Patents Assigned to ASML Netherlands
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Patent number: 11556067Abstract: A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; wherein at least one vane or each vane of the plurality of vanes comprises a material comprising a thermal conductivity above 30 W m?1K?1.Type: GrantFiled: March 10, 2020Date of Patent: January 17, 2023Assignee: ASML Netherlands B.V.Inventors: Sander Catharina Reinier Derks, Daniel Jozef Maria Direcks, Maurice Wilhelmus Leonardus Hendricus Feijts, Pieter Gerardus Mathijs Hoeijmakers, Katja Cornelia Joanna Clasina Moors, Violeta Navarro Paredes, William Peter Van Drent, Jan Steven Christiaan Westerlaken
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Patent number: 11556044Abstract: Disclosed is an optical component, being configured to function as an optical frequency converter in a broadband radiation source device. The optical component comprises a gas cell, and a hollow-core photonic crystal fiber at least partially enclosed within said gas cell. The local cavity volume of said gas cell, where said hollow-core photonic crystal fiber is enclosed within the gas cell, comprises a maximum value of 36 cm3 per cm of length of said hollow-core photonic crystal fiber.Type: GrantFiled: September 27, 2021Date of Patent: January 17, 2023Assignee: ASML Netherlands B.V.Inventors: Patrick Sebastian Uebel, Sebastian Thomas Bauerschmidt, Peter Maximilian Götz
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Patent number: 11556068Abstract: A detection system for an alignment sensor, and an alignment sensor and lithographic projection apparatus comprising such a detection system is disclosed. The detection system comprises at least one detection circuit; and a plurality of optical fiber cores for transporting a measurement signal to the at least one detection circuit. At least as subset of the plurality of optical fiber cores are selectively switchable between a detection state and a non-detection state, thereby defining a configurable detection spot.Type: GrantFiled: September 24, 2019Date of Patent: January 17, 2023Assignee: ASML Netherlands B.V.Inventor: Simon Reinald Huisman
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Patent number: 11556066Abstract: The invention provides a stage system comprising a stage (ST) which is movable in respect of a reference structure. One of the stage and the reference structure comprises a reflective surface (REFS). An optical position sensor (IF1) is arranged at the other one of the stage and the reference structure and is configured to determine a position of the reflective surface relative to the optical position sensor. An optical shape sensor (IF2) is configured to determine a shape of the reflective surface. The stage system further comprises a position measurement controller configured to derive a stage position of the stage from the position of the reflective surface relative to the optical position sensor and from the shape of the reflective surface as determined by the optical shape sensor.Type: GrantFiled: January 30, 2020Date of Patent: January 17, 2023Assignee: ASML Netherlands B.V.Inventors: Maarten Jozef Jansen, Frank Auer
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Patent number: 11556060Abstract: Methods for calibrating metrology apparatuses and determining a parameter of interest are disclosed. In one arrangement, training data is provided that comprises detected representations of scattered radiation detected by each of plural metrology apparatuses. An encoder encodes each detected representation to provide an encoded representation, and a decoder generates a synthetic detected representation from the respective encoded representation. A classifier estimates from which metrology apparatus originates each encoded representation or each synthetic detected representation. The training data is used to simultaneously perform, in an adversarial relationship relative to each other, a first machine learning process involving the encoder or decoder and a second machine learning process involving the classifier.Type: GrantFiled: August 30, 2019Date of Patent: January 17, 2023Assignee: ASML Netherlands B.V.Inventors: Seyed Iman Mossavat, Bastiaan Onne Fagginger Auer, Remco Dirks, Alexandru Onose, Hugo Augustinus Joseph Cramer
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Patent number: 11556064Abstract: The invention provides a stage apparatus, comprising an object support comprising a ring shaped protrusion having an outer radius in a first plane, and configured to support an object with a radius in the first plane larger than the outer radius of the ring shaped protrusion. The stage apparatus further comprises a sensor module configured to detect the object support, and the object when it is arranged on the object support. The stage apparatus further comprises a processing unit configured to receive one or more signals from the sensor module, and to determine, based on said one or more signals, a position of the object relative to the ring shaped protrusion when the object is arranged on the object support. The processing unit is further configured to determine, based on said position of the object, an offset value representing the position of the object relative to the ring shaped protrusion.Type: GrantFiled: July 22, 2019Date of Patent: January 17, 2023Assignee: ASML Netherlands B.V.Inventors: Gijs Kramer, Theodorus Marcus Nagtegaal, André Schreuder, Anna Catharina Verkaik
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Patent number: 11557455Abstract: The disclosed embodiments relate to a charged particle source module for generating and emitting a charged particle beam, such as an electron beam, comprising: a frame including a first frame part, a second frame part, and one or more rigid support members which are arranged between said first frame part and said second frame part; a charged particle source arrangement for generating a charged particle beam, such as an electron beam, wherein said charged particle source arrangement, such as an electron source, is arranged at said second frame part; and a power connecting assembly arranged at said first frame part, wherein said charged particle source arrangement is electrically connected to said connecting assembly via electrical wiring.Type: GrantFiled: October 11, 2019Date of Patent: January 17, 2023Assignee: ASML Netherlands B.V.Inventors: Laura Dinu-Gurtler, Eric Petrus Hogervorst, Jurgen Van Soest
