Abstract: A system and a method for optically detecting a pose of at least one instrument in an operating theater are provided. The method includes determining pose information of the at least one instrument with an optical pose detection device of a surgical microscope or with a microscope-external optical pose detection device, determining whether the pose information is biunique or whether a biunique determination of the pose of the instrument is possible, and evaluating additional information for determining additional pose information, at least for a case where no biunique determination of the pose is possible.

Abstract: A method and apparatus are provided to perform contactless measurement of an object with a measuring camera. The method includes producing an uninterrupted relative motion between the measuring camera and a surface of the object. A plurality of images of the surface of the object are recorded during the relative motion, each image showing a different segment of the surface. A blur of the images that is produced by the relative motion is computationally extracted by applying a deconvolution algorithm, use being made of different convolution kernels that differ from one another in at least one zero. In this case, e.g., exactly one image of each segment of the surface can be recorded. During the recording of the exactly one image at least one recording parameter is changed such that the convolution kernel during the recording changes in at least one zero.

Abstract: An intraocular lens is provided which includes a single optical part, a haptic element, which is coupled to the optical part, and an optical main axis, which penetrates a front face and a rear face of the optical part, the haptic element having a first haptic part, which is in the form of a first ring and extends around the optical part, and at least one second haptic part, which is in the form of a second ring and extends around the optical part and is elastically movable relative to the first haptic part, at least one of the two rings being uneven in the peripheral direction about the optical main axis, at least one of the two rings having exactly two ring valleys and exactly two ring hills.

Abstract: A method for software-based planning of a dimensional measurement of a measurement object includes receiving an input command for selecting at least one measurement element of the measurement object that is to be measured during the measurement. The method includes determining a selection of measurable test features of the at least one selected measurement element. Each of the test features includes a dimensionally measurable measurand of the at least one selected measurement element. The method includes determining a reduced subset of the selection of measurable test features depending on a view currently chosen on a display. The method includes visualizing the test features contained in the reduced subset by generating a graphical representation of each of the test features contained in the reduced subset on the display.

Abstract: An optical assembly has an optical element for influencing the beam path in a projection exposure apparatus and an actuator device for deforming the optical element. The actuator device has at least one photostrictive component and at least one light source. The photostrictive component is mechanically coupled to the optical element for the transmission of a tensile and/or compressive force in order to deform the optical element. The light source is configured for targeted illumination of the photostrictive component in order to induce the tensile and/or compressive force in the photostrictive component.

Abstract: A particle beam column generates a particle beam of charged particles, for example electrons or ions, and direct it onto a sample. The particle beam column comprises a multi-aperture stop and a deflection system for selectively steering the particle beam through one of a plurality of apertures provided in the multi-aperture stop. The apertures have different sizes in order to limit the current strength of the particle beam to different values. The particle beam column furthermore comprises a lens for changing the divergence angle of the particle beam upstream of a first stop. The lens can comprise a magnetic lens, which comprises a magnetic core with a plurality of parts, which are electrically insulated from one another and can have substantially different electrical potentials during operation. Some of the parts of the magnetic core can have the same electrical potential as the first stop during operation.

Abstract: A method for qualifying a mask for a lithography system, the mask having measurement points for detecting critical dimensions of the mask, comprising: first detection of critical dimensions of the mask at the measurement points, the first detection taking place sequentially and the duration of the first detection defining a measurement time period; determining reference measurement points from the measurement points, the number of reference measurement points being less than the number of measurement points; second detection of the at least one critical dimension of the mask at the reference measurement points; determining a deviation between the first and the second detected critical dimension at each of the reference measurement points; and applying a determined temporal profile of the correction factor to the at least one critical dimension to obtain a corrected critical dimension of the mask, and also a corresponding device for qualifying a mask for a lithography system.

Abstract: A field facet system for a lithography apparatus comprises: an optical element which comprises an elastically deformable facet portion having a light-reflecting optically active surface; and at least one actuating element for introducing a bending moment into the facet portion to deform the facet portion to change a radius of curvature of the optically active surface. The facet portion is curved in an arched manner in a plan view of the optically active surface. The rigidity of the facet portion as viewed along a longitudinal direction of the facet portion is variable so that a normal vector oriented perpendicularly to the optically active surface tilts exclusively about a spatial direction when the bending moment is introduced into the facet portion.

Abstract: A method for operating an optical sensor, which has a movement controller that can be actuated by a user to control a movement of the sensor relative to a measurement object, includes identifying that the sensor is in a favorable state of movement relative to the measurement object, and generating and outputting a signal when the sensor is in the favorable state of movement to assist the user in keeping the sensor in the favorable state of movement, and/or inhibiting or blocking by machine a movement of the sensor which would cause the sensor to leave the favorable state of movement. To achieve a favorable orientation of the sensor, generating and outputting a third signal signals to the user to actuate the movement controller such that the sensor achieves the favorable orientation, and/or controlling by machine a movement of the sensor which causes the sensor to achieve the favorable orientation.

Abstract: A method of heating an optical element in a microlithographic projection exposure apparatus and an optical system includes using a heating arrangement to introduce a heating power into the optical element. The heating power is regulated based on a setpoint value. The setpoint value is varied over time during the operation of the projection exposure apparatus. Varying the setpoint value for the heating power comprises a simulation of the effects of changes in the heating power relative to the actual value thereof based on a model for the thermal behavior of the optical element.

