Patents Assigned to ASML Netherlands
  • HOLLOW-CORE FIBER BASED BROADBAND RADIATION GENERATOR WITH EXTENDED FIBER LIFETIME
    Publication number: 20220011500
    Abstract: An optical component for a broadband radiation source device, the optical component configured for generating a broadband output upon receiving pump radiation and including: a hollow-core photonic crystal fiber (HC-PCF); and a gas mixture filling the HC-PCF, wherein the gas mixture includes a mixture of at least one first gas configured for the generation of the broadband radiation and at least one second gas including or consisting of helium.
    Type: Application
    Filed: June 29, 2021
    Publication date: January 13, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Amir ABDOLVAND, Cristian Bogdan CRAUS, Anna EZERSKAIA, Phani Kumar DOMALAPALLY
  • DETERMINING A MARK LAYOUT ACROSS A PATTERNING DEVICE OR SUBSTRATE
    Publication number: 20220011683
    Abstract: A method for determining a layout of mark positions across a patterning device or substrate, the method including: obtaining a model configured to model data associated with measurements performed on the patterning device or substrate at one or more mark positions; obtaining an initial mark layout including initial mark positions; reducing the initial mark layout by removal of one or more mark positions to obtain a plurality of reduced mark layouts, each reduced mark layout obtained by removal of a different mark position from the initial mark layout; determining a model uncertainty metric associated with usage of the model for each reduced mark layout out of the plurality of reduced mark layouts; and selecting one or more reduced mark layouts based on its associated model uncertainty metric.
    Type: Application
    Filed: October 21, 2019
    Publication date: January 13, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Pavel SMAL, Inez Marlena SOCHAL, Gautam SARMA
  • METHOD OF MEASURING VARIATION, INSPECTION SYSTEM, COMPUTER PROGRAM, AND COMPUTER SYSTEM
    Publication number: 20220011680
    Abstract: Methods of measuring variation across multiple instances of a pattern on a substrate or substrates after a step in a device manufacturing process are disclosed. In one arrangement, data representing a set of images is received. Each image represents a different instance of the pattern. The set of images are registered relative to each other to superimpose the instances of the pattern. Variation in the pattern is measured using the registered set of images. The pattern comprises a plurality of pattern elements and the registration comprises applying different weightings to two or more of the plurality of pattern elements. The weightings control the extent to which each pattern element contributes to the registration of the set of images. Each weighting is based on an expected variation of the pattern element to which the weighting is applied.
    Type: Application
    Filed: September 24, 2021
    Publication date: January 13, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Antoine Gaston Marie KIERS, Scott Anderson Middlebrooks, Jan-Willem Gemmink
  • MEMBRANE CLEANING APPARATUS
    Publication number: 20220008963
    Abstract: A membrane cleaning apparatus for removing particles from a membrane, the apparatus including a membrane support and an electric field generating mechanism. The membrane support is for supporting the membrane. The electric field generating mechanism is for generating an electric field in the vicinity of the membrane when supported by the membrane support. The electric field generating mechanism may include: one or more collector electrodes; and a mechanism for applying a voltage across a membrane supported by the membrane support and the or each of the one or more collector electrodes.
    Type: Application
    Filed: November 22, 2019
    Publication date: January 13, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Andrey NIKIPELOV, Dmitry KURILOVICH, Fabio SBRIZZAI, Marcus Adrianus VAN DE KERKHOF, Ties Wouter VAN DER WOORD, Willem Joan VAN DER ZANDE, Jeroen VAN DUIVENBODE, David Ferdinand VLES
  • HOLLOW-CORE PHOTONIC CRYSTAL FIBER BASED OPTICAL COMPONENT FOR BROADBAND RADIATION GENERATION
    Publication number: 20220011644
    Abstract: Disclosed is an optical component, being configured to function as an optical frequency converter in a broadband radiation source device. The optical component comprises a gas cell, and a hollow-core photonic crystal fiber at least partially enclosed within said gas cell. The local cavity volume of said gas cell, where said hollow-core photonic crystal fiber is enclosed within the gas cell, comprises a maximum value of 36 cm3 per cm of length of said hollow-core photonic crystal fiber.
