Patents Assigned to ASML Netherlands
  • METHODS OF INSPECTING SAMPLES WITH A BEAM OF CHARGED PARTICLES
    Publication number: 20240044820
    Abstract: Disclosed herein is an apparatus comprising: a source configured to emit charged particles, an optical system and a stage; wherein the stage is configured to support a sample thereon and configured to move the sample by a first distance in a first direction; wherein the optical system is configured to form probe spots on the sample with the charged particles; wherein the optical system is configured to move the probe spots by the first distance in the first direction and by a second distance in a second direction, simultaneously, while the stage moves the sample by the first distance in the first direction; wherein the optical system is configured to move the probe spots by the first distance less a width of one of the probe spots in an opposite direction of the first direction, after the stage moves the sample by the first distance in the first direction.
    Type: Application
    Filed: October 10, 2023
    Publication date: February 8, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Kuo-Feng TSENG, Zhonghua DONG, Yixiang WANG, Zhong-wei CHEN
  • Imaging via zeroth order suppression
    Patent number: 11892776
    Abstract: Apparatuses and techniques for suppressing a zeroth order portion of a configured radiation beam. In some embodiments, an extreme ultraviolet (EUV) lithographic apparatus for forming an image on a substrate by use of an EUV radiation beam that is configured by a patterning device comprising a pattern of reflective regions and partially reflective regions, wherein the partially reflective regions are configured to suppress and apply a phase shift to a portion of the EUV radiation beam, may include a projection system. The projection system may be configured to suppress a zeroth order portion of a configured EUV radiation beam, and direct an unsuppressed portion of a configured EUV radiation beam towards a substrate to form an image on the substrate.
    Type: Grant
    Filed: December 12, 2019
    Date of Patent: February 6, 2024
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Johannes Jacobus Matheus Baselmans, Duan-Fu Stephen Hsu, Willem Jan Bouman, Frank Jan Timmermans, Marie-claire Van Lare
  • LITHOGRAPHY APPARATUS AND A METHOD OF MANUFACTURING A DEVICE
    Publication number: 20240036477
    Abstract: An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.
    Type: Application
    Filed: September 8, 2023
    Publication date: February 1, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Erik Henricus Egidius Catharina EUMMELEN, Frank Debougnoux, Koen Cuypers, Han Henricus Aldegonda Lempens, Theodorus Wilhelmus Polet, Jorge Alberto Vieyra Salas, John Maria Bombeeck, Johannes Cornelis Paulus Melman, Giovanni Luca Gattobigio
  • TOPOLOGY-BASED IMAGE RENDERING IN CHARGED-PARTICLE BEAM INSPECTION SYSTEMS
    Publication number: 20240037890
    Abstract: Systems and methods of image alignment are disclosed herein. The method of image alignment may comprise obtaining an image of a sample, obtaining information associated with a corresponding reference image, generating a modified rendered image by blurring a rendered image of the corresponding reference image such that a topology of the rendered image is substantially preserved, wherein a degree of blurring is based on a characteristic of the topology, and aligning the image of the sample with the blurred rendered image. The method may further comprise aligning the image of the sample with the corresponding reference image based on an alignment between the image of the sample and the blurred rendered image.
    Type: Application
    Filed: November 24, 2021
    Publication date: February 1, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Haoyi LIANG, Bing MA, Zhichao CHEN, Marc Jurian KEA
  • METHOD OF METROLOGY AND ASSOCIATED APPARATUSES
    Publication number: 20240036484
    Abstract: Disclosed is a method of metrology. The method comprises measuring at least one surrounding observable parameter relating to a surrounding signal contribution to a metrology signal which comprises a contribution to said metrology signal which is not attributable to at least one target being measured and determining a correction from said surrounding signal observable parameter. The correction is used to correct first measurement data relating to measurement of one or more targets using measurement radiation forming a measurement spot on one or more of said one or more targets which is larger than one of said targets.