Abstract: A computer-implemented method for operating an optometry device includes the following steps: generating a first data set including information about a distance of a user of the optometry device to an object and tuning a tunable lens of the optometry device based on the distance of the user of the optometry device to the object based on the first data set. The first data set is generated by using a LiDAR sensor, which measures the distance of the user of the optometry device to the object by evaluating a scene represented by the first data set.

Abstract: The disclosure provides an optical system, having a first optical control loop, which is set up to regulate a position and/or spatial orientation of a first optical element relative to a first module sensor frame, and a first module control loop, which is set up to regulate a position and/or spatial orientation of the first module sensor frame relative to a base sensor frame. Related components and methods are also provided.

Abstract: A method for operating a LIDAR system with at least one spectrally tunable light source emitting a light beam having a temporally varying frequency and a transparent protective shield, arranged in a light path of the light beam, protecting the LIDAR system against environmental pollution includes determining distance values of an object based on beat frequencies of beat signals resulting from a superposition of partial signals obtained from partial reflection of the light beam at the object with reference signals not reflected at the object. Each distance value is determined from a peak in a signal spectrum obtained on the basis of a Fourier transformation of the beat signal. A degree of soiling of the protective shield is diagnosed by analyzing the signal spectrum in a predefined analysis frequency range. An upper limit frequency bounding said analysis frequency range is based on a distance of the protective shield.

Abstract: An apparatus and method for manipulating a focus of excitation light on or in a sample, particularly in a microscope. The apparatus has a light source for emitting excitation light, an excitation beam path for guiding the excitation light onto or into the sample, the excitation beam path comprising an objective for guiding the excitation light onto or into the sample and a wavefront modulator for modulating the excitation light, and a control device for driving the wavefront modulator. The control device is designed for driving the wavefront modulator to generate a number of shaped waves on or in the sample. A focus is generated at a specified location on or in the sample by superposition of the shaped waves.

Abstract: A microscope with fast quasi-confocal detection has a main beam splitter and an adjustable beam deflection unit for moving an illumination light through a sample space. The beam deflection unit is optically arranged between a light source and a main beam splitter such that the sample light away from the beam deflection unit passes to a sensor, wherein both the illumination light and the sample light pass through the same intermediate image.

Abstract: The invention relates to a method for producing a laminating component or a hologram component. A holographic material, such as a holographic film, is connected either to a laminating agent in order to form a laminating component or to a transparent reinforcing material in order to form a hologram component In order to produce a composite glass, the laminating component or the hologram component can then be laminated between two glass panes, which can be curved in particular. By virtue of the laminating agent of the laminating component or the reinforcing material of the hologram component, damage to the hologram imprinted in the holographic material can be prevented or reduced.

Abstract: A particle beam system, such as a multi-beam particle microscope, includes a multi-beam deflection device and a beam stop. The multi-beam deflection device is arranged in the particle-optical beam path downstream of the multi-beam generator and upstream of the beam switch of the particle beam system. The multi-beam deflection device serves collectively blanks a multiplicity of charged individual particle beams. These impinge on a beam stop, which is arranged in the particle-optical beam path level with a site at which a particle beam diameter is reduced or is at a minimum. By way of example, such sites are the cross-over plane of the individual particle beams or an intermediate image plane. Associated methods for operating the particle beam system and associated computer program products are disclosed.

Abstract: A facet assembly is a constituent part of a facet mirror for an illumination optical unit for projection lithography. The facet assembly has a facet with a reflection surface for reflecting illumination light. A facet main body of the facet assembly has at least one hollow chamber. A reflection surface chamber wall of the hollow chamber forms at least one portion of the reflection surface. An actuator control apparatus of the facet assembly is operatively connected to the hollow chamber for the controlled deformation of the reflection surface chamber wall. The result is a facet assembly that is usable flexibly as a constituent part of a facet mirror equipped therewith within an illumination optical unit for projection lithography.

Abstract: A method for operating a particle beam microscope comprises scanning an object using a particle beam and detecting electrons and x-ray radiation when scanning an object using a particle beam. Improved x-ray radiation information can be generated by combining weighted x-ray radiation information items according to the formula S e ( r ? "\[Rule]" i ) = ? j w ? ( i , j ) · S ? ( r ? "\[Rule]" j ) , wherein S({right arrow over (r)}i) is the detected x-ray radiation intensity assigned to a location {right arrow over (r)}i. The following holds true for the weights, for example: w ? ( i , j ) = e - ( r ? "\[Rule]" i - r ? "\[Rule]" j ) 2 / ? f 2 · e - ( I ? ( r ? "\[Rule]" i ) - I ? ( r ? "\[Rule]" j ) ) 2 / ? g 2 , wherein I({right arrow over (r)}) represents the intensity of the detected electrons that is assigned to the location {right arrow over (r)}, and ?f and ?g are constants.

Abstract: A micromirror array is a constituent part of an illumination-optical component of a projection exposure apparatus for projection lithography. A multiplicity of micromirrors are in groups in a plurality of mirror modules, each of which has a rectangular module border. The mirror modules are in module columns. At least some of the module columns are displaced with respect to one another along a column boundary line so that at least some of the mirror modules adjacent to one another over the boundary line are arranged displaced with respect to one another. Their module border sides running transversely to the boundary line are not aligned flush with one another. This micromirror array can have a relatively standardized production and can have a relatively small reflection folding angle on the object if the micromirror array represents a final illumination-optical component upstream of a reflective object to be illuminated.