    Type: Application
    Filed: September 27, 2021
    Publication date: January 13, 2022
    Applicant: ASML Netherlands B.V.
    Inventors: Patrick Sebastian UEBEL, Sebastian Thomas Bauerschmidt, Peter Maximilian Götz
  • FLOWS OF OPTIMIZATION FOR PATTERNING PROCESSES
    Publication number: 20220011674
    Abstract: A method to improve a lithographic process for imaging a portion of a patterning device pattern onto a substrate using a lithographic projection having an illumination system and projection optics, the method including: (1) obtaining a simulation model that models projection of radiation by the projection optics, wherein the simulation model models an effect of an obscuration in the projection optics, and configuring, based on the model, the portion of the patterning device pattern, and/or (2) obtaining a simulation model that models projection of radiation by the projection optics, wherein the simulation model models an anamorphic demagnification of radiation by the projection optics, and configuring, based on the model, the portion of the patterning device pattern taking into account an anamorphic manufacturing rule or anamorphic manufacturing rule ratio.
    Type: Application
    Filed: September 20, 2021
    Publication date: January 13, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Duan-Fu Stephen HSU
  • LITHOGRAPHIC METHOD AND LITHOGRAPHIC APPARATUS
    Publication number: 20220011681
    Abstract: A method includes exposing number of fields on a substrate, obtaining data about a field and correcting exposure of the field in subsequent exposures. The method includes defining one or more sub-fields of the field based on the obtained data. Data relating to each sub-field is processed to produce sub-field correction information. A subsequent exposure of the one or more sub-fields is corrected using the sub-field correction information. By controlling a lithographic apparatus by reference to data of a particular sub-field within a field, overlay error can be reduced or minimized for a critical feature, rather than being averaged over the whole field. By controlling a lithographic apparatus with reference to a sub-field rather than only the whole field, a residual error can be reduced in each sub-field.
    Type: Application
    Filed: September 23, 2021
    Publication date: January 13, 2022
    Applicant: ASML Netherlands B.V.
    Inventors: Hakki Ergün CEKLI, Xing Lan Liu, Stefan Cornelis Theodorus VAN DER SANDEN, Richard Johannes Franciscus VAN HAREN
  • Level sensor and lithographic apparatus
    Patent number: 11221565
    Abstract: The invention provides a level sensor to measure a position of a surface of a substrate, comprising a projection unit arranged to direct a beam of radiation to the surface of the substrate and a detection unit. The detection unit comprises a detection grating arranged to receive the beam of radiation reflected on the surface of the substrate, one or more detectors, one or more optical elements to direct the beam of radiation from the detection grating to the one or more detectors, and a processing unit to determine the position of the surface of the substrate on the basis of the beam of radiation received by the one or more detectors. The detection grating and the one or more optical elements are integrated in a single integrated optical element.
    Type: Grant
    Filed: March 13, 2019
    Date of Patent: January 11, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Simon Reinald Huisman, Marinus Petrus Reijnders
  • Method and apparatus for design of a metrology target
    Patent number: 11221560
    Abstract: A method of metrology target design is described. The method includes determining a sensitivity of a parameter of a metrology target design to a perturbation of a process parameter for forming, or measuring the formation of, the metrology target, and determining a robustness of the metrology target design based on the sum of the sensitivity multiplied by the perturbation of at least one of the process parameters.
    Type: Grant
    Filed: December 19, 2014
    Date of Patent: January 11, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Guangqing Chen, Wei Liu, Maurits Van der Schaar
  • High harmonic generation radiation source
    Patent number: 11223181
    Abstract: Methods and corresponding apparatus operable to cause an interaction between a drive radiation beam and a medium for generation of emitted radiation by high harmonic generation, the arrangement comprising: an interaction region positioned at an interaction plane and configured to receive the medium; a beam block positioned upstream of the interaction plane at a beam block plane and configured to partially block the drive radiation beam; a beam shaper positioned upstream of the beam block plane at an object plane and configured to control a spatial distribution of the drive radiation beam; and at least one lens positioned upstream of the interaction plane and downstream of the beam block plane, wherein the lens being positioned such that an image of the spatial distribution of the drive radiation beam is formed at the interaction plane.
