaël Johannes Anna Maria Walters
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Patent number: 11948772Abstract: Apparatus and methods for adjusting beam condition of charged particles are disclosed. According to certain embodiments, the apparatus includes one or more first multipole lenses displaced above an aperture, the one or more first multipole lenses being configured to adjust a beam current of a charged-particle beam passing through the aperture. The apparatus also includes one or more second multipole lenses displaced below the aperture, the one or more second multipole lenses being configured to adjust at least one of a spot size and a spot shape of the beam.Type: GrantFiled: January 30, 2023Date of Patent: April 2, 2024Assignee: ASML Netherlands B.V.Inventor: Xuedong Liu
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Patent number: 11947269Abstract: A method including: obtaining a detected representation of radiation redirected by each of a plurality of structures from a substrate additionally having a device pattern thereon, wherein each structure has an intentional different physical configuration of the respective structure than the respective nominal physical configuration of the respective structure, wherein each structure has geometric symmetry at the respective nominal physical configuration, wherein the intentional different physical configuration of the structure causes an asymmetric optical characteristic distribution and wherein a patterning process parameter measures change in the physical configuration; and determining a value, based on the detected representations and based on the intentional different physical configurations, to setup, monitor or correct a measurement recipe for determining the patterning process parameter.Type: GrantFiled: October 8, 2021Date of Patent: April 2, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Thomas Theeuwes, Maria Isabel De La Fuente Valentin, Mir Homayoun Shahrjerdy, Arie Jeffrey Den Boef, Shu-jin Wang
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Publication number: 20240103386Abstract: An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.Type: ApplicationFiled: October 3, 2023Publication date: March 28, 2024Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Derk Servatius Gertruda BROUNS, Joshua ADAMS, Aage BENDIKSEN, Richard JACOBS, Andrew JUDGE, Veera Venkata Narasimha Narendra Phani KOTTAPALLI, Joseph Harry LYONS, Theodorus Marinus MODDERMAN, Manish RANJAN, Marcus Adrianus VAN DE KERKHOF, Xugang XIONG
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Publication number: 20240104284Abstract: Systems and methods of feature-based cell extraction. The methods include obtaining data representative of a layout, wherein the layout includes a pattern region having no vertices, extracting unit cells from the pattern region having no vertices, identifying, using the unit cells, a set of regions of the layout matching the unit cells, and generating, using the unit cells, a hierarchy for the set of regions. In some embodiments the pattern regions have oblique angle features or have no vertices of features. The pattern regions can have a feature including a feature slope, a horizontal or a vertical pitch, or a line-space feature. In some embodiments the hierarchy is optimized using a linear optimization and can be provided for use in modeling, OPC, defect inspection, defect prediction, or SMO.Type: ApplicationFiled: November 24, 2021Publication date: March 28, 2024Applicant: ASML NETHERLANDS B.V.Inventor: Yan-ting LIN
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Publication number: 20240105416Abstract: Assessment systems and methods are disclosed. In one arrangement, an effect of electrode distortion in an objective lens array is compensated. An electrode distortion is adjusted by varying an electrostatic field in the objective lens array. The adjustment is such as to compensate for an effect of electrode distortion on sub-beams of a multi-beam impinging on a sample. A sub-beam is refocused in response to the variation in electrostatic field in the objective lens array. The adjusting and the refocusing comprises changing potentials applied to at least two electrodes of the objective lens array.Type: ApplicationFiled: December 8, 2023Publication date: March 28, 2024Applicant: ASML Netherlands B.V.Inventor: Marco Jan-Jaco WIELAND