Patents Assigned to ASML Netherlands
  • Lithographic apparatus, and patterning device for use in a lithographic process
    Patent number: 9019470
    Abstract: The invention relates to a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate support constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and an encoder-type measurement system configured to at least during projection of the patterned radiation beam onto a target portion of the substrate continuously determine a position quantity of a patterning device supported on the patterning device support using a grid or grating provided on the patterning device.
    Type: Grant
    Filed: November 30, 2009
    Date of Patent: April 28, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Jan Van Eijk, Engelbertus Antonius Fransiscus Van Der Pasch, Johannes Petrus Martinus Bernardus Vermeulen
  • Lithographic apparatus and device manufacturing method
    Patent number: 9019476
    Abstract: A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed, the apparatus including a substrate table constructed to hold a substrate, a first clamping system configured to clamp the substrate table to a substrate table support structure, and a second clamping system configured to clamp a substrate to the substrate table after the substrate table has been clamped to the substrate table support structure.
    Type: Grant
    Filed: May 24, 2011
    Date of Patent: April 28, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Rene Theodorus Petrus Compen, Oleg Voznyi, Martijn Houben, Majid El Bouchaibi, Franciscus Johannes Maria Boekholt, Remko Wakker
  • Lithographic apparatus, reflective member and a method of irradiating the underside of a liquid supply system
    Patent number: 9019466
    Abstract: A lithographic apparatus that includes a reflector configured to reflect a cleaning beam of radiation projected through a projection system onto an underside of a liquid retrieval system. The construction of the reflector is also described as is a method for irradiating the underside of a liquid supply system for use in cleaning.
    Type: Grant
    Filed: September 27, 2007
    Date of Patent: April 28, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Martinus Hendrikus Antonius Leenders, Youri Johannes Laurentius Maria Van Dommelen, Hans Jansen, Robert Douglas Watso, Anthonius Martinus Cornelis Petrus De Jong, Jan Willem Cromwijk, Thomas Laursen
  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20150109592
    Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.
    Type: Application
    Filed: December 30, 2014
    Publication date: April 23, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Ivo Adam Johannes THOMAS, Siebe Landheer, Arnout Johannes Meester, Marcio Alexandre Cano Miranda, Gheorghe Tanasa
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20150109593
    Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
    Type: Application
    Filed: December 30, 2014
    Publication date: April 23, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jeroen Johannes Sophia Maria MERTENS, Sjoerd Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Antonius Johannus VAN DER NET, Franciscus Johannes Herman Maria TEUNISSEN, Patricius Aloysius Jacobus TINNEMANS, Martinus Cornelis Maria VERHAGEN, Jacobus Johannus Leonardus Hendricus VERSPAY, Edwin VAN GOMPEL
  • Photon Source, Metrology Apparatus, Lithographic System and Device Manufacturing Method
    Publication number: 20150108373
    Abstract: A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma.
    Type: Application
    Filed: November 20, 2014
    Publication date: April 23, 2015
    Applicant: ASML Netherlands B.V.
    Inventors: Henricus Petrus Maria PELLEMANS, Pavel Stanislavovich ANTSIFEROV, Vladimir Mihailovitch KRIVTSUN, Johannes Matheus Marie DE WIT, Ralph Jozef Johannes Gerardus Anna Maria SMEETS, Gerbrand VAN DER ZOUW
  • SUPPORT APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20150109599
    Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.
    Type: Application
    Filed: May 17, 2013
    Publication date: April 23, 2015
    Applicant: ASML Netherlands B.V.