    Type: Grant
    Filed: August 19, 2019
    Date of Patent: January 11, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Petrus Wilhelmus Smorenburg, Gerrit Jacobus Hendrik Brussaard, David O Dwyer
  • Multi-cell detector for charged particles
    Patent number: 11222766
    Abstract: A multi-cell detector may include a first layer having a region of a first conductivity type and a second layer including a plurality of regions of a second conductivity type. The second layer may also include one or more regions of the first conductivity type. The plurality of regions of the second conductivity type may be partitioned from one another by the one or more regions of the first conductivity type of the second layer. The plurality of regions of the second conductivity type may be spaced apart from one or more regions of the first conductivity type in the second layer. The detector may further include an intrinsic layer between the first and second layers.
    Type: Grant
    Filed: September 28, 2018
    Date of Patent: January 11, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Joe Wang, Yongxin Wang, Zhong-Wei Chen, Xuerang Hu
  • OPTIMIZING AN APPARATUS FOR MULTI-STAGE PROCESSING OF PRODUCT UNITS
    Publication number: 20220004108
    Abstract: A method of optimizing an apparatus for multi-stage processing of product units such as wafers, the method includes: receiving object data representing one or more parameters measured across the product units and associated with different stages of processing of the product units; and determining fingerprints of variation of the object data across the product units, the fingerprints being associated with different respective stages of processing of the product units. The fingerprints may be determined by decomposing the object data into components using principal component analysis for each different respective stage; analyzing commonality of the fingerprints through the different stages to produce commonality results; and optimizing an apparatus for processing product units based on the commonality results.
    Type: Application
    Filed: September 20, 2021
    Publication date: January 6, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jelle NIJE, Alexander YPMA, Dimitra GKOROU, Georgios TSIROGIANNIS, Robert Jan VAN WIJK, Tzu-Chao CHEN, Frans Reinier SPIERING, Sarathi ROY, Cédric Désiré GROUWSTRA
  • PATTERNING DEVICE, A METHOD OF MAKING THE SAME, AND A PATTERNING DEVICE DESIGN METHOD
    Publication number: 20220004094
    Abstract: A patterning device, includes: an absorber layer on a patterning device substrate; and a reflective or transmissive layer on the patterning device substrate, wherein the absorber layer and the reflective or transmissive layer together define a pattern layout having a main feature and an attenuated sub-resolution assist feature paired with the main feature, wherein: the main feature is configured to generate, upon transferring the device pattern to a layer of patterning material on a substrate, the main feature in the layer of patterning material, and upon the transferring the pattern to the layer of patterning material, the attenuated sub-resolution assist feature is configured to avoid generating a feature in the layer of patterning material and to produce a different radiation intensity than the main feature.
    Type: Application
    Filed: September 17, 2021
    Publication date: January 6, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Duan-Fu Stephen HSU, Jingjing LIU
  • EUV optical element having blister-resistant multilayer cap
    Patent number: 11215736
    Abstract: A multilayer mirror having a cap with a multilayer structure including a top layer and a series of bilayers each having an absorber layer and a spacer layer, where the materials for the top layer, absorber layers, and spacer layers are chosen to resist blistering.
    Type: Grant
    Filed: January 29, 2015
    Date of Patent: January 4, 2022
    Assignee: ASML Netherlands B.V.
    Inventor: Norbert Bowering
  • Systems and methods of optimal metrology guidance
    Patent number: 11216938
    Abstract: Systems and methods for optimal electron beam metrology guidance are disclosed. According to certain embodiments, the method may include receiving an acquired image of a sample, determining a set of image parameters based on an analysis of the acquired image, determining a set of model parameters based on the set of image parameters, generating a set of simulated images based on the set of model parameters. The method may further comprise performing measurement of critical dimensions on the set of simulated images and comparing critical dimension measurements with the set of model parameters to provide a set of guidance parameters based on comparison of information from the set of simulated images and the set of model parameters. The method may further comprise receiving auxiliary information associated with target parameters including critical dimension uniformity.
