Patents Assigned to ASML Netherlands
  • METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
    Publication number: 20210384086
    Abstract: A method of determining overlay of a patterning process, the method including: obtaining a detected representation of radiation redirected by one or more physical instances of a unit cell, wherein the unit cell has geometric symmetry at a nominal value of overlay and wherein the detected representation of the radiation was obtained by illuminating a substrate with a radiation beam such that a beam spot on the substrate was filled with the one or more physical instances of the unit cell; and determining, from optical characteristic values from the detected radiation representation, a value of a first overlay for the unit cell separately from a second overlay for the unit cell that is also obtainable from the same optical characteristic values, wherein the first overlay is in a different direction than the second overlay or between a different combination of parts of the unit cell than the second overlay.
    Type: Application
    Filed: August 20, 2021
    Publication date: December 9, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Adriaan Johan VAN LEEST, Anagnostis TSIATMAS, Paul Christiaan HINNEN, Elliott Gerard MC NAMARA, Alok VERMA, Thomas THEEUWES, Hugo Augustinus Joseph CRAMER
  • DETECTION SYSTEM FOR AN ALIGNMENT SENSOR
    Publication number: 20210382404
    Abstract: A detection system for an alignment sensor, and an alignment sensor and lithographic projection apparatus comprising such a detection system is disclosed. The detection system comprises at least one detection circuit; and a plurality of optical fiber cores for transporting a measurement signal to the at least one detection circuit. At least as subset of the plurality of optical fiber cores are selectively switchable between a detection state and a non-detection state, thereby defining a configurable detection spot.
    Type: Application
    Filed: September 24, 2019
    Publication date: December 9, 2021
    Applicant: ASML Netherlands B.V.
    Inventor: Simon Reinald HUISMAN
  • APPARATUS AND METHOD FOR MEASURING A POSITION OF A MARK
    Publication number: 20210382403
    Abstract: An apparatus for measuring a position of a mark on a substrate, the apparatus comprising: an illumination system configured to condition at least one radiation beam to form a plurality of illumination spots spatially distributed in series such that during scanning of the substrate the plurality of illumination spots are incident on the mark sequentially, and a projection system configured to project radiation diffracted by the mark from the substrate, the diffracted radiation being produced by diffraction of the plurality of illumination spots by the mark; wherein the projection system is further configured to modulate the diffracted radiation and project the modulated radiation onto a detecting system configured to produce signals corresponding to each of the plurality of illumination spots, the signals being combined to determine the position of the mark.
    Type: Application
    Filed: September 5, 2019
    Publication date: December 9, 2021
    Applicant: ASML Netherlands B.V.
    Inventor: Sebastianus Adrianus GOORDEN
  • TRANSMISSIVE DIFFUSOR
    Publication number: 20210382209
    Abstract: A first diffusor configured to receive and transmit radiation has a plurality of layers, each layer arranged to change an angular distribution of EUV radiation passing through it differently. A second diffusor configured to receive and transmit radiation has a first layer and a second layer. The first layer is formed from a first material, the first layer including a nanostructure on at least one surface of the first layer. The second layer is formed from a second material adjacent to the at least one surface of the first layer such that the second layer also includes a nanostructure. The second material has a refractive index that is different to a refractive index of the first layer. The diffusors may be configured to receive and transmit EUV radiation.
    Type: Application
    Filed: September 13, 2019
    Publication date: December 9, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Andrey NIKIPELOV, Marcus Adrianus VAN DE KERKHOF, Pieter-Jan VAN ZWOL, Laurentius Cornelius DE WINTER, Wouter Joep ENGELEN, Alexey Olegovich POLYAKOV
  • REFLECTOR AND METHOD OF MANUFACTURING A REFLECTOR
    Publication number: 20210383940
    Abstract: A reflector comprising a hollow body having an interior surface defining a passage through the hollow body, the interior surface having at least one optical surface part configured to reflect radiation and a supporter surface part, wherein the optical surface part has a predetermined optical power and the supporter surface part does not have the predetermined optical power. The reflector is made by providing an axially symmetric mandrel; shaping a part of the circumferential surface of the mandrel to form at least one inverse optical surface part that is not rotationally symmetric about the axis of the mandrel; forming a reflector body around the mandrel; and releasing the reflector body from the mandrel whereby the reflector body has an optical surface defined by the inverse optical surface part and a supporter surface part defined by the rest of the outer surface of the mandrel.
