Patents Assigned to ASML Netherlands
  • Patent number: 11573496
    Abstract: A lithographic apparatus comprising a projection system comprising at least one optical component and configured to project a pattern onto a substrate. The lithographic apparatus further comprises a control system arranged to reduce the effects of heating and/or cooling of an optical component in a lithographic process. The control system is configured at least: to select at least one of a plurality of mode shapes to represent a relationship between at least one input in the lithographic process and an aberration resulting from the input and to generate and apply a correction to the lithographic apparatus based on the mode shape.
    Type: Grant
    Filed: August 26, 2021
    Date of Patent: February 7, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Nick Kant, Martijn Cornelis Schaafsma
  • Publication number: 20230036630
    Abstract: A method for determining an optimized weighting of an encoder and decoder network; the method comprising: for each of a plurality of test weightings, performing the following steps with the encoder and decoder operating using the test weighting: (a) encoding, using the encoder, a reference image and a distorted image into a latent space to form an encoding; (b) decoding the encoding, using the decoder, to form a distortion map indicative of a difference between the reference image and a distorted image; (c) spatially transforming the distorted image by the distortion map to obtain an aligned image; (d) comparing the aligned image to the reference image to obtain a similarity metric; and (e) determining a loss function which is at least partially defined by the similarity metric; wherein the optimized weighting is determined to be the test weighting which has an optimized loss function.
    Type: Application
    Filed: October 10, 2022
    Publication date: February 2, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Coen Adrianus VERSCHUREN, Scott Anderson MIDDLEBROOKS, Maxim PISARENCO
  • Patent number: 11567399
    Abstract: A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.
    Type: Grant
    Filed: December 31, 2021
    Date of Patent: January 31, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Zomer Silvester Houweling, Chaitanya Krishna Ande, Dennis De Graaf, Thijs Kater, Michael Alfred Josephus Kuijken, Mahdiar Valefi
  • Patent number: 11568123
    Abstract: A method for determining an etch profile is described. The method includes determining a masking layer profile. Loading information can be determined. The loading information indicates dependence of an etch rate for the masking layer profile on a quantity and pattern of material being etched. Flux information can be determined. The flux information indicates dependence of the etch rate on an intensity and a spread angle of radiation incident on the masking layer profile. Re-deposition information can be determined. The re-deposition information indicates dependence of the etch rate on an amount of material removed from the masking layer profile that is re-deposited back on the masking layer profile. An output etch profile for the layer of the wafer is determined based on the loading information, the flux information, and/or the re-deposition information.
    Type: Grant
    Filed: January 25, 2021
    Date of Patent: January 31, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Chi-Hsiang Fan, Feng Chen, Wangshi Zhao, Youping Zhang
  • Patent number: 11569060
    Abstract: Apparatus and methods for adjusting beam condition of charged particles are disclosed. According to certain embodiments, the apparatus includes one or more first multipole lenses displaced above an aperture, the one or more first multipole lenses being configured to adjust a beam current of a charged-particle beam passing through the aperture. The apparatus also includes one or more second multipole lenses displaced below the aperture, the one or more second multipole lenses being configured to adjust at least one of a spot size and a spot shape of the beam.
    Type: Grant
    Filed: September 25, 2018
    Date of Patent: January 31, 2023
    Assignee: ASML Netherlands B.V.
    Inventor: Xuedong Liu
  • Patent number: 11569628
    Abstract: An apparatus (10) for increasing a pulse length of a pulsed radiation beam, the apparatus comprising: a beam splitter (16) configured to split an input radiation beam (18) into a first beam (24) and a second beam (22); an optical arrangement (12, 14), wherein the beam splitter and the optical arrangement are configured such that at least a portion of the first beam is recombined with the second beam into a modified beam after an optical delay of the first beam caused by the optical arrangement; and at least one optical element (30) in an optical path of the first beam, the at least one optical element configured such that the phase of different parts of a wavefront of the first beam is varied to reduce coherence between the first beam and the second beam.
    Type: Grant
    Filed: August 5, 2019
    Date of Patent: January 31, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Herman Philip Godfried, Wilhelmus Patrick Elisabeth Maria Op 'T Root
  • Publication number: 20230024490
    Abstract: The present invention relates to methods for improving the resistance of lithography substrate holders to corrosion. The present invention also relates to systems comprising lithography substrate holders with improved corrosion resistance, and to methods of fabricating devices, e.g. integrated circuits, using such systems. The present invention also relates to substrates with backsides configured to preferentially corrode when used in lithography. The present invention has particular use in connection with lithographic apparatus for fabricating devices, for example integrated circuits.