    Type: Grant
    Filed: August 28, 2019
    Date of Patent: January 4, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Lingling Pu, Wei Fang, Nan Zhao, Wentian Zhou, Teng Wang, Ming Xu
  • Substrate table, immersion lithographic apparatus and device manufacturing method
    Patent number: 11215933
    Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
    Type: Grant
    Filed: October 18, 2019
    Date of Patent: January 4, 2022
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Marco Koert Stavenga, Sergei Shulepov, Koen Steffens, Matheus Anna Karel Van Lierop, Samuel Bertrand Dominique David, David Bessems
  • Apparatus of plural charged-particle beams
    Patent number: 11217423
    Abstract: A multi-beam apparatus for observing a sample with oblique illumination is proposed. In the apparatus, a new source-conversion unit changes a single electron source into a slant virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample with oblique illumination, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means not only forms the slant virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots. The apparatus can provide dark-field images and/or bright-field images of the sample.
    Type: Grant
    Filed: March 18, 2019
    Date of Patent: January 4, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Weiming Ren, Shuai Li, Xuedong Liu, Zhongwei Chen, Jack Jau
  • MODEL FOR CALCULATING A STOCHASTIC VARIATION IN AN ARBITRARY PATTERN
    Publication number: 20210405538
    Abstract: A method of determining a relationship between a stochastic variation of a characteristic of an aerial image or a resist image and one or more design variables, the method including: measuring values of the characteristic from a plurality of aerial images and/or resist images for each of a plurality of sets of values of the design variables; determining a value of the stochastic variation, for each of the plurality of sets of values of the design variables, from a distribution of the values of the characteristic for that set of values of the design variables; and determining the relationship by fitting one or more parameters from the values of the stochastic variation and the plurality of sets of values of the design variables.
    Type: Application
    Filed: August 3, 2021
    Publication date: December 30, 2021
    Applicant: ASML Netherlands B.V.
    Inventor: Steven George HANSEN
  • METHOD FOR OBTAINING TRAINING DATA FOR TRAINING A MODEL OF A SEMICONDUCTOR MANUFACTURING PROCESS
    Publication number: 20210405544
    Abstract: A method for obtaining a training data set including synthetic metrology data, the training data set being configured for training of a model relating to a manufacturing process for manufacturing an integrated circuit. The method includes obtaining behavioral property data describing a behavior of a process parameter resultant from the manufacturing process and/or a related tool or effect. Additionally, or alternatively metrology data performed on a structure formed by the manufacturing process and/or a similar manufacturing process may be obtained. Using the behavioral property data and/or metrology data, synthetic metrology data is determined, which describes the effect of variations in the manufacturing process, and/or a related tool or effect on the process parameter. The model is trained using the training data set including the synthetic metrology data.
    Type: Application
    Filed: September 26, 2019
    Publication date: December 30, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Roy WERKMAN, Lydia Marianna VERGAIJ-HUIZER
  • METHOD IN THE MANUFACTURING PROCESS OF A DEVICE, A NON-TRANSITORY COMPUTER-READABLE MEDIUM AND A SYSTEM CONFIGURED TO PERFORM THE METHOD
    Publication number: 20210407112
    Abstract: A method for determining an image-metric of features on a substrate, the method including: obtaining a first image of a plurality of features on a substrate; obtaining one or more further images of a corresponding plurality of features on the substrate, wherein at least one of the one or more further images is of a different layer of the substrate than the first image; generating aligned versions of the first and one or more further images by performing an alignment process on the first and one or more further images; and calculating an image-metric in dependence on a comparison of the features in the aligned version of the first image and the corresponding features in the one or more aligned versions of the one or more further images.
    Type: Application
    Filed: September 23, 2019
    Publication date: December 30, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Wim Tjibbo TEL, Antoine Gaston Marie KIERS, Vadim Yourievich TIMOSHKOV, Hermanus Adrianus DILLEN, Yichen ZHANG, Te-Sheng WANG, Tzu-Chao CHEN