    Type: Application
    Filed: August 23, 2021
    Publication date: December 9, 2021
    Applicant: ASML Netherlands B.V.
    Inventor: Ferry ZIJP
  • FAILURE MODEL FOR PREDICTING FAILURE DUE TO RESIST LAYER
    Publication number: 20210382393
    Abstract: A method of determining a failure model of a resist process of a patterning process. The method includes obtaining (i) measured data of a pattern failure (e.g., failure rate) related to a feature printed on a substrate based on a range of values of dose, and (ii) image intensity values for the feature via simulating a process model using the range of the dose values; and determining, via fitting the measured data of the pattern failure to a product of the dose values and the image intensity values, a failure model to model a stochastic behavior of spatial fluctuations in the resist and optionally predict failure of the feature (e.g., hole closing).
    Type: Application
    Filed: October 22, 2019
    Publication date: December 9, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Steven George HANSEN
  • METHOD OF DETERMINING THE CONTRIBUTION OF A PROCESSING APPARATUS TO A SUBSTRATE PARAMETER
    Publication number: 20210382400
    Abstract: A method for determining a contribution of a processing apparatus to a fingerprint of a parameter across a substrate, the method including: obtaining a delta image which relates to a difference between a first pupil image associated with inspection of a first feature on the substrate and a second pupil image associated with inspection of a second feature on the substrate, wherein the first and second features have different dose sensitivities; determining a rate of change of the difference in response to a variation of a dose used to form the first and second features; selecting a plurality of pixels within the delta image having a rate of change above a predetermined threshold; and determining the contribution using the determined rate of change and the delta image restricted to the plurality of pixels.
    Type: Application
    Filed: September 26, 2019
    Publication date: December 9, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Roy ANUNCIADO
  • APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
    Publication number: 20210384008
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.
    Type: Application
    Filed: July 12, 2021
    Publication date: December 9, 2021
    Applicant: ASML Netherlands B.V.
    Inventors: Shuai LI, Weiming REN, Xuedong LIU, Juying DOU, Xuerang HU, Zhongwei CHEN
  • INSPECTION APPARATUS
    Publication number: 20210382396
    Abstract: An inspection apparatus for inspecting an object such as a pellicle for use in an EUV lithographic apparatus, the inspection apparatus including: a vacuum chamber; a load lock forming an interface between the vacuum chamber and an ambient environment; and a stage apparatus configured to receive the object from the load lock and displace the object inside the vacuum chamber, wherein the vacuum chamber includes a first parking position and a second parking position for temporarily storing the object.
    Type: Application
    Filed: October 17, 2019
    Publication date: December 9, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Pawel SAFINOWSKI, Derk Servatius Gertruda BROUNS
  • Method and apparatus for determining a fingerprint of a performance parameter
    Patent number: 11194258
    Abstract: A lithographic process is one that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. During the lithographic process, the focus needs to be controlled. There is disclosed a method for determining a fingerprint of a performance parameter associated with a substrate, such as a focus value to be used during the lithographic process. A reference fingerprint of the performance parameter is determined for a reference substrate. A reference substrate parameter of the reference substrate is determined. A substrate parameter for a substrate, such as a substrate with product structures, is determined. Subsequently, the fingerprint of the performance parameter is determined based on the reference fingerprint, reference substrate parameter and the substrate parameter. The fingerprint may then be used to control the lithographic process.
