Patents Assigned to ASML Netherlands
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Patent number: 10976675Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.Type: GrantFiled: January 28, 2020Date of Patent: April 13, 2021Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Engelbertus Antonius Fransiscus Van Der Pasch, Paul Corné Henri De Wit
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Patent number: 10976265Abstract: A detector for detecting diffracted radiation which has been diffracted by a regular structure; said detector comprises: a sensor for sensing at least a portion of said diffracted radiation, said sensor having a first region and a second region; a first coating configured to allow transmission of radiation with wavelengths within a first range of wavelengths; and a second coating configured to allow transmission of radiation with wavelengths within a second range of wavelengths; wherein said first coating coats said first region of said sensor, and said second coating coats said second region of said sensor, and wherein said first and second regions are different regions.Type: GrantFiled: July 19, 2018Date of Patent: April 13, 2021Assignee: ASML Netherlands B.V.Inventors: Sander Bas Roobol, Richard Quintanilha
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Patent number: 10976196Abstract: A sensor mark including: a substrate having: a deep ultra violet (DUV) radiation absorbing layer including a first material which substantially absorbs DUV radiation; and a protecting layer including a second material, wherein: the DUV radiation absorbing layer has a through hole in it; the protecting layer is positioned, in plan, in the through hole and the protecting layer in the through hole has a patterned region having a plurality of through holes; and the second material is more noble than the first material.Type: GrantFiled: February 15, 2018Date of Patent: April 13, 2021Assignee: ASML Netherlands B.V.Inventors: Joost André Klugkist, Vadim Yevgenyevich Banine, Johan Franciscus Maria Beckers, Madhusudhanan Jambunathan, Maxim Aleksandrovich Nasalevich, Andrey Nikipelov, Roland Johannes Wilhelmus Stas, David Ferdinand Vles, Wilhelmus Jacobus Johannes Welters, Sandro Wricke
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Patent number: 10969701Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.Type: GrantFiled: September 16, 2019Date of Patent: April 6, 2021Assignee: ASML Netherlands B.V.Inventors: Frits Van Der Meulen, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Derk Servatius Gertruda Brouns, Marc Bruijn, Jeroen Dekkers, Paul Janssen, Ronald Harm Gunther Kramer, Matthias Kruizinga, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Gerrit Van Den Bosch, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge, Angelo Cesar Peter De Klerk, Jacobus Maria Dings, Maurice Leonardus Johannes Janssen, Roland Jacobus Johannes Kerstens, Martinus Jozef Maria Kester, Michel Loos, Geert Middel, Silvester Matheus Reijnders, Frank Johannes Christiaan Theuerzeit, Anne Johannes Wilhelmus Van Lievenoogen
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Patent number: 10969542Abstract: A system and method for providing a radiation source. In one arrangement, the radiation source includes an optical fiber that is hollow, and has an axial direction, a gas that fills the hollow of the optical fiber, and a plurality of temperature setting devices disposed at respective positions along the axial direction of the optical fiber, wherein the temperature setting devices are configured to control the temperature of the gas to locally control the density of the gas.Type: GrantFiled: July 10, 2020Date of Patent: April 6, 2021Assignee: ASML Netherlands B.V.Inventors: Hendrik Sabert, Patrick Sebastian Uebel
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Patent number: 10966308Abstract: A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.Type: GrantFiled: July 12, 2016Date of Patent: March 30, 2021Assignee: ASML Netherlands B.V.Inventors: William N. Partlo, Richard L. Sandstrom, Daniel J. W. Brown, Igor V. Fomenkov
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Patent number: 10962887Abstract: A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate is disclosed the method including: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plurality of substrates obtained using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameters; and determining the one or more optimized values of the operational parameter based on the comparing.Type: GrantFiled: November 18, 2019Date of Patent: March 30, 2021Assignee: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus Tinnemans, Edo Maria Hulsebos, Henricus Johannes Lambertus Megens, Sudharshanan Raghunathan, Boris Menchtchikov, Ahmet Koray Erdamar, Loek Johannes Petrus Verhees, Willem Seine Christian Roelofs, Wendy Johanna Martina Van De Ven, Hadi Yagubizade, Hakki Ergün Cekli, Ralph Brinkhof, Tran Thanh Thuy Vu, Maikel Robert Goosen, Maaike Van't Westeinde, Weitian Kou, Manouk Rijpstra, Matthijs Cox, Franciscus Godefridus Casper Bijnen