    Type: Application
    Filed: December 2, 2021
    Publication date: February 1, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Timothy Dugan DAVIS, Simon Gijsbert Josephus MATHIJSSEN, Kaustuve BHATTACHARYYA, Sebastianus Adrianus GOORDEN, Armand Eugene Albert KOOLEN, Sera JEON, Shuo-Chun LIN
  • METHOD OF DETERMINING AT LEAST A TARGET LAYOUT AND ASSOCIATED METROLOGY APPARATUS
    Publication number: 20240036479
    Abstract: A method of optimizing a target layout for a patterning device and a sampling scheme for measuring the targets of the target layout exposed on a substrate, the method including co-optimizing the target layout and the sampling scheme to obtain an optimized target layout for the patterning device and an optimized sampling scheme for measuring the targets of the optimized target layout exposed on a substrate.
    Type: Application
    Filed: March 8, 2022
    Publication date: February 1, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Roy WERKMAN, Jochem Sebastiaan WILDENBERG, Manouk RIJPSTRA
  • FEATURE EXTRACTION METHOD FOR EXTRACTING FEATURE VECTORS FOR IDENTIFYING PATTERN OBJECTS
    Publication number: 20240037897
    Abstract: An apparatus and method of feature extraction for identifying a pattern. An improved method includes obtaining data representative of a pattern instance, dividing the pattern instance into a plurality of zones, determining a representative characteristic of a zone of the plurality of zones, generating a representation of the pattern instance using a feature vector, wherein the feature vector includes an element corresponding to the representative characteristic, wherein the representative characteristic is indicative of a spatial distribution of one or more features of the zone. The method may also include classifying and/or selecting pattern instances based on the feature vector.
    Type: Application
    Filed: November 24, 2021
    Publication date: February 1, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Danying LI, Meng LIU, Jen-Yi WUU, Rencheng SUN, Cong WU, Dean XU
  • A SUBSTRATE COMPRISING A TARGET ARRANGEMENT, AND ASSOCIATED AT LEAST ONE PATTERNING DEVICE, LITHOGRAPHIC METHOD AND METROLOGY METHOD
    Publication number: 20240036480
    Abstract: Disclosed is a method of measuring a target on a substrate comprising: illuminating a target with measurement radiation comprising at least a first wavelength, collecting the resultant scattered radiation within a collection numerical aperture; and determining a parameter of interest from said scattered radiation. The target comprises a mediator periodic structure and at least a first target periodic structure each in a respective different layer on the substrate, wherein a pitch of at least the mediator periodic structure is below a single diffraction limit defined by the collection numerical aperture and a wavelength of said measurement radiation, such that said scattered radiation comprises double diffracted radiation, said double diffracted radiation comprising radiation having undergone two sequential same-order diffractions of opposite sign.
    Type: Application
    Filed: December 9, 2021
    Publication date: February 1, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Armand Eugene Albert KOOLEN, Simon Gijsbert Josephus MATHIJSSEN, Hui Quan LIM, Amanda Elizabeth ANDERSON
  • ELECTRON-OPTICAL DEVICE
    Publication number: 20240038485
    Abstract: Disclosed herein is a charged-particle apparatus configured to inspect a sample with a charged-particle beam. The charged-particle apparatus comprises a detector assembly or an array of multipole elements. The charged-particle apparatus comprises an electronic device, a power source configured to output radiation, and a power converter configured to receive radiation from the power source, to convert the received radiation into electrical energy and to output the electrical energy to the electronic device. The power source is electrically isolated from the power converter.
    Type: Application
    Filed: October 12, 2023
    Publication date: February 1, 2024
    Applicant: ASML Netherlands B.V.
    Inventor: Stijn Wilem Herman Karel STEENBRINK
  • Flows of optimization for patterning processes
    Patent number: 11886124
    Abstract: A method to improve a lithographic process for imaging a portion of a patterning device pattern onto a substrate using a lithographic projection having an illumination system and projection optics, the method including: (1) obtaining a simulation model that models projection of radiation by the projection optics, wherein the simulation model models an effect of an obscuration in the projection optics, and configuring, based on the model, the portion of the patterning device pattern, and/or (2) obtaining a simulation model that models projection of radiation by the projection optics, wherein the simulation model models an anamorphic demagnification of radiation by the projection optics, and configuring, based on the model, the portion of the patterning device pattern taking into account an anamorphic manufacturing rule or anamorphic manufacturing rule ratio.
