Abstract: An apparatus for broadband radiation generation including a fiber disposed in an enclosure including: a body; and a heat transport region configured to transport heat from the fiber to the body, the heat transport region including a first medium disposed between the fiber and the body, wherein, in at least one radial direction from the fiber, the heat transport region further includes a second medium disposed between the first medium and the body over a portion of the enclosure, the second medium including a solid and/or a liquid, wherein a radial distance between the fiber and the second medium is less than or equal to 2 mm and wherein the second medium forms a slit over the portion of the enclosure, the slit extending in a direction perpendicular to a longitudinal axis of the fiber, the slit being wider than a diameter of the fiber.

Abstract: A method and system for generating a mask pattern design for use in imaging of a pattern on a substrate using a lithographic apparatus. The method includes identifying an area located between two adjacent exposure fields in a lithography process, and determining a placement and a geometry of a sub-resolution feature to be placed in the area of an absorber layer of the mask pattern design based on a prescribed background intensity criterion. One or more geometrical parameters, such as pitch and/or critical dimension (CD) of the sub-resolution feature, and one or more placement parameters, such as overlay parameter and/or line end distance, are determined for assisting in designing and positioning the sub-resolution feature in the absorber layer to minimize specular reflection from the absorber layer. The one or more placement parameters may also assist in stitching images of adjacent exposure fields.

Abstract: A method to generate an inspection tool sampling plan is disclosed. More, particularly, a method to generate an inspection tool sampling plan for more accurate die loss projection assuming non-uniform defect density or distribution on a wafer is disclosed. A method to optimize an inspection tool sampling plan is disclosed. More particularly, a method of optimizing a wafer region definition and sampling budget distribution for improved die loss projection without relying on pre-determined wafer region definition and sampling budget distribution variables is disclosed. A computational probability prediction model, sampling plan optimizer, and die loss projection formula are disclosed to project die loss with improved accuracy and versatility to guide different wafers for inspection.

Abstract: A method of manufacturing an electrode for an object holder, the method including forming at least two electrode portions on a first insulating layer, the at least two electrode portions being spaced from each other, forming at least one insulating portion on the first insulating layer between the at least two electrode portions such that the at least one insulating portion fills a space between the at least two electrode portions and the at least two electrode portions form a planar surface with the at least one insulating portion, and bonding a second insulating layer to the planar surface.

Abstract: Systems and methods for fabricating a substrate of a charged-particle detector for use in a charged-particle beam apparatus are disclosed. The substrate may include a charge sensing element formed on a first surface of the substrate and configured to detect charged particles originating from a sample; and a plurality of transistors formed in a first region of a second surface of the substrate, the second surface being opposite the first surface, wherein a top surface of each transistor of the plurality of transistors is coplanar with a top surface of the first region and with the second surface of the substrate.

Abstract: An improved method and system for image alignment of an inspection image are disclosed. The improved method and system comprises a misalignment index based on applying a density function to both a sample image and a reference image at a region of interest. One or more metrics, such as cross-correlation of the sample and reference images, can be used to derive a region-density based misalignment index from the density-function images. The index can yield a unique alignment solution that is robust to noise and other errors.

Abstract: An EUV radiation source comprising a laser configured to emit a laser beam, and an optical system configured to control a position of the laser beam such that it is incident upon fuel droplets, wherein the optical system comprises an optical path which includes a position-controllable mirror having a control bandwidth of at least 500 Hz.

Abstract: A hollow core fiber and source assembly for broadband generation, wherein a hollow core of the hollow core fiber is filled with a gas composition comprising a working gas. The fiber is configured to receive pulsed pump radiation at an input end of the hollow core fiber, the pulsed pump power having a pulse power exceeding an ionization threshold of the gas composition. The fiber is configured to confine and guide the pulsed pump radiation through the fiber such that it interacts with the working gas for generating broadband radiation through nonlinear broadening of the pulsed pump radiation. The gas composition comprises a hydrogen component which is less than 1% of the total gas composition in the hollow core fiber.

Abstract: A method of grouping pattern features of a substantially irregular pattern layout for patterning a substrate in a lithographic process. The method includes obtaining at least one substantially irregular pattern representation, each at least one substantially irregular pattern representation relating to a respective layer of interest; grouping a plurality of pattern features included within the at least one substantially irregular pattern representation based on geometry and/or at least one processing attribute relating to processing performance into a plurality of groups, each group including a plurality of pattern features which are similar in terms of geometry and/or the at least one processing attribute; and deriving a parameter of interest associated with one or more groups of the plurality of groups.

Abstract: A reticle stage for a lithographic apparatus is disclosed. The reticle stage comprises a support for a reflective reticle, and at least one shielding element coupled to the support. The at least one shielding element is selectively configurable between a first position for shielding a portion of a patterned side of the reflective reticle from a radiation beam, and a second position for exposing the portion. An EUV lithography apparatus and a corresponding method of operating an EUV lithographic apparatus is also disclosed.