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Patent number: 10962890Abstract: The present invention relates to a positioning system, including: a first actuator to exert an actuation force on a moveable body, the first actuator being coupled to a balance mass configured to absorb a reaction force resulting from the actuation force, the actuation force providing an acceleration of the moveable body and the reaction force providing an acceleration of the balance mass, wherein a force resulting from the acceleration of the moveable body together with a force resulting from the acceleration of the balance mass result in a balance mass torque; a balance mass support to support the balance mass onto a frame, which balance mass support engages the frame at a support position; and a torque compensator; wherein the torque compensator exerts a compensation force to compensate the balance mass torque, and wherein the torque compensator exerts the compensation force on the frame at the support position.Type: GrantFiled: November 29, 2018Date of Patent: March 30, 2021Assignee: ASML Netherlands B.V.Inventors: Wilhelmus Franciscus Johannes Simons, Dave Braaksma, Hans Butler, Hendrikus Herman Marie Cox, René Wilhelmus Antonius Hubertus Leenaars, Stephan Christiaan Quintus Libourel, Martinus Van Duijnhoven, Maurice Willem Jozef Etiënne Wijckmans
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Publication number: 20210088912Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.Type: ApplicationFiled: December 4, 2020Publication date: March 25, 2021Applicant: ASML Netherlands B.V.Inventors: Cornelius Maria ROPS, Walter Theodorus Matheus STALS, David BESSEMS, Giovanni Luca GATTOBIGIO, Victor Manuel BLANCO CARBALLO, Erik Henricus Egidius Catharina EUMMELEN, Ronald VAN DER HAM, Frederik Antonius VAN DER ZANDEN, Wilhelmus Antonius WERNAART
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Patent number: 10955759Abstract: An electromagnetic actuator is described the actuator comprising: a magnet assembly comprising: an array of permanent magnets arranged in a first direction and configured to generate, outside the magnet assembly, a spatially varying magnetic field distribution in the first direction; a ferromagnetic member onto which the array of permanent magnets is mounted; a coil assembly, at least partly arranged in the spatially varying magnetic field distribution, configured to co-operate with the magnet assembly to generate an electromagnetic force; wherein a thickness of the array of permanent magnets in a second direction perpendicular to the first direction varies along the first direction and wherein a thickness of the ferromagnetic member in the second direction varies along the first direction such that a combined thickness of the array of permanent magnets and the ferromagnetic member in the second direction is substantially constant along the first direction.Type: GrantFiled: May 5, 2017Date of Patent: March 23, 2021Assignee: ASML Netherlands B.V.Inventors: Olof Martinus Josephus Fischer, Hendrikus Herman Marie Cox
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Patent number: 10955749Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.Type: GrantFiled: January 5, 2018Date of Patent: March 23, 2021Assignee: ASML Netherlands B.V.Inventors: Dzmitry Labetski, Christianus Wilhelmus Johannes Berendsen, Rui Miguel Duarte Rodriges Nunes, Alexander Igorevich Ershov, Kornelis Frits Feenstra, Igor Vladimirovich Fomenkov, Klaus Martin Hummler, Arun Johnkadaksham, Matthias Kraushaar, Andrew David Laforge, Marc Guy Langlois, Maksim Loginov, Yue Ma, Seyedmohammad Mojab, Kerim Nadir, Alexander Shatalov, John Tom Stewart, IV, Henricus Gerardus Tegenbosch, Chunguang Xia
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Patent number: 10955755Abstract: Disclosed herein are several methods of reducing one or more pattern displacement errors, contrast loss, best focus shift , tilt of a Bossung curve of a portion of a design layout used in a lithographic process for imaging that portion onto a substrate using a lithographic apparatus. The methods include adjusting an illumination source of the lithographic apparatus, placing assist features onto or adjusting positions and/or shapes existing assist features in the portion. Adjusting the illumination source and/or the assist features may be by an optimization algorithm.Type: GrantFiled: May 31, 2019Date of Patent: March 23, 2021Assignee: ASML Netherlands B.V.Inventors: Duan-Fu Stephen Hsu, Feng-Liang Liu
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Patent number: 10955756Abstract: Methods and apparatuses for measuring a target formed on a substrate. The target includes an alignment structure and a metrology structure. In one method, a first measurement process is performed that includes illuminating the target with first radiation and detecting radiation resulting from scattering of the first radiation from the target. A second measurement process includes illuminating the target with second radiation and detecting radiation resulting from scattering of the second radiation from the target. The first measurement process detects a position of the alignment structure. The second measurement process uses the position of the alignment structure detected by the first measurement process to align a radiation spot of the second radiation onto a desired location within the metrology structure.Type: GrantFiled: May 3, 2018Date of Patent: March 23, 2021Assignee: ASML Netherlands B.V.Inventor: Hugo Augustinus Joseph Cramer