    Type: Grant
    Filed: October 21, 2022
    Date of Patent: January 30, 2024
    Assignee: ASML NETHERLANDS B.V.
    Inventor: Duan-Fu Stephen Hsu
  • Apparatus of plural charged-particle beams
    Patent number: 11887807
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.
    Type: Grant
    Filed: January 23, 2023
    Date of Patent: January 30, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhongwei Chen
  • Assembly including a non-linear element and a method of use thereof
    Patent number: 11886096
    Abstract: An assembly including a non-linear element configured for generating broadband radiation from input radiation coupled into the non-linear element. The assembly further includes an optical element positioned downstream of the non-linear element configured to reflect a fraction of the broadband radiation back into the non-linear element. The non-linear element can be a nonlinear fiber, such as a hollow-core photonic crystal fiber (HC-PCF).
    Type: Grant
    Filed: February 24, 2021
    Date of Patent: January 30, 2024
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Vitaliy Prosyentsov, Yongfeng Ni
  • Method for inferring a local uniformity metric
    Patent number: 11886125
    Abstract: A method of inferring a value for at least one local uniformity metric relating to a product structure, the method including: obtaining intensity data including an intensity image relating to at least one diffraction order obtained from a measurement on a target; obtaining at least one intensity distribution from the intensity image; determining, from the at least one intensity distribution, an intensity indicator expressing a variation of either intensity over the at least one diffraction order, or a difference in intensity between two complimentary diffraction orders over the intensity image; and inferring the value for the at least one local uniformity metric from the intensity indicator.
    Type: Grant
    Filed: February 2, 2021
    Date of Patent: January 30, 2024
    Assignee: ASML NETHERLANDS B. V.
    Inventors: Simon Gijsbert Josephus Mathijssen, Kaustuve Bhattacharyya
  • METROLOGY METHOD AND APPARATUS AND COMPUTER PROGRAM
    Publication number: 20240027918
    Abstract: Disclosed is a method of improving a measurement of a parameter of interest. The method comprises obtaining metrology data comprising a plurality of measured values of the parameter of interest, relating to one or more targets on a substrate, each measured value relating to a different measurement combination of a target of said one or more targets and a measurement condition used to measure that target and asymmetry metric data relating to asymmetry for said one or more targets. A respective relationship is determined for each of said measurement combinations relating a true value for the parameter of interest to the asymmetry metric data, based on an assumption that there is a common true value for the parameter of interest over said measurement combinations. These relationships are used to improve a measurement of the parameter of interest.
    Type: Application
    Filed: May 27, 2021
    Publication date: January 25, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Simon Gijsbert Josephus MATHIJSSEN, Patricius Aloysius Jacobus TINNEMANS, Arie Jeffrey DEN BOEF, Kaustuve BHATTACHARYYA, Samee Ur REHMAN
  • PELLICLE AND PELLICLE ASSEMBLY
    Publication number: 20240027893
    Abstract: A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.