Abstract: A wavelength of a tunable laser device is stabilized by providing a laser beam from a tunable laser source to an interferometer having a stable reference axis and to a gas absorption cell, scanning the laser beam between first and second wavelengths to determine absorption cell transmission spectrum as a function of wavelength difference; using the interferometer to determine phase change as a function of the wavelength difference; determining a transmission spectrum as a function of the phase change using the gas absorption cell transmission spectrum and phase change as a function of wavelength difference; correlating the determined transmission spectrum as a function of phase change to a pre-calibrated transmission spectrum of the tunable laser device to provide absolute laser wavelength as a function of the phase change; defining phase setpoint corresponding to wavelength setpoint; using the phase setpoint to tune the tunable laser device to the wavelength setpoint.

Abstract: A charged particle detector includes a plurality of sensing elements. The sensing elements may be divided into in sections, with each section including an array of sensing elements. Each section may be coupled to adjacent sections by a set of switches in an upper hierarchy of a switch matrix. Individual sensing elements may be connected to the upper hierarchy in their section by pickup switches. Individual sensing elements may further be coupled to adjacent sensing elements by lateral switches in a lower hierarchy. When sensing elements are grouped together to detect a charged particle beam spot, an optimal configuration of lower and upper hierarchy switches may be selected to optimize bandwidth performance of the detector.

Abstract: Systems, apparatuses, and methods include a generating a reference signal based on a power input for an imaging system; generating a scan signal indicating a scan of a sample; extracting, from an image generated from the scan, first and second disturbance data; generating a calibrated frequency, magnitude, and phase of the image disturbance using the extracted first and second disturbance data, the reference signal, and the scan signal; combining the calibrated frequency, magnitude, and phase of the image disturbance and the reference signal to generate a compensation signal; and using the compensation signal to control a plurality of deflection drivers used for manipulating charged particles to scan the sample.

Abstract: A charged particle detector includes an array of sensing elements that may be selectively grouped with each other by a switch matrix. The sensing elements may be grouped in a shape and location that corresponds to an expected shape and location of beam spot to be detected. During a detection process, the grouping of sensing elements may be updated in real time. Updating may include both adding peripheral sensing elements to the group, as well as removing peripheral sensing elements from the group. A sensing element may be added if it is determined to be receiving sufficient irradiation from the beam spot. A sensing element may be removed if it is determined to not be receiving sufficient irradiation from the beam spot. The determination may be made by a thresholding circuit located within each sensing element.

Abstract: There is provided a superconductive (SC) magnet assembly for a planar motor that includes one or more of the following elements. A two-dimensional (2D) array of SC coils configured to generate a two-dimensional spatially alternating magnetic field. A shield arranged on a side of the 2D array of SC coils facing, during use, a mover of the planar motor, the shield being configured to mitigate a magnetic field change as experienced by the 2D array of SC coils. The shield comprises a layer of conductive material, the layer spanning an area substantially covering the 2D array of SC coils, the layer of conductive material having a thickness variation across the area, the thickness variation across the area being associated with a magnetic pitch of the array of SC coils, an inner diameter of a coil of the array of SC coils or an outer diameter of a coil of the array of SC coils of the 2D array of SC coils.

Abstract: A method of inferring a value for at least one local uniformity metric relating to a product structure, the method including: obtaining intensity data including an intensity image relating to at least one diffraction order obtained from a measurement on a target; obtaining at least one intensity distribution from the intensity image; determining, from the at least one intensity distribution, an intensity indicator expressing a variation of either intensity over the at least one diffraction order, or a difference in intensity between two complimentary diffraction orders over the intensity image; and inferring the value for the at least one local uniformity metric from the intensity indicator.

Abstract: A cleaning system for cleaning a component related to a lithographic process such as a pellicle, reticle, wafer or another lithographic component, the system including at least one radiation emitter configured to, in use, irradiate a region of the component so as to cause thermomechanical vibrations in the component and/or induce sputtering of contaminants present on the component.

Abstract: Methods of determining, and using, a process model that is a machine learning model. The process model is trained partially based on simulation or based on a non-machine learning model. The training data may include inputs obtained from a design layout, patterning process measurements, and image measurements.

Abstract: A vibration isolator (10; 210) for supporting a payload and isolating the payload from vibrations has a contact member (12) configured for supporting the payload, at least two pressurized gas compartments (24) arranged offset from each other to support the contact member at different locations, which pressurized gas compartments are connected to each other via a tubing system (54). The tubing system contains at least one restriction (66) at which a cross section of the tubing system is reduced by at least 50%.

Abstract: A broadband radiation device comprising a HC-PCF comprising: a hollow core extending along the length of the HC-PCF for confining in use a working medium under a pressure, an input end operable to receive a pulsed pump radiation; and an output end operable to emit a broadband output radiation resulting from spectral broadening of said pulsed pump radiation within the working medium confined within the HC-PCF; wherein the HC-PCF is divided into a first section and a second section; wherein the first section comprises the input end and at least part of the first section comprises a bend and/or one or more coils, and the second section comprises the output end and is substantially straight; and wherein said spectral broadening is dominated by a self-phase modulation process and a different nonlinear optical process within the first section and the second section, respectively.