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Publication number: 20230008139Abstract: A detection system (200) includes an illumination system (210), a first optical system (232), a phase modulator (220), a lock-in detector (255), and a function generator (230). The illumination system is configured to transmit an illumination beam (218) along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target (204) on a substrate (202). The first optical system is further configured to transmit a signal beam including diffraction order sub-beams (222, 224, 226) that are diffracted by the diffraction target. The phase modulator is configured to modulate the illumination beam or the signal beam based on a reference signal. The lock-in detector is configured to collect the signal beam and to measure a characteristic of the diffraction target based on the signal beam and the reference signal. The function generator is configured to generate the reference signal for the phase modulator and the lock-in detector.Type: ApplicationFiled: November 18, 2020Publication date: January 12, 2023Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Mohamed SWILLAM, Simon Reinald HUISMAN, Justin Lloyd KREUZER
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Publication number: 20230008474Abstract: Embodiments herein describe methods, devices, and systems for reducing an electric field at a clamp-reticle interface using an enhanced electrostatic clamp. In particular, the electrostatic clamp includes a clamp body, an electrode layer disposed on a top surface of the clamp body, and a plurality of burls that project from a bottom surface of the clamp body, wherein the electrode layer comprises a plurality of cutouts at predetermined locations that vertically correspond to locations of the plurality of burls at the bottom surface of the clamp body.Type: ApplicationFiled: October 5, 2020Publication date: January 12, 2023Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Victor Antonio PEREZ-FALCON, Marcus Adrianus VAN DE KERKHOF, Daniel Leslie HALL, Christopher John MASON, Arthur Winfried Eduardus MINNAERT, Johannes Hubertus Josephina MOORS, Samir A. NAYFEH
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Patent number: 11549806Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the apparatus comprising: a radiation source configured to generate illumination radiation; at least two illumination branches comprising at least one optical fiber and configured to illuminate a structure on a substrate from different angles; and a radiation switch configured to receive the illumination radiation and transfer at least part of the radiation to a selectable one of the at least two illumination branches.Type: GrantFiled: January 5, 2021Date of Patent: January 10, 2023Assignee: ASML Netherland B.V.Inventors: Marinus Johannes Maria Van Dam, Arie Jeffrey Den Boef, Nitesh Pandey
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Patent number: 11553582Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.Type: GrantFiled: April 6, 2020Date of Patent: January 10, 2023Assignee: ASML Netherlands, B.V.Inventors: Yezheng Tao, Daniel John William Brown, Alexander Anthony Schafgans, Palash Parijat Das
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Patent number: 11550227Abstract: Disclosed is a projection system for a lithographic apparatus, comprising: a plurality of optical elements configured to direct a beam along a path, and a control system configured to receive an input signal indicative of a deformation of a first optical element of the plurality of optical elements. The plurality of optical elements may be configured to position the beam onto an object arranged on an object support, and a pattern may be imparted on the beam by a patterning device arranged on support structure. The control system is configured to generate an output signal for controlling a position of at least a second optical element of the plurality of optical elements, based on said input signal; and/or an output signal for controlling a position of said object support, based on said input signal; and/or an output signal for controlling a position of said support structure, based on said input signal.Type: GrantFiled: December 13, 2019Date of Patent: January 10, 2023Assignee: ASML Netherlands B.V.Inventors: Marinus Engelbertus Cornelis Mutsaers, Robertus Johannes Marinus De Jongh, Jeroen Pieter Starreveld
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Patent number: 11550234Abstract: An object, such as a sensor for an immersion lithographic apparatus, has an outer layer which comes in contact with immersion liquid and wherein the outer layer has a composition including a rare earth element. There is also provided an immersion lithographic apparatus having such an object and a method for manufacturing such an object.Type: GrantFiled: September 25, 2019Date of Patent: January 10, 2023Assignee: ASML Netherlands B.V.Inventors: Andrey Nikipelov, Johan Franciscus Maria Beckers
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Publication number: 20230005699Abstract: Disclosed herein is an aperture body for passing a portion of a charged particle beam propagating along a beam path comprising an axis, the aperture body comprising: an up-beam facing surface; a chamber portion comprising an up-beam end, a down-beam end and an up-beam plate, wherein the up-beam plate extends radially inwards from the up-beam end and the up-beam plate is configured to define an entrance opening around the beam path; wherein: the up-beam facing surface extends radially inwards from the down-beam end; the up-beam facing surface comprises an aperture portion that is configured to define an opening around the beam path; and the opening defined by the aperture portion is smaller than the entrance opening.Type: ApplicationFiled: September 9, 2022Publication date: January 5, 2023Applicant: ASML Netherlands B.V.Inventors: Christiaan OTTEN, Christian TEUNISSEN, Boudewjin Weijert Herman Jan VAN DER KROON, Jurgen VAN SOEST