    Type: Application
    Filed: July 11, 2023
    Publication date: January 25, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: David Ferdinand VLES, Chaitanya Krishna ANDE, Antonius Franciscus Johannes DE GROOT, Adrianus Johannes Maria GIESBERS, Johannes Joseph JANSSEN, Paul JANSSEN, Johan Hendrik KLOOTWIJK, Peter Simon Antonius KNAPEN, Evgenia KURGANOVA, Marcel Peter MEIJER, Wouter Rogier MEIJERINK, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Raymond OLSMAN, Hrishikesh PATEL, Mária PÉTER, Gerrit VAN DEN BOSCH, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willem-Pieter VOORTHUIJZEN, Hendrikus Jan WONDERGEM, Aleksandar Nikolov ZDRAVKOV
  • METROLOGY SYSTEM AND COHERENCE ADJUSTERS
    Publication number: 20240027913
    Abstract: A metrology system (400) includes a multi-source radiation system. The multi-source radiation system includes a waveguide device (502) and the multi-source radiation system is configured to generate one or more beams of radiation. The metrology system (400) further includes a coherence adjuster (500) including a multimode waveguide device (504). The multimode waveguide device (504) includes an input configured to receive the one or more beams of radiation from the multi-source radiation system (514) and an output (518) configured to output a coherence adjusted beam of radiation for irradiating a target (418). The metrology system (400) further includes an actuator (506) coupled to the waveguide device (502) and configured to actuate the waveguide device (502) so as to change an impingement characteristic of the one or more beams of radiation at the input of the multimode waveguide device (504).
    Type: Application
    Filed: December 2, 2021
    Publication date: January 25, 2024
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Sergei SOKOLOV, Simon Reinald HUISMAN, Jin LIAN, Sebastianus Adrianus GOORDEN, Muhsin ERALP, Henricus Petrus Maria PELLEMANS, Justin Lloyd KREUZER
  • COMPONENT FOR USE IN A LITHOGRAPHIC APPARATUS, METHOD OF PROTECTING A COMPONENT AND METHOD OF PROTECTING TABLES IN A LITHOGRAPHIC APPARATUS
    Publication number: 20240027925
    Abstract: A method of protecting a component of a lithographic apparatus, the method including the steps of: providing a protective cover which is shaped to protect at least part of said component, the protective cover having a contact surface which is arranged to adhere to a first surface of at least part of said lithographic apparatus or said component; and bringing the protective cover into proximity with the component so as to cause the contact surface to adhere to the lithographic apparatus or said component and remain adhered without the application of external force. It is also provided a patterning device for use in a lithographic apparatus and a lithographic apparatus.
    Type: Application
    Filed: September 29, 2023
    Publication date: January 25, 2024
    Applicant: ASML Netherlands B.V.
    Inventor: Marcus Adrianus VAN DE KERKHOF
  • ELECTRON-OPTICAL SYSTEM AND METHOD OF OPERATING AN ELECTRON-OPTICAL SYSTEM
    Publication number: 20240029995
    Abstract: Electron-optical systems comprising a particle trap and methods of operating electron-optical systems using a particle trap are disclosed. In one arrangement, a stage supports a sample. An objective lens arrangement projects electrons towards the sample along an electron-beam path. A particle trap comprises an electrode assembly radially outside of the objective lens arrangement and facing the sample. The electrode assembly draws a particle away from a surface of the sample and/or stage as the sample moves relative to the electron-beam path.
    Type: Application
    Filed: September 29, 2023
    Publication date: January 25, 2024
    Applicant: ASML Netherlands B.V.
    Inventor: Stijn Wilem Herman Karel STEENBRINK
  • SUBSTRATE HOLDER AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20240027915
    Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object are formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
    Type: Application
    Filed: August 22, 2023
    Publication date: January 25, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Sjoerd Nicolaas Lambertus Donders, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE, Elisabeth Corinne RODENBURG
  • Apparatus for and method of controlling an energy spread of a charged-particle beam
    Patent number: 11881374
    Abstract: Disclosed among other aspects is a charged particle inspection system including an absorbing component and a programmable charged-particle mirror plate arranged to modify the energy distribution of electrons in a beam and shape the beam to reduce the energy spread of the electrons and aberrations of the beam, with the absorbing component including a set of absorbing structures configured as absorbing structures provided on a transparent conductive layer and a method using such an absorbing component and with the programmable charged-particle mirror plate including a set of pixels configured to generate a customized electric field to shape the beam and using such a programmable charged-particle mirror plate.
    Type: Grant
    Filed: February 4, 2020
    Date of Patent: January 23, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Shakeeb Bin Hasan, Yan Ren, Maikel Robert Goosen, Albertus Victor Gerardus Mangnus, Erwin Paul Smakman