    Inventors: Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Menno Fien, Antonius Franciscus Johannes De Groot, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Martijn Houben, Raymond Wilhelmus Louis Laffarre, Jan Steven Christiaan Westerlaken, Jim Vincent Overkamp, Maarten Van Beijnum, Robert De Jong
  • Position Measuring Method, Position Measuring Apparatus, Lithographic Apparatus and Device Manufacturing Method, Optical Element
    Publication number: 20150109624
    Abstract: An apparatus (AS) measures positions of marks (202) on a lithographic substrate (W). An illumination arrangement (940, 962, 964) provides off-axis radiation from at least first and second regions. The first and second source regions are diametrically opposite one another with respect to an optical axis (O) and are limited in angular extent. The regions may be small spots selected according to a direction of periodicity of a mark being measured, or larger segments. Radiation at a selected pair of source regions can be generated by supplying radiation at a single source feed position to a self-referencing interferometer. A modified half wave plate is positioned downstream of the interferometer, which can be used in the position measuring apparatus. The modified half wave plate has its fast axis in one part arranged at 45° to the fast axis in another part diametrically opposite.
    Type: Application
    Filed: February 7, 2013
    Publication date: April 23, 2015
    Applicants: ASML Netherlands B.V.
    Inventors: Justin Lloyd Kreuzer, Arie Jeffrey Den Boef, Simon Josephus Mathijssen
  • Method and apparatus for treatment of self-assemblable polymer layers for use in lithography
    Patent number: 9011978
    Abstract: Treatment of a layer comprising self-assemblable polymer at a surface of a substrate is disclosed. In an embodiment, the treatment includes arranging a zone of temperature change to sweep across the layer, wherein a temperature of the layer within the zone differs from an initial temperature of the layer prior to passage of the zone.
    Type: Grant
    Filed: January 6, 2011
    Date of Patent: April 21, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Roelof Koole, Vadim Yevgenyevich Banine, Sander Frederik Wuister, Emiel Peeters
  • Substrate table, a lithographic apparatus and a device manufacturing method
    Patent number: 9013683
    Abstract: A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.
    Type: Grant
    Filed: December 19, 2011
    Date of Patent: April 21, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Nicolaas Ten Kate, Raymond Wilhelmus Louis LaFarre
  • Clamping device and object loading method
    Patent number: 9013682
    Abstract: The present invention relates to a clamping device configured to clamp an object (20, 120) on a support (1, 101). The clamping device comprises: a first device configured to force the object and the support away from each other using a first force, and a second device configured to force the object and the support towards each other using a second force. The first device and second device are configured to simultaneously exert the first force and the second force respectively to shape the object to a desired shape before completing the clamping of the object on the support.
    Type: Grant
    Filed: June 20, 2008
    Date of Patent: April 21, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Rene Theodorus Petrus Compen, Johannes Henricus Wilhelmus Jacobs, Martinus Hendrikus Antonius Leenders, Joost Jeroen Ottens, Martin Frans Pierre Smeets
  • Lithographic apparatus and device manufacturing method
    Patent number: 9013673
    Abstract: An immersion lithographic apparatus is provided having a table configured to support a substrate; a sensor or target for a sensor is provided on a surface of the table and a cover is provided extending from an edge of the table; in addition, a liquid displacement device is provided including a gas outlet configured to direct a localized gas flow towards the sensor or target so as to displace liquid from the sensor or target over the cover and off the table.
    Type: Grant
    Filed: November 23, 2010
    Date of Patent: April 21, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Jeroen Gerard Gosen, Koen Cuypers
  • Collector mirror assembly and method for producing extreme ultraviolet radiation
    Patent number: 9013679
    Abstract: A collector mirror assembly includes a collector mirror that includes a reflective surface and a hole having an edge. The hole extends through the reflective surface. The assembly also includes a tubular body having an inner surface and an outer surface. The tubular body is constructed and arranged to guide a gas flow in a direction substantially transverse to the reflective surface. The outer surface of the tubular body and the edge of the hole form an opening arranged to guide a further gas flow that diverges with respect the gas flow substantially transverse to the reflective surface.
    Type: Grant
    Filed: March 18, 2011
    Date of Patent: April 21, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Dzmitry Labetski, Erik Roelof Loopstra, Antonius Theodorus Wilhelmus Kempen
  • Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
    Patent number: 9013672
    Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.