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Publication number: 20230004097Abstract: Disclosed is a substrate, associated patterning device and a method for measuring a position of the substrate. The method comprises performing an alignment scan of an alignment mark to obtain simultaneously: a first measurement signal detected in a first measurement channel and a second measurement signal detected in a second measurement channel. The first and second measurement signals are processed by subtracting a first direction component of the first measurement signal from a first direction component of the second measurement signal to obtain a first processed signal, the first direction components relating to said first direction. The position of an alignment mark is determined with respect to the first direction from the first processed signal.Type: ApplicationFiled: November 17, 2020Publication date: January 5, 2023Applicant: ASML Netherlands B.V.Inventors: Franciscus Godefridus Casper BIJNEN, Edo Maria HULSEBOS
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Publication number: 20230004096Abstract: A method and system for predicting complex electric field images with a parameterized model are described. A latent space representation of a complex electric field image is determined based on dimensional data in a latent space of the parameterized model for a given input to the parameterized model. The given input may be a measured amplitude (e.g., intensity) associated with the complex electric field image. The complex electric field image is predicted based on the latent space representation of the complex electric field image. The predicted complex electric field image includes an amplitude and a phase. The parameterized model comprises encoder-decoder architecture. In some embodiments, determining the latent space representation of the electric field image comprises minimizing a function constrained by a set of electric field images that could be predicted by the parameterized model based on the dimensional data in the latent space and the given input.Type: ApplicationFiled: September 28, 2020Publication date: January 5, 2023Applicant: ASML Netherlands B.V.Inventors: Scott Anderson MIDDLEBROOKS, Patrick WARNAAR, Patrick Philipp HELFENSTEIN, Alexander Prasetya KONIJNENBERG, Maxim PISARENCO, Markus Gerardus Martinus Maria VAN KRAAIJ
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Publication number: 20230005707Abstract: Systems and methods for implementing a detector array are disclosed. According to certain embodiments, a substrate comprises a plurality of sensing elements including a first element and a second element. The detector comprises a switching element configured to connect the first element and the second element. The switching region may be controlled based on signals generated in response to the sensing elements receiving electrons with a predetermined amount of energy.Type: ApplicationFiled: September 13, 2022Publication date: January 5, 2023Applicant: ASML Netherlands B.V.Inventors: Yongxin WANG, Zhonghua DONG, Rui-Ling LAI
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Patent number: 11543756Abstract: A lithographic apparatus comprises a projection system comprising position sensors to measure a position of optical elements of the projection system. The positions sensors are referenced to a sensor frame. Damping actuators damp vibrations of the sensor frame. A control device drives the actuators and is configured to derive sensor frame damping force signals from at least one of the acceleration signals and the sensor frame position signals, derive an estimated line of sight error from the position signals, determine actuator drive signals from the sensor frame damping force signals and the estimated line of sight error, drive the actuators using the actuator drive signals to dampen the sensor frame and to at least partly compensate the estimated line of sight error.Type: GrantFiled: November 29, 2018Date of Patent: January 3, 2023Assignee: ASML Netherlands B.V.Inventor: Hans Butler
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Patent number: 11538655Abstract: An improved source conversion unit of a charged particle beam apparatus is disclosed. The source conversion unit comprises a first micro-structure array including a plurality of micro-structures. The plurality of micro-structures is grouped into one or more groups. Corresponding electrodes of micro-structures in one group are electrically connected and driven by a driver to influence a corresponding group of beamlets. The micro-structures in one group may be single-pole structures or multi-pole structures. The micro-structures in one group have same or substantially same radial shifts from an optical axis of the apparatus. The micro-structures in one group have same or substantially same orientation angles with respect to their radial shift directions.Type: GrantFiled: December 28, 2020Date of Patent: December 27, 2022Assignee: ASML Netherlands B.V.Inventors: Xuerang Hu, Xuedong Liu, Zhong-wei Chen, Weiming Ren
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Patent number: 11536654Abstract: An acoustic scatterometer has an acoustic source operable to project acoustic radiation onto a periodic structure and formed on a substrate. An acoustic detector is operable to detect the ?1st acoustic diffraction order diffracted by the periodic structure and while discriminating from specular reflection (0th order). Another acoustic detector is operable to detect the +1st acoustic diffraction order diffracted by the periodic structure, again while discriminating from the specular reflection (0th order). The acoustic source and acoustic detector may be piezo transducers. The angle of incidence of the projected acoustic radiation and location of the detectors and are arranged with respect to the periodic structure and such that the detection of the ?1st and +1st acoustic diffraction orders and discriminates from the 0th order specular reflection.Type: GrantFiled: November 9, 2020Date of Patent: December 27, 2022Assignee: ASML Netherlands B.V.Inventors: Maxim Pisarenco, Nitesh Pandey, Alessandro Polo