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Patent number: 10955744Abstract: A method of determining a parameter of a pattern transfer process and device manufacturing methods are disclosed. In one arrangement, a method includes obtaining a detected representation of radiation redirected by a structure. The structure is a structure formed by applying a pattern processing to a pattern transferred to an earlier formed structure by a pattern transfer process. The pattern processing is such as to remove one or more selected regions in a horizontal plane of the earlier formed structure to form a pattern in the horizontal plane. The pattern is defined by a unit cell that is mirror symmetric with respect to an axis of mirror symmetry. An asymmetry in the detected representation is determined. The determined asymmetry in the detected representation is used to determine a parameter of the pattern transfer process.Type: GrantFiled: August 10, 2018Date of Patent: March 23, 2021Assignee: ASML Netherlands B.V.Inventors: Koen Van Witteveen, Wei-Chun Wang, Paul Jonathan Turner, Elliott Gerard McNamara, Giacomo Miceli
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Patent number: 10955595Abstract: A reflector for EUV radiation, the reflector comprising a reflector substrate and a reflective surface, the reflector substrate having a plurality of coolant channels formed therein, the coolant channels being substantially straight, substantially parallel to each other and substantially parallel to the reflective surface and configured so that coolant flows in parallel through the coolant channels and in contact with the reflector substrate.Type: GrantFiled: February 17, 2017Date of Patent: March 23, 2021Assignee: ASML Netherlands B.V.Inventors: Koos Van Berkel, Adrianus Hendrik Koevoets
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Patent number: 10955353Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.Type: GrantFiled: February 7, 2019Date of Patent: March 23, 2021Assignee: ASML Netherlands B.V.Inventors: Arie Jeffrey Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers, Paul Frank Luehrmann, Henricus Petrus Maria Pellemans, Maurits Van Der Schaar, Cedric Desire Grouwstra, Markus Gerardus Martinus Maria Van Kraaij
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Patent number: 10955761Abstract: The present invention relates to a lithographic apparatus, comprising: a projection system configured to project a patterned radiation beam onto a substrate, comprising optical elements, a sensor frame, a first position measurement system configured to measure a position of an optical element relative to the sensor frame, comprising a sensor adapted to monitor an optical element, with a sensor element mounted to the sensor frame, a sensor frame support supporting the sensor frame on a reference, a force measurement device adapted to generate force measurement data relating to force exerted on the sensor frame by the sensor frame support, a position control device adapted to control the relative position of the substrate and the patterned radiation beam wherein the position control device is configured to receive the force measurement data and to control said relative position based on at least the force measurement data.Type: GrantFiled: January 11, 2018Date of Patent: March 23, 2021Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Maurice Willem Jozef Etiënne Wijckmans
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Publication number: 20210080834Abstract: The invention provides a pneumatic support device for a lithographic apparatus and a lithographic apparatus with such support device. The support device comprises a gas spring. The gas spring comprises a suspending part, a suspended part, and a pressure chamber configured for supporting the suspended part relative to the suspending part. The support device further comprises an actuator configured for positioning the suspended part relative to the suspending part, an acceleration sensor configured for generating a first sensor signal representative for the acceleration of the suspending part, a pressure sensor configured for generating a second sensor signal representative for the pressure in the pressure chamber, and a control unit.Type: ApplicationFiled: March 18, 2019Publication date: March 18, 2021Applicant: ASML Netherlands B.V.Inventors: Hans BUTLER, Joep Sander DE BEER, Cornelius Adrianus Lambertus DE HOON, Jeroen Pieter STARREVELD, Martinus VAN DUIJNHOVEN, Maurice Willem Jozef Etiënn WIJCKMANS
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Publication number: 20210080835Abstract: The invention provides a vibration isolation system (IS), comprising a piston (402) to carry a payload, a connecting member (410), a spring (404) and a flexible member (408). The spring is arranged to support the piston along a direction with a positive stiffness. The flexible member is arranged to apply a force to the piston along the direction via the connecting member with a negative stiffness.Type: ApplicationFiled: April 23, 2019Publication date: March 18, 2021Applicant: ASML Netherlands B.V.Inventors: Roy Hendrikus Emilie Maria JACOBS, Cornelius Adrianus Lambertus DE HOON, Jeroen Pieter STARREVELD, Johannes Petrus Martinus Ber VERMEULEN
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Patent number: RE48515Abstract: For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the lens is caused so that, successively, different portions of the layer are irradiated and an interspace between a surface of the lens nearest to the layer is maintained. Furthermore, at least a portion of the interspace through which the radiation irradiates the spot on the layer is maintained filled with a liquid, the liquid being supplied via a supply conduit. At least a portion of the liquid fills up a recess through which the radiation irradiates the spot.Type: GrantFiled: May 16, 2017Date of Patent: April 13, 2021Assignee: ASML Netherlands B.V.Inventors: Jacobus Hermanus Maria Neijzen, Helmar Van Santen