    Type: Grant
    Filed: June 29, 2007
    Date of Patent: April 21, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
  • Humidifying apparatus, lithographic apparatus and humidifying method
    Patent number: 9004459
    Abstract: A humidifying apparatus is disclosed in which gas is provided to a first side of a membrane and liquid to a second side of the same membrane. The membrane is non-porous to the liquid but porous to vapor of the liquid and is liquidphilic to said liquid.
    Type: Grant
    Filed: December 3, 2010
    Date of Patent: April 14, 2015
    Assignee: ASML Netherlands B.V.
    Inventor: Antonius Johannus Van Der Net
  • Radiation source
    Patent number: 9007560
    Abstract: A radiation source is disclosed that comprises a reservoir that retains a volume of fuel, a nozzle configured to direct a stream of fuel towards a plasma formation location, a laser configured to generate a radiation generating plasma, and a fuel contamination control arrangement. The contamination control arrangement comprises a magnetic field generation element for generating a magnetic field; an electric field generation element for generating an electric field, the magnetic field generation element and the electric field generation element together configured to ensure that the magnetic field and the electric field overlap at a location of contamination within the fuel, and to ensure that lines of flux of the magnetic field and electric field are non-parallel at that location to control movement of the contamination.
    Type: Grant
    Filed: May 25, 2012
    Date of Patent: April 14, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Wilbert Jan Mestrom, Gerardus Hubertus Petrus Maria Swinkels
  • Spectral purity filter
    Patent number: 9007565
    Abstract: A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from tungsten-molybdenum alloy or a molybdenum-rhenium alloy or a tungsten-rhenium alloy or a tungsten-molybdenum-rhenium alloy.
    Type: Grant
    Filed: December 8, 2010
    Date of Patent: April 14, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Andrei Mikhailovich Yakunin, Vladimir Mihailovitch Krivtsun, Viacheslav Medvedev, Alexandre Kodentsov
  • Methods and systems for lithography calibration using a mathematical model for a lithographic process
    Patent number: 9009647
    Abstract: A method of efficient optical and resist parameters calibration based on simulating imaging performance of a lithographic process utilized to image a target design having a plurality of features. The method includes the steps of determining a function for generating a simulated image, where the function accounts for process variations associated with the lithographic process; and generating the simulated image utilizing the function, where the simulated image represents the imaging result of the target design for the lithographic process. Systems and methods for calibration of lithographic processes whereby a polynomial fit is calculated for a nominal configuration of the optical system and which can be used to estimate critical dimensions for other configurations.
    Type: Grant
    Filed: April 8, 2013
    Date of Patent: April 14, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Jun Ye, Yu Cao, Hanying Feng
  • LITHOGRAPHIC APPARATUS
    Publication number: 20150098067
    Abstract: A lithographic apparatus including a first body including a heat source, a second body and a heater device is presented. The second body has a facing surface facing the first body via a gap between the first and second bodies. The heat source is for providing a heat flux to the second body via the gap. The heater device is attached to the facing surface. The heater device is configured to provide a further heat flux to the second body.
    Type: Application
    Filed: May 2, 2013
    Publication date: April 9, 2015
    Applicant: ASML Netherlands B.V.
    Inventors: Adrianus Hendrik Koevoets, Theodorus Petrus Maria Cadee, Harmeet Singh
  • LITHOGRAPHY APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20150098073
    Abstract: A lithography apparatus and device manufacturing methods are disclosed. A lithography apparatus includes a support stage, and a measurement system including a sensor part and a reference part, the measurement system being configured to determine the position and/or orientation of the support stage, or of a component mounted on the support stage, relative to a reference frame by using the sensor part to interact with the reference part, wherein: the reference frame comprises N sub-frames coupled together so as to behave predominantly as a single rigid body with respect to vibrations below a first reference frequency and predominantly as an N-body system with respect to vibrations above a second reference frequency, where N is an integer greater than 1.
    Type: Application
    Filed: March 18, 2013
    Publication date: April 9, 2015
    Applicant: ASML Netherlands B.V.
    Inventors: Hans Butler, Marc Wilhemus Maria Van Der Wijst