    Type: Grant
    Filed: April 2, 2020
    Date of Patent: December 7, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Léon Maria Albertus Van Der Logt, Bart Peter Bert Segers, Simon Hendrik Celine Van Gorp, Carlo Cornelis Maria Luijten, Frank Staals
  • A Positioning System and a Method for Positioning a Substage or a Stage with Respect to a Frame
    Publication number: 20210373446
    Abstract: A method for positioning a substage (9), supported by a main stage (5), relative to a reference object, the substage moveable in a direction (7) between a first and second position relative to the main stage. The method includes positioning the first stage using a passive force system that is activated by positioning the main stage. The passive force system includes two magnet systems (119, 121), each magnet system being configured to apply a force in the direction to the first stage with respect to the second stage in a non-contact manner, the forces resulting in a resultant force applied to the first stage in the direction by the passive force system. A magnitude and/or a direction of the resultant force depends on the position of the first stage relative to the second stage, and the first stage has a zero-force position between the first and second position in which the resultant force is zero.
    Type: Application
    Filed: October 8, 2018
    Publication date: December 2, 2021
    Applicant: ASML Netherlands B.V.
    Inventors: Yang-Shan HUANG, Petrus Theodorus RUTGERS
  • METHOD AND APPARATUS FOR INSPECTION
    Publication number: 20210375581
    Abstract: An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns, each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns, the actuator system including a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.
    Type: Application
    Filed: August 16, 2021
    Publication date: December 2, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bernardo KASTRUP, Johannes Catharinus Hubertus MULKENS, Marinus Aart VAN DEN BRINK, Jozef Petrus Henricus BENSCHOP, Erwin Paul SMAKMAN, Tamara DRUZHININA, Coen Adrianus VERSCHUREN
  • RADIOISOTOPE PRODUCTION
    Publication number: 20210375498
    Abstract: A radioisotope production apparatus comprising an electron source arranged to provide an electron beam. The electron source comprises an electron injector and an electron accelerator. The radioisotope production apparatus further comprises a target support structure configured to hold a target and a beam splitter arranged to direct the a first portion of the electron beam along a first path towards a first side of the target and to direct a second portion of the electron beam along a second path towards a second side of the target.
    Type: Application
    Filed: August 6, 2021
    Publication date: December 2, 2021
    Applicant: ASML Netherlands B.V.
    Inventors: Pieter Willem Herman DE JAGER, Sipke Jacob BIJLSMA, Olav Waldemar Vladimir FRIJNS, Andrey Alexandrovich NIKIPELOV, Nicolaas TEN KATE, Antonius Theodorus Anna Maria DERKSEN, Jacobus Johannus Leonardus Hendricus VERSPAY, Robert Gabriël Maria LANSBERGEN, Aukje Arianne Annette KASTELIJN
  • DEEP LEARNING FOR SEMANTIC SEGMENTATION OF PATTERN
    Publication number: 20210374936
    Abstract: A method for training a deep learning model of a patterning process. The method includes obtaining (i) training data including an input image of at least a part of a substrate having a plurality of features and including a truth image, (ii) a set of classes, each class corresponding to a feature of the plurality of features of the substrate within the input image, and (iii) a deep learning model configured to receive the training data and the set of classes, generating a predicted image, by modeling and/or simulation with the deep learning model using the input image, assigning a class of the set of classes to a feature within the predicted image based on matching of the feature with a corresponding feature within the truth image, and generating, by modeling and/or simulation, a trained deep learning model by iteratively assigning weights using a loss function.
    Type: Application
    Filed: February 15, 2019
    Publication date: December 2, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Adrianus Cornelis Matheus KOOPMAN, Scott Anderson MIDDLEBROOKS, Antoine Gaston Marie KIERS, Mark John MASLOW
  • Metrology using a plurality of metrology target measurement recipes
    Patent number: 11187995
    Abstract: A method of measuring a parameter of a patterning process, the method including obtaining a measurement of a substrate processed by a patterning process, with a first metrology target measurement recipe; obtaining a measurement of the substrate with a second, different metrology target measurement recipe, wherein measurements using the first and second metrology target measurement recipes have their own distinct sensitivity to a metrology target structural asymmetry of the patterning process; and determining a value of the parameter by a weighted combination of the measurements of the substrate using the first and second metrology target measurement recipes, wherein the weighting reduces or eliminates the effect of the metrology target structural geometric asymmetry on the parameter of the patterning process determined from the measurements using the first and second metrology target measurement recipes.