    Type: Application
    Filed: October 29, 2020
    Publication date: January 26, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Paulus Albertus VAN HAL, Diego MILLO, Aleksandar Nikolov ZDRAVKOV, Marcus Anrianus VAN DE KERKHOF
  • Publication number: 20230023631
    Abstract: A vessel (16) for an EUV radiation source, the vessel comprising a first opening (30) for accessing an interior (32) of the vessel, a first access member (34) configured to allow or prevent access to the interior of the vessel through the first opening, a second opening (36) for accessing the interior of the vessel, the second opening being arranged in the first access member and a second access member (38) arranged on the first access member and configured to allow or prevent access to the interior of the vessel through the second opening.
    Type: Application
    Filed: November 13, 2020
    Publication date: January 26, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Sander KERSSEMAKERS, Robert Gabriël Maria LANSBERGEN, Martinus Hendrikus Antonius LEENDERS, Henricus Gerardus TEGENBOSCH
  • Publication number: 20230021320
    Abstract: An inspection tool comprises an imaging system configured to image a portion of a semiconductor substrate. The inspection tool may further comprise an image analysis system configured to obtain an image of a structure on the semiconductor substrate from the imaging system, encode the image of the structure into a latent space thereby forming a first encoding. the image analysis system may subtract an artifact vector, representative of an artifact in the image, from the encoding thereby forming a second encoding; and decode the second encoding to obtain a decoded image.
    Type: Application
    Filed: September 30, 2022
    Publication date: January 26, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Maxim PISARENCO, Scott Anderson MIDDLEBROOKS, Thomas Jarik HUISMAN
  • Patent number: 11563298
    Abstract: A broadband radiation source device, including a fiber assembly having a plurality of optical fibers, each optical fiber being filled with a gas medium, wherein the broadband radiation source device is operable such that subsets of the optical fibers are independently selectable for receiving a beam of input radiation so as to generate a broadband output from only a subset of the plurality of optical fibers at any one time.
    Type: Grant
    Filed: August 30, 2021
    Date of Patent: January 24, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: John Colin Travers, Federico Belli, Malte Christian Brahms, Andreas Johannes Antonius Brouns, Ronald Franciscus Herman Hugers
  • Patent number: 11561478
    Abstract: A method for determining a component of optical characteristic of a patterning process. The method includes obtaining (i) a plurality of desired features, (ii) a plurality of simulated features based on the plurality of desired features and an optical characteristic of a patterning apparatus, and (iii) a performance metric (e.g., EPE) related to a desired feature of the plurality of desired features and an associated simulated feature of the plurality of simulated features; determining a set of optical sensitivities of the patterning process by computing a change in value of the performance metric based on a change in value of the optical characteristic; and identifying, based on the set of optical sensitivities, a set of components (e.g., principal components) of the optical characteristic that include dominant contributors in changing the value of the performance metric.
    Type: Grant
    Filed: December 12, 2019
    Date of Patent: January 24, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Jacobus Matheus Baselmans, Paulus Jacobus Maria Van Adrichem, Egbert Lenderink
  • Patent number: 11561477
    Abstract: A method including: obtaining data based an optical proximity correction for a spatially shifted version of a training design pattern; and training a machine learning model configured to predict optical proximity corrections for design patterns using data regarding the training design pattern and the data based on the optical proximity correction for the spatially shifted version of the training design pattern.
    Type: Grant
    Filed: September 5, 2018
    Date of Patent: January 24, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Jing Su, Yen-Wen Lu, Ya Luo
  • Patent number: 11561479
    Abstract: The invention relates to an electronic system for an accelerometer having a piezoelectric element and a first mechanical resonance frequency, comprising: a) a damping circuit configured to: —receive an acceleration signal from the piezoelectric element; —electronically dampen an amplitude of the first mechanical resonance frequency; and—generate a damped acceleration signal, b) an extender configured to: —receive the damped acceleration signal; —extend the frequency response; and—output an extended damped acceleration signal, wherein the extender is configured to have a first electronic anti-resonance frequency matching the damped first mechanical resonance frequency, and to have a frequency response between the first electronic anti-resonance frequency and a higher second frequency that is substantially opposite to a corresponding frequency response of the combination of the accelerometer and the damping circuit.
    Type: Grant
    Filed: January 3, 2020
    Date of Patent: January 24, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Butler, Bas Jansen, Cornelius Adrianus Lambertus De Hoon
  • Patent number: 11561480
    Abstract: A computer-implemented defect prediction method for a device manufacturing process involving processing a pattern onto a substrate. Non-correctable error is used to help predict locations where defects are likely to be present, allowing improvements in metrology throughput. In an embodiment, non-correctable error information relates to imaging error due to limitations on, for example, the lens hardware, imaging slit size, and/or other physical characteristics of the lithography system. In an embodiment, non-correctable error information relates to imaging error induced by lens heating effects.
    Type: Grant
    Filed: December 12, 2019
    Date of Patent: January 24, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Ivo Liebregts, Niladri Sen, Koen Thuijs, Ronaldus Johannes Gysbertus Goossens
  • Patent number: 11562884
    Abstract: Disclosed among other aspects is a power supply such as may be used in a charged particle inspection system. The power supply includes a direct current source such as a programmable linear current source connected to a controlled voltage source where the control signal for the controlled voltage source is derived from a measured voltage drop across the direct current source.
    Type: Grant
    Filed: April 17, 2020
    Date of Patent: January 24, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Yixiang Wang, Yanqiu Wang, Xiaodong He, Guofan Ye
  • Publication number: 20230020745
    Abstract: Disclosed herein is a substrate stack comprising a plurality of substrates, wherein: each substrate in the substrate stack comprises at least one alignment opening set; the at least one alignment opening set in each substrate is aligned for a light beam to pass through corresponding alignment openings in each substrate; and each substrate comprises at least one alignment opening that has a smaller diameter than the corresponding alignment openings in the other substrates.
    Type: Application
    Filed: September 23, 2022
    Publication date: January 19, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Arjen Benjamin STORM, Johan Frederik Cornelis VAN GURP, Johannes Cornelis Jacobus DE LANGEN, Aaron Yang-Fay AYAL, Michiel Matthieu BRUININK, Christiaan Ruben VAN DEN BERG, Christiaan OTTEN, Laura DINU GURTLER, Marc SMITS
  • Publication number: 20230013919
    Abstract: A method for calibrating a process model and training an inverse process model of a patterning process. The training method includes obtaining a first patterning device pattern from simulation of an inverse lithographic process that predicts a patterning device pattern based on a wafer target layout, receiving wafer data corresponding to a wafer exposed using the first patterning device pattern, and training an inverse process model configured to predict a second patterning device pattern using the wafer data related to the exposed wafer and the first patterning device pattern.
    Type: Application
    Filed: September 22, 2022
    Publication date: January 19, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Marinus Aart Van Den Brink, Yu Cao, Yi Zou
  • Publication number: 20230017894
    Abstract: A flood column for charged particle flooding of a sample, the flood column comprising a charged particle source configured to emit a charged particle beam along a beam path; a source lens arranged down-beam of the charged particle source; a condenser lens arranged down-beam of the source lens; and an aperture body arranged down-beam of the condenser lens, wherein the aperture body is for passing a portion of the charged particle beam; and wherein the source lens is controllable so as to variably set the beam angle of the charged particle beam down-beam of the source lens.
    Type: Application
    Filed: September 23, 2022
    Publication date: January 19, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Jurgen VAN SOEST, Gun Sara Mari BERGLUND, Robert Wong Joek Meu HUANG FOEN CHUNG, Diego MARTINEZ NEGRETE GASQUE, Laura DINU GURTLER
  • Publication number: 20230020194
    Abstract: Systems and methods of enhancing imaging resolution by reducing crosstalk between detection elements of a secondary charged-particle detector in a multi-beam apparatus are disclosed. The multi-beam apparatus may comprise an electro-optical system for projecting a plurality of secondary charged-particle beams from a sample onto a charged-particle detector. The electro-optical system may include a first pre-limit aperture plate comprising a first aperture configured to block peripheral charged-particles of the plurality of secondary charged-particle beams, and a beam-limit aperture array comprising a second aperture configured to trim the plurality of secondary charged-particle beams. The charged-particle detector may include a plurality of detection elements, wherein a detection element of the plurality of detection elements is associated with a corresponding trimmed beam of the plurality of secondary charged-particle beams.
    Type: Application
    Filed: September 13, 2022
    Publication date: January 19, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Weiming REN, Xuerang HU, Qingpo XI, Xuedong LIU
  • Patent number: 11556063
    Abstract: A substrate support for supporting a substrate. The substrate support comprises a main body, a clamping device and a dither device. The main body comprises a support surface for supporting the substrate. The clamping device is arranged to provide the clamping force to clamp the substrate on the support surface. The dither device is configured to dither the clamping force. The dither device may be configured to dither the clamping force while the substrate W is being loaded onto the support surface.
    Type: Grant
    Filed: March 21, 2017
    Date of Patent: January 17, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Onvlee, Antonius Franciscus Johannes De Groot, Wim Symens, David Ferdinand Vles