    Type: Grant
    Filed: November 1, 2017
    Date of Patent: November 30, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Victor Emanuel Calado, Youping Zhang, Maurits Van Der Schaar, Richard Johannes Franciscus Van Haren, Xing Lan Liu
  • Method for controlling a manufacturing process and associated apparatuses
    Patent number: 11187994
    Abstract: A method for controlling a manufacturing process for manufacturing semiconductor devices, the method including: obtaining performance data indicative of the performance of the manufacturing process, the performance data including values for a performance parameter across a substrate subject to the manufacturing process; and determining a process correction for the manufacturing process based on the performance data and at least one control characteristic related to a dynamic behavior of one or more control parameters of the manufacturing process, wherein the determining is further based on an expected stability of the manufacturing process when applying the process correction.
    Type: Grant
    Filed: July 3, 2019
    Date of Patent: November 30, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Mohammad Reza Kamali, Brennan Peterson
  • Lithographic apparatus and a method of operating the apparatus
    Patent number: 11187991
    Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.
    Type: Grant
    Filed: September 18, 2015
    Date of Patent: November 30, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Christian Gerardus Norbertus Hendricus Marie Cloin, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Marco Koert Stavenga, Erik Henricus Egidius Catharina Eummelen, Michel Riepen, Olga Vladimirovna Elisseeva, Tijmen Wilfred Mathijs Gunther, Michaël Christiaan Van Der Wekken
  • Substrate holder, substrate support and method of clamping a substrate to a clamping system
    Patent number: 11187998
    Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member; and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.
    Type: Grant
    Filed: October 24, 2018
    Date of Patent: November 30, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Abraham Alexander Soethoudt, Thomas Poiesz
  • Apparatus and Methods for Determining the Position of a Target Structure on a Substrate
    Publication number: 20210364936
    Abstract: A sensor is disclosed, wherein a transducer generates acoustic waves, which are received by a lens assembly. The lens assembly transmits and directs at least a part of the acoustic waves to a target. The lens assembly then receives at least a part of acoustic waves, after interaction with the target. The sensor further comprises an optical detector that comprises at least one optically reflective member located at a surface of the lens assembly, which surface is arranged opposite to a surface of the lens assembly which faces a focal plane of the lens assembly, wherein the at least one optically reflective member is mechanically displaced in response to the acoustic waves, which are received and transmitted by the lens assembly.
    Type: Application
    Filed: December 20, 2018
    Publication date: November 25, 2021
    Applicant: ASML Netherlands B.V.
    Inventors: Nitesh PANDEY, Duygu AKBULUT, Alessandro POLO, Sebastianus Adrianus GOORDEN
  • WAVEFRONT OPTIMIZATION FOR TUNING SCANNER BASED ON PERFORMANCE MATCHING
    Publication number: 20210364929
    Abstract: A method for determining a wavefront parameter of a patterning process. The method includes obtaining a reference performance (e.g., a contour, EPE, CD) of a reference apparatus (e.g., a scanner), a lens model for a patterning apparatus configured to convert a wavefront parameter of a wavefront to actuator movement, and a lens fingerprint of a tuning apparatus (e.g., a to-be-matched scanner). Further, the method involves determining the wavefront parameter (e.g., a wavefront parameter such as tilt, offset, etc.) based on the lens fingerprint of the tuning apparatus, the lens model, and a cost function, wherein the cost function is a difference between the reference performance and a tuning apparatus performance.
    Type: Application
    Filed: June 21, 2019
    Publication date: November 25, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Duan-Fu Stephen HSU, Christoph Rene Konrad Cebulla HENNERKES, Rafael C. HOWELL, Zhan SHI, Xiaoyang Jason LI, Frank STAALS